JP2012001686A - Gasified gas manufacturing system and method - Google Patents

Gasified gas manufacturing system and method Download PDF

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JP2012001686A
JP2012001686A JP2010140505A JP2010140505A JP2012001686A JP 2012001686 A JP2012001686 A JP 2012001686A JP 2010140505 A JP2010140505 A JP 2010140505A JP 2010140505 A JP2010140505 A JP 2010140505A JP 2012001686 A JP2012001686 A JP 2012001686A
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JP5672791B2 (en
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Toru Mori
徹 森
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IHI Corp
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Abstract

PROBLEM TO BE SOLVED: To effectively use drainage, generated by the production of a gasified gas, as boiler water.SOLUTION: A gasified gas manufacturing system includes a gasification means for gasifying a combustible raw material using water vapor generated with a boiler 2, and a gas purification means for purifying the gasified gas generated by the gasification means, wherein the gas purification means performs the organic component removing treatment and the nitrogen component removing treatment on the drainage generated from the purification of the gasified gas to generate the boiler water to be supplied to the boiler 2.

Description

本発明は、ガス化ガス製造システム及び方法に関する。   The present invention relates to a gasification gas production system and method.

特許文献1、2には、石炭のガス化設備で発生した生成ガス(ガス化ガス)を精製する技術として、生成ガス中に含まれる塩化水素、シアン化水素、アンモニアを水洗塔で洗浄水に吸収させ、該洗浄水をストリッパで減圧すると共に蒸気で加熱してシアン化水素、アンモニアを気体として分離し、分離したシアン化水素、アンモニアを燃焼炉で燃焼処理する一方、洗浄水の一部を水洗塔に戻してリサイクルすることが記載されている。また、特許文献1に記載されたガス化ガスの精製装置では、各種の精製処理を経た排水に安水活性汚泥処理設備で活性汚泥処理を施す。なお、上記ガス化設備では、原料である可燃性廃棄物や石炭にボイラで発生させた水蒸気を付加し900℃程度まで加熱することによりガス化ガスを発生させる。   In Patent Documents 1 and 2, as a technology for purifying a generated gas (gasification gas) generated in a coal gasification facility, hydrogen chloride, hydrogen cyanide, and ammonia contained in the generated gas are absorbed in the washing water by a washing tower. The washing water is decompressed with a stripper and heated with steam to separate hydrogen cyanide and ammonia as gas, and the separated hydrogen cyanide and ammonia are combusted in a combustion furnace, while a part of the washing water is returned to the washing tower for recycling. It is described to do. Moreover, in the refiner | purifier of the gasification gas described in patent document 1, the activated sludge process is performed to the waste_water | drain which passed through the various refinement | purification processes with a water-resistant activated sludge process equipment. In the gasification facility, gasified gas is generated by adding steam generated by a boiler to combustible waste or coal as a raw material and heating it to about 900 ° C.

特開2007−045857号公報JP 2007-045857 A 特開2006−232904号公報JP 2006-232904 A

ところで、上述したようにガス化設備には水蒸気を発生させるボイラが不可欠である。これに対して、例えば原料となる低品位炭が採掘される地域では水の入手が困難な場合が多く、このような地域に建設されたガス化設備では、ボイラ水が極めて貴重なものとなっている。上述した従来技術は、このような貴重なボイラ水を考慮に入れたものではなく、ボイラ水の入手を考慮した石炭ガス化システムの開発が切望されている。   By the way, as mentioned above, the boiler which generates water vapor | steam is indispensable for gasification equipment. On the other hand, for example, it is often difficult to obtain water in an area where low-grade coal as a raw material is mined, and boiler water becomes extremely valuable in a gasification facility constructed in such an area. ing. The above-described prior art does not take such precious boiler water into consideration, and development of a coal gasification system that takes into account the availability of boiler water is eagerly desired.

また、上記排水の活性汚泥処理では、有機成分を十分に除去することができず、特にガス化ガスの製造過程に何らかの不具合が発生してガス化ガスに規定値を超えるタール成分が混入した場合に排水処理が不安定にあるという問題がある。したがって、活性汚泥処理は、ガス化ガスの製造過程で発生する排水の処理として好ましいものではない。   In the activated sludge treatment of waste water, organic components cannot be removed sufficiently, especially when some trouble occurs in the gasification gas production process and tar components exceeding the specified value are mixed in the gasification gas. However, there is a problem that the waste water treatment is unstable. Therefore, the activated sludge treatment is not preferable as a treatment of waste water generated in the process of producing gasification gas.

本発明は、上述した事情に鑑みてなされたものであり、ガス化ガスの製造過程で発生した排水をボイラ水として有効活用することを目的とするものである。また、本発明は、ガス化ガスの製造過程で発生した排水を安定して処理することをも目的としている。   This invention is made | formed in view of the situation mentioned above, and aims at using effectively the waste_water | drain generated in the manufacture process of gasification gas as boiler water. Another object of the present invention is to stably treat waste water generated in the process of producing gasification gas.

