JP2011200941A - Polishing tool, device and method of polishing using the same - Google Patents

Polishing tool, device and method of polishing using the same Download PDF

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JP2011200941A
JP2011200941A JP2010067969A JP2010067969A JP2011200941A JP 2011200941 A JP2011200941 A JP 2011200941A JP 2010067969 A JP2010067969 A JP 2010067969A JP 2010067969 A JP2010067969 A JP 2010067969A JP 2011200941 A JP2011200941 A JP 2011200941A
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polishing
recess
main body
communication
communication path
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Kenei Narahara
賢英 楢原
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Kyocera Corp
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Kyocera Corp
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Abstract

PROBLEM TO BE SOLVED: To evenly polish a surface of an article to be polished with respect to a polishing tool, a device and method of polishing using the same.SOLUTION: The polishing tool 1 includes a body 2 for polishing a face of the article T to be polished. The body 2 includes a recess 8, and a plurality of communication passages 10 that communicate the inner part with the outer part of the recess 8. One ends of a plurality of the communication passages 10 are communicated with the inner part of the recess 8, and the other ends are positioned outer than the one ends in the body 2 in a plan perspective view.

Description

本発明は、研磨用治具およびそれを用いた研磨装置並びに研磨方法に関する。   The present invention relates to a polishing jig, a polishing apparatus using the same, and a polishing method.

金属製品およびセラミック製品の製造過程では、表面の平坦化および鏡面化のために研磨加工が行われる。この研磨加工では、例えば、砥石と研磨対象物との間に研磨用の砥粒と液体とを有するスラリーを供給し、砥石を回転させて、研磨対象物の表面(以下、「被研磨面」ともいう。)を研磨する(例えば、特許文献1参照)。上記スラリーは、通常、砥石と被研磨面との間に供給され、外部に排出されることにより、被研磨面上を移動している。   In the manufacturing process of metal products and ceramic products, polishing is performed to flatten and mirror the surface. In this polishing process, for example, a slurry having abrasive grains and liquid for polishing is supplied between a grindstone and an object to be polished, and the surface of the object to be polished (hereinafter, “surface to be polished”) is rotated by rotating the grindstone. (Refer also to Patent Document 1). The slurry is usually supplied between the grindstone and the surface to be polished, and is discharged to the outside, thereby moving on the surface to be polished.

特開2007−222960号公報JP 2007-222960 A

しかしながら、研磨対象物が、例えば凹形状を有しており、その凹形状の内部の底面を研磨する場合、スラリーを凹形状の外部に排出することが困難であるために、被研磨面上でスラリーが滞留してしまう。特に、被研磨面に砥石の凹部を対向させて研磨を行う場合、その凹部にスラリーが滞留してしまい、凹部内でスラリー中の砥粒が沈降して被研磨面に不均一に堆積し、その結果、被研磨面を均一に研磨することができないといった問題が生じる。   However, the polishing object has, for example, a concave shape, and when polishing the bottom surface inside the concave shape, it is difficult to discharge the slurry to the outside of the concave shape. The slurry will stay. In particular, when polishing with the grindstone recess facing the surface to be polished, the slurry stays in the recess, and the abrasive grains in the slurry settle in the recess and deposit unevenly on the surface to be polished, As a result, there arises a problem that the surface to be polished cannot be uniformly polished.

従って、対象物の表面をより均一に研磨することができる研磨用治具、それを用いた研磨装置並びに研磨方法が求められている。   Accordingly, there is a need for a polishing jig that can polish the surface of an object more uniformly, a polishing apparatus using the same, and a polishing method.

本発明の一態様に係る研磨用治具は、対象物の表面を研磨する本体を有し、前記本体は、凹部と、該凹部の内部と外部とを連通する複数の連通路とを有し、該複数の連通路は、一端が前記凹部の内部に通じ、前記本体を平面透視したときに、他端が前記一端よりも外側に位置している。   A polishing jig according to an aspect of the present invention includes a main body that polishes the surface of an object, and the main body includes a recess and a plurality of communication passages that connect the inside and the outside of the recess. The plurality of communication paths have one end communicating with the inside of the recess and the other end positioned outside the one end when the main body is seen through the plane.

本発明の一態様に係る研磨装置は、前記研磨用治具と、前記対象物を支持する支持部と、前記対象物の前記表面上に研磨用流体を供給する供給部とを有する。   A polishing apparatus according to an aspect of the present invention includes the polishing jig, a support unit that supports the object, and a supply unit that supplies a polishing fluid onto the surface of the object.

本発明の一態様に係る研磨方法は、対象物の表面を研磨する本体を有し、該本体は、凹部と、該凹部の内部と外部とを連通する複数の連通路とを有し、該複数の連通路は、一端が前記凹部の内部に通じ、前記本体を平面透視したときに、他端が前記一端よりも外側に位置している研磨用治具を用いた研磨方法であって、前記対象物の前記表面上に前記本体を設置する工程と、前記対象物の前記表面上に研磨用流体を供給する工程と、前記研磨用流体を前記複数の連通路を介して前記凹部内に流入および前記凹部内から流出させながら、前記本体を回転させる工程とを有する。   A polishing method according to an aspect of the present invention includes a main body that polishes the surface of an object, the main body includes a recess, and a plurality of communication paths that connect the inside and the outside of the recess, The plurality of communication passages is a polishing method using a polishing jig in which one end communicates with the inside of the recess and the other end is positioned outside the one end when the main body is seen through a plane. Installing the main body on the surface of the object; supplying a polishing fluid onto the surface of the object; and passing the polishing fluid into the recess through the plurality of communication passages. And rotating the main body while flowing in and out of the recess.

本発明の一態様による研磨用治具によれば、対象物の表面をより均一に研磨することができる。   According to the polishing jig according to one aspect of the present invention, the surface of the object can be polished more uniformly.

本発明の一態様による研磨装置によれば、対象物の表面をより均一に研磨することができる。   According to the polishing apparatus according to one aspect of the present invention, the surface of an object can be more uniformly polished.

