JP2011214946A - Plating inspection apparatus - Google Patents

Plating inspection apparatus Download PDF

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Publication number
JP2011214946A
JP2011214946A JP2010082326A JP2010082326A JP2011214946A JP 2011214946 A JP2011214946 A JP 2011214946A JP 2010082326 A JP2010082326 A JP 2010082326A JP 2010082326 A JP2010082326 A JP 2010082326A JP 2011214946 A JP2011214946 A JP 2011214946A
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Prior art keywords
plating
plate
inspection
image information
metal product
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Mitsuyuki Mihashi
光幸 三橋
Shinji Okaya
真治 岡谷
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Toppan Inc
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Toppan Printing Co Ltd
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Priority to JP2010082326A priority Critical patent/JP2011214946A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a plating inspection apparatus for performing a stable inspection by managing a trend of plating quality in a plating manufacturing process.SOLUTION: The plating inspection apparatus includes: an illumination means of irradiating a plate-like metal product with illumination light; an imaging means of obtaining image information by imaging the plate-like metal product; a conveying means of moving the plate-like metal product in one direction at a fixed speed; a supply/discharge unit for supplying and discharging the plate-like metal products onto the conveying means one by one; a processing control unit for obtaining inspection information by processing image information of a plating reference article, determining a plated state and obtaining an inspection result by comparing the inspection information with image information of the plate-like metal product, and performing operation control of the entire device; a storage means of storing the image information and inspection result of the plate-like metal product and the image information and inspection information of the plating reference article; and a state managing means of comparing the inspection result of the plate-like metal product with a trend of the image information by referring to the image information of the plating reference article.

Description

本発明は、めっき製法に応じた最適な撮像手段によって得られる板状金属表面の画像データを用いた、めっき検査装置に関する。   The present invention relates to a plating inspection apparatus using image data of a plate-like metal surface obtained by an optimum imaging means corresponding to a plating method.

板状金属製品の中には部分的にめっきの施されたもの、テーピングが施されたものなどがあり、例えば半導体パッケージの基材であるリードフレームがこれに該当する。以下、このリードフレームを例に挙げて説明することとする。現在、リードフレームを使用した半導体パッケージは用途拡大により、基材であるリードフレームに対しても厳しい品質保証が要求されている。一般にリードフレームの基材は鉄ニッケル合金(42材)及び銅合金等が用いられ、その製造方法には超精密金型を用いて機械的に金属を打ち抜くスタンピング方法と、化学的に金属を腐食してパターン形成を行うエッチング方法がある。   Some plate-shaped metal products are partially plated and taped. For example, a lead frame which is a base material of a semiconductor package corresponds to this. Hereinafter, this lead frame will be described as an example. Currently, semiconductor packages using lead frames are required to have strict quality assurance for lead frames as base materials due to the expansion of applications. Generally, iron nickel alloy (42 materials), copper alloy, etc. are used as the base material of the lead frame, and the manufacturing method is a stamping method in which metal is mechanically punched using an ultra-precision mold, and the metal is corroded chemically. There is an etching method for forming a pattern.

近年の半導体技術分野におけるパッケージング技術は、半導体装置の高集積、高機能化に伴い狭ピッチ化が進んでおり、これらのパッケージに用いられるリードフレームも多ピン化、狭ピッチ化が進んでいる。また、半導体素子の高速化に伴い、高い電気伝導度を有する金属材料の使用も年々増加している。   In recent years, the packaging technology in the semiconductor technology field is becoming narrower with higher integration and higher functionality of semiconductor devices, and lead frames used in these packages are also becoming more multi-pin and narrower. . In addition, with the increase in the speed of semiconductor elements, the use of metal materials having high electrical conductivity is increasing year by year.

従来、リードフレームのインナーリードは、ダイパッドの中心を基準として放射線状に広がるようにして延びていくように設計されている。リードフレームを用いた半導体装置は、ICチップがダイパッドに固定され、ICチップの電極パッドとインナーリード先端部のボンディング部とがワイヤボンディング等により電気的に接続される。ICチップが多機能化するにつれ電極パッドの数が増え、また、ICチップの小型化によって、電極パッド間の間隔も狭いものになってきている。それに伴い、電極パッドとの接続が行われるリードフレームのリード部位も多ピン化し、各リードの本数が増え、リード間ピッチ、リード幅も多種多様なものとなっている。   Conventionally, the inner lead of the lead frame is designed to extend so as to spread radially with the center of the die pad as a reference. In a semiconductor device using a lead frame, an IC chip is fixed to a die pad, and an electrode pad of the IC chip and a bonding portion at the tip of the inner lead are electrically connected by wire bonding or the like. As IC chips become more multifunctional, the number of electrode pads increases, and with the miniaturization of IC chips, the spacing between electrode pads is becoming narrower. Along with this, the number of lead portions of the lead frame to be connected to the electrode pads is increased, the number of leads is increased, and the pitch between leads and the lead width are various.

