JP2011181535A - Optical processing apparatus and optical processing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical processing apparatus and an optical processing method that prevent or suppress re-sticking of decomposed residues on a surface of an object to be processed, and perform ultrasonic irradiation processing while suppressing a rise in temperature of the object to be processed. <P>SOLUTION: The optical processing apparatus includes a housing which has an opening on one surface, a window plate material provided in the opening of the housing and having permeability to ultraviolet light, and an excimer lamp arranged in the housing, wherein the housing has a gas supply hole for supplying a cleaning gas comprising an inert gas into the housing, and the window plate material has a gas blast hole for blowing the cleaning gas in the housing toward the object to be processed arranged opposite to the window plate material. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an optical processing apparatus and an optical processing method, and more particularly to an optical processing apparatus and an optical processing method suitable for a template dry cleaning process in a nanoimprint apparatus and a resist optical ashing process in a manufacturing process of a semiconductor element or the like.

In recent years, in the manufacture of semiconductor chips and biochips, nanoimprint technology has attracted attention as a method that can be manufactured at a lower cost than conventional pattern formation methods using photolithography and etching.
In the pattern forming method using the nanoimprint technology, a pattern forming material layer is formed by applying a liquid photocurable resin on a substrate on which a pattern is to be formed, for example, a wafer, and the pattern forming material layer is formed on the pattern forming material layer. On the other hand, a template (mold) on which a pattern serving as a negative of the pattern to be formed is brought into contact, and in this state, the pattern forming material layer is irradiated with ultraviolet rays and cured, and then the obtained cured resin layer The process which peels a template from is performed (refer patent document 1 and patent document 2).

In such a pattern forming method, if foreign matter or the like is present on the surface of the template, a defect is generated in the obtained pattern. Therefore, it is necessary to clean the surface of the template.
Thus, as a method for cleaning the template, a wet cleaning method using a chemical such as an organic solvent, alkali, or acid is known (see Patent Document 3).
However, in such a wet cleaning method, there is a possibility that a part of the template is dissolved by an organic solvent or a chemical, and the pattern shape is deformed. Also, when removing the template from the cured resin layer, if a residue such as a photocurable resin adheres to the template, it is necessary to perform a template cleaning process every time pattern formation is completed. Since the cleaning process requires a considerably long time, there is a problem that the productivity is remarkably lowered.
On the other hand, for example, in the manufacture of a liquid crystal display element, an optical cleaning processing apparatus is used as a means for cleaning a glass substrate (see Patent Document 4).

JP 2000-194142 A JP 2008-91782 A JP 2009-266841 A JP-A-8-236492

However, when a template is cleaned by a conventional optical cleaning processing apparatus, there are the following problems.
(1) In the photo-cleaning treatment apparatus, contaminants such as organic substances existing on the surface of the object to be processed are decomposed by ultraviolet rays from the excimer lamp, and the decomposition products are ozone and active oxygen generated by the irradiation of ultraviolet rays. Oxidized by gas, gasified to CO ₂ or the like and removed.
However, when a template is peeled from the cured resin layer in the nanoimprint apparatus, if a large amount of residue such as a photocurable resin adheres to the template, the residue is not sufficiently gasified by the light cleaning process. There is a problem that the decomposition residue of the residue may float, and therefore, the floating decomposition residue reattaches to the front surface of the template.

(2) As a template in nanoimprint, for example, a template made of quartz glass is used, and temperature management of the template is extremely important from the viewpoint of dimensional stability and pattern shape maintenance.
However, in the case where the template is subjected to the optical cleaning process by the conventional optical cleaning processing device, the template is irradiated with ultraviolet rays or by receiving radiant heat from the window plate material of the optical cleaning processing device. There is a problem that the temperature of the template rises.

  The present invention has been made based on the circumstances as described above, and the object thereof is to prevent or suppress the re-deposition of decomposition residues on the surface of the object to be processed. It is an object of the present invention to provide an optical processing apparatus and an optical processing method capable of performing an ultraviolet irradiation process while suppressing an increase in temperature.

An optical processing apparatus of the present invention comprises a housing having an opening on one surface, a window plate material having ultraviolet transparency provided in the opening of the housing, and an excimer lamp disposed in the housing.
The housing has a gas supply port for supplying a cleaning gas made of an inert gas into the housing,
The window plate material has a gas jet port for jetting the cleaning gas in the casing toward an object to be processed that is disposed to face the window plate material.

The light processing apparatus of the present invention comprises a housing having an opening on one surface, a window plate material having ultraviolet transparency provided in the opening of the housing, and an excimer lamp disposed in the housing. A light processing device arranged such that the window plate material faces the pattern surface of the template in the nanoimprinting device,
The housing has a gas supply port for supplying a cleaning gas made of an inert gas into the housing,
The window plate member has a gas ejection port for ejecting the cleaning gas in the casing toward the template.

