JP2011238819A - Light-emitting device and package - Google Patents

Light-emitting device and package Download PDF

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JP2011238819A
JP2011238819A JP2010109896A JP2010109896A JP2011238819A JP 2011238819 A JP2011238819 A JP 2011238819A JP 2010109896 A JP2010109896 A JP 2010109896A JP 2010109896 A JP2010109896 A JP 2010109896A JP 2011238819 A JP2011238819 A JP 2011238819A
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layer
light emitting
emitting device
electrode
mounting substrate
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Satoshi Wada
聡 和田
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Toyoda Gosei Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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Abstract

PROBLEM TO BE SOLVED: To provide a light-emitting device and a package wherein reaction between a connection terminal of a circuit pattern provided on a mounting substrate and gas in an external atmosphere can be suppressed.SOLUTION: A light-emitting device 1 includes: a mounting substrate 3 made of an inorganic material in which a circuit pattern 4 mounted with an LED element 2 is provided; an external connection electrode 44 of the circuit pattern 4; and a protection film 5 which is provided so as to cover the outer edge of the exposed surface of the external connection electrode 44 and is made of an inorganic material.

Description

本発明は、搭載基板に設けられた電極を保護する保護膜を設けた発光装置及びパッケージに関する。   The present invention relates to a light emitting device and a package provided with a protective film for protecting an electrode provided on a mounting substrate.

従来、搭載基板に設けられた電極を保護する保護膜を設けた発光装置において、保護膜として樹脂レジスト層を形成した発光装置が知られている(例えば、特許文献1参照)。特許文献1に記載の発光装置は、セラミックの搭載基板の表裏面の少なくとも一方に設けた電極を有し、電極は、接合される半田ボールの径よりも大きく形成され、かつ電極のうち半田ボールとの接合箇所を除いた電極表面及びセラミックの搭載基板の表面のうち少なくとも電極の外縁をまたがる部分に樹脂レジストが形成されている。樹脂レジストが電極の外縁をまたがる部分に形成されているため、熱衝撃による電極の外縁部分を起点とするクラックが発生しにくい。   Conventionally, in a light emitting device provided with a protective film for protecting an electrode provided on a mounting substrate, a light emitting device in which a resin resist layer is formed as a protective film is known (for example, see Patent Document 1). The light-emitting device described in Patent Document 1 has electrodes provided on at least one of the front and back surfaces of a ceramic mounting substrate, and the electrodes are formed larger than the diameter of solder balls to be joined. A resin resist is formed on at least a portion of the surface of the electrode excluding the joint portion and the surface of the ceramic mounting substrate that straddles the outer edge of the electrode. Since the resin resist is formed in a portion that straddles the outer edge of the electrode, cracks starting from the outer edge portion of the electrode due to thermal shock are unlikely to occur.

特開2005−244100号公報JP-A-2005-244100

ところで、特許文献1に記載の発光装置の樹脂レジストは、電極の外縁部分を保護することにより電極外縁部分を基点とするクラックの発生を抑制することができるが、有機材料であるため外部雰囲気に含まれる硫黄を含むガス等を透過させる。これにより、透過したガスが電極に至り、電極とガスが反応して劣化し、脆弱部となるおそれがあった。   By the way, although the resin resist of the light emitting device described in Patent Document 1 can suppress the generation of cracks based on the outer edge portion of the electrode by protecting the outer edge portion of the electrode, it is an organic material, so Permeate sulfur-containing gas. As a result, the permeated gas reaches the electrode, and the electrode and the gas react to deteriorate to become a weakened portion.

本発明は、前記事情に鑑みてなされたものであり、その目的とするところは、搭載基板に設けられた電極と外部雰囲気中のガスとの反応を抑制することのできる発光装置及びパッケージを提供することにある。   The present invention has been made in view of the above circumstances, and an object thereof is to provide a light emitting device and a package capable of suppressing a reaction between an electrode provided on a mounting substrate and a gas in an external atmosphere. There is to do.

前記目的を達成するため、本発明では、発光素子が搭載され、無機材料からなる搭載基板と、前記搭載基板の裏面に設けられる電極と、前記電極の外縁を覆うように、前記搭載基板の裏面に設けられる無機材料からなる保護膜とを有する発光装置が提供される。   In order to achieve the above object, in the present invention, a light emitting element is mounted, a mounting substrate made of an inorganic material, an electrode provided on the back surface of the mounting substrate, and a back surface of the mounting substrate so as to cover an outer edge of the electrode. A light-emitting device having a protective film made of an inorganic material is provided.

上記発光装置において、前記電極と外部との電気的接続に用いられる導電接合材を有し、前記保護膜は、前記電極のうち前記導電接合材との接合領域以外を全て覆ってもよい。   The light emitting device may include a conductive bonding material used for electrical connection between the electrode and the outside, and the protective film may cover all of the electrode other than a bonding region with the conductive bonding material.