上記目的を達成するために、本発明では、ガス化ガス製造システムに係る第1の解決手段として、ボイラで生成した水蒸気を用いて可燃性原料をガス化するガス化手段と、該ガス化手段で生成されたガス化ガスを精製するガス精製手段と、を具備し、前記ガス精製手段は、ガス化ガスの精製から発生した排水に有機成分除去処理及び窒素成分除去処理を施すことにより前記ボイラに供するためのボイラ水を生成する、という手段を採用する。   In order to achieve the above object, in the present invention, as a first solution means for a gasification gas production system, a gasification means for gasifying a combustible raw material using water vapor generated in a boiler, and the gasification means A gas purification means for purifying the gasified gas produced in step (i), wherein the gas purification means performs an organic component removal treatment and a nitrogen component removal treatment on the wastewater generated from the purification of the gasification gas. The means of generating boiler water to be used for

ガス化ガス製造システムに係る第2の解決手段として、上記第1の解決手段において、前記ガス精製手段は、無機イオン除去処理あるいは蒸留処理のいずれか一方あるいは両方をさらに施す、という手段を採用する。   As the second solving means relating to the gasification gas production system, in the first solving means, the gas purification means further adopts a means in which either or both of an inorganic ion removing process and a distillation process are further performed. .

ガス化ガス製造システムに係る第3の解決手段として、上記第1または第2の解決手段において、前記ガス精製手段は、排水に有機成分除去処理を施す設備として、少なくとも凝集沈殿槽を備える、という手段を採用する。   As the third solving means relating to the gasification gas production system, in the first or second solving means, the gas purification means includes at least a coagulation sedimentation tank as equipment for performing organic component removal treatment on the waste water. Adopt means.

ガス化ガス製造システムに係る第4の解決手段として、上記第1〜第3のいずれかの解決手段において、前記ガス精製手段は、排水に窒素成分除去処理を施す設備としてアンモニアトリッピング装置を備える、という手段を採用する。   As a fourth solving means related to the gasification gas production system, in any one of the first to third solving means, the gas purification means includes an ammonia tripping device as equipment for performing nitrogen component removal treatment on the waste water, Adopt the means.

ガス化ガス製造システムに係る第5の解決手段として、上記第2〜第4のいずれかの解決手段において、前記ガス精製手段は、無機イオン除去処理を施す設備としてイオン交換膜を備える、という手段を採用する。   As a fifth solving means relating to the gasification gas production system, in any one of the second to fourth solving means, the gas purification means includes an ion exchange membrane as equipment for performing an inorganic ion removing process. Is adopted.

また、本発明では、ガス化ガス製造方法に係る第1の解決手段として、ボイラで生成した水蒸気を用いて可燃性原料からガス化ガスを生成し、該ガス化ガスに不純物を除去する精製処理を施すガス化ガス製造方法であって、前記精製処理から発生した排水に有機成分除去処理及び有機成分除去処理を施すことにより前記ボイラに供するためのボイラ水を生成する、という手段を採用する。   Further, in the present invention, as a first solving means related to the gasified gas production method, a purification process is performed in which gasified gas is generated from a combustible raw material using water vapor generated in a boiler and impurities are removed from the gasified gas. A method for producing gasified gas, wherein the waste water generated from the purification treatment is subjected to organic component removal treatment and organic component removal treatment to generate boiler water for use in the boiler.

本発明によれば、ガス化ガスの精製で発生した排水から有機成分及び窒素成分を除去するので、ボイラ水として要求される程度の排水を清浄化してボイラ水として有効活用することができる。   According to the present invention, since organic components and nitrogen components are removed from wastewater generated by purification of gasification gas, wastewater to the extent required as boiler water can be purified and effectively used as boiler water.

本発明の一実施形態に係るガス化ガス製造システムのシステム構成図である。It is a system configuration figure of the gasification gas manufacturing system concerning one embodiment of the present invention. 本発明の一実施形態に係るガス化ガス製造システムにおける排水処理装置8の機能構成を示すブロック図である。It is a block diagram which shows the function structure of the waste water treatment equipment 8 in the gasification gas manufacturing system which concerns on one Embodiment of this invention.

以下、図面を参照して、本発明の一実施形態について説明する。
本実施形態に係るガス化ガス製造システムは、図1に示すように、ガス化炉1、ボイラ2、酸化改質炉3、直接冷却器4、間接冷却器5、コンプレッサ6、脱硫・脱CO装置7、また排水処理装置8によって構成されている。このような各構成要素のうち、ガス化炉1及びボイラ2及び排水処理装置8はガス化手段を構成し、また酸化改質炉3、直接冷却器4、間接冷却器5、コンプレッサ6及び脱硫・脱CO装置7は、ガス精製手段を構成している。
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
As shown in FIG. 1, the gasification gas production system according to this embodiment includes a gasification furnace 1, a boiler 2, an oxidation reforming furnace 3, a direct cooler 4, an indirect cooler 5, a compressor 6, a desulfurization / de-CO. 2 device 7 and waste water treatment device 8. Among these components, the gasification furnace 1, the boiler 2, and the waste water treatment device 8 constitute gasification means, and the oxidation reforming furnace 3, the direct cooler 4, the indirect cooler 5, the compressor 6, and the desulfurization. and de-CO 2 device 7 constitute a gas purification unit.

以下に詳説するが、このようなガス化ガス製造システムは、可燃性原料を水蒸気を用いてガス化ガスにガス化すると共に、当該ガス化ガスに不純物を除去するための精製処理を施して製品ガス(ガス化ガス)を製造する設備である。なお、本実施形態における可燃性原料は、石炭である。   As will be described in detail below, such a gasification gas production system is a product obtained by gasifying a combustible raw material into a gasification gas using water vapor and subjecting the gasification gas to a purification treatment to remove impurities. This is a facility for producing gas (gasification gas). In addition, the combustible raw material in this embodiment is coal.

ガス化炉1は、投入口から投入された可燃性原料にボイラ2から供給された水蒸気を混合させて例えば900℃程度まで加熱することにより、可燃性原料をガス化する装置である。すなわち、ガス化炉1は、燃焼室を備えており、当該燃焼室で燃料を燃焼させて発生する熱を用いて水蒸気と混合した状態の可燃性原料を900℃程度まで加熱することによりガス化ガスを発生させる。このようなガス化炉1で発生したガス化ガスは、ガス化炉1から酸化改質炉3に排出される。   The gasification furnace 1 is a device that gasifies the combustible raw material by mixing the combustible raw material supplied from the inlet with the water vapor supplied from the boiler 2 and heating it to about 900 ° C., for example. That is, the gasification furnace 1 includes a combustion chamber, and gasifies by heating the combustible raw material mixed with water vapor to about 900 ° C. using heat generated by burning fuel in the combustion chamber. Generate gas. The gasification gas generated in such a gasification furnace 1 is discharged from the gasification furnace 1 to the oxidation reforming furnace 3.

ボイラ2は、上記ガス化炉1の燃焼室で発生する熱を用いて排水処理装置8から供給されたボイラ水を加熱して水蒸気を発生させる装置である。すなわち、このボイラ2は、上記ガス化炉1の排熱を回収してボイラ水を気化させる排熱回収ボイラであり、自らが発生した水蒸気をガス化炉1に供給する。酸化改質炉3は、水素を燃料として燃焼させて得られる熱によってガス化ガスを例えば1100〜1300℃まで加熱することにより酸化改質する装置である。この酸化改質炉3には、改質処理されたガス化ガスの排出口近傍に冷却水を噴霧する冷却水噴霧装置が備えられており、当該冷却水の噴霧によって例えば1000〜1200℃まで冷却したガス化ガスを直接冷却器4に排出する。   The boiler 2 is a device that generates steam by heating the boiler water supplied from the waste water treatment device 8 using heat generated in the combustion chamber of the gasification furnace 1. That is, the boiler 2 is an exhaust heat recovery boiler that recovers exhaust heat of the gasification furnace 1 and vaporizes boiler water, and supplies the steam generated by itself to the gasification furnace 1. The oxidation reforming furnace 3 is an apparatus that performs oxidation reforming by heating a gasification gas to, for example, 1100 to 1300 ° C. by heat obtained by burning hydrogen as fuel. The oxidation reforming furnace 3 is provided with a cooling water spray device that sprays cooling water in the vicinity of the outlet of the reformed gasification gas, and is cooled to, for example, 1000 to 1200 ° C. by spraying the cooling water. The gasified gas thus discharged is directly discharged to the cooler 4.

直接冷却器4は、上記酸化改質炉3から供給されたガス化ガスに冷却水を噴霧することにより直接冷却する装置である。この直接冷却器4は、冷却後のガス化ガスを間接冷却器5に排出すると共に、当該直接冷却に供された後の冷却水を排水として排水処理装置8に排出する。間接冷却器5は、熱交換器であり、冷却水との熱交換によってガス化ガスを間接冷却してコンプレッサ6に排出すると共に、当該間接冷却に供された後の冷却水を排水として排水処理装置8に排出する。   The direct cooler 4 is a device that directly cools the gasified gas supplied from the oxidation reforming furnace 3 by spraying cooling water. The direct cooler 4 discharges the gasified gas after cooling to the indirect cooler 5, and discharges the cooling water supplied to the direct cooling to the waste water treatment device 8 as waste water. The indirect cooler 5 is a heat exchanger that indirectly cools the gasified gas by exchanging heat with the cooling water and discharges it to the compressor 6, and drains the cooling water after being used for the indirect cooling as waste water. It discharges to the device 8.

コンプレッサ6は、ガス化ガス中に含まれるタール成分の飽和蒸気濃度を低下させるために、ガス化ガスを例えば1〜5MPaまで昇圧する装置である。なお、このコンプレッサ6では、上記タール成分等の一部成分が凝縮水としてある程度凝縮する。コンプレッサ6は、このような凝縮水を排水として排水処理装置8に排出する。脱硫・脱CO装置7は、ガス化ガスに含まれる硫黄(S)及び二酸化炭素(CO)を除去する装置である。脱硫や脱COの方式についてはいくつかのものが知られているが、この脱硫・脱CO装置7としては何れの方式のものでも良い。 The compressor 6 is a device that boosts the gasification gas to, for example, 1 to 5 MPa in order to reduce the saturated vapor concentration of the tar component contained in the gasification gas. In the compressor 6, some components such as the tar component are condensed to some extent as condensed water. The compressor 6 discharges such condensed water as waste water to the waste water treatment device 8. The desulfurization / de-CO 2 device 7 is a device that removes sulfur (S) and carbon dioxide (CO 2 ) contained in the gasification gas. Although desulfurization and the removal CO 2 system are known some things may be of any type as the desulfurization and removal CO 2 device 7.