Further, the light processing apparatus of the present invention includes a housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and a gas inside the first window plate material. A second window plate material having ultraviolet transmissivity disposed so as to face the first window plate material through the circulation space, and an excimer lamp disposed in the housing;
The housing has a gas supply port for supplying a cleaning gas made of an inert gas or a mixed gas of an inert gas and an oxygen gas to the gas circulation space,
The first window plate material has a gas jet port for jetting the cleaning gas in the gas circulation space toward the object to be processed disposed opposite to the first window plate material.

The light processing apparatus of the present invention includes a housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and the first window plate material in the housing. And a second window plate material having ultraviolet transparency disposed so as to face each other through a gas circulation space, and an excimer lamp disposed in the housing, wherein the first window plate material is a nanoimprint apparatus. An optical processing apparatus arranged to face the pattern surface of the template in the above, wherein the casing supplies a cleaning gas made of an inert gas or a mixed gas of an inert gas and an oxygen gas to the gas circulation space. A gas supply port for
The first window plate material has a gas jet port for jetting the cleaning gas in the gas circulation space toward the template.

  In the light processing apparatus of this invention, it is preferable to have a gas suction port around which the cleaning gas ejected from the gas ejection port is sucked around the first window plate material.

  Moreover, in the optical processing apparatus of this invention, it is preferable that the said cleaning gas consists of mixed gas of nitrogen gas or helium gas, and 1-3 volume% oxygen gas.

The light processing method of the present invention comprises a housing having an opening on one surface, a window plate material having ultraviolet transparency provided in the opening of the housing, and an excimer lamp disposed in the housing. The housing has a gas supply port for supplying a cleaning gas into the housing, and the window plate member has a gas ejection port for ejecting the cleaning gas in the housing. The window plate material is arranged so as to face the pattern surface of the template in the nanoimprint apparatus with a gap between them,
The template is irradiated with ultraviolet rays while a cleaning gas made of an inert gas is jetted from the gas jetting port to the template.

Further, the light processing method of the present invention includes a housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and a gas inside the first window plate material. A second window plate material having ultraviolet transparency disposed so as to face the first window plate material through a circulation space; and an excimer lamp disposed in the housing. An optical processing apparatus having a gas supply port for supplying a cleaning gas into the housing and having a gas outlet through which the first window plate material ejects the cleaning gas in the gas circulation space, The first window plate material is disposed so as to face the pattern surface of the template in the nanoimprint apparatus via a gap,
The template is irradiated with ultraviolet rays while a cleaning gas made of an inert gas or a mixed gas of an inert gas and oxygen gas is jetted from the gas jetting port to the template.

  According to the present invention, the decomposition residue generated by the irradiation of ultraviolet rays can be removed by irradiating the object to be processed with ultraviolet rays while jetting the cleaning gas from the gas outlet formed in the window plate material. Since it is blown away by the gas, it is possible to prevent or suppress the decomposition residue from re-adhering to the surface of the object to be processed, and the window plate material and the object to be processed are cooled by the cleaning gas blown to the object to be processed. Therefore, it is possible to perform the ultraviolet irradiation treatment of the object to be processed while suppressing an increase in the temperature of the object to be processed.

It is explanatory drawing which shows the structure of the optical processing apparatus which concerns on the 1st Embodiment of this invention. It is sectional drawing for description which cut | disconnects and shows the optical processing apparatus shown in FIG. 1 in the vertical direction. It is sectional drawing for description which cut | disconnects and shows a part of optical processing apparatus shown in FIG. It is a perspective view of the excimer lamp in the optical processing apparatus shown in FIG. It is sectional drawing for description of the excimer lamp shown in FIG. It is explanatory drawing which shows the outline of a structure in an example of the nanoimprint apparatus carrying the optical processing apparatus of this invention. In the nanoimprint apparatus shown in FIG. 6, the optical processing apparatus is an explanatory view showing a state in which the window plate member is arranged to face the pattern surface of the template with a gap. It is sectional drawing for description which fractures | ruptures and shows the structure of the optical processing apparatus which concerns on the 2nd Embodiment of this invention in the vertical direction. It is sectional drawing for description which shows a part of optical processing apparatus shown in FIG. 8 cut | disconnected in a horizontal direction. It is sectional drawing for description which shows the structure of the optical processing apparatus which concerns on the 3rd Embodiment of this invention partly cut | disconnected in the horizontal direction. It is the temperature rise curve figure of the window board material and template which were measured in Experimental example 1. FIG.