上記発光装置において、前記発光素子は、無機材料からなる封止材により封止されてもよい。   In the light emitting device, the light emitting element may be sealed with a sealing material made of an inorganic material.

上記発光装置と、前記導電接合材と接合される外部電極と、前記外部電極のうち前記導電接合材との接合領域以外を覆う無機材料からなる保護膜とを有する配線基板とを備えてもよい。   The wiring board which has the said light-emitting device, the external electrode joined to the said electrically conductive joining material, and the protective film which consists of inorganic materials which cover those external electrodes other than the joining area | region with the said electrically conductive joining material may be provided. .

本発明によれば、搭載基板に設けられた電極と外部雰囲気中のガスとの反応を抑制することができる。   According to the present invention, the reaction between the electrode provided on the mounting substrate and the gas in the external atmosphere can be suppressed.

図1は、本発明の第1の実施の形態に係る発光装置の概略縦断面図である。FIG. 1 is a schematic longitudinal sectional view of a light emitting device according to a first embodiment of the present invention. 図2は、本発明の第1の実施の形態に係る発光装置の搭載基板の裏面を示す平面図である。FIG. 2 is a plan view showing the back surface of the mounting substrate of the light emitting device according to the first embodiment of the present invention. 図3は、本発明の第1の実施の形態に係るLED素子の模式縦断面図である。FIG. 3 is a schematic longitudinal sectional view of the LED element according to the first embodiment of the present invention. 図4(a)〜(e)は、本発明の第1の実施の形態に係る発光装置の製造工程を説明するための概略縦断面図である。4A to 4E are schematic longitudinal sectional views for explaining a manufacturing process of the light emitting device according to the first embodiment of the invention. 図5は、本発明の第1変形例に係る発光装置を実装したパッケージの概略縦断面図である。FIG. 5 is a schematic longitudinal sectional view of a package in which the light emitting device according to the first modification of the present invention is mounted. 図6は、本発明の第2の実施の形態に係る発光装置の概略縦断面図である。FIG. 6 is a schematic longitudinal sectional view of a light emitting device according to the second embodiment of the present invention. 図7は、本発明の第2の実施の形態に係る発光装置の搭載基板の裏面を示す平面図である。FIG. 7 is a plan view showing the back surface of the mounting substrate of the light emitting device according to the second embodiment of the present invention.

[第1の実施の形態]
図1は、本発明の第1の実施の形態に係る発光装置の概略縦断面図であり、図2は、発光装置の搭載基板の裏面を示す平面図、図3はLED素子の模式縦断面図である。
[First Embodiment]
1 is a schematic longitudinal sectional view of a light emitting device according to a first embodiment of the present invention, FIG. 2 is a plan view showing a back surface of a mounting substrate of the light emitting device, and FIG. 3 is a schematic longitudinal sectional view of an LED element. FIG.

図1に示すように、この発光装置1は、フリップチップ型のGaN系半導体材料からなるLED素子2と、LED素子2を搭載する搭載基板3と、搭載基板3に形成されタングステン(W)−ニッケル(Ni)−金(Au)で構成される回路パターン4と、回路パターン4のうち裏面パターン42を保護する保護膜5と、LED素子2を封止するとともに搭載基板3と接着されるガラス封止部6とを有する。また、LED素子2と搭載基板3との間には、ガラスがまわりこまない中空部7が形成されている。本実施形態においては、搭載基板3および回路パターン4が、LED素子2を搭載しLED素子2へ電力を供給するための搭載基板を構成している。   As shown in FIG. 1, the light emitting device 1 includes an LED element 2 made of a flip-chip GaN-based semiconductor material, a mounting substrate 3 on which the LED element 2 is mounted, and a tungsten (W)- A circuit pattern 4 made of nickel (Ni) -gold (Au), a protective film 5 that protects the back pattern 42 of the circuit pattern 4, and a glass that seals the LED element 2 and is bonded to the mounting substrate 3. And a sealing portion 6. Further, a hollow portion 7 in which the glass does not surround is formed between the LED element 2 and the mounting substrate 3. In the present embodiment, the mounting board 3 and the circuit pattern 4 constitute a mounting board for mounting the LED element 2 and supplying power to the LED element 2.

