JP2012099555A - Light-emitting device for backlight - Google Patents

Light-emitting device for backlight Download PDF

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Publication number
JP2012099555A
JP2012099555A JP2010243928A JP2010243928A JP2012099555A JP 2012099555 A JP2012099555 A JP 2012099555A JP 2010243928 A JP2010243928 A JP 2010243928A JP 2010243928 A JP2010243928 A JP 2010243928A JP 2012099555 A JP2012099555 A JP 2012099555A
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plating
light emitting
backlight
light
emitting elements
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Inventor
Takeshi Sakurai
健 櫻井
Shinichi Funaki
真一 船木
Shunroku Sukumoda
俊緑 すくも田
Taku Omura
卓 大村
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Mitsubishi Shindoh Co Ltd
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Mitsubishi Shindoh Co Ltd
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Priority to JP2010243928A priority Critical patent/JP2012099555A/en
Priority to TW099139788A priority patent/TW201217689A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate

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  • Planar Illumination Modules (AREA)
  • Led Device Packages (AREA)
  • Liquid Crystal (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a light-emitting device for a backlight having a good heat dissipation property and an excellent long-term durability, which can be manufactured at a low cost.SOLUTION: The light-emitting device for a backlight comprises: a deformed cross section plate of copper or copper alloy having convex and concave portions, and a thermal conductivity of 150 W/(mK) or larger with its surface covered with one selected from a group consisting of Sn plating, Ni plating, Ag plating, and Ag-Sn alloy plating, which have degrees of brilliance of 80-110%; a plurality of light-emitting elements directly mounted on the bottom face of the concave portion of the deformed cross section plate; cathode and anode patterning circuits formed on the bottom face of the concave portion; a wiring line for connecting between the light-emitting elements in series, a wiring line for connecting the first element of the series-connected light-emitting elements to the anode patterning circuit, and a wiring line for connecting the last light-emitting element to the cathode patterning circuit; and a transparent resin for sealing the concave portion to cover the plurality of light-emitting elements.

Description

本発明は、バックライト用発光装置に関し、特に詳しくは、耐久性と放熱性に優れたCOB型のバックライト用発光装置に関する。   The present invention relates to a backlight light-emitting device, and more particularly to a COB-type backlight light-emitting device excellent in durability and heat dissipation.

COB型のバックライト装置として、樹脂基板に複数のLED素子を直接的に搭載するものが知られている。この種のバックライト装置では、基板としてガラスエポキシ樹脂(熱伝導率:0.2〜0.3W/mK)を用い、基板に導電性金属からなる電極パターンを形成する。バックライト装置を利用する表示装置では、基板のLED素子の搭載面と対向して表示部を設けるため、LED素子から基板側へ入射した光を基板にて反射させる必要がある。そこで、基板表面を白色樹脂のソルダーレジスト層により被覆し、基板表面の反射率を高めたものが一般的である。しかしながら、樹脂基板を用いたCOB型のバックライト装置は、基板の熱伝導率が低く、LED素子にて生じた熱が装置内にこもり易く、これにより、長期の使用に際し、白色のソルダーレジスト層が黄変するおそれがあった。   As a COB type backlight device, one that directly mounts a plurality of LED elements on a resin substrate is known. In this type of backlight device, a glass epoxy resin (thermal conductivity: 0.2 to 0.3 W / mK) is used as a substrate, and an electrode pattern made of a conductive metal is formed on the substrate. In a display device using a backlight device, since a display portion is provided to face the mounting surface of the LED element of the substrate, it is necessary to reflect light incident from the LED element to the substrate side on the substrate. Therefore, the substrate surface is generally covered with a white resin solder resist layer to increase the reflectance of the substrate surface. However, the COB type backlight device using a resin substrate has a low thermal conductivity of the substrate, and the heat generated in the LED element is likely to be trapped in the device. There was a risk of yellowing.

また、透明なガラス基板上にITOからなる透明導電膜を形成したLED表示装置が
提案されており、このLED表示装置により、LEDチップ実装部と基板側のメタライズ部以外は透明に保つことができ、かつ表示品位を向上させることができるが、この様なLED表示装置は、基板が透明であるため、LED素子から発せられた光は基板を透過してしまい、基板の搭載面に対向する表示部へ的確に光を照射することができず、バックライト装置としての性能は低下する傾向がある。
In addition, an LED display device in which a transparent conductive film made of ITO is formed on a transparent glass substrate has been proposed. With this LED display device, the LED chip mounting portion and the metallized portion on the substrate side can be kept transparent. However, since such a LED display device has a transparent substrate, the light emitted from the LED element is transmitted through the substrate and is opposed to the mounting surface of the substrate. It is impossible to irradiate light accurately to the part, and the performance as a backlight device tends to be lowered.

これらの対策として、基板の熱伝導率を向上させ、長期の使用に際しての劣化を抑制することのできるバックライト装置及びこれを備えた表示装置として次の特許文献がある。   As these measures, there is the following patent document as a backlight device capable of improving the thermal conductivity of a substrate and suppressing deterioration during long-term use and a display device equipped with the backlight device.

特許文献1では、各LED素子が搭載される基板をガラスとし、各LED素子にて生じた熱が基板から効率良く放散されるようにするとともに、ガラスに反射性を持たせることにより各LED素子から発せられた光が基板を透過しないようにし、基板のLED素子の搭載面と対向する表示部へ的確に光を照射するようにしたことを特徴とする基板の熱伝導率を向上させ、長期の使用に際しての劣化を抑制することのできるバックライト装置及びこれを備えた表示装置を開示する。   In Patent Document 1, the substrate on which each LED element is mounted is made of glass, and heat generated in each LED element is efficiently dissipated from the substrate, and each LED element is made reflective by making the glass reflective. The heat conductivity of the substrate is improved by preventing the light emitted from the substrate from being transmitted through the substrate, and irradiating the display portion facing the LED element mounting surface of the substrate accurately. Disclosed is a backlight device capable of suppressing deterioration during use and a display device including the backlight device.