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 1 is an explanatory view showing the configuration of the optical processing apparatus according to the first embodiment of the present invention, and FIG. 2 is an explanatory sectional view showing the optical processing apparatus shown in FIG. FIG. 3 is a cross-sectional view for explaining a part of the optical processing apparatus shown in FIG. 1 cut in the lateral direction.
This optical processing device 30 is used for optically cleaning the surface of the template in the nanoimprint apparatus, and a pattern surface of the template 1 in which a window plate material 11 described later is held by a template holding mechanism (not shown). Are arranged so as to face each other with a gap between them.
The casing 10 of the light processing apparatus 30 has a substantially rectangular parallelepiped shape, and the lamp housing chamber S1 and the circuit chamber S2 are formed in the casing 10 so as to be arranged with the partition wall 14 therebetween. The housing 10 has a rectangular opening K on one surface (upper surface in the drawing) forming the lamp housing chamber S1, and the opening K is a window plate material 11 made of a material having ultraviolet transparency, such as quartz glass. Are fixed by a frame-shaped fixing plate 15.
An excimer lamp 20 is disposed in the lamp housing chamber S1 of the housing 10, and a step-up transformer 25 and the like are disposed in the circuit chamber S2.

The casing 10 is formed with a gas supply port 17 for supplying a cleaning gas into the lamp housing chamber S1 in the casing 10, and the gas supply port 17 is connected to the cleaning gas via a gas supply pipe 18. It is connected to a supply source (not shown). In this example, a gas discharge pipe 19 for discharging gas from the lamp housing chamber S1 is provided.
Further, the window plate member 11 is formed with a plurality of gas outlets 16 for jetting the cleaning gas in the lamp housing chamber S <b> 1 in the housing 10 toward the template 1.
The diameter of the gas outlet 16 is, for example, 1 to 3 mm, and the pitch of the gas outlet 16 is, for example, 5 to 30 mm.

4 is a perspective view of the excimer lamp 20, and FIG. 5 is a cross-sectional view for explaining the excimer lamp 20 shown in FIG. The excimer lamp 20 has a flat plate-like discharge vessel 21 in which a discharge space S is formed inside, and caps 24 are provided at both ends of the discharge vessel 21. In S, excimer gas is hermetically sealed. A mesh-like high-voltage side electrode 22 is disposed on one surface of the discharge vessel 21, and a mesh-like ground-side electrode 23 is disposed on the other surface of the discharge vessel 21. Each of 23 is connected to a high frequency power supply (not shown). The excimer lamp 20 is disposed such that one surface of the discharge vessel 21 on which the high-voltage side electrode 22 is disposed is opposed to the window plate 11 in the housing 10.
According to such a configuration, the excimer lamp 20 is disposed so that one surface of the discharge vessel 21 on which the high-voltage side electrode 22 is disposed is opposed to the window plate material 11, and thus the ground-side electrode 23 in the discharge vessel 21. Even if the separation distance between the other surface where the lamp is disposed and the inner surface of the housing 10 is small, external discharge does not occur between the excimer lamp 20 and the housing 10. While being able to make it small, since the separation distance between the one surface of the discharge vessel 21 to which the ultraviolet rays are radiated and the window plate material 11 can be increased, the temperature rise of the window plate material 11 can be further suppressed.

As a material constituting the discharge vessel 21, a material that can transmit vacuum ultraviolet rays satisfactorily, specifically, silica glass such as synthetic quartz glass, sapphire glass, or the like can be used.
As a material constituting the high voltage side electrode 22 and the ground side electrode 23, a metal material such as aluminum, nickel, gold or the like can be used. The high-voltage side electrode 22 and the ground-side electrode 23 can also be formed by screen printing a conductive paste containing the above metal material or by vacuum vapor deposition of the above metal material.
The excimer gas enclosed in the discharge space S of the discharge vessel 21 can generate an excimer that emits vacuum ultraviolet rays, specifically, a rare gas such as xenon, argon, krypton, or a rare gas , A mixed gas in which a halogen gas such as bromine, chlorine, iodine, or fluorine is mixed can be used. When a specific example of the excimer gas is shown together with the wavelength of emitted ultraviolet light, it is 172 nm for xenon gas, 191 nm for a mixed gas of argon and iodine, and 193 nm for a mixed gas of argon and fluorine.
Moreover, the sealing pressure of the excimer gas is, for example, 10 to 100 kPa.

