JP2011170024A - Method for manufacturing liquid crystal display elements - Google Patents

Method for manufacturing liquid crystal display elements Download PDF

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JP2011170024A
JP2011170024A JP2010032328A JP2010032328A JP2011170024A JP 2011170024 A JP2011170024 A JP 2011170024A JP 2010032328 A JP2010032328 A JP 2010032328A JP 2010032328 A JP2010032328 A JP 2010032328A JP 2011170024 A JP2011170024 A JP 2011170024A
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liquid crystal
sealing material
transparent electrode
light
substrate
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Tadayuki Shimada
忠之 島田
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JVCKenwood Holdings Inc
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JVCKenwood Holdings Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing liquid crystal display elements for improving productivity, wherein liquid crystal is not contaminated by a sealing material and cell gap adjustment is easily performed. <P>SOLUTION: The photo-curable sealing material 21 is applied in a circular shape around a display pixel region 4, on a liquid crystal driving substrate 6 including a display pixel region 4 in which a plurality of pixel electrodes 3 are formed. Then, the liquid crystal 23 is supplied on the display pixel region 4. A transparent electrode substrate 15 in which transparent electrodes 13 are formed and liquid crystal driving substrate 6 are stuck together via the sealing material 21 so that the plurality of pixel electrodes 3 may face the transparent electrodes 13, and the liquid crystal 23 may not come into contact with the sealing material 21. Then, light UV1 of a predetermined illuminance is emitted onto an inner surface layer section A21 of the sealing material 21. Cell gap adjustment is performed between the transparent electrode substrate 15 and the liquid crystal driving substrate 6, and light UV2 of higher illuminance than the predetermined illuminance is emitted onto the whole sealing material 21. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は液晶表示素子の製造方法に関する。   The present invention relates to a method for manufacturing a liquid crystal display element.

近年、液晶表示素子は、プロジェクタ、プロジェクションテレビ、ヘッドマウントディスプレイ等のディスプレイ分野に広く用いられている。   In recent years, liquid crystal display elements have been widely used in display fields such as projectors, projection televisions, and head mounted displays.

ここで、液晶表示素子の一般的な製造方法について説明する。   Here, a general manufacturing method of the liquid crystal display element will be described.

まず、液晶駆動基板又は透明電極基板の少なくとも一方に、素子毎にシール材を不連続部を有して環状に塗布する。
次に、液晶駆動基板と透明電極基板とをシール材を介して貼り合わせる。
さらに、貼り合わされた液晶駆動基板及び透明電極基板を素子毎に分断する。
上述の不連続部は液晶を液晶駆動基板と透明電極基板との間隙に注入するための注入口となる。
First, a sealing material is applied in an annular shape with a discontinuous portion for each element on at least one of a liquid crystal driving substrate and a transparent electrode substrate.
Next, the liquid crystal driving substrate and the transparent electrode substrate are bonded together with a sealing material.
Further, the bonded liquid crystal driving substrate and transparent electrode substrate are divided for each element.
The discontinuous portion described above serves as an injection port for injecting liquid crystal into the gap between the liquid crystal driving substrate and the transparent electrode substrate.

次に、素子毎に、減圧環境下で液晶を注入口から上記間隙に注入する。
さらに、素子毎に、セルギャップ調整を行った後、注入口を封止剤で封止する。
以上の工程により、液晶表示素子が作製される。
Next, liquid crystal is injected into the gap from the injection port for each element under a reduced pressure environment.
Further, after adjusting the cell gap for each element, the inlet is sealed with a sealant.
Through the above steps, a liquid crystal display element is manufactured.

しかしながら、上述した液晶表示素子の製造方法では、分断された素子毎に減圧環境下の状態にして液晶の注入をそれぞれ行ったり、注入口を封止剤で素子毎に封止するため、生産性が悪いといった問題を有する。   However, in the above-described method for manufacturing a liquid crystal display element, the liquid crystal is injected under a reduced pressure environment for each divided element, or the injection port is sealed for each element with a sealing agent. Have the problem of being bad.

上述の問題を解決するための手段の一例が特許文献1に開示されている。
特許文献1に開示されている手段は、液晶駆動基板又は透明電極基板に、素子毎にシール材を不連続部を有さずに環状に塗布し、さらに環状内部に液晶を滴下した後、減圧環境下で液晶駆動基板と透明電極基板とを貼り合わせ、さらにセルギャップ調整を行った後にシール材を硬化させるものである。
An example of means for solving the above-described problem is disclosed in Patent Document 1.
The means disclosed in Patent Document 1 is applied to a liquid crystal driving substrate or a transparent electrode substrate by applying a sealing material in a ring shape without discontinuities for each element, dropping liquid crystal inside the ring, and then reducing the pressure. The sealing material is cured after the liquid crystal driving substrate and the transparent electrode substrate are bonded together under the environment and the cell gap is adjusted.