特許文献2では、側面と樹脂および/または導電性金属から形成された底面とを有する凹部に複数のLEDチップが搭載され、該凹部が透光性樹脂で封止されているLEDパッケージにおいて、該LEDチップ各々を隔てる障壁が該底面と同一の樹脂または同一の導電性金属で一体成型されていることを特徴とする3イン1パッケージやマルチチップパッケージにおける出力ロスを低減する低コストのLEDパッケージが開示されている。   In Patent Document 2, in an LED package in which a plurality of LED chips are mounted in a recess having a side surface and a bottom surface formed of a resin and / or a conductive metal, and the recess is sealed with a translucent resin, A low-cost LED package that reduces output loss in a 3-in-1 package or a multi-chip package, in which a barrier separating each LED chip is integrally formed of the same resin or the same conductive metal as the bottom surface It is disclosed.

特許文献3では、LEDチップ収納凹部の銀めっきの表面が酸化・硫化し難く、放熱性が良好なLED発光装置が開示されている。アルミ板にアルマイト処理した基台の上に、上面に所定の導電パターンを形成し、LEDチップをダイボンドする領域を有する開口部を備えたプリント基板を貼付し、プリント基板の開口部に位置する基台の上にLEDチップを透明ペーストでダイボンドし、LEDチップの上面電極とプリント基板上に形成した導電パターンとを金線でワイヤーボンディングし、プリント基板の外周上面に、LEDチップを覆うように外周部に封止樹脂注入孔を有するシリコーン樹脂よりなるレンズ付ケースを貼付し、レンズ付ケースに設けた封止樹脂注入孔よりゴム/ゲル系シリコーン樹脂よりなる封止樹脂を注入してLEDチップを封止することにより製造される。   Patent Document 3 discloses an LED light-emitting device in which the surface of the silver plating in the LED chip housing recess is not easily oxidized or sulfided and has good heat dissipation. A printed circuit board with an opening having a predetermined conductive pattern formed on the upper surface and an area for die-bonding the LED chip is affixed on a base anodized on an aluminum plate, and a base located at the opening of the printed board. The LED chip is die-bonded with a transparent paste on the base, the upper electrode of the LED chip and the conductive pattern formed on the printed circuit board are wire-bonded with a gold wire, and the outer peripheral surface of the printed circuit board covers the LED chip Attach a case with a lens made of silicone resin having a sealing resin injection hole to the part, and inject a sealing resin made of rubber / gel silicone resin from the sealing resin injection hole provided in the case with lens to attach the LED chip. Manufactured by sealing.

特許文献4では、半導体のパッケージの放熱性および製造コストを改善する構造および製造方法として、金属基板の一部分に半導体がダイボンディングされ、他の部分に半導体の電極がボンディングされ、両部分は分割されているが封止樹脂により相互に連結された構造を有し、かつ金属基板の両部分は電極端子ともなっている構造が開示されている。集合金属基板上の所定位置に多数の半導体をダイボンディングし、半導体の各々の電極と金属板上の他の所定位置とをそれぞれワイヤーボンディングし、半導体を封止する樹脂を基板全面に充填しかつ硬化させた後、集合金属基板の各所定領域と各他の所定領域とを封止樹脂を残して分割する加工と集合金属基板および封止樹脂をデバイス毎に切断分離する加工を行い製造される。   In Patent Document 4, as a structure and manufacturing method for improving the heat dissipation and manufacturing cost of a semiconductor package, a semiconductor is die-bonded to a part of a metal substrate, a semiconductor electrode is bonded to another part, and both parts are divided. However, there is disclosed a structure in which the metal substrates are connected to each other by a sealing resin and both portions of the metal substrate are also electrode terminals. A large number of semiconductors are die-bonded at predetermined positions on the collective metal substrate, each electrode of the semiconductor and another predetermined position on the metal plate are wire-bonded, and a resin for sealing the semiconductor is filled over the entire surface of the substrate, and After being cured, each predetermined region and each other predetermined region of the collective metal substrate are manufactured by performing a process of dividing the collective metal substrate and the seal resin for each device by separating and separating the collective metal substrate and the seal resin for each device. .

特開平2009−170847号公報JP 2009-170847 A 特開平2008−41699号公報JP 2008-41699 A 特開平2007−129053号公報Japanese Patent Laid-Open No. 2007-129053 特開平2000−77725号公報Japanese Unexamined Patent Publication No. 2000-77725

上述の特許文献に開示されるバックライト装置は、放熱性及び耐久性が充分とは言えず、製造コストも安価ではなかった。
本発明では、放熱性が良好で長期使用時の耐久性に優れた製造コストの安価なバックライト用発光装置を提供する。
The backlight device disclosed in the above-mentioned patent document cannot be said to have sufficient heat dissipation and durability, and the manufacturing cost is not low.
The present invention provides a light-emitting device for a backlight that is excellent in heat dissipation and excellent in durability during long-term use and at a low manufacturing cost.

本発明者らは鋭意検討の結果、放熱性が良好で長期使用時の耐久性に優れた製造コストの安価なバックライト用発光装置を提供するには、次の事項が重要であることを見出した。
(1)熱伝導率を向上させるには、LEDチップが直接搭載される基板として、熱伝導率が150W/(m・K)以上である銅或いは銅合金板を使用する。
(2)耐久性、特に樹脂封止される反射層の耐久性を向上させるには、反射層として、銅或いは銅合金板の表面に高耐久及び耐熱性で光沢度が80〜110%であるSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきを施す。
(3)構造を簡略化し製造コストを下げ表示部へ的確に光を照射するには、基板上に後から樹脂などにより反射部を形成するのではなく、銅或いは銅合金板の片側に凸凹を有する異形断面形状として反射部を一体成形し、その表面に光沢度が80〜110%であるSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきを施し、凹部の底面に複数個の発光素子を直接的に搭載し、凹部の側面を反射部として使用して、その凹部内を透明樹脂で封止する必要がある。更に、銅或いは銅合金異形断面板の裏側の平板部を電子機器部内のバックライト装置固定部に直接接着或いはビス留めしてバックライト用発光装置として使用することにより、取り扱いが非常に容易となる。
As a result of intensive studies, the present inventors have found that the following matters are important in order to provide an inexpensive backlight light-emitting device with excellent heat dissipation and durability during long-term use and at a low manufacturing cost. It was.
(1) To improve the thermal conductivity, a copper or copper alloy plate having a thermal conductivity of 150 W / (m · K) or more is used as a substrate on which the LED chip is directly mounted.
(2) To improve the durability, particularly the durability of the reflective layer sealed with resin, the surface of the copper or copper alloy plate as the reflective layer has high durability and heat resistance, and a glossiness of 80 to 110%. A kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag—Sn alloy plating is applied.
(3) In order to simplify the structure and reduce the manufacturing cost and accurately irradiate the display part with light, the reflective part is not formed later on the substrate with a resin or the like, but an unevenness is formed on one side of the copper or copper alloy plate. The reflective portion is integrally formed as a deformed cross-sectional shape, and the surface thereof is subjected to a kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag—Sn alloy plating with a glossiness of 80 to 110%. It is necessary to directly mount a plurality of light emitting elements on the bottom surface of the concave portion, use the side surface of the concave portion as a reflecting portion, and seal the inside of the concave portion with a transparent resin. Furthermore, the flat plate portion on the back side of the copper or copper alloy deformed cross-section plate is directly bonded or screwed to the backlight device fixing portion in the electronic device portion and used as a light emitting device for the backlight, so that handling becomes very easy. .