発光素子としてのLED素子2は、図3に示すように、サファイア(Al)からなる成長基板20の表面に、III族窒化物系半導体をエピタキシャル成長させることにより、バッファ層21と、n型層22と、MQW層23と、p型層24とがこの順で形成されている。このLED素子2は、700℃以上でエピタキシャル成長され、その耐熱温度は600℃以上であり、後述する低融点のガラスを用いた封止加工における加工温度に対して安定である。また、LED素子2は、p型層24の表面に設けられるp側電極25と、p側電極25上に形成されるp側パッド電極26と、を有するとともに、p型層24からn型層22にわたって一部をエッチングすることにより露出したn型層22に形成されるn側電極27を有する。p側パッド電極26とn側電極27には、それぞれAuバンプ28が形成される。 As shown in FIG. 3, the LED element 2 as a light-emitting element is formed by epitaxially growing a group III nitride semiconductor on the surface of a growth substrate 20 made of sapphire (Al 2 O 3 ). The mold layer 22, the MQW layer 23, and the p-type layer 24 are formed in this order. This LED element 2 is epitaxially grown at 700 ° C. or higher, and its heat-resistant temperature is 600 ° C. or higher, and is stable with respect to the processing temperature in sealing processing using low-melting glass described later. The LED element 2 includes a p-side electrode 25 provided on the surface of the p-type layer 24 and a p-side pad electrode 26 formed on the p-side electrode 25, and the p-type layer 24 to the n-type layer. 22 has an n-side electrode 27 formed on the n-type layer 22 exposed by etching a part thereof. Au bumps 28 are formed on the p-side pad electrode 26 and the n-side electrode 27, respectively.

p側電極25は、例えば銀(Ag)からなり、発光層としてのMQW層23から発せられる光を成長基板20の方向に反射する光反射層として機能する。尚、p側電極25の材質は適宜変更が可能である。本実施形態においては、p側電極25上には2点のp側パッド電極26が形成され、各p側パッド電極26にAuバンプ28が形成される。尚、p側パッド電極26は例えば3点であってもよく、p側電極25上に形成するp側パッド電極26の個数は適宜変更が可能である。   The p-side electrode 25 is made of, for example, silver (Ag), and functions as a light reflecting layer that reflects light emitted from the MQW layer 23 as a light emitting layer toward the growth substrate 20. The material of the p-side electrode 25 can be changed as appropriate. In the present embodiment, two p-side pad electrodes 26 are formed on the p-side electrode 25, and an Au bump 28 is formed on each p-side pad electrode 26. The number of p-side pad electrodes 26 may be three, for example, and the number of p-side pad electrodes 26 formed on the p-side electrode 25 can be changed as appropriate.

n側電極27は、同一エリアにコンタクト層とパッド層とが形成されている。図3に示すように、n側電極27は、Al層27aと、このAl層27aの上面を覆う薄膜状のNi層27bと、Ni層27bの上面を覆うAu層27cによって形成されている。尚、n側電極27の材質は適宜変更が可能である。本実施形態においては、平面視にて、n側電極27がLED素子2の隅部に形成され、p側電極25がn側電極27の形成領域を除いて、ほぼ全面的に形成されている。   In the n-side electrode 27, a contact layer and a pad layer are formed in the same area. As shown in FIG. 3, the n-side electrode 27 is formed of an Al layer 27a, a thin film Ni layer 27b covering the upper surface of the Al layer 27a, and an Au layer 27c covering the upper surface of the Ni layer 27b. Note that the material of the n-side electrode 27 can be changed as appropriate. In the present embodiment, the n-side electrode 27 is formed at the corner of the LED element 2 and the p-side electrode 25 is formed almost entirely except for the formation region of the n-side electrode 27 in plan view. .

LED素子2は、厚さ100μmで346μm角に形成されており、熱膨張率は7×10−6/℃である。ここで、LED素子2のGaN層の熱膨張率は5×10−6/℃であるが、大部分を占めるサファイアからなる成長基板20の熱膨張率が7×10−6/℃であるため、LED素子2本体の熱膨張率は成長基板20の熱膨張率と同等となっている。尚、各図においてはLED素子2の各部の構成を明確にするために実寸と異なるサイズで各部を示している。 The LED element 2 has a thickness of 100 μm and a 346 μm square, and has a thermal expansion coefficient of 7 × 10 −6 / ° C. Here, although the thermal expansion coefficient of the GaN layer of the LED element 2 is 5 × 10 −6 / ° C., the thermal expansion coefficient of the growth substrate 20 made of sapphire occupying most is 7 × 10 −6 / ° C. The thermal expansion coefficient of the LED element 2 main body is equal to the thermal expansion coefficient of the growth substrate 20. In addition, in each figure, in order to clarify the structure of each part of the LED element 2, each part is shown by the size different from an actual size.