しかしながら、特許文献1に開示されているような手段では、液晶駆動基板と透明電極基板とを貼り合わせるときに、未硬化状態のシール材に液晶が接触するため、シール材が液晶中に溶出して液晶を汚染する場合がある。
液晶の汚染は液晶表示素子の表示品質を悪化させる要因となる。
However, with the means disclosed in Patent Document 1, when the liquid crystal driving substrate and the transparent electrode substrate are bonded together, the liquid crystal comes into contact with the uncured sealing material, so that the sealing material is eluted into the liquid crystal. May contaminate the LCD.
The contamination of the liquid crystal becomes a factor that deteriorates the display quality of the liquid crystal display element.

そこで、液晶の汚染を防止するための手段の一例が特許文献2に開示されている。
特許文献2に開示されている手段は、未硬化状態のシール材の表層部を全体に亘って半硬化させてから、液晶駆動基板と透明電極基板とを貼り合わせるものである。
An example of means for preventing liquid crystal contamination is disclosed in Patent Document 2.
The means disclosed in Patent Document 2 is a method in which the surface layer portion of the uncured sealing material is semi-cured over the whole, and then the liquid crystal driving substrate and the transparent electrode substrate are bonded together.

特開2005−148215号公報JP 2005-148215 A 特開2008−293000号公報JP 2008-293000 A

しかしながら、特許文献2に開示されている手段では、シール材の表層部全体を半硬化させるための硬化条件の設定が難しいという問題がある。
シール材の表層部の硬化が不十分だとシール材が液晶中に溶出して液晶を汚染してしまう。
一方、シール材の表層部を硬化しすぎると、硬化した表層部によってセルギャップ調整が困難になる。
However, the means disclosed in Patent Document 2 has a problem that it is difficult to set curing conditions for semi-curing the entire surface layer portion of the sealing material.
If the surface layer of the sealing material is not sufficiently cured, the sealing material will elute into the liquid crystal and contaminate the liquid crystal.
On the other hand, if the surface layer part of the sealing material is excessively cured, the cell gap adjustment becomes difficult due to the cured surface layer part.

また、特許文献2に開示されている手段では、シール材が形成されていない側の基板に、硬化した表層部を突き破るための複数の凸部を形成する凸部形成工程が必要であり、液晶表示素子の製造工程が煩雑になるため、生産性が悪く、さらなる改善が望まれる。   Further, the means disclosed in Patent Document 2 requires a protrusion forming step of forming a plurality of protrusions for breaking through the hardened surface layer portion on the substrate on which the sealing material is not formed. Since the manufacturing process of a display element becomes complicated, productivity is bad and the further improvement is desired.

そこで、本発明は、液晶がシール材によって汚染されることなく、セルギャップ調整を容易に行うことができ、生産性を向上できる液晶表示素子の製造方法を提供することを目的とする。   Therefore, an object of the present invention is to provide a method for manufacturing a liquid crystal display element that can easily adjust the cell gap without causing the liquid crystal to be contaminated by the sealing material and improve the productivity.

