JP2012031240A5 - - Google Patents

Download PDF

Info

Publication number
JP2012031240A5
JP2012031240A5 JP2010169956A JP2010169956A JP2012031240A5 JP 2012031240 A5 JP2012031240 A5 JP 2012031240A5 JP 2010169956 A JP2010169956 A JP 2010169956A JP 2010169956 A JP2010169956 A JP 2010169956A JP 2012031240 A5 JP2012031240 A5 JP 2012031240A5
Authority
JP
Japan
Prior art keywords
mass
component
acrylate
following
mpa
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2010169956A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012031240A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010169956A priority Critical patent/JP2012031240A/ja
Priority claimed from JP2010169956A external-priority patent/JP2012031240A/ja
Priority to PCT/JP2011/067217 priority patent/WO2012014961A1/ja
Priority to US13/193,658 priority patent/US20120029110A1/en
Publication of JP2012031240A publication Critical patent/JP2012031240A/ja
Publication of JP2012031240A5 publication Critical patent/JP2012031240A5/ja
Abandoned legal-status Critical Current

Links

JP2010169956A 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物 Abandoned JP2012031240A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2010169956A JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物
PCT/JP2011/067217 WO2012014961A1 (ja) 2010-07-29 2011-07-28 微細構造転写用の光重合性樹脂組成物
US13/193,658 US20120029110A1 (en) 2010-07-29 2011-07-29 Photopolymerizable resin composition for transferring microstructure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010169956A JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2012031240A JP2012031240A (ja) 2012-02-16
JP2012031240A5 true JP2012031240A5 (https=) 2013-01-10

Family

ID=45527356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010169956A Abandoned JP2012031240A (ja) 2010-07-29 2010-07-29 微細構造転写用の光重合性樹脂組成物

Country Status (3)

Country Link
US (1) US20120029110A1 (https=)
JP (1) JP2012031240A (https=)
WO (1) WO2012014961A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6037627B2 (ja) * 2011-03-30 2016-12-07 協立化学産業株式会社 インプリント成型用光硬化性樹脂組成物、インプリント成型硬化体及びこれらの製造方法
KR20150013477A (ko) * 2012-05-25 2015-02-05 소켄 케미칼 앤드 엔지니어링 캄파니, 리미티드 임프린트용 광 경화성 수지 조성물, 그 제조 방법 및 구조체
EP2911184B1 (en) * 2012-10-22 2019-07-24 Soken Chemical & Engineering Co., Ltd. Photocurable resin composition for imprinting, method for producing mold for imprinting, and mold for imprinting
JP6460672B2 (ja) 2013-09-18 2019-01-30 キヤノン株式会社 膜の製造方法、光学部品の製造方法、回路基板の製造方法及び電子部品の製造方法
JP6339346B2 (ja) * 2013-11-05 2018-06-06 太陽インキ製造株式会社 プリント配線板用硬化型組成物、これを用いた硬化塗膜及びプリント配線板
WO2015068703A1 (ja) 2013-11-05 2015-05-14 太陽インキ製造株式会社 硬化型組成物、これを用いた硬化塗膜及びプリント配線板
US11195813B2 (en) * 2014-02-04 2021-12-07 Dexerials Corporation Anisotropic conductive film and production method of the same
JP6797529B2 (ja) * 2015-01-21 2020-12-09 東洋合成工業株式会社 光学部材の製造方法及びそれに用いられる組成物
WO2019237228A1 (zh) * 2018-06-11 2019-12-19 厦门三安光电有限公司 发光组件
JP7490476B2 (ja) * 2019-08-20 2024-05-27 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4668558A (en) * 1978-07-20 1987-05-26 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
US5626800A (en) * 1995-02-03 1997-05-06 Minnesota Mining And Manufacturing Company Prevention of groove tip deformation in brightness enhancement film
JP4013532B2 (ja) * 2001-11-26 2007-11-28 東亞合成株式会社 光学部材用活性エネルギー線硬化型組成物
JP4156415B2 (ja) * 2003-03-20 2008-09-24 大日本印刷株式会社 賦型方法、賦型フィルム、及び射出成形品
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
JP4247335B2 (ja) * 2003-05-27 2009-04-02 サンノプコ株式会社 放射線硬化性組成物
JP2006063144A (ja) * 2004-08-25 2006-03-09 Jsr Corp 液状硬化性樹脂組成物
JP4770354B2 (ja) * 2005-09-20 2011-09-14 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いたパターン形成方法
CN101253227B (zh) * 2005-10-04 2011-05-18 日本印帝股份公司 具有特定的表面形状与物性的结构体及用于形成该结构体的(甲基)丙烯酸系聚合性组合物
JP5243887B2 (ja) * 2008-02-12 2013-07-24 富士フイルム株式会社 ナノインプリント用硬化性組成物およびパターン形成方法
US20130004718A1 (en) * 2010-03-17 2013-01-03 Tsuyoshi Takihara Active energy ray curable resin composition and article having fine concave-convex structure on surface

Similar Documents

Publication Publication Date Title
JP2012031240A5 (https=)
WO2014036498A3 (en) Dual mechanism thickening agents for hydraulic fracturing fluids
JP2011516694A5 (https=)
JP2010045351A5 (https=)
JP2009024168A5 (https=)
JP2012520430A5 (https=)
JP2009256608A5 (https=)
JP2018150550A5 (https=)
JP2010500717A5 (https=)
JP2011517716A5 (https=)
JP2006526563A5 (https=)
JP2013504644A5 (https=)
JP2013510216A5 (https=)
JP2015158565A5 (https=)
WO2011101260A3 (en) Sulfonamide-containing photoresist compositions and methods of use
TW201612232A (en) Photosensitive resin composition, resist laminate and cured product thereof
JP2012517503A5 (https=)
JP2010116441A5 (https=)
JP2015158628A5 (https=)
JP2017538856A5 (https=)
JP2010500432A5 (https=)
JP2011520594A5 (https=)
JP2007186709A5 (https=)
JP2007186562A5 (ja) ポリ乳酸含有樹脂組成物
JP2008542461A5 (https=)