本発明の一態様による研磨方法によれば、対象物の表面をより均一に研磨することができる。   According to the polishing method of one embodiment of the present invention, the surface of the object can be polished more uniformly.

(a)は本発明の一実施形態に係る研磨用治具の斜視図であり、(b)は(a)に示す研磨用治具を用いた研磨装置を示す斜視図である。(A) is a perspective view of the grinding | polishing jig | tool which concerns on one Embodiment of this invention, (b) is a perspective view which shows the grinding | polishing apparatus using the grinding | polishing jig | tool shown to (a). (a)は研磨装置の断面図であり、(b)は(a)の一部を拡大した拡大断面図である。(A) is sectional drawing of a grinding | polishing apparatus, (b) is the expanded sectional view which expanded a part of (a). 研磨用表面を正面として図1の本体を平面透視したときの平面透視図である。FIG. 2 is a plan perspective view of the main body of FIG. (a),(c)は本発明の一実施形態に係る研磨用治具を用いて対象物を研磨している状態を模式的に示した部分拡大断面図であり、(b),(d)はそれぞれ(a),(c)に示す研磨用治具を研磨用表面を正面として平面透視したときの構成をその回転方向と共に示す平面透視図である。(A), (c) is the elements on larger scale which showed typically the state where the object is ground using the polish jig concerning one embodiment of the present invention, and (b), (d) (A), (c) is a plane perspective view showing the configuration of the polishing jig shown in (a), (c) when the polishing surface is viewed in plan with the rotation direction. (a),(b)は、対象物上を移動する研磨用治具の軌跡の一例を示した平面図である。(A), (b) is the top view which showed an example of the locus | trajectory of the grinding | polishing jig | tool which moves on a target object. (a),(b)は、研磨用表面表面を正面として本体を平面透視したときのバリエーションを示す平面透視図である。(A), (b) is a plane perspective view which shows the variation when the main body is planarly seen with the surface for polishing as the front. (a)〜(e)は、連通路の形態を説明するための本体の断面図である。(A)-(e) is sectional drawing of the main body for demonstrating the form of a communicating path.

以下、図面を参照して、本発明の実施の形態について説明する。   Embodiments of the present invention will be described below with reference to the drawings.

本発明の一実施形態に係る研磨用治具について説明する。図1および図2に示すように、本実施形態による研磨用治具1は、対象物Tの表面を研磨する本体2を有する。本体2は、対象物Tの被研磨面Tsに対向して、被研磨面Tsの研磨に作用する表面(以下、「研磨用表面」ともいう。)4を有する。本体2は、回転軸3によって回転駆動力が伝えられ、回転軸3とともに回転する。ここでは、対象物Tが凹形状の容器体であり、その凹形状の内部の底面が被研磨面Tsであるとする。また、対象物Tは、支持台6に固定されている。   A polishing jig according to an embodiment of the present invention will be described. As shown in FIGS. 1 and 2, the polishing jig 1 according to the present embodiment has a main body 2 that polishes the surface of an object T. The main body 2 has a surface (hereinafter, also referred to as “polishing surface”) 4 that acts on the polishing of the surface to be polished Ts, facing the surface to be polished Ts of the object T. The main body 2 is transmitted with the rotational driving force by the rotating shaft 3 and rotates together with the rotating shaft 3. Here, it is assumed that the object T is a concave container body, and the bottom surface inside the concave shape is the surface to be polished Ts. In addition, the object T is fixed to the support base 6.

なお、研磨装置は、研磨用治具1と対象物Tを支持する支持台6と、対象物Tの被研磨面Ts上に研磨用流体を供給する供給部Spと、回転軸3に回転駆動力を伝える駆動力伝達部Rtとを有する。ここで、供給部Spおよび駆動力伝達部Rtは、図2(a)にのみ示し、その他の図では省略している。   The polishing apparatus is rotationally driven by the rotating shaft 3 and the support base 6 that supports the polishing jig 1 and the object T, the supply unit Sp that supplies the polishing fluid onto the surface Ts of the object T to be polished. And a driving force transmission portion Rt for transmitting force. Here, the supply part Sp and the driving force transmission part Rt are shown only in FIG. 2A and are omitted in the other figures.

図2に示すように、本体2は、凹部8と、凹部8と外部とを連通する複数の連通路10とを有する。これらの連通路10は、一端が凹部8の内部に通じ、本体2を平面透視したときに、他端が上記一端よりも外側に位置している。好ましくは、図2に示すように、連通路10全体が凹部8の側方に設けられている。複数の連通路10は、具体的に、本体2の研磨用表面4に設けられた複数の溝10a(10a〜10a)と、本体2に設けられた複数の貫通孔10b(10b〜10b)とを有する。複数の溝10aは、研磨用表面4に設けられた凹部8の開口8aに通じ、複数の貫通孔10bは、凹部8と外部との間で本体2を貫通する。複数の溝10aは、研磨用表面4に垂直な方向において互いに同じ位置にある。複数の貫通孔10bは、研磨用表面4に垂直な方向において互いに同じ位置にあり、かつ複数の溝10aとは異なる位置にある。ここでは、複数の貫通孔10bは
、研磨用表面4に平行であって、複数の溝10aが形成された面(ここでは、研磨用表面4)とは異なる面に沿って形成されている。なお、本明細書では、各溝10a〜10aを区別しないときは、「溝10a」と表記し、各貫通孔10b〜10bを区別しないときは、「貫通孔10b」と表記する。
As shown in FIG. 2, the main body 2 includes a recess 8 and a plurality of communication passages 10 that connect the recess 8 and the outside. One end of each communication passage 10 communicates with the inside of the recess 8, and the other end is located outside the one end when the main body 2 is seen through the plane. Preferably, as shown in FIG. 2, the entire communication path 10 is provided on the side of the recess 8. Specifically, the plurality of communication passages 10 include a plurality of grooves 10 a (10 a 1 to 10 a 6 ) provided in the polishing surface 4 of the main body 2 and a plurality of through holes 10 b (10 b 1 to 10 b provided in the main body 2. 10b 6 ). The plurality of grooves 10a lead to the openings 8a of the recesses 8 provided in the polishing surface 4, and the plurality of through holes 10b penetrate the main body 2 between the recesses 8 and the outside. The plurality of grooves 10 a are at the same position in the direction perpendicular to the polishing surface 4. The plurality of through holes 10b are at the same position in the direction perpendicular to the polishing surface 4, and are at positions different from the plurality of grooves 10a. Here, the plurality of through holes 10b are formed along a plane that is parallel to the polishing surface 4 and that is different from the surface on which the plurality of grooves 10a are formed (here, the polishing surface 4). In this specification, when not distinguished each groove 10a 1 10 A 6, referred to as "grooves 10a ', when not distinguished from each other through-holes 10b 1 ~10b 6, referred to as" through-hole 10b " .