上記の課題を解決するために、本発明は次の液晶表示素子の製造方法を提供する。
1)複数の画素電極(3)が形成された表示画素領域(4)を有する液晶駆動基板(6)に、前記表示画素領域を囲うように光硬化性を有するシール材(21)を環状に塗布するシール材塗布工程と、前記シール材塗布工程の後に、前記表示画素領域上に液晶(23)を供給する液晶供給工程と、前記液晶供給工程の後に、透明電極(13)が形成された透明電極基板(15)と前記液晶駆動基板とを、前記複数の画素電極と前記透明電極とが向かい合い、かつ前記液晶と前記シール材とが互いに接触しないようにして、前記シール材を介して貼り合わせる貼り合わせ工程と、前記貼り合わせ工程の後に、前記シール材の内周表層部(A21)に所定照度の光(UV1)を照射する第1の光照射工程と、前記第1の光照射工程の後に、前記透明電極基板と前記液晶駆動基板とのセルギャップ調整を行うセルギャップ調整工程と、前記セルギャップ調整工程の後に、前記シール材全体に前記所定照度よりも高い照度の光(UV2)を照射する第2の光照射工程と、を有することを特徴とする液晶表示素子(30)の製造方法。
2)前記第1の光照射工程では、前記所定照度の光を、前記内周表層部に対応する領域が光透過領域(A25)である遮光マスク(25)を介して前記内周表層部に照射することを特徴とする1)記載の液晶表示素子の製造方法。
In order to solve the above problems, the present invention provides the following method for manufacturing a liquid crystal display element.
1) A sealing material (21) having a photo-curing property is annularly formed on a liquid crystal driving substrate (6) having a display pixel region (4) in which a plurality of pixel electrodes (3) are formed so as to surround the display pixel region. A sealing material application process for applying, a liquid crystal supply process for supplying liquid crystal (23) onto the display pixel region after the sealing material application process, and a transparent electrode (13) formed after the liquid crystal supply process. The transparent electrode substrate (15) and the liquid crystal drive substrate are bonded via the sealing material so that the plurality of pixel electrodes and the transparent electrode face each other and the liquid crystal and the sealing material do not contact each other. A bonding process for combining, a first light irradiation process for irradiating light (UV1) with a predetermined illuminance on the inner peripheral surface layer portion (A21) of the sealing material after the bonding process, and the first light irradiation process After A cell gap adjustment step for adjusting a cell gap between the electrode substrate and the liquid crystal driving substrate, and a second irradiation of light (UV2) with an illuminance higher than the predetermined illuminance on the entire sealing material after the cell gap adjustment step. A process for producing a liquid crystal display element (30).
2) In the first light irradiation step, the light having the predetermined illuminance is applied to the inner peripheral surface layer portion through a light shielding mask (25) whose region corresponding to the inner peripheral surface layer portion is a light transmission region (A25). Irradiating, the manufacturing method of the liquid crystal display element of 1 description characterized by the above-mentioned.

本発明によれば、液晶がシール材によって汚染されることなく、セルギャップ調整を容易に行うことができ、生産性を向上できるという効果を奏する。   According to the present invention, the cell gap can be easily adjusted without the liquid crystal being contaminated by the sealing material, and the productivity can be improved.

本発明の液晶表示素子の製造方法の実施例を説明するためのフローチャートである。It is a flowchart for demonstrating the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例における液晶駆動基板作製工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the liquid-crystal drive board | substrate preparation process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例における透明電極基板作製工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the transparent electrode substrate preparation process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例におけるシール材塗布工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the sealing material application | coating process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例における液晶滴下工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the liquid crystal dropping process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例における基板貼り合わせ工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the board | substrate bonding process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例におけるシール材半硬化工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the sealing material semi-hardening process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例におけるシール材半硬化工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the sealing material semi-hardening process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例におけるセルギャップ調整工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the cell gap adjustment process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例におけるシール材本硬化工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the sealing material main hardening process in the Example of the manufacturing method of the liquid crystal display element of this invention. 本発明の液晶表示素子の製造方法の実施例における素子分離工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the element separation process in the Example of the manufacturing method of the liquid crystal display element of this invention.

本発明の実施の形態を、好ましい実施例により図1〜図11を用いて説明する。
本発明に係る液晶表示素子の製造方法の実施例では、1つの半導体ウエハ及び1つの透明基板から複数の液晶表示素子が一度に得られるが、図2〜図11では、説明をわかりやすくするために便宜上、工程の初めから1つの液晶表示素子のみを示すこととする。
The preferred embodiments of the present invention will be described with reference to FIGS.
In the embodiment of the method for manufacturing a liquid crystal display element according to the present invention, a plurality of liquid crystal display elements can be obtained at one time from one semiconductor wafer and one transparent substrate. However, in FIGS. For convenience, only one liquid crystal display element is shown from the beginning of the process.

<実施例>
本実施例では、反射型の液晶表示素子の製造方法を例に挙げて説明するが、これに限定されるものではなく、本発明に係る液晶表示素子の製造方法を透過型の液晶表示素子に適用することも可能である。
<Example>
In this embodiment, a method for manufacturing a reflective liquid crystal display element will be described as an example. However, the present invention is not limited to this, and the method for manufacturing a liquid crystal display element according to the present invention is applied to a transmission liquid crystal display element. It is also possible to apply.

