JP2011165899A - Method of manufacturing wiring board - Google Patents

Method of manufacturing wiring board Download PDF

Info

Publication number
JP2011165899A
JP2011165899A JP2010027065A JP2010027065A JP2011165899A JP 2011165899 A JP2011165899 A JP 2011165899A JP 2010027065 A JP2010027065 A JP 2010027065A JP 2010027065 A JP2010027065 A JP 2010027065A JP 2011165899 A JP2011165899 A JP 2011165899A
Authority
JP
Japan
Prior art keywords
metal frame
wiring board
pair
plan
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010027065A
Other languages
Japanese (ja)
Other versions
JP5331022B2 (en
Inventor
Akihiro Fukada
明宏 深田
Ken Masuda
健 増田
Sho Sukemori
翔 祐森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Niterra Co Ltd
Original Assignee
NGK Spark Plug Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Spark Plug Co Ltd filed Critical NGK Spark Plug Co Ltd
Priority to JP2010027065A priority Critical patent/JP5331022B2/en
Publication of JP2011165899A publication Critical patent/JP2011165899A/en
Application granted granted Critical
Publication of JP5331022B2 publication Critical patent/JP5331022B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a wiring board capable of reliably reducing deformation of a metal frame, and warpage and cracks of a multiple-pattern base board when tentatively mounting the metal frame on a metalized layer formed on a surface of each wiring board and having a rectangular shape in a plan view, in a manufacturing method by multiple patterning of a wiring board. <P>SOLUTION: The method of manufacturing a wiring board 8 includes a tentatively-mounting step of mounting a metal frame 16 having a rectangular shape in a plan view and arranged with a brazing material layer 15 on the bottom surface on a metalized layer 14 formed along respective sides of a surface 3 for each wiring board 8 and having an oblong (rectangular) frame-like shape in a plan view, individually bringing a pair of electrodes 18 into contact with two parts on the upper surface of the metal frame 16 to carry a current thereto, and melting/solidifying only a part of the brazing material layer 15, thereby fixing the metal frame 16 to the surface 3 of the wiring board 8. In the tentatively-mounting step of the method of manufacturing a wiring board 8, the current is carried to the pair of electrodes 18 in the state individually brought into contact with positions in the vicinities of both ends of one long side without becoming point-symmetrical with respect to the center cp of four sides constituting the metal frame 16 in a plan view out of the upper surfaces of the four sides. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、全体が箱形状で且つその開口部に設けた金属枠上を蓋板で封止される配線基板、または全体が板形状で且つその表面の周辺に沿って設けた金属枠上を箱形の蓋材で封止される配線基板を、多数個取りにより製造する方法に関する。   The present invention provides a wiring board that is entirely box-shaped and sealed on a metal frame provided in the opening with a cover plate, or a metal board that is entirely plate-shaped and provided along the periphery of the surface. The present invention relates to a method of manufacturing a plurality of wiring boards sealed with a box-shaped lid.

例えば、水晶振動子などの電子部品を内側に収納した箱形のパッケージにおける平面視が長方形の上面にメタライズ層の封止材を形成し、該封止材の上に沿って設けたAu−Sn合金やハンダなどの低融点金属を平面視で互いに点対称となる2箇所ないし4箇所で点状に熱融着して仮付けした後、上記低融点金属の全体を熱融着することで、封止部の上に載置した金属蓋を固着する小型電子部品パッケージの封止方法が提案されている(例えば、特許文献1参照)。
更に、セラミック基板上に形成された矩形の金属層の上に、これと相似形の金属リングを所要の姿勢で仮止めするため、アクリル系樹脂からなる仮止め剤を上記金属層の対辺に少なくとも一対(点対称の位置)以上点状にして塗布し、かかる複数の仮止め剤の上に、平面視が同じ枠形の金属層と金属ロウとをクラッドした矩形の金属リングを載置し、該金属ロウを溶融させ、且つ上記仮止め剤を蒸発または加熱分解させて、セラミック基板上に金属リングを接合する矩形金属リングのロウ付け方法も提案されている(例えば、特許文献2参照)。
For example, a metallized layer sealing material is formed on the upper surface of a rectangular package in a box-shaped package containing electronic components such as a crystal resonator inside, and Au-Sn provided along the sealing material After the low melting point metal such as an alloy or solder is point-sealed in two or four points that are symmetrical with respect to each other in a plan view and temporarily attached, the whole of the low melting point metal is thermally fused. A method for sealing a small electronic component package in which a metal lid placed on a sealing portion is fixed has been proposed (for example, see Patent Document 1).
Furthermore, in order to temporarily fix a metal ring similar to this on a rectangular metal layer formed on the ceramic substrate in a required posture, a temporary fixing agent made of an acrylic resin is at least on the opposite side of the metal layer. A pair of (point-symmetrical positions) or more is applied in the form of a dot, and a rectangular metal ring clad with a frame-shaped metal layer and a metal solder having the same plan view is placed on the plurality of temporary fixing agents, There has also been proposed a brazing method for a rectangular metal ring in which the metal braze is melted and the temporary fixing agent is evaporated or thermally decomposed to join a metal ring onto a ceramic substrate (see, for example, Patent Document 2).

ところで、絶縁材からなる基板の表面上に形成された矩形の金属層の上に、これと相似形の金属枠を固定する場合、特許文献2に記載の矩形金属リングのロウ付け方法のように、樹脂製の仮止め剤を用いると、その仮止めした位置に微細な空隙を生じ得るため、金属層と矩形金属リングとの間における封止性が損なわれるおそれがあった。
一方、上記樹脂製の仮止め剤に替えて、特許文献1のようにハンダなどの低融点金属を用いて仮付けすることも可能である。
しかし、配線基板の多数個取りによる製造方法において、平面視が矩形の金属層と金属枠との間に、上記低融点金属を点状に少なくとも一対以上、点対称の位置で溶融して仮付けした場合、上記低融点金属の溶融・凝固に伴って生じる応力によって、多数個取り用のベース基板に反りやクラックが発生したり、金属枠が変形する場合がある。これに起因して、金属枠と金属蓋との封止性が損なわれるおそれがあった。
By the way, when a similar metal frame is fixed on a rectangular metal layer formed on the surface of a substrate made of an insulating material, as in the rectangular metal ring brazing method described in Patent Document 2. If a temporary fixing agent made of a resin is used, a fine gap may be generated at the temporarily fixed position, which may impair the sealing performance between the metal layer and the rectangular metal ring.
On the other hand, instead of the resin temporary fixing agent, it is possible to temporarily attach using a low melting point metal such as solder as disclosed in Patent Document 1.
However, in a manufacturing method using a large number of wiring boards, at least one pair of the low melting point metals is melted at a point-symmetrical position between a metal layer and a metal frame that are rectangular in plan view, and temporarily attached. In such a case, warp and cracks may occur in the base substrate for taking a large number of pieces, or the metal frame may be deformed due to the stress generated as the low melting point metal melts and solidifies. Due to this, the sealing performance between the metal frame and the metal lid may be impaired.

