JP2011203025A - DEVICE AND METHOD FOR WASHING pH METER - Google Patents
DEVICE AND METHOD FOR WASHING pH METER Download PDFInfo
- Publication number
- JP2011203025A JP2011203025A JP2010069061A JP2010069061A JP2011203025A JP 2011203025 A JP2011203025 A JP 2011203025A JP 2010069061 A JP2010069061 A JP 2010069061A JP 2010069061 A JP2010069061 A JP 2010069061A JP 2011203025 A JP2011203025 A JP 2011203025A
- Authority
- JP
- Japan
- Prior art keywords
- meter
- cleaning
- tank
- cleaning liquid
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
Description
本発明は、pH計洗浄装置およびpH計の洗浄方法に関する。 The present invention relates to a pH meter cleaning device and a pH meter cleaning method.
各種工場等から排出される廃液をまとめて中和処理する排水処理設備では、反応槽に流入してくる排水のpH値を常時測定して、反応槽のpH値が目標値に近づくように、中和剤の注入量を増減して中和処理を行い、管理pH値範囲に処理された排水が処理水として放流される。 In wastewater treatment facilities that collectively neutralize waste liquid discharged from various factories, etc., constantly measure the pH value of the wastewater flowing into the reaction tank, so that the pH value of the reaction tank approaches the target value, Neutralization treatment is performed by increasing / decreasing the injection amount of the neutralizing agent, and the wastewater treated in the control pH value range is discharged as treated water.
通常pH測定は、排水処理設備に流入する廃液の一部を分岐したpH測定槽で行われる。pH測定槽には次々と新しい廃液が流出入するので、pH測定は連続して行われるため時間の経過と共に廃液中のスラジ等が測定用電極の表面に付着すると正確なpH測定が難しくなる。従って、定期的にpH計の測定用電極の表面を手動または自動で洗浄し、pH指示値の異常防止に努める必要がある。 Usually, pH measurement is performed in a pH measurement tank in which a part of the waste liquid flowing into the wastewater treatment facility is branched. Since new waste liquid flows into and out of the pH measurement tank one after another, pH measurement is performed continuously. Therefore, if sludge or the like in the waste liquid adheres to the surface of the measurement electrode with time, accurate pH measurement becomes difficult. Therefore, it is necessary to periodically clean the surface of the measurement electrode of the pH meter manually or automatically to try to prevent the abnormality of the pH indication value.
pH計の洗浄は、従来は、図4〜6に示すように、排水処理設備に流入する廃液の一部を分岐したpH測定槽にpH計を浸漬してpH測定を行う(図4)。そして、pH測定用電極が汚染した時はpH計をpH計洗浄槽内に引き上げて、薬液をポンプ等でpH計洗浄槽に注入してpH計の電極部分の洗浄を行う(図5)。洗浄に使用した薬液(pH計洗浄液)はpH測定槽にそのまま排出していた(図6)。 Conventionally, as shown in FIGS. 4 to 6, the pH meter is washed by immersing the pH meter in a pH measuring tank into which a part of the waste liquid flowing into the wastewater treatment facility is branched (FIG. 4). When the pH measurement electrode is contaminated, the pH meter is pulled up into the pH meter cleaning tank, and the chemical solution is injected into the pH meter cleaning tank with a pump or the like to clean the electrode portion of the pH meter (FIG. 5). The chemical solution used for cleaning (pH meter cleaning solution) was directly discharged into the pH measurement tank (FIG. 6).
pH計の洗浄については、特許文献1に、pH計の洗浄及び校正を自動で行うpH測定装置が開示されている。 Regarding the cleaning of the pH meter, Patent Document 1 discloses a pH measuring device that automatically cleans and calibrates the pH meter.
従来技術では、pH計の洗浄に使用した薬液(pH計洗浄液)をそのままpH測定槽に排出すると、pH測定値への影響が大きく、pH測定対象の流量によってはその影響が消えるまで大幅な時間を要する場合がある。またpH計洗浄液をそのままpH測定槽に排出すると、pH測定槽の周囲に薬液が飛散するという問題もあった。 In the conventional technology, if the chemical solution used for cleaning the pH meter (pH meter cleaning solution) is discharged to the pH measurement tank as it is, the effect on the pH measurement value is large, and depending on the flow rate of the pH measurement object, it takes a significant amount of time to disappear. May be required. Further, when the pH meter cleaning liquid is discharged into the pH measurement tank as it is, there is a problem that the chemical liquid is scattered around the pH measurement tank.
