JP2012101342A - Surface treatment agent for polishing pad and spray for polishing pad - Google Patents

Surface treatment agent for polishing pad and spray for polishing pad Download PDF

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JP2012101342A
JP2012101342A JP2010253861A JP2010253861A JP2012101342A JP 2012101342 A JP2012101342 A JP 2012101342A JP 2010253861 A JP2010253861 A JP 2010253861A JP 2010253861 A JP2010253861 A JP 2010253861A JP 2012101342 A JP2012101342 A JP 2012101342A
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polishing pad
polishing
treatment agent
surface treatment
spray
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JP5688590B2 (en
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Yasuhiro Tani
泰弘 谷
Chuji Kirino
宙治 桐野
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TOOL BANK KK
Ritsumeikan Trust
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Ritsumeikan Trust
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Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment agent for a polishing pad and a spray for a polishing pad by which a thin and uniform film made of a thermosetting resin can be formed on the surface of a polishing pad without replacing a used pad with new one.SOLUTION: The spray 1 for the polishing pad is provided by filling a spray container 2 with a surface treatment agent for a polishing pad made of a dispersant 3 prepared by dispersing a thermosetting resin, such as urethane resin and epoxy resin, in a solvent and showing a viscosity of 1,000 cP (centipoise) or lower at 20°C and with a high-pressure gas.

Description

本発明は、レンズ、半導体デバイス用シリコンウエハ、液晶ディスプレイ用ガラス基板等の被研磨物を研磨加工する際に用いられる研磨パッドの表面にウレタン樹脂やエポキシ樹脂等の熱硬化性樹脂を塗布するための研磨パッド用表面処理剤及び該研磨パッド用表面処理剤を用いた研磨パッド用スプレーに関する。   The present invention applies a thermosetting resin such as a urethane resin or an epoxy resin to the surface of a polishing pad used when polishing an object to be polished such as a lens, a silicon wafer for a semiconductor device, or a glass substrate for a liquid crystal display. The polishing pad surface treatment agent and a polishing pad spray using the polishing pad surface treatment agent.

従来、レンズ、半導体デバイス用シリコンウエハ、液晶ディスプレイ用ガラス基板、ハードディスク用ガラス基板、アルミ基板等の高精度な平坦性が要求される被研磨物では、研磨パッドを用いた研磨加工が行われている。このような高度な平坦性が要求される被研磨物の研磨加工では、一般的に平坦度の調整を主目的とする粗研磨を行った後に、表面粗さを改善することを主目的とする仕上げ研磨が行われる。   Conventionally, polishing work using a polishing pad has been performed on objects to be polished that require high-precision flatness such as lenses, silicon wafers for semiconductor devices, glass substrates for liquid crystal displays, glass substrates for hard disks, and aluminum substrates. Yes. In the polishing process of an object requiring such high flatness, the main purpose is to improve the surface roughness after performing rough polishing, which is generally intended to adjust the flatness. Final polishing is performed.

これらの研磨加工を行うために用いる研磨パッドとしては、例えば、繊維を絡合して構成した不織布の繊維基材にポリウレタン樹脂を含浸して硬化させたウレタン含浸不織布タイプの研磨パッド(例えば、特許文献1参照)や繊維により構成される不織布や樹脂フィルムからなる基材上にウレタン樹脂溶液を塗布し、これを凝固処理して多数の気泡を有する多孔質の銀面層を形成し、該銀面層の表面を研削して多孔質の研磨層であるナップ層を形成したスエードタイプの研磨パッド(例えば、特許文献2参照)等がこれまで用いられている。被研磨物の表面の研磨を行う際には、例えば、これらの研磨パッドを回転可能な研磨定盤の上に貼り付け、該研磨パッドに研磨ヘッドに保持された被研磨物を押し当てた状態で、研磨パッド上に研磨材である砥粒が分散された研磨スラリーを供給しながら、研磨定盤及び研磨ヘッドを相対的に回転させることにより研磨が行われる。   As a polishing pad used for performing these polishing processes, for example, a urethane-impregnated nonwoven fabric type polishing pad in which a nonwoven fabric fiber base material formed by intertwining fibers is impregnated with a polyurethane resin and cured (for example, a patent) A urethane resin solution is applied on a base material made of a nonwoven fabric or resin film composed of a non-woven fabric or a fiber made of fibers, and this is solidified to form a porous silver surface layer having a large number of bubbles. A suede type polishing pad (see, for example, Patent Document 2) in which a nap layer that is a porous polishing layer is formed by grinding the surface of a surface layer has been used so far. When polishing the surface of the object to be polished, for example, these polishing pads are stuck on a rotatable polishing surface plate and the object to be polished held by the polishing head is pressed against the polishing pad. Thus, polishing is performed by relatively rotating the polishing platen and the polishing head while supplying the polishing slurry in which the abrasive grains, which are abrasives, are dispersed on the polishing pad.