特開2004−6457号公報(第1〜4頁、図1〜3)JP 2004-6457 A (pages 1 to 4, FIGS. 1 to 3) 特開2007−237239号公報(第1〜15頁、図1〜4)JP 2007-237239 A (pages 1 to 15, FIGS. 1 to 4)

本発明は、背景技術で説明した問題点を解決し、多数個取りによる配線基板の製造方法において、配線基板ごとの表面に形成した平面視が矩形のメタライズ層の上に金属枠を仮付けするに際し、該金属枠の変形や多数個取り用のベース基板の反りやクラックの発生を確実に低減する配線基板の製造方法を提供する、ことを課題とする。   The present invention solves the problems described in the background art and temporarily attaches a metal frame on a metallized layer having a rectangular shape in plan view formed on the surface of each wiring board in a method of manufacturing a wiring board by multi-cavity. In doing so, it is an object to provide a method of manufacturing a wiring board that reliably reduces the deformation of the metal frame and the occurrence of warping and cracking of a base substrate for taking multiple pieces.

課題を解決するための手段および発明の効果Means for Solving the Problems and Effects of the Invention

本発明は、前記課題を解決するため、配線基板ごとの表面に形成した平面視が矩形のメタライズ層と金属枠との間において、ロウ材を一箇所のみで溶融・凝固させて仮付けする、ことに着想して成されたものである。
即ち、本発明による配線基板の製造方法(請求項1)は、絶縁材からなり、平面視が矩形の表面および裏面を有する配線基板を縦横の平面方向に沿って複数個配置した多数個取りのベース基板において、上記配線基板ごとの表面の各辺に沿って形成した平面視が矩形枠状のメタライズ層の上に、平面視が矩形で且つ底面にロウ材層が配置された金属枠を載置し、かかる金属枠の上面の2箇所に一対の電極を個別に接触および通電して、上記ロウ材層の一部のみを溶融・凝固することで、上記金属枠を上記配線基板の表面に固定する仮付け工程を含む配線基板の製造方法であって、上記仮付け工程において、一対の電極は、平面視で上記金属枠を構成する四辺の上面のうち、かかる四辺の中心に対して互いに点対称とはならない2つの位置に個別に接触した状態で通電される、ことを特徴とする。
In order to solve the above-mentioned problem, the present invention temporarily fixes the brazing material by melting and solidifying at only one place between the metallized layer and the metal frame having a rectangular plan view formed on the surface of each wiring board. It was created with the idea in mind.
That is, a method for manufacturing a wiring board according to the present invention (Claim 1) is a multi-piece manufacturing method in which a plurality of wiring boards made of an insulating material and having a front surface and a back surface that are rectangular in plan view are arranged along a vertical and horizontal plane direction. On the base substrate, a metal frame having a rectangular shape in plan view and a brazing material layer disposed on the bottom surface is mounted on the metallized layer having a rectangular shape in plan view formed along each side of the surface of each wiring board. A pair of electrodes are individually contacted and energized at two locations on the upper surface of the metal frame, and only a part of the brazing material layer is melted and solidified, whereby the metal frame is placed on the surface of the wiring board. A method of manufacturing a wiring board including a fixing step of fixing, wherein in the temporary fixing step, the pair of electrodes are mutually connected to the center of the four sides of the upper surface of the four sides constituting the metal frame in a plan view. Individual at two positions that are not point-symmetric It is energized in contact with, and wherein the.

これによれば、前記一対の電極から通電された電流は、平面視で前記金属枠を構成する四辺における上記一対の電極を隔てる2つの経路のうち、相対的に短い側の経路を流れると共に、かかる短い経路をほぼ二等分する中間位置で且つ各電極から最も離れている位置において、最も熱エネルギが高くなる。その結果、かかる中間位置における一箇所の(一部の)ロウ材層のみが円形状(点状)に小さく溶融する。この溶融・凝固したロウ材層の一部のみを介して、金属枠がメタライズ層に仮付けされるので、従来のように点対称の2箇所以上の位置で仮付けする方法に比べ、ロウ材の溶融・凝固に伴う金属枠や多数個取り用のベース基板に生じる応力が少なくなる。従って、上記ベース基板に反りやクラックが発生したり、金属枠が熱変形するなどの不具合を確実に低減し、封止性の高い配線基板を効率良く製造できる。
前記仮(ロウ)付け工程の後には、多数個取り用のベース基板を加熱炉内にて、前記ロウ材層全体を溶融および凝固させる本(ロウ)付け工程により、配線基板ごとのメタライズ層と金属枠とがこれらの全周に沿って固定される。
According to this, the current supplied from the pair of electrodes flows through a relatively short path among the two paths separating the pair of electrodes on the four sides constituting the metal frame in plan view. The thermal energy is highest at an intermediate position that bisects the short path and at a position farthest from each electrode. As a result, only one (partial) brazing material layer at the intermediate position melts into a small circle (dot). Since the metal frame is temporarily attached to the metallized layer through only a part of the molten and solidified brazing material layer, the brazing material is compared with the conventional method of temporarily attaching at two or more point symmetrical positions. The stress generated in the metal frame and the base substrate for taking a large number due to melting and solidification of the metal is reduced. Therefore, defects such as warpage and cracks in the base substrate and thermal deformation of the metal frame can be reliably reduced, and a wiring substrate with high sealing performance can be efficiently manufactured.
After the temporary (brazing) step, a metallized layer for each wiring board is formed by a main (brazing) step of melting and solidifying the entire brazing material layer in a heating furnace with a base substrate for multi-piece taking. A metal frame is fixed along these entire circumferences.

尚、前記絶縁材には、各種のセラミック、あるいは各種の樹脂が含まれる。
また、前記矩形は、長方形と正方形とを含む。
更に、前記配線基板の表面は、平坦面である形態のほか、平面視で当該表面の四辺に沿った四つの側壁と、これらに囲まれた平面視が上記表面とほぼ相似形である矩形の底面と、を有するキャビティを有する形態でも良い。
また、前記一対の電極は、転動可能なローラのほか、ピン状の形態でも良い。
加えて、ロウ材層の一部が溶融・凝固する部位は、前記円形状のほか、楕円形状の形態も含まれる。
The insulating material includes various ceramics or various resins.
The rectangle includes a rectangle and a square.
Furthermore, the surface of the wiring board has a flat surface, four side walls along the four sides of the surface in plan view, and a rectangular shape in which the plan view surrounded by these is substantially similar to the surface. A form having a cavity having a bottom surface is also possible.
The pair of electrodes may be in the form of a pin in addition to a rollable roller.
In addition, the part where a part of the brazing material layer is melted and solidified includes not only the circular shape but also an elliptical shape.

