JP2011502781A - 湿気検出器付きの水処理システム - Google Patents
湿気検出器付きの水処理システム Download PDFInfo
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- JP2011502781A JP2011502781A JP2010534107A JP2010534107A JP2011502781A JP 2011502781 A JP2011502781 A JP 2011502781A JP 2010534107 A JP2010534107 A JP 2010534107A JP 2010534107 A JP2010534107 A JP 2010534107A JP 2011502781 A JP2011502781 A JP 2011502781A
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- light source
- chamber
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- water
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 238000001514 detection method Methods 0.000 claims description 7
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 230000000007 visual effect Effects 0.000 claims description 2
- 238000005286 illumination Methods 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract description 4
- 230000001681 protective effect Effects 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000001010 compromised effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
- C02F9/20—Portable or detachable small-scale multistage treatment devices, e.g. point of use or laboratory water purification systems
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/009—Apparatus with independent power supply, e.g. solar cells, windpower, fuel cells
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/326—Lamp control systems
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/42—Liquid level
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
Landscapes
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Clinical Laboratory Science (AREA)
- Physical Water Treatments (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
Claims (16)
- 水処理システムであって、
光源チャンバと、
前記チャンバ内の、抵抗を有する光源と、
前記チャンバ内の湿気検出装置であって、前記光源に電気的に並列に接続されており、および、予め選択されたレベルの湿気が存在していない時には前記光源の前記抵抗よりも高い第1の抵抗を有し、および、前記予め選択されたレベルの湿気が存在している時には前記光源の前記抵抗よりも低い第2の抵抗を有する湿気検出装置と、
前記光源と前記湿気検出装置とに作動的に接続されている制御回路であって、前記湿気検出器は、前記予め選択されたレベルの湿気が存在している時に前記光源が電力を受け取ることを防止する比較的に抵抗が低い配線経路を提供する制御回路と、
を備える水処理システム。 - 前記光源は紫外線(UV)光源である請求項1に記載の水処理システム。
- 前記光源チャンバは透明部分を含む請求項1に記載の水処理システム。
- 前記制御回路が前記光源が電力を受け取ることを防止しているということを表示するための手段をさらに備える請求項1に記載の水処理システム。
- 光源アセンブリであって、
光チャンバを画定するチャンバ壁と、
前記チャンバ内の、抵抗を有する光源と、
前記光源に給電するための給電手段と、
前記給電手段を制御する制御手段であって、前記光チャンバ内の湿気検出器を含み、および、前記湿気検出器は、前記光源に電気的に並列に接続されており、湿気が前記チャンバ内に存在していない時には前記光源の抵抗よりも高い第1の抵抗を有し、および、前記湿気検出器は、湿気が前記チャンバ内に存在している時には前記光源の抵抗よりも低い第2の抵抗を有し、および、前記湿気検出器は、湿気が存在している時に、前記光源の周りの電流を分路するために、比較的に抵抗の低い配線経路を提供する制御手段と、
を備える光源アセンブリ。 - 前記光源は紫外線(UV)光源である請求項5に記載の光源。
- 前記チャンバ壁は透明部分を含む請求項5に記載の光源。
- 前記制御手段は、前記湿気検出器が前記光チャンバ内の湿気を検出する時に可視的な表示を提供するように、前記湿気検出器に対して応答する請求項5に記載の光源。
- 水処理システムであって、
水が中を通って流れる水チャンバと、
通常は水が無い光チャンバと、
前記チャンバ内の、抵抗を有する光源と、
水の存在を検出するための、前記光チャンバ内の検出器手段であって、前記光源に電気的に並列に接続されており、かつ、この検出器手段上に水が存在していない時には前記光源の前記抵抗よりも高い第1の抵抗を有し、および、湿気がこの検出器手段上に存在している時には前記光源の前記抵抗よりも低い第2の抵抗を有し、および、前記光チャンバ内で水が検出される時に、前記光源を通過する電流を減少させるために、抵抗の低い電気経路を提供する検出器手段と、
を備える水処理システム。 - 前記光チャンバは石英スリーブによって少なくとも部分的に画定されている請求項9に記載の水処理システム。
- 前記光源は前記光チャンバ内の紫外線(UV)ランプを含む請求項9に記載の水処理システム。
- 前記制御回路は、前記UVランプによって放出される光に応答する光センサを含む請求項11に記載の水処理システム。
- 前記システムはユースポイント水処理システムである請求項9に記載の水処理システム。