  FIG. 6 is an explanatory diagram showing an outline of the configuration of an example of a nanoimprint apparatus equipped with the optical processing apparatus of the present invention. In this figure, 1 is a template, 2 is a template holding mechanism for holding the template 1, and 3 is a chamber. Reference numeral 4 denotes a movable wafer stage. A wafer chuck 4 a for holding the wafer W is disposed on the wafer stage 4. Reference numeral 5 denotes an ink jet application means for applying a liquid photocurable resin, which is a pattern forming material (imprint material), to the surface of the wafer W, 6 is a pressurizing mechanism, 7 is a vibration isolation table, and 8 is a stage fixed A board 9 is an ultraviolet light source for irradiating the pattern forming material layer made of a photocurable resin formed on the wafer W with ultraviolet rays. 30 is an optical processing apparatus having the configuration shown in FIGS. 1 and 2, and this optical processing apparatus 30 is fixed to a transport arm 35 that transports the optical processing apparatus 30 below the template 1.

In such a nanoimprint apparatus, the wafer stage 4 with the wafer W held on the wafer chuck 4a is moved to a position below the coating means 5, and a liquid photocurable resin is coated on the surface of the wafer W by the coating means 5. As a result, a pattern forming material layer made of a photocurable resin is formed on the wafer W. Next, the wafer stage 4 is moved to a position below the template 1, and the template 1 is brought into contact with the pattern forming material layer formed on the wafer W by the pressing mechanism 6 to pressurize it. The pattern forming material layer is cured by irradiating the forming material layer with the ultraviolet light source 9 through the template 1 to cure the pattern forming material layer, and then peeling the template 1 from the obtained cured resin layer. Formation is achieved.
When such pattern formation on the wafer W is completed once or a plurality of times, the wafer stage 4 on which the wafer W is placed is moved from the lower position of the template 1 to its side position as shown in FIG. While being retracted, the light processing device 30 is transported to a position below the template 1, and the window plate member 11 (see FIG. 3) is arranged so as to face the pattern surface of the template 1 with a gap.
Here, the separation distance between the outer surface of the window plate material 11 and the pattern surface of the template 1 is, for example, 0.3 to 10.0 mm.

In the light processing device 30, the cleaning gas is supplied into the lamp storage chamber S <b> 1 from the gas supply port 17 of the housing 10 through the gas supply pipe 18, so that the cleaning gas is contained in the lamp storage chamber S <b> 1. Further, the cleaning gas in the lamp housing chamber S <b> 1 is ejected from the gas ejection port 16 of the window plate material 11 to the template 1. In this state, the excimer lamp 20 is turned on to irradiate the pattern surface of the template 1 with ultraviolet rays from the excimer lamp 20 through the window plate material 11, thereby achieving the light cleaning process of the template 1. .
Thereafter, the optical processing apparatus 30 is transported and retracted from the lower position of the template 1, and the wafer stage 4 on which the wafer W is placed is moved to the lower position of the template 1 to execute pattern formation on the wafer W. Is done.

In the above, the cleaning gas ejected from the gas outlet 16 of the window plate material 11 is also used as the purge gas filled in the lamp housing chamber S1, and therefore an inert gas is used as the cleaning gas. . Specific examples of the inert gas include nitrogen gas and helium gas, but helium gas is preferable in that high cooling efficiency can be obtained.
The flow rate of the cleaning gas ejected from the gas outlet 16 of the window plate material 11 is, for example, 100 to 1000 L / min, the flow rate of the cleaning gas is, for example, 5-30 m / s, and the temperature of the cleaning gas is, for example, 10-35 ° C.
Moreover, the irradiation time of the ultraviolet rays with respect to the template 1 is 3 to 3600 seconds, for example.

  According to the light processing device 30 described above, the template 1 is irradiated with ultraviolet rays while the cleaning gas is ejected from the gas jets 16 formed in the window plate material 11 to the template 1, so that the decomposition caused by the ultraviolet irradiation. Since the residue is blown away by the cleaning gas, it is possible to prevent or suppress the decomposition residue from re-adhering to the surface of the template 1, and the window plate material 11 and the template 1 are removed by the cleaning gas blown to the template 1. Since it cools, the ultraviolet irradiation process of the said template 1 can be performed, suppressing the temperature of the template 1 rising.

FIG. 8 is a cross-sectional view for explaining the configuration of the optical processing apparatus according to the second embodiment of the present invention cut in the vertical direction, and FIG. 9 shows a part of the optical processing apparatus shown in FIG. 8 in the horizontal direction. It is sectional drawing for description cut | disconnected and shown in FIG.
This optical processing device 30 is used for optically cleaning the surface of the template in the nanoimprint apparatus, and a first window plate material 12 described later is held by a template holding mechanism (not shown) in the nanoimprint apparatus. The template 1 is used so as to be opposed to the pattern surface with a gap.
The casing 10 of the light processing apparatus 30 has a substantially rectangular parallelepiped shape, and the lamp housing chamber S1 and the circuit chamber S2 are formed in the casing 10 so as to be arranged with the partition wall 14 therebetween. The housing 10 has a rectangular opening K on one surface (upper surface in the drawing) that forms the lamp housing chamber S1, and the opening K includes a first material made of ultraviolet transmissive material such as quartz glass. The window plate material 12 is fixed by a frame-shaped fixing plate 15. Inside the first window plate member 12, a second window plate member 13 made of a material having ultraviolet transparency, for example, quartz glass, is disposed so as to face the first window plate member 12 through the gas circulation space S3. Has been.
An excimer lamp 20 is disposed in the lamp housing chamber S1 of the housing 10, and a step-up transformer 25 and the like are disposed in the circuit chamber S2.