特開平10−249737号公報Japanese Patent Laid-Open No. 10-249737 特開2010−149259号公報JP 2010-149259 A

しかしながら、従来の研磨加工においては、研磨パッド表面の磨耗等に伴って、研磨パッドを研磨定盤上に貼り換える作業が必要であった。特に大口径の研磨パッドにおいては、この張り換え作業に多大な時間を要するため、生産効率が低下するという問題があった。また、レンズ等の研磨加工では形状精度が大事な要素となるため、研磨パッドの表面を均一にすることが求められる。   However, in the conventional polishing process, it is necessary to replace the polishing pad on the polishing surface plate as the polishing pad surface is worn. In particular, a large-diameter polishing pad has a problem that production efficiency is lowered because a large amount of time is required for this replacement work. In addition, since the shape accuracy is an important factor in polishing processing of lenses and the like, it is required to make the surface of the polishing pad uniform.

本発明は、上記のような課題に鑑みてなされたものであって、研磨パッドの貼り換え作業を行うことなく、研磨パッドの表面に熱硬化性樹脂からなる膜を薄く均一に形成することができる研磨パッド用表面処理剤及び研磨パッド用スプレーを提供することを目的とする。   The present invention has been made in view of the problems as described above, and it is possible to form a thin and uniform film made of a thermosetting resin on the surface of the polishing pad without performing a replacement operation of the polishing pad. An object of the present invention is to provide a polishing pad surface treatment agent and a polishing pad spray.

上記目的を達成するために、請求項1記載の研磨パッド用表面処理剤は、熱硬化性樹脂を溶剤に分散させた分散液からなることを特徴としている。   In order to achieve the above object, the surface treatment agent for a polishing pad according to claim 1 is characterized by comprising a dispersion in which a thermosetting resin is dispersed in a solvent.

請求項2記載の研磨パッド用表面処理剤では、前記熱硬化性樹脂は、A硬度が70〜100の範囲内であることを特徴としている。   The surface treatment agent for a polishing pad according to claim 2 is characterized in that the thermosetting resin has an A hardness in the range of 70-100.

請求項3記載の研磨パッド用表面処理剤は、前記熱硬化性樹脂が、1液タイプの常温硬化型であることを特徴としている。   The surface treating agent for a polishing pad according to claim 3 is characterized in that the thermosetting resin is a one-component type room temperature curing type.

請求項4記載の研磨パッド用表面処理剤では、前記分散液は、20℃における粘度が1000cP以下であることを特徴としている。   The surface treatment agent for a polishing pad according to claim 4 is characterized in that the dispersion has a viscosity at 20 ° C. of 1000 cP or less.

請求項5記載の研磨パッド用表面処理剤は、前記熱硬化性樹脂は、エポキシ樹脂であることを特徴としている。   The surface treatment agent for a polishing pad according to claim 5 is characterized in that the thermosetting resin is an epoxy resin.

請求項6記載の研磨パッド用表面処理剤は、前記分散液に固体粒子を混合したことを特徴としている。また、この固体粒子としては、被研磨物の表面への傷を防止するために、研磨加工の際に使用される研磨スラリーに含まれる砥粒よりも硬度が柔らかいものを用いるのが好適であり、例えば、この条件に合う無機物粒子、金属粒子、有機物粒子等を用途に応じて用いる。   The surface treatment agent for a polishing pad according to claim 6 is characterized in that solid particles are mixed in the dispersion. Further, as this solid particle, in order to prevent scratches on the surface of the object to be polished, it is preferable to use a particle whose hardness is softer than the abrasive grains contained in the polishing slurry used in the polishing process. For example, inorganic particles, metal particles, organic particles, or the like that meet these conditions are used depending on the application.

請求項7記載の研磨パッド用スプレーは、前記研磨パッド用表面処理剤を噴霧可能な容器に充填してなることを特徴としている。   The spray for polishing pad according to claim 7 is characterized in that the surface treatment agent for polishing pad is filled in a sprayable container.

請求項8記載の研磨パッド用スプレーは、前記噴霧可能な容器に高圧ガスを充填してなることを特徴としている。   The spray for a polishing pad according to claim 8 is characterized in that the sprayable container is filled with a high-pressure gas.