搭載基板としての搭載基板3は、アルミナ(Al)の多結晶焼結材料からなり、厚さ0.25mmで1.0mm角に形成されており、熱膨張率αが7×10−6/℃である。図1に示すように、搭載基板3の回路パターン4は、基板表面に形成されてLED素子2と電気的に接続される表面パターン41と、基板裏面に形成されて外部端子と接続可能な裏面パターン42と、を有している。表面パターン41は、LED素子2の電極形状に応じてパターン形成されたW層4aと、W層4aの表面を覆う薄膜状のNi層4bと、Ni層4bの表面を覆う薄膜状のAu層4cと、を含んでいる。裏面パターン42は、後述する外部接続電極44に応じてパターン形成されたW層4aと、W層4aの表面を覆う薄膜状のNi層4bと、Ni層4bの表面を覆う薄膜状のAu層4cと、を含んでいる。表面パターン41と裏面パターン42は、搭載基板3を厚さ方向に貫通するビアホール3aに設けられWからなるビアパターン43により電気的に接続されている。外部接続電極44はアノード側とカソード側で1つずつ設けられる。各外部接続電極44は、搭載基板3に平面視にて対角に配されている。 The mounting substrate 3 as a mounting substrate is made of a polycrystalline sintered material of alumina (Al 2 O 3 ), is formed in a 1.0 mm square with a thickness of 0.25 mm, and has a thermal expansion coefficient α of 7 × 10 −. 6 / ° C. As shown in FIG. 1, the circuit pattern 4 of the mounting substrate 3 includes a surface pattern 41 formed on the substrate surface and electrically connected to the LED element 2, and a back surface formed on the substrate back surface and connectable to an external terminal. And a pattern 42. The surface pattern 41 includes a W layer 4a patterned according to the electrode shape of the LED element 2, a thin film Ni layer 4b covering the surface of the W layer 4a, and a thin film Au layer covering the surface of the Ni layer 4b. 4c. The back surface pattern 42 includes a W layer 4a patterned according to an external connection electrode 44 described later, a thin film Ni layer 4b covering the surface of the W layer 4a, and a thin film Au layer covering the surface of the Ni layer 4b. 4c. The front surface pattern 41 and the back surface pattern 42 are electrically connected by a via pattern 43 made of W provided in a via hole 3 a penetrating the mounting substrate 3 in the thickness direction. One external connection electrode 44 is provided on each of the anode side and the cathode side. Each external connection electrode 44 is diagonally arranged on the mounting substrate 3 in plan view.

保護膜5は、SiO等の無機材料からなり、図2に示すように、搭載基板3の裏面上から外部接続電極44の外縁部にかけて連続的に形成されて、外部接続電極44の外縁部を保護する。尚、保護膜5に用いることができる無機材料は、SiOに限定されるものではなく、Al、TiO等でもよい。保護膜5は、外部接続電極44を後述する導電接合材8と接続するための開口部50を有する。 The protective film 5 is made of an inorganic material such as SiO 2 and is continuously formed from the back surface of the mounting substrate 3 to the outer edge portion of the external connection electrode 44 as shown in FIG. Protect. The inorganic material that can be used for the protective film 5 is not limited to SiO 2 but may be Al 2 O 3 , TiO 2 or the like. The protective film 5 has an opening 50 for connecting the external connection electrode 44 to a conductive bonding material 8 described later.

ガラス封止部6は、ZnO−B−SiO系の無機材料のガラスからなる。尚、ガラスの組成はこれに限定されるものではなく、例えば、ガラスは、高屈折率とするためNbを含んでもよいし、低融点化のためにNaO、LiO等を含有していてもよい。さらに、任意成分としてZrO、TiO等を含んでいてもよい。このガラスは、ガラス転移温度(Tg)が490℃で、屈伏点(At)が520℃であり、LED素子2の発光層(本実施形態ではMQW層23)におけるエピタキシャル成長時の形成温度よりも、ガラス転移温度(Tg)が十分に低くなっている。本実施形態においては、発光層のエピタキシャル成長温度よりも、ガラス転移温度(Tg)が200℃以上低くなっている。また、ガラスの100℃〜300℃における熱膨張率(α)は6×10−6/℃である。熱膨張率(α)は、ガラス転移温度(Tg)を超えるとこれより大きな数値となる。これにより、ガラスは約600℃で搭載基板3と接着し、ホットプレス加工が可能となっている。また、ガラス封止部6のガラスの屈折率は1.7である。 Glass sealing part 6 is made of glass of ZnO-B 2 O 3 -SiO 2 based inorganic material. The composition of the glass is not limited to this. For example, the glass may contain Nb 2 O 5 for a high refractive index, or Na 2 O, Li 2 O, etc. for lowering the melting point. May be contained. Furthermore, ZrO 2 , TiO 2 or the like may be included as an optional component. This glass has a glass transition temperature (Tg) of 490 ° C., a yield point (At) of 520 ° C., and the formation temperature at the time of epitaxial growth in the light emitting layer of the LED element 2 (MQW layer 23 in the present embodiment), The glass transition temperature (Tg) is sufficiently low. In the present embodiment, the glass transition temperature (Tg) is lower by 200 ° C. or more than the epitaxial growth temperature of the light emitting layer. Moreover, the thermal expansion coefficient ((alpha)) in 100 to 300 degreeC of glass is 6x10 < -6 > / degreeC . When the thermal expansion coefficient (α) exceeds the glass transition temperature (Tg), a larger numerical value is obtained. Thereby, the glass is bonded to the mounting substrate 3 at about 600 ° C., and hot pressing is possible. Moreover, the refractive index of the glass of the glass sealing part 6 is 1.7.