The casing 10 is formed with a gas supply port 17 for supplying a cleaning gas into the gas circulation space S3 in the casing 10, and a gas supply pipe 18 is connected to the gas supply port 17. . Further, the casing 10 is provided with a purge gas supply pipe (not shown) for supplying a purge gas to the casing 10 and a purge gas discharge pipe (not shown) for discharging the gas from the lamp housing chamber S1. Yes.
In addition, the first window plate 12 is formed with a plurality of gas ejection ports 16 for ejecting the cleaning gas in the gas circulation space S <b> 3 in the housing 10 toward the template 1 vertically and horizontally. The diameter and pitch of the gas outlets 16 are the same as those of the gas outlets 16 of the window plate 11 in the light processing apparatus 30 according to the first embodiment described above.
The separation distance between the first window plate material 12 and the second window plate material 13 is, for example, 5 to 20 mm.
The excimer lamp 20 has the same configuration as that of the excimer lamp 20 in the optical processing device 30 according to the first embodiment described above.

In such an optical processing device 30, the cleaning gas is supplied from the gas supply port 17 of the housing 10 to the gas circulation space S <b> 3, so that the gas circulation space S <b> 3 is filled with the cleaning gas and the gas The cleaning gas in the circulation space S3 is ejected from the gas ejection port 16 of the first window plate 12 to the template 1. Then, in this state, the excimer lamp 20 is turned on to irradiate the pattern surface of the template 1 with the ultraviolet light from the excimer lamp 20 through the second window plate material 13 and the first window plate material 12, The light cleaning process of template 1 is achieved.
In the above, as the cleaning gas ejected from the gas ejection port 16 of the first window plate material 12, an inert gas or a mixed gas of an inert gas and an oxygen gas is used. A mixed gas of nitrogen gas or helium gas and oxygen gas is more preferable.
Moreover, it is preferable that the ratio of the oxygen gas in mixed gas is 1-3 volume%.
Further, the flow rate of the cleaning gas, the flow rate of the cleaning gas, the temperature of the cleaning gas, and the irradiation time of the ultraviolet rays on the template 1 are the same as those of the light processing apparatus 30 according to the first embodiment described above.

According to the light processing apparatus 30 described above, the template 1 is irradiated with ultraviolet rays while the cleaning gas is jetted from the gas outlet 16 formed in the first window plate member 12 to the template 1, thereby irradiating the ultraviolet rays. Since the decomposition residue generated by the cleaning gas is blown away by the cleaning gas, it is possible to prevent or suppress the decomposition residue from reattaching to the surface of the template 1, and the first window is generated by the cleaning gas blown to the template 1. Since the board | plate material 12 and the template 1 are cooled, the ultraviolet irradiation process of the said template 1 can be performed, suppressing the temperature of the template 1 rising.
Further, by using a mixed gas of an inert gas and an oxygen gas as a cleaning gas, the oxygen gas can be brought into contact with the entire surface of the template 1, thereby generating ozone and activity generated by ultraviolet irradiation. Since oxygen can be reliably brought into contact with the entire surface of the template 1, uniform light cleaning treatment can be reliably performed on the entire surface of the template 1.

FIG. 10 is an explanatory cross-sectional view illustrating a configuration of an optical processing apparatus according to the third embodiment of the present invention, partially cut in the horizontal direction.
The light processing device 30 has a gas suction port 32 around the first window plate member 12 through which the cleaning gas ejected from the gas ejection port 16 is sucked. More specifically, two rectangular cylindrical gas flow path members 31 are arranged on one surface of the housing 10 along both side edges, and face inward in each of the gas flow path members 31. A gas suction port 32 is formed on one surface. The gas flow path member 31 is connected to a gas suction mechanism (not shown) through a gas suction pipe (not shown). Other configurations of the optical processing device 30 are the same as those of the optical processing device according to the second embodiment described above.