本発明の研磨パッド用表面処理剤によれば、従来、研磨加工に用いられている研磨パッドの表面に熱硬化性樹脂を溶剤に分散させた分散液を塗布することにより、研磨パッドの表面にウレタン樹脂等の熱硬化性樹脂からなる膜を容易に形成することができる。従って、一度研磨パッドを研磨定盤上に貼り付けておけば、その後は研磨パッドの表面が磨耗したとしても、研磨パッドを貼り換えることなく、研磨パッドの表面に熱硬化性樹脂からなる膜を形成することにより、研磨加工を再度行うことが可能になるので、生産効率を向上させることができる。   According to the surface treating agent for a polishing pad of the present invention, by applying a dispersion liquid in which a thermosetting resin is dispersed in a solvent to the surface of the polishing pad conventionally used for polishing, the surface of the polishing pad is coated. A film made of a thermosetting resin such as urethane resin can be easily formed. Therefore, once the polishing pad is affixed to the polishing surface plate, a film made of a thermosetting resin is applied to the surface of the polishing pad without replacing the polishing pad even if the surface of the polishing pad is worn out thereafter. By forming, it becomes possible to perform the polishing process again, so that the production efficiency can be improved.

また、本発明によれば、A硬度が70〜100の範囲内にある熱硬化性樹脂を用いている。これにより、研磨パッドの表面に分散液が塗布されることにより、硬度が柔らかい熱硬化性樹脂の膜が形成されるので、研磨加工の際に研磨材が研磨パッドと被研磨物の間を滑ってしまうことを防止することができる。また、このような硬度が柔らかい熱硬化性樹脂を用いることにより、研磨加工を行うことによる磨耗を軽減することができる。   Moreover, according to this invention, A thermosetting resin in the range of 70-100 is used. As a result, since the dispersion liquid is applied to the surface of the polishing pad, a film of a thermosetting resin having a soft hardness is formed, so that the abrasive slips between the polishing pad and the object to be polished during the polishing process. Can be prevented. Further, by using a thermosetting resin having such a soft hardness, it is possible to reduce wear due to polishing.

また、本発明によれば、1液タイプの常温硬化(自然硬化)型の熱硬化性樹脂を用いている。これにより、研磨パッドの表面の熱硬化性樹脂を容易に硬化させることができるので、生産効率をより向上させることができるとともに、表面に熱硬化性樹脂の膜が形成される研磨パッドを製造する場合において、その研磨パッドの製造効率も向上させることができる。   Further, according to the present invention, a one-component type room temperature curing (natural curing) type thermosetting resin is used. Thereby, since the thermosetting resin on the surface of the polishing pad can be easily cured, the production efficiency can be further improved and a polishing pad in which a thermosetting resin film is formed on the surface is manufactured. In some cases, the manufacturing efficiency of the polishing pad can also be improved.

また、本発明によれば、分散液は、粘度が1000cP(センチポイズ)以下の低粘度であるので、研磨パッドの表面に容易に当該分散液を薄く均一に塗布することができる。これにより、研磨パッド表面の熱硬化性樹脂からなる膜は薄く均一に形成されるので、レンズ等のように研磨加工において形状精度が大事な要素となる非研磨物に対しても有効に用いることができる。   Further, according to the present invention, since the dispersion has a low viscosity of 1000 cP (centipoise) or less, the dispersion can be easily and thinly applied to the surface of the polishing pad. As a result, the film made of the thermosetting resin on the surface of the polishing pad is thinly and evenly formed, so it can be used effectively even for non-abrasive objects such as lenses, where shape accuracy is an important factor in polishing processing. Can do.

また、本発明によれば、熱硬化性樹脂として、エポキシ樹脂を用いている。これにより、研磨パッドの表面にはエポキシ樹脂からなる膜を形成することができる。従って、この研磨パッドを用いて、研磨加工を行う場合には、研磨パッド上に供給される研磨スラリーに含まれる研磨材(砥粒)がエポキシの官能基による化学的親和力によって一時的に研磨パッドの表面にしっかりと保持されるので、研磨能率を向上させることができる。   According to the present invention, an epoxy resin is used as the thermosetting resin. Thereby, a film made of an epoxy resin can be formed on the surface of the polishing pad. Therefore, when performing polishing using this polishing pad, the polishing material (abrasive grains) contained in the polishing slurry supplied onto the polishing pad is temporarily polished by the chemical affinity of the epoxy functional groups. Since it is firmly held on the surface, the polishing efficiency can be improved.

また、本発明によれば、分散液に固体粒子が混合されている。これにより、研磨パッドの表面に固体粒子が含まれる熱硬化性樹脂からなる膜が形成されるので、研磨加工を行う際に、被研磨物と研磨パッドの表面に隙間が設けられ、研磨スラリーが流入しやすくなり、研磨特性を向上させることができる。また、固体粒子によって研磨パッドの表面に凹凸を形成することができるので、砥粒の滞留性の向上、切りくず等の排出の促進、及び被研磨物との摩擦の低減等を図ることができる。   Moreover, according to the present invention, solid particles are mixed in the dispersion. As a result, a film made of a thermosetting resin containing solid particles is formed on the surface of the polishing pad, so that when polishing is performed, a gap is provided between the surface of the object to be polished and the polishing pad, and the polishing slurry is formed. It becomes easy to flow in and polishing characteristics can be improved. Further, since the unevenness can be formed on the surface of the polishing pad by the solid particles, it is possible to improve the retention of abrasive grains, promote the discharge of chips and the like, reduce the friction with the object to be polished, and the like. .

