JP2011170151A5 - - Google Patents
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- Publication number
- JP2011170151A5 JP2011170151A5 JP2010034429A JP2010034429A JP2011170151A5 JP 2011170151 A5 JP2011170151 A5 JP 2011170151A5 JP 2010034429 A JP2010034429 A JP 2010034429A JP 2010034429 A JP2010034429 A JP 2010034429A JP 2011170151 A5 JP2011170151 A5 JP 2011170151A5
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- antioxidant
- resin
- boiling point
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002904 solvent Substances 0.000 claims 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 239000003963 antioxidant agent Substances 0.000 claims 1
- 230000003078 antioxidant effect Effects 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010034429A JP2011170151A (ja) | 2010-02-19 | 2010-02-19 | レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010034429A JP2011170151A (ja) | 2010-02-19 | 2010-02-19 | レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011170151A JP2011170151A (ja) | 2011-09-01 |
| JP2011170151A5 true JP2011170151A5 (enrdf_load_html_response) | 2013-01-24 |
Family
ID=44684340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010034429A Pending JP2011170151A (ja) | 2010-02-19 | 2010-02-19 | レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2011170151A (enrdf_load_html_response) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5625460B2 (ja) * | 2010-04-15 | 2014-11-19 | Jsr株式会社 | ポジ型感放射線性組成物、層間絶縁膜及びその形成方法 |
| KR102247281B1 (ko) * | 2016-09-02 | 2021-05-03 | 후지필름 가부시키가이샤 | 용액, 용액 수용체, 감활성 광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 반도체 디바이스의 제조 방법 |
| WO2018043695A1 (ja) * | 2016-09-02 | 2018-03-08 | 富士フイルム株式会社 | 溶液、溶液収容体、感活性光線性又は感放射線性樹脂組成物、パターン形成方法、半導体デバイスの製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5164278A (en) * | 1990-03-01 | 1992-11-17 | International Business Machines Corporation | Speed enhancers for acid sensitized resists |
| JPH1152575A (ja) * | 1997-08-04 | 1999-02-26 | Sumitomo Chem Co Ltd | 化学増幅型ポジ型フォトレジスト組成物 |
| KR100520168B1 (ko) * | 1999-06-21 | 2005-10-10 | 주식회사 하이닉스반도체 | 화학증폭형 레지스트에 첨가되는 새로운 페닐렌디아민계 유도체 |
| JP3919147B2 (ja) * | 1999-09-29 | 2007-05-23 | 住友ベークライト株式会社 | ポジ型感光性樹脂組成物及びそれを用いた半導体装置 |
| JP2005257884A (ja) * | 2004-03-10 | 2005-09-22 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びパターン形成方法 |
| JP4545500B2 (ja) * | 2004-07-01 | 2010-09-15 | 東京応化工業株式会社 | 化学増幅型レジスト組成物およびレジストパターン形成方法 |
| JP4496120B2 (ja) * | 2005-03-30 | 2010-07-07 | 富士フイルム株式会社 | 化学増幅型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4655886B2 (ja) * | 2005-10-28 | 2011-03-23 | Ｊｓｒ株式会社 | ポジ型感放射線性樹脂組成物 |
| JP4991150B2 (ja) * | 2005-12-21 | 2012-08-01 | 東京応化工業株式会社 | レジスト組成物およびレジスト組成物の製造方法 |
| JP2008133266A (ja) * | 2006-10-25 | 2008-06-12 | Sumitomo Chemical Co Ltd | 多価フェノール誘導体その製造法および電子線またはｅｕｖ用レジスト組成物 |
| JP2010151889A (ja) * | 2008-12-24 | 2010-07-08 | Toray Ind Inc | ポジ型感光性ペースト |
| JP5425031B2 (ja) * | 2009-10-16 | 2014-02-26 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
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2010
- 2010-02-19 JP JP2010034429A patent/JP2011170151A/ja active Pending