これに対して特許文献1記載の洗浄液の回収装置を取り付けることで、pH測定値への影響を抑えることができるが、装置の設備費が高くなるという問題がある。 On the other hand, by attaching the cleaning liquid recovery device described in Patent Document 1, the influence on the pH measurement value can be suppressed, but there is a problem that the equipment cost of the device becomes high.
本発明は、簡便で、コストの掛からない信頼性の高いpH計洗浄装置およびpH計の洗浄方法を提供することを目的とする。 An object of the present invention is to provide a pH meter cleaning device and a pH meter cleaning method that are simple and inexpensive and have high reliability.
発明者は、上述した課題を解決するためにpH計洗浄装置の構成を鋭意検討し、本発明に至ったものである。 The inventor diligently studied the configuration of the pH meter cleaning device in order to solve the above-described problems, and reached the present invention.
第一の発明は、廃液処理設備から分岐したpH測定槽に付設されたpH計の洗浄装置であって、pH計洗浄槽と、該pH計洗浄槽の底部に洗浄液を取り出す開閉式底蓋と、洗浄液を回収する洗浄液回収槽と、該洗浄液回収槽の底部にはpH計挿通口と、洗浄液を排出するドレン口と、ドレン口に接続したドレンパイプとを設けたことを特徴とするpH計洗浄装置である。 A first invention is a pH meter cleaning device attached to a pH measurement tank branched from a waste liquid treatment facility, a pH meter cleaning tank, and an openable bottom lid for taking out the cleaning liquid at the bottom of the pH meter cleaning tank, A pH meter, comprising: a cleaning liquid recovery tank for recovering the cleaning liquid; a pH meter insertion port at the bottom of the cleaning liquid recovery tank; a drain port for discharging the cleaning liquid; and a drain pipe connected to the drain port. It is a cleaning device.
第二の発明は、さらに、前記pH計挿通口には洗浄液の漏洩を防止する弁を、前記ドレンパイプにはドレンバルブを取り付けたことを特徴とする第一の発明に記載のpH計洗浄装置である。 The second aspect of the present invention is the pH meter cleaning device according to the first aspect, further comprising a valve for preventing leakage of cleaning liquid at the pH meter insertion port, and a drain valve attached to the drain pipe. It is.
第三の発明は、pH計洗浄槽に設けられた洗浄液注入口から洗浄液を注入してpH計を洗浄後、pH計洗浄槽の底部に設けた底蓋を開放して、前記洗浄液を洗浄液回収槽に排出することを少なくとも1回以上行った後、前記洗浄液回収槽に貯留した洗浄液を洗浄液回収槽のドレン口に接続したドレンパイプから系外に排出することを特徴とするpH計の洗浄方法である。 The third aspect of the present invention is to inject a cleaning liquid from a cleaning liquid inlet provided in the pH meter cleaning tank and wash the pH meter, then open a bottom lid provided at the bottom of the pH meter cleaning tank and collect the cleaning liquid. A pH meter cleaning method characterized by discharging the cleaning liquid stored in the cleaning liquid recovery tank out of the system from a drain pipe connected to a drain port of the cleaning liquid recovery tank after discharging to the tank at least once. It is.
本発明を使用すると、廉価にpH計洗浄装置を作製でき、且つ洗浄液の回収を確実に行え、また、洗浄液をpH測定槽に排出することもないので、洗浄液によるpH測定槽内の廃液pHの変動もない。 By using the present invention, it is possible to manufacture a pH meter cleaning device at a low cost and to reliably collect the cleaning liquid, and since the cleaning liquid is not discharged to the pH measuring tank, the waste liquid pH in the pH measuring tank by the cleaning liquid can be reduced. There is no change.
本発明を図を用いて説明する。 The present invention will be described with reference to the drawings.