また、本発明の研磨パッド用スプレーによれば、従来、研磨加工に用いられている研磨パッドの表面に熱硬化性樹脂が分散された分散液からなる研磨パッド用表面処理剤を噴霧して、塗布することができるので、研磨パッドの表面に容易に熱硬化性樹脂からなる膜を形成することができる。   Further, according to the polishing pad spray of the present invention, conventionally, a polishing pad surface treatment agent comprising a dispersion liquid in which a thermosetting resin is dispersed is sprayed on the surface of the polishing pad used for polishing, Since it can be applied, a film made of a thermosetting resin can be easily formed on the surface of the polishing pad.

また、本発明の研磨パッド用スプレーによれば、従来の研磨パッドの表面に熱硬化性樹脂の膜を容易に形成することができるので、研磨パッドの製造メーカは、新たに設備投資等をする必要がなく、研磨パッドの表面に熱硬化性樹脂の膜が形成される研磨パッドの製造を行うことが可能になる。また、本発明の研磨パッド用スプレーを用いることにより、従来の研磨パッドの硬度を活かしたまま、非研磨物と接する表面だけを熱硬化樹脂にすることができるので、様々な用途の被研磨物に対応することができる。   Also, according to the polishing pad spray of the present invention, a thermosetting resin film can be easily formed on the surface of a conventional polishing pad, so that the polishing pad manufacturer newly invests in equipment. There is no need, and it becomes possible to manufacture a polishing pad in which a thermosetting resin film is formed on the surface of the polishing pad. In addition, by using the polishing pad spray of the present invention, the surface of the non-polishing object can be made into a thermosetting resin while utilizing the hardness of the conventional polishing pad. It can correspond to.

本発明に係る研磨パッド用スプレーを用いて、研磨パッドの表面にエポキシ樹脂(熱硬化性樹脂)を塗布する際の状態の一例を示す概略説明図である。It is a schematic explanatory drawing which shows an example of the state at the time of apply | coating an epoxy resin (thermosetting resin) to the surface of a polishing pad using the spray for polishing pads which concerns on this invention.

以下、本発明に係る研磨パッド用表面処理剤及び研磨パッド用スプレーの実施形態について、図面を参照しつつ説明する。本発明に係る研磨パッド用表面処理剤及び研磨パッド用スプレーは、主に従来の研磨パッドや繊維を絡合して構成した不織布の繊維基材、ポリ塩化ビニル等のプラスチックフィルムやベークライト等からなる基材等の表面に熱硬化性樹脂を溶剤に分散させた分散液を噴霧して塗布することにより、熱硬化性樹脂からなる膜を形成するためのものである。   Hereinafter, embodiments of a surface treatment agent for a polishing pad and a spray for a polishing pad according to the present invention will be described with reference to the drawings. The polishing pad surface treatment agent and polishing pad spray according to the present invention are mainly composed of a nonwoven fabric fiber base material formed by entanglement of conventional polishing pads and fibers, a plastic film such as polyvinyl chloride, bakelite, and the like. By spraying and applying a dispersion in which a thermosetting resin is dispersed in a solvent on the surface of a substrate or the like, a film made of a thermosetting resin is formed.

図1に示すように、研磨パッド用スプレー1は、内容物を噴霧可能な容器2に熱硬化性樹脂としてエポキシ樹脂を溶剤に分散させた分散液3からなる研磨パッド用表面処理剤(以下、単に分散液という)と共に高圧ガスを充填してなるものである。このような研磨パッド用スプレー1を用いて、エポキシ樹脂が分散された分散液3を基材4上に噴霧して塗布することにより、図1に示すようにエポキシ樹脂膜5を研磨パッド6の表面上に容易に形成することができる。   As shown in FIG. 1, a polishing pad spray 1 is a polishing pad surface treatment agent (hereinafter referred to as “a polishing pad surface treatment agent”) comprising a dispersion 3 in which an epoxy resin is dispersed as a thermosetting resin in a container 2 capable of spraying the contents. It is simply filled with high-pressure gas together with the dispersion). Using such a polishing pad spray 1, the dispersion liquid 3 in which the epoxy resin is dispersed is sprayed onto the substrate 4 to apply the epoxy resin film 5 to the polishing pad 6 as shown in FIG. It can be easily formed on the surface.

分散液3が内部に充填される容器2は、例えば、スチールやアルミニウム等の金属製の缶からなるものであり、高圧ガスにより圧力が加わった内部の分散液3を外部へと噴霧するためのノズル7が設けられたキャップ8が先端に備えられている。ノズル7には、内部から外部に通じる細い穴(不図示)が複数形成されており、分散液3がその穴を通って外部へと勢い良く押し出されることにより、分散液3が噴霧される。   The container 2 in which the dispersion liquid 3 is filled is made of, for example, a metal can such as steel or aluminum, and is used for spraying the internal dispersion liquid 3 pressurized by high-pressure gas to the outside. A cap 8 provided with a nozzle 7 is provided at the tip. The nozzle 7 has a plurality of thin holes (not shown) communicating from the inside to the outside, and the dispersion 3 is sprayed by vigorously pushing the dispersion 3 through the holes to the outside.

