JP2011232651A - Optical waveguide forming film and method of manufacturing the same as well as optical waveguide, optical wiring, optoelectronic hybrid substrate and electronic equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an optical waveguide forming film with excellent dimensional accuracy and a method of manufacturing the same as well as an optical waveguide, an optical wiring, an optoelectronic hybrid substrate, and electronic equipment capable of exhibiting high quality transmission performance.SOLUTION: A method of manufacturing an optical waveguide forming film includes the process of producing a film body by applying a coating liquid for an optical waveguide on a film base material, and heating the film body. In manufacturing the optical waveguide forming film, a heat shrinkage ratio of the film base material at a heating temperature of the heating process in a longitudinal direction is 0.5% or less.

Description

  The present invention relates to a method for producing an optical waveguide forming film, an optical waveguide forming film, an optical waveguide, an optical wiring, an opto-electric hybrid board, and an electronic device.

In electronic devices, there is an increasing demand for high-speed and high-capacity transmission of information signals between electronic components, and optical transmission in which electronic components are connected by optical signals has been studied. In optical transmission, an optical fiber or an optical waveguide is used as a transmission medium, and its dimensional accuracy is an important factor that affects the connection quality of the medium and thus the quality of the device itself. In recent years, polymer optical waveguide films using various polymer materials have been proposed, but dimensional changes due to heat shrinkage, heat curing, moisture absorption, etc. have become a major problem.
Patent Document 1 describes means for solving such a problem, but a special process using a hard substrate is required, so that the problem that enlargement and mass production are difficult remains. It was.

Japanese Patent Laid-Open No. 10-34761

  The present invention has been made in view of the above-described problems of the prior art, a film for forming an optical waveguide excellent in dimensional accuracy, a manufacturing method thereof, and an optical waveguide capable of exhibiting high-quality transmission performance, An object is to provide an optical wiring, an opto-electric hybrid board, and an electronic device.

The object is achieved by the following inventions (1) to (16).
(1) A method for producing a film for forming an optical waveguide, comprising: a film forming step of applying an optical waveguide coating solution on a film substrate to form a film-like body; and a heating step of heating the film-like body. And the heating shrinkage rate of the elongate direction of the said film base material at the heating temperature in the said heating process is 0.5% or less, The manufacturing method of the film for optical waveguide formation characterized by the above-mentioned.
(2) The manufacturing method of the film for optical waveguide formation as described in said (1) which has a patterning process after the said film forming process.
(3) The said patterning process is a patterning process of patterning an optical waveguide by exposing the said film-like body through a photomask, The manufacture of the film for optical waveguide formation as described in said (1) or (2) Method.

(4) The method for producing a film for forming an optical waveguide according to any one of the above (1) to (3), which includes a step of peeling the optical waveguide from the film substrate after the heating step.
(5) The manufacturing method of the film for optical waveguide formation in any one of said (1) thru | or (4) whose said film base material is a polyimide.
(6) The manufacturing method of the film for optical waveguide formation in any one of said (1) thru | or (4) whose said film base material is polyester.

(7) The manufacturing method of the film for optical waveguide formation as described in said (6) whose said polyester is a polyethylene terephthalate.

(8) The manufacturing method of the film for optical waveguide formation in any one of said (1) thru | or (7) with which the said film base material is mold-release-processed.

(9) The manufacturing method of the film for optical waveguide formation as described in said (8) whose said mold release process is a hard-coat process.
(10) The method for producing a film for forming an optical waveguide according to (9), wherein the hard coat is a hard coat containing silsesquioxane.
(11) The method for producing a film for forming an optical waveguide according to any one of (1) to (10), wherein the coating solution for optical waveguide contains a norbornene-based resin.

(12) An optical waveguide forming film obtained by the method for producing an optical waveguide forming film according to any one of (1) to (11).
(13) An optical waveguide characterized by being formed using the optical waveguide forming film described in (12).

(14) An optical wiring comprising the optical waveguide according to (13).

(15) An opto-electric hybrid board comprising electrical wiring and the optical wiring according to (14) above.

(16) An electronic device comprising the optical waveguide according to (13).

The film for forming an optical waveguide excellent in dimensional accuracy can be manufactured by the manufacturing method of the present invention.
As a result of intensive studies to achieve the above object, the present inventors have efficiently used an optical waveguide having excellent dimensional accuracy by using a film material having specific physical properties as a supporting substrate for forming a waveguide forming film. The inventors have found that it is possible to manufacture well, and have completed the present invention. Furthermore, it has become possible to provide an optical waveguide, an optical wiring, an opto-electric hybrid board, and an electronic device that can exhibit high-quality transmission performance.

It is sectional drawing which shows an example of the preparation methods of the optical waveguide using the film for optical waveguide formation of this invention. It is sectional drawing which shows an example of the preparation methods of the optical waveguide using the film for optical waveguide formation of this invention. It is sectional drawing which shows an example of the patterning process of this invention.

The method for producing a film for forming an optical waveguide of the present invention comprises a film forming step of applying a coating solution for an optical waveguide on a film substrate to form a film-like body, and a heating step of heating the film-like body, A method for producing a film for forming an optical waveguide having a heating shrinkage rate in the longitudinal direction of the film substrate at a heating temperature in the heating step is 0.5% or less.
The film for forming an optical waveguide of the present invention is manufactured by the above manufacturing method.
The optical waveguide of the present invention is manufactured using the above-mentioned film for forming an optical waveguide.
The optical wiring of the present invention is characterized by comprising the above optical waveguide.
The opto-electric hybrid board according to the present invention is characterized by having an electrical wiring and the optical wiring.
The electronic device of the present invention

The optical waveguide is provided.

  Hereinafter, a method for producing an optical waveguide forming film, an optical waveguide film, an optical waveguide, an optical wiring, an opto-electric hybrid board, and an electronic device according to the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.

First, the manufacturing method of the film for optical waveguide formation is demonstrated.
The method for producing a film for forming an optical waveguide of the present invention comprises a film forming step of applying a coating solution for an optical waveguide on a film substrate to form a film, and a heating step of heating the film. Have.
Hereinafter, the method for producing the optical waveguide forming film of the present invention will be sequentially described.
In the following description, the case where the optical waveguide forming film is the core layer 1 will be described. However, the clad layers 3 and 4 are also included in the optical waveguide forming film.

The film forming process of the present invention will be described.
The first stage of the film forming process is a process of forming a liquid film by applying an optical waveguide coating solution to a film substrate. Examples of the apparatus used for coating the optical waveguide coating liquid include, but are not limited to, a spin coater, a comma coater, a die coater, a bar coater, a roll coater, and a spray coater.
The second stage of the film forming process is a process of solidifying the liquid film formed on the film substrate to form a film-like body. When the optical waveguide forming coating solution is solvent-free, it is necessary to solidify by heat curing or UV curing. However, when the optical waveguide forming coating solution contains a solvent, it is solidified by drying the solvent. It becomes. Examples of the apparatus used in this step include, but are not limited to, a hot air dryer, a far infrared dryer, a steam oven, a UV curing furnace, an electric furnace, and a conveyor furnace.

The heating process of the present invention will be described.
The heating step of the present invention is a step of heating the film-like body. Thereby, the said film-like body can be hardened and heat resistance and long-term reliability can be improved. Examples of the apparatus used for the heating process include, but are not limited to, a hot air dryer, a far infrared dryer, a steam oven, a UV curing furnace, an electric furnace, and a conveyor furnace.
The heating temperature condition is not limited as long as it is within the heat resistance range of the film base material and the optical waveguide material, but it is preferable to carry out heating for 1 minute to 8 hours in a temperature range of 40 to 280 ° C. in normal cases.

The film base material has a heat shrinkage rate of 0.5% or less in the longitudinal direction at the heating temperature in the heating step. The heat shrinkage ratio in the longitudinal direction of the film base material is preferably −0.5% to 0.5%, and more preferably −0.2% to 0.2%. Here, the film base material having a heat shrinkage factor of − indicates a film base material that expands by heating. By using such a film base material, it becomes possible to minimize the change in the design dimension of the patterning formed on the optical waveguide film due to the dimensional change of the film base material, and an optical waveguide with a small connection loss is manufactured. be able to.
In order to make the film base material have such a heat shrinkage rate, the film base material prepared by the melt extrusion method is preferably subjected to a treatment (annealing treatment) for heating and shrinking the film base material in advance. Moreover, since the film base material produced by the casting method tends to decrease the heat shrinkage rate, it is preferable.

  The material suitable for such a film substrate is not particularly limited, but silicon substrate, silicon dioxide substrate, glass substrate, quartz substrate, metal foil, polybenzoxazole, polyamideimide, polyethylene terephthalate, polyethylene naphthalate, etc. Examples include film-like polyester and film-like polyimide. Among these, film-like polyesters such as polyethylene terephthalate and polyethylene naphthalate and film-like polyimides are preferable. Furthermore, among the film-like polyester, a polyethylene terephthalate film (PET film) is more preferable from the viewpoint of versatility and cost.