また、本発明には、前記仮付け工程において、一対の電極は、平面視で前記金属枠を構成する四辺のうち、何れか一つの辺の両端付近に接触するか、あるいは、隣接する一対の辺の中間同士の位置に接触した状態で通電される、配線基板の製造方法(請求項2)も含まれる。
これによれば、前記一対の電極から給電された電流によって、金属枠を構成する四辺の何れか一つの辺を二等分する中間位置、あるいは、隣接する一対の辺の中間同士の間をほぼ二等分する中間位置(金属枠が正方形の形態では、そのコーナ付近)において、最も熱エネルギが高くなり、これらの位置における一箇所のロウ材層のみが小さな円形状にして溶融・凝固する。その結果、前記従来の方法に比べて、金属枠や多数個取り用のベース基板に生じる応力が少なくなるため、上記ベース基板に反りやクラックが生じたり、金属枠が熱変形するなどの不具合を確実に低減することが可能となる。
In the present invention, in the tacking step, the pair of electrodes are in contact with the vicinity of both ends of any one of the four sides constituting the metal frame in a plan view, or a pair of adjacent pairs. Also included is a method of manufacturing a wiring board in which power is supplied while being in contact with the middle positions of the sides (claim 2).
According to this, by the current fed from the pair of electrodes, an intermediate position that bisects any one of the four sides constituting the metal frame, or between the middle of a pair of adjacent sides. At an intermediate position that bisects (in the case of a metal frame having a square shape, near its corner), the thermal energy is highest, and only one brazing material layer at these positions is melted and solidified into a small circular shape. As a result, compared to the conventional method, the stress generated in the metal frame and the base substrate for multi-cavity is reduced, so that the base substrate is warped or cracked, or the metal frame is thermally deformed. It becomes possible to reduce it reliably.

更に、本発明には、前記仮付け工程において、一対の電極は、平面視で前記金属枠の隣接する一対の辺のうち、一方の辺の中間位置と、他方の辺で且つ一方の辺から離れた端部と接触した状態で通電される、配線基板の製造方法(請求項3)も含まれる。
これによれば、前記一対の電極から給電された電流によって、金属枠を構成する四辺の隣接する一対の辺のうち、一方の辺の中間位置と、他方の辺で且つ一方の辺から離れた端部との間をほぼ二等分する中間位置において、最も熱エネルギが高くなり、この位置における一箇所のロウ材層のみが小さな円形状にして溶融・凝固する。その結果、前記同様の不具合を確実に低減することが可能となる。
Further, according to the present invention, in the tacking step, the pair of electrodes includes an intermediate position of one side of the pair of adjacent sides of the metal frame in a plan view, and the other side and from one side. Also included is a method for manufacturing a wiring board in which power is supplied in contact with a remote end (claim 3).
According to this, the current fed from the pair of electrodes is separated from the middle position of one side and the other side and from one side of a pair of adjacent sides of the four sides constituting the metal frame. At an intermediate position that bisects the edge, the heat energy is highest, and only one brazing material layer at this position is melted and solidified in a small circular shape. As a result, it is possible to reliably reduce the same problems as described above.

また、本発明には、前記複数の配線基板の表面は、平面視が長方形であり、前記仮付け工程において、一対の電極は、平面視で前記金属枠を構成する四辺のうち、対向する一対の短辺ごとにおける長手方向の中央付近を除いた異なる位置に個別に接触した状態で通電される、配線基板の製造方法(請求項4)も含まれる。
これによれば、前記一対の電極から給電された電流によって、金属枠を構成する四辺のうち、対向する一対の短辺に挟まれた長辺で且つ各電極の接触位置の間をほぼ二等分する中間位置において、最も電圧と熱エネルギとが高くなり、この位置の一箇所のロウ材層のみが円形状に小さく溶融・凝固する。その結果、前記同様の不具合を確実に低減することが可能となる。
Further, according to the present invention, the surfaces of the plurality of wiring boards are rectangular in plan view, and in the tacking step, the pair of electrodes are a pair of opposing ones of the four sides constituting the metal frame in plan view. Also included is a method for manufacturing a wiring board in which power is supplied in a state of being individually in contact with different positions excluding the vicinity of the center in the longitudinal direction for each short side.
According to this, by the electric current supplied from the pair of electrodes, the long side sandwiched between the pair of opposing short sides among the four sides constituting the metal frame, and the distance between the contact positions of the electrodes is almost equal. At the intermediate position to be divided, the voltage and heat energy are highest, and only one brazing material layer at this position is melted and solidified in a small circular shape. As a result, it is possible to reliably reduce the same problems as described above.

加えて、本発明には、前記仮付け工程に用いる一対の電極は、複数の前記配線基板の表面に対して接近および離間可能で、且つ上記配線基板の表面に沿って移動可能とされた一対のローラ電極である、配線基板の製造方法(請求項5)も含まれる。
これによれば、多数個取りのベース基板に縦横に平面方向に沿って配置され、前記ロウ材層付きの金属枠がメタライズ層の上に載置された配線基板に対し、上記金属枠の上面における前記2箇所の位置に一対のローラ電極を個別に接触させて通電し、それらの中間位置のロウ材層の一部を円形状に溶融・凝固した後、該配線基板から離間させ、更に隣接する配線基板側に順次移動させることができる。従って、メタライズ層の上に金属枠が載置された配線基板ごとに、一対のローラ電極を接触させて、前記仮付けを自動的に順次行うことが容易となる。しかも、ローラ電極は、金属枠上を転動可能であるため、ピン状の電極に比べて、損耗しにくく、耐久性に優れるので、メンテナンスも容易となる。
尚、前記一対の電極の相対的な距離および配置の少なくとも一方を、調整可能な溶接(接合)装置とすることで、各種形状の配線基板に対しても、対応が容易となる。
In addition, according to the present invention, the pair of electrodes used in the tacking step can be moved toward and away from the surfaces of the plurality of wiring boards and can be moved along the surfaces of the wiring boards. A method of manufacturing a wiring board which is a roller electrode is also included.
According to this, the upper surface of the metal frame with respect to the wiring substrate which is arranged along the plane direction in the vertical and horizontal directions on the multi-piece base substrate and the metal frame with the brazing material layer is placed on the metallized layer. A pair of roller electrodes are individually brought into contact with the two positions in the substrate and energized, and a part of the brazing material layer at the intermediate position is melted and solidified into a circular shape, and then separated from the wiring board and further adjacent Can be sequentially moved to the wiring board side. Therefore, it becomes easy to perform the temporary attachment automatically by sequentially bringing a pair of roller electrodes into contact with each wiring board on which the metal frame is placed on the metallized layer. In addition, since the roller electrode can roll on the metal frame, it is less likely to be worn and superior in durability compared to the pin-shaped electrode, so that maintenance is also facilitated.
In addition, by using at least one of the relative distance and the arrangement of the pair of electrodes as an adjustable welding (joining) device, it is easy to cope with various types of wiring boards.