即ち、本発明のバックライト用発光装置は、光沢度が80〜110%であるSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきが表面に施された熱伝導率が150W/(m・K)以上である凸凹部を有する銅或いは銅合金異形断面板と、当該異形断面板の凹部の底面に直接実装された複数個の発光素子と、当該凹部の底面に形成されたカソードパターニング回路およびアノードパターニング回路と、当該複数個の発光素子間を直列接続する配線と、当該直列接続された複数個の発光素子の先頭の素子をアノードパターニング回路に接続する配線および末端の素子をカソードパターニング回路に接続する配線と、当該複数個の発光素子を覆うように前記凹部内を封止する透明樹脂とから構成されたことを特徴とする。   That is, the light emitting device for backlight according to the present invention is provided with a kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag—Sn alloy plating having a glossiness of 80 to 110% on the surface. A copper or copper alloy irregular cross-section plate having a convex / concave portion having a thermal conductivity of 150 W / (m · K) or more, a plurality of light-emitting elements mounted directly on the bottom surface of the concave portion of the irregular cross-section plate, and the concave portion The cathode patterning circuit and the anode patterning circuit formed on the bottom surface of the substrate, the wiring for connecting the plurality of light emitting elements in series, and the head element of the plurality of light emitting elements connected in series are connected to the anode patterning circuit. A wiring for connecting the wiring and the terminal element to the cathode patterning circuit, and a transparent resin for sealing the inside of the recess so as to cover the plurality of light emitting elements. Characterized in that made the.

本発明において、銅或いは銅合金断面条材の表面に施されるめっきは、耐熱性、樹脂に対する耐硫化性の観点から、Snめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきであり、反射率の観点から、その光沢度は80〜110%である。光沢度が80%未満では反射効果が不足し、110%を超えると反射効果が飽和して無駄となる。めっきの厚みは0.2〜3.0μmが好ましく、0.2μm未満では耐熱性、耐硫化性が不足し、3.0μmを超えると効果が飽和して高価なAgを使用するためコスト的に無駄となる。
また、銅或いは銅合金断面条材の熱伝導率は、150W/(m・K)未満では、効果が充分ではない。ただし、350W/(m・K)にまで高めることは製造コストの観点から無駄であり、実用上は160〜300W/(m・K)とすることが好ましい。
In the present invention, the plating applied to the surface of the copper or copper alloy cross-section strip is from the group consisting of Sn plating, Ni plating, Ag plating, and Ag-Sn alloy plating from the viewpoint of heat resistance and sulfidation resistance to the resin. It is a kind of selected plating, and its glossiness is 80 to 110% from the viewpoint of reflectance. When the glossiness is less than 80%, the reflection effect is insufficient, and when it exceeds 110%, the reflection effect is saturated and wasted. The thickness of the plating is preferably 0.2 to 3.0 μm. If the thickness is less than 0.2 μm, the heat resistance and sulfidation resistance are insufficient, and if it exceeds 3.0 μm, the effect is saturated and expensive Ag is used, which is expensive. It becomes useless.
Further, if the thermal conductivity of the copper or copper alloy cross section is less than 150 W / (m · K), the effect is not sufficient. However, increasing to 350 W / (m · K) is useless from the viewpoint of manufacturing cost, and is practically preferably 160 to 300 W / (m · K).

更に、本発明のバックライト用発光装置は、当該銅合金異形断面板がFe;1.5〜2.6質量%、P;0.008〜0.15質量%及びZn;0.01〜0.5質量%を含有し、残部がCu及び不可避不純物からなり組成を有し、表面の算術平均粗さRaが0.02〜0.05μmであり、最大高さRzが0.20〜0.40μmであり、二乗平均平方根粗さRqと最大高さRzの比Rq/Rzが0.10〜0.25であることを特徴とする。   Furthermore, in the light emitting device for backlight of the present invention, the copper alloy deformed cross-sectional plate is Fe; 1.5 to 2.6 mass%, P; 0.008 to 0.15 mass%, and Zn; 0.01 to 0 0.5% by mass, the balance being composed of Cu and inevitable impurities, the composition having an arithmetic average roughness Ra of 0.02-0.05 μm, and a maximum height Rz of 0.20-0. The ratio Rq / Rz of the root mean square roughness Rq to the maximum height Rz is 0.10 to 0.25.