次に、これらの連通路10について詳細に説明する。図3に示すように、複数の溝10aは、研磨用表面4を正面として本体2を平面視したときに、外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っている。また、複数の貫通孔10bは、研磨用表面4を正面として本体2を平面透視したときに、外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っている。   Next, these communication paths 10 will be described in detail. As shown in FIG. 3, the plurality of grooves 10 a are arranged along the outer circumferential direction when the main body 2 is viewed in plan with the polishing surface 4 as a front surface, and from the recess side end to the external side end. The direction of the inclination is aligned. The plurality of through-holes 10b are arranged along the outer peripheral direction when the main body 2 is seen through a plane with the polishing surface 4 as a front surface, and the direction of inclination from the recess side end to the external side end is It's all there.

また、研磨用表面4を正面として本体2を平面透視したとき、溝10am(mは1〜6の整数)および貫通孔10bm(mは1〜6の整数)は、凹部側端部から外部側端部に向けて、凹部8から放射状に広がる仮想直線のうち対応する仮想直線Amに関してそれぞれ傾くように設けられている。また、溝10amおよび貫通孔10bmの傾く向きは、上記仮想直線Amに対して互いに逆向きである。ここでは、溝10amおよび貫通孔10bmは、その外部側端部が仮想直線Amを挟んで仮想直線Amの両側にあり、溝10amおよび貫通孔10bmと仮想直線Amとが交わる部位から外部側端部に向けて、溝10amおよび貫通孔10bmと仮想直線Amとの間の距離が大きくなっている。   Further, when the main body 2 is seen in a plan view with the polishing surface 4 as a front surface, the groove 10am (m is an integer of 1 to 6) and the through hole 10bm (m is an integer of 1 to 6) are provided on the outer side from the recess side end. It is provided so as to be inclined with respect to the corresponding virtual straight line Am among the virtual straight lines that radiate from the recess 8 toward the end. Further, the inclination directions of the groove 10am and the through hole 10bm are opposite to each other with respect to the virtual straight line Am. Here, the groove 10am and the through hole 10bm have outer end portions on both sides of the virtual straight line Am across the virtual straight line Am, and the outer side end portion from the portion where the groove 10am and the through hole 10bm intersect the virtual straight line Am. The distance between the groove 10am and the through hole 10bm and the imaginary straight line Am is increased.

また、溝10amおよび貫通孔10bmは、上記仮想直線Amに関して線対称に位置することが好ましい。例えば、図3に示すように、溝10a1および貫通孔10b1は、点線で示す仮想の直線A1に関して線対称に位置している。溝10aと貫通孔10bを、このように仮想の直線を挟んで両側に対称に位置させることによって、研磨用流体Fが凹部8に流入、および凹部8から流出するときの流量の時間的な変動を抑制することができる。このため、研磨用治具30が回転しながら移動しても、研磨用流体Fの凹部8内への流入量および凹部8からの流出量がそれぞれ一定となる。すなわち、流入する度に流入量が変化したり、流出する度に流出量が変化したりといった経時変化が抑制され、その結果、被研磨面Tsをより均一に研磨することができる。   Moreover, it is preferable that the groove | channel 10am and the through-hole 10bm are located in line symmetry with respect to the said virtual straight line Am. For example, as shown in FIG. 3, the groove 10a1 and the through hole 10b1 are positioned symmetrically with respect to a virtual straight line A1 indicated by a dotted line. By locating the groove 10a and the through-hole 10b symmetrically on both sides of the virtual straight line in this way, the temporal variation of the flow rate when the polishing fluid F flows into and out of the recess 8 Can be suppressed. For this reason, even if the polishing jig 30 moves while rotating, the inflow amount of the polishing fluid F into the concave portion 8 and the outflow amount from the concave portion 8 are constant. That is, changes over time such as the inflow amount changing each time it flows in and the outflow amount changing every time it flows out are suppressed, and as a result, the surface to be polished Ts can be polished more uniformly.

さらに、溝10aおよび貫通孔10bの形状が全て同じであり、溝10aの数および貫通孔10bの数が同じであれば、研磨用流体Fの流入および流出が同一条件でおこなわれるために、研磨用流体Fの凹部8に対する流入量および流出量の時間的な変化がより抑制され、被研磨面Tsをより均一に研磨することができる。しかし、研磨方法や研磨用流体Fの種類によって研磨用流体Fの凹部8内への溜まりやすさ、および凹部8からの排出されやすさが異なる場合には、溝10aおよび貫通孔10bの形状および本数の少なくとも1つを敢えて異ならせることにより、研磨用流体Fの流入量および流出量を異ならせることも可能である。   Furthermore, if the shapes of the grooves 10a and the through holes 10b are all the same, and the number of the grooves 10a and the number of the through holes 10b are the same, the inflow and the outflow of the polishing fluid F are performed under the same conditions. The temporal change of the inflow amount and the outflow amount of the working fluid F with respect to the concave portion 8 is further suppressed, and the surface to be polished Ts can be polished more uniformly. However, when the easiness of accumulation of the polishing fluid F in the recess 8 and the easiness of discharge from the recess 8 differ depending on the polishing method and the type of the polishing fluid F, the shape of the groove 10a and the through hole 10b and It is also possible to vary the inflow amount and the outflow amount of the polishing fluid F by varying at least one of the numbers.