図1に示すように、ガラス封止部6は、レンズ形状面を有し、LED素子2及び搭載基板3を全面的に覆い、厚さが0.5mmとなっている。   As shown in FIG. 1, the glass sealing part 6 has a lens-shaped surface, covers the LED element 2 and the mounting substrate 3 entirely, and has a thickness of 0.5 mm.

以上のように構成された発光装置1では、回路パターン4を通じてLED素子2に電圧が印加されると、LED素子2から青色光が発せられる。LED素子2から発せられた青色光は、ガラス封止部6のレンズ形状面を通じて外部へ放射される。   In the light emitting device 1 configured as described above, when a voltage is applied to the LED element 2 through the circuit pattern 4, blue light is emitted from the LED element 2. Blue light emitted from the LED element 2 is radiated to the outside through the lens-shaped surface of the glass sealing portion 6.

この発光装置1は、以下の工程を経て製造される。   The light emitting device 1 is manufactured through the following steps.

図4(a)〜(e)は、本発明の第1の実施の形態に係る発光装置の製造工程を説明するための概略縦断面図である。以下、特に搭載基板3の裏面の外部接続電極44の製造工程について説明する。   4A to 4E are schematic longitudinal sectional views for explaining a manufacturing process of the light emitting device according to the first embodiment of the invention. Hereinafter, the manufacturing process of the external connection electrode 44 on the back surface of the mounting substrate 3 will be described in particular.

まず、搭載基板3をなすグリーンシート30を用意し、プレス型等によってビアホール3aを形成しておく。そして、図4(a)に示すように、裏面に回路パターンに応じてWペースト40をスクリーン印刷する。次いで、図4(b)に示すように、Wペースト40を印刷されたグリーンシート30を1000℃余で熱処理することにより焼成させ、アルミナからなる搭載基板3とし、W層4aを搭載基板3に焼き付ける。   First, a green sheet 30 forming the mounting substrate 3 is prepared, and the via hole 3a is formed by a press die or the like. Then, as shown in FIG. 4A, the W paste 40 is screen-printed on the back surface according to the circuit pattern. Next, as shown in FIG. 4B, the green sheet 30 on which the W paste 40 is printed is baked by heat-treating at 1000 ° C. or more to form a mounting substrate 3 made of alumina, and the W layer 4 a is formed on the mounting substrate 3. Bake.

さらに、図4(c)に示すように、W層4a上にNiめっきを施してNi層4bを形成し、図4(d)に示すように、Ni層4b上にAuめっきを施すことでAu層4cを形成し、回路パターン4を形成する(パターン形成工程)。なお、Au層4cは、Auに比べて外部雰囲気中のガスと反応性の高いNi層4bを保護するため、Ni層4bの表面及び外縁部を覆うように形成することが望ましい。   Further, as shown in FIG. 4C, Ni plating is performed on the W layer 4a to form the Ni layer 4b, and as shown in FIG. 4D, Au plating is applied on the Ni layer 4b. The Au layer 4c is formed, and the circuit pattern 4 is formed (pattern formation process). The Au layer 4c is preferably formed so as to cover the surface and the outer edge of the Ni layer 4b in order to protect the Ni layer 4b that is more reactive with the gas in the external atmosphere than Au.

回路パターン4を形成するにあたっては、焼成されたセラミックにCr,Ti等の金属を蒸着してNiめっき及びAuめっきを施したたり、Cu箔を貼り付けた後に所定形状にエッチングしてAuめっきを施すようにすることができる。   In forming the circuit pattern 4, a metal such as Cr or Ti is vapor-deposited on the fired ceramic, and Ni plating and Au plating are performed. Can be applied.

次に、図4(e)に示すように、SiOからなる保護膜5をゾルゲル法により形成する。保護膜5は、搭載基板3の裏面、外部接続電極44の外縁部を保護するように形成する(保護膜形成工程)。 Next, as shown in FIG. 4E, a protective film 5 made of SiO 2 is formed by a sol-gel method. The protective film 5 is formed so as to protect the back surface of the mounting substrate 3 and the outer edge portion of the external connection electrode 44 (protective film forming step).