本組成及び表面粗さを有する銅合金異形断面板は、耐熱性、耐久性、放熱性のバランスが優れており、これを使用することにより、高温下での機械的強度が増しバックライト装置の放熱性が向上する。
また、銅合金異形断面板の強度を向上させるために、本組成に加えNi;0.003〜0.5質量%及び又はSn;0.003〜0.5質量%を含有していても良い。
また、表面の算術平均粗さRaが0.02〜0.05μmであり、最大高さRzが0.20〜0.40μmであり、二乗平均平方根粗さRqと最大高さRzの比Rq/Rzが0.10〜0.25であると、その表面に直接搭載されるLEDとの接触熱抵抗が小さくなり、放熱性が更に増す。Raが0.02μm未満、或いは、Rzが0.20μm未満、或いは、Rq/Rzが0.10未満では効果が飽和し、製造上特殊な表面処理が必要となりコストが増加して無駄である。Raが0.05μmを超えると、或いは、Rzが0.40μmを超えると、或いは、Rq/Rzが0.25を超えると効果が不足する。
The copper alloy irregular cross-section plate having this composition and surface roughness has an excellent balance of heat resistance, durability and heat dissipation, and by using this, the mechanical strength at high temperature is increased and the backlight device has Heat dissipation is improved.
Moreover, in order to improve the intensity | strength of a copper alloy irregular cross-section board, in addition to this composition, Ni; 0.003-0.5 mass% and / or Sn; You may contain 0.003-0.5 mass%. .
The arithmetic average roughness Ra of the surface is 0.02 to 0.05 μm, the maximum height Rz is 0.20 to 0.40 μm, and the ratio Rq / of the root mean square roughness Rq to the maximum height Rz When Rz is 0.10 to 0.25, the contact thermal resistance with the LED mounted directly on the surface is reduced, and the heat dissipation is further increased. If Ra is less than 0.02 μm, Rz is less than 0.20 μm, or Rq / Rz is less than 0.10, the effect is saturated, and a special surface treatment is required for manufacturing, which increases costs and is useless. When Ra exceeds 0.05 μm, Rz exceeds 0.40 μm, or Rq / Rz exceeds 0.25, the effect is insufficient.

更に、本発明の液晶を使用する電子或いは電気機器は、本発明のバックライト用発光装置が機器内のバックライト発光装置固定部に接着或いはビス止めにより直接固定されたことを特徴とする。   Furthermore, the electronic or electrical equipment using the liquid crystal of the present invention is characterized in that the backlight light emitting device of the present invention is directly fixed to the backlight light emitting device fixing portion in the device by bonding or screwing.

本発明のバックライト用発光装置は、銅或いは銅合金異形断面板の裏側が平板部であり、液晶を使用する電子或いは電気機器部内のバックライト装置固定部に、この平板部を直接的に接着或いはビス留めすることにより、複雑な取り付け機構なしに簡単に取り付けることが出来る。   In the light emitting device for backlight according to the present invention, the back side of the copper or copper alloy deformed cross section plate is a flat plate portion, and this flat plate portion is directly bonded to the backlight device fixing portion in the electronic or electric equipment portion using liquid crystal. Alternatively, by screwing, it can be easily mounted without a complicated mounting mechanism.

本発明により、放熱性が良好で長期使用時の耐久性に優れた製造コストの安価なバックライト用発光装置を提供することができる。   According to the present invention, it is possible to provide a light-emitting device for a backlight having good heat dissipation and excellent durability during long-term use and at a low manufacturing cost.

本発明のバックライト用発光装置の斜視図である。It is a perspective view of the light emitting device for backlight of the present invention.

図1を参照に本発明のバックライト用発光装置の一実施形態を説明する。
本発明のバックライト用発光装置1は、光沢度が80〜110%であるSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきが表面に施された熱伝導率が150W/(m・K)以上である凸凹部を有する銅或いは銅合金異形断面板2と、銅或いは銅合金異形断面板2の凹部3の底面に直接実装(COB)された複数個の発光素子4,4a,4bと、凹部3の内底面に形成されたカソードパターニング回路5bおよびアノードパターニング回路5aと、複数個の発光素子4,4a、4b間を直列接続する配線6と、直列接続された複数個の発光素子の先頭の素子4aをアノードパターニング回路5aに接続する配線7aおよび末端の素子4bをカソードパターニング5b回路に接続する配線7bと、複数個の発光素子4,4a,4bを覆うように凹部3内を封止する透明樹脂8とから構成される。カソードパターニング回路5bおよびアノードパターニング回路5aは、図示されていない電源と接続されている。
An embodiment of a light emitting device for backlight according to the present invention will be described with reference to FIG.
The light emitting device for backlight 1 of the present invention has a surface on which a kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag—Sn alloy plating with a glossiness of 80 to 110% is applied. A copper or copper alloy modified cross-section plate 2 having a convex and concave portion having a thermal conductivity of 150 W / (m · K) or more, and a plurality of components mounted directly (COB) on the bottom surface of the concave portion 3 of the copper or copper alloy modified cross-sectional plate 2 A plurality of light emitting elements 4, 4 a, 4 b, a cathode patterning circuit 5 b and an anode patterning circuit 5 a formed on the inner bottom surface of the recess 3, a wiring 6 for connecting a plurality of light emitting elements 4, 4 a, 4 b in series, A wiring 7a for connecting the leading element 4a of the plurality of light emitting elements connected in series to the anode patterning circuit 5a and a wiring for connecting the terminal element 4b to the cathode patterning 5b circuit. 7b and a plurality of light emitting elements 4, 4a, comprised of a transparent resin 8 which seals the inside recess 3 so as to cover the 4b. The cathode patterning circuit 5b and the anode patterning circuit 5a are connected to a power source (not shown).

銅或いは銅合金異形断面板2の素材となる銅或いは銅合金は、放熱性の観点から、熱伝導率が160〜300W/(m・K)であることがより好ましく、耐熱性、耐久性、放熱性のバランスの観点より、特にFe;1.5〜2.6質量%、P;0.008〜0.15質量%及びZn;0.01〜0.5質量%を含有し、残部がCu及び不可避不純物からなる組成を有し、表面の算術平均粗さRaが0.02〜0.05μmであり、最大高さRzが0.20〜0.40μmであり、二乗平均平方根粗さRqと最大高さRzの比Rq/Rzが0.10〜0.25であることが好ましい。また、強度を向上させるために、本組成に加えNi;0.003〜0.5質量%及び又はSn;0.003〜0.5質量%を含有しても良い。   From the viewpoint of heat dissipation, the copper or copper alloy that is the material of the copper or copper alloy modified cross-section plate 2 preferably has a thermal conductivity of 160 to 300 W / (m · K), heat resistance, durability, From the viewpoint of balance of heat dissipation, it contains Fe; 1.5 to 2.6% by mass, P; 0.008 to 0.15% by mass, and Zn; 0.01 to 0.5% by mass, with the balance being It has a composition composed of Cu and inevitable impurities, has an arithmetic average roughness Ra of 0.02 to 0.05 μm, a maximum height Rz of 0.20 to 0.40 μm, and a root mean square roughness Rq. The ratio Rq / Rz of the maximum height Rz is preferably 0.10 to 0.25. Moreover, in order to improve intensity | strength, in addition to this composition, you may contain Ni; 0.003-0.5 mass% and / or Sn; 0.003-0.5 mass%.

表面の算術平均粗さRaが0.02〜0.05μmであり、最大高さRzが0.20〜0.40μmであり、二乗平均平方根粗さRqと最大高さRzの比Rq/Rzが0.10〜0.25であると、その表面に直接搭載されるLEDとの接触熱抵抗が小さくなり、放熱性が更に増す。Raが0.02μm未満、或いは、Rzが0.20μm未満、或いは、Rq/Rzが0.10未満では効果が飽和し、製造上特殊な表面処理が必要となり製造コストが増加して無駄である。Raが0.05μmを超えると、或いは、Rzが0.40μmを超えると、或いは、Rq/Rzが0.25を超えると効果が不足する。   The arithmetic average roughness Ra of the surface is 0.02 to 0.05 μm, the maximum height Rz is 0.20 to 0.40 μm, and the ratio Rq / Rz of the root mean square roughness Rq to the maximum height Rz is When it is 0.10 to 0.25, the contact thermal resistance with the LED directly mounted on the surface is reduced, and the heat dissipation is further increased. If Ra is less than 0.02 μm, Rz is less than 0.20 μm, or Rq / Rz is less than 0.10, the effect is saturated, and a special surface treatment is required for manufacturing, which increases the manufacturing cost and is useless. . When Ra exceeds 0.05 μm, Rz exceeds 0.40 μm, or Rq / Rz exceeds 0.25, the effect is insufficient.

銅或いは銅合金異形断面板2の表面に施されているSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきは、耐熱性、樹脂に対する耐硫化性の観点から、厚みが0.2〜3.0μmあり、反射率の観点から、その光沢度は80〜110%である。光沢度が80%未満では反射効果が不足し、110%を超えると反射効果が飽和して無駄となる。めっきの厚みが0.2μm未満では耐熱性、耐硫化性が不足し、3.0μmを超えると効果が飽和しコスト的に無駄となる。
また、めっきは、耐硫化性を重視すると、Ag−Sn合金めっきであることが特に好ましく、コスト、耐久性、耐熱性を考慮すると、下地層を有する2層或いは3層のめっきとすることが好ましい。
A kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag-Sn alloy plating applied to the surface of the copper or copper alloy deformed cross-section plate 2 is heat resistant and sulfide resistant to resin. From the viewpoint, the thickness is 0.2 to 3.0 μm, and from the viewpoint of reflectance, the glossiness is 80 to 110%. When the glossiness is less than 80%, the reflection effect is insufficient, and when it exceeds 110%, the reflection effect is saturated and wasted. When the plating thickness is less than 0.2 μm, the heat resistance and sulfidation resistance are insufficient, and when it exceeds 3.0 μm, the effect is saturated and the cost is wasted.
Further, the plating is particularly preferably an Ag—Sn alloy plating in view of resistance to sulfidation, and considering the cost, durability, and heat resistance, the plating may be a two-layer or three-layer plating having an underlayer. preferable.

次に、下地層を有するAg−Sn合金めっきを使用したバックライト用発光装置1につき説明する。
銅或いは銅合金平板を圧延により厚肉部と薄肉部とが幅方向に並んだ異形断面板を作製して焼鈍し、仕上げ圧延して所定形状に成形した異形断面板2の表面に、3層めっきの場合は、Niめっき、Cuめっき、Snめっきを順に施し、これらをリフロー処理した後に、電気化学還元法にて表面の酸化膜を除去し、その表面にシアン系化合物を使用したAgストライクめっき法にてAg−Sn合金めっきを施す。下地層を2層めっきとする場合は、Niめっきは不要である。
この場合、電気化学還元法にて弱アルカリ電解液中でSnめっき層の酸化膜を還元して完全に除去することにより、Snめっき層のSn金属面を露出させ、次のAgめっきを密着させることができる。また、Agめっきを施した後に合金化処理を施すことにより、AgとSnとの相互拡散を確実にすることができる。
Agストライクめっきの条件は、表1に示す通りである。
Next, the light emitting device 1 for backlight using Ag—Sn alloy plating having a base layer will be described.
Three layers are formed on the surface of the deformed cross-section plate 2 formed by rolling a copper or copper alloy flat plate into which a thick section and a thin section are aligned in the width direction and then annealing and finishing and rolling into a predetermined shape. In the case of plating, Ni plating, Cu plating, and Sn plating are performed in order, and after reflow treatment, the oxide film on the surface is removed by an electrochemical reduction method, and Ag strike plating using a cyanide compound on the surface Ag—Sn alloy plating is applied by the method. When the base layer is a two-layer plating, Ni plating is unnecessary.
In this case, the Sn metal surface of the Sn plating layer is exposed by reducing and completely removing the oxide film of the Sn plating layer in a weak alkaline electrolyte by an electrochemical reduction method, and the next Ag plating is adhered. be able to. Moreover, the mutual diffusion of Ag and Sn can be ensured by performing the alloying treatment after the Ag plating.
The conditions for Ag strike plating are as shown in Table 1.

Figure 2012099555
Figure 2012099555

ここで、シアン化銀カリウムの濃度は1g/L未満であると、Snめっき層に対して所望の面積被覆率が得られず、また8g/Lを超えると、Agめっき表面が粗くなるので、1〜8g/Lが好ましい。
Agストライクめっき後の合金化処理条件は、表2に示す通りである。
Here, if the concentration of potassium potassium cyanide is less than 1 g / L, a desired area coverage cannot be obtained for the Sn plating layer, and if it exceeds 8 g / L, the Ag plating surface becomes rough. 1-8 g / L is preferable.
The alloying treatment conditions after Ag strike plating are as shown in Table 2.