また、研磨用表面4が円形であるとき、上記仮想直線Amは、円の接線に垂直な直線とみなして、溝10amおよび貫通孔10bmを配置することができる。   When the polishing surface 4 is circular, the virtual straight line Am can be regarded as a straight line perpendicular to the tangent of the circle, and the groove 10am and the through hole 10bm can be disposed.

次に、研磨用治具1を用いて対象物Tを研磨する場合の研磨用治具1の使用方法を説明する。対象物Tの凹形状の内部には、研磨用流体Fが供給される。そして、研磨用治具1の本体2は、回転軸3によって回転される。図4に示すように、研磨用治具1の本体2がD1方向に回転すると、溝10aの外部側端部から凹部側端部への向きが回転方向に沿うものとなるため、研磨用流体Fが溝10aを通ってf1方向に凹部8へ流入する。そして、凹部8へ流入した研磨用流体Fは、貫通孔10bを通って外部へ排出される。このとき、貫通孔10bの外部側端部から凹部側端部への向きは、回転方向D1に反するものとなるため、貫通孔10bから研磨用流体Fが流入することが抑制される。   Next, a method of using the polishing jig 1 when the object T is polished using the polishing jig 1 will be described. A polishing fluid F is supplied into the concave shape of the object T. The main body 2 of the polishing jig 1 is rotated by the rotating shaft 3. As shown in FIG. 4, when the main body 2 of the polishing jig 1 rotates in the D1 direction, the direction from the outer end of the groove 10a to the end of the recess is along the rotation direction. F flows into the recess 8 in the f1 direction through the groove 10a. Then, the polishing fluid F flowing into the recess 8 is discharged to the outside through the through hole 10b. At this time, since the direction from the outer end of the through hole 10b to the end of the recess is opposite to the rotation direction D1, the inflow of the polishing fluid F from the through hole 10b is suppressed.

一方、本体2が上記D1方向と反対方向であるD2方向に回転すると、貫通孔10bの外部側端部から凹部側端部への向きが回転方向に沿うものとなるため、研磨用流体Fが貫通孔10bからf1方向に凹部8へ流入する。そして、凹部8へ流入した研磨用流体Fは、溝10aからf2方向に外部へ流出する。このとき、溝10aの外部側端部から凹部側端部への向きは、回転方向D2に反するものとなるため、溝10aから研磨用流体Fが流入することが抑制される。   On the other hand, when the main body 2 rotates in the direction D2, which is opposite to the direction D1, the direction from the outer end of the through hole 10b to the end of the recess is along the rotation direction. It flows into the concave portion 8 in the f1 direction from the through hole 10b. Then, the polishing fluid F that has flowed into the recess 8 flows out of the groove 10a in the f2 direction. At this time, since the direction from the outer end of the groove 10a to the end of the recess is opposite to the rotational direction D2, the inflow of the polishing fluid F from the groove 10a is suppressed.

このように、本体2に連通路10を設け、その連通路10の一端が凹部8の内部に通じ、本体2を平面透視したときに、他端が上記一端よりも外側に位置している場合には、本体2を回転させた場合に、その連通孔10を介して研磨用流体Fが凹部8内に強制的に流入し、さらに凹部8内から流出するので、研磨用流体Fが凹部8と外部との間で循環し、研磨用治具1の研磨用表面4と対象物Tの被研磨面Tsとの間に研磨用流体Fが滞留することを抑制することができる。   As described above, when the communication path 10 is provided in the main body 2, one end of the communication path 10 communicates with the inside of the recess 8, and the other end is positioned outside the one end when the main body 2 is seen through the plane. When the main body 2 is rotated, the polishing fluid F is forced to flow into the recess 8 through the communication hole 10 and further flows out of the recess 8. It is possible to prevent the polishing fluid F from staying between the polishing surface 4 of the polishing jig 1 and the surface to be polished Ts of the object T.

また、本体2を平面透視したときに、研磨用流体の凹部8内への流入又は凹部8外への流出といった同じ機能を有する複数の連通孔10が、外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っている場合は、その流入又は流出がよりスムーズに行われることから、凹部8内と外部との流通がよりスムーズに行われる。よって、被研磨面上において研磨用流体が滞留することが抑制され、被研磨面をより均一に研磨することができる。なお、研磨用流体の凹部8からの排出に用いられる複数の連通孔10について、それらが外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っていると、凹部8内に研磨用流体が滞留することが抑制され、より好ましい。   Further, when the main body 2 is seen through the plane, a plurality of communication holes 10 having the same function of inflow of the polishing fluid into the recess 8 or out of the recess 8 are arranged along the outer peripheral direction, When the direction of inclination from the recess side end portion to the outer side end portion is aligned, the inflow or outflow is performed more smoothly, and therefore the circulation between the recess 8 and the outside is performed more smoothly. Therefore, the polishing fluid is prevented from staying on the surface to be polished, and the surface to be polished can be more uniformly polished. In addition, about the some communicating hole 10 used for discharge | emission from the recessed part 8 of polishing fluid, while they are arranged along an outer peripheral direction, the direction of the inclination from a recessed part side edge part to an external side edge part has gathered. It is more preferable that the polishing fluid stays in the recess 8.

上述の研磨用部材1を用いた研磨方法は、対象物Tの被研磨面Ts上に本体2を設置する工程と、対象物Tの被研磨面Ts上に研磨用流体Fを供給する工程と、研磨用流体Fを複数の連通路10を介して凹部8に流入および凹部8から流出させながら、本体2を回転させる工程とを有している。   The polishing method using the polishing member 1 described above includes a step of installing the main body 2 on the surface to be polished Ts of the object T, and a step of supplying the polishing fluid F onto the surface to be polished Ts of the object T. And a step of rotating the main body 2 while allowing the polishing fluid F to flow into and out of the recess 8 through the plurality of communication passages 10.