The method for producing a film for forming an optical waveguide of the present invention may include a patterning step after the initial film-forming step. The patterning method used in the patterning step of the present invention is not particularly limited, and a conventionally well-known patterning method can be used, but some methods are exemplified below.
In the first example, when a coating solution for an optical waveguide whose refractive index is changed by irradiation with actinic radiation is used, a photomask having a waveguide pattern drawn on a film-like body is used. In this method, the optical waveguide is patterned by exposing the film-like body.
In the second example, when a material that is insolubilized by UV irradiation is used as a material for the optical waveguide, the film-like body is covered with a photomask on which a waveguide pattern is drawn, and UV irradiation is performed. In this method, patterning is performed by developing the film.
In the third example, a film is coated with a photoresist, then irradiated with UV through a photomask, an image is formed by development with a developing solution or dry etching, and a pattern is formed by removing the resist. Is the method. Examples of other methods include a method of directly processing an optical waveguide pattern with a laser processing machine, a three-dimensional processing machine, or the like.

  Among these, the first example of patterning the optical waveguide by exposing the film-like body through a photomask is preferable. Thereby, a core part and a clad part can be formed in one film for optical waveguide formation, and the adhesiveness of a core part and a side clad part can be made very high.

As a first example, the case where a coating solution for an optical waveguide whose refractive index is lowered by irradiation with active radiation is used will be described with reference to FIG. An actinic radiation 6 is irradiated onto an optical waveguide forming film (for core layer) 13 as shown in FIG. Thereby, the part which selectively irradiates the actinic radiation 6 to the film for optical waveguide formation (for core layer) 13 and the unirradiated part can be formed.
In the portion 12 irradiated with the active radiation 6, the acid generator in the photosensitive resin composition constituting the optical waveguide forming film (for the core portion) generates an acid by light irradiation, and the monomer is polymerized. Start. As a result, the force that eliminates the concentration gradient of the unreacted monomer in the matrix works, and a monomer having a refractive index lower than that of the resin diffuses from the unirradiated region into the irradiated region and polymerizes, so that the active radiation 6 is irradiated. The refractive index of the formed portion 12 is relatively lower than that of the unirradiated region.
Further, by performing the patterning step before the heating step, it is possible to increase the contrast (refractive index difference) of the optical waveguide pattern formed in the patterning step in the heating step.

The manufacturing method of the film for forming an optical waveguide of the present invention may include a step of peeling the film for forming an optical waveguide from the film substrate after the heating step.
The film for forming an optical waveguide of the present invention can be used for a core layer and a cladding layer of an optical waveguide. For example, when used as a core layer, the film base material does not function as a cladding layer, or a cladding material is used as a core. In the case of forming an optical waveguide by coating or laminating on both surfaces, an optical waveguide may be formed by peeling the film for forming an optical waveguide from the film substrate. Moreover, when using the film for optical waveguide formation of this invention as a clad layer, when not using the said film base material as a protective layer, you may peel.
The method of peeling the optical waveguide forming film from the film substrate is not particularly limited, but the method of lifting the core layer as it is to separate it from the film substrate, the method of peeling the entire film after narrowly slitting it, Examples thereof include a method of half-cutting an optical waveguide film and peeling only that portion, a method of immersing in water and peeling.

(Release processing)
When a step of peeling the optical waveguide forming film from the film base material is necessary, it is preferable to perform a mold release treatment on the film base material in advance. Thereby, it can peel from a film base material, without producing damage etc. with respect to the film for optical waveguide formation at the time of peeling. As a mold release treatment method, a conventionally used method such as plasma treatment or surface treatment by hard coating can be appropriately used.

  Among these, as the mold release process, a hard coat process is preferable. In the present invention, the hard coat treatment refers to a treatment for forming a film (hard coat) on the surface of the substrate by depositing particles on the surface of the substrate, applying and drying a liquid material, or attaching a film. The thickness of the hard coat is not particularly limited, but is preferably in the range of 0.01 to 10 μm. By setting it as this range, sufficient peelability and adhesiveness to a film base material can be made compatible. The constituent material of the hard coat is not particularly limited, but conventionally used oil, polyolefin resin, melamine resin, urethane resin, organic hard coat such as acrylic resin, silicon hard coat such as silane compound, metal oxide, etc. Inorganic hard coats and organic-inorganic hybrid hard coats. Of these constituent materials, one type may be used, or two or more types may be used in combination or mixed. Among these, a mold release treatment using a silicon hard coat such as a silane compound is preferable. Thereby, it becomes easy to achieve both wettability and peelability when coating the waveguide film.

  Among these, release processing using a hard coat having silsesquioxane is particularly preferable. The composition of the hard coat having the silsesquioxane is not particularly limited, but a functional group that can be crosslinked by any method such as a vinyl group, an acrylic group, a methacryl group, a carboxyl group, a hydroxyl group, an epoxy group, or an oxetanyl group. Can be used effectively. In particular, the use of an epoxy group or an oxetanyl group is preferred in terms of fast curability and peelability. Moreover, it is preferable that content of silsesquioxane is 10 wt% or more. If the silsesquioxane content is less than 10 wt%, it is not preferable because sufficient peelability may not be obtained.

The hard coat having such a silsesquioxane preferably contains an oxetane monomer having a silsesquioxane structure as a raw material.
Examples of the oxetane monomer include poly [[3-[(3-ethyl-3-oxetanyl) methoxy] propyl] silasesquioxane] derivatives (Toa Gosei OX-SQ-H). Thereby, a high crosslinking density can be imparted to the hard coat, and penetration of the optical waveguide coating solution applied onto the hard coat can be prevented.
An oxetane monomer having such a silsesquioxetane structure and 4,4′-bis [(3-ethyl-3-oxetanyl) methoxymethyl] biphenyl (Ube Industries, Ltd. ETERNACOLL OXBP), 3-ethyl-3 {[( An oxetane monomer such as 3-ethyloxetane-3-yl) methoxy] methyl} oxetane (DOA) may be used in combination.

The hard coat having silsesquioxane may further contain an epoxy monomer as a raw material. The epoxy monomer is preferably an alicyclic epoxy monomer. The alicyclic epoxy monomer is highly reactive because it has a larger structural strain than other epoxy monomers. The alicyclic epoxy monomer is not particularly limited, but 1,2: alicyclic epoxy 8,9 diepoxy limonene (Daicel Chemical Industries, Ltd. CEL3000), 3'-4'-Epoxycyclohexane) methyl 3'-4 ' -Epoxycyclohexyl-carboxylate (Daicel Chemical Industry Co., Ltd. CEL2021), (3'-4'-Epoxycyclohexane, methyl 3'-4'-Epoxycyclohexyl-carboxylate modi-fied C1-Cyloid-Chemical-Chemical Cyl 2021 Cyclohexanedimethanol bis (3,4-epoxycyclohexane carbonate) (Kitamura Industrial Chemical Co., Ltd.) ER X-3360) and the like, and in particular, (3′-4′-Epoxycyclohexane) methyl 3′-4′-Epoxycyclohexyl-carboxylate (Daicel Chemical Industries, Ltd. CEL2021), (3′-4′-Epoxycyclohexane 3 ′) -4'-Epoxycyclohexyl-carboxy modified -caprolactone (Daicel Chemical Industries, Ltd. CEL-2081), 1,4-Cyclohexanedimethanol bis (3,4-epoxycyclohexane carbylate) Thereby, it is possible to obtain a photosensitive resin composition having high reactivity, excellent flexibility, and high transparency.
By using such an inorganic / organic composite material, a high crosslink density and appropriate flexibility can be imparted to the molded body of the photosensitive resin composition (such as the optical waveguide forming film of the present invention).

  As the optical waveguide coating solution, a known resin (polymer) that can be used for forming the core layer of the optical waveguide can be appropriately used. For example, a norbornene-based resin or a benzocyclobutene-based resin can be used. Polymers such as olefin resins, epoxy resins, polyamide resins, acrylic resins, methacrylic resins, polycarbonates, polystyrenes, polyimide resins, polybenzoxazole resins, and polymers obtained by combining one or more of these polymers Examples thereof include alloys, polymer blends (mixtures), copolymers, and crosslinked products, and cyclic olefin resins, epoxy resins, acrylic resins, and polyimide resins are preferable. Such resin can be used individually by 1 type or in combination of 2 or more types.

  Among these, those mainly composed of cyclic olefin resins are preferable. By using a cyclic olefin-based resin, an optical waveguide film having excellent optical transmission performance and heat resistance can be obtained. Among the cyclic olefin resins, those mainly composed of norbornene resins (norbornene polymers) are preferred. Since the norbornene-based polymer has high hydrophobicity, it is possible to obtain a film for forming an optical waveguide that hardly undergoes dimensional changes due to water absorption.

Examples of norbornene polymers include:
(1) addition (co) polymer of norbornene type monomer obtained by addition (co) polymerization of norbornene type monomer,
(2) an addition copolymer of a norbornene monomer and ethylene or α-olefins,
(3) an addition polymer such as an addition copolymer of a norbornene-type monomer and a non-conjugated diene and, if necessary, another monomer;
(4) a ring-opening (co) polymer of a norbornene-type monomer, and a resin obtained by hydrogenating the (co) polymer if necessary,
(5) a ring-opening copolymer of a norbornene-type monomer and ethylene or α-olefins, and a resin obtained by hydrogenating the (co) polymer if necessary,
(6) Ring-opening copolymers such as norbornene-type monomers and non-conjugated dienes, or other monomers, and polymers obtained by hydrogenating the (co) polymers as necessary. Examples of these polymers include random copolymers, block copolymers, and alternating copolymers.

  These norbornene-based polymers include, for example, ring-opening metathesis polymerization (ROMP), combination of ROMP and hydrogenation reaction, polymerization by radical or cation, polymerization using a cationic palladium polymerization initiator, and other polymerization initiators ( For example, it can be obtained by any known polymerization method such as polymerization using a polymerization initiator of nickel or another transition metal).

  Among these, as the norbornene-based polymer, an addition (co) polymer is preferable. Addition (co) polymers are also preferred because they are rich in transparency, heat resistance and flexibility. For example, after forming a film with the photosensitive resin composition, an electrical component or the like may be mounted via solder. In such a case, an addition (co) polymer is preferable because it needs to have high heat resistance, that is, reflow resistance. Further, when a film is formed from the photosensitive resin composition and incorporated in a product, it may be used in an environment of about 80 ° C., for example. Even in such a case, an addition (co) polymer is preferred because it is necessary to have heat resistance.

  Among these, the norbornene-based polymer preferably includes a norbornene repeating unit having a substituent containing a polymerizable group and a norbornene repeating unit having a substituent containing an aryl group.

  As the repeating unit of norbornene having a substituent containing a polymerizable group, the repeating unit of norbornene having a substituent containing an epoxy group, the repeating unit of norbornene having a substituent containing a (meth) acryl group, and an alkoxysilyl group At least one of the repeating units of norbornene having a substituent containing is preferable. These polymerizable groups are preferable because of their high reactivity among various polymerizable groups.

  Moreover, if the thing containing 2 or more types of norbornene repeating units containing such a polymeric group is used, both flexibility and heat resistance can be achieved.

  On the other hand, by including a norbornene repeating unit having a substituent containing an aryl group, the aryl group has extremely high hydrophobicity, and therefore, dimensional change due to water absorption can be prevented more reliably.

  Furthermore, the norbornene-based polymer preferably contains an alkylnorbornene repeating unit. The alkyl group may be linear or branched.

  By including the repeating unit of alkyl norbornene, the norbornene-based polymer has high flexibility, and thus can provide high flexibility (flexibility).

  Here, the optical waveguide formed using the optical waveguide film is preferably used in data communication using light in a wavelength region of about 600 to 1550 nm, for example. However, a repeating unit of hexyl (alkyl) norbornene is used. The norbornene-based polymer to be included is preferable because it has excellent transmittance with respect to light in the wavelength region as described above (particularly in the wavelength region near 850 nm).

  For these reasons, as the norbornene-based polymer, those represented by the following formulas (1) to (4) and (8) to (10) are preferable.

The norbornene polymer of the formula (1) can be produced as follows.
Norbornene having R ₁ and norbornene having an epoxy group in the side chain are dissolved in toluene, and solution polymerization is performed using a Ni compound of the following formula (2) as a catalyst to obtain formula (1).

  In addition, the manufacturing method of norbornene which has an epoxy group in a side chain is as (i) (ii), for example.

(I) Synthesis of norbornene methanol (NB—CH ₂ —OH) CPD (cyclopentadiene) and α-olefin (CH ₂ ═CH—CH ₂ —OH) produced by cracking of DCPD (dicyclopentadiene) under high temperature and high pressure React.

(Ii) Synthesis of epoxy norbornene It is formed by the reaction of norbornene methanol and epichlorohydrin.

In the formula (1), when b is 2 or 3, an epichlorohydrin in which the methylene group is an ethylene group, a propylene group or the like is used.
Among the norbornene-based polymers represented by the formula (1), from the viewpoint that both flexibility and heat resistance can be achieved, in particular, R ₁ is an alkyl group having 4 to 10 carbon atoms, and a and A compound in which each b is 1, for example, a copolymer of butyl norbornene and methyl glycidyl ether norbornene, a copolymer of hexyl norbornene and methyl glycidyl ether norbornene, a copolymer of decyl norbornene and methyl glycidyl ether norbornene, or the like is preferable.

The norbornene-based polymer of the formula (5) is obtained by dissolving norbornene having R ₂ and norbornene having an acrylic and methacrylic group in the side chain in toluene, and performing solution polymerization using the Ni compound (A) described above as a catalyst. Obtainable.

Among the norbornene-based polymers represented by the formula (5), R ₂ is an alkyl group having 4 to 10 carbon atoms and c is 1 from the viewpoint of achieving both flexibility and heat resistance. Compounds such as copolymers of butyl norbornene and 2- (5-norbornenyl) methyl acrylate, copolymers of hexyl norbornene and 2- (5-norbornenyl) methyl acrylate, decyl norbornene and 2- (5-norbornenyl) acrylate A copolymer with methyl is preferred.

The resin of the formula (6) is obtained by dissolving norbornene having R ₄ and norbornene having an alkoxysilyl group in the side chain in toluene, and performing solution polymerization using the Ni compound of the formula (2) described above as a catalyst. be able to.

Among the norbornene-based polymers represented by the formula (6), in particular, a compound in which R ₄ is an alkyl group having 4 to 10 carbon atoms, d is 1 or 2, and X ₃ is a methyl group or an ethyl group, For example, a copolymer of butylnorbornene and norbornenylethyltrimethoxysilane, a copolymer of hexylnorbornene and norbornenylethyltrimethoxysilane, a copolymer of decylnorbornene and norbornenylethyltrimethoxysilane, butylnorbornene and triethoxysilyl Copolymer of norbornene, copolymer of hexyl norbornene and triethoxysilyl norbornene, copolymer of decyl norbornene and triethoxysilyl norbornene, copolymer of butyl norbornene and trimethoxysilyl norbornene, hex Copolymer of norbornene and trimethoxysilyl norbornene, copolymers, etc. of decyl norbornene and trimethoxysilyl norbornene are preferred.

Norbornene having R ₅ and norbornene having A ₁ and A ₂ in the side chain are dissolved in toluene, and solution polymerization is carried out using Ni compound (A) as a catalyst to obtain formula (7).

  As the norbornene-based polymer represented by the formula (10), for example, any one of butyl norbornene, hexyl norbornene or decyl norbornene, 2- (5-norbornenyl) methyl acrylate, norbornenyl ethyl trimethoxysilane, Terpolymer with either triethoxysilyl norbornene or trimethoxysilyl norbornene, terpolymer of butyl norbornene, hexyl norbornene or decyl norbornene, 2- (5-norbornenyl) methyl acrylate and methyl glycidyl ether norbornene, butyl Norbornene, hexyl norbornene or decyl norbornene, methyl glycidyl ether norbornene, norbornenyl ethyl trimethoxysilane, trieth Terpolymers, etc. and any of shea silyl norbornene or trimethoxysilyl norbornene.

Norbornene having R ₇ and norbornene containing-(CH ₂ ) -X ₁ -X ₂ (R ₈ ) _3-j (Ar) _j in the side chain are dissolved in toluene, and solution polymerization is performed using a Ni compound as a catalyst. To obtain equation (11).

Of the norbornene polymers represented by the formula (11), those in which X ₁ is an oxygen atom, X ₂ is a silicon atom, and Ar is a phenyl group are preferable.
Further, particularly from the viewpoint of flexibility, heat resistance and refractive index control, R ₇ is an alkyl group having 4 to 10 carbon atoms, X ₁ is an oxygen atom, X ₂ is a silicon atom, Ar is a phenyl group, R Compounds in which ₈ is a methyl group, i is 1 and j is 2, for example, a copolymer of butylnorbornene and diphenylmethylnorbornenemethoxysilane, a copolymer of hexylnorbornene and diphenylmethylnorbornenemethoxysilane, decylnorbornene and diphenylmethylnorbornenemethoxysilane And a copolymer thereof are preferred.

  Specifically, it is preferable to use the following norbornene resin.

From the viewpoint of flexibility, heat resistance, and refractive index control, in Formula (11), R ₇ is an alkyl group having 4 to 10 carbon atoms, X ₁ is a methylene group, X ₂ is a carbon atom, and Ar is A compound having a phenyl group, R ₈ is a hydrogen atom, i is 0, and j is 1, for example, a copolymer of butylnorbornene and phenylethylnorbornene, a copolymer of hexylnorbornene and phenylethylnorbornene, a decylnorbornene and phenylethylnorbornene It may be a copolymer or the like.
Further, the following may be used as the norbornene resin.

P ₁ / q _{1 to} p ₃ / q ₃ , p ₅ / q ₅ , p ₆ / q ₆ or p ₄ / q ₄ + r may be 20 or less, preferably 15 or less, About 0.1-10 is more preferable. Thereby, the effect including the repeating unit of multiple types of norbornene is exhibited.

The norbornene-based resin as described above preferably has a leaving group. Here, the leaving group is a group that is released by the action of an acid.
Specifically, those having at least one of an —O— structure, an —Si—aryl structure, and an —O—Si— structure in the molecular structure are preferable. Such an acid leaving group is released relatively easily by the action of a cation.

Among these, as the leaving group that causes a decrease in the refractive index of the resin by leaving, at least one of the -Si-diphenyl structure and the -O-Si-diphenyl structure is preferable.
For example, among the norbornene polymers represented by the formula (11), those in which X ₁ is an oxygen atom, X ₂ is a silicon atom, and Ar is a phenyl group have a leaving group.
Further, in the formula (12), there are cases where the Si—O—X ₃ part of the alkoxysilyl group is eliminated.

  For example, when the norbornene resin of the formula (12) is used, it is presumed that the reaction proceeds as follows by the acid generated from the photoacid generator (denoted as PAG). Here, only the leaving group portion is shown, and the case where i = 1 will be described.

Further, in addition to the structure of the formula (12), the side chain may have an epoxy group. By using such a material, there is an effect that a film having excellent adhesion can be formed.
A specific example is as follows.

The compound represented by the formula (15) includes, for example, hexyl norbornene, diphenylmethyl norbornene methoxysilane (norbornene containing -CH ₂ -O-Si (CH ₃ ) (Ph) ₂ in the side chain) and epoxy norbornene in toluene. It can be obtained by dissolving and solution polymerization using a Ni compound as a catalyst.

  In the patterning step to be described later, when the optical waveguide is patterned on the optical waveguide forming film by irradiation with active radiation, the optical waveguide coating solution contains, as additives, a monomer, a promoter (first substance), and a catalyst precursor. The body (second substance) may be included.

  The monomer reacts in the active radiation irradiated region to form a reactant upon irradiation with actinic radiation, and due to the presence of this reactant, the refractive index in the active radiation irradiated region and the non-active radiation irradiated region. It is a compound that can make a difference.

  The reactants include a polymer formed by polymerizing monomers in a polymer (matrix), a crosslinked structure that crosslinks the polymers, and a branched structure that is polymerized and branched from the polymer (branched polymer). And at least one of side chains (pendant groups)).

  Here, in a film-like body irradiated with actinic radiation, when it is desired that the refractive index of the irradiated region be high, a polymer having a relatively low refractive index and a monomer having a high refractive index for this polymer Is used in combination and a polymer having a relatively high refractive index is used in combination with a monomer having a low refractive index for this polymer. The Note that “high” or “low” in the refractive index does not mean the absolute value of the refractive index but means a relative relationship between certain materials.

  When the refractive index of the irradiated region in the film-like body decreases due to the reaction of the monomer (reactant generation), the portion becomes a side cladding portion, and when the refractive index of the irradiated region increases, the portion becomes the core portion. It becomes. In the description of the steps described later, the former case will be described as an example.

  Such a monomer is not particularly limited as long as it is a compound having a polymerizable site, and examples thereof include norbornene monomers, acrylic acid (methacrylic acid) monomers, epoxy monomers, styrene monomers, and cyclic ether groups. And an oligomer having a cyclic ether group, and one or more of them can be used in combination.

  Among these, it is preferable to use a norbornene monomer, a monomer having a cyclic ether group, and an oligomer having a cyclic ether group as the monomer. By using a norbornene-based monomer, an optical waveguide forming film having excellent optical transmission performance and excellent heat resistance and flexibility can be obtained.

  Here, the norbornene-based monomer is a generic term for monomers containing at least one norbornene skeleton represented by the following formula (16), and examples thereof include compounds represented by the following formula (17).

Examples of the unsubstituted hydrocarbon group (hydrocarbyl group) include, for example, a linear or branched alkyl group having 1 to 10 carbon atoms (C _{1 to} C ₁₀ ), a linear or branched carbon number of 2 -10 (C ₂ -C ₁₀ alkenyl group, linear or branched alkynyl group having 2 to 10 carbon atoms (C ₂ -C ₁₀ ), cycloalkyl having 4 to 12 carbon atoms (C ₄ -C ₁₂ ) Group, C 4-12 (C ₄ -C ₁₂ ) cycloalkenyl group, C 6-12 (C ₆ -C ₁₂ ) aryl group, C 7-24 (C ₇ -C ₂₄ ) aralkyl group In addition, R ¹ and R ² , R ³ and R ⁴ may each be an alkylidenyl group having 1 to 10 carbon atoms (C _{1 to} C ₁₀ ).

  Specific examples of the alkyl group include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, heptyl group, octyl group. , Nonyl and decyl groups, but are not limited thereto.

  Specific examples of the alkenyl group include, but are not limited to, a vinyl group, an allyl group, a butenyl group, and a cyclohexenyl group.

  Specific examples of the alkynyl group include, but are not limited to, ethynyl group, 1-propynyl group, 2-propynyl group, 1-butynyl group and 2-butynyl group.

  Specific examples of the cycloalkyl group include, but are not limited to, a cyclopentyl group, a cyclohexyl group, and a cyclooctyl group.

  Specific examples of the aryl group include, but are not limited to, a phenyl group, a naphthyl group, and an anthracenyl group.

  Specific examples of the aralkyl group include, but are not limited to, a benzyl group and a phenylethyl (phenethyl) group.

  Further, specific examples of the alkylidenyl group include, but are not limited to, a methylidenyl group and an ethylidenyl group.

  Examples of the substituted hydrocarbon group include those in which some or all of the hydrogen atoms of the hydrocarbon group are substituted with halogen atoms, that is, halohydrocarbyl groups, perhalohydrocarbyl groups. Or halogenated hydrocarbon groups such as perhalocarbyl groups.

  In these halogenated hydrocarbon groups, the halogen atom substituted with a hydrogen atom is preferably at least one selected from a chlorine atom, fluorine and bromine, more preferably a fluorine atom.

  Among these, specific examples of the perhalogenated hydrocarbon group (perhalohydrocarbyl group, perhalocarbyl group) include, for example, a perfluorophenyl group, a perfluoromethyl group (trifluoromethyl group), and a perfluoroethyl group. Perfluoropropyl group, perfluorobutyl group, perfluorohexyl group and the like.

As the halogenated alkyl group, those having 11 to 20 carbon atoms can be suitably used in addition to those having 1 to 10 carbon atoms. That is, as the halogenated alkyl group, a group that is partially or completely halogenated, linear or branched, and represented by the general formula: —C _Z X ″ _{2Z + 1} can be selected. Here, X '' represents a halogen atom or a hydrogen atom each independently, and Z represents the integer of 1-20.

In addition to the halogen atom, the substituted hydrocarbon group may be a linear or branched alkyl group having 1 to 5 carbon atoms (C _{1 to} C ₅ ), a haloalkyl group, an aryl group, and a cycloalkyl group. Examples thereof include a substituted cycloalkyl group, aryl group and aralkyl group (aralkyl group).

Moreover, as a functional substituent, for example, — (CH ₂ ) _n —CH (CF ₂ ) ₂ —O—Si (Me) ₃ , — (CH ₂ ) _n —CH (CF ₃ ) ₂ —O—CH ₂ —O—CH ₃ , — (CH ₂ ) _n —CH (CF ₃ ) ₂ —O—C (O) —O—C (CH ₃ ) ₃ , — (CH ₂ ) _n —C (CF ₃ ) ₂ — OH, — (CH ₂ ) _n —C (O) —NH ₂ , — (CH ₂ ) _n —C (O) —Cl, — (CH ₂ ) _n —C (O) —O—R ⁵ , — ( ^{_{CH 2) n-O-R}} 5, - (CH 2) n -O-C (O) -R 5, - (CH 2) n -C (O) -R 5, - (CH 2) n -O —C (O) —OR ⁵ , — (CH ₂ ) _n —Si (R ⁵ ) ₃ , — (CH ₂ ) _n —Si (OR ⁵ ) ₃ , — (CH ₂ ) _n —O—Si (R ⁵⁾ ) ₃ and-(C _{H 2) n -C (O)} -OR 6 , and the like.

Here, in each of the formulas above, each, n is an integer of 0, ^{R 5} are each independently a hydrogen atom, a linear or branched C 1 to 20 _(C 1 -C ₂₀₎ alkyl group, a linear or branched halogenated or perhalogenated alkyl group having a carbon number 1 to 20 _(C 1 _{-C 20)} linear or branched C 2 to 10 _(C 2 ~ alkenyl group of C _10), a linear or branched alkynyl group having 2 to 10 carbon atoms _(C 2 _{~C 10),} a cycloalkyl group having 5 to 12 carbon atoms _(C 5 _{~C 12),} to 6 carbon atoms -14 (C ₆ -C ₁₄ ) aryl group, C 6-14 (C ₆ -C ₁₄ ) halogenated or perhalogenated aryl group or C 7-24 (C ₇ -C ₂₄ ) aralkyl group Represents.

Incidentally, the hydrocarbon group represented by R ⁵ represents the same hydrocarbon groups as those represented by R ¹ to R ^4. As represented by R ^{1 to} R ⁴ , the hydrocarbon group represented by R ⁵ may be halogenated or perhalogenated.

For example, when R ⁵ is a halogenated or perhalogenated alkyl group having 1 to 20 carbon atoms (C _{1 to} C ₂₀ ), R ⁵ is represented by the general formula: —C _Z X ″ _{2Z + 1} . Here, z and X ″ are the same as defined above, and at least one of X ″ is a halogen atom (for example, a bromine atom, a chlorine atom, or a fluorine atom).

Here, the perhalogenated alkyl group is a group in which all X ″ are halogen atoms in the above general formula, and specific examples thereof include a trifluoromethyl group, a trichloromethyl group, —C ₇ F _15. Although _-C 11 _{F 23} and the like, but are not limited to.

  Specific examples of the perhalogenated aryl group include, but are not limited to, a pentachlorophenyl group and a pentafluorophenyl group.

Examples of R ⁶ include —C (CH ₃ ) ₃ , —Si (CH ₃ ) ₃ , —CH (R ⁷ ) —O—CH ₂ CH ₃ , —CH (R ⁷ ) OC (CH ₃ ). ₃ and the cyclic group of the following formula (18), and the like.

Here, R ⁷ represents a hydrogen atom or a linear or branched alkyl group having ₁ to ₅ carbon atoms (C _{1 to} C ₅ ).

  Examples of the alkyl group include methyl group, ethyl group, propyl group, i-propyl group, butyl group, i-butyl group, t-butyl, pentyl group, t-pentyl group, and neopentyl group.

  In the cyclic group represented by the above formula (18), an ester bond is formed between the single bond extending from the ring structure and the acid substituent.

Specific examples of R ⁶ include, for example, a 1-methyl-1-cyclohexyl group, an isobornyl group, a 2-methyl-2-isobornyl group, a 2-methyl-2-adamantyl group, a tetrahydrofuranyl group, Examples thereof include a tetrahydropyranoyl group, a 3-oxocyclohexanoyl group, a mevalonic lactonyl group, a 1-ethoxyethyl group, and a 1-t-butoxyethyl group.

Other examples of R ⁶ include a dicyclopropylmethyl group (Dcpm) and a dimethylcyclopropylmethyl group (Dmcp) represented by the following formula (19).

  Moreover, it can replace with the said norbornene-type monomer, or can also use a crosslinkable monomer (crosslinking agent) with the said monomer. This crosslinkable monomer is a compound capable of causing a crosslinking reaction in the presence of a catalyst precursor described later.

  The use of the crosslinkable monomer has the following advantages. That is, since the crosslinkable monomer is polymerized faster, the time required for forming the optical waveguide forming film can be shortened. Further, since the crosslinkable monomer is difficult to evaporate even when heated, an increase in vapor pressure can be suppressed. Furthermore, since the crosslinkable monomer is excellent in heat resistance, the heat resistance of the optical waveguide forming film can be improved.

  Examples of the crosslinkable norbornene-based monomer include compounds of fused multicyclic ring systems and compounds of linked multicyclic ring systems.

  Examples of the continuous polycyclic ring-based compound (continuous polycyclic ring-based crosslinkable norbornene-based monomer) include compounds represented by the following formula (20).

  For simplicity, norbornadiene is considered to be included in a continuous polycyclic ring system and includes a polymerizable norbornene double bond.

  Specific examples of the compound having a continuous polycyclic ring system include, but are not limited to, compounds represented by the following formula (21).

  On the other hand, examples of the linked polycyclic ring-based compound (linked polycyclic ring-based crosslinkable norbornene-based monomer) include compounds represented by the following formula (22).

  Here, the divalent substituent refers to a group having two bonds that can be bonded to the norbornene structure at the end.

Specific examples of the divalent hydrocarbon group (hydrocarbyl group) include an alkylene group represented by the general formula:-(C _d H _2d )-(d is preferably an integer of 1 to 10). And a divalent aromatic group (aryl group).

The divalent alkylene group is preferably a linear or branched alkylene group having 1 to 10 carbon atoms (C _{1 to} C ₁₀ ), such as a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, Examples include a hexylene group, a heptylene group, an octylene group, a nonylene group, and a decylene group.

  The branched alkylene group is one in which a main chain hydrogen atom is substituted with a linear or branched alkyl group.

On the other hand, the divalent aromatic group is preferably a divalent phenyl group or a divalent naphthyl group. The divalent ether group is a group represented by —R ¹⁰ —O—R ¹⁰ —. Here, R ¹⁰ independently represents the same as R ⁹ .

  Specific examples of the linked polycyclic compound include compounds represented by the following formulas (23) to (27), and fluorine-containing compounds represented by the following formulas (28) and (29) (fluorine-containing compounds). Crosslinkable norbornene monomers), but is not limited thereto.

  The compound represented by the chemical formula (24) is dimethylbis [bicyclo [2.2.1] hept-2-ene-5-methoxy] silane, and is named dimethylbis (norbornenemethoxy) silane. (Abbreviated as “SiX”).

  Among various crosslinkable norbornene monomers, dimethylbis (norbornenemethoxy) silane (SiX) is particularly preferable. SiX has a sufficiently low refractive index with respect to a norbornene-based polymer containing a repeating unit of alkylnorbornene and / or a repeating unit of aralkylnorbornene. For this reason, the refractive index of the irradiation area | region which irradiates the active radiation mentioned later can be reliably made low, and it can be set as a side cladding part. Further, the difference in refractive index between the core portion and the side cladding portion can be increased, and the characteristics (optical transmission performance) of the core layer (optical waveguide) can be improved.

  Examples of the monomer having a cyclic ether group and the oligomer having a cyclic ether group include those having an oxetanyl group or an epoxy group. Such a cyclic ether group is preferable because it is easily opened by an acid and the polymerization reaction easily proceeds. Considering the diffusibility of the monomer and oligomer, the molecular weight (weight average molecular weight) of the monomer and oligomer is preferably 100 or more and 400 or less, respectively.

  As the monomer having an oxetanyl group and the oligomer having an oxetanyl group, those selected from the following formulas (30) to (39) are preferable. By using these, there is an advantage that transparency in the vicinity of a wavelength of 850 nm is excellent and both flexibility and heat resistance are possible. These may be used alone or in combination.

  The compound represented by the formula (39) is 3- (cyclohexyloxy) methyl-3-ethyloxetane and may be abbreviated as “CHOX”.

  Especially, it is preferable to use Formula (32), (34), (35), (36), (39) from a viewpoint of ensuring the refractive index difference with the said resin.

  Furthermore, considering the point that there is a difference in refractive index from the resin, the point that the molecular weight is small, the mobility of the monomer is high, and the point that the monomer does not volatilize easily, formulas (39) and (34) should be used. Is particularly preferred.

  Moreover, as a compound which has an oxetanyl group, the following formula | equation (40) and Formula (41) can be used. Formula (40) can use Toagosei's trade name TESOX, etc., and Formula (41) can use Toagosei's trade name OX-SQ.

Examples of the monomer having an epoxy group and the oligomer having an epoxy group include the following. The monomer and oligomer having an epoxy group are polymerized by ring-opening in the presence of an acid.
As the monomer having an epoxy group and the oligomer having an epoxy group, those represented by the following formulas (42) to (47) can be used. Especially, it is preferable to use an alicyclic epoxy monomer (44)-(47) from a viewpoint that the distortion energy of an epoxy ring is large and is excellent in reactivity.
In addition, Formula (42) is epoxy norbornene, for example, ProNBES EpNB can be used. Formula (43) is γ-glycidoxypropyltrimethoxysilane. For example, Z-6040 manufactured by Toray Dow Corning Silicone Co., Ltd. can be used. Formula (44) is 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, and for example, E0327 manufactured by Tokyo Chemical Industry can be used.
Further, the formula (45) is 3,4-epoxycyclohexenylmethyl-3, '4'-epoxycyclohexenecarboxylate, and for example, Celoxide 2021P manufactured by Daicel Chemical Industries, Ltd. can be used. Further, the formula (46) is 1,2-epoxy-4-vinylcyclohexane, and Celoxide 2000 manufactured by Daicel Chemical Industries, Ltd. can be used.
Further, the formula (47) is 1,2: 8,9 diepoxy limonene, and for example, (Celoxide 3000 manufactured by Daicel Chemical Industries, Ltd.) can be used.

Furthermore, a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group may be used in combination.
In addition, you may make it use the above monomers and oligomers individually or in arbitrary combinations.
For example, a monomer having an oxetanyl group and an oligomer having an oxetanyl group have a slow initiation reaction for initiating polymerization but a fast growth reaction. On the other hand, a monomer having an epoxy group and an oligomer having an epoxy group have a fast initiation reaction for initiating polymerization, but have a slow growth reaction. Therefore, by using a monomer having an oxetanyl group, an oligomer having an oxetanyl group, a monomer having an epoxy group, and an oligomer having an epoxy group, when irradiated with light, the light irradiated portion and the unirradiated portion A difference in refractive index can be reliably generated.

  These monomers and oligomers are preferably 1 part by weight or more and 50 parts by weight or less based on 100 parts by weight of the resin. Especially, 2 to 30 weight part is preferable. Thereby, the refractive index modulation between the core and the clad is possible, and there is an effect that both flexibility and heat resistance can be achieved.

  The catalyst precursor (second substance) is a substance capable of initiating the above-mentioned monomer reaction (for example, polymerization reaction, crosslinking reaction), and is a promoter (first substance) activated by irradiation of actinic radiation described later. ) Is a substance whose activation temperature changes due to the action of.

  As the catalyst precursor, any compound may be used as long as the activation temperature changes (increases or decreases) with irradiation of actinic radiation. Those whose temperature decreases are preferred. Thereby, the film for forming an optical waveguide can be formed by heat treatment at a relatively low temperature, and the characteristics (optical transmission performance) of the film for forming an optical waveguide can be prevented from being deteriorated due to the influence of heat.

  In the state where the activation temperature is lowered (active latent state), the catalyst precursor has an activation temperature lower by about 10 to 80 ° C. (preferably about 10 to 50 ° C.) than the original activation temperature. Is preferred. Thereby, a refractive index difference can be produced reliably between the core portion and the side clad portion.

Such a catalyst precursor includes (mainly) one containing at least one of Pd (OAc) ₂ (P (i-Pr) ₃ ) ₂ and Pd (OAc) ₂ (P (Cy) ₃ ) _2. Is preferred.

  A co-catalyst is a substance that can be activated by irradiation with actinic radiation to change the activation temperature of the catalyst precursor (the temperature at which the monomer reacts).

  As the co-catalyst, any compound can be used as long as it has a molecular structure that changes (reacts or decomposes) when activated by irradiation with actinic radiation. And a compound containing (mainly) a compound (photoinitiator) that generates a proton or other cation cation and a weakly coordinating anion (WCA) that can be substituted for the leaving group of the catalyst precursor. Used for.

  Examples of weakly coordinating anions include tetrakis (pentafluorophenyl) borate ion (FABA-) and hexafluoroantimonate ion (SbF6-).

  Examples of the cocatalyst (photoacid generator or photobase generator) include tetrakis (pentafluorophenyl) borate and hexafluoroantimonate, tetrakis (bentafluorophenyl) gallate, and aluminates. , Antimonates, other borates, gallates, carboranes, halocarboranes.

  You may make it add a sensitizer in the said coating liquid for optical waveguides as needed.

  The sensitizer increases the sensitivity of the cocatalyst to actinic radiation, reduces the time and energy required for the activation (reaction or decomposition) of the cocatalyst, and the wavelength of the actinic radiation to a wavelength suitable for the activation of the cocatalyst. It has a function of changing the wavelength.

  Such a sensitizer is appropriately selected according to the sensitivity of the promoter and the peak wavelength of absorption of the sensitizer, and is not particularly limited. For example, 9,10-dibutoxyanthracene (CAS No. 76275-14) -4)), anthracenes, xanthones, anthraquinones, phenanthrenes, chrysene, benzpyrenes, fluoracenes, rubrenes, pyrenes, indanthrines, thioxanthen-9-ones, These may be used alone or as a mixture.

  Specific examples of the sensitizer include 2-isopropyl-9H-thioxanthen-9-one, 4-isopropyl-9H-thioxanthen-9-one, 1-chloro-4-propoxythioxanthone, phenothiazine or a mixture thereof. Can be mentioned.

  The total content of the sensitizer in the optical waveguide coating solution is not particularly limited, but is preferably 0.01% by weight or more, more preferably 0.5% by weight or more, and 1% by weight or more. More preferably. In addition, it is preferable that an upper limit is 5 weight% or less.

  Furthermore, an antioxidant can be added to the optical waveguide coating solution. Thereby, generation of undesirable free radicals and natural oxidation of the polymer 115 can be prevented. As a result, the characteristics of the obtained core layer can be improved.

If the polymer used in the optical waveguide coating solution is liquid, it may be solvent-free, but in that case, it becomes difficult to obtain a thin film. Therefore, it is preferable to dissolve the polymer and other additives in a solvent and use it as a solution.
The said solvent can use suitably what can melt | dissolve uniformly in each material. By adjusting the resin concentration by changing the addition amount of the solvent, it is possible to obtain an optical waveguide coating liquid for easily producing an optical waveguide forming film having a desired thickness.

  Examples of the solvent used for the preparation of the optical waveguide coating solution include diethyl ether, diisopropyl ether, 1,2-dimethoxyethane (DME), 1,4-dioxane, tetrahydrofuran (THF), tetrahydropyran (THP), and anisole. , Ether solvents such as diethylene glycol dimethyl ether (diglyme), diethylene glycol ethyl ether (carbitol), cellosolv solvents such as methyl cellosolve, ethyl cellosolve, phenyl cellosolve, aliphatic hydrocarbon solvents such as hexane, pentane, heptane, cyclohexane, Aromatic hydrocarbon solvents such as toluene, xylene, benzene and mesitylene, aromatic heterocyclic solvents such as pyridine, pyrazine, furan, pyrrole, thiophene and methylpyrrolidone, N, N-dimethyl Amide solvents such as formamide (DMF), N, N-dimethylacetamide (DMA), halogen compound solvents such as dichloromethane, chloroform, 1,2-dichloroethane, ester solvents such as ethyl acetate, methyl acetate, ethyl formate , Various organic solvents such as sulfur compound solvents such as dimethyl sulfoxide (DMSO) and sulfolane, or mixed solvents containing these.

  The film for forming an optical waveguide of the present invention will be described. The film for forming an optical waveguide of the present invention is an optical waveguide forming film produced by the above-described method for producing an optical waveguide forming film. Thereby, a dimensional change is small, the joining with an element is easy, and it can be set as the film for optical waveguide formation with small joining loss.

  In the description of the method for manufacturing the optical waveguide forming film described above, the case where the core layer 1 is manufactured has been described, but the same applies to the cladding layers 3 and 4 by setting the optical waveguide forming coating solution to the following composition. It can manufacture with the manufacturing method of.

  The coating solution for the optical waveguide when forming each of the cladding layers 3 and 4 is not particularly limited, but a known polymer that can be used for forming the cladding layer in the optical waveguide can be appropriately used. , Cyclic olefin resins, acrylic resins, methacrylic resins, polycarbonate resins, polystyrene resins, epoxy resins, polyamide resins, polyimide resins, polybenzoxazole resins, etc., and one of these polymers Alternatively, a polymer alloy, a polymer blend (mixture), a copolymer, a cross-linked body, or the like, which is a combination of two or more, can be mentioned as a suitable one. Note that, in an optical waveguide provided with a clad layer containing such a resin, the refractive index of the clad layer needs to be lower than the refractive index of the core part in order for the core part to sufficiently function as a light guide. Therefore, it is preferable to select and use a resin having a lower refractive index than the resin forming the core layer for the cladding layer.

  In the present invention, the resin composition mainly composed of the resin for the clad layer is used as a coating solution as it is or dissolved in a solvent. A solvent that can be uniformly dissolved in each material can be used as appropriate. By changing the amount of the solvent added and adjusting the resin concentration, a coating solution for easily producing an optical waveguide having a desired thickness can be obtained.

  Examples of the solvent used for the preparation of the optical waveguide coating solution include diethyl ether, diisopropyl ether, 1,2-dimethoxyethane (DME), 1,4-dioxane, tetrahydrofuran (THF), tetrahydropyran (THP), and anisole. , Ether solvents such as diethylene glycol dimethyl ether (diglyme), diethylene glycol ethyl ether (carbitol), cellosolv solvents such as methyl cellosolve, ethyl cellosolve, phenyl cellosolve, aliphatic hydrocarbon solvents such as hexane, pentane, heptane, cyclohexane, Aromatic hydrocarbon solvents such as toluene, xylene, benzene and mesitylene, aromatic heterocyclic solvents such as pyridine, pyrazine, furan, pyrrole, thiophene and methylpyrrolidone, N, N-dimethyl Amide solvents such as formamide (DMF), N, N-dimethylacetamide (DMA), halogen compound solvents such as dichloromethane, chloroform, 1,2-dichloroethane, ester solvents such as ethyl acetate, methyl acetate, ethyl formate , Various organic solvents such as sulfur compound solvents such as dimethyl sulfoxide (DMSO) and sulfolane, or mixed solvents containing these.

Next, the optical waveguide will be described.
The optical waveguide 5 includes a core layer 1 in which a long core portion 11 and a side cladding portion 12 provided so as to surround the core portion 11 are formed, and a lower portion laminated below the core layer 1. It has a clad layer 3 and an upper clad layer 4 laminated above the core layer 1.

  In the optical waveguide 5 configured as described above, the core portion 1 is in a state where the side surface is surrounded by the side cladding portion 12 and the cladding layers 3 and 4. In the following, the side clad part 12 and the clad layers 3 and 4 are collectively referred to as a clad part.

  In the optical waveguide 5, the light incident on one end portion of the core portion 11 is totally reflected at the interface between the core portion 11 and the clad portion, and propagates to the other end portion, so that the light from the other end portion is transmitted. It can be taken out. Thereby, optical communication can be performed between two points.

  Although the refractive index of the core part 11 should just be larger than the refractive index of a clad part, it is preferable that the difference is 0.5% or more, and it is more preferable that it is 0.8% or more. On the other hand, the upper limit value may not be set, but is preferably about 5.5%. If the difference in refractive index is less than the lower limit, the effect of transmitting light may be reduced, and even if the upper limit is exceeded, no further increase in light transmission efficiency can be expected.

The difference in refractive index is expressed by the following equation when the refractive index of the core 11 is A and the refractive index of the cladding is B.
Refractive index difference (%) = | A / B-1 | × 100

A method of laminating the optical waveguide 5 formed by laminating the three layers of the core layer 1, the lower clad layer 3, and the upper clad layer 4 will be described.
FIG. 1 shows a film for forming an optical waveguide to be a core layer 1 on a film substrate 2, the film substrate is peeled off, and an upper cladding layer 4 and a lower cladding layer 3 are bonded to the upper and lower sides of the core layer 1, respectively. It is sectional drawing which shows the method to do. The film substrate 2 may be subjected to a mold release process as described above. In this case, as the respective clad layers 3 and 4, those conventionally used may be used, or the optical waveguide forming film for the clad layer manufactured by the above-described optical waveguide forming film manufacturing method is used. May be. The method for adhering the upper and lower cladding layers is not particularly limited, but a method such as electrothermal pressing or thermal lamination can be used.

  On the other hand, in FIG. 2, an optical waveguide forming film to be the lower clad layer 3 is formed on the film substrate 2, and the core layer 1 is formed on the lower clad layer 3 by the optical waveguide coating solution for the core layer. FIG. 2 is a cross-sectional view showing a method of forming an optical waveguide forming film and finally forming an upper clad layer 4 on a core layer 1 with an optical waveguide coating solution for a clad layer. Also in such a forming method, the film substrate 2 may be subjected to a mold release treatment as described above. FIG. 2 is a diagram for explaining the case where the film base 2 is peeled from the lower clad layer 3 after the upper clad layer 4 is laminated. The film base 2 is formed after the core layer 1 is formed. Alternatively, the upper clad layer 4 may be formed on the core layer 1 after being peeled off. A method for adhering the upper clad layer is not particularly limited, but a method such as an electrothermal press or a heat laminate can be used.

  The optical wiring of the present invention has the optical waveguide 5 as described above. This makes it possible to perform optical wiring at an arbitrary location on the high-density wiring board.

  Further, the opto-electric hybrid board of the present invention has an electrical wiring and an optical wiring having the optical waveguide 5 as described above. As a result, it is possible to improve EMI (electromagnetic wave interference), which has been a problem with conventional electrical wiring, and the signal transmission speed can be significantly improved as compared with the conventional case.

  The electronic device of the present invention has the optical waveguide 10 as described above. Thereby, space saving can be achieved. Specific examples of such an electronic device include a computer, a server, a mobile phone, a game device, a memory tester, and an appearance inspection robot.

  EXAMPLES Hereinafter, although this invention is demonstrated in detail based on an Example and a comparative example, this invention is not limited to this.

Example 1
1. 1. Production of optical waveguide forming film (core layer) 1-1. Film base material As a film base material, a low heat shrink PET film Tetron (R) film SLA-50 (manufactured by Teijin DuPont Films Ltd.) was used. When the low heat shrinkage PET film was heated at 150 ° C. for 1 hour, it was confirmed that the film material was excellent in dimensional stability with dimensional shrinkage of 0.2% in the longitudinal direction and 0% in the width direction.

1-2. Mold release treatment Oxetanyl group-containing silsesquioxane compound OX-SQ-ME20 (manufactured by Toagosei Co., Ltd.) (8.0 g), alicyclic epoxy resin ceroxide 2021P (manufactured by Daicel Chemical Industries, Ltd.) (2.0 g), A photoacid generator Optmer SP-170 (manufactured by ADEKA Corporation) (0.3 g) and methyl ethyl ketone (90 g) were stirred and mixed to obtain a mold release treatment coating solution.
The low heat-shrinkable PET film is coated with the mold release treatment coating solution with a bar coater, dried at 45 ° C. for 5 minutes in a hot air dryer, and then cured by UV irradiation at 500 mJ / cm using an ultra-high pressure mercury lamp. Thus, a release-processed low heat shrink PET film (hereinafter referred to as a release-treated PET film) was obtained.

1-3. Preparation of coating solution for optical waveguide Hexylnorbornene (HxNB) (8.94 g, 0.05 mol), diphenylmethylnorbornenemethoxysilane (diphNB) (16.1 g, 0.05 mol), 1-hexene (4.2 g, 0.2 mol). 05 mol) and toluene (142.0 g) were sealed in a 250 mL sealam bottle and heated to 120 ° C. in an oil bath and mixed. To this solution was added [Pd (PCy ₃ ) ₂ (O ₂ CCH ₃ ) (NCCH ₃ )] tetrakis (pentafluorophenyl) borate (Pd1446) (5.8E ⁻³ g, 4.0E ⁻⁶ mol) and N, N -Dimethylanilinium tetrakis (pentafluorophenyl) borate (DANFABA) (3.2E- ³ g, 4.0E- ⁶ mol) was dissolved in 0.5 ml of dichloromethane and added to the solution. After the addition, the resulting solution was stirred and reacted for 6 hours while maintaining at 120 ° C. Next, methanol was added dropwise to the vigorously stirred solution to precipitate the copolymer. The precipitated copolymer was recovered by filtration and dried in an oven under vacuum at 80 ° C. for 8 hours. The weight after drying was 12.0 g (yield 48%).
When the molecular weight of the copolymer was measured by GPC in a THF solvent, it was Mw = 16,196 and Mn = 8,448 in terms of polystyrene. When the composition of the copolymer was measured by 1H-NMR, the molar ratio of HxNB / diPhNB was 54/46. When the refractive index of the copolymer was measured by the prism coupling method, it was 1.5569 in the TE mode and 1.5555 in the TM mode at a wavelength of 633 nm. The dried copolymer was dissolved in sufficient mesitylene to obtain a resin solution having a resin component of 30 wt%.

To 10.0 g of the resin solution described above, 3- (cyclohexyloxy) methyl-3-ethyloxetane (CHOX) (0.72 g, 0.00363 mol), RHODORSIL (registered trademark) PHOTOINITIATOR 2074 (CAS 178233-72-2, New Jersey) Cranberry, Inc. (Rhodia Inc.) (2.55E ^-3 g, 2.516E ^-6 mol, in 0.1 mL of methylene chloride) was added and mixed uniformly and filtered through a 0.2 micron pore filter. An optical waveguide coating solution was obtained.

1-4. Preparation of Optical Waveguide Forming Film (Core Layer) The optical waveguide coating solution was uniformly applied onto the above-described release-treated PET film by a doctor blade, and then dried in a dryer at 45 ° C. for 15 minutes. After the solvent is completely removed, a photomask having a pattern in which eight lines of 50 μm width are arranged at a pitch of 0.25 mm is pressure-bonded so that the longitudinal direction of the release-treated PET film is perpendicular to the mask line. UV rays were selectively irradiated at 500 mJ / cm ² . The mask was removed, and heating was performed at 150 ° C. for 1 hour in a dryer. After heating, an optical waveguide forming film in which a very clear waveguide pattern appeared was confirmed. The obtained optical waveguide forming film was peeled from the release-treated PET film to obtain a single-layer optical waveguide forming film (core layer) having a thickness of about 50 μm.

2. 2. Production of optical waveguide forming film (cladding layer) 2-1. As the film substrate film substrate, a polyimide film (Ubex Corporation, Upilex) was used. The polyimide film was heat-treated at 160 ° C./2 hours, but no dimensional change was observed in any direction.
2-2. Preparation of coating solution for optical waveguide A norbornene-based resin composition containing a cyclic olefin-based resin (Avatrel 2590, 20 wt% 2-heptanone solution, 10 g) manufactured by Promelas, 2-undecylmethylimidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd., Part number C11Z) (0.06 g) was added and mixed to obtain a coating solution for optical waveguides. The optical waveguide coating solution was uniformly applied onto the two polyimide films with a doctor blade, and then dried in a dryer at 45 ° C. for 15 minutes. After completely removing the solvent, the film was heated in a dryer at 160 ° C. for 2 hours to cure the coating film to form two optical waveguide forming films (cladding layers).
The obtained two optical waveguide forming films (cladding layers) both had a thickness of 20 μm, were colorless and transparent, and had a refractive index of 1.52 (measurement wavelength: 633 nm).

3. Production of Optical Waveguide The optical waveguide forming film (cladding layer) was laminated on both surfaces of the optical waveguide forming film (core layer) with a laminator to obtain a laminate. The obtained laminate was heat-treated at 160 ° C. for 2 hours to obtain an optical waveguide.

4). Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.04 dB / cm, and it was found to be an excellent optical waveguide. . Furthermore, as an evaluation of the dimensional accuracy of the optical waveguide, the distance between the first and eighth centers of the eight core lines was measured with a microscope with a length measuring function, which was 1747 μm, which was 3 μm contracted with respect to the photomask design. It was.
Next, the optical loss in the case of coupling with the connector was evaluated. Optical measurement was performed by inputting and outputting light using an optical fiber array (core diameter: 62.5 μm) of 250 μ pitch and 8 cores having dimensions consistent with the design of the photomask. The obtained waveguide was cut to a length of 1 cm, and the insertion loss value was measured by putting the optical waveguide between the first fiber of the input / output optical fiber array and the center of the first core line of the waveguide. As a result, the optical waveguide having excellent performance with small excess loss due to misalignment was confirmed even when coupled to the connector, which was 0.19 dB for the first line with the center and 0.22 dB for the eighth line.

(Example 2)
1. Production of optical waveguide Except that a low heat-shrinkable polyethylene naphthalate film, Teonex (R) Q83-50 (manufactured by Teijin DuPont Films Ltd.) was used as a film base material used for production of an optical waveguide forming film (core layer). An optical waveguide was produced in the same manner as in Example 1. When the polyethylene naphthalate film was heated at 150 ° C. for 1 hour, it was confirmed that the film material had excellent dimensional stability with dimensional shrinkage of 0.2% in the longitudinal direction and 0% in the width direction.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.04 dB / cm, and it was found to be an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1748 μm, which was reduced by 2 μm with respect to the photomask design. Next, the evaluation of the optical loss when coupled with the connector was evaluated in the same manner as in Example 1. As a result, the first line with the center aligned was 0.18 dB and the eighth line was 0.20 dB. It was found to be an optical waveguide with excellent performance with little excess loss.

(Example 3)
Production of optical waveguide As a film substrate used for production of an optical waveguide forming film (core layer), an annealed silicone release-treated PET film, Purex (R) A54 type (manufactured by Teijin DuPont Films Ltd.) An optical waveguide was produced in the same manner as in Example 1 except that the mold release treatment described in Example 1 was not performed. When the used silicone release-treated PET film is heated at 150 ° C. for 1 hour, it is a film material with excellent dimensional stability with dimensional shrinkage of 0.2% in the longitudinal direction and 0.1% in the width direction. I was able to confirm.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.05 dB / cm, and it was found that the optical waveguide was an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1745 μm, which was contracted by 5 μm with respect to the photomask design. Next, the evaluation of the optical loss when coupled to the connector was evaluated in the same manner as in Example 1. As a result, the first line with the center aligned was 0.22 dB, and the eighth line was 0.25 dB. It was found to be an optical waveguide with excellent performance and small excess loss.

Example 4
1. Production of optical waveguide forming film (lower clad layer) 1-1. Film substrate A polyimide film (manufactured by Ube Industries, Upilex) was used as the film substrate. The polyimide film used was heat-treated at 160 ° C./2 hours, but no dimensional change was observed in any direction.

1-2. Preparation of coating solution for optical waveguide Oxetanyl group-containing silsesquioxane compound OX-SQ-ME20 (manufactured by Toagosei Co., Ltd.) (2.0 g), alicyclic epoxy resin ceroxide 2021P (manufactured by Daicel Chemical Industries, Ltd.) (8 0.0 g) and a photoacid generator Optmer SP-170 (manufactured by ADEKA Co., Ltd.) (0.3 g) were stirred and mixed to obtain an optical waveguide coating solution (lower clad layer).

1-3. Production of optical waveguide forming film The polyimide film is coated with the optical waveguide coating solution (lower cladding layer) with a bar coater and cured by UV irradiation of 500 mJ / cm using an ultra-high pressure mercury lamp to ensure adhesion. Therefore, the lower clad layer was corona-treated to produce an optical waveguide forming film (lower clad layer) on the polyimide film.

2. 2. Production of optical waveguide 2-1. Formation of core layer The same optical waveguide coating solution (core layer) as used in Example 1 was uniformly applied to the optical waveguide forming film (lower clad layer) formed on the polyimide film by a doctor blade. And then dried in a dryer at 45 ° C. for 15 minutes. After completely removing the solvent, a photomask having a pattern in which eight lines each having a width of 50 μm are arranged at a pitch of 0.25 mm is pressure-bonded so that the longitudinal direction of the polyimide film is perpendicular to the mask line, and ultraviolet rays are applied. Irradiation was selectively performed at 500 mJ / cm ² . The mask was removed, and heating was performed at 150 ° C. for 1 hour in a dryer. After heating, a core layer with a very clear waveguide pattern was confirmed.

2-2. Formation of Upper Cladding Layer In the same manner as in Example 1, an optical waveguide forming film (cladding layer) was produced and laminated on the core layer with a laminator to obtain a laminate. The obtained laminate was heat-treated at 160 ° C. for 2 hours to finally obtain an optical waveguide.

3. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.04 dB / cm, and it was found to be an excellent optical waveguide. . Furthermore, the evaluation of the dimensional accuracy of the optical waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1750 μm, which was a size that matched the design of the photomask. Next, the evaluation of the optical loss when coupled to the connector was performed in the same manner as in Example 1. As a result, the first line with the center aligned was 0.18 dB, and the eighth line was 0.19 dB. It was found to be an optical waveguide with excellent performance and small excess loss.

(Example 5)
1. Production of Optical Waveguide An optical waveguide was produced and evaluated in the same manner as in Example 4 except that a polyimide film (manufactured by Kaneka Corporation, Apical) was used as the film substrate. The polyimide film used was heat-treated at 160 ° C./2 hours, but no dimensional change was observed in any direction.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.04 dB / cm, and it was found to be an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the optical waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1750 μm, which was a size that matched the photomask design. Next, the evaluation of the optical loss when coupled to the connector was performed in the same manner as in Example 1. As a result, the first line with the center aligned was 0.20 dB, and the eighth line was 0.21 dB. It was found to be an optical waveguide with excellent performance and small excess loss.

(Example 6)
1. Preparation of Optical Waveguide An optical waveguide was prepared and evaluated in the same manner as in Example 4 except that a low heat shrink PET film Tetron (R) film SLA-50 (manufactured by Teijin DuPont Films Ltd.) was used as the film substrate. . When the low heat shrinkage PET film used was heat-treated at 160 ° C./2 hours, the film material had excellent dimensional stability with dimensional shrinkage of 0.3% in the longitudinal direction and 0.1% in the width direction. It could be confirmed.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.05 dB / cm, and it was found that the optical waveguide was an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the optical waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1745 μm, which was contracted by 5 μm with respect to the photomask design. Next, the evaluation of the optical loss when coupled with the connector was evaluated by the same method as in Example 1. As a result, the first line with the center aligned was 0.20 dB, and the eighth line was 0.25 dB. It was found to be an optical waveguide with excellent performance and small excess loss.

(Comparative Example 1)
1. Fabrication of optical waveguide 1. Production of optical waveguide forming film (core layer); In the production of the optical waveguide forming film (cladding layer), an optical waveguide was produced in the same manner as in Example 1 except that a general-purpose 50 μm thick PET film was used as the film substrate. When the PET film was heated at 150 ° C. for 1 hour, dimensional shrinkage was 1.3% in the longitudinal direction and 0.5% in the width direction.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.04 dB / cm, and it was found to be an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1725 μm, which was shrunk by 25 μm with respect to the photomask design. Next, the evaluation of the optical loss in the case of coupling with the connector was evaluated in the same manner as in Example 1. As a result, although the center line was 0.20 dB in the first line, it was in the eighth line. The optical loss was increased to 7.8 dB due to the position shift.

(Comparative Example 2)
1. Production of Optical Waveguide An optical waveguide was produced in the same manner as in Example 4 except that a general-purpose 50 μm thick PET film was used as the film substrate of Example 4. When the PET film used was heat-treated at 160 ° C. for 2 hours, dimensional shrinkage was 1.8% in the longitudinal direction and 0.8% in the width direction.

2. Evaluation of optical waveguide When the optical propagation loss of the obtained optical waveguide was measured by the cutback method, the optical propagation loss at 850 nm was as low as 0.05 dB / cm, and it was found that the optical waveguide was an excellent optical waveguide. . Further, the evaluation of the dimensional accuracy of the optical waveguide was performed in the same manner as in Example 1. As a result, the distance between the first and eighth centers was 1715 μm, which was contracted by 35 μm with respect to the photomask design. Next, the evaluation of the optical loss when coupled to the connector was performed in the same manner as in Example 1. As a result, although the center line was 0.24 dB in the first line, it was 15 in the eighth line. .3 dB, and an increase in optical loss due to misalignment was observed.

  The optical waveguides obtained in Examples 1 to 6 were confirmed to have high dimensional accuracy and small dimensional change before and after the heating process. This also confirmed that the optical waveguide was excellent because the optical loss of each line was low because the positional deviation was small when coupled with the connector. On the other hand, it was confirmed that the optical waveguides obtained in Comparative Examples 1 and 2 had a large dimensional change before and after the heating process and had a large optical loss in the eighth line farthest from the first line aligned with the center. It was.

  It is expected that the optical wiring, the photoelectric hybrid substrate, and the electronic device using such an optical waveguide have excellent performance.

  According to the present invention, a film for forming an optical waveguide having excellent dimensional accuracy can be produced. As a result, it is possible to efficiently manufacture an optical waveguide having excellent dimensional accuracy, and it is possible to provide an optical waveguide, an optical wiring, an opto-electric hybrid board, and an electronic device having high-quality transmission performance. .

DESCRIPTION OF SYMBOLS 1 Core layer 11 Core part 12 Side surface clad part (part irradiated with the active radiation 6)
13 Optical waveguide forming film (for core layer)
2 Film base 3 Lower clad layer 4 Upper clad layer 5 Optical waveguide 6 Actinic radiation 7 Mask

Claims (16)

A method for producing a film for forming an optical waveguide, comprising: a film forming step of applying an optical waveguide coating solution on a film substrate to form a film-like body; and a heating step of heating the film-like body. The method for producing a film for forming an optical waveguide, wherein a heat shrinkage rate in the longitudinal direction of the film base material at a heating temperature in the heating step is 0.5% or less. The method for producing a film for forming an optical waveguide according to claim 1, further comprising a patterning step after the film forming step. The method for producing a film for forming an optical waveguide according to claim 1, wherein the patterning step is a patterning step of patterning the optical waveguide by exposing the film-like body through a photomask.
The method for producing a film for forming an optical waveguide according to any one of claims 1 to 3, further comprising a step of peeling the optical waveguide from the film substrate after the heating step. The method for producing a film for forming an optical waveguide according to claim 1, wherein the film base material is polyimide. The method for producing a film for forming an optical waveguide according to claim 1, wherein the film substrate is polyester.
The method for producing a film for forming an optical waveguide according to claim 6, wherein the polyester is polyethylene terephthalate.
The manufacturing method of the film for optical waveguide formation in any one of Claim 1 thru | or 7 by which the said film base material was mold-release-processed.
The method for producing a film for forming an optical waveguide according to claim 8, wherein the release treatment is a hard coat treatment. The method for producing a film for forming an optical waveguide according to claim 9, wherein the hard coat is a hard coat containing silsesquioxane. The method for producing a film for forming an optical waveguide according to any one of claims 1 to 10, wherein the coating liquid for optical waveguide contains a norbornene-based resin.
An optical waveguide forming film obtained by the method for producing an optical waveguide forming film according to claim 1. An optical waveguide formed using the optical waveguide forming film according to claim 12.
An optical wiring comprising the optical waveguide according to claim 13.
An opto-electric hybrid board, comprising electrical wiring and the optical wiring according to claim 14.
An electronic apparatus comprising the optical waveguide according to claim 13.

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