JP2001050927A - Cleaning apparatus for residual chlorine analyzer of discharge water in sewer - Google Patents

Cleaning apparatus for residual chlorine analyzer of discharge water in sewer

Info

Publication number
JP2001050927A
JP2001050927A JP11226867A JP22686799A JP2001050927A JP 2001050927 A JP2001050927 A JP 2001050927A JP 11226867 A JP11226867 A JP 11226867A JP 22686799 A JP22686799 A JP 22686799A JP 2001050927 A JP2001050927 A JP 2001050927A
Authority
JP
Japan
Prior art keywords
water
cleaning
residual chlorine
pump
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11226867A
Other languages
Japanese (ja)
Other versions
JP3435370B2 (en
Inventor
Kenichi Hoshi
健一 星
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NISHIKAWA KEISOKU KK
Original Assignee
NISHIKAWA KEISOKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NISHIKAWA KEISOKU KK filed Critical NISHIKAWA KEISOKU KK
Priority to JP22686799A priority Critical patent/JP3435370B2/en
Publication of JP2001050927A publication Critical patent/JP2001050927A/en
Application granted granted Critical
Publication of JP3435370B2 publication Critical patent/JP3435370B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/28Electrolytic cell components
    • G01N27/30Electrodes, e.g. test electrodes; Half-cells
    • G01N27/38Cleaning of electrodes

Abstract

PROBLEM TO BE SOLVED: To obtain a cleaning apparatus which prevents a drop in the measurment accuracy of the concentration of residual chlorine and which extends the cycle interval of an inspection maintenance operation to be longer, by a method wherein the apparatus as a whole is maintained to be always clean. SOLUTION: In this cleaning apparatus, a water-collecting device 1 which collects a sample as discharge water from a river water discharge conduit is provided, and a residual chlorine analyzer 2 which measures residual chlorine in the sample as the discharge water collected by the water collecting device 1 is provided. In the cleaning apparatus, a cleaning-water supply means 4 is provided, a measuring-tank cleaning means to which cleaning water is introduced from cleaning-water supply means 4 and by which the inside of a cleaning tank 24 installed at the residual chlorine analyzer 2 and a measuring electrode are cleaned is provided, a sand-filter device cleaning means by which the inside of a sand filtration device 22 installed at the residual chlorine analyzer 2 and sand are cleaned is provided, a container 13 which is installed at the watercollecting device 1 is provided, a water-collecting device cleaning means by which a water collecting pump 14 and pipes in respective parts are cleaned is provided, and a control device 6 which controls the respective cleaning means is provided.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、下水を河川に放流
するために処理する下水処理場において、下水処理のた
めに注入された塩素の残留濃度を測定する残留塩素計に
関するものである。さらに詳しくは、処理された河川へ
の放流水の残留塩素濃度を、ポーラログラフ法を利用し
て連続的に測定する装置において、測定誤差や感度の低
下の原因となる微生物や妨害物質などが滞留あるいは付
着することを抑制するために、常に装置全体を清浄に保
つ残留塩素計の洗浄装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a residual chlorine meter for measuring the residual concentration of chlorine injected for sewage treatment in a sewage treatment plant for treating sewage for discharge into rivers. In more detail, in a device that continuously measures the residual chlorine concentration of the effluent to the treated river using the polarographic method, microorganisms and interfering substances that cause measurement errors and decrease in sensitivity stay or The present invention relates to a cleaning apparatus for a residual chlorine meter that always keeps the entire apparatus clean in order to suppress the adhesion.

【0002】[0002]

【従来の技術】従来、残留塩素計の洗浄装置としては、
定期的に測定槽の内壁や測定電極を洗浄するオゾン洗浄
法があった。このオゾン洗浄法は、オゾンが溶解したオ
ゾン水を洗浄水として測定槽に注入し、オゾンの酸化作
用によって付着した妨害物質や微生物などを酸化して洗
い流す方法である。また、封入したガラスやセラミック
のビーズによって測定槽内を洗浄する方法があった。こ
のビーズによる洗浄法にはつぎのような方法があった。
第1の方法は、攪拌器あるいは洗浄水の噴射により測定
槽内を攪拌することにより測定電極や測定槽の内壁に付
着した妨害物質や微生物などを洗浄する方法である。第
2の方法は、測定電極が埋もれるようにビーズを封入
し、測定電極自体を常に回転あるいは振動させて測定電
極を研磨する方法である。ビーズを用いた第2の方法で
は、ビーズ中で回転させることにより測定電極を研磨
(洗浄)しながらでも測定を行うことができるが、測定槽
の内壁まで洗浄することはできない。
2. Description of the Related Art Conventionally, as a cleaning device for a residual chlorine meter,
There has been an ozone cleaning method for periodically cleaning the inner wall of a measuring tank and a measuring electrode. This ozone cleaning method is a method in which ozone water in which ozone is dissolved is poured into a measuring tank as cleaning water, and the interfering substances and microorganisms attached by the oxidizing action of ozone are oxidized and washed away. There is also a method of cleaning the inside of a measurement tank with enclosed glass or ceramic beads. The following methods were used for washing with beads.
The first method is a method of agitating the inside of the measuring tank by a stirrer or jetting of washing water to wash the interfering substances and microorganisms attached to the measuring electrode and the inner wall of the measuring tank. The second method is a method in which beads are sealed so that the measurement electrode is buried, and the measurement electrode itself is constantly rotated or vibrated to polish the measurement electrode. In the second method using beads, the measurement electrode is polished by rotating in the beads.
The measurement can be performed while (washing), but the inner wall of the measuring tank cannot be washed.

【0003】[0003]