研磨用流体Fには、砥粒Gが分散している。研磨用治具1の研磨用表面4と、対象物Tの被研磨面Tsは、研磨用流体Fを介して摺動し、被研磨面Tsが研磨される。本体2は、回転軸3とともに回転すると共に、研磨用表面の中心の軌跡22が例えば、図5(a)、(b)に示すように、被研磨面Ts上を移動する。   In the polishing fluid F, abrasive grains G are dispersed. The polishing surface 4 of the polishing jig 1 and the polished surface Ts of the object T slide through the polishing fluid F, and the polished surface Ts is polished. The main body 2 rotates together with the rotating shaft 3 and the locus 22 of the center of the polishing surface moves on the surface to be polished Ts as shown in FIGS. 5 (a) and 5 (b), for example.

図5(a)では、研磨用治具1の本体2の回転中心は、始点22aから螺旋状の軌跡22を描きながら終点22bへ移動する。このとき、研磨用表面4の摺動始端部位は24a、摺動終端部位は24bの位置である。   In FIG. 5A, the rotation center of the main body 2 of the polishing jig 1 moves from the start point 22a to the end point 22b while drawing a spiral trajectory 22. At this time, the sliding start end portion of the polishing surface 4 is at a position 24a, and the sliding end portion is at a position 24b.

図5(b)では、本体2の回転中心は、始点22aから終点22bまで屈曲しながら移動する。このとき、このとき、研磨用表面4の摺動始端部位は24a、摺動終端部位は24bの位置である。   In FIG. 5B, the rotation center of the main body 2 moves while bending from the start point 22a to the end point 22b. At this time, the sliding start end portion of the polishing surface 4 is at a position 24a and the sliding end portion is at a position 24b.

本実施の形態による研磨用治具1によれば、研磨を行う際に、研磨用治具1の研磨用表面4と対象物Tの被研磨面Tsとの間に研磨用流体Fが滞留することを抑制することができる。よって、研磨用流体F中の砥粒Gが沈降して被研磨面に不均一に堆積するといったことを抑制することができる。従って、砥粒Gが枯渇せず、砥粒Gが滞留することも抑制され、砥粒Gが被研磨面Ts上により均一に広がるために、被研磨面Ts全体をより均一に研磨することができる。ここで、均一に研磨するとは、被研磨面Tsの凹凸ができるだけ無くなるように研磨し、被研磨面Tsの平坦度の値を小さくすることを意味する。   According to the polishing jig 1 according to the present embodiment, the polishing fluid F stays between the polishing surface 4 of the polishing jig 1 and the surface to be polished Ts of the object T when polishing. This can be suppressed. Therefore, it is possible to suppress the abrasive grains G in the polishing fluid F from being settled and depositing unevenly on the surface to be polished. Accordingly, the abrasive grains G are not depleted and the abrasive grains G are also prevented from staying, and the abrasive grains G spread more uniformly on the surface to be polished Ts, so that the entire surface to be polished Ts can be more uniformly polished. it can. Here, uniform polishing means polishing so that the unevenness of the surface to be polished Ts is eliminated as much as possible, and reducing the flatness value of the surface to be polished Ts.

なお、図3においては、対応する溝10aおよび貫通孔10bが、本体2を平面透視したとき交わるように設けられているが、離間するように設けられていてもよい。この場合、溝10amおよび貫通孔10bmのそれぞれは、凹部側端部(仮想直線Amに最も近い部位)から外部側端部に向けて、仮想直線Amとの距離が大きくなるように延在する。   In FIG. 3, the corresponding grooves 10a and through-holes 10b are provided so as to intersect when the main body 2 is seen through the plane, but may be provided so as to be separated from each other. In this case, each of the groove 10am and the through hole 10bm extends from the recess side end portion (the portion closest to the virtual straight line Am) toward the external end portion so that the distance from the virtual straight line Am increases.

また、溝10aおよび貫通孔10bは、形状が全て同一である必要はなく、一部が異なっていてもよい。さらに、溝10aの数および貫通孔10bの数は、同じである必要はなく、異なっていてもよい。ただし、溝10aおよび貫通孔10bの形状が全て同じであり、溝10aの数および貫通孔10bの数が同じであれば、研磨用流体Fの流入および流出が同一条件でおこなわれるために、研磨用流体Fの対流がスムーズとなり、被研磨面Tsをより均一に研磨することができる。   Further, the grooves 10a and the through-holes 10b are not necessarily the same in shape, and may be partially different. Furthermore, the number of the grooves 10a and the number of the through holes 10b are not necessarily the same, and may be different. However, if the shapes of the grooves 10a and the through holes 10b are all the same, and the number of the grooves 10a and the number of the through holes 10b are the same, the inflow and the outflow of the polishing fluid F are performed under the same conditions. The convection of the working fluid F becomes smooth, and the surface to be polished Ts can be polished more uniformly.

図6(a),(b)は、研磨用表面4を正面として本体2を平面透視したときのバリエーションを示す平面透視図である。これらの場合も、研磨用表面4を正面として本体2を平面透視したとき、溝10aおよび貫通孔10bは、凹部側端部から外部側端部に向けて、凹部8から放射状に広がる仮想直線のうち対応する仮想直線Amに関してそれぞれ傾くように設けられている。   6A and 6B are plan perspective views showing variations when the main body 2 is seen through the plane with the polishing surface 4 as the front. Also in these cases, when the main body 2 is seen in a plan view with the polishing surface 4 as the front surface, the groove 10a and the through hole 10b are virtual straight lines that radially extend from the recess 8 toward the external end. Of these, they are provided so as to be inclined with respect to the corresponding virtual straight line Am.

