JP2011523971A - スルホニウム塩及び潜在性酸としての使用 - Google Patents

スルホニウム塩及び潜在性酸としての使用 Download PDF

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Publication number
JP2011523971A
JP2011523971A JP2011512932A JP2011512932A JP2011523971A JP 2011523971 A JP2011523971 A JP 2011523971A JP 2011512932 A JP2011512932 A JP 2011512932A JP 2011512932 A JP2011512932 A JP 2011512932A JP 2011523971 A JP2011523971 A JP 2011523971A
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JP
Japan
Prior art keywords
alkyl
interrupted
compound
formula
cycloalkyl
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Withdrawn
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JP2011512932A
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English (en)
Japanese (ja)
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JP2011523971A5 (https=
Inventor
祐一 西前
敏景 朝倉
斉 山戸
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BASF SE
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BASF SE
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Application filed by BASF SE filed Critical BASF SE
Publication of JP2011523971A publication Critical patent/JP2011523971A/ja
Publication of JP2011523971A5 publication Critical patent/JP2011523971A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D327/00—Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms
    • C07D327/02—Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms one oxygen atom and one sulfur atom
    • C07D327/06—Six-membered rings
    • C07D327/08—[b,e]-condensed with two six-membered carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2011512932A 2008-06-12 2009-06-02 スルホニウム塩及び潜在性酸としての使用 Withdrawn JP2011523971A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08158090.4 2008-06-12
EP08158090 2008-06-12
PCT/EP2009/056703 WO2009150074A1 (en) 2008-06-12 2009-06-02 Sulfonium derivatives and the use thereof as latent acids

Publications (2)

Publication Number Publication Date
JP2011523971A true JP2011523971A (ja) 2011-08-25
JP2011523971A5 JP2011523971A5 (https=) 2012-07-19

Family

ID=40469989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011512932A Withdrawn JP2011523971A (ja) 2008-06-12 2009-06-02 スルホニウム塩及び潜在性酸としての使用

Country Status (7)

Country Link
US (1) US20110171569A1 (https=)
EP (1) EP2288599A1 (https=)
JP (1) JP2011523971A (https=)
KR (1) KR20110025211A (https=)
CN (1) CN102056913A (https=)
TW (1) TW201004934A (https=)
WO (1) WO2009150074A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022164586A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2022164585A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622448B2 (ja) * 2010-06-15 2014-11-12 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、高分子化合物、化合物
JP6002705B2 (ja) * 2013-03-01 2016-10-05 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、電子デバイスの製造方法
TWI575566B (zh) 2014-02-24 2017-03-21 東京威力科創股份有限公司 與光敏化化學放大光阻化學品及程序一起使用的方法及技術
US10020195B2 (en) 2014-02-25 2018-07-10 Tokyo Electron Limited Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
US10429745B2 (en) 2016-02-19 2019-10-01 Osaka University Photo-sensitized chemically amplified resist (PS-CAR) simulation
US10048594B2 (en) 2016-02-19 2018-08-14 Tokyo Electron Limited Photo-sensitized chemically amplified resist (PS-CAR) model calibration
WO2017197279A1 (en) 2016-05-13 2017-11-16 Tokyo Electron Limited Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resist
CN109313395B (zh) 2016-05-13 2021-05-14 东京毅力科创株式会社 通过使用光剂来进行的临界尺寸控制
KR102898764B1 (ko) 2019-08-16 2025-12-10 도쿄엘렉트론가부시키가이샤 확률 중심 결함 교정을 위한 방법 및 공정
US12566375B2 (en) * 2021-05-06 2026-03-03 Sumitomo Chemical Company, Limited Salt, acid generator, resist composition and method for producing resist pattern
JP7687292B2 (ja) * 2021-07-28 2025-06-03 信越化学工業株式会社 ネガ型レジスト材料及びパターン形成方法
TW202328061A (zh) * 2021-11-09 2023-07-16 日商住友化學股份有限公司 鹽、酸產生劑、樹脂、抗蝕劑組成物及抗蝕劑圖案的製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
EP1902019B1 (en) * 2005-07-01 2010-07-07 Basf Se Sulphonium salt initiators
CN101466804B (zh) * 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
WO2007147782A2 (en) * 2006-06-20 2007-12-27 Ciba Holding Inc. Oxime sulfonates and the use therof as latent acids
CN101522613B (zh) * 2006-10-04 2013-03-06 西巴控股有限公司 锍盐光引发剂
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
CN101952269B (zh) * 2007-10-10 2014-06-25 巴斯夫欧洲公司 锍盐引发剂
KR101599562B1 (ko) * 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022164586A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP2022164585A (ja) * 2021-04-15 2022-10-27 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Also Published As

Publication number Publication date
CN102056913A (zh) 2011-05-11
EP2288599A1 (en) 2011-03-02
TW201004934A (en) 2010-02-01
WO2009150074A1 (en) 2009-12-17
KR20110025211A (ko) 2011-03-09
US20110171569A1 (en) 2011-07-14

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