本発明の対象となる一形態の多数個取り配線基板を示す平面図。The top view which shows the multi-piece wiring board of one form used as the object of this invention. 図1中の一点鎖線部分Xの拡大平面図。The enlarged plan view of the dashed-dotted line part X in FIG. 図2中のY−Y線の矢視に沿った断面図。Sectional drawing along the arrow of the YY line in FIG. 本発明の一製造工程の概略を示す部分断面図。The fragmentary sectional view which shows the outline of one manufacturing process of this invention. 図4に続く製造工程の概略を示す部分断面図。The fragmentary sectional view which shows the outline of the manufacturing process following FIG. 図4,図5の各製造工程を示す概略図。Schematic which shows each manufacturing process of FIG. 4, FIG. 図5の製造工程における一対の電極の接触位置を示す部分平面図。The partial top view which shows the contact position of a pair of electrode in the manufacturing process of FIG. 図5の製造工程で一対の電極の異なる接触位置を示す部分平面図。FIG. 6 is a partial plan view showing different contact positions of a pair of electrodes in the manufacturing process of FIG. 5. 図5の製造工程で一対の電極の更に異なる接触位置を示す部分平面図。FIG. 6 is a partial plan view showing further different contact positions of a pair of electrodes in the manufacturing process of FIG. 5. 図5の製造工程で一対の電極の別な接触位置を示す部分平面図。The fragmentary top view which shows another contact position of a pair of electrode in the manufacturing process of FIG. 図5の製造工程で一対の電極の別異な接触位置を示す部分平面図。The fragmentary top view which shows a different contact position of a pair of electrode in the manufacturing process of FIG. 従来と同様な比較例の方法における接触位置を示す部分平面図。The partial top view which shows the contact position in the method of the comparative example similar to the past. 実施例の製造方法が施された多数個取り配線基板を示す平面図。The top view which shows the multi-piece wiring board by which the manufacturing method of the Example was given. 比較例の製造方法が施された多数個取り配線基板を示す平面図。The top view which shows the multi-piece wiring board by which the manufacturing method of the comparative example was given. 本発明の対象となる異なる形態の多数個取り配線基板を示す平面図。The top view which shows the multi-cavity wiring board of the different form used as the object of this invention. 図15中において隣接する2個の配線基板を示す部分拡大平面図。The partial enlarged plan view which shows two wiring boards adjacent in FIG. 図16中のV−V線の矢視に沿った断面図。Sectional drawing along the arrow of the VV line in FIG.

以下において、本発明を実施するための形態について説明する。
図1は、本発明の対象となる一形態の多数個取り用のベース基板1を示す平面図、図2は、図1中の一点鎖線部分Xの拡大平面図、図3は、図2中のY−Y線の矢視に沿った断面図である。
上記ベース基板1は、アルミナなどのセラミック(絶縁材)からなり、図1〜図3に示すように、平面視が正方形(矩形)の表面3および裏面4を有する板状の基板本体2において、四辺に沿って一定の幅で位置する耳部5と、これらに囲まれ、平面視が長方形(矩形)の表面3および裏面4を有する配線基板8を縦横の平面方向に沿って複数個配置した製品領域6とを備えている。以下では、表面3と裏面4は、基板本体2、耳部5、および各配線基板8に共通して用いる。
Hereinafter, modes for carrying out the present invention will be described.
FIG. 1 is a plan view showing a multi-piece base substrate 1 according to an embodiment of the present invention, FIG. 2 is an enlarged plan view of a one-dot chain line portion X in FIG. 1, and FIG. 3 is in FIG. It is sectional drawing along the arrow of the YY line.
The base substrate 1 is made of ceramic (insulating material) such as alumina, and as shown in FIGS. 1 to 3, in a plate-like substrate body 2 having a front surface 3 and a rear surface 4 that are square (rectangular) in plan view, A plurality of wiring boards 8 are arranged along the vertical and horizontal plane directions, each having an ear portion 5 positioned at a certain width along the four sides, and a front surface 3 and a rear surface 4 that are surrounded by these and are rectangular (rectangular) in plan view. And a product area 6. Hereinafter, the front surface 3 and the back surface 4 are used in common for the substrate body 2, the ear portion 5, and each wiring substrate 8.

図2,図3に示すように、配線基板8は、約2mm×1mmの長方形の表面3にこれと相似形にして開口するキャビティ9を有する。該キャビティ9は、平面視が長方形の底面10と、これを囲む四つの側壁11とからなり、底面10のうち、一方(図示で左側)の短辺の両端の内隅部には、セラミックからなる一対の段部12が形成され、それらの上面には、一対の接続端子13が個別に形成されている。該一対の接続端子13と、追ってキャビティ9内に挿入される水晶振動子などの電子部品(図示せず)の電極とは、個別にロウ材を介して接合されることで、該電子部品が一対の上記接続端子13に実装される。
尚、配線基板8,8間および配線基板8と耳部5との間には、表面3側に開口する断面ほぼV字形の分割溝7が、平面視で格子枠状に形成され、該分割溝7と裏面4との間には、追って配線基板8ごとに個片化するための切断予定面(仮想面)cfが位置している。また、キャビティ9の底面10と配線基板8の裏面4との間には、図示しない任意数の配線層やビア導体が形成されても良く、配線基板8の裏面4には、前記接続端子13と導通する外部端子が形成されても良い。
前記配線基板8ごとの表面3には、その各辺に沿って平面視が長方形(矩形)枠状のメタライズ層14が形成されている。該メタライズ層14、接続端子13、上記配線層、およびビア導体は、W、Mo、Cu、Agなどの金属の何れかからなる。
As shown in FIGS. 2 and 3, the wiring substrate 8 has a cavity 9 that opens in a similar shape to a rectangular surface 3 of about 2 mm × 1 mm. The cavity 9 is composed of a bottom surface 10 having a rectangular shape in plan view and four side walls 11 surrounding the bottom surface 10, and ceramics are formed on inner corners at both ends of one short side (left side in the drawing) of the bottom surface 10. A pair of step portions 12 are formed, and a pair of connection terminals 13 are individually formed on the upper surfaces thereof. The pair of connection terminals 13 and electrodes of an electronic component (not shown) such as a crystal resonator which is inserted into the cavity 9 later are joined individually via a brazing material so that the electronic component is It is mounted on the pair of connection terminals 13.
In addition, between the wiring boards 8 and 8 and between the wiring board 8 and the ear portion 5, a dividing groove 7 having a substantially V-shaped cross section that opens toward the surface 3 is formed in a lattice frame shape in plan view. Between the groove 7 and the back surface 4, a planned cutting surface (virtual surface) cf for separating each wiring substrate 8 later is located. Further, an arbitrary number of wiring layers and via conductors (not shown) may be formed between the bottom surface 10 of the cavity 9 and the back surface 4 of the wiring substrate 8, and the connection terminals 13 are formed on the back surface 4 of the wiring substrate 8. An external terminal that is electrically connected to the terminal may be formed.
On the surface 3 of each wiring substrate 8, a metallized layer 14 having a rectangular (rectangular) frame shape in plan view is formed along each side. The metallized layer 14, the connection terminal 13, the wiring layer, and the via conductor are made of any of metals such as W, Mo, Cu, and Ag.