図6(a)は、溝10aおよび貫通孔10bが螺旋状に形成された研磨用表面4を示している。このように、研磨用表面4に形成される溝10aおよび貫通孔10bは、直線状のみならず曲線であってもよい。   FIG. 6A shows the polishing surface 4 in which the grooves 10a and the through holes 10b are formed in a spiral shape. Thus, the groove 10a and the through hole 10b formed in the polishing surface 4 may be not only linear but also curved.

図6(b)は、研磨用表面4が円形状ではなく、多角形状からなる場合を示している。このように研磨用表面4の形状は、円形状に限られず、多角形状等の種々の形状を選択することができる。   FIG. 6B shows a case where the polishing surface 4 has a polygonal shape instead of a circular shape. Thus, the shape of the polishing surface 4 is not limited to a circular shape, and various shapes such as a polygonal shape can be selected.

また、連通路10は、一端が凹部8の内部に通じ、本体2を平面透視したときに、他端が上記一端よりも外側に位置していればよく、種々の形態を取り得る。この構成によれば、遠心力によって凹部8から研磨用流体Fが流出する。また、研磨用流体Fの凹部8への
流入も起こる。
The communication path 10 may have various forms as long as one end communicates with the inside of the recess 8 and the other end is positioned outside the one end when the main body 2 is seen through the plane. According to this configuration, the polishing fluid F flows out of the recess 8 due to centrifugal force. In addition, the polishing fluid F also flows into the recess 8.

図7は、連通路10の形態を説明するための本体2の断面図である。図7では、図示を簡略化するために、連通路10を太線で示している。図7(a)〜(e)において、連通
路10は、一端25aが凹部8の内部に通じ、矢印Kの方向に本体2を平面透視したとき
に、他端25bが上記一端25aよりも外側に位置している。この構成であれば、一端2
5aは、凹部8の内面のいずれの位置に存在していてもよく、他端25aは、本体2の外表面のいずれの位置に存在してもよい。例えば、(a)では、連通路10の一端25aが凹部8の側面に位置し、他端25bが本体2の側面に位置している。また、この構成では、連通路10が一端25aから他端25bに向けて傾斜している。(b)では、連通路10
の一端25aが凹部8の側面に位置し、他端25bが研磨用表面4に対向する本体2の上面に位置している。(c)では、連通路10の一端25aが凹部8の底面に位置し、他端
25bが本体2の側面に位置している。(d)では、連通路10の一端25aが凹部8の
底面に位置し、他端25bが本体2の上面に位置している。(e)では、連通路10の一
端25aが凹部8の底面に位置し、他端25bが研磨用表面4の側面に位置している。
FIG. 7 is a cross-sectional view of the main body 2 for explaining the form of the communication passage 10. In FIG. 7, the communication path 10 is indicated by a thick line for the sake of simplicity. 7A to 7E, the communication path 10 has one end 25a communicating with the inside of the recess 8, and the other end 25b is located outside the one end 25a when the main body 2 is seen through the plane in the direction of arrow K. Is located. With this configuration, one end 2
5 a may be present at any position on the inner surface of the recess 8, and the other end 25 a may be present at any position on the outer surface of the main body 2. For example, in (a), one end 25 a of the communication path 10 is located on the side surface of the recess 8, and the other end 25 b is located on the side surface of the main body 2. Moreover, in this structure, the communicating path 10 inclines toward the other end 25b from the one end 25a. In (b), the communication path 10
One end 25 a is located on the side surface of the recess 8, and the other end 25 b is located on the upper surface of the main body 2 facing the polishing surface 4. In (c), one end 25 a of the communication path 10 is located on the bottom surface of the recess 8, and the other end 25 b is located on the side surface of the main body 2. In (d), one end 25 a of the communication path 10 is located on the bottom surface of the recess 8, and the other end 25 b is located on the top surface of the main body 2. In (e), one end 25 a of the communication path 10 is located on the bottom surface of the recess 8, and the other end 25 b is located on the side surface of the polishing surface 4.

これらの図7(a)〜(e)に示した連通路10は、研磨用流体Fの凹部8内への流入
用および研磨用流体Fの凹部8からの排出用のいずれにも使用可能である。従って、研磨用流体Fの凹部8内への流入用連通路および研磨用流体Fの凹部8からの排出用連通路として、図7(a)〜図7(e)をどのように組み合わせてもよい。しかし、研磨用流体F
のスムーズな移動のためには、例えば、図7(a),(d),(e)のように、連通路10は、角部をもたず、直線状若しくは曲線状であることが好ましい。さらに、連通路10は、図2に示すように、一端25aから他端25bにかけて、研磨用表面4に平行な面に沿って延在することが好ましい。また、図7(b),(d)については、他端25bが本体2の上面に位置しているため、これを流入用連通路として用いるためには、研磨用流体Fの液面が、本体2の上面より上に位置していることが必要である。
These communication paths 10 shown in FIGS. 7A to 7E can be used both for inflow of the polishing fluid F into the recess 8 and for discharging the polishing fluid F from the recess 8. is there. Therefore, any combination of FIG. 7A to FIG. 7E can be used as the communication path for inflow of the polishing fluid F into the recess 8 and the communication path for discharge of the polishing fluid F from the recess 8. Good. However, polishing fluid F
For the smooth movement, for example, as shown in FIGS. 7A, 7 </ b> D, and 7 </ b> E, the communication path 10 does not have a corner and is preferably linear or curved. . Further, as shown in FIG. 2, the communication path 10 preferably extends from one end 25 a to the other end 25 b along a plane parallel to the polishing surface 4. 7B and 7D, since the other end 25b is located on the upper surface of the main body 2, in order to use this as the inflow communication path, the level of the polishing fluid F is: It is necessary to be located above the upper surface of the main body 2.

また、連通路10は、その一部が研磨用表面4の溝であってもよい。例えば、図7(b)における連通路10の一部26aが研磨用表面4に設けられてもよい。   Further, a part of the communication path 10 may be a groove of the polishing surface 4. For example, a part 26 a of the communication path 10 in FIG. 7B may be provided on the polishing surface 4.

