JP2012079878A5 - - Google Patents
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- JP2012079878A5 JP2012079878A5 JP2010222957A JP2010222957A JP2012079878A5 JP 2012079878 A5 JP2012079878 A5 JP 2012079878A5 JP 2010222957 A JP2010222957 A JP 2010222957A JP 2010222957 A JP2010222957 A JP 2010222957A JP 2012079878 A5 JP2012079878 A5 JP 2012079878A5
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- JP
- Japan
- Prior art keywords
- light emission
- waveform
- plasma processing
- unit
- timer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000012545 processing Methods 0.000 claims description 23
- 238000001514 detection method Methods 0.000 claims description 8
- 230000002123 temporal effect Effects 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 6
- 238000003672 processing method Methods 0.000 claims description 4
- 238000012958 reprocessing Methods 0.000 claims description 3
- 238000009832 plasma treatment Methods 0.000 claims 5
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010222957A JP5654309B2 (ja) | 2010-09-30 | 2010-09-30 | エンドポイントモニタ及びプラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010222957A JP5654309B2 (ja) | 2010-09-30 | 2010-09-30 | エンドポイントモニタ及びプラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012079878A JP2012079878A (ja) | 2012-04-19 |
| JP2012079878A5 true JP2012079878A5 (https=) | 2013-12-05 |
| JP5654309B2 JP5654309B2 (ja) | 2015-01-14 |
Family
ID=46239789
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010222957A Active JP5654309B2 (ja) | 2010-09-30 | 2010-09-30 | エンドポイントモニタ及びプラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5654309B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9899694B2 (en) | 2012-07-27 | 2018-02-20 | Lockheed Martin Advanced Energy Storage, Llc | Electrochemical energy storage systems and methods featuring high open circuit potential |
| US9768463B2 (en) | 2012-07-27 | 2017-09-19 | Lockheed Martin Advanced Energy Storage, Llc | Aqueous redox flow batteries comprising metal ligand coordination compounds |
| US9865893B2 (en) | 2012-07-27 | 2018-01-09 | Lockheed Martin Advanced Energy Storage, Llc | Electrochemical energy storage systems and methods featuring optimal membrane systems |
| US9559374B2 (en) | 2012-07-27 | 2017-01-31 | Lockheed Martin Advanced Energy Storage, Llc | Electrochemical energy storage systems and methods featuring large negative half-cell potentials |
| EP2878021B1 (en) * | 2012-07-27 | 2020-12-09 | Lockheed Martin Energy, LLC | Electrochemical systems featuring high open circuit potential |
| US12046522B2 (en) * | 2022-02-18 | 2024-07-23 | Applied Materials, Inc. | Endpoint detection in low open area and/or high aspect ratio etch applications |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2611001B2 (ja) * | 1989-07-17 | 1997-05-21 | 株式会社日立製作所 | 終点判定方法および装置 |
| JP2002231695A (ja) * | 2001-01-31 | 2002-08-16 | Sony Corp | プラズマ処理の終点判定方法 |
-
2010
- 2010-09-30 JP JP2010222957A patent/JP5654309B2/ja active Active
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