Figure 2012099555
Figure 2012099555

この合金化処理により、表面のAgとその下のSnとが相互拡散して合金化し、表面にAgSn合金層が形成される。
また、封止に使用する樹脂の硫化に対する耐久性を増す為に、AgSn合金層の表面に5〜20nmの透明な酸化錫皮膜を形成することが好ましい。
以上のようなめっき方法により、Niめっき層とCu−Sn合金層とAg−Sn合金めっき層を有する銅或いは銅合金異形断面板2が完成され、最表面のAg−Sn合金めっき層は、表面の光沢度が80〜110%とされる。これにより銅或いは銅合金異形断面板2の凹部3の内部側面11は、耐久性及び耐熱性を有する良好な反射板として作用し、優れたバックライト装置を形成する。
また、銅或いは銅合金異形断面板2の裏面9、側面10、凸部上面12には、この様なめっきが施されていなくても良い。
By this alloying treatment, Ag on the surface and Sn under the surface are diffused and alloyed to form an Ag 3 Sn alloy layer on the surface.
Moreover, in order to increase the durability against sulfidation of the resin used for sealing, it is preferable to form a transparent tin oxide film of 5 to 20 nm on the surface of the Ag 3 Sn alloy layer.
By the above plating method, the copper or copper alloy modified cross-sectional plate 2 having the Ni plating layer, the Cu—Sn alloy layer, and the Ag—Sn alloy plating layer is completed, and the outermost Ag—Sn alloy plating layer is The glossiness is 80 to 110%. Thereby, the internal side surface 11 of the recessed part 3 of the copper or copper alloy modified cross-section board 2 acts as a good reflector having durability and heat resistance, and forms an excellent backlight device.
Further, such plating may not be applied to the back surface 9, the side surface 10, and the convex surface 12 of the copper or copper alloy modified cross-section plate 2.

このAg−Sn合金めっきが表面に施された銅合金異形断面板2の凹部3の底面には、複数個の発光素子4,4a,4bが直接実装される。この場合、発光素子4,4a,4bの凹部3の底面と接する面にAu−Snはんだを蒸着し、押圧しながら240〜310℃の温度で加熱することにより、Ag−Sn合金めっき層との間で3元系のAu−Ag−Sn合金層が形成され、発光素子4が強固に実装される。
ボイド等の欠陥がなく高い接合強度となるAu−Ag−Sn合金層を得るために、240℃以上の加熱温度とするのが好ましい。加熱温度が310℃を超えても、接合強度のそれ以上の向上は期待できないとともに、熱応力が大きくなるので好ましくない。
A plurality of light emitting elements 4, 4 a, 4 b are directly mounted on the bottom surface of the concave portion 3 of the copper alloy modified cross-section plate 2 on which the Ag—Sn alloy plating is applied. In this case, Au—Sn solder is vapor-deposited on the surface of the light emitting elements 4, 4 a, 4 b in contact with the bottom surface of the recess 3, and heated at a temperature of 240 to 310 ° C. while being pressed, whereby the Ag—Sn alloy plating layer A ternary Au—Ag—Sn alloy layer is formed between them, and the light emitting element 4 is firmly mounted.
In order to obtain an Au—Ag—Sn alloy layer having no defects such as voids and high bonding strength, it is preferable to set the heating temperature to 240 ° C. or higher. Even if the heating temperature exceeds 310 ° C., no further improvement in bonding strength cannot be expected, and thermal stress increases, which is not preferable.

アノードパターニング回路5a及びカソードパターニング回路5bは、絶縁性接着テープまたは接着樹脂にて、Ag−Sn合金めっきが表面に施された銅或いは銅合金異形断面板2の凹部3の底面に接着される。また。耐久性、耐熱性の観点から、アノードパターニング回路5a及びカソードパターニング回路5bは、Ag或いはAg−Sn合金めっきが表面に施された銅ストリップ上に形成されることが好ましい。
複数個の発光素子4,4a,4bの間は配線(金ワイヤー)6で直列接続され、末端部の発光素子4a,4bは各パターニング回路5a、5bに配線7a,7b(金ワイヤー)で接続される。パターニング回路5a、5bは、図示しない配線により電源に接続される。
The anode patterning circuit 5a and the cathode patterning circuit 5b are bonded to the bottom surface of the concave portion 3 of the copper or copper alloy deformed cross-section plate 2 with Ag—Sn alloy plating applied to the surface with an insulating adhesive tape or an adhesive resin. Also. From the viewpoint of durability and heat resistance, the anode patterning circuit 5a and the cathode patterning circuit 5b are preferably formed on a copper strip having Ag or Ag—Sn alloy plating applied to the surface thereof.
A plurality of light emitting elements 4, 4 a, 4 b are connected in series by wiring (gold wire) 6, and the light emitting elements 4 a, 4 b at the end are connected to the patterning circuits 5 a, 5 b by wiring 7 a, 7 b (gold wire). Is done. The patterning circuits 5a and 5b are connected to a power source by wiring (not shown).

更に、凹部3内は複数個の発光素子4,4a,4bを覆うように透明樹脂8で封止される。透明樹脂8の材質は特に限定されないが、透明性、耐久性、耐熱性などを考慮するとシリコーン樹脂であることが好ましい。   Further, the inside of the recess 3 is sealed with a transparent resin 8 so as to cover the plurality of light emitting elements 4, 4a, 4b. The material of the transparent resin 8 is not particularly limited, but a silicone resin is preferable in consideration of transparency, durability, heat resistance, and the like.

この様な本発明のバックライト用発光装置1は、裏面9の平面部を電子機器部内のバックライト装置固定部(図示しない)に、接着剤により直接接合、或いは、両端に形成したビス止め穴13を介して直接接合して使用される。   Such a backlight light emitting device 1 of the present invention is such that the flat portion of the back surface 9 is directly joined to the backlight device fixing portion (not shown) in the electronic device portion by an adhesive or screw fixing holes formed at both ends. 13 is used by directly joining via 13.