なお、図2および図7(a)の構成は、平面透視したときに、連通路10の一端25aが、凹部8の側面、すなわち凹部8の内周面に位置し、連通路10の他端25bが、本体2の外表面に位置している。また、図2および図7(a)において、連通路10は、本体2を貫通している。   2 and FIG. 7A, the one end 25a of the communication path 10 is located on the side surface of the recess 8, that is, the inner peripheral surface of the recess 8, and the other end of the communication path 10 when viewed in plan. 25 b is located on the outer surface of the main body 2. 2 and 7A, the communication path 10 passes through the main body 2.

また、図7に示した上述の連通路10についても、平面透視したときに、外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っていることが好ましい。   In addition, the above-described communication path 10 shown in FIG. 7 is also arranged along the outer peripheral direction when seen in a plan view, and the direction of inclination from the concave side end to the external side end is aligned. Is preferred.

なお、上述の説明では、溝10aが形成された面と貫通孔10bが形成された面とを平行にしたが、必ずしも平行である必要はない。また、複数の溝10aを必ずしも同一平面上に設ける必要はなく、複数の貫通孔10bも必ずしも同一平面上に設ける必要はない。しかし、複数の溝10aおよび複数の貫通孔10bの少なくとも一方を同一平面上に形成すると、凹部8内を移動する研磨用流体Fの乱流が抑制されるため、被研磨面Tsと研磨用表面4との間に介在する砥粒Gの量が、研磨に悪影響を及ぼさない程度に常に一定となり、経時変化しにくい。このため、被研磨面Ts全体がより均一に研磨される。さらには、複数の溝10aおよび複数の貫通孔10bをそれぞれ同一平面上に形成するとともに、複数の溝10aが形成された面と複数の貫通孔10bが形成された面とを平行にすると、被研磨面Tsと研磨用表面4との間に介在する砥粒Gの量がさらに経時変化しにくくなり、被研磨面Ts全体がより均一に研磨される。   In the above description, the surface on which the groove 10a is formed and the surface on which the through hole 10b is formed are made parallel, but they are not necessarily parallel. Further, the plurality of grooves 10a are not necessarily provided on the same plane, and the plurality of through holes 10b are not necessarily provided on the same plane. However, if at least one of the plurality of grooves 10a and the plurality of through-holes 10b is formed on the same plane, the turbulent flow of the polishing fluid F moving in the recess 8 is suppressed, so the surface to be polished Ts and the polishing surface The amount of abrasive grains G intervening with 4 is always constant to such an extent that it does not adversely affect the polishing, and hardly changes with time. For this reason, the whole surface to be polished Ts is polished more uniformly. Further, when the plurality of grooves 10a and the plurality of through holes 10b are formed on the same plane, and the surface on which the plurality of grooves 10a are formed and the surface on which the plurality of through holes 10b are formed are parallel, The amount of abrasive grains G interposed between the polishing surface Ts and the polishing surface 4 is further less likely to change over time, and the entire surface to be polished Ts is polished more uniformly.

さらに、上述の本体2は、連通孔10として、溝10aと貫通孔10bとを有していたが、研磨用流体Fの凹部8に対する流入用および流出用の連通部10が全て溝であっても、全て貫通孔であってもよい。   Further, the main body 2 described above has the grooves 10a and the through holes 10b as the communication holes 10, but the inflow and outflow communication portions 10 for the recess 8 of the polishing fluid F are all grooves. Alternatively, all may be through holes.

T:対象物
Ts:被研磨面
2:本体
3:回転軸
4:研磨用表面
6:支持台
8:凹部
8a:開口
10:連通路
10a,10a〜10a:溝
10b,10b〜10b:貫通孔
22:軌跡
22a:始点
22b:終点
24a:摺動始端部位
24b:摺動終端部位
Rt:駆動力伝達部
Sp:供給部
F:研磨用流体
G:砥粒
D1,D2:回転方向
f1:流入方向
f2:流出方向
T: Object Ts: Surface to be polished 2: Main body 3: Rotating shaft 4: Polishing surface 6: Support base 8: Recessed portion 8a: Opening 10: Communication path 10a, 10a 1 to 10a 6 : Groove 10b, 10b 1 to 10b 6 : Through-hole 22: Trajectory 22a: Start point 22b: End point 24a: Sliding start end part 24b: Sliding end part Rt: Driving force transmission part Sp: Supply part F: Polishing fluid G: Abrasive grains D1, D2: Rotation direction f1: Inflow direction f2: Outflow direction

Claims (13)