パターン形成されたリードフレームは、インナーリード先端部等の所定位置に銀めっきが施される。このめっき部がボンディング部として使用される。
リード間のピッチ、リード幅が狭くなったリードは強度が弱く、僅かな外力によってもリードの変形を生じる。このことから、インナーリード同士及びダイパッドを支える吊りリードとインナーリードとの接触、電気的短絡やインナーリード等の変形を防止するために、保護テープを貼ったリードフレームが製造されるようになった。
そして更にダウンプレス処理後、インナーリード先端をカットする先端カット処理が施されるものもある。
The patterned lead frame is subjected to silver plating at a predetermined position such as the inner lead tip. This plating part is used as a bonding part.
Leads with a narrow pitch and lead width between the leads are weak in strength, and the lead is deformed even by a slight external force. This has led to the manufacture of lead frames with protective tape applied to prevent contact between the inner leads and the suspension leads that support the die pad and the inner leads, electrical shorts, deformation of the inner leads, etc. .
Further, after the down-press process, there is also a process in which a tip cut process for cutting the tip of the inner lead is performed.

図1にリードフレーム10の概要を示す。図1(a)は表面側から観察した時のリードフレーム10を、図1(b)は裏面側から観察した時のリードフレームを示す。
エッチング方法などにより製造されたリードフレーム10はダイパッド1、インナーリード2、アウターリード3、ダムバー4、フレーム部5を有し、配線パターンが形成されていない部分を空間部9とする。その後、インナーリード2に半導体素子とボンディング部の接続抵抗を低下させるためめっき6を施す。また、インナーリード同士及びダイパッドを支える吊りリードとインナーリードとの接触、電気的短絡やインナーリード等の変形を防止するために保護テープ7を貼り付ける。保護テープ7は絶縁体であることなどを考慮しポリイミドテープを使用している。さらに、ダウンプレスにより吊りリード8に段差を形成しダイパッド1への半導体素子積載を考慮し、インナーリード2先端の導通を取り除くためのインナーリード先端カットが行なわれ、リードフレームが完成する。尚、実製品のリードフレームは、前述のような配線パターンが多面付けされた状態となっている。
FIG. 1 shows an outline of the lead frame 10. FIG. 1A shows the lead frame 10 when observed from the front surface side, and FIG. 1B shows the lead frame when observed from the back surface side.
A lead frame 10 manufactured by an etching method or the like has a die pad 1, an inner lead 2, an outer lead 3, a dam bar 4, and a frame portion 5, and a portion where no wiring pattern is formed is defined as a space portion 9. Thereafter, plating 6 is applied to the inner lead 2 in order to reduce the connection resistance between the semiconductor element and the bonding portion. Further, a protective tape 7 is attached to prevent contact between the inner leads and the suspension leads supporting the die pad and the inner leads, electrical short circuit, and deformation of the inner leads. In consideration of the fact that the protective tape 7 is an insulator, polyimide tape is used. Further, a step is formed on the suspension lead 8 by down-pressing, taking into consideration the loading of semiconductor elements on the die pad 1, the inner lead tip cutting for removing the conduction at the tip of the inner lead 2 is performed, and the lead frame is completed. Note that the actual lead frame is in a state in which the above-described wiring patterns are multifaceted.

以上により、リードフレーム最終検査における不良項目は、パターン不良(オープン系/ショート系/異物等)、リード変形、テープ不良(有無/位置ズレ/幅不良等)、めっき不良(有無/未着/付着/位置ズレ/幅不良等)、ダウンプレス有無等多岐に亘り、自動検査機を活用した製品弁別が欠かせない。しかし、全ての不良を1台の検査機で検査することは難しく、特に最近ではテープやめっきに関する検査要求がさらに高まっており、ICチップとの接続を行なうボンディング部に施される部分めっきの品位は特に重要で、CCDカメラ等でめっき部を撮像し、画像処理を用いてそのめっき状態を検査する方法として、例えば特許文献1が提案されている。   As described above, the defect items in the lead frame final inspection include pattern defects (open / short / foreign matter, etc.), lead deformation, tape defects (existence / position misalignment / width defect, etc.), plating defects (existence / non-attachment / attachment). Discrimination of products using automatic inspection machines is indispensable. However, it is difficult to inspect all defects with a single inspection machine. Recently, the demand for inspection on tapes and plating has increased further, and the quality of partial plating applied to bonding parts that connect with IC chips is increasing. Is particularly important, and for example, Patent Document 1 has been proposed as a method of imaging a plating portion with a CCD camera or the like and inspecting the plating state using image processing.

特開2000−171402号公報JP 2000-171402 A

特許文献1の技術によって確かに板状金属表面とめっき部とのコントラスト差を得ることはできるが、厳密には三次元的な形状を有した配線パターンの側面テーパー部も含めためっき状態の良し悪しを判断する検査方法が望ましく、かつ金属表面とめっき部とを明瞭にコントラスト分離できると共に、めっき部のみならず金属表面状態の良し悪しも同時に行える撮像、検査方法が望ましい。また、板状金属表面やめっき面をミクロ的に観察すると金属材料製法起因の圧延キズや凹凸が存在し、この凹凸による微小な明暗が画像上に生じてしまい画像処理における閾値設定によっては過検出要素となり、安定した自動判定が難しい。   Although it is possible to obtain the difference in contrast between the plate-like metal surface and the plated portion by the technique of Patent Document 1, strictly speaking, the plating state including the side tapered portion of the wiring pattern having a three-dimensional shape is good. An inspection method for judging badness is desirable, and an imaging and inspection method capable of clearly separating the contrast between the metal surface and the plated portion and simultaneously improving the quality of the metal surface as well as the plated portion is desirable. In addition, when microscopic observations are made on the surface of a metal plate or plated surface, there are rolling flaws and irregularities caused by the metal material manufacturing method, and minute brightness and darkness due to these irregularities occurs on the image, depending on the threshold setting in image processing, overdetection It becomes an element, and stable automatic judgment is difficult.