排水処理装置8は、上記直接冷却器4、間接冷却器5及びコンプレッサ6から供給される各排水を浄化処理し、ボイラ水として上記ボイラ2に供給するものである。この排水処理装置8は、本ガス化ガス製造システムを構成する各種構成要素のうち、最も特徴的な構成要素であり、図2に示すように沈殿池8a、凝集沈殿槽8b、アンモニアトリッピング装置8c、第1蒸留装置8d、第1イオン交換装置8e、第2蒸留装置8f、第2イオン交換装置8g及び選択装置8hから構成されている。   The waste water treatment device 8 purifies each waste water supplied from the direct cooler 4, the indirect cooler 5 and the compressor 6 and supplies the waste water as boiler water to the boiler 2. This waste water treatment device 8 is the most characteristic component among the various components constituting the gasification gas production system, and as shown in FIG. 2, a sedimentation tank 8a, a coagulation sedimentation tank 8b, and an ammonia tripping device 8c. The first distillation device 8d, the first ion exchange device 8e, the second distillation device 8f, the second ion exchange device 8g, and the selection device 8h.

沈殿池8aは、静置分離法に基づいて有機成分を沈殿させて排水から分離するものであり、上澄水を処理水として凝集沈殿槽8bに排水する。凝集沈殿槽8bは、上記処理水に凝集剤を添加することにより処理水中に残存する有機成分を強制的に凝集除去するものであり、有機成分を強制凝集除去した処理水をアンモニアトリッピング装置8cに排水する。アンモニアトリッピング装置8cは、凝集沈殿槽8bから供給された処理水中に含まれる窒素成分(アンモニアとして存在する)を水と化学反応させることによりアンモニアガスとして分離除去する装置である。アンモニアトリッピング装置8cは、窒素成分を除去した処理水を第1蒸留装置8d、第2蒸留装置8f及び第2イオン交換装置8gに排水する。   The sedimentation basin 8a precipitates organic components based on the stationary separation method and separates them from the waste water, and drains the supernatant water into the coagulation sedimentation tank 8b as treated water. The coagulation sedimentation tank 8b forcibly removes the organic components remaining in the treated water by adding a coagulant to the treated water, and the treated water from which the organic components are forcibly removed by coagulation is supplied to the ammonia tripping device 8c. Drain. The ammonia tripping device 8c is a device that separates and removes nitrogen components (existing as ammonia) contained in the treated water supplied from the coagulation sedimentation tank 8b as ammonia gas by chemically reacting with water. The ammonia tripping device 8c drains the treated water from which the nitrogen component has been removed to the first distillation device 8d, the second distillation device 8f, and the second ion exchange device 8g.

第1蒸留装置8dは、アンモニアトリッピング装置8cから供給された処理水に蒸留処理を施すことにより処理水中に残存するタール成分等の各種固形物を除去するものである。この第1蒸留装置8dは、タール成分等の固形物が除去された蒸留水を第1イオン交換装置8eに排水する。第1イオン交換装置8eは、上記蒸留水に含まれる無機イオンをイオン交換膜によって除去する装置である。この第1イオン交換装置8eは、無機イオンが除去されたイオン交換膜の透過水を選択装置8hに排水する。   The first distillation device 8d is for removing various solids such as tar components remaining in the treated water by subjecting the treated water supplied from the ammonia tripping device 8c to a distillation treatment. The first distillation apparatus 8d drains distilled water from which solids such as tar components have been removed to the first ion exchange apparatus 8e. The first ion exchange device 8e is a device that removes inorganic ions contained in the distilled water with an ion exchange membrane. The first ion exchange device 8e drains the permeated water of the ion exchange membrane from which inorganic ions have been removed to the selection device 8h.

第2蒸留装置8fは、上記第1蒸留装置8dと同様に、アンモニアトリッピング装置8cから供給された処理水に蒸留処理を施すことにより、処理水中に残存するタール成分等の固形物を除去するものである。この第2蒸留装置8fは、蒸留水を選択装置8hに排水する。第2イオン交換装置8gは、アンモニアトリッピング装置8cから供給された処理水に含まれる無機イオンをイオン交換膜によって除去する装置である。この第2イオン交換装置8gは、イオン交換膜の透過水を選択装置8hに排水する。   Similarly to the first distillation apparatus 8d, the second distillation apparatus 8f removes solids such as tar components remaining in the treated water by subjecting the treated water supplied from the ammonia tripping apparatus 8c to a distillation treatment. It is. The second distillation device 8f drains distilled water to the selection device 8h. The second ion exchange device 8g is a device that removes inorganic ions contained in the treated water supplied from the ammonia tripping device 8c with an ion exchange membrane. The second ion exchange device 8g drains the permeated water of the ion exchange membrane to the selection device 8h.