- 前記検出器手段は、非伝導性の基板と、前記基板上の第1および第2の導電性配線経路とを備える請求項9に記載の水処理システム。
- 照明アセンブリであって、
チャンバと、
前記チャンバ内の、抵抗を有する光源と、
前記チャンバ内の水検出器であって、前記光源に電気的に並列に接続されており、かつ、前記チャンバ内に水が存在していない時には前記光源の抵抗よりも高い第1の抵抗を有し、および、水が前記チャンバ内に存在している時には前記光源の前記抵抗よりも低い第2の抵抗を有し、および、前記光チャンバ内に水が存在している時に、前記光源に対する電流を減少させるために伝導性の経路を提供する水検出器と、
を備える照明アセンブリ。 - 前記光源の動作状態を表示する出力を有する光センサをさらに備える請求項15に記載の照明アセンブリ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/939,160 US7883619B2 (en) | 2007-11-13 | 2007-11-13 | Water treatment system with moisture detector |
PCT/US2008/082726 WO2009064666A1 (en) | 2007-11-13 | 2008-11-07 | Water treatment system with moisture detector |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011502781A true JP2011502781A (ja) | 2011-01-27 |
JP2011502781A5 JP2011502781A5 (ja) | 2011-07-14 |
Family
ID=40193736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010534107A Pending JP2011502781A (ja) | 2007-11-13 | 2008-11-07 | 湿気検出器付きの水処理システム |
Country Status (8)
Country | Link |
---|---|
US (1) | US7883619B2 (ja) |
JP (1) | JP2011502781A (ja) |
KR (1) | KR20100085097A (ja) |
CN (1) | CN101855176B (ja) |
HK (1) | HK1146588A1 (ja) |
RU (1) | RU2010123681A (ja) |
TW (1) | TW200938490A (ja) |
WO (1) | WO2009064666A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2465957B (en) * | 2007-10-02 | 2012-04-04 | Shimadzu Corp | Preparative separation/ purification system |
US8128820B2 (en) * | 2009-02-25 | 2012-03-06 | Mr. Chiaphua Industries Limited | UV liquid storage and dispensing device |
MX2010009169A (es) * | 2010-08-10 | 2012-02-21 | Andres Abelino Choza Romero | Aparato para desinfectar líquidos, mediante el uso de luz ultravioleta. |
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-
2007
- 2007-11-13 US US11/939,160 patent/US7883619B2/en not_active Expired - Fee Related
-
2008
- 2008-11-07 CN CN200880115994.4A patent/CN101855176B/zh not_active Expired - Fee Related
- 2008-11-07 KR KR1020107010412A patent/KR20100085097A/ko not_active Application Discontinuation
- 2008-11-07 JP JP2010534107A patent/JP2011502781A/ja active Pending
- 2008-11-07 WO PCT/US2008/082726 patent/WO2009064666A1/en active Application Filing
- 2008-11-07 RU RU2010123681/05A patent/RU2010123681A/ru not_active Application Discontinuation
- 2008-11-11 TW TW097143460A patent/TW200938490A/zh unknown
-
2011
- 2011-04-19 HK HK11103470.0A patent/HK1146588A1/xx not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63194794A (ja) * | 1987-02-04 | 1988-08-11 | Hitachi Ltd | 水棲生物の付着防止装置 |
JPH01139186A (ja) * | 1987-11-26 | 1989-05-31 | Matsushita Electric Ind Co Ltd | 水殺菌浄化装置 |
JP2007021494A (ja) * | 1999-06-21 | 2007-02-01 | Access Business Group Internatl Llc | 流体処理システム用の無線周波数識別システム |
JP2001047040A (ja) * | 1999-08-10 | 2001-02-20 | Ebara Corp | 紫外線殺菌装置 |
Also Published As
Publication number | Publication date |
---|---|
HK1146588A1 (en) | 2011-06-24 |
US7883619B2 (en) | 2011-02-08 |
WO2009064666A1 (en) | 2009-05-22 |
KR20100085097A (ko) | 2010-07-28 |
CN101855176A (zh) | 2010-10-06 |
US20090120851A1 (en) | 2009-05-14 |
RU2010123681A (ru) | 2011-12-20 |
CN101855176B (zh) | 2013-02-06 |
TW200938490A (en) | 2009-09-16 |
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