分散液3は、エポキシ樹脂を溶剤に分散させたものであり、この分散液3に用いるエポキシ樹脂としては、A硬度が70〜100の範囲内であるものを使用するのが好適である。このように硬度が柔らかいエポキシ樹脂を研磨パッド用スプレー1に用いることにより、図1に示すように、研磨パッド6の表面に形成されたエポキシ樹脂膜5は、研磨加工による磨耗を軽減することができるとともに、研磨加工の際に研磨材が研磨パッド6の表面のエポキシ樹脂膜5と被研磨物の間を滑ってしまうことを防止することができる。また、研磨材に対する一時的な保持力をより高めるために、エポキシ樹脂は、フリーの官能基が多くあるタイプのものを用いることが好適である。また、1液タイプの常温硬化(自然硬化)型のエポキシ樹脂を用いることにより、容易に硬化させることができるので、研磨パッド6の製造効率を向上させることができる。   The dispersion 3 is obtained by dispersing an epoxy resin in a solvent. As the epoxy resin used in the dispersion 3, it is preferable to use an A resin having an A hardness in the range of 70 to 100. By using such a soft epoxy resin for the polishing pad spray 1, as shown in FIG. 1, the epoxy resin film 5 formed on the surface of the polishing pad 6 can reduce wear due to polishing. In addition, it is possible to prevent the abrasive from slipping between the epoxy resin film 5 on the surface of the polishing pad 6 and the object to be polished during the polishing process. Moreover, in order to further increase the temporary holding force with respect to the abrasive, it is preferable to use an epoxy resin having a lot of free functional groups. Moreover, since it can harden | cure easily by using the 1 liquid type normal temperature hardening (natural hardening) type epoxy resin, the manufacturing efficiency of the polishing pad 6 can be improved.

エポキシ樹脂を分散させる溶剤としては、例えば、MEK(メチルエチルケトン)やIPA(イソプロピルアルコール)等の溶剤を用いることができるが、特にこれらに限定されるものではなく、従来公知の溶剤を適宜用いても良い。   As a solvent for dispersing the epoxy resin, for example, a solvent such as MEK (methyl ethyl ketone) or IPA (isopropyl alcohol) can be used. However, the solvent is not particularly limited, and a conventionally known solvent may be appropriately used. good.

また、エポキシ樹脂は低粘度のものを使用し、分散液3の20℃における粘度が1000cP(センチポイズ)以下となるように調製する。このように低粘度の分散液3を使用すれば、基材4の表面に当該分散液3を噴霧することによりエポキシ樹脂を薄く均一に塗布することが容易になる。従って、研磨パッド6には、表面が薄く均一に形成されたエポキシ樹脂膜5を形成することができるので、レンズ等の研磨加工において形状精度が大事な要素となる非研磨物に対しても有効な研磨パッドを製造することができる。   In addition, an epoxy resin having a low viscosity is used so that the viscosity of the dispersion 3 at 20 ° C. is 1000 cP (centipoise) or less. When the low-viscosity dispersion liquid 3 is used in this way, it becomes easy to apply the epoxy resin thinly and uniformly by spraying the dispersion liquid 3 on the surface of the substrate 4. Accordingly, since the epoxy resin film 5 having a thin and uniform surface can be formed on the polishing pad 6, it is also effective for non-polishing objects whose shape accuracy is an important factor in polishing processing of lenses and the like. A polishing pad can be manufactured.

次に、この研磨パッド用スプレー1を用いて、研磨パッド6の表面にエポキシ樹脂膜5を形成する方法の一例について説明する。   Next, an example of a method for forming the epoxy resin film 5 on the surface of the polishing pad 6 using the polishing pad spray 1 will be described.

図1に示すように、まずユーザは、研磨パッドスプレー1を用いて、エポキシ樹脂が分散されている分散液3を基材2の表面上に噴霧してエポキシ樹脂を略均一に塗布する。この際、エポキシ樹脂の塗布厚は、被研磨物の種類に対応する所望の厚さになるようにすれば良いが、研磨加工を行う際の研磨パッド6の寿命を考慮して、少なくとも10μm以上の厚みを有するように塗布することが好ましい。   As shown in FIG. 1, first, a user sprays a dispersion 3 in which an epoxy resin is dispersed on the surface of a substrate 2 using a polishing pad spray 1 to apply the epoxy resin substantially uniformly. At this time, the application thickness of the epoxy resin may be set to a desired thickness corresponding to the type of the object to be polished, but at least 10 μm or more in consideration of the life of the polishing pad 6 when performing the polishing process. It is preferable to apply so as to have a thickness of 5 mm.