選択装置8hは、上記第1イオン交換装置8e、第2蒸留装置8f、第2イオン交換装置8gあるいはアンモニアトリッピング装置8cのいずれか1つを択一的に選択する装置である。この選択装置8hは、自らが選択した装置から供給される透過水、蒸留水あるいは処理水をボイラ水として上記ボイラ2に供給する。   The selection device 8h is a device that selectively selects any one of the first ion exchange device 8e, the second distillation device 8f, the second ion exchange device 8g, and the ammonia tripping device 8c. The selection device 8h supplies permeated water, distilled water or treated water supplied from the device selected by itself to the boiler 2 as boiler water.

なお、上記第1蒸留装置8d及び第2蒸留装置8fは、ガス化ガス製造システムの全体的なエネルギー効率を向上させるために、ガス化炉1の排熱を利用して蒸留処理を行うことが好ましい。   The first distillation apparatus 8d and the second distillation apparatus 8f perform distillation using the exhaust heat of the gasification furnace 1 in order to improve the overall energy efficiency of the gasification gas production system. preferable.

次に、本ガス化ガス製造システムの動作について詳しく説明する。
本ガス化ガス製造システムでは、ガス化手段によって水蒸気を用いて可燃性原料からガス化ガスが生成され、当該ガス化ガスはガス精製手段によって生成されることによって製品ガスとなる。そして、このガス精製手段によるガス化ガスの精製過程において各種の排水が発生するが、これら排水は、ガス精製手段の構成要素である排水処理装置8によってボイラ水として再利用できるまでに浄化されてガス化手段を構成するボイラ2に供給される。
Next, the operation of the gasified gas production system will be described in detail.
In this gasification gas production system, gasification gas is generated from a combustible raw material using water vapor by the gasification means, and the gasification gas becomes product gas by being generated by the gas purification means. Various types of wastewater are generated during the purification process of the gasification gas by the gas purification means. These wastewaters are purified by the wastewater treatment device 8 that is a component of the gas purification means until they can be reused as boiler water. It is supplied to the boiler 2 constituting the gasification means.

すなわち、直接冷却器4、間接冷却器5及びコンプレッサ6で発生した各排水は、排水処理装置8において最上流に位置する沈殿池8に順次供給される。このような排水は、水を主成分とするが、直接冷却器4においてガス化ガスと気液接触したものやコンプレッサ6において凝縮したもの等であり、ガス化炉1における生成過程や酸化改質炉3における酸化改質過程でタール成分や有機成分、また無機成分を不純物として含むものである。このような排水は、上記不純物に起因してボイラ2がボイラ水として要求する純度を下回るものである。   That is, each waste water generated by the direct cooler 4, the indirect cooler 5, and the compressor 6 is sequentially supplied to the settling basin 8 positioned in the uppermost stream in the waste water treatment device 8. Such wastewater is mainly composed of water, but is directly in gas-liquid contact with the gasification gas in the cooler 4 or condensed in the compressor 6, and the generation process or oxidation reforming in the gasification furnace 1. In the oxidation reforming process in the furnace 3, a tar component, an organic component, and an inorganic component are included as impurities. Such drainage is less than the purity required by the boiler 2 as boiler water due to the impurities.

一般的に、ボイラは低圧ボイラと高圧ボイラとに分類されるが、高圧ボイラは低圧ボイラよりも純度の高いボイラ水を必要とするように設計されている。また、このような分類に各々属するボイラにおいても設計仕様に応じてボイラ水に求められる純度(水質)は異なる。したがって、上記排水をボイラ水に利用するためには、不純物を除去することによりボイラ種別や設計仕様に応じて要求される純度まで排水を浄化する必要がある。   Generally, boilers are classified into low-pressure boilers and high-pressure boilers, but high-pressure boilers are designed to require boiler water having a higher purity than low-pressure boilers. In addition, the purity (water quality) required for boiler water varies depending on the design specifications in the boilers belonging to each of these categories. Therefore, in order to use the waste water for boiler water, it is necessary to purify the waste water to a purity required according to the boiler type and design specifications by removing impurities.

本ガス化ガス製造システムの排水処理装置8において最上流に位置する沈殿池8aは、上記直接冷却器4、間接冷却器5及びコンプレッサ6から順次供給される排水を一定期間静置することにより当該排水に含まれる比較的沈殿し易い有機成分を沈殿させて分離除去する。しかしながら、沈殿池8aにおける有機成分の除去は必ずしも十分なものではないので、沈殿池8aの処理水(上澄み水)は、後段の凝集沈殿槽8bに導入されて凝集剤が添加され、残存する有機成分が強制的に凝集沈殿処理される。このような沈殿池8a及び凝集沈殿槽8bによって排水中の有機成分は、ボイラ2が要求するボイラ水の残存有機成分の許容値を満足するものとなる。   The sedimentation basin 8a located at the uppermost stream in the wastewater treatment device 8 of the gasification gas production system is configured to allow the wastewater sequentially supplied from the direct cooler 4, the indirect cooler 5 and the compressor 6 to stand for a certain period. Organic components contained in the waste water that are relatively easily precipitated are precipitated and separated and removed. However, since removal of organic components in the sedimentation basin 8a is not always sufficient, the treated water (supernatant water) of the sedimentation basin 8a is introduced into the subsequent agglomeration sedimentation tank 8b, added with a flocculant, and the remaining organic The components are forcibly coagulated and precipitated. The organic components in the wastewater satisfy the allowable value of the remaining organic components in the boiler water required by the boiler 2 by the sedimentation basin 8a and the coagulation sedimentation tank 8b.