前記のような多数個取り用のベース基板1は、アルミナなどのセラミック成分を含み、所要層数の平坦なグリーンシートと、長方形などの貫通孔を縦横に沿って形成した所要層数のグリーンシートとを積層した後、焼成して製作したものである。予め、何れかのグリーンシートの表面にW粉末などを含む導電性ペーストが印刷され、上記積層後における配線基板8,8間および配線基板8と耳部5との間には、挿入した刃物によって分割溝7が格子形状にして形成されている。
図4に示すように、図示で左側の配線基板8の表面3に位置するメタライズ層14上には、既に、平面視が該メタライズ層14と相似形の長方形(矩形)で且つ底面の全体にロウ材層15が配置された金属枠16が仮付けされている。
上記金属枠(金属リング)16は、例えば、42アロイ(Fe−42%Ni)や194合金(Cu−2.3%Fe−0.03%P)などからなり、上記ロウ材層15は、例えば、Sn−Au、銀ロウ、ハンダなどからなる。
The base substrate 1 for multi-piece production as described above includes a ceramic component such as alumina, a flat green sheet having a required number of layers, and a green sheet having a required number of layers in which through holes such as rectangles are formed vertically and horizontally. And then fired and manufactured. A conductive paste containing W powder or the like is printed on the surface of any of the green sheets in advance, and between the wiring boards 8 and 8 and between the wiring board 8 and the ear portion 5 after the above-described stacking is performed by an inserted blade. The division grooves 7 are formed in a lattice shape.
As shown in FIG. 4, on the metallized layer 14 positioned on the surface 3 of the left wiring board 8 in the drawing, the planar view is already a rectangle (rectangle) similar to the metallized layer 14 and the entire bottom surface. A metal frame 16 on which the brazing material layer 15 is disposed is temporarily attached.
The metal frame (metal ring) 16 is made of, for example, 42 alloy (Fe-42% Ni), 194 alloy (Cu-2.3% Fe-0.03% P), or the like, For example, it is made of Sn—Au, silver solder, solder or the like.

図4で中央に示す配線基板8の表面3に位置するメタライズ層14上には、同図中の太い矢印で示すように、予め、姿勢制御されたリングマウンタ(図示せず)などにエア吸引されたロウ材層15付きの金属枠16が位置決めされた上で載置される。その結果、図5に示すように、メタライズ層14上にロウ材層15付きの金属枠16が載置された。
次いで、図5,図6に示す一対のローラ電極(電極)18を用意した。該ローラ電極18は、一対の軸17の端部に固定され、軸17,17間に位置する昇降および水平移動が可能な軸受部19によって支持されている。即ち、図6中の一点鎖線および二点鎖線の矢印で示すように、一対のローラ電極18は、配線基板8ごとの表面3に対して接近(下降)および離間(上昇)可能であると共に、配線基板8ごとの表面3に沿って(水平)移動可能とされている。
On the metallized layer 14 located on the surface 3 of the wiring substrate 8 shown in the center in FIG. 4, as shown by a thick arrow in the figure, air is sucked into a ring mounter (not shown) whose posture is controlled in advance. The metal frame 16 with the brazing material layer 15 is positioned and placed. As a result, as shown in FIG. 5, the metal frame 16 with the brazing material layer 15 was placed on the metallized layer 14.
Next, a pair of roller electrodes (electrodes) 18 shown in FIGS. 5 and 6 were prepared. The roller electrode 18 is fixed to the ends of the pair of shafts 17 and is supported by a bearing portion 19 that is located between the shafts 17 and 17 and can be moved up and down and horizontally moved. That is, as shown by the one-dot chain line and two-dot chain line arrows in FIG. 6, the pair of roller electrodes 18 can approach (lower) and separate (up) the surface 3 of each wiring board 8, and It can be moved (horizontal) along the surface 3 of each wiring board 8.

かかる状態で、上記金属枠16の上面において、該金属枠16を構成する四辺の中心cpに対して互いに点対称とはならない位置、例えば、図7に示すように、一つの長辺の両端付近(金属枠16を構成する四辺の中心cpに対し互いに点対称とはならない位置)に、一対のローラ電極18の最下部を個別に接触させた後、該一対のローラ電極18,18間に電圧(約75V)を印加した。
上記電極18,18間を流れた電流によって、一対のローラ電極18,18の接触位置同士の間を二等分した位置で、且つ各ローラ電極18から最も離れた位置である上記長辺の中央部付近において、最大の熱エネルギが局部的に生じる。その結果、図7に示すように、金属枠16やメタライズ層14よりも低融点であるロウ材層15の上記長辺の中央部付近において、該ロウ材層15の一部のみが円形ないし楕円形状に溶融し、更に前記通電を停止して凝固させることで、一箇所の小さなロウ付け部bpとなった。かかる一箇所のロウ付け部bpのみを介して、金属枠16は、前記メタライズ層14上に所定の姿勢で仮固定された(仮付け工程)。
上記仮付け工程は、一対のローラ電極18を隣接する配線基板8に移動させることにより、複数個の配線基板8に対して順次施される。
In such a state, on the upper surface of the metal frame 16, positions that are not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16, for example, near both ends of one long side as shown in FIG. After the lowermost portions of the pair of roller electrodes 18 are individually brought into contact (positions that are not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16), a voltage is applied between the pair of roller electrodes 18 and 18. (About 75V) was applied.
The center of the long side, which is a position that bisects the contact positions of the pair of roller electrodes 18 and 18 by the current flowing between the electrodes 18 and 18 and is the most distant from each roller electrode 18 In the vicinity of the part, the maximum heat energy is locally generated. As a result, as shown in FIG. 7, in the vicinity of the central portion of the long side of the brazing material layer 15 having a lower melting point than the metal frame 16 and the metallized layer 14, only a part of the brazing material layer 15 is circular or elliptical. By melting into a shape and further solidifying by stopping the energization, a small brazed part bp was formed in one place. The metal frame 16 was temporarily fixed in a predetermined posture on the metallized layer 14 only through the one brazing part bp (temporary attaching step).
The temporary attachment process is sequentially performed on the plurality of wiring boards 8 by moving the pair of roller electrodes 18 to the adjacent wiring boards 8.