図1は、本発明のpH計洗浄装置を説明する図である。pH計洗浄装置は、pH計1を定期的に洗浄するpH計洗浄槽2と、該pH計洗浄槽2の底部に接続する洗浄液回収槽5とから構成され、pH測定用廃液が流出入するpH測定槽13の上部に設置される。pH計洗浄槽2には洗浄液注入口3が設けられ、該洗浄液注入口3からpH計1を洗浄する薬液4(pH計洗浄液)が注入される。
FIG. 1 is a diagram illustrating a pH meter cleaning device according to the present invention. The pH meter cleaning device includes a pH
洗浄液回収槽5は、pH計1を洗浄した薬液等を一次的に貯留する容量を有する立方体または円筒体の形状を有し、上部には、pH計洗浄槽2の底部を開閉できる底蓋6が取り付けられている。また、前記洗浄液回収槽5の底部には、ドレン口7とpH計挿通口10とが取り付けられている。
The cleaning liquid recovery tank 5 has a cubic or cylindrical shape having a capacity for temporarily storing the chemical solution or the like that has cleaned the pH meter 1, and a
ドレン口7にはドレンパイプが接続しており、pH計洗浄液4はドレンパイプ8から系外に排出できるので、pH測定槽13がpH洗浄液4によって汚染されることはない。さらにドレンパイプ8にはドレンバルブを取り付けておけば貯留したpH計洗浄液4の系外への排出を制御できるのでより好ましい。
Since a drain pipe is connected to the drain port 7 and the pH
pH計挿通口10には、pH計1とpH計挿通口10との隙間からpH計洗浄液4が漏れ出るのを防止するためにゴム等で作られた弁9を取り付けても良い。
A
pH測定槽13には、廃液流入口11と廃液排出口12が取り付けられ、廃液の受け入れ、排出が行われる。また、pH測定槽13の上部は、pH計挿入口15と廃液流入口11を設けた上蓋で密閉するのが良い。pH測定槽13にpH計洗浄液4が流入してpH測定値が変動するのを防止するためである。
A
次に、本発明の作用について述べる。 Next, the operation of the present invention will be described.
pH測定槽13に流入する廃液14のpH測定を行う場合は、pH計洗浄槽2の底部の底蓋6を開いてpH計1を、pH計洗浄槽2の上部から挿入し、洗浄液回収槽5の底部に設けたpH計挿通口10、pH測定槽13の上部にあるpH計挿入口15を通過させて廃液14中に浸漬してpH測定を行う(図1)。
When measuring the pH of the
pH計1が汚染された場合、あるいは定期的にpH計1を廃液14中から引き上げてpH計洗浄槽2の底部の底蓋6を閉じた後に洗浄液注入口3からpH計洗浄液4をpH計洗浄槽2内に注入してpH計1の洗浄を行う(図2)。洗浄を行う毎に底蓋6を開いてpH計洗浄液4を洗浄液回収槽5に排出することを少なくとも1回以上行った後に、洗浄液回収槽5に貯留したpH計洗浄液4をドレンパイプから系外に排出する(図3)。そして、pH計1の洗浄処理が完了後にpH計1を廃液14中に浸漬してpH測定を再開する(図1)。
When the pH meter 1 is contaminated, or after periodically lifting the pH meter 1 from the
なお、pH計洗浄液4の種類や洗浄回数は、pH計1の汚染度合に応じて適宜決めれば良い。また、pH計洗浄液4による洗浄後に浄水による洗浄を行ってpH計1の表面に付着したpH計洗浄液4を洗い流すようにしても良い。
The type of pH
1 pH計
2 pH計洗浄槽
3 pH計洗浄液注入口
4 pH計洗浄液
5 洗浄液回収槽
6 底蓋
7 ドレン口
8 ドレンパイプ
9 弁
10 pH計挿通口
11 廃液流入口
12 廃液排出口
13 pH測定槽
14 廃液
15 pH計挿入口
1
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010069061A JP5370231B2 (en) | 2010-03-25 | 2010-03-25 | pH meter cleaning device and pH meter cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010069061A JP5370231B2 (en) | 2010-03-25 | 2010-03-25 | pH meter cleaning device and pH meter cleaning method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011203025A true JP2011203025A (en) | 2011-10-13 |
JP5370231B2 JP5370231B2 (en) | 2013-12-18 |
Family
ID=44879845
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010069061A Expired - Fee Related JP5370231B2 (en) | 2010-03-25 | 2010-03-25 | pH meter cleaning device and pH meter cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5370231B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10338682B2 (en) | 2008-04-02 | 2019-07-02 | Immersion Corporation | Method and apparatus for providing multi-point haptic feedback texture systems |
CN112676248A (en) * | 2020-12-02 | 2021-04-20 | 金川集团股份有限公司 | Automatic electrode cleaning device for measuring pH value of fluid electrolyte |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108548848B (en) * | 2018-04-20 | 2021-04-13 | 唐山三友集团兴达化纤有限公司 | Online automatic device that blasts of pH meter |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54119787A (en) * | 1978-03-10 | 1979-09-17 | Olympus Optical Co | Ionic electrode measuring method and its device |
JP2003262605A (en) * | 2002-03-08 | 2003-09-19 | Horiba Ltd | Method and apparatus for cleaning ion concentration measuring electrode |
JP2006242778A (en) * | 2005-03-03 | 2006-09-14 | Nec Electronics Corp | Oxidation-reduction potential measuring device and measuring method of oxidation-reduction potential |
-
2010