対象物の表面を研磨する本体を有し、前記本体は、凹部と、該凹部の内部と外部とを連通する複数の連通路とを有し、該複数の連通路は、一端が前記凹部の内部に通じ、前記本体を平面透視したときに、他端が前記一端よりも外側に位置している研磨用治具。   A main body for polishing the surface of the object, the main body having a recess and a plurality of communication paths communicating the inside and the outside of the recess, the plurality of communication paths having one end of the recess A polishing jig that leads to the inside and has the other end positioned outside the one end when the main body is seen through the plane. 平面透視したときに、前記一端は、前記凹部の内周面に位置し、前記他端は、前記本体の外表面に位置し、前記連通路が、前記凹部から前記本体の外表面まで貫通している請求項1に記載の研磨用治具。   When viewed through, the one end is located on the inner peripheral surface of the recess, the other end is located on the outer surface of the main body, and the communication path penetrates from the concave portion to the outer surface of the main body. The polishing jig according to claim 1. 前記本体は、前記対象物を研磨する研磨用表面を有し、
前記凹部は、前記研磨用表面に開口を有し、
前記複数の連通路は、前記開口に通じる前記研磨用表面に設けられた溝を有する請求項1又は請求項2に記載の研磨用治具。
The main body has a polishing surface for polishing the object,
The recess has an opening in the polishing surface;
The polishing jig according to claim 1, wherein the plurality of communication passages have grooves provided on the polishing surface that communicate with the opening.
前記複数の連通路は、前記本体に設けられた貫通孔を有する請求項1から請求項3のいずれかに記載の研磨用治具。   The polishing jig according to any one of claims 1 to 3, wherein the plurality of communication paths have through holes provided in the main body. 前記複数の連通路は、平面透視したときに、外周方向に沿って配列されるとともに、凹部側端部から外部側端部への傾斜の向きが揃っている複数の第1連通路を有する請求項1から請求項4のいずれかに記載の研磨用治具。   The plurality of communication passages have a plurality of first communication passages that are arranged along the outer peripheral direction when seen in a plan view, and that are inclined in the direction from the recess-side end portion to the external-side end portion. Item 5. The polishing jig according to any one of Items 1 to 4. 前記本体は、前記対象物を研磨する研磨用表面を有し、
前記複数の連通路は、前記研磨用表面に垂直な方向において互いに同じ位置にある複数の第1連通路と、該垂直な方向において互いに同じ位置にあり、かつ前記第1連通路とは異なる位置にある複数の第2連通路とを有する請求項1から請求項4のいずれかに記載の研磨用治具。
The main body has a polishing surface for polishing the object,
The plurality of communication paths are a plurality of first communication paths that are in the same position in the direction perpendicular to the polishing surface, and positions that are the same in the vertical direction and different from the first communication path. The polishing jig according to claim 1, further comprising a plurality of second communication passages.
前記複数の第1連通路は、前記研磨用表面に平行な面に沿って形成されており、前記複数の第2連通路は、前記研磨用表面に平行であって、前記第1連通路が形成された面とは異なる面に沿って形成されている請求項6に記載の研磨用治具。   The plurality of first communication passages are formed along a plane parallel to the polishing surface, the plurality of second communication passages are parallel to the polishing surface, and the first communication passage is The polishing jig according to claim 6, wherein the polishing jig is formed along a surface different from the formed surface. 前記研磨用表面を正面として平面透視したとき、前記第1連通路および前記第2連通路は、凹部側端部から外部側端部に向けて、前記凹部から放射状に広がる仮想直線に関してそれぞれ傾くように設けられており、前記第1連通路および前記第2連通路の傾きは、前記仮想直線に関して逆向きである請求項6又は請求項7に記載の研磨用治具。   When the polishing surface is viewed from the front, the first communication path and the second communication path are inclined with respect to an imaginary straight line extending radially from the recess toward the external end from the recess side end. The polishing jig according to claim 6 or 7, wherein an inclination of the first communication path and the second communication path is reverse with respect to the virtual straight line. 前記第1連通路および前記第2連通路は、前記仮想直線に関して線対称に位置している請求項8に記載の研磨用治具。   The polishing jig according to claim 8, wherein the first communication path and the second communication path are positioned in line symmetry with respect to the virtual straight line. 前記研磨用表面を正面として平面透視したとき、前記第1連通路および前記第2連通路は、前記凹部から放射状に広がる複数の直線のうち対応する直線に関して線対称に位置し、前記第1連通路および前記第2連通路のそれぞれは、該直線に交わる若しくは該直線に最も近い部位から外部側端部に向けて、該直線との間の距離が大きくなるように延在している請求項8に記載の研磨用治具。   When the polishing surface is viewed from the front, the first communication path and the second communication path are positioned symmetrically with respect to a corresponding straight line among a plurality of straight lines extending radially from the recess, and the first communication path Each of the passage and the second communication passage extends so as to increase a distance from the straight line from a portion that intersects or is closest to the straight line toward the outer end. The polishing jig according to 8. 前記研磨用表面を正面として平面透視したとき、前記本体は円状であり、
前記第1連通路および前記第2連通路は、前記円の接線に垂直な各直線に関して線対称に位置し、前記第1連通路および前記第2連通路のそれぞれは、該直線に交わる若しくは該直線に最も近い部位からから外部側端部に向けて、該直線との間の距離が大きくなるよう
に延在している請求項8に記載の研磨用治具。
When viewed through a plane with the polishing surface as the front, the main body is circular,
The first communication path and the second communication path are positioned symmetrically with respect to each straight line perpendicular to the tangent line of the circle, and each of the first communication path and the second communication path intersects the straight line or the The polishing jig according to claim 8, wherein the polishing jig extends from a portion closest to the straight line toward an outer side end portion so that a distance from the straight line increases.
請求項1から請求項11に記載の研磨用治具と、
前記対象物を支持する支持部と、
前記対象物の前記表面上に研磨用流体を供給する供給部と
を有する研磨装置。
A polishing jig according to claim 1 to 11,
A support part for supporting the object;
A polishing apparatus comprising: a supply unit that supplies a polishing fluid onto the surface of the object.
対象物の表面を研磨する本体を有し、該本体は、凹部と、該凹部の内部と外部とを連通する複数の連通路とを有し、該複数の連通路は、一端が前記凹部の内部に通じ、前記本体を平面透視したときに、他端が前記一端よりも外側に位置している研磨用治具を用いた研磨方法であって、
前記対象物の前記表面上に前記本体を設置する工程と、
前記対象物の前記表面上に研磨用流体を供給する工程と、
前記研磨用流体を前記複数の連通路を介して前記凹部内に流入および前記凹部内から流出させながら、前記本体を回転させる工程と
を有する研磨方法。
A main body for polishing the surface of the object, the main body having a recess and a plurality of communication passages communicating the inside and the outside of the recess; A polishing method using a polishing jig that leads to the inside and has the other end positioned outside the one end when the main body is seen through a plane.
Installing the body on the surface of the object;
Supplying a polishing fluid onto the surface of the object;
And a step of rotating the main body while allowing the polishing fluid to flow into and out of the recess through the plurality of communication passages.
JP2010067969A 2010-03-24 2010-03-24 Polishing tool, device and method of polishing using the same Pending JP2011200941A (en)

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