【発明が解決しようとする課題】上述のような従来の洗
浄方法では、測定電極を含む測定槽の内部だけしか洗浄
することができないので、測定槽内以外の配管やポンプ
など、特に継ぎ目などの凹凸を有する部分に微生物が付
着して繁殖することにより、繁殖した微生物が配管やポ
ンプを通過する放流水のサンプル中に流出し、微生物の
濃度が実際の放流水より高くなる。微生物は、それ自体
が残留塩素の消費要因となるため、微生物の濃度が高く
なるほど放流水のサンプル中の残留塩素を多く消費して
しまう。従って、サンプルの残留塩素濃度が、実際の放
流水の残留塩素濃度より低くなってしまうという問題点
があった。このため、装置全体の点検整備を頻繁に行わ
なければならず、点検整備を怠ると、残留塩素濃度の測
定精度が低下するという問題点があった。さらに、オゾ
ンを用いた方法では、高価なオゾン発生器を必要とする
が、オゾン発生器は、測定槽内の洗浄に用いる程度の発
生量が限界であるため、他の部分まで洗浄することがで
きず、また、オゾンは酸化力が極めて強いので、微生物
や妨害物質を酸化するだけでなく、オゾン洗浄される装
置の各部分の劣化が早いという問題点があった。
According to the conventional cleaning method as described above, only the inside of the measuring tank including the measuring electrode can be cleaned. When the microorganisms adhere to and propagate on the uneven portion, the propagated microorganisms flow out into the sample of the effluent that passes through the pipes and pumps, and the concentration of the microorganisms becomes higher than the actual effluent. Microorganisms themselves cause residual chlorine consumption, so that the higher the concentration of microorganisms, the more residual chlorine in the effluent sample is consumed. Therefore, there was a problem that the residual chlorine concentration of the sample was lower than the actual residual chlorine concentration of the effluent. For this reason, inspection and maintenance of the entire apparatus must be performed frequently, and if inspection and maintenance is neglected, there has been a problem that the measurement accuracy of the residual chlorine concentration is reduced. In addition, the method using ozone requires an expensive ozone generator, but since the amount of ozone generator used is limited to cleaning the inside of the measuring tank, it is not possible to clean other parts. In addition, since ozone has an extremely strong oxidizing power, not only does it oxidize microorganisms and interfering substances, but also there is a problem that each part of the apparatus to be ozone-washed is quickly deteriorated.

【0004】本発明は、装置全体を常に清浄に維持して
装置全体の微生物の繁殖を抑えることにより、ポーラロ
グラフ法による残留塩素濃度の測定精度の低下を防止
し、点検整備の周期間隔をより長く延ばすことを目的と
する。
[0004] The present invention always keeps the entire apparatus clean and suppresses the growth of microorganisms in the entire apparatus, thereby preventing a decrease in the accuracy of the residual chlorine concentration measurement by the polarographic method and extending the cycle of inspection and maintenance. The purpose is to extend.

【0005】[0005]

【課題を解決するための手段】本発明は、以上のような
問題点を解決するためになされたもので、河川放流渠か
ら放流水のサンプルを採取する採水装置と、この採水装
置で採取された放流水のサンプルの残留塩素を測定して
出力する残留塩素計とを具備する残留塩素計において、
洗浄水供給手段と、この洗浄水供給手段から洗浄水を導
入し、前記残留塩素計に設けられた測定槽の内部および
測定電極の洗浄を行う測定槽洗浄手段と、前記残留塩素
計に設けられた砂濾過装置の内部および砂の洗浄を行う
砂濾過装置洗浄手段と、前記採水装置に設けられたスト
レーナ、採水ポンプおよび各部の配管を洗浄する採水装
置洗浄手段と、これらの洗浄手段を制御する制御装置と
を具備してなるものである。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and a water sampling device for sampling a sample of discharged water from a river discharge culvert, and a water sampling device using the water sampling device. A residual chlorine meter comprising: a residual chlorine meter that measures and outputs residual chlorine of a sample of the discharged effluent;
Cleaning water supply means, measurement tank cleaning means for introducing cleaning water from the cleaning water supply means, for cleaning the inside of the measurement tank and the measurement electrode provided in the residual chlorine meter, and provided in the residual chlorine meter. Sand filtering device cleaning means for cleaning the inside of the sand filtration device and sand, water sampling device cleaning means for cleaning a strainer, a water sampling pump and piping of each part provided in the water sampling device, and a cleaning device for these And a control device for controlling the

【0006】[0006]

【発明の実施の形態】以下、本発明の実施例を図面に基
づき説明する。図1は、本発明による洗浄装置を示すブ
ロック図で、1は河川放流渠11から放流水のサンプル
を採取する採水装置、2は残留塩素計、3は測定のため
の試薬を残留塩素計1に供給する試薬供給装置、4は残
留塩素計1や採水装置2に洗浄水を供給する洗浄水供給
装置、5は砂濾過装置22の洗浄の際に洗浄薬を供給す
る洗浄薬供給装置、6はこれらの装置を制御する制御装
置である。なお、図1中、実線は残留塩素測定系の配管
を表し、破線は洗浄液(薬)供給系の配管を表し、二点
鎖線は制御系の配線を表す。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a block diagram showing a cleaning apparatus according to the present invention. 1 is a water sampling apparatus for collecting a sample of effluent from a river discharge culvert 11, 2 is a residual chlorine meter, 3 is a residual chlorine meter for measuring reagents. 1 is a reagent supply device for supplying to 1, 4 is a cleaning water supply device for supplying cleaning water to the residual chlorine meter 1 and the water sampling device 2, 5 is a cleaning agent supply device for supplying a cleaning agent when the sand filtration device 22 is washed. , 6 are control devices for controlling these devices. In FIG. 1, the solid line represents the piping of the residual chlorine measurement system, the broken line represents the piping of the cleaning liquid (chemical) supply system, and the two-dot chain line represents the wiring of the control system.

【0007】採水装置1は、先端を河川放流渠11に臨
ませて設けられた採水管12がストレーナ13を介して
採水ポンプ14に接続されており、この採水ポンプ14
の吐出口は配管20を介して前記残留塩素計2の砂濾過
装置22に接続されている。また、この配管20の反対
側には、余剰の放流水サンプルまたは洗浄水を排水する
ため、前記採水管12より下流側に位置する配水管29
が接続されている。採水ポンプ14は、運転状態から停
止する際に、できる限り瞬時に運転を停止するポンプが
使われる。
In the water sampling apparatus 1, a water sampling pipe 12 provided with a tip thereof facing a river discharge channel 11 is connected to a water sampling pump 14 via a strainer 13.
Is connected to a sand filtration device 22 of the residual chlorine meter 2 through a pipe 20. On the opposite side of the pipe 20, a drain pipe 29 located downstream from the water sampling pipe 12 is provided to drain excess effluent water sample or washing water.
Is connected. As the water sampling pump 14, a pump that stops operation as soon as possible when stopping from the operation state is used.

【0008】残留塩素計2の砂濾過装置22は、図3に
示すように、水槽22aの約半分の深さに砂22bが充
填されており、水槽22aの上部から放流水のサンプル
が注がれるようになっている。また、水槽22aの下部
に設けられた濾出口22dは、測定のための試薬と放流
水のサンプルとを規定の比率で混合する混合ポンプ23
の一方の吸入口に接続されており、さらに、水槽22a
が満水となる水位の高さには、オーバーフロー管22c
が接続されている。このオーバーフロー管22cは前記
河川放流渠11の前記採水管12より下流側に位置する
排水管19に接続されている。混合ポンプ23の吐出口
は測定槽24に接続され、測定槽24の排出口は前記排
水管19に接続されている。
As shown in FIG. 3, the sand filter 22 of the residual chlorine meter 2 is filled with sand 22b to a depth of about half of a water tank 22a, and a sample of discharged water is poured from the upper part of the water tank 22a. It is supposed to be. Further, a filtration outlet 22d provided at a lower portion of the water tank 22a is provided with a mixing pump 23 for mixing a reagent for measurement and a sample of effluent at a specified ratio.
Is connected to one suction port of the water tank 22a.
When the water level is full, the overflow pipe 22c
Is connected. The overflow pipe 22c is connected to a drain pipe 19 located downstream of the water sampling pipe 12 of the river discharge channel 11. The discharge port of the mixing pump 23 is connected to the measuring tank 24, and the outlet of the measuring tank 24 is connected to the drain pipe 19.