そして、この基材2上に塗布されたエポキシ樹脂を硬化させる。例えば、光硬化性のエポキシ樹脂を用いる場合には、エポキシ樹脂を均一に塗布した後に、紫外線を照射することにより、エポキシ樹脂を硬化させる。これにより、基材2上に表面が均一な薄膜状のエポキシ樹脂膜3が形成された研磨パッド6が生成される。   And the epoxy resin apply | coated on this base material 2 is hardened. For example, in the case of using a photocurable epoxy resin, the epoxy resin is cured by irradiating ultraviolet rays after the epoxy resin is uniformly applied. Thereby, the polishing pad 6 in which the thin-film epoxy resin film 3 having a uniform surface is formed on the substrate 2 is generated.

また、このように研磨パッド6の表面にエポキシ樹脂膜5が形成されることにより、この研磨パッド6を用いて、研磨加工を行う場合には、研磨パッド6上に供給される研磨スラリーに含まれる酸化セリウム、酸化ジルコニウム、コロイダルシリカ等の研磨材(砥粒)がエポキシの官能基による化学的親和力によって一時的に研磨パッド6の表面にしっかりと保持される。従って、研磨材が研磨パッド6と被研磨物との相対的な回転に伴って被研磨物に引きずられて動いてしまうことを抑制することができるので、様々な被研磨物に対して研磨能率を向上させることができる。   In addition, since the epoxy resin film 5 is formed on the surface of the polishing pad 6 in this way, when polishing is performed using the polishing pad 6, it is included in the polishing slurry supplied onto the polishing pad 6. Abrasive materials (abrasive grains) such as cerium oxide, zirconium oxide, colloidal silica, etc., are temporarily held firmly on the surface of the polishing pad 6 by chemical affinity due to the functional groups of the epoxy. Therefore, the polishing material can be prevented from being dragged and moved by the object to be polished along with the relative rotation of the polishing pad 6 and the object to be polished. Can be improved.

尚、本実施形態では、エポキシ樹脂を溶剤に分散させた分散液3(研磨パッド用表面処理剤)を用いた例について説明しているが、分散液3はウレタン樹脂等の他の熱硬化性樹脂にエポキシ樹脂を加えて溶剤に分散させたものやエポキシ樹脂以外の熱硬化性樹脂を溶剤に分散させたもの等を用いることもできる。   In this embodiment, an example using the dispersion 3 (surface treatment agent for polishing pad) in which an epoxy resin is dispersed in a solvent is described. However, the dispersion 3 may be other thermosetting such as urethane resin. A resin in which an epoxy resin is added to a resin and dispersed in a solvent, a resin in which a thermosetting resin other than an epoxy resin is dispersed in a solvent, or the like can also be used.

また、このような分散液3に予め固体粒子を混合させたものを研磨パッド用表面処理剤として用いることもできる。尚、研磨加工の際に固体粒子によって被研磨物の表面に傷がつくことを防止するために、この固体粒子には、研磨加工の際に使用される研磨スラリーに含まれる砥粒よりも硬度が柔らかいものを用いるのが好適である。固体粒子としては、例えば、砥粒のような無機物粒子、ポリマー微粒子等の有機物粒子、又は金属粒子等を用途に応じて用いることができる。   Moreover, what mixed solid particle | grains previously with such a dispersion liquid 3 can also be used as a surface treating agent for polishing pads. In order to prevent the surface of the workpiece from being scratched by the solid particles during the polishing process, the solid particles have a hardness higher than that of the abrasive grains contained in the polishing slurry used during the polishing process. It is preferable to use a soft material. As the solid particles, for example, inorganic particles such as abrasive grains, organic particles such as polymer fine particles, metal particles, or the like can be used depending on the application.

