TW201005433A - Photosensitive paste and sintered layer - Google Patents

Photosensitive paste and sintered layer Download PDF

Info

Publication number
TW201005433A
TW201005433A TW098118111A TW98118111A TW201005433A TW 201005433 A TW201005433 A TW 201005433A TW 098118111 A TW098118111 A TW 098118111A TW 98118111 A TW98118111 A TW 98118111A TW 201005433 A TW201005433 A TW 201005433A
Authority
TW
Taiwan
Prior art keywords
content
paste
photosensitive paste
methyl
poly
Prior art date
Application number
TW098118111A
Other languages
English (en)
Chinese (zh)
Inventor
Kazushige Ito
Masakatsu Kuroki
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of TW201005433A publication Critical patent/TW201005433A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW098118111A 2008-05-30 2009-06-01 Photosensitive paste and sintered layer TW201005433A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US5734308P 2008-05-30 2008-05-30

Publications (1)

Publication Number Publication Date
TW201005433A true TW201005433A (en) 2010-02-01

Family

ID=40972812

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098118111A TW201005433A (en) 2008-05-30 2009-06-01 Photosensitive paste and sintered layer

Country Status (6)

Country Link
US (1) US8221958B2 (enExample)
JP (1) JP2011524023A (enExample)
KR (1) KR20110014673A (enExample)
CN (1) CN102046677A (enExample)
TW (1) TW201005433A (enExample)
WO (1) WO2009146400A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI460743B (zh) * 2012-01-12 2014-11-11 Innolux Corp 包含觸控面板之影像顯示系統及觸控面板之製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120139392A (ko) * 2011-06-17 2012-12-27 삼성디스플레이 주식회사 디스플레이 패널, 그 제조방법 및 이에 사용되는 프릿 조성물
US20150064479A1 (en) * 2013-08-30 2015-03-05 Guardian Industries Corp. Heat treatable painted glass substrate, and/or method of making the same
KR102370118B1 (ko) * 2015-07-10 2022-03-04 도레이 카부시키가이샤 도전 페이스트, 터치 센서 부재 및 도전 패턴의 제조 방법
JP2024033515A (ja) * 2022-08-30 2024-03-13 株式会社村田製作所 感光性ペースト、配線パターンの形成方法、電子部品の製造方法および電子部品

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4533689A (en) * 1982-09-01 1985-08-06 Mitsubishi Rayon Company, Limited Flame resistant acrylic resin composition and process for its production
US6197480B1 (en) 1995-06-12 2001-03-06 Toray Industries, Inc. Photosensitive paste, a plasma display, and a method for the production thereof
JP3510761B2 (ja) 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3920449B2 (ja) 1998-03-13 2007-05-30 太陽インキ製造株式会社 アルカリ現像型光硬化性組成物及びそれを用いて得られる焼成物パターン
WO2001004705A1 (en) * 1999-07-12 2001-01-18 Taiyo Ink Manufacturing Co., Ltd. Alkali development type photocurable composition and pattern of burned matter obtained from the same
JP3827196B2 (ja) 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
JP3757886B2 (ja) 2002-01-25 2006-03-22 株式会社村田製作所 光反応性樹脂組成物、それを用いた回路基板およびセラミック多層基板の製造方法
JP3943057B2 (ja) 2003-07-11 2007-07-11 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
DE10331888B4 (de) * 2003-07-14 2005-11-10 Clariant Gmbh Elastisches Belagmaterial mit verbesserten Flammschutzeigenschaften sowie ein Verfahren zu dessen Herstellung
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI460743B (zh) * 2012-01-12 2014-11-11 Innolux Corp 包含觸控面板之影像顯示系統及觸控面板之製造方法

Also Published As

Publication number Publication date
US20100136484A1 (en) 2010-06-03
JP2011524023A (ja) 2011-08-25
KR20110014673A (ko) 2011-02-11
CN102046677A (zh) 2011-05-04
WO2009146400A1 (en) 2009-12-03
US8221958B2 (en) 2012-07-17

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