そこで、金属表面とめっき部とを明瞭にコントラスト分離できる方法として、撮像角度が0°〜10°で基板の表面を撮像する手段と、非めっき部の金属材料とめっき部のめっき材料との反射強度の差異が最大となる波長域の光源手段と、立体角2πの間接光を照射する照射手段による金属基板表面の検査方法を提案し、これにより一光学系においてめっき部と非めっき部との同時撮像及び検査が実行可能となり、めっき部と非めっき部との個別撮像及び検査に比べ安価な装置実現が可能となった。   Therefore, as a method for clearly separating the contrast between the metal surface and the plated portion, a means for imaging the surface of the substrate at an imaging angle of 0 ° to 10 °, and reflection between the metal material of the non-plated portion and the plated material of the plated portion We propose a method for inspecting the surface of a metal substrate by using a light source unit having a wavelength range that maximizes the difference in intensity and an irradiation unit that emits indirect light having a solid angle of 2π. Simultaneous imaging and inspection can be performed, and an inexpensive apparatus can be realized as compared with individual imaging and inspection of a plated portion and a non-plated portion.

しかし、最近めっき部は製造条件の微少な変動などによって表面状態や組成が変化し、金属表面とのコントラスト分離による検査が安定化しないことが極稀に発生することが分かってきた。また、製法上の光沢材有無によって半光沢、無光沢などめっきの仕上がり状態の異なる品種も存在することも事実で、このような仕上がり状態を早期に数値データで傾向管理する必要性が生じてきた。   Recently, however, it has been found that the surface state and composition of the plated part change due to slight fluctuations in manufacturing conditions, and the inspection by contrast separation from the metal surface is rarely stabilized. In addition, it is also true that there are varieties with different plating finishes, such as semi-gloss and matte, depending on the presence or absence of the brightening material in the manufacturing process, and it has become necessary to manage the trend of such finishes early with numerical data. .

そこで本発明は、上述の課題を解消し、めっき製造工程におけるめっき品質を傾向管理することによって、安定しためっき検査を行うめっき検査装置を提供することにある。   Then, this invention is providing the metal-plating test | inspection apparatus which eliminates the above-mentioned subject and performs stable metal-plating test | inspection by carrying out the trend management of the metal-plating quality in a metal-plating manufacturing process.

上記の課題を解決するための手段として、請求項1に記載の発明は、板状金属製品のめっき品質の欠陥を検査する検査装置であって
前記板状金属製品に照明光を照射する照明手段と、
前記照明手段によって照明された板状金属製品を撮像して画像情報を得る撮像手段と、
前記板状金属製品を一定速度で一方向へ移動する搬送手段と、
前記搬送手段上に、前記板状金属製品を1枚ずつ供給、排出する供給排出部と、
板状金属製品のうちのめっき基準品の画像情報を処理して検査情報を得、前記検査情報
と前記板状金属製品の画像情報を比較することによって板状金属製品のめっき状態の良否を判定して検査結果を得て、かつ、装置全体の動作制御を行う処理制御部と、
前記板状金属製品の画像情報および検査結果と、めっき基準品の画像情報および検査情報と、を記憶する記憶手段と、
前記めっき基準品の画像情報を参照して、板状金属製品の検査結果および画像情報の傾向を比較するめっき状態管理手段と、
を備えたことを特徴とするめっき検査装置である。
As means for solving the above problems, the invention according to claim 1 is an inspection apparatus for inspecting defects in plating quality of a plate-shaped metal product, and illuminating means for irradiating the plate-shaped metal product with illumination light When,
Imaging means for obtaining image information by imaging a plate-shaped metal product illuminated by the illumination means;
Conveying means for moving the plate-shaped metal product in one direction at a constant speed;
A supply / discharge section for supplying and discharging the plate-like metal products one by one on the conveying means;
Process the image information of the plating standard product of the plate metal product to obtain inspection information, and compare the inspection information with the image information of the plate metal product to determine the quality of the plating state of the plate metal product A process control unit that obtains the inspection result and controls the operation of the entire apparatus;
Storage means for storing image information and inspection results of the plate-shaped metal product, and image information and inspection information of a plating reference product,
With reference to the image information of the plating standard product, the plating state management means for comparing the inspection result of the metal plate product and the tendency of the image information,
A plating inspection apparatus comprising:

また、本発明の請求項2に記載の発明は、前記板状金属製品がリードフレームであることを特徴とする請求項1記載のめっき検査装置である。   The invention according to claim 2 of the present invention is the plating inspection apparatus according to claim 1, wherein the plate-shaped metal product is a lead frame.

また、本発明の請求項3に記載の発明は、前記撮像手段は前記搬送手段と同期しながら、撮像手段の撮像位置に到達した板状金属製品を撮像することを特徴とする請求項1または2に記載のめっき検査装置である。   The invention according to claim 3 of the present invention is characterized in that the imaging means images the plate-shaped metal product that has reached the imaging position of the imaging means while synchronizing with the transport means. 2. The plating inspection apparatus according to 2.