【0009】測定槽24の内部には、図4に示すよう
に、ガラスあるいはセラミックのビーズ24aが封入さ
れており、測定電極24bはこのビーズ24aに埋もれ
るように配置され、かつ、自転するための駆動装置24
dが設けられている。また、測定槽24の底部に臨ませ
て内部に洗浄水を噴射するノズル24cが設けられてい
る。測定槽24からの残留塩素測定信号出力は、変換器
25に内蔵された増幅回路(図示せず)を介して制御装置
6に接続されている。この変換器25には、さらに、洗
浄制御出力として、測定槽24の洗浄を制御する洗浄出
力端子26を介して後述の第5電磁弁31に接続され、
洗浄制御の開始を制御する制御出力端子27を介して制
御装置6に接続されている。
As shown in FIG. 4, glass or ceramic beads 24a are sealed in the measuring tank 24, and the measuring electrodes 24b are disposed so as to be buried in the beads 24a and rotate for rotation. Drive 24
d is provided. In addition, a nozzle 24c for injecting cleaning water into the inside facing the bottom of the measuring tank 24 is provided. The residual chlorine measurement signal output from the measurement tank 24 is connected to the control device 6 via an amplifier circuit (not shown) built in the converter 25. This converter 25 is further connected as a cleaning control output to a fifth solenoid valve 31 described below via a cleaning output terminal 26 for controlling cleaning of the measuring tank 24,
It is connected to the control device 6 via a control output terminal 27 for controlling the start of the cleaning control.

【0010】試薬供給装置3は、水道(図示せず)に接続
され、純水を生成する純水器32、試薬調合タンク3
3、移送ポンプ34、調合された試薬を貯留する試薬タ
ンク35が順次接続され、試薬タンク35は、前記混合
ポンプ23の他方の吸入口に接続されている。
The reagent supply device 3 is connected to a water supply (not shown), and a pure water generator 32 for generating pure water, a reagent preparation tank 3
3. A transfer pump 34 and a reagent tank 35 for storing the prepared reagent are sequentially connected, and the reagent tank 35 is connected to the other suction port of the mixing pump 23.

【0011】洗浄水供給装置4は、水道(図示せず)から
の水道水を貯留する洗浄水タンク36と、洗浄水(水道
水)を前記残留塩素計2および採水装置1に供給する洗
浄水ポンプ37とからなり、洗浄水タンク36には水位
が下がると自動的に開いて水道水を補給する水栓(図示
せず)が設けられている。洗浄水ポンプ37の吐出口
は、洗浄水配管51を介してストレーナ13と採水ポン
プ14の間の配管15に、洗浄水配管52を介して採水
ポンプ14の吐出側の配管16に、洗浄水配管53を介
して前記配管20の砂濾過装置22の直前に接続される
とともに、洗浄水配管54を介して砂濾過装置22の濾
出口22dに、洗浄水配管55を介して測定槽24のノ
ズル24cに接続されている。これらの洗浄水ポンプ3
7から各部への洗浄水配管51、52、53、54、5
5には、それぞれ洗浄水を供給、停止するための第1〜
5の電磁弁17、18、21、30、31が設けられて
いる。これらの電磁弁17、18、21、30、31は
常閉型である。
The cleaning water supply device 4 includes a cleaning water tank 36 for storing tap water from a water supply (not shown), and a cleaning water supply device for supplying cleaning water (tap water) to the residual chlorine meter 2 and the water sampling device 1. The washing water tank 36 is provided with a faucet (not shown) which automatically opens when the water level drops and supplies tap water. The discharge port of the cleaning water pump 37 is connected to the pipe 15 between the strainer 13 and the water sampling pump 14 via the cleaning water pipe 51, and to the pipe 16 on the discharge side of the water sampling pump 14 via the cleaning water pipe 52. A water pipe 53 is connected immediately before the sand filter 22 of the pipe 20, and a washing water pipe 54 is connected to a filter outlet 22 d of the sand filter 22. It is connected to the nozzle 24c. These washing water pumps 3
Cleaning water piping 51, 52, 53, 54, 5 from 7 to each part
5 are the first to the first for supplying and stopping the washing water, respectively.
Five solenoid valves 17, 18, 21, 30, 31 are provided. These solenoid valves 17, 18, 21, 30, 31 are normally closed type.

【0012】洗浄薬供給装置5は、洗浄薬としての次亜
塩素酸塩(例えば、NaClO)溶液が貯留された洗浄
薬タンク38と洗浄薬供給ポンプ39とからなり、前記
洗浄水ポンプ37から砂濾過装置22の濾出口22dへ
の洗浄水配管54の途中であって第4電磁弁30の砂濾
過装置22側に接続されている。
The cleaning agent supply device 5 includes a cleaning agent tank 38 storing a hypochlorite (eg, NaClO) solution as a cleaning agent and a cleaning agent supply pump 39. The fourth solenoid valve 30 is connected to the sand filtration device 22 on the way of the washing water pipe 54 to the filtration outlet 22 d of the filtration device 22.