図8は、一対のローラ電極18の異なる接触位置を示す部分平面図である。
前記同様に、配線基板8のメタライズ層14の上に載置されたロウ材層15付きの金属枠16の上面において、図8に示すように、一対の短辺ごとの同じ端部付近の位置(金属枠16を構成する四辺の中心cpに対して互いに点対称とはならない位置)に、一対のローラ電極18の最下部を接触させて通電した。
その結果、一対のローラ電極18,18間の中間位置であるロウ材層15の長辺の中央部付近において、前記同様のロウ付け部bpが一つ形成されたことで、金属枠16がメタライズ層14の上面に仮固定された。
FIG. 8 is a partial plan view showing different contact positions of the pair of roller electrodes 18.
Similarly to the above, on the upper surface of the metal frame 16 with the brazing material layer 15 placed on the metallized layer 14 of the wiring substrate 8, as shown in FIG. The lowermost portions of the pair of roller electrodes 18 were brought into contact with each other (positions that were not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16).
As a result, one brazing part bp similar to the above is formed in the vicinity of the central part of the long side of the brazing material layer 15 that is an intermediate position between the pair of roller electrodes 18, 18, so that the metal frame 16 is metallized. Temporarily fixed to the upper surface of the layer 14.

図9は、一対のローラ電極18の更に異なる接触位置を示す部分平面図である。
前記同様に、配線基板8のメタライズ層14の上に載置されたロウ材層15付きの金属枠16の上面において、図9に示すように、左側の短辺の中央付近の位置と、右側の短辺およびこれらの二つの短辺に挟まれた長辺間のコーナ部付近の位置(金属枠16を構成する四辺の中心cpに対して互いに点対称とはならない位置)とに、一対のローラ電極18の最下部を接触させた状態で、前記同様の電圧を印加して通電した。
その結果、一対のローラ電極18,18間の中間位置であるロウ材層15の長辺におけるやや左側寄りの中間位置において、前記同様のロウ付け部bpが一つ(一箇所)形成されたことで、金属枠16がメタライズ層14の上面に仮固定された。
FIG. 9 is a partial plan view showing further different contact positions of the pair of roller electrodes 18.
Similarly to the above, on the upper surface of the metal frame 16 with the brazing material layer 15 placed on the metallized layer 14 of the wiring board 8, as shown in FIG. And a position in the vicinity of the corner portion between the long sides sandwiched between these two short sides (positions that are not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16) While the lowermost portion of the roller electrode 18 was in contact, the same voltage as described above was applied to energize.
As a result, one (one) brazing portion bp similar to the above was formed at an intermediate position slightly on the left side of the long side of the brazing material layer 15 that is an intermediate position between the pair of roller electrodes 18 and 18. Thus, the metal frame 16 was temporarily fixed to the upper surface of the metallized layer 14.

図10は、一対のローラ電極18の別異な接触位置を示す部分平面図である。
前記同様に、配線基板8のメタライズ層14の上に載置されたロウ材層15付きの金属枠16の上面において、図10に示すように、左側の短辺の中央付近の位置と、この短辺に隣接する長辺の中間位置(金属枠16を構成する四辺の中心cpに対して互いに点対称とはならない位置)とに、一対のローラ電極18の最下部を接触させた状態で、前記同様の電圧を印加して通電した。
その結果、一対のローラ電極18,18間の中間位置であるロウ材層15の短辺と長辺とのコーナ付近の位置において、前記同様のロウ付け部bpが一つ(一箇所)形成されたことで、金属枠16がメタライズ層14の上面に仮固定された。
FIG. 10 is a partial plan view showing different contact positions of the pair of roller electrodes 18.
Similarly to the above, on the upper surface of the metal frame 16 with the brazing material layer 15 placed on the metallized layer 14 of the wiring board 8, as shown in FIG. In a state where the lowermost portions of the pair of roller electrodes 18 are in contact with an intermediate position of the long side adjacent to the short side (a position that is not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16), The same voltage as above was applied and energized.
As a result, one brazing portion bp similar to the above is formed at a position near the corner between the short side and the long side of the brazing material layer 15 which is an intermediate position between the pair of roller electrodes 18 and 18. As a result, the metal frame 16 was temporarily fixed to the upper surface of the metallized layer 14.

図11は、一対のローラ電極18の別な接触位置を示す部分平面図である。
前記同様に、配線基板8のメタライズ層14の上に載置されたロウ材層15付きの金属枠16の上面において、図11に示すように、一方(図示で左側)の短辺の両端部付近の位置(金属枠16を構成する四辺の中心cpに対し互いに点対称とはならない位置)に、一対のローラ電極18の最下部を接触させた状態で、前記同様の電圧を印加して通電した。
その結果、一対のローラ電極18,18間の中間位置であるロウ材層15の上記短辺の中央部付近において、前記同様のロウ付け部bpが一つ(一箇所)形成されたことで、金属枠16がメタライズ層14の上面に仮固定された。
FIG. 11 is a partial plan view showing another contact position of the pair of roller electrodes 18.
Similarly to the above, on the upper surface of the metal frame 16 with the brazing material layer 15 placed on the metallized layer 14 of the wiring board 8, as shown in FIG. Energization is performed by applying the same voltage as described above in a state where the lowermost portions of the pair of roller electrodes 18 are brought into contact with nearby positions (positions that are not point-symmetric with respect to the center cp of the four sides constituting the metal frame 16). did.
As a result, one brazing part bp similar to the above is formed in the vicinity of the central part of the short side of the brazing material layer 15 which is an intermediate position between the pair of roller electrodes 18, 18. A metal frame 16 was temporarily fixed to the upper surface of the metallized layer 14.