また、本発明の請求項4に記載の発明は、めっき基準品との傾向比較によって得られる比較結果を製造工程へフィードバックすることを特徴とする請求項1から3のいずれかに記載のめっき検査装置である。   Further, the invention according to claim 4 of the present invention feeds back a comparison result obtained by a tendency comparison with a plating reference product to the manufacturing process. Device.

本発明に係るめっき検査装置は、めっき製法に応じた撮像手段によって得られる画像情報を用いて、めっき品質を検査する検査装置である。従来、めっき部の製造条件の微少な変動などによって表面状態や組成が変化し、金属表面とのコントラスト分離による検査が安定化しないことが極稀に発生していたが、本発明に係るめっき検査装置によれば安定しためっき検査を行うことが可能となる。   The plating inspection apparatus according to the present invention is an inspection apparatus that inspects plating quality using image information obtained by an imaging unit corresponding to a plating method. Previously, the surface condition and composition changed due to slight fluctuations in the manufacturing conditions of the plating part, and it was extremely rare that the inspection by contrast separation from the metal surface did not stabilize, but the plating inspection according to the present invention According to the apparatus, stable plating inspection can be performed.

リードフレームの概要を示す図Diagram showing the outline of the lead frame 本発明に係るめっき検査装置の一例を示す外観図External view showing an example of a plating inspection apparatus according to the present invention 本発明に係るめっき検査装置の照明部を詳細に示した図The figure which showed the illumination part of the plating inspection apparatus which concerns on this invention in detail 本発明に係るめっき検査装置によって検査されるリードフレームの一例を示す概要図Schematic diagram showing an example of a lead frame inspected by a plating inspection apparatus according to the present invention インナーリード、めっき部、空間部の概略を示した模式図Schematic diagram showing the outline of the inner lead, plating part, and space part 本発明に係るめっき検査装置の画像処理・欠陥判定処理の全体動作を示したフローチャートThe flowchart which showed the whole operation | movement of the image processing and defect determination processing of the plating inspection apparatus which concerns on this invention (a)本発明に係るめっき検査装置の分割マッチング処理を示す(b)めっき付着の検出を示す図(A) The division | segmentation matching process of the plating inspection apparatus which concerns on this invention is shown, (b) The figure which shows the detection of plating adhesion (a)本発明に係るめっき検査装置によるエリアズレ検出を示す図(b)めっきがインナーリード途中に施されている場合のエリアズレ検出を示す図(c)更に別のエリアズレ検出を示す図(A) The figure which shows the area shift detection by the plating test | inspection apparatus based on this invention (b) The figure which shows the area shift detection in case plating is performed in the middle of the inner lead (c) The figure which shows another area shift detection 本発明に係るめっき検査装置による同品種の基準ワークと検査ワークからヒストグラムピーク平均輝度を求めた一例を示す図The figure which shows an example which calculated | required the histogram peak average brightness | luminance from the reference | standard workpiece | work and inspection work of the same kind by the plating inspection apparatus which concerns on this invention 本発明に係るめっき検査装置による検査結果表示例を示した図The figure which showed the example of an inspection result display by the plating inspection apparatus which concerns on this invention

以下、図面を参照して本発明に係るめっき検査装置の一実施形態を説明する。   Hereinafter, an embodiment of a plating inspection apparatus according to the present invention will be described with reference to the drawings.

図2は本発明に係るめっき検査装置の一例を示す外観図である。図2(a)は正面から見た図、図2(b)は側面から見た図である。本発明のめっき検査装置は、板状金属製品10を照明する照明手段である照明部30と、照明された板状金属製品10の表面を撮像
する撮像手段である撮像カメラ40と、板状金属製品10を一定速度で一定方向へ移動する搬送手段である搬送部20を備えている。撮像カメラ40は搬送部20と同期が取られ、検査位置に到達した板状金属製品の表面を撮像する。処理制御部60は、撮像カメラ40により板状金属表面を撮像して得られた画像情報を用いて板状金属表面に存在するめっき不良を検査して検査結果を得ると共に、めっきが施された領域における検査画像とめっき基準品の画像情報とのめっき状態の画像比較を行う。更に処理制御部60は照明部や撮像カメラや搬送部や供給、排出部の制御を行う。図示しないが搬送部上には前記板状金属製品を1枚ずつ供給、排出する供給排出部を備えている。21は搬送手段動作開始釦である。この実施の形態では搬送手段20へ板状金属製品(リードフレーム)10を供給及び排出する動作は手載せを想定したものを例示している。
FIG. 2 is an external view showing an example of a plating inspection apparatus according to the present invention. 2A is a view seen from the front, and FIG. 2B is a view seen from the side. The plating inspection apparatus of the present invention includes an illuminating unit 30 that is an illuminating unit that illuminates the plate-shaped metal product 10, an imaging camera 40 that is an imaging unit that images the surface of the illuminated plate-shaped metal product 10, and a plate-shaped metal. A transport unit 20 that is a transport unit that moves the product 10 in a constant direction at a constant speed is provided. The imaging camera 40 is synchronized with the transport unit 20 and images the surface of the plate-shaped metal product that has reached the inspection position. The processing control unit 60 inspects plating defects existing on the plate-like metal surface using image information obtained by imaging the plate-like metal surface with the imaging camera 40, obtains the inspection result, and is plated. The image of the plating state is compared between the inspection image in the region and the image information of the plating reference product. Further, the processing control unit 60 controls the illumination unit, the imaging camera, the transport unit, the supply / discharge unit. Although not shown, a supply / discharge unit for supplying and discharging the plate-like metal products one by one is provided on the transport unit. 21 is a transport means operation start button. In this embodiment, the operation of supplying and discharging the plate-shaped metal product (lead frame) 10 to the conveying means 20 is illustrated assuming that it is manually placed.

また、前記板状金属製品の画像情報および検査結果と、めっき基準品(後述する)の画像情報および検査情報(後述する)は、図示しない記憶手段である記憶部に記憶される。   In addition, image information and inspection results of the plate-shaped metal product, and image information and inspection information (described later) of a plating reference product (described later) are stored in a storage unit which is a storage unit (not illustrated).

図3は、照明部30を詳細に示した図である。照明部30は、間接光照射するドーム照明42と直接光照射する直接照明41を共に具備している。ドーム照明42はめっき部表面の平坦性の高い状態、すなわち光沢、半光沢と表現できる表面状態のめっき検査に効果があり、使用する板状金属材料とめっき材料に応じて反射強度差異が最も大なる波長域400nm以上600nm以下を活用して板状金属材料とめっき材料との光学的分離を図ったものである。直接照明41は同波長域を使用し、めっき部表面の平坦性の低い状態、すなわち無光沢と表現できる状態のめっき検査に効果があり、照射範囲20〜60°の直接光を照射することで、めっき部を高コントラスト抽出する。尚、ドーム照明42と直接照明41を同時に使用することは無く、めっき製造条件によりユーザーが適宜選択することで求める画像を得る。撮像手段の仰角θは、板状金属製品の鉛直方向と光軸とのなす角度を指し、仰角θは好ましくは5°付近を採用する。尚、仰角θを0°としない理由は、撮像時に板状金属表面の圧延キズ等の細かな凹凸を軽減化させ、誤検出、過検出の防止を狙っているからである。そして、照明上部の撮像用開口部は、この仰角θに合わせた所定の位置に開口形成させる。撮像カメラはその用途に応じてラインカメラ、エリアカメラ、モノクロ、カラーの選択が可能であり、本例ではラインカメラを使用した場合の形態を例示している。   FIG. 3 is a diagram showing the illumination unit 30 in detail. The illumination unit 30 includes both a dome illumination 42 that emits indirect light and a direct illumination 41 that emits direct light. The dome illumination 42 is effective for plating inspection in a state where the surface of the plated portion is highly flat, that is, a surface state that can be expressed as glossy or semi-glossy, and has the largest difference in reflection intensity depending on the metal plate material used and the plating material. The plate-shaped metal material and the plating material are optically separated by utilizing the wavelength range of 400 nm to 600 nm. The direct illumination 41 uses the same wavelength region, and is effective for plating inspection in a state where the flatness of the surface of the plated portion is low, that is, a state where it can be expressed as matte, and by irradiating direct light in an irradiation range of 20 to 60 °. , High contrast extraction of the plating part. Note that the dome illumination 42 and the direct illumination 41 are not used at the same time, and an image desired by the user is appropriately selected according to plating manufacturing conditions. The elevation angle θ of the imaging means indicates the angle formed by the vertical direction of the plate-shaped metal product and the optical axis, and the elevation angle θ is preferably around 5 °. The reason why the elevation angle θ is not 0 ° is that fine irregularities such as rolling flaws on the surface of the plate-like metal are reduced at the time of imaging to aim at prevention of erroneous detection and overdetection. Then, the imaging opening at the top of the illumination is formed at a predetermined position according to the elevation angle θ. The imaging camera can be selected from a line camera, an area camera, monochrome, and color according to the application, and in this example, a mode in which a line camera is used is illustrated.

図4は、本発明に係るめっき検査装置によって検査されるリードフレームの一例を示す概要図である。101はリードフレーム、11はダイパッド、12はインナーリード、13はアウターリード、14はダムバー、15はフレーム部、16はめっき、17は保護テープ、18はリード、19は空間部を示す。   FIG. 4 is a schematic diagram showing an example of a lead frame inspected by the plating inspection apparatus according to the present invention. 101 is a lead frame, 11 is a die pad, 12 is an inner lead, 13 is an outer lead, 14 is a dam bar, 15 is a frame portion, 16 is plating, 17 is a protective tape, 18 is a lead, and 19 is a space portion.

図5(a)はインナーリード12、めっき部16、空間部19の概略を示した模式図で、(b)は(a)図中のL1線上のプロファイルを示したものである。横軸は位置を示し、縦軸は反射光の濃度を階調値で示したものである。このようにインナーリード12、めっき16、空間部19それぞれにおいて濃度情報の分離がなされ、めっき部のみの抽出及び画像処理が容易に行うことができる。例えばリードフレームの裏面側にはめっき処理は施されないが、リードフレーム裏面側へのめっき回り込み(付着)が生じる可能性があるため、裏面側を検査したい場合には手動/自動を切り替えてリードフレームを表裏反転させることで同様の検査を行うことが可能である。   FIG. 5A is a schematic diagram showing an outline of the inner lead 12, the plating part 16, and the space part 19, and FIG. 5B shows a profile on the line L1 in FIG. The horizontal axis indicates the position, and the vertical axis indicates the density of the reflected light as a gradation value. As described above, the density information is separated in each of the inner lead 12, the plating 16, and the space portion 19, so that only the plated portion can be extracted and image processing can be easily performed. For example, the back side of the lead frame is not plated, but there is a possibility that plating wraps around (attaches to) the back side of the lead frame, so if you want to inspect the back side, switch between manual and automatic lead frames. It is possible to perform the same inspection by inverting the front and back.

処理制御部60では、照明部や撮像カメラや搬送部や供給、排出部の制御を行うと共に板状金属表面を撮像して得られた画像情報を用いて、板状金属表面に存在するめっき不良を抽出する。更にめっきが施された領域におけるめっき基準品とのめっき状態の画像比較を行う。図6は、この画像処理・欠陥判定処理の全体動作を示したフローチャートである。撮像部が撮像するタイミングは、板状金属製品を一定速度で一方向へ移動する搬送部の搬送速度と同期を取ることで撮像して画像情報を得る(ステップS1)。この画像情報は、処理制御部に送出され、この画像情報からめっき部の各部情報を抽出する(ステップS2)。更に、抽出された情報を用いて欠陥検出・判定処理が実行される(ステップS3)。この欠陥検出・判定処理は、板状金属製品に形成されている所定のめっき領域に対して実行され、この後全体動作は完了する(ステップS4のYESの場合)。ステップS4のNOの場合は更にステップS1に移行する。   The processing control unit 60 controls the illumination unit, the imaging camera, the transport unit, the supply unit, and the discharge unit and uses the image information obtained by imaging the plate-shaped metal surface to cause plating defects existing on the plate-shaped metal surface. To extract. Further, an image comparison of the plating state with the plating standard product in the plated area is performed. FIG. 6 is a flowchart showing the overall operation of this image processing / defect determination processing. The timing at which the imaging unit captures an image is obtained by synchronizing with the transport speed of the transport unit that moves the plate-shaped metal product in one direction at a constant speed to obtain image information (step S1). This image information is sent to the processing control unit, and information on each part of the plating unit is extracted from this image information (step S2). Further, defect detection / determination processing is executed using the extracted information (step S3). This defect detection / determination process is performed on a predetermined plating area formed on the plate-shaped metal product, and then the entire operation is completed (in the case of YES in step S4). If NO in step S4, the process further proceeds to step S1.

めっき検査に関してその処理を説明する。まず、リードフレームのうちの1枚をめっき基準品として、撮像手段でその画像情報を撮像して、めっき基準品の画像情報(マスター画像)を得る。このめっき基準品の画像情報に対してめっき部のみを抽出する2値化処理を行い、更に必要に応じてこの2値画像に対する膨張収縮処理等を必要回数(段数)分行うことでエッジ部分のがたつきを抑えた後、この画像を新たにめっき検査用の検査情報とする。そして、この検査情報と撮像画像との間で予め設定した基準位置を使用した位置補正処理を行った後、めっき部分でのマッチングエリア70を適正に設定した上で分割マッチング処理を行うことで、めっきカス・ブツ、めっき不着等のめっき不良を検出させる(図7(a))。逆にめっき付着は、本来付いてはいけない部位にめっきが付いてしまう不良を指し、この不良を検出するため被めっきエリアに対してめっき2値化レベル以上の輝度値部位が存在するか否かで判断が可能である(図7(b))。   The process for plating inspection will be described. First, one of the lead frames is used as a plating reference product, and the image information is picked up by the imaging means to obtain image information (master image) of the plating reference product. A binarization process for extracting only the plating part is performed with respect to the image information of the standard plating product, and further, an expansion / contraction process for the binary image is performed as many times as necessary (the number of steps). After suppressing rattling, this image is newly used as inspection information for plating inspection. Then, after performing a position correction process using a reference position set in advance between the inspection information and the captured image, by performing a division matching process after appropriately setting the matching area 70 in the plating portion, Plating defects such as plating residue, plating non-adherence, etc. are detected (FIG. 7A). On the other hand, the plating adhesion refers to a defect in which plating is attached to a portion that should not be attached, and whether or not there is a luminance value portion higher than the binarization level for the plating area in order to detect this failure. This is possible to determine (FIG. 7B).

次に、めっきエリアズレ検出は次のように行う。マスター画像上の上下左右4方向におけるリードフレームアイランド1中心とめっき端間距離を予め求めておく。この距離を基準値とし、撮像した検査ワークの画像情報に対して同様の処理を毎回行い、得られたアイランド1中心とめっき端間距離とマスター画像の基準値と比較し、ある閾値以上であればめっきエリアズレが生じていると判断している(図8(a))。   Next, the plating area deviation detection is performed as follows. The distance between the center of the lead frame island 1 and the plating end in the four directions on the master image is determined in advance. Using this distance as a reference value, the same processing is performed each time on the image information of the imaged inspection work, and the obtained distance between the center of the island 1 and the distance between the plating ends and the reference value of the master image is greater than a certain threshold value. In other words, it is determined that plating area deviation has occurred (FIG. 8A).

