JP2011524023A - 感光性ペーストおよび焼結層 - Google Patents

感光性ペーストおよび焼結層 Download PDF

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Publication number
JP2011524023A
JP2011524023A JP2011511839A JP2011511839A JP2011524023A JP 2011524023 A JP2011524023 A JP 2011524023A JP 2011511839 A JP2011511839 A JP 2011511839A JP 2011511839 A JP2011511839 A JP 2011511839A JP 2011524023 A JP2011524023 A JP 2011524023A
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JP
Japan
Prior art keywords
meth
weight
phosphate
content
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2011511839A
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English (en)
Japanese (ja)
Other versions
JP2011524023A5 (enExample
Inventor
和重 伊藤
正勝 黒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2011524023A publication Critical patent/JP2011524023A/ja
Publication of JP2011524023A5 publication Critical patent/JP2011524023A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2011511839A 2008-05-30 2009-05-29 感光性ペーストおよび焼結層 Withdrawn JP2011524023A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5734308P 2008-05-30 2008-05-30
US61/057,343 2008-05-30
PCT/US2009/045590 WO2009146400A1 (en) 2008-05-30 2009-05-29 Photosensitive paste and sintered layer

Publications (2)

Publication Number Publication Date
JP2011524023A true JP2011524023A (ja) 2011-08-25
JP2011524023A5 JP2011524023A5 (enExample) 2012-05-24

Family

ID=40972812

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011511839A Withdrawn JP2011524023A (ja) 2008-05-30 2009-05-29 感光性ペーストおよび焼結層

Country Status (6)

Country Link
US (1) US8221958B2 (enExample)
JP (1) JP2011524023A (enExample)
KR (1) KR20110014673A (enExample)
CN (1) CN102046677A (enExample)
TW (1) TW201005433A (enExample)
WO (1) WO2009146400A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120139392A (ko) * 2011-06-17 2012-12-27 삼성디스플레이 주식회사 디스플레이 패널, 그 제조방법 및 이에 사용되는 프릿 조성물
TWI460743B (zh) * 2012-01-12 2014-11-11 Innolux Corp 包含觸控面板之影像顯示系統及觸控面板之製造方法
US20150064479A1 (en) * 2013-08-30 2015-03-05 Guardian Industries Corp. Heat treatable painted glass substrate, and/or method of making the same
WO2017010343A1 (ja) * 2015-07-10 2017-01-19 東レ株式会社 導電ペースト、タッチセンサー部材及び導電パターンの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533689A (en) * 1982-09-01 1985-08-06 Mitsubishi Rayon Company, Limited Flame resistant acrylic resin composition and process for its production
US6197480B1 (en) 1995-06-12 2001-03-06 Toray Industries, Inc. Photosensitive paste, a plasma display, and a method for the production thereof
JP3510761B2 (ja) 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3920449B2 (ja) 1998-03-13 2007-05-30 太陽インキ製造株式会社 アルカリ現像型光硬化性組成物及びそれを用いて得られる焼成物パターン
CN1318915C (zh) * 1999-07-12 2007-05-30 太阳油墨制造株式会社 碱显影型光固化性组合物及使用该组合物所得的烧成物图案
JP3827196B2 (ja) 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
JP3757886B2 (ja) 2002-01-25 2006-03-22 株式会社村田製作所 光反応性樹脂組成物、それを用いた回路基板およびセラミック多層基板の製造方法
JP3943057B2 (ja) 2003-07-11 2007-07-11 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
DE10331888B4 (de) * 2003-07-14 2005-11-10 Clariant Gmbh Elastisches Belagmaterial mit verbesserten Flammschutzeigenschaften sowie ein Verfahren zu dessen Herstellung
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Also Published As

Publication number Publication date
WO2009146400A1 (en) 2009-12-03
TW201005433A (en) 2010-02-01
CN102046677A (zh) 2011-05-04
US20100136484A1 (en) 2010-06-03
KR20110014673A (ko) 2011-02-11
US8221958B2 (en) 2012-07-17

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