そして、沈殿池8a及び凝集沈殿槽8bにおいて有機成分が除去された処理水は、アンモニアトリッピング装置8cにおいてボイラ2が要求するボイラ水の残存窒素成分の許容値を満足するように窒素成分がアンモニアとして分離除去される。そして、アンモニアトリッピング装置8cにおいて窒素成分が除去された処理水は、第1蒸留装置8d、第2蒸留装置8fあるいは第2イオン交換装置8gで択一的に処理されることによりタール成分等の固形物除去あるいは無機イオン除去が行われた後に、選択装置8hからボイラ2にボイラ水として供給される。   The treated water from which the organic components have been removed in the settling basin 8a and the coagulation settling tank 8b is converted into ammonia so that the nitrogen content of the treated water in the ammonia tripping device 8c satisfies the allowable value of the residual nitrogen component required by the boiler 2. Separated and removed. Then, the treated water from which the nitrogen component has been removed in the ammonia tripping device 8c is selectively treated by the first distillation device 8d, the second distillation device 8f, or the second ion exchange device 8g, whereby solids such as tar components are obtained. After object removal or inorganic ion removal is performed, boiler water is supplied to the boiler 2 from the selection device 8h.

すなわち、アンモニアトリッピング装置8cから第1蒸留装置8dに供給された処理水は、当該第1蒸留装置8dでタール成分等の固形物が除去され、さらに第1イオン交換装置8eにおいて無機イオンが除去された後に、選択装置8hを介してボイラ2にボイラ水として供給される。一方、アストリッピング装置8cから第2蒸留装置8fに供給された処理水は、当該第2蒸留装置8fでタール成分等の固形物が除去された後に、選択装置8hを介してボイラ2にボイラ水として供給される。一方、アンモニアトリッピング装置8cから第2イオン交換装置8gに供給された処理水は、当該第2イオン交換装置8gにおいて無機イオンが除去された後に、選択装置8hを介してボイラ2にボイラ水として供給される。   That is, in the treated water supplied from the ammonia tripping device 8c to the first distillation device 8d, solids such as tar components are removed by the first distillation device 8d, and inorganic ions are removed by the first ion exchange device 8e. After that, it is supplied as boiler water to the boiler 2 via the selection device 8h. On the other hand, the treated water supplied from the astripping device 8c to the second distillation device 8f is supplied to the boiler 2 via the selection device 8h after the solid matter such as the tar component is removed by the second distillation device 8f. Supplied as On the other hand, the treated water supplied from the ammonia tripping device 8c to the second ion exchange device 8g is supplied as boiler water to the boiler 2 via the selection device 8h after the inorganic ions are removed in the second ion exchange device 8g. Is done.

選択装置8hは、このような3つの処理経路であられたボイラ水とアンモニアトリッピング装置8cから排出された処理水をそのままボイラ水とする処理経路のうち、ボイラ2がボイラ水として要求する純度(水質)を満足する処理経路で処理された処理水を選択してボイラ2に供給する。すなわち、第1蒸留装置8dと第1イオン交換装置8eとからなる処理経路(第1処理経路)は、タール成分等の固形物と無機イオンとの両方を除去するものなので、3つの処理経路のうち最も純度の高い(水質が最も良好な)ボイラ水をボイラ2に提供できるものである。   The selection device 8h has the purity (water quality) required by the boiler 2 as boiler water out of the treatment routes in which the boiler water that is the three treatment routes and the treatment water discharged from the ammonia tripping device 8c are used as boiler water as they are. ) Is selected and supplied to the boiler 2. That is, since the processing path (first processing path) composed of the first distillation apparatus 8d and the first ion exchange apparatus 8e removes both solid substances such as tar components and inorganic ions, the three processing paths The boiler water with the highest purity (the best water quality) can be provided to the boiler 2.

一方、第2蒸留装置8fからなる処理経路(第2処理経路)は、タール成分等の固形物のみを除去するものであり、よって第1処理経路を経て生成されたボイラ水よりも無機イオンの残存量が多いボイラ水をボイラ2に提供するものである。一方、第2イオン交換装置8gからなる処理経路(第3処理経路)は、無機イオンのみを除去するものであり、よって第1処理経路を経て生成されたボイラ水よりもタール成分等の固形物の残存量が多いボイラ水をボイラ2に提供するものである。一方、アンモニアトリッピング装置8cから排出された処理水をそのままボイラ水とする処理経路(第4処理経路)は、第1処理経路を経て生成されたボイラ水よりもタール成分等の固形物及び無機イオンの残存量が多いボイラ水をボイラ2に提供するものである。   On the other hand, the treatment path (second treatment path) composed of the second distillation apparatus 8f removes only solids such as tar components, and thus more inorganic ions than boiler water generated through the first treatment path. The boiler water with a large remaining amount is provided to the boiler 2. On the other hand, the processing path (third processing path) composed of the second ion exchange device 8g removes only inorganic ions, and therefore solids such as tar components rather than boiler water generated through the first processing path. The boiler water with a large amount of remaining is provided to the boiler 2. On the other hand, in the treatment path (fourth treatment path) in which the treated water discharged from the ammonia tripping device 8c is used as boiler water as it is, solid substances such as tar components and inorganic ions are generated more than the boiler water generated through the first treatment path. The boiler water with a large amount of remaining is provided to the boiler 2.

このような本実施形態によれば、ガス化ガスの精製で発生した排水から有機成分を少なくとも除去するので、排水をボイラ水として有効活用することができる。また、選択装置8hによってタール成分等の固形物と無機イオンの除去処理を択一的に選択できるので、有機成分の除去に加えて、必要に応じてタール成分等の固形物あるいは/及び無機イオンが除去されたボイラ水をボイラ2に供給することができる。
また、本実施形態によれば、活性汚泥処理を利用することなく排水を処理するので、ガス化ガスの製造過程で発生した排水を安定して処理することをも目的としている。
According to the present embodiment as described above, since at least organic components are removed from the wastewater generated by purification of the gasification gas, the wastewater can be effectively used as boiler water. Further, since the selection device 8h can selectively select a solid component such as a tar component and inorganic ions, the solid component such as the tar component and / or inorganic ions can be selected as necessary in addition to the removal of the organic component. The boiler water from which the water is removed can be supplied to the boiler 2.
Moreover, according to this embodiment, since waste water is processed without using activated sludge processing, it aims also to process stably the waste water generated in the production process of gasification gas.

なお、本発明は上記実施形態に限定されるものではなく、例えば以下のような変形例が考えられる。
(1)上記実施形態では石炭を可燃性原料とし、この関係で排水にタール成分や有機成分、また無機成分が不純物としてまれるが、可燃性原料は石炭に限定されるものではない。ガス化炉1に供される可燃性原料としては、石炭の他に、例えば都市ごみ、産業廃棄物、汚泥、農業廃棄物等の各種廃棄物等の固形燃料やバイオマス等が考えられ、可燃性原料の性状に応じて排水に含まれる不純物は異なるので、タール成分や有機成分、また無機成分の他にボイラ水として不都合な成分(例えば塩素成分やシアン成分)を除去する装置を追加しても良い。
In addition, this invention is not limited to the said embodiment, For example, the following modifications can be considered.
(1) In the above embodiment, coal is used as a combustible raw material, and in this connection, tar components, organic components, and inorganic components are contained as impurities in the wastewater. However, the combustible raw material is not limited to coal. As the combustible raw material to be supplied to the gasification furnace 1, in addition to coal, solid fuel such as various types of waste such as municipal waste, industrial waste, sludge, and agricultural waste, biomass, and the like can be considered. Impurities contained in the wastewater differ depending on the properties of the raw materials, so even if a device that removes tar components, organic components, and inorganic components that are inconvenient as boiler water (such as chlorine components and cyan components) is added. good.

(2)上記実施形態では、第1〜第4処理経路を選択装置8hで択一的に選択するようにしたが、本発明はこれに限定されない。例えば排水処理装置8を沈殿池8a、凝集沈殿槽8b及びアンモニアトリッピング装置8cのみから構成するようにしても良く、また沈殿池8a、凝集沈殿槽8b及びアンモニアトリッピング装置8cに第1蒸留装置8d及び第1イオン交換装置8eのみを加えた構成、あるいは沈殿池8a、凝集沈殿槽8b及びアンモニアトリッピング装置8cに第2蒸留装置8fのみを加えた構成、あるいは沈殿池8a、凝集沈殿槽8b及びアンモニアトリッピング装置8cに第2イオン交換装置8gのみを加えた構成としても良い。 (2) In the above embodiment, the first to fourth processing paths are alternatively selected by the selection device 8h, but the present invention is not limited to this. For example, the waste water treatment device 8 may be composed of only the sedimentation basin 8a, the coagulation sedimentation tank 8b, and the ammonia tripping device 8c, and the first distillation apparatus 8d and the sedimentation basin 8a, the coagulation sedimentation tank 8b, and the ammonia tripping device 8c A configuration in which only the first ion exchange device 8e is added, or a configuration in which only the second distillation device 8f is added to the sedimentation tank 8a, the coagulation sedimentation tank 8b, and the ammonia tripping device 8c, or a sedimentation tank 8a, the coagulation sedimentation tank 8b, and the ammonia tripping. It is good also as a structure which added only the 2nd ion exchange apparatus 8g to the apparatus 8c.

(3)上記実施形態では、ガス精製手段を酸化改質炉3、直接冷却器4、間接冷却器5、コンプレッサ6、脱硫・脱CO装置7及び排水処理装置8によって構成するようにしたが、本発明はこれに限定されない。本発明の要旨は、ガス化ガスの製造過程で発生する排水をボイラ水とすることにあるので、排水をボイラ水とするために必要な装置以外の装置構成は種々の構成が取り得る。 (3) In the above embodiment, the gas purification means is constituted by the oxidation reforming furnace 3, the direct cooler 4, the indirect cooler 5, the compressor 6, the desulfurization / deoxygenation CO 2 device 7 and the waste water treatment device 8. However, the present invention is not limited to this. Since the gist of the present invention is to use boiler water as wastewater generated in the process of producing gasified gas, various device configurations other than those necessary for using wastewater as boiler water can take various configurations.

(4)上記実施形態では、排水処理装置8で得られる処理水をボイラ水としてボイラ2に供給するようにしたが、排水処理装置8が出力する処理水の量がボイラ2が必要とするボイラ水の量を上回る場合には、排水処理装置8が出力する処理水の一部を冷却水として酸化改質炉3、直接冷却器4、間接冷却器5に供給するようにしても良い。 (4) In the said embodiment, although the treated water obtained with the waste water treatment apparatus 8 was supplied to the boiler 2 as boiler water, the amount of the treated water which the waste water treatment apparatus 8 outputs requires the boiler 2. When the amount of water is exceeded, a part of the treated water output from the waste water treatment device 8 may be supplied to the oxidation reforming furnace 3, the direct cooler 4, and the indirect cooler 5 as cooling water.

1…ガス化炉、2…ボイラ、3…酸化改質炉、4…直接冷却器、5…間接冷却器、6…コンプレッサ、7…脱硫・脱CO装置、8…排水処理装置、8a…沈殿池、8b…凝集沈殿槽、8c…アンモニアトリッピング装置、8d…第1蒸留装置、8e…第1イオン交換装置、8f…第2蒸留装置、8g…第2イオン交換装置、8h…選択装置 1 ... gasification furnace, 2 ... boiler, 3 ... oxidation reformer, 4 ... direct cooler, 5 ... indirect cooler, 6 ... compressor, 7 ... desulfurization and removal CO 2 device, 8 ... waste water treatment apparatus, 8a ... Precipitation basin, 8b ... Coagulation sedimentation tank, 8c ... Ammonia tripping device, 8d ... First distillation device, 8e ... First ion exchange device, 8f ... Second distillation device, 8g ... Second ion exchange device, 8h ... Selection device

Claims (6)

ボイラで生成した水蒸気を用いて可燃性原料をガス化するガス化手段と、
該ガス化手段で生成されたガス化ガスを精製するガス精製手段と、を具備し、
前記ガス精製手段は、ガス化ガスの精製から発生した排水に有機成分除去処理及び窒素成分除去処理を施すことにより前記ボイラに供するためのボイラ水を生成する
ことを特徴とするガス化ガス製造システム。
Gasification means for gasifying a combustible raw material using water vapor generated in a boiler;
Gas purification means for purifying the gasification gas produced by the gasification means,
The gas purification means generates boiler water for use in the boiler by performing an organic component removal process and a nitrogen component removal process on the wastewater generated from the purification of the gasification gas. .
前記ガス精製手段は、無機イオン除去処理あるいは蒸留処理のいずれか一方あるいは両方をさらに施すことを特徴とする請求項1記載のガス化ガス製造システム。   2. The gasification gas production system according to claim 1, wherein the gas purification means further performs one or both of an inorganic ion removal process and a distillation process. 前記ガス精製手段は、排水に有機成分除去処理を施す設備として、少なくとも凝集沈殿槽を備えることを特徴とする請求項1または2記載のガス化ガス製造システム。   The gasification gas production system according to claim 1 or 2, wherein the gas purification means includes at least a coagulation sedimentation tank as equipment for performing an organic component removal treatment on the waste water. 前記ガス精製手段は、排水に窒素成分除去処理を施す設備としてアンモニアトリッピング装置を備えることを特徴とする請求項1〜3のいずれか一項に記載のガス化ガス製造システム。   The gasification gas production system according to any one of claims 1 to 3, wherein the gas purification means includes an ammonia tripping device as equipment for performing a nitrogen component removal process on the waste water. 前記ガス精製手段は、無機イオン除去処理を施す設備としてイオン交換膜を備えることを特徴とする請求項2〜4のいずれか一項に記載のガス化ガス製造システム。   The gasification gas production system according to any one of claims 2 to 4, wherein the gas purification means includes an ion exchange membrane as equipment for performing an inorganic ion removal treatment. ボイラで生成した水蒸気を用いて可燃性原料からガス化ガスを生成し、該ガス化ガスに不純物を除去する精製処理を施すガス化ガス製造方法であって、
前記精製処理から発生した排水に有機成分除去処理及び有機成分除去処理を施すことにより前記ボイラに供するためのボイラ水を生成することを特徴とするガス化ガス製造方法。
A gasified gas production method for producing a gasification gas from a combustible raw material using water vapor generated in a boiler and subjecting the gasification gas to a purification treatment to remove impurities,
The gasification gas manufacturing method characterized by producing | generating boiler water for supplying to the said boiler by performing the organic component removal process and the organic component removal process to the waste_water | drain produced | generated from the said refinement | purification process.
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