In such an optical processing device 30, the cleaning gas is supplied from the gas supply port 17 of the housing 10 to the gas circulation space S <b> 3, so that the gas circulation space S <b> 3 is filled with the cleaning gas and the gas The cleaning gas in the circulation space S3 is ejected from the gas ejection port 16 of the first window plate 12 to the template 1. Then, in this state, the excimer lamp 20 is turned on to irradiate the pattern surface of the template 1 with the ultraviolet light from the excimer lamp 20 through the second window plate material 13 and the first window plate material 12, The light cleaning process of template 1 is achieved. At this time, the cleaning gas ejected from the gas ejection port 16 of the first window plate 12 is sucked into the gas suction port 32 together with the decomposition residue generated by the irradiation of the ultraviolet rays.
In the above, the type of the cleaning gas ejected from the gas outlet 16 of the first window plate member 12, the flow rate of the cleaning gas, the flow rate of the cleaning gas, the temperature of the cleaning gas, and the irradiation time of the ultraviolet rays on the template 1 are as follows. This is the same as the optical processing apparatus 30 according to the second embodiment described above.

  According to the light processing device 30 described above, the same effect as that of the light processing device 30 according to the second embodiment can be obtained, and further, decomposition residues generated by the irradiation of ultraviolet rays are sucked into the gas suction port 32. The decomposition residue can be reliably prevented or suppressed from reattaching to the surface of the template 1.

  Although the embodiments of the present invention have been described above, the specific application of the light processing apparatus and the light processing method of the present invention is not limited to the template light cleaning process in the nanoimprint apparatus, but is used for other light cleaning processes. In addition, the present invention is not limited to the optical cleaning process, and can be used as, for example, an optical ashing apparatus for a resist used in a semiconductor manufacturing process.

<Experimental example 1>
(1) Fabrication of optical processing apparatus An optical processing apparatus (A) having the following specifications was fabricated in accordance with the configuration shown in FIGS.
[Case]
The housing (10) has a lamp accommodating chamber (S1) having dimensions of 180 mm × 80 mm × 60 mm, and an opening (K) having a dimension of 60 mm × 60 mm is formed on one surface of the portion forming the lamp accommodating chamber (S1). Is formed.
[Window material]
The window plate material (11) is made of quartz glass and has a thickness of 5 mm. In this window plate material (11), 60 gas jets (16) each having a diameter of 2 mm are arranged vertically and horizontally at a pitch of 8 mm. Is formed.
[Excimer lamp]
The excimer lamp (20) has a discharge vessel (21) made of quartz glass. The discharge vessel (21) is filled with xenon gas, has an emission length of 50 mm, an emission width of 45 mm, and an output of 15 W. Is.
The excimer lamp (20) is arranged in the housing (10) such that one surface of the discharge vessel (21) on which the high voltage side electrode (22) is arranged is opposed to the window plate material (11). The separation distance between one surface of the excimer lamp (20) and the window plate material (11) is 30 mm.

  Moreover, the light processing apparatus (B) of the structure similar to a light processing apparatus (A) was produced except having used what does not have a gas jet nozzle as a window-plate material.

(2) Preparation of test template Each has a pattern surface formed such that a plurality of protrusions each having a width of 100 nm and a protrusion height of 120 nm are arranged at a pitch of 200 mm, and the dimension of the pattern region on this pattern surface Was made of quartz glass having a size of 53 mm × 53 mm and a thickness of 5 mm.
Next, a photoresist layer having a thickness of 110 nm is formed on the substrate by spin coating, and the photoresist layer is exposed and cured in a state where the pattern surface of the template is in contact with the photoresist layer. Then, the template for a test was produced by peeling a template from the obtained cured resist layer.

(3) Light cleaning treatment test Using the above test template, light processing device (A) and light processing device (B), a light cleaning treatment test was performed as follows.
An optical processing device was arranged on the pattern surface of the test template so that the window plate material faced through a gap of 1 mm, and a K thermocouple for temperature measurement was attached to each of the window plate material and the test template. Then, by supplying nitrogen gas at 25 ° C., which is a cleaning gas and a purge gas, from the gas supply port of the housing to the lamp housing chamber, the lamp housing chamber is filled with nitrogen gas, and the gas outlet of the window plate material While the nitrogen gas was jetted from the test template, the excimer lamp was turned on to irradiate the test template with ultraviolet rays, whereby the test template was subjected to a light cleaning process.
Here, the flow rate of the nitrogen gas ejected from the gas ejection port is 200 L / min, and the flow rate of the nitrogen gas is 17.7 m / s.
And the relationship between the ultraviolet irradiation time with respect to the test template and the rising temperature of the test template and the window sheet material was examined. The results are shown in FIG.

In FIG. 11, “A1” is the temperature rise curve of the window plate material in the light processing apparatus (A), “A2” is the temperature rise curve of the test template subjected to light cleaning treatment by the light processing apparatus (A), and “B1” is A temperature rise curve of the window plate material in the light processing apparatus (B), “B2” indicates a temperature rise curve of the test template subjected to the light cleaning treatment by the light processing apparatus (B).
As is clear from FIG. 11, according to the light processing apparatus (A) of the present invention, it was confirmed that the ultraviolet irradiation treatment can be performed while suppressing the temperature rise of the workpiece.