一方、ガラス成分の酸化物粉末を1200℃に加熱し、溶融状態で撹拌する。そして、ガラスを固化した後、ガラス封止部6の厚さに対応するようスライスして封止前ガラスを球状に加工する。この後、金型を用いて封止前ガラスに、レンズ形状を有するレンズ形状面、搭載基板3と接着される接着面及び接着面に設けられたLED素子2に対応する凹部を形成する(封止部材準備工程)。   On the other hand, the oxide powder of the glass component is heated to 1200 ° C. and stirred in a molten state. And after solidifying glass, it slices so that it may correspond to the thickness of the glass sealing part 6, and processes glass before sealing in a spherical shape. Thereafter, a lens-shaped surface having a lens shape, a bonding surface to be bonded to the mounting substrate 3, and a concave portion corresponding to the LED element 2 provided on the bonding surface are formed on the pre-sealing glass using a mold (sealing). Stop member preparation step).

次に、封止部材準備工程にて準備した封止前ガラスを、その凹部がLED素子2に対向するように配置し、金型によって搭載基板3にホットプレス加工する。ホットプレス加工により、封止前ガラスの凹部はLED素子2に沿うように変形するとともに、搭載基板の表面に接着され、LED素子2及び表面パターン41を封止する(封止工程)。なお、封止部材準備工程及び封止工程は、保護膜形成工程の前に行っても良い。   Next, the pre-sealing glass prepared in the sealing member preparation step is disposed so that the concave portion faces the LED element 2 and hot-pressed on the mounting substrate 3 by a mold. By hot pressing, the concave portion of the glass before sealing is deformed along the LED element 2 and is bonded to the surface of the mounting substrate to seal the LED element 2 and the surface pattern 41 (sealing process). In addition, you may perform the sealing member preparation process and the sealing process before a protective film formation process.

第1の実施の形態によれば、外部接続電極44の外縁部を外部雰囲気中のガス透過性が低い無機材料からなる保護膜5によって保護するとともに、ガスとの反応性が低いAu層4cを開口部50から露出する構成とするため、外部接続電極44と外部雰囲気中のガスとの反応を抑制することができる。   According to the first embodiment, the outer edge portion of the external connection electrode 44 is protected by the protective film 5 made of an inorganic material having low gas permeability in the external atmosphere, and the Au layer 4c having low reactivity with the gas is formed. Since the structure is exposed from the opening 50, the reaction between the external connection electrode 44 and the gas in the external atmosphere can be suppressed.

また、外部接続電極44の外縁部を保護膜5によって保護するため、外部接続電極44の外縁部を基点とするクラックや、外部接続電極44の剥離等の発生を抑制することができる。   In addition, since the outer edge portion of the external connection electrode 44 is protected by the protective film 5, it is possible to suppress the occurrence of cracks originating from the outer edge portion of the external connection electrode 44, peeling of the external connection electrode 44, and the like.

[第1変形例]
図5は、発光装置を実装したパッケージの概略縦断面図である。第1変形例は、第1の実施の形態に係る発光素子1を配線基板9に実装したものである。
[First Modification]
FIG. 5 is a schematic longitudinal sectional view of a package in which the light emitting device is mounted. In the first modification, the light emitting element 1 according to the first embodiment is mounted on a wiring board 9.

パッケージ10は、上記した発光素子1と、金属微粒子を含むペーストからなる導電接合材8と、回路パターン90を表面に設けた無機材料からなる配線基板9とを有する。また、配線基板9の回路パターン90は、その表面のうち導電接合材8との接合面以外の領域が保護膜91により保護される。保護膜91は、保護膜5と同様にSiO等を用いる。 The package 10 includes the light emitting element 1 described above, a conductive bonding material 8 made of a paste containing metal fine particles, and a wiring substrate 9 made of an inorganic material having a circuit pattern 90 provided on the surface thereof. Further, the circuit pattern 90 of the wiring substrate 9 is protected by a protective film 91 in a region other than the bonding surface with the conductive bonding material 8 on the surface. As the protective film 91, SiO 2 or the like is used similarly to the protective film 5.

導電接合材8は、発光素子1の外部接続電極44又は配線基板9の回路パターン90の表面の少なくともいずれか一方に設ければよい。そして、導電接合材8には、例えば、金スズ(AuSn)はんだ層や、金、銀、白金、パラジウム等の金属微粒子を含むペーストなどを用いればよい。   The conductive bonding material 8 may be provided on at least one of the external connection electrode 44 of the light emitting element 1 or the surface of the circuit pattern 90 of the wiring board 9. For the conductive bonding material 8, for example, a gold tin (AuSn) solder layer or a paste containing metal fine particles such as gold, silver, platinum, and palladium may be used.