[液晶駆動基板作製工程]
図1(ステップ1)及び図2に示すように、まず、半導体基板1に、後述する液晶23を画素電極3ごとに駆動させる駆動回路部2を周知の半導体プロセスを用いて形成する。
次に、半導体基板1上に複数の画素電極3を形成する。複数の画素電極3が形成された領域は画像を表示するための表示画素領域4である。
さらに、半導体基板1上に、複数の画素電極3(表示画素領域4)を覆うように配向膜5を形成して、液晶駆動基板6を作製する。
[Liquid crystal drive substrate manufacturing process]
As shown in FIG. 1 (step 1) and FIG. 2, first, a drive circuit unit 2 for driving a liquid crystal 23 to be described later for each pixel electrode 3 is formed on a semiconductor substrate 1 using a known semiconductor process.
Next, a plurality of pixel electrodes 3 are formed on the semiconductor substrate 1. A region where the plurality of pixel electrodes 3 are formed is a display pixel region 4 for displaying an image.
Further, an alignment film 5 is formed on the semiconductor substrate 1 so as to cover the plurality of pixel electrodes 3 (display pixel regions 4), and the liquid crystal driving substrate 6 is manufactured.

実施例では、半導体基板1としてシリコン(Si)ウエハを用いた。
また、実施例では、画素電極3として、アルミニウム(Al)又は銀(Ag)の少なくともいずれかを主成分とする光反射型の電極を形成した。
また、実施例では、配向膜5としてラビング処理されたポリイミド膜、又は酸化シリコン膜等の無機配向膜を形成した。
In the example, a silicon (Si) wafer was used as the semiconductor substrate 1.
In the embodiment, as the pixel electrode 3, a light reflection type electrode containing at least one of aluminum (Al) and silver (Ag) as a main component is formed.
In the example, an inorganic alignment film such as a rubbed polyimide film or a silicon oxide film was formed as the alignment film 5.

[透明電極基板作製工程]
図1(ステップ2)及び図3に示すように、光透過性を有する透明基板11の一面11a側に反射防止膜12を形成し、他面11b側に光透過性を有する透明電極13及び配向膜14を順次形成して、透明電極基板15を作製する。
[Transparent electrode substrate manufacturing process]
As shown in FIG. 1 (step 2) and FIG. 3, an antireflection film 12 is formed on one surface 11a side of a transparent substrate 11 having light transmittance, and a transparent electrode 13 having light transmittance and orientation on the other surface 11b side. The film 14 is sequentially formed to produce the transparent electrode substrate 15.

実施例では、透明基板11としてガラス基板を用いた。
また、実施例では、反射防止膜12として酸化アルミニウム膜等の無機酸化膜を形成した。
また、実施例では、透明電極13としてITO(酸化インジウムスズ)膜を形成した。
また、実施例では、配向膜14としてラビング処理されたポリイミド膜、又は酸化シリコン膜等の無機配向膜を形成した。
In the example, a glass substrate was used as the transparent substrate 11.
In the example, an inorganic oxide film such as an aluminum oxide film was formed as the antireflection film 12.
In the example, an ITO (indium tin oxide) film was formed as the transparent electrode 13.
In the example, an inorganic alignment film such as a rubbed polyimide film or a silicon oxide film was formed as the alignment film 14.

上述した“液晶駆動基板作製工程”及び“透明電極基板作製工程”の順序は限定されるものではない。
“透明電極基板作製工程”後に“液晶駆動基板作製工程”を行ってもよく、“透明電極基板作製工程”と“液晶駆動基板作製工程”とを同時に並行して行ってもよい。
The order of the above-mentioned “liquid crystal driving substrate manufacturing process” and “transparent electrode substrate manufacturing process” is not limited.
The “liquid crystal driving substrate manufacturing process” may be performed after the “transparent electrode substrate manufacturing process”, or the “transparent electrode substrate manufacturing process” and the “liquid crystal driving substrate manufacturing process” may be performed in parallel.

[シール材塗布工程]
図1(ステップ3)及び図4に示すように、シール材21を液晶駆動基板6上に、表示画素領域4を囲うように環状に塗布する。
[Sealing material application process]
As shown in FIG. 1 (step 3) and FIG. 4, the sealing material 21 is applied on the liquid crystal driving substrate 6 in an annular shape so as to surround the display pixel region 4.