Moreover, the optical cleaning process by ultraviolet irradiation for 120 seconds is performed three times, and the central part and the peripheral part in the pattern region of the test template after each optical cleaning process are observed with a microscope at a magnification of 5000 times, and the pattern of the test template is observed. The number of resist residues adhering per 400 μm ^{2 of the} surface was measured. The results are shown in Table 1 below.
From the results shown in Table 1 below, it was confirmed that according to the light processing apparatus (A) of the present invention, the decomposition residue attached to the test template was reduced after the light cleaning process.
Further, when the removal rate of the resist residue at the central portion and the peripheral portion in the pattern region of the test template was determined, the removal rate at the central portion was 82%, the removal rate at the peripheral portion was 94%, and the removal rate at the peripheral portion. Was confirmed to be higher than the removal rate at the center.
In the above, the resist residue removal rate is X in the total number of resist residues in three tests by the light processing device (B) in each of the central portion and the peripheral portion in the pattern area of the template. When the total number of resist residues in the three tests in (A) is Y, (XY) is divided by X and multiplied by 100.

<Experimental example 2>
(1) Fabrication of optical processing apparatus An optical processing apparatus (C) having the following specifications was fabricated in accordance with the configuration shown in FIGS.
[Case]
The housing (10) has a lamp accommodating chamber (S1) having dimensions of 180 mm × 80 mm × 60 mm, and an opening (K) having a dimension of 60 mm × 60 mm is formed on one surface of the portion forming the lamp accommodating chamber (S1). Is formed.
[First window plate material and second window plate material]
The first window plate material (12) is made of quartz glass and has a thickness of 5 mm. In the first window plate material (12), 60 gas jet ports (16) each having a diameter of 2 mm are 8 mm. It is formed to be arranged vertically and horizontally at a pitch.
The second window plate material (13) is made of quartz glass and has a thickness of 3 mm, and the distance between the first window plate material (12) and the second window plate material (13) is 15 mm. .
[Excimer lamp]
The excimer lamp (20) has a discharge vessel (21) made of quartz glass. The discharge vessel (21) is filled with xenon gas, has an emission length of 50 mm, an emission width of 45 mm, and an output of 15 W. Is.
The excimer lamp (20) is disposed in the housing (10) such that one surface of the discharge vessel (21) on which the high voltage side electrode (22) is disposed is opposed to the second window plate member (13). The distance between the one surface of the excimer lamp (20) and the second window plate material (13) is 30 mm.

(2) Optical cleaning treatment test Using the test template and the optical processing apparatus (C) produced in the same manner as in Experimental Example 1, the optical cleaning processing test was performed as follows.
An optical processing apparatus was arranged so that the first window plate material was opposed to the pattern surface of the test template with a gap of 1 mm. Then, by supplying nitrogen gas into the lamp housing chamber, the lamp housing chamber is filled with nitrogen gas, and a gas flow space between the first window plate material and the second window plate material from the gas supply port of the housing. By supplying a cleaning gas composed of a mixed gas a of 99% by volume nitrogen gas and 1% by volume oxygen gas into the interior, the gas is discharged from the gas window outlet of the first window plate material through the gas circulation space. While the gas was jetted onto the test template, the excimer lamp was turned on and the test template was irradiated with ultraviolet rays for 120 seconds to perform a photocleaning treatment on the test template.
Here, the flow rate of the cleaning gas ejected from the gas ejection port is 200 L / min, and the flow rate of the nitrogen gas is 17.7 m / s.
As a cleaning gas, instead of the mixed gas a, a mixed gas b of 98% by volume of nitrogen gas and 2% by volume of oxygen gas, a mixed gas of 97% by volume of nitrogen gas and 3% by volume of oxygen gas is used. The test template was subjected to a light cleaning treatment in the same manner as described above except that c was used.
Further, the test template was subjected to a light cleaning process in the same manner as described above except that the light processing apparatus (B) prepared in Experimental Example 1 was used instead of the light processing apparatus (C).

Then, the light cleaning process is performed three times, and the central part and the peripheral part in the pattern region of the test template after each light cleaning process are observed with a microscope at a magnification of 5000 times, and 400 μm ² of the pattern surface of the test template is observed. The total number of resist residues adhering to each other was measured, and the removal rate of the resist residues was determined. The results are shown in Table 2 below.
In the above, the resist residue removal rate is X ′, where the total number of resist residues in three tests by the light processing apparatus (B) is X ′ at each of the central portion and the peripheral portion in the pattern area of the template. When the total number of resist residues in the three tests in each case using the mixed gas a to mixed gas c by the apparatus (C) is Y ′, (X′−Y ′) This is calculated by dividing the number by X ′ and multiplying by 100.
From the results shown in Table 2 below, it is confirmed that the decomposition residue adhering to the test template is reduced after the optical cleaning process by ejecting the cleaning gas from the gas outlet of the first window plate material. It was done.
In addition, regarding the removal rate of resist residues, it is confirmed that the removal rate of the central portion and the peripheral portion is the same value in any mixed gas, and the optical cleaning process is uniformly performed over the entire surface of the template. It was done.