【0013】制御装置6は、図2に示すように、残留塩
素測定信号を必要に応じてホールドして出力するメモリ
40が設けられ、このメモリ40の出力は残留塩素濃度
を表示する表示装置41に接続されるとともに、中央監
視所(図示せず)に出力するための信号出力端子59に
接続されている。また、制御装置6には、前記変換器2
5からの制御出力端子27に接続されたシーケンサ42
が設けられ、このシーケンサ42の制御出力は、駆動接
点43〜49およびメモリ40のホールド制御端子に接
続されている。駆動接点43は採水ポンプ14に、駆動
接点44は洗浄水ポンプ37に、駆動接点45は洗浄薬
ポンプ39に、駆動接点46は前記洗浄水配管51に設
けられた第1電磁弁17に、駆動接点47は前記洗浄水
配管52に設けられた第2電磁弁18に、駆動接点48
は前記洗浄水配管53に設けられた第3電磁弁21に、
駆動接点49は前記洗浄水配管54の第4電磁弁30に
接続されている。採水ポンプ14の駆動接点43は常閉
型であり、その他の駆動接点44〜49は常開型であ
る。
As shown in FIG. 2, the control device 6 is provided with a memory 40 for holding and outputting the residual chlorine measurement signal as necessary, and the output of the memory 40 is a display device 41 for displaying the residual chlorine concentration. And a signal output terminal 59 for outputting to a central monitoring station (not shown). The control device 6 includes the converter 2
Sequencer 42 connected to control output terminal 27 from 5
The control output of the sequencer 42 is connected to the drive contacts 43 to 49 and the hold control terminal of the memory 40. The drive contact 43 is connected to the water sampling pump 14, the drive contact 44 is connected to the washing water pump 37, the drive contact 45 is connected to the detergent pump 39, the drive contact 46 is connected to the first solenoid valve 17 provided in the washing water pipe 51, The drive contact 47 is connected to the second solenoid valve 18 provided in the washing water pipe 52 by a drive contact 48.
Corresponds to the third solenoid valve 21 provided in the washing water pipe 53,
The drive contact 49 is connected to the fourth solenoid valve 30 of the washing water pipe 54. The drive contact 43 of the water sampling pump 14 is a normally closed type, and the other drive contacts 44 to 49 are a normally open type.

【0014】つぎに以上の構成の装置における動作を説
明する。まず、試薬供給装置3および洗浄水供給装置4
について説明する。試薬供給装置3は、純水器32によ
り水道水から塩素やその他の不純物を取り除いて純水を
生成して試薬調合タンク33に溜めてゆく。試薬調合タ
ンク33に規定の量の純水が溜まると、これに相当する
量の試薬が投入されて攪拌され、移送ポンプ34により
試薬タンク35に移送される。洗浄水供給装置4は、常
に規定の量の水道水が貯留されるように、装置の洗浄な
どに使用されて水位が下がると自動的に水栓(図示せ
ず)が開いて水道水が補給される
Next, the operation of the apparatus having the above configuration will be described. First, the reagent supply device 3 and the washing water supply device 4
Will be described. The reagent supply device 3 removes chlorine and other impurities from tap water by a pure water device 32 to generate pure water, and stores the pure water in a reagent preparation tank 33. When a prescribed amount of pure water accumulates in the reagent preparation tank 33, a corresponding amount of reagent is charged and stirred, and is transferred to the reagent tank 35 by the transfer pump 34. The washing water supply device 4 is used for washing the device and so on so that a predetermined amount of tap water is always stored. When the water level drops, a water faucet (not shown) is automatically opened to supply tap water. Be done

【0015】つぎに、残留塩素の測定時の動作について
説明する。残留塩素の測定時には、変換器25は、洗浄
出力端子26および制御出力端子27からの駆動制御信
号を出力しておらず、各駆動接点43〜49は常態を維
持している。したがって、常閉型の駆動接点33は閉じ
て採水ポンプ14を運転しており、常開型の駆動出力接
点44〜49は開いているので、洗浄水供給装置4から
各部へ洗浄水(水道水)を停止、供給する第1〜5電磁弁
17、18、21、30、31はすべて閉止し、洗浄水
ポンプ37、洗浄薬ポンプ39は運転を停止している。
混合ポンプ23は、本装置が運転を行っている限り、測
定時、洗浄時を問わず運転を継続している。この測定動
作状態では、図5に太線で示すように、採水ポンプ14
により採水管12を介して河川放流渠11から放流水の
サンプルが採取され、ストレーナ13でごみや土砂など
が除去されて砂濾過装置22に送られる。放流水のサン
プルは、前記ストレーナ13で除去しきれない濁質が砂
濾過装置22で除去され、水槽22aから溢れる放流水
のサンプルはオーバーフロー管22c、排水管19を介
して河川放流渠11に放流される。
Next, the operation at the time of measuring the residual chlorine will be described. When measuring the residual chlorine, the converter 25 does not output the drive control signals from the cleaning output terminal 26 and the control output terminal 27, and the respective drive contacts 43 to 49 maintain the normal state. Therefore, the normally closed drive contact 33 is closed to operate the water sampling pump 14, and the normally open drive output contacts 44 to 49 are open. The first to fifth solenoid valves 17, 18, 21, 30, and 31 for stopping and supplying (water) are all closed, and the cleaning water pump 37 and the cleaning agent pump 39 are stopped.
As long as the present apparatus is operating, the mixing pump 23 continues to operate irrespective of measurement or cleaning. In this measurement operation state, as shown by the thick line in FIG.
Thus, a sample of the discharged water is collected from the river discharge channel 11 through the water sampling pipe 12, and trash and earth and sand are removed by the strainer 13 and sent to the sand filtration device 22. The effluent sample which is not completely removed by the strainer 13 is removed by the sand filtration device 22. Is done.

【0016】濁質が除去された放流水のサンプルは、前
記試薬タンク35に貯留された試薬とともに、混合ポン
プ23で吸引されて規定の比率に混合されて測定槽24
に送出される。測定槽24では、流入した放流水のサン
プルの残留塩素濃度がポーラログラフ法により測定さ
れ、変換器25に内蔵された増幅器により適当な大きさ
(例えば、4〜20mA)に増幅されて制御装置6のメ
モリ40に出力される。この測定の間も、測定電極は自
転を継続しており、ビーズ24aにより常に測定電極表
面に均一な拡散層を維持できるように研磨(洗浄)され
ている。メモリ40は、この測定状態では、入力した残
留塩素の測定信号をそのまま、表示装置41に出力して
表示するとともに、信号出力端子59を介して中央監視
所に送信する。
The effluent sample from which the turbid matter has been removed is sucked by the mixing pump 23 and mixed with the reagent stored in the reagent tank 35 at a specified ratio, and mixed in a specified ratio.
Sent to In the measuring tank 24, the residual chlorine concentration of the sample of the discharged effluent is measured by a polarographic method, amplified to an appropriate size (for example, 4 to 20 mA) by an amplifier built in the converter 25, and Output to the memory 40. Even during this measurement, the measurement electrode continues to rotate, and is polished (washed) by the beads 24a so that a uniform diffusion layer can always be maintained on the measurement electrode surface. In this measurement state, the memory 40 outputs the input residual chlorine measurement signal as it is to the display device 41 for display, and transmits the signal to the central monitoring station via the signal output terminal 59.

