JP2012087338A - Metal mask and metal mask member - Google Patents

Metal mask and metal mask member Download PDF

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JP2012087338A
JP2012087338A JP2010233377A JP2010233377A JP2012087338A JP 2012087338 A JP2012087338 A JP 2012087338A JP 2010233377 A JP2010233377 A JP 2010233377A JP 2010233377 A JP2010233377 A JP 2010233377A JP 2012087338 A JP2012087338 A JP 2012087338A
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opening
metal mask
longitudinal direction
metal
array
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JP5636863B2 (en
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Yoshinori Hirobe
吉紀 廣部
Yuji Anzai
祐二 安在
Toshihiro Hatori
敏洋 羽鳥
Yasuharu Minoura
康晴 箕浦
Kazuya Ogawa
和也 小川
Takanori Maruoka
敬典 丸岡
Yutaka Matsumoto
豊 松元
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a metal mask of pseudo slit type, capable of suppressing any twist of a tape part by increasing the length in the longitudinal direction of each aperture when the metal mask is affixed to a frame body by applying tensional force, and suppressing dispersion in the aperture width so as to be small.SOLUTION: A plurality of aperture array parts having an aperture shape provided with a plurality of connection parts 12 across the direction orthogonal to the longitudinal direction of a slit-like aperture 11 at a predetermined pitch P1 are arrayed at the predetermined pitch in the direction orthogonal to the longitudinal direction. Each of the connection parts of each of the aperture array parts is provided evenly on the straight line in the direction orthogonal to the longitudinal direction of each of the aperture array parts at every other aperture array part, and the straight line group in the direction orthogonal to the longitudinal direction of each of the aperture array parts, in which every connection part of the every aperture array part is arrayed, is arranged at the pitch that shows the half of the predetermined pitch.

Description

本発明は、張力をかけて枠体に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板に開口を設けたメタルマスクと、該メタルマスクを張力をかけて枠体に固定したマスク部材に関する。   The present invention relates to a metal mask provided with an opening in a metal plate, which is fixed to a frame body under tension and used as a mask for selectively controlling a film formation region when vacuum film formation is performed, and the metal mask It is related with the mask member fixed to the frame body by applying tension.

近年、電流の注入によって発光する有機化合物材料のエレクトロルミネッセンス(以下、有機ELという)を利用して、かかる有機EL材料の薄膜からなる発光層を備えた有機EL素子の複数を配置した有機ELディスプレイパネルが、携帯端末やノートパソコンの表示部として用いられるようになってきた。
有機化合物材料を発光体とする有機EL素子は、液晶素子に比べ視野角が広く、コントラストも良く、視認性に優れており、バックライトが不要なため、薄型、軽量化が実現でき、消費電力の面でも有利で、応答性も速い。
そして、すべて固体であるため振動に強く、使用温度範囲も広いなどの特徴があり、表示素子として注目されている。
有機EL素子の構造は、図4に示すように、透明基板310上に、陽極(ITO)320と、ホール輸送層330、発光層340、電子輸送層350からなる有機層と、陰極360とを、この順にして層構成されている。
尚、図4中、341、342、343は、それぞれ、R(赤色)発光層、G(緑色)発光層、B(青色)発光層である。
2. Description of the Related Art In recent years, an organic EL display in which a plurality of organic EL elements each having a light emitting layer made of a thin film of an organic EL material is arranged using electroluminescence (hereinafter referred to as organic EL) of an organic compound material that emits light by current injection. Panels have come to be used as display units for portable terminals and notebook computers.
Organic EL devices that use organic compound materials as light emitters have a wider viewing angle, better contrast, better visibility, and no need for a backlight, making them thinner and lighter, and reducing power consumption. This is also advantageous and quick response.
And since it is all solid, it is strong against vibration and has a wide operating temperature range, and has attracted attention as a display element.
As shown in FIG. 4, the organic EL element has a structure in which an anode (ITO) 320, an organic layer composed of a hole transport layer 330, a light emitting layer 340, and an electron transport layer 350, and a cathode 360 are formed on a transparent substrate 310. The layers are arranged in this order.
In FIG. 4, 341, 342, and 343 are an R (red) light emitting layer, a G (green) light emitting layer, and a B (blue) light emitting layer, respectively.

有機EL素子の種類は、有機層(図4の330、340、350)が高分子タイプと低分子タイプがあり、素子の駆動方式にはパッシブタイプとアクティブタイプがあるが、低分子有機層およびパッシブ駆動タイプの陰極の形成には真空蒸着が必要となり、有機EL素子の低分子有機層及び陰極の形成に、金属マスク(以下、メタルマスクとも言う)を用いて真空蒸着を行ないパターニングする方法も採られている。
尚、一般に、通常薄膜のパターニングに用いられるフォトリソグラフィ法を用い有機EL素子の陰極や有機EL媒体層をマイクロパターニングすることは、電荷注入層や発光層に用いられる有機EL媒体の耐熱性(一般に100℃以下)、耐溶剤性、耐湿性の低さのため困難である。
フォトレジスト中の溶剤の素子への侵入や、フォトレジストベーク中の高温雰囲気や、フォトレジスト現像液またはエッチング液の素子への浸入や、ドライエッチング時のプラズマによるダメージ等の原因により有機EL素子特性が劣化する問題が生じる。
As for the types of organic EL elements, the organic layer (330, 340, 350 in FIG. 4) has a high molecular type and a low molecular type, and there are a passive type and an active type as an element driving method. Formation of a passive drive type cathode requires vacuum deposition, and a method of patterning by performing vacuum deposition using a metal mask (hereinafter also referred to as a metal mask) for forming a low molecular organic layer and a cathode of an organic EL element. It is taken.
In general, micropatterning of the cathode of an organic EL element and the organic EL medium layer using a photolithography method usually used for patterning a thin film means that the organic EL medium used for the charge injection layer and the light emitting layer has heat resistance (generally, 100 ° C. or lower), low solvent resistance, and low moisture resistance.
Organic EL device characteristics due to the intrusion of solvents in the photoresist, high temperature atmosphere during photoresist baking, penetration of photoresist developer or etching solution into the device, damage due to plasma during dry etching, etc. This causes a problem of deterioration.