DESCRIPTION OF SYMBOLS 1 Template 2 Template holding mechanism 3 Chamber 4 Wafer stage 4a Wafer chuck 5 Application | coating means 6 Pressurization mechanism 7 Vibration isolator 8 Stage surface plate 9 Ultraviolet light source 10 Case 11 Window plate material 12 First window plate material 13 Second window plate material 14 Partition 15 Fixed plate 16 Gas outlet 17 Gas supply port 18 Gas supply tube 19 Gas discharge tube 20 Excimer lamp 21 Discharge vessel 22 High voltage side electrode 23 Ground side electrode 24 Base 25 Booster transformer 30 Light processing device 31 Gas flow path member 32 Gas suction port 35 Transfer arm K Opening S Discharge space S1 Lamp housing chamber S2 Circuit chamber S3 Gas distribution space W Wafer

Claims (8)

A housing having an opening on one surface, an ultraviolet transmissive window plate provided in the opening of the housing, and an excimer lamp disposed in the housing;
The housing has a gas supply port for supplying a cleaning gas made of an inert gas into the housing,
The said window board material has a gas jet nozzle which ejects the cleaning gas in the said housing toward the to-be-processed object arrange | positioned facing the said window board material. A casing having an opening on one surface, a window plate material having ultraviolet transparency provided in the opening of the casing, and an excimer lamp disposed in the casing, wherein the window plate material is a template in a nanoimprint apparatus An optical processing device arranged to face the pattern surface of
The housing has a gas supply port for supplying a cleaning gas made of an inert gas into the housing,
The said window board material has a gas jet nozzle which ejects the gas for washing | cleaning in the said housing | casing toward a template. A housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and the first window through a gas flow space inside the first window plate material A second window plate having ultraviolet transparency disposed so as to face the plate, and an excimer lamp disposed in the housing;
The housing has a gas supply port for supplying a cleaning gas made of an inert gas or a mixed gas of an inert gas and an oxygen gas to the gas circulation space,
The first window plate material has a gas ejection port for ejecting the cleaning gas in the gas circulation space toward an object to be processed that is disposed to face the first window plate material. Processing equipment. A housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and the first window plate material in the housing so as to face each other through a gas flow space. An ultraviolet ray transmitting second window plate material and an excimer lamp arranged in the housing are arranged, and the first window plate material is arranged so as to face the pattern surface of the template in the nanoimprint apparatus. A light processing device,
The housing has a gas supply port for supplying a cleaning gas made of an inert gas or a mixed gas of an inert gas and an oxygen gas to the gas circulation space,
The first window plate member has a gas ejection port for ejecting the gas for cleaning the gas circulation space toward the template.   The optical processing apparatus according to claim 4, further comprising a gas suction port around which the cleaning gas ejected from the gas ejection port is sucked around the first window plate member.   6. The optical processing apparatus according to claim 3, wherein the cleaning gas is a mixed gas of nitrogen gas or helium gas and 1 to 3% by volume of oxygen gas. A housing having an opening on one side, an ultraviolet transmissive window plate provided in the opening of the housing, and an excimer lamp disposed in the housing; And a gas supply port for supplying a cleaning gas to the optical processing apparatus, wherein the window plate material has a gas outlet for jetting the cleaning gas in the housing, and the window plate material is a template of the nanoimprint apparatus. Arranged to face the pattern surface with a gap,
An optical processing method characterized by irradiating the template with ultraviolet rays while jetting a cleaning gas made of an inert gas from the gas jetting port to the template. A housing having an opening on one surface, a first window plate material having ultraviolet transparency provided in the opening of the housing, and the first window through a gas flow space inside the first window plate material A second window plate material having ultraviolet transparency disposed so as to face the plate material, and an excimer lamp disposed in the housing, wherein the housing supplies cleaning gas into the housing An optical processing apparatus having a gas supply port for performing the cleaning operation in the gas circulation space, and the first window sheet material in the nanoimprint apparatus. Arranged to face the pattern surface of the template with a gap,
An optical processing method comprising irradiating the template with ultraviolet rays while jetting a cleaning gas made of an inert gas or a mixed gas of an inert gas and an oxygen gas from the gas jetting port to the template.

Images