三菱伸銅(株)の商品名、MAX251C(Cu;95質量%以上、Ni;1.3〜2.7質量%、Si;0.2〜0.8質量%、Sn;0.2〜0.8質量%、Zn;0.5〜1.5質量%、残部が不可避不純物)、TAMAC194(Cu;97質量%以上、Fe;2.1〜2.6質量%、P;0.015〜0.15質量%、Zn;0.05〜0.20質量%、残部が不可避不純物)の銅合金平板を使用し、圧延により厚肉部と薄肉部とが幅方向に並んだ異形断面板を作製して焼鈍後、更に仕上げ圧延して、図1に示す諸寸法が、長さL;100mm、全体幅W;20mm、凹部底面の幅W1;15mm、全体高さH;10mm、凹部底面までの高さH1;5mm、凹部の底面と内部側面との角度θ;75°で表3及び表4に示す表面粗さの各異形断面板を作製した。MAX251を用いたものを表3に、TAMAC194を用いたものを表4に示す。   Trade name of Mitsubishi Shindoh Co., Ltd., MAX251C (Cu; 95% by mass or more, Ni; 1.3 to 2.7% by mass, Si; 0.2 to 0.8% by mass, Sn; 0.2 to 0 0.8% by mass, Zn: 0.5-1.5% by mass, the balance being inevitable impurities), TAMAC194 (Cu: 97% by mass or more, Fe: 2.1-2.6% by mass, P: 0.015 Using a copper alloy flat plate of 0.15% by mass, Zn: 0.05-0.20% by mass, the balance being inevitable impurities), a deformed cross-sectional plate in which a thick part and a thin part are aligned in the width direction by rolling 1 is manufactured and annealed, and then finish-rolled. The dimensions shown in FIG. 1 are as follows: length L: 100 mm, overall width W: 20 mm, recess bottom width W1: 15 mm, overall height H: 10 mm, to recess bottom Height H1: 5 mm, angle θ between the bottom surface of the recess and the inner side surface; surface roughness shown in Tables 3 and 4 at 75 ° Each of the irregular cross-sectional plates was prepared. Table 3 shows the results using MAX251, and Table 4 shows the results using TAMAC194.

次に、この異形断面板の表面を洗浄後、Cuめっき、Snめっきを順に施し、加熱してリフロー処理することにより、Cu−Sn合金層、その上層にSnめっき層が形成された2層めっき異形断面板を作製し、更に、そのSnめっき表面を、電気化学還元法にて、電解液中でSnめっき層の酸化膜を除去し、表1に示す条件にて、膜厚を変化させてAgストライクめっきを施し、表2に示す条件にて、ベンゾチアゾール化合物を含む水溶液中にて合金化及び変色防止処理を施し、表3及び表4に示すめっき厚と光沢度を有するAg−Sn合金層を表面に有する各異形断面板を作製した。
次に、このAg−Sn合金めっきが施された異形断面板の凹部の底面上に、CREE社製のLEDチップ(縦0.9mm×横0.9mm×高さ200μmで底面に接合の為のAu−Snはんだが蒸着されている)3個を6mm間隔で直列配置し、押圧しながら240〜310℃の温度で加熱し、凹部の底面と直接接合した。
Next, after cleaning the surface of the irregular cross-section plate, Cu plating and Sn plating are performed in this order, and the reflow treatment is performed by heating to form a Cu-Sn alloy layer and a two-layer plating in which an Sn plating layer is formed thereon An odd-shaped cross-section plate was prepared, and the Sn plating surface was removed from the Sn plating layer in the electrolytic solution by an electrochemical reduction method, and the film thickness was changed under the conditions shown in Table 1. Ag-Sn alloy having a plating thickness and glossiness shown in Tables 3 and 4 after being subjected to Ag strike plating and subjected to alloying and discoloration prevention treatment in an aqueous solution containing a benzothiazole compound under the conditions shown in Table 2. Each modified cross-section board having a layer on the surface was produced.
Next, an LED chip made by CREE (length 0.9 mm × width 0.9 mm × height 200 μm for bonding to the bottom surface) is formed on the bottom surface of the concave portion of the deformed cross-section plate subjected to the Ag—Sn alloy plating. Three pieces (Au—Sn solder deposited) were arranged in series at intervals of 6 mm, heated at a temperature of 240 to 310 ° C. while being pressed, and directly joined to the bottom surface of the recess.

次に、Ag−Sn合金めっきが施された異形断面板の凹部のLEDチップが接合されていない底面上に、カソード及びアノードパターニング回路(表面がメッキ処理された銅ストリップ)を絶縁性接着テープにて貼り付け、直列配置された両端のLEDチップの電極とカソードおよびアノードパターニング回路を金ワイヤーにてボンディングした。各LEDチップ間も金ワイヤーにてボンディングした。
次に、このLEDチップが直接搭載された凹部内を完全に覆うように信越化学(株)社製のシリコーン樹脂にて封止して硬化させ、実施例1〜6及び実施例11〜16、比較例1〜4及び比較例11〜14に示すバックライト用発光装置を作製した。
Next, the cathode and anode patterning circuit (copper strip whose surface is plated) is applied to the insulating adhesive tape on the bottom surface where the LED chip in the concave portion of the deformed cross-section plate plated with Ag-Sn alloy is not bonded. The electrodes of the LED chips on both ends arranged in series and the cathode and anode patterning circuits were bonded with gold wires. Each LED chip was also bonded with a gold wire.
Next, it is sealed and cured with a silicone resin manufactured by Shin-Etsu Chemical Co., Ltd. so as to completely cover the inside of the recess where the LED chip is directly mounted, and Examples 1 to 6 and Examples 11 to 16, The backlight light emitting devices shown in Comparative Examples 1 to 4 and Comparative Examples 11 to 14 were produced.

この様に作製されたバックライト用発光装置のカソードパターニング回路およびアノードパターニング回路に通電し、放熱性及び耐久性を測定した。測定結果を表3及び表4に示す。
放熱性は、発光装置をバックライトの筐体を模したアルミ板(縦200mm、横65mm、厚さ0.8mm)に接着樹脂にて貼り付け、1000時間通電した後、素子1個当りに電圧3.3V、電流350mAを負荷し発光させ、素子温度(ジャンクション温度Tj)を赤外線サーモグラフィ(NEC三栄社製TH9100)にて測定した。
耐久性は、加速試験を実施し、85℃/85%RHの雰囲気中で1000時間通電した後の輝度を測定し、初期輝度に対する輝度の低下率を算出した。輝度は輝度計(コニカミノルタセンシング社製CS−100A)にて測定した。
The cathode patterning circuit and the anode patterning circuit of the backlight light emitting device thus manufactured were energized to measure heat dissipation and durability. The measurement results are shown in Tables 3 and 4.
For heat dissipation, the light emitting device is attached to an aluminum plate (200 mm long, 65 mm wide, 0.8 mm thick) imitating the backlight housing with adhesive resin, energized for 1000 hours, and then the voltage per element. 3.3V and a current of 350 mA were loaded to emit light, and the element temperature (junction temperature Tj) was measured with an infrared thermography (TH9100 manufactured by NEC Saneisha).
Durability was measured by measuring the luminance after conducting an acceleration test, energizing for 1000 hours in an atmosphere of 85 ° C./85% RH, and calculating the rate of decrease in luminance relative to the initial luminance. The luminance was measured with a luminance meter (CS-100A manufactured by Konica Minolta Sensing).