前記のような仮付け工程によれば、一対のローラ電極18,18間に通電した電流によって、ロウ材層15のうち、一対のローラ電極18,18の接触位置同士の間をほぼ二等分した各ローラ電極18から最も離れた位置で、且つ金属枠16、ロウ材層15、およびメタライズ層14の長方形を構成する四辺の中心cpに対し互いに非点対称の位置において、ロウ材層15が溶融・凝固した局部的な一つ(一箇所)のロウ付け部bpを形成できた。該ロウ付け部bpを介して、配線基板8ごとのメタライズ層14と金属枠16とを固定する仮付けができたので、従来のように点対称の2箇所以上の位置で仮付けする方法に比べ、ロウ材の凝固に伴う各金属枠16や基板本体2に生じる応力を少なくし、金属枠16が熱変形したり、上記基板本体2やベース基板1が反ったり、クラックが発生するなどの不具合を低減することができた。
従って、封止用である平板状の金属蓋(図示せず)を金属枠16に対し、高い気密性をもって確実に接合できるので、封止性の高い配線基板8を効率良く製造することが可能となった。
According to the tacking process as described above, the current between the pair of roller electrodes 18 and 18 is substantially divided into two parts between the contact positions of the pair of roller electrodes 18 and 18 in the brazing material layer 15. The brazing material layer 15 is located farthest from each roller electrode 18 and is asymmetric with respect to the center cp of the four sides constituting the rectangle of the metal frame 16, brazing material layer 15, and metallization layer 14. One local (one place) brazed part bp melted and solidified could be formed. Since the metallization layer 14 and the metal frame 16 for each wiring board 8 can be temporarily fixed via the brazing part bp, the conventional method of temporarily attaching at two or more point-symmetrical positions can be used. In comparison, the stress generated in each metal frame 16 and the substrate body 2 due to the solidification of the brazing material is reduced, the metal frame 16 is thermally deformed, the substrate body 2 and the base substrate 1 are warped, and cracks are generated. Defects could be reduced.
Accordingly, since a flat metal lid (not shown) for sealing can be reliably bonded to the metal frame 16 with high airtightness, it is possible to efficiently manufacture the wiring substrate 8 having high sealing performance. It became.

ここで、本発明の具体的な実施例を比較例と併せて説明する。
主にアルミナからなり、平面視が2mm×1.4mmの表・裏面3,4で、且つ同じ寸法のキャビティ9を有する配線基板8を縦9個×横6個で平面方向に沿って配する製品領域6を有し、四辺の耳部5を含めて、平面視の一辺が20mmの正方形で厚みが0.6mmの多数個取りのベース基板(1)を20個製作した。
これらのうち、10個のベース基板1における配線基板8ごとのメタライズ層14上に42アロイからなるロウ層材15付きの同じ金属枠16を載置し、前記一対のローラ電極18を前記図7に示した位置ごとに接触させて通電した。その結果、金属枠16の一方の長辺における中央付近直下のロウ材層15に点状のロウ付け部bpを一箇所のみ設けて仮付け工程が行えた。該仮付け後のベース基板1の平面図を図13に示した。これら10個のベース基板1の組を実施例とした。
Here, specific examples of the present invention will be described together with comparative examples.
It is mainly made of alumina, and the front and back surfaces 3 and 4 having a plan view of 2 mm × 1.4 mm, and the wiring board 8 having the same size cavity 9 is arranged vertically 9 × 6 horizontally along the plane direction. Twenty multi-base substrates (1) having a product region 6 and including four ears 5 and having a square shape of 20 mm on one side in a plan view and a thickness of 0.6 mm were manufactured.
Among these, the same metal frame 16 with the brazing layer material 15 made of 42 alloy is placed on the metallized layer 14 for each of the wiring substrates 8 in the ten base substrates 1, and the pair of roller electrodes 18 are connected to the pair of roller electrodes 18 shown in FIG. Each position shown in Fig. 1 was contacted and energized. As a result, only one spot-like brazing part bp was provided on the brazing material layer 15 immediately below the center of one long side of the metal frame 16 to perform the temporary attachment process. A plan view of the base substrate 1 after the temporary attachment is shown in FIG. A set of these ten base substrates 1 was taken as an example.

一方、残り10個のベース基板1zにおける配線基板8zごとのメタライズ層14上にも前記と同じ金属枠16を載置し、前記と同じ一対のローラ電極18を、図12に示すように、金属枠16において対向する一対の短辺の中央付近に、該金属枠16の中心cpに対し点対称に接触させて、前記と同じ電流を通電した。かかる電流は、上記金属枠16を構成する四辺のうち、上記一対の電極18を隔てる上下2つの経路を平行して流れると共に、これらの経路をほぼ二等分する中間位置で最大の熱エネルギを生じた。その結果、図12に示すように、金属枠16の一対の長辺における中央付近の直下のロウ材層15ごとに点状のロウ付け部bpを2箇所設けることで仮付け工程が施された。該仮付け後のベース基板1zの平面図を図14に示した。これら10個のベース基板1zの組を比較例とした。   On the other hand, the same metal frame 16 is also placed on the metallized layer 14 for each wiring board 8z in the remaining 10 base substrates 1z, and the same pair of roller electrodes 18 as shown in FIG. In the vicinity of the center of the pair of short sides facing each other in the frame 16, the same current as that described above was applied in contact with the center cp of the metal frame 16 in point symmetry. The current flows in parallel between two upper and lower paths separating the pair of electrodes 18 among the four sides constituting the metal frame 16, and the maximum thermal energy is obtained at an intermediate position that bisects these paths. occured. As a result, as shown in FIG. 12, the temporary attachment process was performed by providing two dotted brazing portions bp for each brazing material layer 15 immediately below the center of the pair of long sides of the metal frame 16. . A plan view of the base substrate 1z after the temporary attachment is shown in FIG. A set of these ten base substrates 1z was used as a comparative example.