【0017】つぎに、洗浄動作について説明する。洗浄
は、例えば、30分周期間隔で行われ、変換器25から
洗浄出力端子26および制御出力端子27への駆動制御
信号が出力されることにより開始される。洗浄出力端子
26から駆動信号が出力されると第5電磁弁31が開放
され、同時に制御出力端子27から制御信号が出力され
ると、シーケンサ42が各接点43〜48の開閉制御を
開始する。シーケンサ42は、まず、メモリ40のホー
ルド制御端子にホールド信号を出力し、洗浄動作が完了
するまで、出力される測定信号を洗浄開始直前の値に維
持する。
Next, the cleaning operation will be described. The cleaning is performed, for example, at intervals of 30 minutes, and is started when a drive control signal is output from the converter 25 to the cleaning output terminal 26 and the control output terminal 27. When a drive signal is output from the cleaning output terminal 26, the fifth solenoid valve 31 is opened. When a control signal is output from the control output terminal 27 at the same time, the sequencer 42 starts opening / closing control of the contacts 43 to 48. The sequencer 42 first outputs a hold signal to the hold control terminal of the memory 40, and maintains the output measurement signal at the value immediately before the start of cleaning until the cleaning operation is completed.

【0018】そして、測定槽24の洗浄が60秒間行わ
れる。測定槽24の洗浄は、洗浄出力端子26から駆動
信号が出力される事により、第5電磁弁31が開放さ
れ、駆動接点44が閉じて洗浄水ポンプ37が運転を開
始し、図6に太線で示すように、洗浄水供給装置4から
洗浄水(水道水)が測定槽24内にノズル24cからジ
ェット噴流として噴射される。すると測定槽24内が攪
拌され、洗浄水および封入されたビーズ24aにより内
壁および測定電極が洗浄される。噴射された洗浄水は配
水管19を介して河川放流渠11に排水される。測定槽
24の洗浄が完了すると、洗浄出力端子26からの駆動
信号が停止して第5電磁弁31が閉止する。
Then, the measuring tank 24 is washed for 60 seconds. The cleaning of the measuring tank 24 is performed by outputting a drive signal from the cleaning output terminal 26, whereby the fifth solenoid valve 31 is opened, the drive contact 44 is closed, and the cleaning water pump 37 starts operating. As shown by, washing water (tap water) is jetted from the washing water supply device 4 into the measuring tank 24 from the nozzle 24c as a jet stream. Then, the inside of the measuring tank 24 is stirred, and the inner wall and the measuring electrode are washed by the washing water and the enclosed beads 24a. The injected washing water is drained to the river discharge culvert 11 via the water distribution pipe 19. When the cleaning of the measuring tank 24 is completed, the drive signal from the cleaning output terminal 26 stops and the fifth solenoid valve 31 closes.

【0019】測定槽24の洗浄開始に7秒遅れて、砂濾
過装置22の逆方向洗浄が5分間行われる。この砂濾過
装置22の洗浄は、駆動接点49が閉じて第4電磁弁3
0が開放され、駆動接点45が閉じて洗浄薬ポンプ39
が運転を開始する。すると、図6に太線で示すように、
砂濾過装置22の濾出口22dから、洗浄薬が混合され
た洗浄水が噴射されて、逆方向洗浄により砂22bに捕
捉された濁質を洗浄するとともに、水槽22aの内壁の
洗浄が行われる。洗浄を行った後の洗浄水はオーバーフ
ロー管22cから配水管19を介して河川放流渠11に
排水される。同時に混合ポンプ23にも洗浄薬が混合さ
れた洗浄水が吸入されて混合ポンプ23の内部も洗浄が
行われる。混合ポンプ23を洗浄した洗浄水は、測定槽
24を経て配水管19から河川放流渠11に排水され
る。
Seven seconds later than the start of washing of the measuring tank 24, backward washing of the sand filter 22 is performed for 5 minutes. When the sand filter 22 is washed, the drive contact 49 is closed and the fourth solenoid valve 3 is closed.
0 is opened, the drive contact 45 is closed, and the cleaning agent pump 39 is closed.
Starts driving. Then, as shown by the thick line in FIG.
Cleaning water mixed with a cleaning agent is sprayed from a filtration outlet 22d of the sand filtration device 22 to wash the turbid matter trapped in the sand 22b by the backward cleaning and to clean the inner wall of the water tank 22a. The washing water after the washing is drained from the overflow pipe 22c to the river discharge culvert 11 via the water distribution pipe 19. At the same time, the cleaning water mixed with the cleaning agent is sucked into the mixing pump 23, and the inside of the mixing pump 23 is also cleaned. The washing water that has washed the mixing pump 23 is drained from the water distribution pipe 19 to the river discharge culvert 11 via the measuring tank 24.

【0020】前記測定槽24の洗浄の開始と同時に、駆
動接点43が開いて採水ポンプ14の運転を停止する
が、急激な流れの停止によるウォータハンマー現象によ
り、配管の内壁に付着した微生物や妨害物質がある程度
剥離する。採水ポンプ14停止の5秒後、採水ポンプ1
4と砂濾過装置22との間の配管20の正方向洗浄が6
0秒間行われる。この洗浄は、駆動接点47を閉じて第
2電磁弁18が開放され、図6に太線で示すように、配
管20に洗浄水供給装置4からの洗浄水が正方向に供給
されて洗浄が行われる。配管20を洗浄した洗浄水は砂
濾過装置22を経て、オーバーフロー管22c、配水管
19を介して河川放流渠11に排水される。
At the same time as the washing of the measuring tank 24 is started, the driving contact 43 opens to stop the operation of the water sampling pump 14. However, due to the water hammer phenomenon caused by the sudden stop of the flow, microorganisms adhering to the inner wall of the pipe are removed. Interfering substances peel to some extent. Five seconds after the pump 14 stopped, the water pump 1
The forward cleaning of the pipe 20 between the sand filter 4 and
Performed for 0 seconds. In this cleaning, the driving contact 47 is closed, the second solenoid valve 18 is opened, and the cleaning water is supplied from the cleaning water supply device 4 to the pipe 20 in the forward direction as shown by the thick line in FIG. Will be The washing water that has washed the pipe 20 passes through the sand filtration device 22 and is drained to the river discharge culvert 11 via the overflow pipe 22 c and the water distribution pipe 19.

【0021】つぎに、前記配管20の逆方向洗浄が60
秒間行われる。この逆洗浄は、駆動接点47を開いて第
2電磁弁18が閉止され、駆動接点48を閉じて第3電
磁弁21が開放され、図7に太線で示すように、配管2
0に洗浄水供給装置4からの洗浄水が逆方向に供給され
て洗浄が行われる。配管20を逆洗浄した洗浄水は、配
水管29を介して河川放流渠11に排水される。
Next, the reverse cleaning of the pipe 20 is performed for 60 hours.
Done for seconds. This back washing is performed by opening the drive contact 47 and closing the second solenoid valve 18, closing the drive contact 48 and opening the third solenoid valve 21, and as shown by the thick line in FIG.
The cleaning water is supplied to the cleaning water supply device 4 in the reverse direction, and the cleaning is performed. The washing water obtained by backwashing the pipe 20 is drained to the river discharge culvert 11 via a water pipe 29.