従来、有機EL素子の形成において、上記金属マスク(以下、メタルマスクとも言う)を用いて真空蒸着を行ないパターニングする方法は、例えば、図5(b)に示すように、枠体390に、単層の金属薄板をエッチング加工して作製したメタルマスク部380を貼り付けた状態で、図5(a)のように、所定の箇所をメタルマスク部380にてマスキングして、陰極360の蒸着パターニングが行われていた。
尚、加工精度上から、メタルマスクの板厚は薄い方が好ましく、通常、30μm〜150μmの金属薄板が加工用素材として用られていた。
図5中、310は透明基板、320は陽極(ITO)、330はホール輸送層、340は発光層、350は電子輸送層、360は陰極、380はメタルマスク部、381はスリット部(貫通孔部とも言う)、382は面付け単位領域、390は枠体である。
効率化のため、図5(b)に示すように多面付けしてパターニングして、あるいは、面付けしないでも、蒸着パターン領域が大サイズとなる場合がある。
Conventionally, in the formation of an organic EL element, a method for patterning by vacuum deposition using the metal mask (hereinafter also referred to as a metal mask) is, for example, as shown in FIG. With the metal mask portion 380 produced by etching the metal thin plate of the layer attached, a predetermined portion is masked by the metal mask portion 380 as shown in FIG. Was done.
From the viewpoint of processing accuracy, it is preferable that the metal mask has a thin plate thickness. Usually, a metal thin plate of 30 μm to 150 μm has been used as a processing material.
In FIG. 5, 310 is a transparent substrate, 320 is an anode (ITO), 330 is a hole transport layer, 340 is a light emitting layer, 350 is an electron transport layer, 360 is a cathode, 380 is a metal mask portion, and 381 is a slit portion (through hole). 382 is an imposition unit region, and 390 is a frame.
In order to improve efficiency, the deposition pattern region may be large in size even if it is patterned with multiple faces as shown in FIG.

このようなメタルマスクには、開口の形状から大きくは、スロットタイプ、ドットタイプ、スリットタイプの3種類のタイプに分けられており、それぞれ、成膜形状をスロット状、ドット状、スリット状に形成するものであります。
しかし、スリットタイプのメタルマスクにおいては、例えば、被処理基板のサイズが300mm×400mm以上のものを対象として、スリット幅50μm〜150μm、ピッチ幅150μm〜300μm程度のスリットパターンの作製を、図4に示すような、メタルマスク部380を枠体(フレームあるいは外枠とも言う)390に貼り付け固定したメタルマスク部材を用いて、蒸着パターニングで行なう場合には、メタルマスク部材のメタルマスク部380の中央部が弛み、これに起因して蒸着パターニングするスリット部381の精度を所望の精度内に維持することができない。
また、弛みをとるため、外周を引っ張って外側の枠体に貼り付けた場合には、スリット部381がよれ(歪とも言う)、その精度を維持できない。
例えば、従来、フォトエッチングにて製造された厚さ0.04mmの36Invar(36%Ni、64%Fe)製のエッチングマスクのスリットの開口幅(スリット幅とも言う)0.070mm、ピッチ0.200mmとした場合、通常の張力(2kgf/mm2 程度)をかけてから枠体(フレーム)に溶接して固定すると、スリット間の金属部(以下、テープないしテープ部とも言う)の幅のバラツキは3σで0.003mm程度だが、スリット幅のバラツキは3σで0.006mm程度になる。
強く張力(3.5kgf/mm2 程度)をかけた場合は、テープ幅のバラツキは3σで0.003mm程度だが、スリット幅のバラツキは3σで0.004mm程度になり、張力を強くすることにより、スリット幅のバラツキは小さくなるが、強く張力(3.5kgf/mm2 程度)をかけた場合には、枠体の強度を上げる為に、全体が重くなってしまう。
Such metal masks are roughly divided into three types: slot type, dot type, and slit type, depending on the shape of the opening, and the film-forming shapes are formed into slots, dots, and slits, respectively. It is what
However, in the case of a slit-type metal mask, for example, a slit pattern having a slit width of 50 μm to 150 μm and a pitch width of about 150 μm to 300 μm is prepared for a target substrate having a size of 300 mm × 400 mm or more in FIG. As shown in the figure, when the metal mask member 380 is attached to a frame (also referred to as a frame or an outer frame) 390 and fixed by vapor deposition patterning, the center of the metal mask portion 380 of the metal mask member is used. As a result, the accuracy of the slit portion 381 for vapor deposition patterning cannot be maintained within the desired accuracy.
Further, in order to remove slack, when the outer periphery is pulled and attached to the outer frame, the slit portion 381 is moved (also referred to as distortion), and the accuracy cannot be maintained.
For example, a slit opening width (also referred to as slit width) of 0.070 mm and a pitch of 0.200 mm in a conventional etching mask made of 36 Invar (36% Ni, 64% Fe) having a thickness of 0.04 mm manufactured by photoetching. In this case, when a normal tension (about 2 kgf / mm 2 ) is applied and then fixed to the frame (frame) by welding, the variation in the width of the metal part between the slits (hereinafter also referred to as tape or tape part) is Although 3σ is about 0.003 mm, the slit width variation is about 0.006 mm at 3σ.
When a strong tension (about 3.5 kgf / mm 2 ) is applied, the tape width variation is about 0.003 mm at 3σ, but the slit width variation is about 0.004 mm at 3σ. By increasing the tension, Although the variation in the slit width is small, when a strong tension (about 3.5 kgf / mm 2 ) is applied, the entire frame becomes heavy in order to increase the strength of the frame.

特開2003−272838号公報JP 2003-272838 A

上記のように、従来、有機EL素子の形成に用いられるスリットタイプのメタルマスクにおいては、通常の張力でメタルマスクの外周を引っ張って枠体に貼り付けた場合には、テープ部がよれ、スリット幅のバラツキが大きくなり、また、枠体を強固にしてメタルマスクを強く引っ張って枠体に張った場合には、テープ部のよれは改善され、スリット幅のバラツキは小さくなるが、枠体自体を通常の場合と比べて強固としなければならず、枠体が重くなってしまうと言う問題があった。
本願発明は、これらの問題に対応するもので、配列させた開口配列部の各開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制でき、開口幅のバラツキを小さく抑制できるメタルマスクの提供しようとするものです。
特に、通常の張力(2kgf/mm2 程度)をかけてから枠体に溶接して固定した場合において、開口の形状をスリットタイプにできるだけ近く、開口の長手方向の長さを長くして、テープ部のよれを抑制でき、開口幅のバラツキを小さく抑制できる、擬似スリットタイプのメタルマスクを提供しようとするものです。
勿論、表示装置に用いられた際に画像の品質に影響する成膜形状をそこなわないことを前提としてである。
As described above, in the conventional slit-type metal mask used for forming an organic EL element, when the outer periphery of the metal mask is pulled with a normal tension and attached to the frame, the tape portion is moved and the slit is formed. When the width variation increases, and when the frame is strengthened and the metal mask is pulled strongly and stretched to the frame, the tape section is improved and the slit width variation is reduced, but the frame itself There is a problem that the frame becomes heavier than in the normal case.
The present invention addresses these problems. The length of each opening in the array of openings arranged in the longitudinal direction is increased, and when the tape is applied to the frame body under tension, the tape portion is twisted. It is intended to provide a metal mask that can suppress the variation of the opening width and reduce the variation of the opening width.
In particular, when a normal tension (about 2 kgf / mm 2 ) is applied and then fixed to the frame by welding, the shape of the opening is as close as possible to the slit type, and the length in the longitudinal direction of the opening is increased, and the tape The purpose is to provide a pseudo-slit type metal mask that can suppress the distortion of the part and the variation of the opening width.
Of course, it is based on the premise that the film forming shape that affects the quality of the image is not lost when used in a display device.