このような固体粒子を分散液3に混合させた研磨パッド用表面処理剤を用いることにより、研磨パッドの表面に固体粒子が含まれる熱硬化性樹脂からなる膜が形成されるので、研磨加工を行う際に、被研磨物と研磨パッドの表面に隙間が設けられ、研磨スラリーが流入しやすくなり、研磨特性を向上させることができる。また、固体粒子によって研磨パッドの表面に凹凸を形成することができるので、砥粒の滞留性の向上、切りくず等の排出の促進、及び被研磨物との摩擦の低減等を図ることができる。また、固体粒子として金属酸化物粒子のような無機物粒子を用いた場合には、更に酸化作用や切りくずの吸着等の効果を図ることができる。また、固体粒子としてポリマー微粒子を用いた場合には、潤滑性を向上させることができる。また、固体粒子として金属粒子を用いた場合には、触媒作用及び還元作用を図ることができる。以上のように、分散液3に混合させる固体粒子の種類によって、砥粒の滞留性の向上、切りくず等の排出の促進、及び被研磨物との摩擦の低減等以外に、固体粒子の材質に基づく効果も付加させることができるので、研磨加工時の要求に応じて、これらの固体粒子を選択することが好ましい。   By using a surface treatment agent for a polishing pad in which such solid particles are mixed with the dispersion 3, a film made of a thermosetting resin containing solid particles is formed on the surface of the polishing pad. When performing, a gap is provided between the surface of the object to be polished and the polishing pad so that the polishing slurry can easily flow in and the polishing characteristics can be improved. Further, since the unevenness can be formed on the surface of the polishing pad by the solid particles, it is possible to improve the retention of abrasive grains, promote the discharge of chips and the like, reduce the friction with the object to be polished, and the like. . In addition, when inorganic particles such as metal oxide particles are used as the solid particles, effects such as oxidation action and chip adsorption can be further achieved. In addition, when polymer fine particles are used as the solid particles, the lubricity can be improved. Moreover, when metal particles are used as the solid particles, a catalytic action and a reducing action can be achieved. As described above, depending on the type of solid particles mixed in the dispersion 3, the material of the solid particles can be used in addition to improving the retention of abrasive grains, promoting the discharge of chips and the like, and reducing the friction with the object to be polished. Therefore, it is preferable to select these solid particles according to the requirements at the time of polishing.

また、その他に、プラスティック等の繊維を分散液3に混合させたものを研磨パッド用表面処理剤として用いることもできる。このような繊維を分散液3に混合させた研磨パッド用表面処理剤を用いることにより、研磨パッドの表面に繊維が含まれる熱硬化性樹脂からなる膜が形成され、この繊維によって研磨パッドの表面に凹凸が形成されるので、上記の固体粒子を混合させた場合と同様に砥粒の滞留性の向上、切りくず等の排出の促進、及び被研磨物との摩擦の低減等の効果を図ることができる。   In addition, a mixture of fibers such as plastic in the dispersion 3 can be used as a surface treatment agent for a polishing pad. By using a surface treatment agent for a polishing pad in which such a fiber is mixed with the dispersion liquid 3, a film made of a thermosetting resin containing the fiber is formed on the surface of the polishing pad, and the surface of the polishing pad is formed by the fiber. As in the case where the above solid particles are mixed, the effect of improving the retention of abrasive grains, promoting the discharge of chips and the like, and reducing the friction with the object to be polished is achieved. be able to.

また、デンプン、食塩、砂糖等の所謂気孔材を分散液3に混合させたものを研磨パッド用表面処理剤として用いても良い。このような気孔材を混合させた研磨パッド用表面処理剤を用いた場合には、研磨パッドの表面には気孔材が含まれる熱硬化性樹脂からなる膜が形成されることになる。従って、水等の気孔材のみを溶出する物質を用いて、この研磨パッドの表面を洗い流すことにより、研磨パッドの表面には複数の気孔が形成されるので、研磨加工を行う際に用いられる研磨スラリーに含まれる砥粒に対する構造的なグリップ力を得ることができる。   In addition, a so-called pore material such as starch, salt or sugar mixed with the dispersion 3 may be used as a surface treatment agent for a polishing pad. When the surface treatment agent for a polishing pad mixed with such a pore material is used, a film made of a thermosetting resin containing the pore material is formed on the surface of the polishing pad. Therefore, a plurality of pores are formed on the surface of the polishing pad by rinsing the surface of the polishing pad using a substance that elutes only a pore material such as water, so that the polishing used for polishing is performed. A structural grip force for abrasive grains contained in the slurry can be obtained.

また、本発明に係る研磨パッド用スプレー1によりエポキシ樹脂が表面に塗布される研磨パッドや基材は、特に限定されるものではなく、非研磨物の種類に応じて、従来から使用されているものに適用することができる。   Moreover, the polishing pad and the base material on which the epoxy resin is applied to the surface by the polishing pad spray 1 according to the present invention are not particularly limited, and are conventionally used according to the type of non-polished material. Can be applied to things.

また、本実施形態に係る研磨パッド用スプレー1では、エポキシ樹脂を溶剤に分散させた分散液3と共に高圧ガスを噴霧可能な容器2に充填した例を用いて説明しているが、本発明に係る研磨パッド用スプレー1は、このような形態に限定されるものではなく、例えば、高圧ガスによる圧力を利用する代わりに、電動ポンプによる電動スプレータイプのものや、外部の空気圧を利用したエアスプレータイプのもの等、容器2内に充填された分散液3を外部へと噴霧可能なものであれば良い。また、容器2も金属製の缶等に限定されるものではなく、プラスティック容器やその他の容器を利用しても良い。   In addition, the polishing pad spray 1 according to the present embodiment is described using an example in which a container 2 that can be sprayed with a high-pressure gas together with a dispersion 3 in which an epoxy resin is dispersed in a solvent is used. The polishing pad spray 1 is not limited to such a form. For example, instead of using the pressure of a high-pressure gas, an electric spray type using an electric pump or an air spray using an external air pressure is used. What is necessary is just to be able to spray the dispersion liquid 3 with which it filled in the container 2 outside, such as a type thing. The container 2 is not limited to a metal can or the like, and a plastic container or another container may be used.