Figure 2012099555
Figure 2012099555

Figure 2012099555
Figure 2012099555

表3及び表4の結果より、本発明のバックライト用発光装置は、放熱性が良好で長期使用時の耐久性、特に、樹脂封止された反射層の耐久性に優れ、輝度が低下し難いことがわかる。
また、本発明のバックライト装置は構造が簡略化されているので製造コストが安価であり、電子機器部内のバックライト装置固定部に直接接着或いはビス留めして簡単に使用することができる。
From the results of Tables 3 and 4, the backlight light-emitting device of the present invention has good heat dissipation and durability during long-term use, in particular, excellent durability of the resin-sealed reflective layer, resulting in lower brightness. I find it difficult.
Further, since the structure of the backlight device of the present invention is simplified, the manufacturing cost is low, and the backlight device can be easily used by directly bonding or screwing to the backlight device fixing portion in the electronic device section.

以上、本発明の実施形態の製造方法について説明したが、本発明はこの記載に限定されることはなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。   As mentioned above, although the manufacturing method of embodiment of this invention was demonstrated, this invention is not limited to this description, A various change can be added in the range which does not deviate from the meaning of this invention.

1 バックライト用発光装置
2 銅或いは銅合金異形断面板
3 銅或いは銅合金異形断面板の凹部
4、4a、4b 発光素子
5a アノードパターニング回路
5b カソードパターニング回路
6、7a、7b 配線
8 透明樹脂
DESCRIPTION OF SYMBOLS 1 Light-emitting device for backlights 2 Copper or copper alloy irregular cross-section board 3 Recessed copper or copper alloy irregular cross-section board 4, 4a, 4b Light emitting element 5a Anode patterning circuit 5b Cathode patterning circuit 6, 7a, 7b Wiring 8 Transparent resin

Claims (3)

光沢度が80〜110%であるSnめっき、Niめっき、Agめっき、Ag−Sn合金めっきからなるグループから選択された一種のめっきが表面に施された熱伝導率が150W/(m・K)以上である凸凹部を有する銅或いは銅合金異形断面板と、当該異形断面板の凹部の底面に直接実装された複数個の発光素子と、当該凹部の底面に形成されたカソードパターニング回路およびアノードパターニング回路と、当該複数個の発光素子間を直列接続する配線と、当該直列接続された複数個の発光素子の先頭の素子をアノードパターニング回路に接続する配線および末端の素子をカソードパターニング回路に接続する配線と、当該複数個の発光素子を覆うように前記凹部内を封止する透明樹脂とから構成されたことを特徴とするバックライト用発光装置。   A thermal conductivity of 150 W / (m · K) on the surface of which a kind of plating selected from the group consisting of Sn plating, Ni plating, Ag plating, and Ag—Sn alloy plating with a glossiness of 80 to 110% is applied. The copper or copper alloy irregular cross-sectional plate having the convex and concave portions as described above, a plurality of light emitting elements mounted directly on the bottom surface of the concave portion of the irregular cross-sectional plate, the cathode patterning circuit and the anode patterning formed on the bottom surface of the concave portion A circuit, a wiring for connecting the plurality of light emitting elements in series, a wiring for connecting the head element of the plurality of light emitting elements connected in series to the anode patterning circuit, and a terminal element for connecting to the cathode patterning circuit For a backlight comprising a wiring and a transparent resin for sealing the inside of the recess so as to cover the plurality of light emitting elements Light equipment. 当該銅合金異形断面板がFe;1.5〜2.6質量%、P;0.008〜0.15質量%およびZn;0.01〜0.5質量%を含有し、残部がCu及び不可避不純物からなる組成を有し、表面の算術平均粗さRaが0.02〜0.05μmであり、最大高さRzが0.20〜0.40μmであり、二乗平均平方根粗さRqと最大高さRzの比Rq/Rzが0.10〜0.25であることを特徴とする請求項1に記載のバックライト用発光装置。   The copper alloy deformed cross-section plate contains Fe; 1.5 to 2.6% by mass, P; 0.008 to 0.15% by mass and Zn; 0.01 to 0.5% by mass, with the balance being Cu and It has a composition consisting of inevitable impurities, has a surface arithmetic average roughness Ra of 0.02 to 0.05 μm, a maximum height Rz of 0.20 to 0.40 μm, and a root mean square roughness Rq and a maximum The light emitting device for backlight according to claim 1, wherein the ratio Rq / Rz of the height Rz is 0.10 to 0.25. 請求項1〜請求項2の何れか1項に記載のバックライト用発光装置が機器内のバックライト発光装置固定部に接着或いはビス止めにより直接固定されたことを特徴とする液晶を使用する電子或いは電気機器。   An electronic device using liquid crystal, characterized in that the backlight light emitting device according to any one of claims 1 to 2 is directly fixed to a backlight light emitting device fixing portion in a device by bonding or screwing. Or electrical equipment.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015000036A (en) * 2013-06-17 2015-01-05 交和電気産業株式会社 Illumination device
JP2015017286A (en) * 2013-07-09 2015-01-29 三菱伸銅株式会社 Plating-fitted copper alloy sheet having excellent glossiness
WO2021060531A1 (en) * 2019-09-27 2021-04-01 シチズン電子株式会社 Light-emitting apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015000036A (en) * 2013-06-17 2015-01-05 交和電気産業株式会社 Illumination device
JP2015017286A (en) * 2013-07-09 2015-01-29 三菱伸銅株式会社 Plating-fitted copper alloy sheet having excellent glossiness
WO2021060531A1 (en) * 2019-09-27 2021-04-01 シチズン電子株式会社 Light-emitting apparatus

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