本発明のメタルマスクは、張力をかけて枠体に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板に開口を設けたメタルマスクであって、金属板に、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部を所定のピッチで設けた開口形状を有する開口配列部を、複数、前記長手方向に直交する方向に、所定の決められたピッチで配列しており、各開口配列部の各繋ぎ部は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の直線群は、前記所定の決められたピッチの半分のピッチであることを特徴とするものである。
そして、上記のメタルマスクであって、有EL素子の形成用であることを特徴とするものである。
尚、繋ぎ部は開口の長手方向において開口を分離する金属部分のことで、ここでの開口配列部とは、開口の長手方向に直線状に配列された全ての開口と繋ぎ部とを併せた部分を意味し、また、スリット状の開口とは、所定幅で直線状に開口された開口を意味している。
The metal mask of the present invention is a metal mask provided with an opening in a metal plate, which is fixed to a frame body under tension and is used as a mask for selectively controlling a film formation region during vacuum film formation. A plurality of opening array portions having an opening shape in which a plurality of connecting portions straddling a slit-like opening in a direction orthogonal to the longitudinal direction of the opening are provided at a predetermined pitch on the metal plate in the longitudinal direction. Arranged at a predetermined pitch in a direction orthogonal to each other, and each connecting portion of each opening arrangement portion is on a straight line in a direction orthogonal to the longitudinal direction of the opening arrangement portion every other opening arrangement portion. And the straight line group in the direction orthogonal to the longitudinal direction of the opening array portion, in which all connecting portions of all the opening array portions are arrayed, is a pitch that is half the predetermined predetermined pitch. It is characterized by.
And it is said metal mask, Comprising: It is for formation of an electroluminescent element, It is characterized by the above-mentioned.
In addition, a connection part is a metal part which isolate | separates an opening in the longitudinal direction of an opening, and the opening arrangement | sequence part here combines all the openings and connection parts arranged linearly in the longitudinal direction of the opening. A slit-like opening means an opening that is opened in a straight line with a predetermined width.

本発明のメタルマスク部材は、真空成膜する際に成膜領域を選択的に制御するためのマスクとして、金属板に開口を設けたメタルマスクを張力をかけて枠体に固定したマスク部材であって、前記メタルマスクとして、請求項1ないし請求項2のいずれか1項に記載のメタルマスクを用ていることを特徴とするものである。   The metal mask member of the present invention is a mask member in which a metal mask provided with an opening in a metal plate is tensioned and fixed to a frame body as a mask for selectively controlling a film formation region during vacuum film formation. And the metal mask of any one of Claim 1 thru | or 2 is used as said metal mask, It is characterized by the above-mentioned.

(作用)
本発明のメタルマスクは、このような構成にすることにより、配列させた開口配列部の各開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制でき、開口幅のバラツキを小さく抑制できるメタルマスクの提供を可能としている。
即ち、配列させた開口配列部の開口の形状がスリットタイプにできるだけ近くなるようにして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制できるメタルマスクの提供を可能としている。
具体的には、金属板に、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部を所定のピッチで設けた開口形状を有する開口配列部を、複数、前記長手方向に直交する方向に、所定の決められたピッチで配列しており、各開口配列部の各繋ぎ部は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の直線群は、前記所定の決められたピッチの半分のピッチであることにより、これを達成している。
即ち、1開口配列部の隣接する繋ぎ部の間隔を広くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制できるメタルマスクの提供を可能としている。
特に、有EL素子の形成用である場合には、特に有効である。
(Function)
When the metal mask of the present invention is configured in this way, the length of each opening in the array of openings arranged in the longitudinal direction is increased, and the tape is applied to the frame body under tension. Accordingly, it is possible to provide a metal mask that can suppress the wobbling of the portion and suppress the variation in the opening width.
In other words, it is possible to provide a metal mask that can prevent the tape part from twisting when it is attached to the frame with tension applied so that the shape of the openings of the arranged opening array part is as close as possible to the slit type. Yes.
Specifically, a plurality of opening array portions having an opening shape in which a plurality of connecting portions straddling a metal plate in a direction orthogonal to the longitudinal direction of the opening is provided at a predetermined pitch with respect to the slit-shaped opening, Arranged at a predetermined pitch in a direction orthogonal to the longitudinal direction, and each connecting portion of each opening array portion is a direction orthogonal to the longitudinal direction of the opening array portion every other opening array portion A straight line group in a direction perpendicular to the longitudinal direction of the opening array portion, in which all the connecting portions of the all opening array portions are arranged, is arranged at a pitch that is half the predetermined predetermined pitch. This has been achieved.
That is, it is possible to provide a metal mask that can suppress the warp of the tape portion when the gap between the adjacent connecting portions of one opening array portion is widened and applied to the frame body under tension.
This is particularly effective when used for forming an EL element.