【0022】つぎに、採水管12およびストレーナ13
の逆洗浄が60秒間行われる。この逆洗浄は、駆動接点
47を開いて第2電磁弁18が閉止され、駆動接点46
を閉じて第1電磁弁17が開放される。すると、図8に
太線で示すように、採水管12およびストレーナ13に
洗浄水供給装置4から洗浄水が逆方向に供給されて洗浄
が行われる。この逆洗浄によりストレーナ13に濾過さ
れたごみや土砂が洗浄されて河川放流渠11に排出され
る。
Next, the water sampling pipe 12 and the strainer 13
Is performed for 60 seconds. In this back washing, the drive contact 47 is opened, the second solenoid valve 18 is closed, and the drive contact 46
And the first solenoid valve 17 is opened. Then, as shown by the thick line in FIG. 8, the washing water is supplied from the washing water supply device 4 to the water sampling pipe 12 and the strainer 13 in the reverse direction to perform washing. By this back washing, dirt and earth and sand filtered by the strainer 13 are washed and discharged to the river discharge culvert 11.

【0023】つぎに、採水ポンプ14の洗浄が20秒間
行われる。この採水ポンプ14の洗浄は、駆動接点43
を閉じて採水ポンプ14を運転する。すると、図9に太
線で示すように、ポンプ14に洗浄水供給装置4から洗
浄水が供給されて洗浄が行われる。採水ポンプ14を洗
浄した洗浄水は、配水管29を介して河川放流渠11に
排水される。余剰の洗浄水は、ストレーナ13、採水管
12を介して河川放流渠11に排水される。
Next, the water sampling pump 14 is washed for 20 seconds. The cleaning of the water sampling pump 14 is performed by
Is closed and the water sampling pump 14 is operated. Then, as shown by the thick line in FIG. 9, the cleaning water is supplied from the cleaning water supply device 4 to the pump 14, and the cleaning is performed. Wash water that has washed the water sampling pump 14 is drained to the river discharge culvert 11 via a water pipe 29. Excess washing water is drained to the river discharge channel 11 through the strainer 13 and the water sampling pipe 12.

【0024】以上の配管20の正方向洗浄、逆方向洗
浄、採水管12およびストレーナ13の逆方向洗浄、採
水ポンプ14の洗浄の間、前記砂濾過装置22の洗浄が
平行して行われている。これらの洗浄がすべて完了する
と、駆動接点44、45が開いて洗浄薬ポンプ39、洗
浄水ポンプ37の運転が停止し、駆動接点46が開いて
第1電磁弁17が閉止する。そして、すべての駆動接点
が残留塩素の測定時の状態に戻るが、測定槽24、砂濾
過装置22、採水ポンプ14や各部の配管内の洗浄水
が、放流水のサンプルに置換されるまで、シーケンサ4
2は、メモリ40のホールド制御端子へのホールド信号
出力を継続し、出力される測定信号を洗浄開始直前の値
に維持する。そして、放流水のサンプルへの置換が完了
するのに充分な時間の経過後に、メモリ40へのホール
ド信号出力が解除されて、再び、測定された残留塩素の
測定信号がメモリ40から出力されて、定常の残留塩素
測定状態に戻る。
During the washing of the pipe 20 in the forward direction and the backward direction, the washing of the water sampling pipe 12 and the strainer 13 in the backward direction, and the washing of the water sampling pump 14, the sand filter 22 is washed in parallel. I have. When all of these washings are completed, the drive contacts 44 and 45 are opened, the operation of the cleaning agent pump 39 and the washing water pump 37 is stopped, the drive contact 46 is opened, and the first solenoid valve 17 is closed. Then, all the drive contacts return to the state at the time of the measurement of the residual chlorine, but until the washing water in the measuring tank 24, the sand filtration device 22, the water sampling pump 14 and the piping of each part is replaced by the sample of the discharged water. , Sequencer 4
2 keeps outputting the hold signal to the hold control terminal of the memory 40 and maintains the output measurement signal at the value immediately before the start of cleaning. After a lapse of time sufficient to complete the replacement of the effluent with the sample, the output of the hold signal to the memory 40 is released, and the measurement signal of the measured residual chlorine is output from the memory 40 again. Then, the operation returns to the normal residual chlorine measurement state.

【0025】以上の実施例では、従来の測定槽の洗浄を
行う洗浄装置に、採水装置1の配管20や採水ポンプ1
4の洗浄を行う構成を追加したので、残留塩素計2に設
けられた変換器25から出力される信号で洗浄を開始す
るように構成したが、本発明はこれに限られるものでは
なく、制御装置6に設けられたシーケンサ42によっ
て、測定槽の洗浄を含むすべての洗浄の開始から完了ま
での制御を行うようにしてもよい。
In the above-described embodiment, the conventional cleaning device for cleaning the measuring tank includes the pipe 20 of the water sampling device 1 and the water pump 1.
4 was added, so that the cleaning was started by a signal output from the converter 25 provided in the residual chlorine meter 2, but the present invention is not limited to this, and the control is not limited to this. The sequencer 42 provided in the apparatus 6 may perform control from the start to the completion of all cleaning including cleaning of the measurement tank.

【0026】以上の実施例では、洗浄水としての水道水
を、一旦、洗浄水タンク36に貯留して洗浄水ポンプ3
7で供給するようにしたが、洗浄動作時に充分な水量と
水圧が得られさえすれば、水道から直接供給するように
してもよい。洗浄水タンク36に水道水を貯留するよう
にした場合、時間とともに貯留した水道水の塩素濃度が
低下するため、洗浄時に洗浄薬が混入される砂濾過装置
22以外の洗浄では、長時間貯留した水道水による洗浄
では、微生物などの塩素消費物質の除去効果が低下する
ので、洗浄周期に合せて洗浄水タンク36に水道水を貯
留する必要がある。
In the above embodiment, the tap water as the washing water is temporarily stored in the washing water tank 36 and the washing water pump 3
Although the supply is performed at 7, the supply may be performed directly from the water supply as long as a sufficient amount of water and water pressure can be obtained during the cleaning operation. When the tap water is stored in the wash water tank 36, the chlorine concentration of the stored tap water decreases with time. Therefore, the tap water is stored for a long time in cleaning other than the sand filtration device 22 in which the cleaning agent is mixed during cleaning. In washing with tap water, the effect of removing chlorine-consuming substances such as microorganisms is reduced. Therefore, it is necessary to store tap water in the washing water tank 36 according to the washing cycle.