- 2010-03-25 JP JP2010069061A patent/JP5370231B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54119787A (en) * | 1978-03-10 | 1979-09-17 | Olympus Optical Co | Ionic electrode measuring method and its device |
JP2003262605A (en) * | 2002-03-08 | 2003-09-19 | Horiba Ltd | Method and apparatus for cleaning ion concentration measuring electrode |
JP2006242778A (en) * | 2005-03-03 | 2006-09-14 | Nec Electronics Corp | Oxidation-reduction potential measuring device and measuring method of oxidation-reduction potential |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10338682B2 (en) | 2008-04-02 | 2019-07-02 | Immersion Corporation | Method and apparatus for providing multi-point haptic feedback texture systems |
CN112676248A (en) * | 2020-12-02 | 2021-04-20 | 金川集团股份有限公司 | Automatic electrode cleaning device for measuring pH value of fluid electrolyte |
Also Published As
Publication number | Publication date |
---|---|
JP5370231B2 (en) | 2013-12-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1960814B (en) | Drainage pipe cleaning method and drainage pipe cleaning device | |
KR101403671B1 (en) | Maintenance managing apparatus and method of system for sewage water sampling | |
CN101376084A (en) | Membrane filtration device and membrane damage detection method of membrane filtration device | |
CN105283422A (en) | Ultrapure water production system, ultrapure water production supply system, and method for cleaning same | |
JP5370231B2 (en) | pH meter cleaning device and pH meter cleaning method | |
CN106219635A (en) | A kind of ultrapure water machine intelligent management method | |
JP2006322793A (en) | Water quality measuring device and its method | |
KR20180105187A (en) | Control method of vacuum sewer system for building or marine vessel | |
CN203343107U (en) | Full-automatic fast disinfection cleaning machine for porous plate | |
KR101240237B1 (en) | Polluted sewage sample former disposal system and operation method thereof | |
CN109494179A (en) | A kind of automatic organic washing machine, cleaning system and cleaning method | |
KR20130127830A (en) | A filter self-cleaning system for measuring contaminated substance | |
JP5041688B2 (en) | Filtration filter coating method | |
KR100801656B1 (en) | Method for supplying treating liquid | |
CN107831042A (en) | A kind of sampling of wastewater monitoring and cleaning device | |
CN208942991U (en) | A kind of amniotic fluid storage decontamination system | |
CN207738531U (en) | A kind of reverse osmosis sewage treatment equipment | |
CN105858980A (en) | CODcr wastewater treatment system and treatment method thereof | |
CN205965198U (en) | Disc filter's online washing unit | |
JP5905302B2 (en) | Surface deposit measurement device | |
CN204356170U (en) | Be applicable to the test waste liquid recovery apparatus that plastics detect | |
CN209016027U (en) | A kind of automatic organic washing machine and cleaning system | |
JP2001050927A (en) | Cleaning apparatus for residual chlorine analyzer of discharge water in sewer | |
JP2003334512A (en) | Waste cleaning method | |
CN213903262U (en) | Liquid corrosion environment simulator |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20120321 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20120327 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130221 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130517 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130604 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130719 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130820 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130902 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |