JP2011501872A5 - - Google Patents
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- JP2011501872A5 JP2011501872A5 JP2010524341A JP2010524341A JP2011501872A5 JP 2011501872 A5 JP2011501872 A5 JP 2011501872A5 JP 2010524341 A JP2010524341 A JP 2010524341A JP 2010524341 A JP2010524341 A JP 2010524341A JP 2011501872 A5 JP2011501872 A5 JP 2011501872A5
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- JP
- Japan
- Prior art keywords
- branches
- imaging
- optical
- field lens
- optics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000003384 imaging method Methods 0.000 description 3
- 230000003287 optical Effects 0.000 description 3
Description
集光光学系と視野レンズ光学系とをそれぞれ利用できる両方の光学ブランチにおける別々の結像により、短軸上のビームプロファイルを、エッジ急峻性と線半値幅とについて別々に変えるため又は所期の通りに最適化するための前提が満たされることが分かった。これは、さらなる実施形態に示されるように、上記第１及び第２の光学的結像ブランチに属する個々の集光及び／又は視野レンズ光学系の軸方向移動によって達成することができる。さらに、上記第１及び第２の結像ブランチに沿って含まれる光学系の回転が、少なくとも線半値幅に対して影響を及ぼす。
To change the beam profile on the minor axis separately for edge steepness and linewidth at half-height by separate imaging in both optical branches where condensing optics and field lens optics can be used respectively. It turns out that the premise for optimizing on the street is met. This can be achieved by axial movement of the individual focusing and / or field lens optics belonging to the first and second optical imaging branches, as shown in further embodiments. Furthermore, the rotation of the optical system included along the first and second imaging branches affects at least the line half width.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200710044298 DE102007044298B3 (en) | 2007-09-17 | 2007-09-17 | Method and arrangement for generating a laser beam with a linear beam cross section |
| DE102007044298.1 | 2007-09-17 | ||
| PCT/DE2008/001181 WO2009036716A1 (en) | 2007-09-17 | 2008-07-18 | Method and arrangement for producing a laser beam with a linear beam cross section |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011501872A JP2011501872A (en) | 2011-01-13 |
| JP2011501872A5 true JP2011501872A5 (en) | 2013-12-12 |
| JP5548127B2 JP5548127B2 (en) | 2014-07-16 |
Family
ID=40070896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524341A Expired - Fee Related JP5548127B2 (en) | 2007-09-17 | 2008-07-18 | Method and arrangement for generating a laser beam having a linear beam cross-section |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5548127B2 (en) |
| KR (1) | KR101529344B1 (en) |
| CN (1) | CN101801586B (en) |
| DE (1) | DE102007044298B3 (en) |
| WO (1) | WO2009036716A1 (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010027196B4 (en) * | 2010-07-07 | 2012-03-08 | Carl Zeiss Laser Optics Gmbh | Optical system for generating a line focus and apparatus for treating a substrate with such an optical system |
| DE102010045620B4 (en) * | 2010-09-17 | 2016-09-01 | Limo Patentverwaltung Gmbh & Co. Kg | Device for generating a linear intensity distribution in a working plane |
| KR101257827B1 (en) * | 2012-09-20 | 2013-04-29 | (주)프로비전 | Apparatus of forming linear laser beam and method of manufacturing touch panel using the same |
| DE102012111098B4 (en) * | 2012-11-19 | 2016-03-03 | Scanlab Ag | Divergence changing means |
| DE102014213775B4 (en) * | 2014-07-15 | 2018-02-15 | Innolas Solutions Gmbh | Method and device for laser-based processing of flat, crystalline substrates, in particular of semiconductor substrates |
| DE102015002537B4 (en) * | 2015-02-27 | 2017-11-09 | Innovavent Gmbh | Optical system and optical process for homogenizing the intensity of laser radiation and equipment for processing thin-film layers |
| KR102440115B1 (en) | 2015-11-13 | 2022-09-05 | 삼성디스플레이 주식회사 | Method of excimer laser annealing |
| EP3491450B1 (en) * | 2016-07-27 | 2024-02-28 | TRUMPF Laser GmbH | Laser line illumination |
| DE102017115964B4 (en) * | 2017-07-14 | 2020-04-02 | LIMO GmbH | Device for generating a linear intensity distribution of laser radiation |
| JP7117611B2 (en) * | 2017-12-05 | 2022-08-15 | パナソニックＩｐマネジメント株式会社 | Beam conversion optical system and light source device |
| DE102018216940A1 (en) * | 2018-10-02 | 2020-04-02 | 3D-Micromac Ag | Laser processing system |
| DE102019102511B4 (en) * | 2019-01-31 | 2020-08-20 | Trumpf Laser- Und Systemtechnik Gmbh | Laser system |
| DE102019206976B3 (en) * | 2019-05-14 | 2020-11-12 | Trumpf Laser Gmbh | Optical system for generating two laser focus lines as well as a method for the simultaneous processing of two opposite, parallel workpiece sides of a workpiece |
| DE102019118676B4 (en) * | 2019-07-10 | 2021-10-21 | Innovavent Gmbh | Optical system for homogenizing the intensity of light radiation and system for processing a semiconductor material layer |
| DE102020130651B3 (en) | 2020-11-19 | 2022-05-05 | Trumpf Laser- Und Systemtechnik Gmbh | Device for generating a defined laser illumination on a working plane |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3917231B2 (en) * | 1996-02-06 | 2007-05-23 | 株式会社半導体エネルギー研究所 | Laser irradiation apparatus and laser irradiation method |
| CN1072364C (en) * | 1997-05-29 | 2001-10-03 | 中国科学院上海光学精密机械研究所 | Super-fine structural optical measuring system |
| US6583937B1 (en) * | 1998-11-30 | 2003-06-24 | Carl-Zeiss Stiftung | Illuminating system of a microlithographic projection exposure arrangement |
| TW528879B (en) * | 2001-02-22 | 2003-04-21 | Ishikawajima Harima Heavy Ind | Illumination optical system and laser processor having the same |
| US7009140B2 (en) * | 2001-04-18 | 2006-03-07 | Cymer, Inc. | Laser thin film poly-silicon annealing optical system |
| KR100591404B1 (en) * | 2002-08-13 | 2006-06-19 | 가부시끼가이샤 도시바 | Laser application method |
| JP2005079470A (en) * | 2003-09-02 | 2005-03-24 | Nikon Corp | Adjustment method of illumination optical system, method and device for exposure, device manufacturing method |
| JP2007528509A (en) * | 2004-03-06 | 2007-10-11 | ヘンツェ−リソチェンコ パテントフェルヴァルトゥングス ゲーエムベーハー ウント コー．カーゲー | Devices for homogenizing light and arrangements for irradiation or light collection by such devices |
| WO2006066706A2 (en) * | 2004-12-22 | 2006-06-29 | Carl Zeiss Laser Optics Gmbh | Optical illumination system for creating a line beam |
| WO2007049525A1 (en) * | 2005-10-26 | 2007-05-03 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and manufacturing method of semiconductor device |
-
2007
- 2007-09-17 DE DE200710044298 patent/DE102007044298B3/en not_active Expired - Fee Related
-
2008
- 2008-07-18 CN CN2008801070697A patent/CN101801586B/en not_active Expired - Fee Related
- 2008-07-18 JP JP2010524341A patent/JP5548127B2/en not_active Expired - Fee Related
- 2008-07-18 WO PCT/DE2008/001181 patent/WO2009036716A1/en active Application Filing
- 2008-07-18 KR KR1020107005492A patent/KR101529344B1/en active IP Right Grant
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