実施例では、シール材21として、未硬化状態の樹脂21aに所定の直径を有する球状粒子であるスペーサ21bが分散したものを用いた。
また、実施例では、樹脂21aとして、紫外線と熱による併用硬化型の樹脂を用いた。
なお、シール材21は実施例に限定されるものではなく、少なくとも光硬化性を有する樹脂を含むものであればよい。
In the embodiment, as the sealing material 21, a material in which spacers 21b which are spherical particles having a predetermined diameter are dispersed in an uncured resin 21a is used.
In the example, a combined curing resin using ultraviolet rays and heat was used as the resin 21a.
In addition, the sealing material 21 is not limited to an Example, What is necessary is just to contain the resin which has photocurability at least.

また、実施例では、液晶駆動基板6側にシール材21を塗布したが、これに限定されるものではなく、例えば透明電極基板15側にシール材21を塗布してもよく、また液晶駆動基板6側及び透明電極基板15側にシール材21をそれぞれ塗布してもよい。   In the embodiment, the sealing material 21 is applied to the liquid crystal driving substrate 6 side. However, the present invention is not limited to this. For example, the sealing material 21 may be applied to the transparent electrode substrate 15 side. The sealing material 21 may be applied to the 6 side and the transparent electrode substrate 15 side, respectively.

[液晶滴下工程]
図1(ステップ4)及び図5に示すように、シール材21で囲われた表示画素領域4上に液晶23を所定量、滴下する。
[Liquid crystal dropping process]
As shown in FIG. 1 (step 4) and FIG. 5, a predetermined amount of liquid crystal 23 is dropped onto the display pixel region 4 surrounded by the sealing material 21.

[基板貼り合わせ工程]
図1(ステップ5)及び図6に示すように、減圧環境下で、液晶駆動基板6と透明電極基板15とを、画素電極3(又は配向膜5)と透明電極13(又は配向膜14)とが対向するようにして貼り合わせる。
このとき、液晶23は、液晶駆動基板6の配向膜5及び透明電極基板15の配向膜14にそれぞれ接触しているが、未硬化状態のシール材21には接触していない。
[Board bonding process]
As shown in FIG. 1 (step 5) and FIG. 6, the liquid crystal drive substrate 6 and the transparent electrode substrate 15 are replaced with the pixel electrode 3 (or alignment film 5) and the transparent electrode 13 (or alignment film 14) under a reduced pressure environment. Paste them so that they face each other.
At this time, the liquid crystal 23 is in contact with the alignment film 5 of the liquid crystal driving substrate 6 and the alignment film 14 of the transparent electrode substrate 15, but not in contact with the uncured sealing material 21.

実施例では、所定の圧力に減圧された真空チャンバ内で液晶駆動基板6と透明電極基板15との貼り合わせを行った。   In the example, the liquid crystal drive substrate 6 and the transparent electrode substrate 15 were bonded together in a vacuum chamber depressurized to a predetermined pressure.

[シール材半硬化工程]
図1(ステップ6)及び図7に示すように、減圧環境下において、遮光マスク25を用いて、環状に塗布されたシール材21の内周面を含む内周表層部A21に低照度の紫外線UV1を照射する。
遮光マスク25は、内周表層部A21に対応する領域が光透過領域A25となっており、光透過領域A25以外の領域は、シール材21の内周表層部A21以外の領域B21及び表示画素領域4に紫外線UV1が照射されないように遮光領域B25となっている。
[Seal material semi-curing process]
As shown in FIG. 1 (step 6) and FIG. 7, low-intensity ultraviolet rays are applied to the inner peripheral surface portion A21 including the inner peripheral surface of the annularly applied sealing material 21 using a light shielding mask 25 under a reduced pressure environment. Irradiate UV1.
In the light shielding mask 25, a region corresponding to the inner peripheral surface layer portion A21 is a light transmitting region A25, and regions other than the light transmitting region A25 are regions B21 other than the inner peripheral surface layer portion A21 of the sealing material 21 and display pixel regions. 4 is a light shielding region B25 so that ultraviolet rays UV1 are not irradiated.

低照度の紫外線UV1が照射された内周表層部A21(樹脂21a)は半硬化状態になる(図8参照)。
ここでいう半硬化状態とは、液晶23がシール材21に接触した際にシール材21(樹脂21a)が液晶23中に溶出しない程度に硬化した状態をいう。
The inner peripheral surface portion A21 (resin 21a) irradiated with the low-intensity ultraviolet ray UV1 is in a semi-cured state (see FIG. 8).
The semi-cured state here refers to a state where the sealing material 21 (resin 21 a) is cured to the extent that it does not elute into the liquid crystal 23 when the liquid crystal 23 comes into contact with the sealing material 21.

このとき、シール材21において、半硬化状態とされた内周表層部A21以外の領域B21(樹脂21a)は未硬化状態である。
また、このとき、液晶23は、シール材21の半硬化状態とされた内周表層部A21とは接触していない。
また、このとき、液晶駆動基板6,透明電極基板15,シール材21,及び液晶23によって囲まれた空隙Sは、減圧された閉空間となっている。
At this time, in the sealing material 21, the region B21 (resin 21a) other than the inner peripheral surface layer portion A21 in a semi-cured state is in an uncured state.
At this time, the liquid crystal 23 is not in contact with the inner peripheral surface layer portion A21 in which the sealing material 21 is in a semi-cured state.
At this time, the space S surrounded by the liquid crystal driving substrate 6, the transparent electrode substrate 15, the sealing material 21, and the liquid crystal 23 is a closed space where the pressure is reduced.

[セルギャップ調整工程]
図1(ステップ7)及び図9に示すように、大気圧環境下で、液晶駆動基板6と透明電極基板15とのセルギャップ及びその分布範囲が所定の値及び所定の分布範囲となるようにセルギャップ調整を行う。
このセルギャップ調整の際に、液晶23は外周部に向かって広がるため、減圧状態の空隙Sは液晶23で充填される。
[Cell gap adjustment process]
As shown in FIG. 1 (step 7) and FIG. 9, the cell gap between the liquid crystal drive substrate 6 and the transparent electrode substrate 15 and the distribution range thereof are set to a predetermined value and a predetermined distribution range under an atmospheric pressure environment. Adjust the cell gap.
At the time of this cell gap adjustment, the liquid crystal 23 expands toward the outer peripheral portion, so that the void S in the reduced pressure state is filled with the liquid crystal 23.

セルギャップ調整の際、液晶23はシール材21の内周表層部A21に接触するが、内周表層部A21(樹脂21a)は半硬化状態にあるため、シール材21(樹脂21a)が液晶23中に溶出することを防止できる。
また、シール材半硬化工程で低照度の紫外線UV1を照射した際、内周表層部A21が所望の半硬化状態よりもさらに硬化が進んだ状態になってしまった場合においても、未硬化状態の領域B21のシール材21が外周方向に容易に広がるので、シール材21の形状は容易に変化する。このため、セルギャップ調整を容易に、かつ高精度に行うことができる。
また、セルギャップ調整の際、シール材21は外周部側で変形するものの、内周表層部A21は半硬化状態にあるので、内周部側ではほとんど変形しない。そのため、液晶23が充填される領域におけるセルギャップ調整による体積変化を抑制することができるので、セルギャップ調整を容易に、かつ高精度に行うことができる。
When adjusting the cell gap, the liquid crystal 23 comes into contact with the inner peripheral surface portion A21 of the sealing material 21, but the inner peripheral surface layer portion A21 (resin 21a) is in a semi-cured state, and therefore the sealing material 21 (resin 21a) is in the liquid crystal 23. Elution into the inside can be prevented.
Further, even when the inner peripheral surface layer portion A21 is in a state where the curing has progressed further than the desired semi-cured state when the UV light UV1 having low illuminance is irradiated in the semi-curing process of the sealing material, Since the sealing material 21 in the region B21 easily spreads in the outer peripheral direction, the shape of the sealing material 21 easily changes. For this reason, cell gap adjustment can be performed easily and with high accuracy.
Further, when the cell gap is adjusted, the sealing material 21 is deformed on the outer peripheral side, but the inner peripheral surface layer portion A21 is in a semi-hardened state, and therefore hardly deforms on the inner peripheral portion side. Therefore, the volume change due to the cell gap adjustment in the region filled with the liquid crystal 23 can be suppressed, so that the cell gap adjustment can be performed easily and with high accuracy.

[シール材本硬化工程]
図1(ステップ8)及び図10に示すように、遮光マスク27を用いて、表示画素領域4が遮光された状態で、シール材21全体に紫外線UV1よりも高照度の紫外線UV2を照射する。
遮光マスク27は、シール材21に対応する領域が光透過領域A27となっており、光透過領域A27以外の領域は、表示画素領域4に紫外線UV2が照射されないように遮光領域B27となっている。
[Seal material main curing process]
As shown in FIG. 1 (step 8) and FIG. 10, using the light shielding mask 27, the entire sealing material 21 is irradiated with ultraviolet rays UV2 having a higher illuminance than the ultraviolet rays UV1 in a state where the display pixel region 4 is shielded from light.
In the light shielding mask 27, a region corresponding to the sealing material 21 is a light transmission region A27, and a region other than the light transmission region A27 is a light shielding region B27 so that the display pixel region 4 is not irradiated with the ultraviolet rays UV2. .

さらに、図1(ステップ9)及び図11に示すように、上記の液晶駆動基板6と透明電極基板15との貼り合わせ構造体29を所定の時間、所定の温度で加熱することにより、シール材21全体を本硬化させる。
ここでいう本硬化とは、硬化後のシール材21(樹脂21a)が所望の特性(例えば液晶駆動基板6及び透明電極基板15との密着強度や吸水率等)を有する状態になることをいう。
Further, as shown in FIG. 1 (step 9) and FIG. 11, the bonded structure 29 of the liquid crystal driving substrate 6 and the transparent electrode substrate 15 is heated at a predetermined temperature for a predetermined time, thereby providing a sealing material. 21 is fully cured.
Here, the main curing means that the cured sealing material 21 (resin 21a) has a desired characteristic (for example, adhesion strength between the liquid crystal driving substrate 6 and the transparent electrode substrate 15 and water absorption). .

[素子分離工程]
図1(ステップ10)に示すように、上記工程を経た貼り合わせ構造体29を素子毎に分断することにより、液晶表示素子30(図10参照)が一度に複数得られる。
[Element isolation process]
As shown in FIG. 1 (step 10), a plurality of liquid crystal display elements 30 (see FIG. 10) are obtained at a time by dividing the bonded structure 29 that has undergone the above-described process into each element.

上述した液晶表示素子の製造方法によれば、特に、液晶と接触する側のシール材の内周表層部のみを半硬化させた状態でセルギャップ調整をした後に、シール材全体を本硬化させることにより、液晶がシール材によって汚染されることなく、セルギャップ調整を容易に行うことができ、また、硬化した表層部を突き破るための複数の凸部を形成する必要がないので生産性を向上できるという効果を奏します。   According to the above-described method for manufacturing a liquid crystal display element, in particular, after the cell gap is adjusted in a state where only the inner peripheral surface layer portion of the sealing material on the side in contact with the liquid crystal is semi-cured, the entire sealing material is fully cured. This makes it possible to easily adjust the cell gap without the liquid crystal being contaminated by the sealing material, and it is not necessary to form a plurality of convex portions for breaking through the hardened surface layer portion, thereby improving productivity. The effect is.

本発明の実施例は、上述した構成及び手順に限定されるものではなく、本発明の要旨を逸脱しない範囲において変形例としてもよいのは言うまでもない。   The embodiment of the present invention is not limited to the configuration and procedure described above, and it goes without saying that modifications may be made without departing from the scope of the present invention.

例えば、実施例では、シール材の内周面を含む内周表層部のみに紫外線UV1を照射するために遮光マスク25を用いたが、これに限定されるものではない。
遮光マスク25に替えて、光ファイバやレンズ等の光学部材を用い、紫外線UV1をスポット状に集光させてシール材の内周に沿って環状に走査させるようにしてもよいし、紫外線UV1をライン状に集光させてシール材の内周面を含む内周表層部のみを硬化するようにしてもよい。
For example, in the embodiment, the light shielding mask 25 is used to irradiate the ultraviolet ray UV1 only on the inner peripheral surface layer portion including the inner peripheral surface of the sealing material. However, the present invention is not limited to this.
Instead of the light shielding mask 25, an optical member such as an optical fiber or a lens may be used so that the ultraviolet ray UV1 is condensed in a spot shape and scanned in an annular shape along the inner periphery of the sealing material. Only the inner peripheral surface layer portion including the inner peripheral surface of the sealing material may be cured by condensing in a line shape.

また、実施例では、表示画素領域を遮光してシール材全体に紫外線UV2を照射するために遮光マスク27を用いたが、これに限定されるものではない。
遮光マスク27に替えて、光ファイバやレンズ等の光学部材を用い、紫外線UV2をスポット状に集光させてシール材の内周に沿って環状に走査させるようにしてもよいし、紫外線UV2をライン状に集光させてシール材の内周面を含む内周表層部のみを硬化するようにしてもよい。
In the embodiment, the light shielding mask 27 is used to shield the display pixel region and irradiate the entire sealing material with the ultraviolet ray UV2. However, the present invention is not limited to this.
Instead of the light shielding mask 27, an optical member such as an optical fiber or a lens may be used so that the ultraviolet ray UV2 is condensed in a spot shape and scanned in an annular shape along the inner periphery of the sealing material. Only the inner peripheral surface layer portion including the inner peripheral surface of the sealing material may be cured by condensing in a line shape.

1_半導体基板
2_駆動回路部
3_画素電極
4_表示画素領域
5,14_配向膜
6_液晶駆動基板
11_透明基板、11a,11b_面
12_反射防止膜
13_透明電極
15_透明電極基板
21_シール材、21a_樹脂、21b_スペーサ
23_液晶
25,27_遮光マスク
29_貼り合わせ構造体
30_液晶表示素子
A21_内周表層部、UV1,UV2_紫外線、S_空隙
DESCRIPTION OF SYMBOLS 1_ Semiconductor substrate 2_ Drive circuit part 3_ Pixel electrode 4_ Display pixel area 5, 14_ Alignment film 6_ Liquid crystal drive substrate 11_ Transparent substrate, 11a, 11b_ Surface 12_ Antireflection film 13_ Transparent electrode 15_ Transparent electrode substrate 21_ Seal material, 21a_ Resin, 21b_ Spacer 23_liquid crystal 25, 27_light shielding mask 29_bonding structure 30_liquid crystal display element A21_inner peripheral surface layer, UV1, UV2_ultraviolet light, S_gap

Claims (2)

複数の画素電極が形成された表示画素領域を有する液晶駆動基板に、前記表示画素領域を囲うように光硬化性を有するシール材を環状に塗布するシール材塗布工程と、
前記シール材塗布工程の後に、前記表示画素領域上に液晶を供給する液晶供給工程と、
前記液晶供給工程の後に、透明電極が形成された透明電極基板と前記液晶駆動基板とを、前記複数の画素電極と前記透明電極とが向かい合い、かつ前記液晶と前記シール材とが互いに接触しないようにして、前記シール材を介して貼り合わせる貼り合わせ工程と、
前記貼り合わせ工程の後に、前記シール材の内周表層部に所定照度の光を照射する第1の光照射工程と、
前記第1の光照射工程の後に、前記透明電極基板と前記液晶駆動基板とのセルギャップ調整を行うセルギャップ調整工程と、
前記セルギャップ調整工程の後に、前記シール材全体に前記所定照度よりも高い照度の光を照射する第2の光照射工程と、
を有することを特徴とする液晶表示素子の製造方法。
A sealing material application step of annularly applying a photocurable sealant so as to surround the display pixel area on a liquid crystal driving substrate having a display pixel area in which a plurality of pixel electrodes are formed;
A liquid crystal supply step for supplying liquid crystal onto the display pixel region after the sealing material application step;
After the liquid crystal supplying step, the transparent electrode substrate on which the transparent electrode is formed and the liquid crystal driving substrate are arranged such that the plurality of pixel electrodes and the transparent electrode face each other, and the liquid crystal and the sealing material do not contact each other. Then, a bonding step of bonding through the sealing material,
A first light irradiation step of irradiating the inner peripheral surface layer portion of the sealing material with light having a predetermined illuminance after the bonding step;
A cell gap adjusting step for adjusting a cell gap between the transparent electrode substrate and the liquid crystal driving substrate after the first light irradiation step;
After the cell gap adjustment step, a second light irradiation step of irradiating the entire sealing material with light having an illuminance higher than the predetermined illuminance,
A method for producing a liquid crystal display element, comprising:
前記第1の光照射工程では、前記所定照度の光を、前記内周表層部に対応する領域が光透過領域である遮光マスクを介して前記内周表層部に照射することを特徴とする請求項1記載の液晶表示素子の製造方法。   The said 1st light irradiation process irradiates the said inner peripheral surface layer part through the light-shielding mask whose area | region corresponding to the said inner peripheral surface layer part is a light transmissive area | region with the said predetermined illumination intensity light. Item 2. A method for producing a liquid crystal display element according to Item 1.
JP2010032328A 2010-02-17 2010-02-17 Method for manufacturing liquid crystal display elements Pending JP2011170024A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020194112A (en) * 2019-05-29 2020-12-03 株式会社Jvcケンウッド Liquid crystal device manufacturing apparatus, liquid crystal device manufacturing method, and liquid crystal device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020194112A (en) * 2019-05-29 2020-12-03 株式会社Jvcケンウッド Liquid crystal device manufacturing apparatus, liquid crystal device manufacturing method, and liquid crystal device
JP7346911B2 (en) 2019-05-29 2023-09-20 株式会社Jvcケンウッド Liquid crystal device manufacturing equipment and liquid crystal device manufacturing method

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