JP2011170151A5 - - Google Patents
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- Publication number
- JP2011170151A5 JP2011170151A5 JP2010034429A JP2010034429A JP2011170151A5 JP 2011170151 A5 JP2011170151 A5 JP 2011170151A5 JP 2010034429 A JP2010034429 A JP 2010034429A JP 2010034429 A JP2010034429 A JP 2010034429A JP 2011170151 A5 JP2011170151 A5 JP 2011170151A5
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- antioxidant
- resin
- boiling point
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Claims (1)
溶剤が、沸点が１８５℃以上の溶剤を少なくとも１種含む溶剤（ただし乳酸エチルを含
まない）であるレジスト組成物。 Contains an antioxidant, solvent, resin and acid generator,
A resist composition, wherein the solvent is a solvent containing at least one solvent having a boiling point of 185 ° C. or higher (but not containing ethyl lactate).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010034429A JP2011170151A (en) | 2010-02-19 | 2010-02-19 | Resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010034429A JP2011170151A (en) | 2010-02-19 | 2010-02-19 | Resist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011170151A JP2011170151A (en) | 2011-09-01 |
| JP2011170151A5 true JP2011170151A5 (en) | 2013-01-24 |
Family
ID=44684340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010034429A Pending JP2011170151A (en) | 2010-02-19 | 2010-02-19 | Resist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2011170151A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5625460B2 (en) * | 2010-04-15 | 2014-11-19 | Jsr株式会社 | Positive radiation-sensitive composition, interlayer insulating film and method for forming the same |
| WO2018043695A1 (en) * | 2016-09-02 | 2018-03-08 | 富士フイルム株式会社 | Solution, solution accommodating body, active light-sensitive or radiation-sensitive resin composition, pattern formation method, and method for producing semiconductor devices |
| TW202305094A (en) * | 2016-09-02 | 2023-02-01 | 日商富士軟片股份有限公司 | Solution, container filled with solution, active light sensitive or radiation sensitive resin composition, method for forming pattern, and method for manufacturing semiconductor device |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5164278A (en) * | 1990-03-01 | 1992-11-17 | International Business Machines Corporation | Speed enhancers for acid sensitized resists |
| JPH1152575A (en) * | 1997-08-04 | 1999-02-26 | Sumitomo Chem Co Ltd | Chemical amplification type positive type photoresist composition |
| KR100520168B1 (en) * | 1999-06-21 | 2005-10-10 | 주식회사 하이닉스반도체 | New phenylenediamine derivatives for adding to chemical amplified resist |
| JP3919147B2 (en) * | 1999-09-29 | 2007-05-23 | 住友ベークライト株式会社 | Positive photosensitive resin composition and semiconductor device using the same |
| JP2005257884A (en) * | 2004-03-10 | 2005-09-22 | Fuji Photo Film Co Ltd | Positive resist composition and pattern forming method |
| JP4545500B2 (en) * | 2004-07-01 | 2010-09-15 | 東京応化工業株式会社 | Chemically amplified resist composition and resist pattern forming method |
| JP4496120B2 (en) * | 2005-03-30 | 2010-07-07 | 富士フイルム株式会社 | Chemically amplified resist composition and pattern forming method using the same |
| JP4655886B2 (en) * | 2005-10-28 | 2011-03-23 | Ｊｓｒ株式会社 | Positive radiation sensitive resin composition |
| JP4991150B2 (en) * | 2005-12-21 | 2012-08-01 | 東京応化工業株式会社 | Resist composition and method for producing resist composition |
| JP2008133266A (en) * | 2006-10-25 | 2008-06-12 | Sumitomo Chemical Co Ltd | Polyhydric phenol derivative, its manufacturing method and resist composition for electron beam or euv |
| JP2010151889A (en) * | 2008-12-24 | 2010-07-08 | Toray Ind Inc | Positive photosensitive paste |
| JP5425031B2 (en) * | 2009-10-16 | 2014-02-26 | 富士フイルム株式会社 | Photosensitive resin composition, method for forming cured film, cured film, organic EL display device, and liquid crystal display device |
-
2010
- 2010-02-19 JP JP2010034429A patent/JP2011170151A/en active Pending