【0027】[0027]

【発明の効果】本発明は、測定槽の洗浄に加えて、砂濾
過装置および放流水のサンプルを残留塩素計に供給する
採水装置のポンプや配管をも洗浄するようにしたので、
装置の各部に微生物や妨害物質が滞留することが極めて
少なくなり、点検整備の周期を大幅に伸ばすことができ
るという効果を有する。特に、ストレーナ13や採水管
12を逆洗浄により洗浄し、採水ポンプから砂濾過装置
への配管20は、洗浄水を正方向と逆方向の両方向に流
通させて洗浄するようにしたので、一方向のみの洗浄で
は不充分な配管などの継ぎ目なども、微生物や妨害物質
が滞留することが少なくなり、洗浄の効果が高いという
効果を有する。
According to the present invention, in addition to washing the measuring tank, the sand filter and the pump and piping of the water sampling apparatus for supplying the sample of the discharged water to the residual chlorine meter are also washed.
Microorganisms and interfering substances are extremely unlikely to accumulate in each part of the apparatus, and the cycle of inspection and maintenance can be greatly extended. In particular, the strainer 13 and the water sampling pipe 12 are washed by back washing, and the pipe 20 from the water sampling pump to the sand filtration device is made to wash by flowing the washing water in both the forward and reverse directions. Microbes and interfering substances are less likely to accumulate at seams such as pipes, etc., which are insufficient when cleaning in only the direction is effective, and the cleaning effect is high.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の残留塩素計洗浄装置の実施例を示すブ
ロック図である。
FIG. 1 is a block diagram showing an embodiment of a residual chlorine meter cleaning apparatus of the present invention.

【図2】図1における制御装置を示すブロック図であ
る。
FIG. 2 is a block diagram showing a control device in FIG.

【図3】図1における砂濾過装置を示す説明図である。FIG. 3 is an explanatory view showing the sand filtration device in FIG. 1;

【図4】図1における測定槽の説明図である。FIG. 4 is an explanatory view of a measuring tank in FIG.

【図5】本発明の残留塩素計洗浄装置による残留塩素測
定時における放流水のサンプルの流れを示す説明図であ
る。
FIG. 5 is an explanatory diagram showing a flow of a sample of effluent at the time of measuring residual chlorine by the residual chlorine meter cleaning device of the present invention.

【図6】本発明の残留塩素計洗浄装置による砂濾過装
置、測定槽、混合ポンプの洗浄、および配管20の正方
向洗浄時における洗浄水の流れを示す説明図である。
FIG. 6 is an explanatory diagram showing the flow of the washing water when the sand filtering device, the measuring tank, and the mixing pump are washed by the residual chlorine meter washing device of the present invention, and when the pipe 20 is washed in the forward direction.

【図7】本発明の残留塩素計洗浄装置による採水装置の
配管20の逆方向洗浄時における洗浄水の流れ示す説明
図である。
FIG. 7 is an explanatory diagram showing a flow of cleaning water when the piping 20 of the water sampling apparatus is reversely cleaned by the residual chlorine meter cleaning apparatus of the present invention.

【図8】本発明の残留塩素計洗浄装置による採水管12
とストレーナ13の洗浄時における洗浄水の流れ示す説
明図である。
FIG. 8 shows a water sampling pipe 12 provided by the apparatus for cleaning a residual chlorine meter according to the present invention.
FIG. 4 is an explanatory diagram showing a flow of cleaning water when cleaning the strainer 13.

【図9】本発明の残留塩素計洗浄装置による採水ポンプ
14の洗浄時における洗浄水の流れ示す説明図である。
FIG. 9 is an explanatory diagram showing a flow of cleaning water when the water sampling pump is cleaned by the residual chlorine meter cleaning device of the present invention.

【符号の説明】[Explanation of symbols]

1…採水装置、2…残留塩素計、3…試薬供給装置、4
…洗浄水供給装置、5…洗浄薬供給装置、6…制御装
置、11…河川放流渠、12…採水管、13…ストレー
ナ、14…採水ポンプ、15、16…配管、17…第1
電磁弁、18…第2電磁弁、19…配水管、20…配
管、21…第3電磁弁、22…砂濾過装置、23…混合
ポンプ、24…測定槽、25…変換器、26…洗浄出力
端子、27…制御出力端子、28…測定信号出力端子、
29…排水管、30…第4電磁弁、31…第5電磁弁、
32…純水器、33…試薬調合タンク、34…移送ポン
プ、35…試薬タンク、36…洗浄水タンク、37…洗
浄水ポンプ、38…洗浄薬タンク、39…洗浄薬ポン
プ、40…メモリ、41…表示装置、42…シーケン
サ、43〜49…駆動接点、51、52、53、54、
55…洗浄水配管、59…測定信号出力端子点。
1 ... water sampling device, 2 ... residual chlorine meter, 3 ... reagent supply device, 4
... Washing water supply device, 5 ... Cleaning agent supply device, 6 ... Control device, 11 ... River culvert, 12 ... Sampling pipe, 13 ... Strainer, 14 ... Sampling pump, 15, 16 ... Piping, 17 ... First
Solenoid valve, 18: second solenoid valve, 19: water pipe, 20: piping, 21: third solenoid valve, 22: sand filtration device, 23: mixing pump, 24: measuring tank, 25: converter, 26: cleaning Output terminal, 27: control output terminal, 28: measurement signal output terminal,
29 ... drain pipe, 30 ... fourth solenoid valve, 31 ... fifth solenoid valve,
32 ... pure water device, 33 ... reagent preparation tank, 34 ... transfer pump, 35 ... reagent tank, 36 ... wash water tank, 37 ... wash water pump, 38 ... wash agent tank, 39 ... wash agent pump, 40 ... memory, 41: display device, 42: sequencer, 43 to 49: drive contacts, 51, 52, 53, 54,
55: Cleaning water pipe, 59: Measurement signal output terminal point.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G01N 33/18 106 G01N 27/46 316Z ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) G01N 33/18 106 G01N 27/46 316Z