本願請求項1の発明のメタルマスクにおいては、各開口配列部の隣接する繋ぎ部の間隔をP1 とした場合、図1に示すように、開口配列部11Aの開口11の長手方向を直交する方向で、前記各開口配列部11Aの隣接する2つの繋ぎ部の中間位置を通る直線上に、両隣の開口配列部の繋ぎの位置があり、該中間位置の開口幅は両隣の繋ぎ部によっても固定されるため、各開口配列部11Aの開口11の幅の固定は、該開口の長手方向の長さを決める繋ぎ部2つと該2つの繋ぎ部の中間位置の両隣の開口配列部の繋ぎ部2つの、計4箇所で固定されることとなり、開口配列部の各開口の幅の固定位置の間隔は、実質的に(P1/2)となる。
このように、本願請求項1の発明においては、開口配列部11Aの隣接する繋ぎ部12間のピッチはP1 とした場合、開口配列部の開口の幅の固定位置の間隔は、実質的に(P1/2)となり、これにより、配列させた開口配列部の開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制でき、開口幅のバラツキを小さく抑制できるメタルマスクの提供を可能としている。
In the metal mask of the invention according to claim 1, when the interval between adjacent connecting portions of each opening sequence portions was P 1, as shown in FIG. 1, perpendicular to the longitudinal direction of the opening 11 of the aperture array portion 11A In the direction, there is a position of connection between the adjacent opening array portions on a straight line passing through an intermediate position between two adjacent connection portions of each opening array portion 11A, and the opening width of the intermediate position is also determined by the adjacent connection portions. Since the width of the opening 11 of each opening array portion 11A is fixed, the two connecting portions that determine the length of the opening in the longitudinal direction and the connecting portion between the opening array portions adjacent to each other between the two connecting portions are fixed. It is fixed at two places in total, and the interval between the fixed positions of the widths of the openings of the opening array portion is substantially (P1 / 2).
Thus, in the invention according to claim 1, when the pitch between adjacent connecting portions 12 of the opening sequence unit 11A which has a P 1, the distance between the fixed position of the width of the aperture of the aperture array unit, substantially (P1 / 2), thereby increasing the length in the longitudinal direction of the openings of the arranged opening arrangement portions, and when applying the tension to the frame body, the tape portion can be prevented from being twisted, It is possible to provide a metal mask that can suppress variations in opening width.

本発明のメタルマスク部材は、このような構成にすることにより、メタルマスクの開口配列部の各開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、開口幅のバラツキを抑制し易いメタルマスク部材の提供を可能としている。
有EL素子の形成用である場合には、特に有効である。
When the metal mask member of the present invention has such a configuration, the length in the longitudinal direction of each opening of the opening arrangement portion of the metal mask is increased, and when applied to the frame body by applying tension, It is possible to provide a metal mask member that can easily suppress variations in opening width.
This is particularly effective when used for the formation of an EL element.

本発明は、このように、枠体を用いてメタルマスクを展張する際に、配列させた開口配列部の各開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑え、開口幅の歪みを抑制できるメタルマスクの提供を可能とした。
また、そのようなメタルマスクを用いた、開口幅のバラツキを抑制し易いメタルマスク部材の提供を可能とした。
In the present invention, when the metal mask is expanded using the frame body, the length of each opening in the array of the opening array portions in the longitudinal direction is increased and the tension is applied to the frame body. In this case, it is possible to provide a metal mask capable of suppressing the warp of the tape portion and suppressing distortion of the opening width.
In addition, it is possible to provide a metal mask member using such a metal mask that can easily suppress variation in opening width.

本願発明のメタルマスクの開口配列部の開口状態を示した一部概略図である。It is the partial schematic diagram which showed the opening state of the opening arrangement | sequence part of the metal mask of this invention. 図2(a)は本願発明のメタルマスク部材の1例の概略斜視図で、図2(b)はA1−A2における一部断面図で、図1(c)は図1(b)のA3部の斜視図である。2A is a schematic perspective view of an example of the metal mask member of the present invention, FIG. 2B is a partial cross-sectional view taken along A1-A2, and FIG. 1C is A3 in FIG. 1B. It is a perspective view of a part. 比較例のメタルマスクの開口配列部の開口状態を示した一部概略図である。It is the partial schematic which showed the opening state of the opening arrangement | sequence part of the metal mask of a comparative example. 有機EL素子の概略構成図である。It is a schematic block diagram of an organic EL element. 従来のマスキング部材とその使用方法を説明するための概略図である。It is the schematic for demonstrating the conventional masking member and its usage.

先ず、本発明のメタルマスクの実施形態例を、図1に基づいて説明する。
本例のメタルマスク10は、図2(a)に示すように、張力をかけて枠体110に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板にエッチング加工により開口11を設けた有EL素子の形成用のメタルマスクで、有機EL素子の低分子有機層や陰極のパターニング形成に用いられる真空蒸着用のメタルマスクである。
図1中、太点線矢印は、枠体に取り付ける際に、張力をかける方向を示しており、図1のX方向、Y方向は、それぞれ、図2(a)でのX方向、Y方向と同じ方向です。
開口配列部11Aは、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部12を所定のピッチP1 で設けた開口形状で、テープ部(金属部とも言う)12A間に配され、所定のピッチ間隔で開口配列部11Aの開口11の長手方向に直交する方向に配列されている。
尚、先にも述べましたが、繋ぎ部は開口の長手方向において開口を分離する金属部分のことで、ここでの開口配列部11Aとは、開口11の長手方向に直線状に配列された全ての開口と繋ぎ部12とを併せた部分を意味し、また、スリット状の開口とは、所定幅で直線状に開口された開口を意味している。
各開口配列部11Aの各繋ぎ部12は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の前記直線の群である直線群は、前記所定の決められたピッチの半分のピッチで配されている。
各開口配列部については、それぞれ、隣接する開口配列部の長手方向の繋ぎ部配列に対して、開口配列部の長手方向で半ピッチ分ずれた状態で繋ぎ部が形成されている。
First, an embodiment of the metal mask of the present invention will be described with reference to FIG.
As shown in FIG. 2A, the metal mask 10 of this example is fixed to the frame body 110 by applying tension, and is used as a mask for selectively controlling the film formation region during vacuum film formation. This is a metal mask for forming an EL element having an opening 11 formed by etching in a metal plate, and is a metal mask for vacuum deposition used for patterning of a low molecular organic layer or a cathode of an organic EL element.
In FIG. 1, thick dotted arrows indicate directions in which tension is applied when attaching to the frame, and the X direction and Y direction in FIG. 1 are the X direction and Y direction in FIG. In the same direction.
The opening array portion 11A has an opening shape in which a plurality of connecting portions 12 are provided at a predetermined pitch P 1 across a direction orthogonal to the longitudinal direction of the opening with respect to the slit-shaped opening, and is a tape portion (also referred to as a metal portion). 12A are arranged in a direction perpendicular to the longitudinal direction of the openings 11 of the opening arrangement portion 11A at a predetermined pitch interval.
As described above, the connecting portion is a metal portion that separates the opening in the longitudinal direction of the opening, and the opening arrangement portion 11A here is linearly arranged in the longitudinal direction of the opening 11. It means a portion where all the openings and the connecting portion 12 are combined, and the slit-like opening means an opening opened linearly with a predetermined width.
Each connecting portion 12 of each opening array portion 11A is provided on every other opening array portion so as to be aligned on a straight line in a direction perpendicular to the longitudinal direction of the opening array portion, and all connecting portions of all opening array portions are connected. A straight line group, which is a group of the straight lines in a direction orthogonal to the longitudinal direction of the opening array part, in which the parts are arranged, is arranged at a pitch that is half of the predetermined predetermined pitch.
Each opening array portion is formed with a connecting portion that is shifted by a half pitch in the longitudinal direction of the opening array portion with respect to the connecting portion array in the longitudinal direction of the adjacent opening array portions.

本例においては、図1に示すように、各開口配列部11Aの隣接する繋ぎ部12間のピッチはP1 であるが、各開口11の長手方向を直交する方向、該開口の長手方向の中間を通る直線上に、両隣の開口配列部の繋ぎ部の位置があり、各開口11の長手方向の中間位置の開口幅は両隣開口配列部の繋ぎ部によっても実質的に固定される。
このため、各開口11の幅の固定は、該開口の長手方向の長さを決める2つの繋ぎ部12と、該2つの繋ぎ部12の中間位置を通り該開口の長手方向に直交する直線上の両隣の開口配列部11Aの繋ぎ部12の2つとの、計4箇所で固定されることとなり、開口配列部の開口の幅の固定位置の間隔は、実質的に(P1/2)となる。
簡単には、開口11aは、繋ぎ部12aと繋ぎ部12bと、隣接する両隣の開口配列部の繋ぎ部12c、12dとの4箇所において開口幅が固定されている。
In this example, as shown in FIG. 1, the pitch between adjacent connecting portions 12 of each opening array portion 11A is P 1 , but in the direction orthogonal to the longitudinal direction of each opening 11, the longitudinal direction of the opening On the straight line passing through the middle, there is a position of the connecting portion of the adjacent opening array portions, and the opening width at the intermediate position in the longitudinal direction of each opening 11 is substantially fixed by the connecting portion of the adjacent opening array portions.
For this reason, the width of each opening 11 is fixed on a straight line perpendicular to the longitudinal direction of the opening through two intermediate portions 12 that determine the length of the opening in the longitudinal direction and an intermediate position between the two connecting portions 12. Are fixed at a total of four locations with two of the connecting portions 12 of the opening array portions 11A adjacent to each other, and the interval between the fixed positions of the opening widths of the opening array portions is substantially (P1 / 2). .
In brief, the opening width of the opening 11a is fixed at four locations, that is, the connecting portion 12a, the connecting portion 12b, and the connecting portions 12c and 12d of the adjacent opening array portions.

これに対して、図3に示すように、各開口配列部の隣接する繋ぎ部の間隔をP1 とし、全ての開口配列部21Aについて繋ぎ部22の位置を開口配列部21Aの開口21の長手方向に直交する方向に揃えた形態を比較例として挙げると、開口配列部21Aの各開口21は、該開口配列部の隣接する2つの繋ぎ部22のみにより、開口幅を固定されることとなり、開口配列部21Aの各開口21の幅の固定位置の間隔はP1となる。
図3に示す形態の場合は、テープ部21Bのよれの面から、本願請求項1の発明に比べて、各開口配列部21Aの繋ぎ部22のピッチP2 を大きくとることはできない。
In contrast, as shown in FIG. 3, the spacing between adjacent connecting portions of each opening sequence portions and P 1, the longitudinal opening 21 positions an opening sequence portion 21A of the connecting portion 22 of all of the opening sequence portion 21A When a form aligned in a direction orthogonal to the direction is given as a comparative example, the opening width of each opening 21 of the opening array portion 21A is fixed only by two adjacent connecting portions 22 of the opening array portion, The interval between the fixed positions of the widths of the openings 21 of the opening array portion 21A is P1.
In the case of the form shown in FIG. 3, the pitch P 2 of the connecting portion 22 of each opening array portion 21A cannot be increased from the side of the tape portion 21B as compared with the invention of claim 1 of the present application.

メタルマスク10の展張りは、開口配列部11Aの開口11の長手方向に、図1に示す矢印方向に、テンションをかけるため、開口の長手幅が大きくなると、即ち、ピッチP1 が大きくなると開口の固定がない位置では、テープ部11Bのよれに起因した開口の幅のバラツキが発生することとなるが、本例のメタルマスク10においては、前述のように、開口配列部の開口の幅の固定位置の間隔は、実質的に(P1/2)となるため、ピッチP1 を大きくしても、即ち、開口11の長手方向の長さを長くしても、展張りの際に、テープ部12Aのよれの程度を低く抑えることを可能としている。
これにより、開口の長手方向を長くした、スリットタイプに近い形状として、展張りの際に、よれの程度を低く抑えることを可能としている。
一方、図3に示す形態の場合、各開口配列部の隣接する繋ぎ部の間隔をP1 とした場合、各開口21の幅の固定は、該開口の長手方向を決める2つの繋ぎ部22のみであるから、開口の幅の固定位置の間隔はP1 で、開口11の長手方向の長さを長くして、展張りの際に、テープ部12Aのよれの程度を低く抑えることは難しい。
図3に示す形態の場合、同じ展張りの条件下では、本発明のメタルマスクよりよれは大きく、ばらつきも大きくなってしまう。
Since the metal mask 10 is stretched in the longitudinal direction of the openings 11 of the opening array portion 11A in the direction of the arrow shown in FIG. 1, when the longitudinal width of the openings is increased, that is, when the pitch P 1 is increased, the openings are opened. However, in the metal mask 10 of this example, as described above, the opening width of the opening array portion is not uniform. Since the interval between the fixed positions is substantially (P1 / 2), even if the pitch P 1 is increased, that is, the longitudinal length of the openings 11 is increased, It is possible to suppress the degree of kinking of the portion 12A.
This makes it possible to keep the degree of twisting low at the time of spreading as a shape close to the slit type in which the longitudinal direction of the opening is lengthened.
On the other hand, if the form shown in FIG. 3, if the interval between adjacent connecting portions of each opening sequence portions was P 1, the fixed width of each opening 21, only two of the connecting portion 22 which determines the longitudinal direction of the opening Therefore, the interval between the fixed positions of the opening width is P 1 , and it is difficult to lengthen the length of the opening 11 in the longitudinal direction so as to keep the degree of twist of the tape portion 12A low during spreading.
In the case of the form shown in FIG. 3, under the same spreading condition, the warp is larger and the variation becomes larger than that of the metal mask of the present invention.

本例においては、メタルマスク10の素材を鉄−ニッケル系としたが、これは、枠体に展張りしてメタルマスク部材として用いられ、蒸着パターニングを行なう際、磁力によりメタルマスク部材全体、あるいはメタルマスク部を固定することができるからである。
尚、鉄−ニッケル系としては、42合金(42%ニッケル−鉄合金)、インバー材(Invar材と同じ、36%ニッケル−鉄合金)が挙げられるがこれに限定はされない。
勿論、蒸着パターニングを行なう際、磁力によりメタルマスク部材全体、あるいはメタルマスクを固定する必要がない場合には、素材としては、鉄−ニッケル系に限定はされない。
この場合、ステンレス材、銅材も素材として挙げられる。
In this example, the material of the metal mask 10 is made of iron-nickel, but this is used as a metal mask member that is spread on a frame, and when performing vapor deposition patterning, the whole metal mask member or This is because the metal mask portion can be fixed.
Examples of the iron-nickel system include, but are not limited to, 42 alloy (42% nickel-iron alloy) and Invar material (same as Invar material, 36% nickel-iron alloy).
Of course, when performing vapor deposition patterning, if it is not necessary to fix the entire metal mask member or the metal mask by magnetic force, the material is not limited to the iron-nickel system.
In this case, a stainless material and a copper material are also mentioned as a raw material.

本発明のメタルマスク10は、金属板部に1面付けのメタルマスクを複数面付けした状態で作製されて、図2(a)に示すように、枠体(フレームとも言う)110に、メタルマスク10に撓みが発生しないように、図2(a)に示す太点線矢印の方向に張力をかけながら、溶接固定している。
メタルマスク10を溶接固定するため枠体110としては、ステンレス材が挙げられるが、これに限定はされない。
尚、メタルマスク10の枠体110への固定方法としては、接着剤を用いて固定する方法や所定の治具を用いて固定する固定方法等も挙げられる。
接着剤を用いて固定する方法としては、予め、銀ペースト等の低融点金属を塗布して接着材としたり、真空接着剤を用いてもかまわない。
The metal mask 10 of the present invention is manufactured in a state where a plurality of single-sided metal masks are attached to the metal plate portion, and as shown in FIG. The mask 10 is welded and fixed while applying tension in the direction of the thick dotted arrow shown in FIG.
The frame 110 for fixing the metal mask 10 by welding includes stainless steel, but is not limited thereto.
Examples of the method for fixing the metal mask 10 to the frame 110 include a method of fixing using an adhesive and a method of fixing using a predetermined jig.
As a method of fixing using an adhesive, a low melting point metal such as a silver paste may be applied in advance to form an adhesive, or a vacuum adhesive may be used.

メタルマスク10の作製は、例えば、被加工基板の両面に耐エッチング性のレジスト膜を塗布し、両面のレジスト膜をフォトリソ法で所望の形状にパターニングしてレジストパタンを形成し、該レジストパタンを耐エッチング性膜として、両面エッチングして貫通させ、所望の形状に加工する。
エッチング加工後、レジスト膜の剥離や洗浄、乾燥の各処理を行う。
被加工基板の両面からのエッチングは、一度にあるいは2段階に分けて行う。
尚、2段エッチング法においては、はじめの片面側からのエッチング後、形成された貫通していない孔部に耐エッチング性の樹脂(バッキング材とも言う)を充填した後、他面側からエッチングを行ない孔部を貫通させる。
The metal mask 10 is produced by, for example, applying an etching-resistant resist film on both surfaces of a substrate to be processed, patterning the resist films on both surfaces into a desired shape by a photolithographic method, and forming the resist pattern. As an etching resistant film, etching is performed on both sides and processed into a desired shape.
After the etching process, the resist film is stripped, washed, and dried.
Etching from both sides of the substrate to be processed is performed at one time or in two stages.
In the two-stage etching method, after etching from one side of the first side, the formed non-penetrating hole is filled with an etching resistant resin (also called a backing material), and then etched from the other side. Go through the hole.

本例のメタルマスクの開口配列部間の金属部分であるテープ部12Aの断面形状は、図2(b)や図2(c)に示すように、有機EL素子形成のために蒸着時に素子形成側の開口幅が広くなるようにテーパーを付けた形状としてある。
尚、ここでは、開口幅はメタルマスクの表裏の狭い側の開口を開口幅としている。
As shown in FIGS. 2B and 2C, the cross-sectional shape of the tape portion 12A, which is a metal portion between the opening arrangement portions of the metal mask of this example, is formed during vapor deposition for forming an organic EL element. The opening is tapered so that the opening width on the side is wide.
Here, the opening width is the opening width on the narrow side of the front and back sides of the metal mask.

図1に示すメタルマスク10と、図3に示すメタルマスク20とを、いずれも、開口幅70μm、開口の長手方向の開口のピッチP1 =50mm、開口配列部に直交する方向の開口のピッチ200μm、繋ぎ部幅50μmとし、開口配列部の全長300mm、配列全体の幅を400mmとして、断面形状も同じくして、2段エッチング法にて作製し、それぞれ、張力2kgf/mm2 で枠体に貼りつけたものについて、テープ部の幅バラツキ、開口幅バラツキを評価したが、以下のような評価結果が得られた。
評価は、SOKIA製寸法測定機AMIC−701で、開孔幅を6000ポイント( 全列×3行) 、テープ幅を5997ポイント( 全列×3行) 測定して行った。
図1に示すメタルマスク10の場合は、テープ部の幅バラツキ3σで0.003mmで、開口幅のバラツキは3σで0.004mmとなり、また、図3に示すメタルマスク20の場合は、テープ部の幅バラツキ3σで0.003mm、開口幅のバラツキは3σで0.049mmとなった。
このように、図1に示すメタルマスク10の方が、図3に示すメタルマスク20に比べて、開口幅のバラツキを低く抑えることができた。
Each of the metal mask 10 shown in FIG. 1 and the metal mask 20 shown in FIG. 3 has an opening width of 70 μm, an opening pitch P 1 = 50 mm in the longitudinal direction of the openings, and an opening pitch in a direction orthogonal to the opening arrangement portion. 200 μm, connecting portion width 50 μm, opening array length 300 mm, entire array width 400 mm, the same cross-sectional shape, and produced by a two-step etching method, each with a tension of 2 kgf / mm 2 About the thing affixed, although the width variation of the tape part and the opening width variation were evaluated, the following evaluation results were obtained.
The evaluation was performed by measuring a hole width of 6000 points (all rows × 3 rows) and a tape width of 5997 points (all rows × 3 rows) with a dimension measuring machine AMIC-701 manufactured by SOKIA.
In the case of the metal mask 10 shown in FIG. 1, the tape portion width variation 3σ is 0.003 mm, and the opening width variation is 3σ 0.004 mm. In the case of the metal mask 20 shown in FIG. The width variation of 3σ was 0.003 mm, and the variation of the opening width was 0.049 mm at 3σ.
Thus, the metal mask 10 shown in FIG. 1 was able to suppress variation in the opening width to be lower than that of the metal mask 20 shown in FIG.

10 メタルマスク
11 開口
11a 開口
11A 開口配列部
12 繋ぎ部
12a〜12d 繋ぎ部
12A テープ部(金属部とも言う)
20 メタルマスク
21 開口
21A 開口配列部
22 繋ぎ部
22A テープ部(金属部とも言う)
100 メタルマスク部材
110 枠体
120 金属板部
120A テープ部(金属部とも言う)
120S 面
125 貫通孔部
130 スポット溶接部
140 1面付のメタルマスク
310 透明基板
320 陽極(ITO)
330 ホール輸送層
340 発光層
341 R(赤色)発光層
342 G(緑色)発光層
343 B(青色)発光層
350 電子輸送層
360 陰極
380 メタルマスク部
381 スリット部(貫通孔部とも言う)
382 面付け単位領域
390 枠体
DESCRIPTION OF SYMBOLS 10 Metal mask 11 Opening 11a Opening 11A Opening array part 12 Connecting part 12a-12d Connecting part 12A Tape part (it is also called a metal part)
20 Metal mask 21 Opening 21A Opening array part 22 Connecting part 22A Tape part (also called metal part)
DESCRIPTION OF SYMBOLS 100 Metal mask member 110 Frame 120 Metal plate part 120A Tape part (it is also called a metal part)
120S surface 125 through-hole portion 130 spot welded portion 140 metal mask 310 with one surface transparent substrate 320 anode (ITO)
330 hole transport layer 340 light emitting layer 341 R (red) light emitting layer 342 G (green) light emitting layer 343 B (blue) light emitting layer 350 electron transport layer 360 cathode 380 metal mask portion 381 slit portion (also referred to as through hole portion)
382 Imposition unit area 390 Frame

本発明のメタルマスクは、張力をかけて枠体に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板に開口を設けたメタルマスクであって、金属板に、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部を所定のピッチで設けた開口形状を有する開口配列部を、複数、前記長手方向に直交する方向に、配列しており、各開口配列部の各繋ぎ部は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の前記直線の群である直線群は、前記繋ぎ部の所定のピッチの半分のピッチであることを特徴とするものである。
そして、上記のメタルマスクであって、有機EL素子の形成用であることを特徴とするものである。
尚、繋ぎ部は開口の長手方向において開口を分離する金属部分のことで、ここでの開口配列部とは、開口の長手方向に直線状に配列された全ての開口と繋ぎ部とを併せた部分を意味し、また、スリット状の開口とは、所定幅で直線状に開口された開口を意味している。
The metal mask of the present invention is a metal mask provided with an opening in a metal plate, which is fixed to a frame body under tension and is used as a mask for selectively controlling a film formation region during vacuum film formation. A plurality of opening array portions having an opening shape in which a plurality of connecting portions straddling a slit-like opening in a direction orthogonal to the longitudinal direction of the opening are provided at a predetermined pitch on the metal plate in the longitudinal direction. Are arranged in a direction orthogonal to each other, and each connecting portion of each opening arrangement portion is provided every other opening arrangement portion so as to be aligned on a straight line in a direction perpendicular to the longitudinal direction of the opening arrangement portion, and The straight line group, which is a group of the straight lines in the direction orthogonal to the longitudinal direction of the opening array part, in which all joint parts of the whole opening array part are arrayed is a pitch that is half the predetermined pitch of the joint part. It is a feature.
And it is said metal mask, Comprising: It is for formation of an organic EL element , It is characterized by the above-mentioned.
In addition, a connection part is a metal part which isolate | separates an opening in the longitudinal direction of an opening, and the opening arrangement | sequence part here combines all the openings and connection parts arranged linearly in the longitudinal direction of the opening. A slit-like opening means an opening that is opened in a straight line with a predetermined width.

本発明のメタルマスク部材は、真空成膜する際に成膜領域を選択的に制御するためのマスクとして、金属板に開口を設けたメタルマスクを張力をかけて枠体に固定したマスク部材であって、前記メタルマスクとして、請求項1ないし請求項2のいずれか1項に記載のメタルマスクを用いていることを特徴とするものである。 The metal mask member of the present invention is a mask member in which a metal mask provided with an opening in a metal plate is tensioned and fixed to a frame body as a mask for selectively controlling a film formation region during vacuum film formation. there are, as the metal mask and is characterized that you have a metal mask according to any one of claims 1 to 2.

(作用)
本発明のメタルマスクは、このような構成にすることにより、配列させた開口配列部の各開口の長手方向の長さを長くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制でき、開口幅のバラツキを小さく抑制できるメタルマスクの提供を可能としている。
即ち、配列させた開口配列部の開口の形状がスリットタイプにできるだけ近くなるようにして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制できるメタルマスクの提供を可能としている。
具体的には、金属板に、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部を所定のピッチで設けた開口形状を有する開口配列部を、複数、前記長手方向に直交する方向に、配列しており、各開口配列部の各繋ぎ部は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の前記直線の群である直線群は、前記繋ぎ部の所定のピッチの半分のピッチであることにより、これを達成している。
即ち、1開口配列部の隣接する繋ぎ部の間隔を広くして、張力をかけて枠体に貼り付けた際に、テープ部のよれを抑制できるメタルマスクの提供を可能としている。
特に、有EL素子の形成用である場合には、特に有効である。
(Function)
When the metal mask of the present invention is configured in this way, the length of each opening in the array of openings arranged in the longitudinal direction is increased, and the tape is applied to the frame body under tension. Accordingly, it is possible to provide a metal mask that can suppress the wobbling of the portion and suppress the variation in the opening width.
In other words, it is possible to provide a metal mask that can prevent the tape part from twisting when it is attached to the frame with tension applied so that the shape of the openings of the arranged opening array part is as close as possible to the slit type. Yes.
Specifically, a plurality of opening array portions having an opening shape in which a plurality of connecting portions straddling a metal plate in a direction orthogonal to the longitudinal direction of the opening is provided at a predetermined pitch with respect to the slit-shaped opening, in a direction perpendicular to the longitudinal direction and arranged, the connecting portion of each aperture array unit are both one opening array unit every aligned in the direction of the straight line perpendicular to the longitudinal direction of the opening arrangement portion provided And a straight line group, which is a group of the straight lines in a direction orthogonal to the longitudinal direction of the opening array portion, in which all the joint portions of the all opening array portions are arranged, has a pitch that is half the predetermined pitch of the joint portions. This is achieved by being.
That is, it is possible to provide a metal mask that can suppress the warp of the tape portion when the gap between the adjacent connecting portions of one opening array portion is widened and applied to the frame body under tension.
This is particularly effective when used for forming an EL element.

先ず、本発明のメタルマスクの実施形態例を、図1に基づいて説明する。
本例のメタルマスク10は、図2(a)に示すように、張力をかけて枠体110に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板にエッチング加工により開口11を設けた有機EL素子の形成用のメタルマスクで、有機EL素子の低分子有機層や陰極のパターニング形成に用いられる真空蒸着用のメタルマスクである。
図1中、太点線矢印は、枠体に取り付ける際に、張力をかける方向を示しており、図1のX方向、Y方向は、それぞれ、図2(a)でのX方向、Y方向と同じ方向です。
開口配列部11Aは、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部12を所定のピッチP1 で設けた開口形状で、テープ部(金属部とも言う)12A間に配され、所定のピッチ間隔で開口配列部11Aの開口11の長手方向に直交する方向に配列されている。
尚、先にも述べましたが、繋ぎ部は開口の長手方向において開口を分離する金属部分のことで、ここでの開口配列部11Aとは、開口11の長手方向に直線状に配列された全ての開口と繋ぎ部12とを併せた部分を意味し、また、スリット状の開口とは、所定幅で直線状に開口された開口を意味している。
各開口配列部11Aの各繋ぎ部12は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の前記直線の群である直線群は、前記所定の決められたピッチの半分のピッチで配されている。
各開口配列部については、それぞれ、隣接する開口配列部の長手方向の繋ぎ部配列に対して、開口配列部の長手方向で半ピッチ分ずれた状態で繋ぎ部が形成されている。
First, an embodiment of the metal mask of the present invention will be described with reference to FIG.
As shown in FIG. 2A, the metal mask 10 of this example is fixed to the frame body 110 by applying tension, and is used as a mask for selectively controlling the film formation region during vacuum film formation. This is a metal mask for forming an organic EL element in which an opening 11 is provided on a metal plate by etching, and is a metal mask for vacuum evaporation used for patterning of a low molecular organic layer and a cathode of the organic EL element.
In FIG. 1, thick dotted arrows indicate directions in which tension is applied when attaching to the frame, and the X direction and Y direction in FIG. 1 are the X direction and Y direction in FIG. In the same direction.
The opening array portion 11A has an opening shape in which a plurality of connecting portions 12 are provided at a predetermined pitch P 1 across a direction orthogonal to the longitudinal direction of the opening with respect to the slit-shaped opening, and is a tape portion (also referred to as a metal portion). 12A are arranged in a direction perpendicular to the longitudinal direction of the openings 11 of the opening arrangement portion 11A at a predetermined pitch interval.
As described above, the connecting portion is a metal portion that separates the opening in the longitudinal direction of the opening, and the opening arrangement portion 11A here is linearly arranged in the longitudinal direction of the opening 11. It means a portion where all the openings and the connecting portion 12 are combined, and the slit-like opening means an opening opened linearly with a predetermined width.
Each connecting portion 12 of each opening array portion 11A is provided on every other opening array portion so as to be aligned on a straight line in a direction perpendicular to the longitudinal direction of the opening array portion, and all connecting portions of all opening array portions are connected. A straight line group, which is a group of the straight lines in a direction orthogonal to the longitudinal direction of the opening array part, in which the parts are arranged, is arranged at a pitch that is half of the predetermined predetermined pitch.
Each opening array portion is formed with a connecting portion that is shifted by a half pitch in the longitudinal direction of the opening array portion with respect to the connecting portion array in the longitudinal direction of the adjacent opening array portions.

Claims (3)

張力をかけて枠体に固定され、真空成膜する際に成膜領域を選択的に制御するためのマスクとして用いられる、金属板に開口を設けたメタルマスクであって、金属板に、スリット状の開口に対して該開口の長手方向を直交する方向に跨ぐ複数の繋ぎ部を所定のピッチで設けた開口形状を有する開口配列部を、複数、前記長手方向に直交する方向に、所定の決められたピッチで配列しており、各開口配列部の各繋ぎ部は、いずれも、1開口配列部おきに、開口配列部の長手方向に直交する方向の直線上に揃えて設けられ、且つ、全開口配列部の全繋ぎ部が配列される、開口配列部の長手方向に直交する方向の直線群は、前記所定の決められたピッチの半分のピッチであることを特徴とするメタルマスク。   A metal mask provided with an opening in a metal plate, which is fixed to the frame body under tension and used as a mask for selectively controlling the film formation region when vacuum film formation is performed. A plurality of opening arrangement portions having an opening shape in which a plurality of connecting portions straddling a direction orthogonal to the longitudinal direction of the opening are provided at a predetermined pitch with respect to the shape of the opening in a direction orthogonal to the longitudinal direction. Are arranged at a determined pitch, and each connecting portion of each opening arrangement portion is provided on every other opening arrangement portion so as to be aligned on a straight line in a direction perpendicular to the longitudinal direction of the opening arrangement portion, and The straight line group in the direction orthogonal to the longitudinal direction of the opening array portion where all the connecting portions of the entire opening array portion are arrayed is a half pitch of the predetermined determined pitch. 請求項1に記載のメタルマスクであって、有EL素子の形成用であることを特徴とするメタルマスク。   The metal mask according to claim 1, wherein the metal mask is used for forming an EL element. 真空成膜する際に成膜領域を選択的に制御するためのマスクとして、金属板に開口を設けたメタルマスクを張力をかけて枠体に固定したマスク部材であって、前記メタルマスクとして、請求項1ないし請求項2のいずれか1項に記載のメタルマスクを用ていることを特徴とするメタルマスク部材。   As a mask for selectively controlling a film formation region when performing vacuum film formation, a mask member in which a metal mask provided with an opening in a metal plate is tensioned and fixed to a frame body, and as the metal mask, A metal mask member, wherein the metal mask according to claim 1 is used.
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