ところで、めっきは必ずインナーリード先端から施されているわけではなく、インナーリード途中に施されているものもある。その場合は、内側めっき端、外側めっき端とアイランド中心間距離を各々の方向において求め、基準値との比較により、めっきエリアズレを検出するようにしている(図8(b))。更に別の手法もある(図8(c))。アイランド側及びダムバー側のめっき端が交差範囲内に存在しているかを判定したい。そこで、Y方向において、アイランド側めっき端基準MIy=(MSy+MSy’)/2、ダムバー側めっき端基準MOy=(MEy+MEy’)/2を求める。X方向についても同様にめっき端基準MIx、MOxを算出する。そして、アイランド側及びダムバー側めっき端基準において、基準値と計測値との比較、|MI−MS|、|MI−MS’|、|MO−ME|、|MO−ME’|をXY2方向について行い、この値が設定公差以内であれば良品、公差外は不良と判断する。尚、公差(閾値)は8箇所共通でも良いし、個別でも構わない。   By the way, the plating is not always applied from the tip of the inner lead, but there are some which are applied in the middle of the inner lead. In that case, the distance between the inner plating end, the outer plating end, and the island center is obtained in each direction, and the plating area deviation is detected by comparison with the reference value (FIG. 8B). There is another method (FIG. 8C). I want to determine if the plating ends on the island side and dam bar side are within the intersection. Therefore, in the Y direction, the island side plating end reference MIy = (MSy + MSy ′) / 2 and the dam bar side plating end reference MOy = (MEy + MEy ′) / 2 are obtained. The plating end reference MIx and MOx are similarly calculated for the X direction. Then, in the island side and dam bar side plating end reference, the comparison between the reference value and the measured value, | MI-MS |, | MI-MS '|, | MO-ME |, | MO-ME' | If this value is within the set tolerance, it is determined that the product is non-defective and the tolerance is not acceptable. The tolerance (threshold value) may be common to eight locations or may be individual.

めっき状態の管理は例えば次のように行う。めっき製法に応じた撮像手段によって、めっき基準品(上記検査情報を採取したワークと同物でも構わない)から画像情報を得て、めっきが施された部位にヒストグラム算出領域を設定し、この領域からピーク平均輝度値を求めておく。検査ワーク上でも同様にピーク平均輝度値を求め、この基準値との差異を算出することにより、この値が適正かどうかを管理する。また、この値に良品限度域を設定することで良否判別、傾向管理を行う。このような画像評価値と、めっき工程にて例えば光沢計などで数値管理されている測定値との間で相関関係(検量カーブ)を見出し、めっき状態の管理に活用しても良い。また、このようなめっき管理は板状金属製品の面内バラツキを求める場合にも使用でき、板状金属製品全域において均一なめっき状態管理にも繋がる。更に、画像上のRGB情報から色相、明度、彩度などの別の観点から必要な数値情報を得て、管理することも可能である。図9は同品種の基準ワーク(Base)と検査ワーク(Ins)からヒストグラムピーク平均輝度を求めた一例であり、両者のピーク平均輝度に差が見られ、同品種ではあるがロット間バラツキによる特異な例である。   For example, the plating state is managed as follows. Image information is obtained from a plating reference product (which may be the same as the workpiece from which the above inspection information was collected) by an imaging means corresponding to the plating method, and a histogram calculation area is set in the plated portion. The peak average luminance value is obtained from the above. Similarly, the peak average luminance value is obtained on the inspection work, and the difference from this reference value is calculated to manage whether this value is appropriate. Also, pass / fail judgment and trend management are performed by setting a non-defective product limit area to this value. A correlation (calibration curve) may be found between such an image evaluation value and a measured value that is numerically managed by, for example, a gloss meter in the plating step, and may be utilized for management of the plating state. Moreover, such plating management can also be used when the in-plane variation of the plate-shaped metal product is required, which leads to uniform plating state management throughout the plate-shaped metal product. Furthermore, necessary numerical information can be obtained and managed from other viewpoints such as hue, brightness, and saturation from RGB information on the image. FIG. 9 is an example in which the histogram peak average luminance is obtained from the standard workpiece (Base) and the inspection workpiece (Ins) of the same type, and there is a difference in the peak average luminance between the two types. This is an example.

図10は検査結果表示例を示したもので、検査結果及び様々なトレンド情報を出力表示させることで必要な情報の入手を可能にしている。更に、このような数値データをネットワークを介し上位基幹システムへ伝達し、製造工程へ品質情報をフィードバックすることにより、良品率向上など工程改善に役立てることも可能である。   FIG. 10 shows an example of display of the inspection result. Necessary information can be obtained by outputting and displaying the inspection result and various trend information. Furthermore, by transmitting such numerical data to a higher-level backbone system via a network and feeding back quality information to the manufacturing process, it is also possible to use it for process improvement such as improvement of the yield rate.

本発明に係るめっき検査装置は、めっき製法に応じた撮像手段によって得られる画像情報を用いて、めっき品質を検査する検査装置であり、めっき基準品との傾向比較によって得られる比較結果を製造工程へフィードバックすることでめっき品質安定化へ寄与でき、版起因などの共通不良なども早期に見つけ出すことができる、不良検出感度の優れた検査装置の提供を可能としている。この結果、半導体装置の高密度、高機能化に伴う板状金属製品の微細化や量産化に対応できるものとしている。   The plating inspection apparatus according to the present invention is an inspection apparatus that inspects plating quality using image information obtained by an imaging means corresponding to a plating method, and produces a comparison result obtained by comparing a tendency with a plating reference product. This makes it possible to provide an inspection apparatus with excellent defect detection sensitivity that can contribute to stabilizing the plating quality and can quickly find common defects such as plate-related defects. As a result, it is possible to cope with the miniaturization and mass production of the plate-like metal product accompanying the high density and high functionality of the semiconductor device.