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 河川放流渠から放流水のサンプルを採取
する採水装置と、この採水装置で採取された放流水のサ
ンプルの残留塩素を測定して出力する残留塩素計とを具
備する残留塩素計において、前記残留塩素計に設けられ
た測定槽の内部および測定電極の洗浄を行う測定槽洗浄
装置と、前記残留塩素計に設けられた砂濾過装置の内部
および砂の洗浄を行う砂濾過装置洗浄装置と、前記採水
装置に設けられたストレーナ、採水ポンプおよび各部の
配管を洗浄する採水装置洗浄装置と、これらの洗浄手段
に洗浄水を供給する洗浄水供給装置と、洗浄手段を制御
する制御装置とを具備してなることを特徴とする下水道
放流水の残留塩素計洗浄装置。
1. A residual water sampling device for collecting a sample of effluent from a river discharge culvert, and a residual chlorine meter for measuring and outputting residual chlorine of a sample of effluent water collected by the water sampling device. In a chlorine meter, a measuring tank cleaning device for cleaning the inside of a measuring tank and a measuring electrode provided in the residual chlorine meter, and a sand filter for cleaning the inside of a sand filtering device and sand provided in the residual chlorine meter. A device cleaning device, a water sampling device cleaning device for cleaning a strainer, a water sampling pump and piping of each part provided in the water sampling device, a cleaning water supply device for supplying cleaning water to these cleaning devices, and a cleaning device And a control device for controlling the amount of residual chlorine in the sewage discharge water.
【請求項2】 測定槽洗浄装置は、測定槽の内部に洗浄
水を噴射するノズルを洗浄水供給装置に接続してなり、
砂濾過装置洗浄装置は、砂濾過装置の下部に設けた濾出
口から内部へ洗浄水が噴射するように前記洗浄水ポンプ
を接続してなり、採水装置洗浄手段は、ストレーナと採
水ポンプとの間の配管と、採水ポンプと砂濾過装置の間
の配管であって採水ポンプの直後および砂濾過装置の直
前とに前記洗浄水ポンプを接続し、洗浄水ポンプから各
部への洗浄水配管の途中にそれぞれ電磁弁を設け、これ
らの電磁弁および洗浄水ポンプ、採水ポンプを制御装置
で制御することを特徴とする請求項1記載の下水道放流
水の残留塩素計洗浄装置。
2. A measuring tank cleaning device comprising: a nozzle for injecting cleaning water into a measuring tank connected to a cleaning water supply device;
The sand filtering device washing device is connected to the washing water pump so that washing water is sprayed from a filter outlet provided at a lower portion of the sand filtering device to the inside, and the water sampling device washing means includes a strainer and a water sampling pump. The washing water pump is connected immediately after the sampling pump and immediately before the sand filtration device, and the washing water is supplied from the washing water pump to each part. 2. A residual chlorine meter cleaning apparatus for sewer discharge water according to claim 1, wherein an electromagnetic valve is provided in each of the pipes, and the electromagnetic valve, the washing water pump, and the water sampling pump are controlled by a control device.
【請求項3】 採水ポンプと砂濾過装置の間の配管の洗
浄は、洗浄水を採水ポンプ側から供給して行う正方向洗
浄と、洗浄水を砂濾過装置側から供給して行う逆方向洗
浄を順次行うことを特徴とする請求項2記載の下水道放
流水の残留塩素計洗浄装置。
3. The cleaning of the pipe between the water sampling pump and the sand filtration device is performed in a forward direction in which the cleaning water is supplied from the water sampling pump, and in a reverse direction in which the cleaning water is supplied from the sand filtration device. 3. The apparatus for cleaning a residual chlorine meter in sewer effluent according to claim 2, wherein the directional cleaning is performed sequentially.
【請求項4】 洗浄の開始時に、採水ポンプを急激に停
止させることによるウォータハンマー現象で各部の配管
の内部に付着、滞留した微生物や妨害物質を剥離するこ
とを特徴とする請求項2記載の下水道放流水の残留塩素
計洗浄装置。
4. The method according to claim 2, wherein at the start of the washing, microorganisms and interfering substances adhered and retained inside the piping of each part are removed by a water hammer phenomenon caused by suddenly stopping the water sampling pump. Cleaning device for residual chlorine in sewage discharge water.
【請求項5】 砂濾過装置に洗浄水を供給する配管に洗
浄薬供給装置を接続し、砂濾過装置の洗浄に際に、洗浄
水に洗浄薬を混合することを特徴とする請求項2記載の
下水道放流水の残留塩素計洗浄装置。
5. A cleaning agent supply device is connected to a pipe for supplying cleaning water to the sand filtration device, and a cleaning agent is mixed with the cleaning water when cleaning the sand filtration device. Cleaning device for residual chlorine in sewage discharge water.
JP22686799A 1999-08-10 1999-08-10 Residual chlorine meter cleaning device for sewage effluent Expired - Lifetime JP3435370B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22686799A JP3435370B2 (en) 1999-08-10 1999-08-10 Residual chlorine meter cleaning device for sewage effluent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22686799A JP3435370B2 (en) 1999-08-10 1999-08-10 Residual chlorine meter cleaning device for sewage effluent

Publications (2)

Publication Number Publication Date
JP2001050927A true JP2001050927A (en) 2001-02-23
JP3435370B2 JP3435370B2 (en) 2003-08-11

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Country Link
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KR101403671B1 (en) 2014-03-11 2014-06-05 (주)에코베이스 Maintenance managing apparatus and method of system for sewage water sampling
CN109738011A (en) * 2018-12-29 2019-05-10 中国科学院南京地理与湖泊研究所 A kind of river and lake connection river cyanobacteria emission flux automatic monitoring system
JP2020160011A (en) * 2019-03-28 2020-10-01 浜松ホトニクス株式会社 Sample measuring device
JP6770216B1 (en) * 2019-09-18 2020-10-14 中国電力株式会社 Residual chlorine automatic analyzer
CN114646743A (en) * 2022-03-17 2022-06-21 重庆昕晟环保科技有限公司 Test device for removing residual chlorine from secondary water supply terminal filter element

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101246564B1 (en) 2011-10-12 2013-03-25 (주) 테크로스 Total residual oxidant measuring devices
KR101403671B1 (en) 2014-03-11 2014-06-05 (주)에코베이스 Maintenance managing apparatus and method of system for sewage water sampling
CN109738011A (en) * 2018-12-29 2019-05-10 中国科学院南京地理与湖泊研究所 A kind of river and lake connection river cyanobacteria emission flux automatic monitoring system
JP2020160011A (en) * 2019-03-28 2020-10-01 浜松ホトニクス株式会社 Sample measuring device
JP7281320B2 (en) 2019-03-28 2023-05-25 浜松ホトニクス株式会社 Sample measuring device
JP6770216B1 (en) * 2019-09-18 2020-10-14 中国電力株式会社 Residual chlorine automatic analyzer
WO2021053752A1 (en) * 2019-09-18 2021-03-25 中国電力株式会社 Residual chlorine automatic analyzer
CN114646743A (en) * 2022-03-17 2022-06-21 重庆昕晟环保科技有限公司 Test device for removing residual chlorine from secondary water supply terminal filter element

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