また、導電接合材8は、発光素子1と配線基板9とが実装されている状態において、外部接続電極44のうち保護膜5の開口部50に露出している領域をすべて覆うように接合される。同様に、回路パターン90のうち保護膜91によって保護されていない領域をすべて覆うように接合される。   In addition, the conductive bonding material 8 is bonded so as to cover the entire area of the external connection electrode 44 exposed to the opening 50 of the protective film 5 in a state where the light emitting element 1 and the wiring substrate 9 are mounted. The Similarly, bonding is performed so as to cover all areas of the circuit pattern 90 that are not protected by the protective film 91.

また、導電接合材8として金属微粒子を含むペーストを使用すれば、金属微粒子間に形成される間隙が、金属微粒子及び圧着で融合した金属微粒子の移動や変形を許容することにより、発光素子1と配線基板9との間の熱膨張収縮量の違い等により生じる応力が緩和され、発光素子1の配線基板9からの剥離が防止される。   Further, when a paste containing metal fine particles is used as the conductive bonding material 8, the gap formed between the metal fine particles allows movement and deformation of the metal fine particles and the metal fine particles fused by pressure bonding, so that the light emitting element 1 and The stress caused by the difference in thermal expansion / shrinkage between the wiring board 9 and the like is relieved, and the light emitting element 1 is prevented from being peeled off from the wiring board 9.

尚、前記導電接合材8として金属微粒子を含むペーストを使用する場合は、当該金属微粒子と同種の金属からなる金属層を、外部接続電極44の接合面及び回路パターン90の接合面の両方に設けることが好ましい。なぜなら、圧着時に金属微粒子の一部がそれぞれの接合面に設けた金属層に侵入することにより接合性が高まるからである。   When a paste containing metal fine particles is used as the conductive bonding material 8, a metal layer made of the same kind of metal as the metal fine particles is provided on both the bonding surface of the external connection electrode 44 and the bonding surface of the circuit pattern 90. It is preferable. This is because a part of the metal fine particles penetrates into the metal layer provided on each joining surface at the time of pressure bonding, so that the joining property is improved.

第1変形例によれば、発光素子1を配線基板9に実装する場合に、それぞれ外部接続電極44及び回路パターン90が露出せず、無機材料の保護膜5及び保護膜91並びに導電接合材8によって保護されるため、外部接続電極44及び回路パターン90と外部雰囲気中のガスとの反応を抑制したパッケージを作製することができる。   According to the first modification, when the light emitting element 1 is mounted on the wiring board 9, the external connection electrode 44 and the circuit pattern 90 are not exposed, and the protective film 5 and the protective film 91 of the inorganic material and the conductive bonding material 8 are not exposed. Therefore, a package in which the reaction between the external connection electrode 44 and the circuit pattern 90 and the gas in the external atmosphere is suppressed can be manufactured.

[第2の実施の形態]
図6は、本発明の第2の実施の形態に係る発光装置の概略縦断面図であり、図7は、発光装置の搭載基板の裏面を示す平面図である。第2の実施の形態は、保護膜5上にさらにAu層を設けた点で第1の実施の形態と異なる。
[Second Embodiment]
FIG. 6 is a schematic longitudinal sectional view of the light emitting device according to the second embodiment of the present invention, and FIG. 7 is a plan view showing the back surface of the mounting substrate of the light emitting device. The second embodiment differs from the first embodiment in that an Au layer is further provided on the protective film 5.

外部接続電極45は、図6及び図7に示すように、第1の実施の形態係る発光素子1のAu層4c及びAu層4cの外縁を覆う保護膜5上に、開口部50を塞ぐように、さらにAuめっきを施してAu層51が形成されることで設けられ、裏面パターン42及び保護膜5を外部雰囲気から保護する。   As shown in FIGS. 6 and 7, the external connection electrode 45 covers the opening 50 on the Au layer 4 c of the light emitting device 1 according to the first embodiment and the protective film 5 covering the outer edge of the Au layer 4 c. Further, the Au layer 51 is formed by further performing Au plating, and protects the back pattern 42 and the protective film 5 from the external atmosphere.

第2の実施の形態によれば、裏面パターン42及び保護膜5をAu層51によって覆い、外部雰囲気中のガスとの反応性の低いAu層51を露出する構成とするため、裏面パターン42と外部雰囲気中のガスとの反応を抑制することができる。   According to the second embodiment, the back pattern 42 and the protective film 5 are covered with the Au layer 51 to expose the Au layer 51 having low reactivity with the gas in the external atmosphere. Reaction with the gas in the external atmosphere can be suppressed.

また、保護膜5の開口部50をAu層51によって保護するため、保護膜5の開口部50を基点とした剥離等の発生を抑制することができる。   Further, since the opening 50 of the protective film 5 is protected by the Au layer 51, it is possible to suppress the occurrence of peeling or the like based on the opening 50 of the protective film 5.

なお、発光素子1Aを上記した配線基板9に実装する場合は、上記した導電接合材8を用いる他、外部接続電極45の接合面と回路パターン90の接合面の両方に金メッキ層を設けて当該両金メッキ層にプラズマを照射して活性化することにより、当該金メッキ層同士を常温で接合してもよい。   When mounting the light emitting element 1A on the wiring board 9 described above, in addition to using the conductive bonding material 8 described above, a gold plating layer is provided on both the bonding surface of the external connection electrode 45 and the bonding surface of the circuit pattern 90. The gold plating layers may be joined at normal temperature by irradiating both gold plating layers with plasma and activating them.

また、前記実施形態においては、発光素子としてLED素子を用いた発光装置を説明したが、発光素子はLED素子に限定されるものではない。さらに、ガラス封止部6はレンズ形状面を有しているものに限らず、複数の平面からなるものとしてもよいし、その他、具体的な細部構造等についても適宜に変更可能であることは勿論である。   Moreover, in the said embodiment, although the light-emitting device using an LED element as a light emitting element was demonstrated, a light emitting element is not limited to an LED element. Furthermore, the glass sealing portion 6 is not limited to having a lens-shaped surface, and may be composed of a plurality of planes, and other specific details such as a detailed structure can be appropriately changed. Of course.

1 発光素子1A 発光素子
2 LED素子
3 搭載基板
3a ビアホール
4 回路パターン
4a Au層
4b Ni層
4c W層
5 保護膜
6 ガラス封止部
7 中空部
8 導電接合材
9 配線基板
10 パッケージ20 成長基板
21 バッファ層
22 n型層
23 MQW層
24 p型層
25 p側電極
26 p側パッド電極
27 n側電極
27a Au層
27b Ni層
27c W層
28 バンプ
30 グリーンシート
40 Wペースト
41 表面パターン
42 裏面パターン
43 ビアパターン
44 外部接続電極
45 外部接続電極50 開口部
51 Au層
90 回路パターン
91 保護膜
DESCRIPTION OF SYMBOLS 1 Light emitting element 1A Light emitting element 2 LED element 3 Mounting board 3a Via hole 4 Circuit pattern 4a Au layer 4b Ni layer 4c W layer 5 Protective film 6 Glass sealing part 7 Hollow part 8 Conductive bonding material 9 Wiring board 10 Package 20 Growth board 21 Buffer layer 22 n-type layer 23 MQW layer 24 p-type layer 25 p-side electrode 26 p-side pad electrode 27 n-side electrode 27a Au layer 27b Ni layer 27c W layer 28 Bump 30 Green sheet 40 W paste 41 Surface pattern 42 Back surface pattern 43 Via pattern 44 External connection electrode 45 External connection electrode 50 Opening 51 Au layer 90 Circuit pattern 91 Protective film

Claims (4)

発光素子が搭載され、無機材料からなる搭載基板と、
前記搭載基板の裏面に設けられる電極と、
前記電極の外縁を覆うように、前記搭載基板の裏面に設けられる無機材料からなる保護膜とを有する発光装置。
A mounting substrate on which a light emitting element is mounted and made of an inorganic material;
An electrode provided on the back surface of the mounting substrate;
A light emitting device having a protective film made of an inorganic material provided on a back surface of the mounting substrate so as to cover an outer edge of the electrode.
前記電極と外部との電気的接続に用いられる導電接合材を有し、
前記保護膜は、前記電極のうち前記導電接合材との接合領域以外を全て覆う請求項1に記載の発光装置。
A conductive bonding material used for electrical connection between the electrode and the outside;
The light-emitting device according to claim 1, wherein the protective film covers all of the electrodes except for a bonding region with the conductive bonding material.
前記発光素子は、無機材料からなる封止材により封止される請求項2に記載の発光装置。   The light emitting device according to claim 2, wherein the light emitting element is sealed with a sealing material made of an inorganic material. 請求項2又は3に記載の発光装置と、
前記導電接合材と接合される外部電極と、前記外部電極のうち前記導電接合材との接合領域以外を覆う無機材料からなる保護膜とを有する配線基板とを備えるパッケージ。
A light emitting device according to claim 2 or 3,
A package comprising: an external electrode that is bonded to the conductive bonding material; and a wiring board that includes a protective film made of an inorganic material that covers a portion of the external electrode other than a bonding region with the conductive bonding material.
JP2010109896A 2010-05-12 2010-05-12 Light-emitting device and package Pending JP2011238819A (en)

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