めっき品質を検査する検査装置として、めっき製法に応じた最適な撮像手段を使って板状金属表面の画像情報を得て、適切な画像処理を行うことで得られる検査情報を使い、めっき品質の維持、向上に寄与できる。   As an inspection device for inspecting plating quality, image information on the surface of a plate metal is obtained using an optimal imaging means according to the plating method, and inspection information obtained by performing appropriate image processing is used to improve the plating quality. It can contribute to maintenance and improvement.

1・・・アイランド又はダイパット
2・・・インナーリード
3・・・アウターリード
4・・・ダムバー
5・・・フレーム部
6・・・めっき
7・・・保護テープ
8・・・吊りリード
9・・・空間部
10・・・板状金属製品(リードフレーム)
11・・・ダイパッド
12・・・インナーリード
13・・・アウターリード
14・・・ダムバー
15・・・フレーム部
16・・・めっき
17・・・保護テープ
18・・・リード
19・・・空間部
20・・・搬送手段
21・・・搬送手段動作開始釦
30・・・撮像手段
40・・・照明手段
41・・・直射照明
42・・・間接照明
43・・・内壁
44・・・撮像用開口部
50・・・カメラ
60・・・処理制御部
70・・・分割マッチングエリア
101・・・リードフレーム
DESCRIPTION OF SYMBOLS 1 ... Island or die pad 2 ... Inner lead 3 ... Outer lead 4 ... Dam bar 5 ... Frame part 6 ... Plating 7 ... Protective tape 8 ... Hanging lead 9 ...・ Space 10: Plate-shaped metal product (lead frame)
DESCRIPTION OF SYMBOLS 11 ... Die pad 12 ... Inner lead 13 ... Outer lead 14 ... Dam bar 15 ... Frame part 16 ... Plating 17 ... Protection tape 18 ... Lead 19 ... Space part 20 ... Conveying means 21 ... Conveying means operation start button 30 ... Imaging means 40 ... Illuminating means 41 ... Direct illumination 42 ... Indirect illumination 43 ... Inner wall 44 ... For imaging Opening 50 ... Camera 60 ... Processing control unit 70 ... Divided matching area 101 ... Lead frame

Claims (4)

板状金属製品のめっき品質の欠陥を検査する検査装置であって
前記板状金属製品に照明光を照射する照明手段と、
前記照明手段によって照明された板状金属製品を撮像して画像情報を得る撮像手段と、
前記板状金属製品を一定速度で一方向へ移動する搬送手段と、
前記搬送手段上に、前記板状金属製品を1枚ずつ供給、排出する供給排出部と、
板状金属製品のうちのめっき基準品の画像情報を処理して検査情報を得、前記検査情報と前記板状金属製品の画像情報を比較することによって板状金属製品のめっき状態の良否を判定して検査結果を得て、かつ、装置全体の動作制御を行う処理制御部と、
前記板状金属製品の画像情報および検査結果と、めっき基準品の画像情報および検査情報と、を記憶する記憶手段と、
前記めっき基準品の画像情報を参照して、板状金属製品の検査結果および画像情報の傾向を比較するめっき状態管理手段と、
を備えたことを特徴とするめっき検査装置。
An inspection apparatus for inspecting a plating quality defect of a plate-shaped metal product, the illumination means for irradiating the plate-shaped metal product with illumination light;
Imaging means for obtaining image information by imaging a plate-shaped metal product illuminated by the illumination means;
Conveying means for moving the plate-shaped metal product in one direction at a constant speed;
A supply / discharge section for supplying and discharging the plate-like metal products one by one on the conveying means;
Process the image information of the plating standard product of the plate metal product to obtain inspection information, and compare the inspection information with the image information of the plate metal product to determine the quality of the plating state of the plate metal product A process control unit that obtains the inspection result and controls the operation of the entire apparatus;
Storage means for storing image information and inspection results of the plate-shaped metal product, and image information and inspection information of a plating reference product,
With reference to the image information of the plating standard product, the plating state management means for comparing the inspection result of the metal plate product and the tendency of the image information,
A plating inspection apparatus characterized by comprising:
前記板状金属製品がリードフレームであることを特徴とする請求項1記載のめっき検査装置。   The plating inspection apparatus according to claim 1, wherein the plate-shaped metal product is a lead frame. 前記撮像手段は前記搬送手段と同期しながら、撮像手段の撮像位置に到達した板状金属製品を撮像することを特徴とする請求項1または2に記載のめっき検査装置。   The plating inspection apparatus according to claim 1, wherein the imaging unit images the plate-shaped metal product that has reached the imaging position of the imaging unit in synchronization with the transport unit. めっき基準品との傾向比較によって得られる比較結果を製造工程へフィードバックすることを特徴とする請求項1から3のいずれかに記載のめっき検査装置。   The plating inspection apparatus according to claim 1, wherein a comparison result obtained by a tendency comparison with a plating reference product is fed back to the manufacturing process.
JP2010082326A 2010-03-31 2010-03-31 Plating inspection apparatus Pending JP2011214946A (en)

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