尚、本発明の実施の形態は上述の形態に限るものではなく、本発明の思想の範囲を逸脱しない範囲で適宜変更することができる。   The embodiment of the present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the scope of the idea of the present invention.

本発明に係る研磨パッド用表面処理剤及び研磨パッド用スプレーは、研磨パッドの表面に熱硬化性樹脂の膜を容易に形成するための表面処理剤及びスプレーとして有効に利用することができる。   The surface treatment agent for polishing pad and the spray for polishing pad according to the present invention can be effectively used as a surface treatment agent and a spray for easily forming a film of a thermosetting resin on the surface of the polishing pad.

1 研磨パッド用スプレー
2 容器
3 分散液(研磨パッド用表面処理剤)
4 基材
5 エポキシ樹脂膜
6 研磨パッド
1 Polishing pad spray 2 Container 3 Dispersion liquid (Polishing pad surface treatment agent)
4 Base material 5 Epoxy resin film 6 Polishing pad

Claims (8)

熱硬化性樹脂を溶剤に分散させた分散液からなることを特徴とする研磨パッド用表面処理剤。   A surface treatment agent for a polishing pad, comprising a dispersion in which a thermosetting resin is dispersed in a solvent. 前記熱硬化性樹脂は、A硬度が70〜100の範囲内であることを特徴とする請求項1記載の研磨パッド用表面処理剤。   The surface treatment agent for a polishing pad according to claim 1, wherein the thermosetting resin has an A hardness in the range of 70 to 100. 前記熱硬化性樹脂は、1液タイプの常温硬化型であることを特徴とする請求項1又は2記載の研磨パッド用表面処理剤。   The surface treatment agent for a polishing pad according to claim 1 or 2, wherein the thermosetting resin is a one-pack type room temperature curing type. 前記分散液は、20℃における粘度が1000cP以下であることを特徴とする請求項1〜3のいずれかに記載の研磨パッド用表面処理剤。   The surface treatment agent for a polishing pad according to claim 1, wherein the dispersion has a viscosity at 20 ° C. of 1000 cP or less. 前記熱硬化性樹脂は、エポキシ樹脂であることを特徴とする請求項1〜4のいずれかに記載の研磨パッド用表面処理剤。   The surface treatment agent for a polishing pad according to claim 1, wherein the thermosetting resin is an epoxy resin. 前記分散液に固体粒子を混合したことを特徴とする請求項1〜5のいずれかに記載の研磨パッド用表面処理剤。   The surface treatment agent for a polishing pad according to claim 1, wherein solid particles are mixed in the dispersion. 請求項1〜6のいずれかに記載の研磨パッド用表面処理剤を噴霧可能な容器に充填してなることを特徴とする研磨パッド用スプレー。   A spray for polishing pad, comprising a sprayable container filled with the surface treatment agent for polishing pad according to claim 1. 前記噴霧可能な容器に高圧ガスを充填してなることを特徴とする請求項7記載の研磨パッド用スプレー。   The polishing pad spray according to claim 7, wherein the sprayable container is filled with a high-pressure gas.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016140938A (en) * 2015-01-30 2016-08-08 富士紡ホールディングス株式会社 Polishing pad and method for manufacturing polishing pad

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Publication number Priority date Publication date Assignee Title
JPH05316904A (en) * 1992-05-18 1993-12-03 Shimano Inc Fishing rod
JPH08253976A (en) * 1995-03-15 1996-10-01 Nisshinbo Ind Inc Thermal insulation structural body having flame resistance for building and method thereof
JP2000061817A (en) * 1998-08-24 2000-02-29 Nikon Corp Polishing pad
JP2001150589A (en) * 1999-11-30 2001-06-05 Kawasaki Steel Corp Coating zinc-base plated steel pipe and its manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05316904A (en) * 1992-05-18 1993-12-03 Shimano Inc Fishing rod
JPH08253976A (en) * 1995-03-15 1996-10-01 Nisshinbo Ind Inc Thermal insulation structural body having flame resistance for building and method thereof
JP2000061817A (en) * 1998-08-24 2000-02-29 Nikon Corp Polishing pad
JP2001150589A (en) * 1999-11-30 2001-06-05 Kawasaki Steel Corp Coating zinc-base plated steel pipe and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016140938A (en) * 2015-01-30 2016-08-08 富士紡ホールディングス株式会社 Polishing pad and method for manufacturing polishing pad

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