実施例および比較例の組ごとの前記20個のベース基板1,1zの全部について、前記仮付け工程による反り量を測定した。即ち、個々のベース基板1,1zを、断面がほぼ凹形の凹んだ表面3側を上向きにして定盤の上に載置し、厚み方向において最も偏倚した距離を反り量として測定した。そして、かかる反り量から実施例の10個の平均値と、比較例の10個の平均値とを算出した。
その結果、実施例の反り量の平均値は、363μmであった。
一方、比較例の反り量の平均値は、734μmであった。
換言すると、実施例のベース基板1の反り量は、比較例のベース基板1zの反り量の50%以下であった。
以上のような実施例の結果によれば、本発明の仮付け工程を用いることで、一対のローラ電極18,18間に通電した電流により形成される一つの点(円)状のロウ付け部bpにより生じる応力を抑制できたため、比較例に比べて反り量をほぼ半減できものと推定される。更に、上記応力が抑制されることで、配線基板8ごとの金属枠16の熱変形も併せて低減されたものと推測される。
従って、上記実施例により、本発明の優位性が裏付けられたことが理解できる。
The amount of warpage due to the tacking step was measured for all of the 20 base substrates 1 and 1z for each set of Examples and Comparative Examples. That is, the individual base substrates 1 and 1z were placed on the surface plate with the recessed surface 3 side having a substantially concave cross section facing upward, and the distance most deviated in the thickness direction was measured as the amount of warpage. Then, 10 average values of the example and 10 average values of the comparative example were calculated from the warpage amount.
As a result, the average value of the amount of warpage in the example was 363 μm.
On the other hand, the average value of the amount of warpage in the comparative example was 734 μm.
In other words, the warpage amount of the base substrate 1 of the example was 50% or less of the warpage amount of the base substrate 1z of the comparative example.
According to the results of the embodiment as described above, by using the temporary attachment process of the present invention, a single point (circle) brazing portion formed by a current supplied between the pair of roller electrodes 18 and 18 is used. Since the stress caused by bp could be suppressed, it is estimated that the amount of warpage can be almost halved compared to the comparative example. Furthermore, it is estimated that the thermal deformation of the metal frame 16 for each wiring board 8 is also reduced by suppressing the stress.
Therefore, it can be understood that the superiority of the present invention is supported by the above embodiment.

図15は、本発明の対象の異なる形態の多数個取り用のベース基板20の概略を示す平面図、図16は、該ベース基板20内に設けた2個の隣接する配線基板28を示す拡大図、図17は、図16中のV−V線の矢視に沿った断面図である。
上記ベース基板20は、エポキシ系などの樹脂(絶縁材)からなり、図15〜図17に示すように、平面視が正方形(矩形)の表面23および裏面24を有する板状の基板本体22において、四辺に沿って一定の幅で位置する耳部25と、これに囲まれ、平面視が長方形(矩形)の表面23および裏面24を有する配線基板28を縦横の平面方向に沿って複数個配置した製品領域26とを備えている。
尚、以下では、表面23と裏面24は、基板本体22、耳部25、および各配線基板28に共通して用いる。
FIG. 15 is a plan view schematically showing a multi-piece base substrate 20 of a different form to which the present invention is applied, and FIG. 16 is an enlarged view showing two adjacent wiring boards 28 provided in the base substrate 20. 17 is a cross-sectional view taken along the line VV in FIG.
The base substrate 20 is made of an epoxy-based resin (insulating material) and, as shown in FIGS. 15 to 17, in a plate-like substrate body 22 having a front surface 23 and a rear surface 24 that are square (rectangular) in plan view. A plurality of wiring boards 28 having a front surface 23 and a rear surface 24 which are surrounded by the edge portions 25 having a constant width along the four sides and are rectangular (rectangular) in plan view are arranged along the vertical and horizontal plane directions. Product area 26.
In the following description, the front surface 23 and the back surface 24 are used in common for the substrate body 22, the ear portion 25, and each wiring substrate 28.

個々の配線基板28は、図16,図17中の破線で示すように、平面視が長方形(矩形)の切断予定面(仮想面)cfに囲まれ、且つ該切断予定面cfにより隣接する配線基板28同士の間、あるいは耳部25との間を仕切られている。
かかる配線基板28は、図16,図17に示すように、平坦な表面23を有し、該表面23の四辺に沿って平面視が相似形のメタライズ層34と、該メタライズ層34の内側で且つその右側の短辺に近接する位置に形成された平面視が長方形の凸部30と、該凸部30の上面の両端側に形成された一対の接続端子32と、を備えている。該一対の接続端子32上には、追って水晶振動子などの電子部品(図示せず)の電極がロウ付けされ、且つ該電子部品を片持ち状に支持して実装する。尚、上記メタライズ層34や接続端子32は、Cu、Agなどからなる。
Each wiring board 28 is surrounded by a rectangular (rectangular) planned cutting surface (virtual surface) cf in plan view and is adjacent to the planned cutting surface cf, as indicated by a broken line in FIGS. A space is formed between the substrates 28 or the ears 25.
As shown in FIGS. 16 and 17, the wiring substrate 28 has a flat surface 23, a metallized layer 34 having a similar shape in plan view along the four sides of the surface 23, and an inner side of the metallized layer 34. In addition, a convex portion 30 having a rectangular shape in plan view formed at a position close to the short side on the right side thereof, and a pair of connection terminals 32 formed on both ends of the upper surface of the convex portion 30 are provided. On the pair of connection terminals 32, electrodes of an electronic component (not shown) such as a crystal resonator are brazed, and the electronic component is supported and mounted in a cantilever manner. The metallized layer 34 and the connection terminal 32 are made of Cu, Ag, or the like.

図16,図17中で左側の配線基板28に示すように、メタライズ層34の上面には、該メタライズ層34と平面視が同じ形状のロウ材層35付きの金属枠36を既に固定されている。即ち、図16に示すように、前記同様の一対のローラ電極18を金属枠36の四辺の中心cpに対し、非点対称となる金属枠36の上面の2つの位置に接触させ、上記電極18,18間に通電する仮付け工程を行って、ロウ材層35の一部に1箇所の小さなロウ付け部bpを形成することで、メタライズ層34の上に金属枠36が仮付けで固定されている。
図17中で右側の配線基板28についても、同図中の矢印で示すように、底面全体にロウ材層35が形成された金属枠36を、メタライズ層34の上に載置し、上記同様の仮付け工程を施すことで、該メタライズ層34の上に金属枠36を仮付けの固定を行うことができる。
16 and 17, a metal frame 36 with a brazing material layer 35 having the same shape as that of the metallized layer 34 is already fixed on the upper surface of the metallized layer 34, as shown on the left side wiring board 28. Yes. That is, as shown in FIG. 16, a pair of roller electrodes 18 similar to the above are brought into contact with two positions on the upper surface of the metal frame 36 that is asymmetric with respect to the center cp of the four sides of the metal frame 36, and the electrodes 18. The metal frame 36 is fixed to the metallized layer 34 by temporary attachment by forming a small brazing part bp in a part of the brazing material layer 35 by performing a temporary attachment process in which a current is applied between the metallized layers 34. ing.
Also for the right side wiring board 28 in FIG. 17, a metal frame 36 having a brazing material layer 35 formed on the entire bottom surface is placed on the metallized layer 34 as shown by the arrows in FIG. By performing the temporary attachment step, the metal frame 36 can be temporarily fixed on the metallized layer 34.

尚、配線基板28のメタライズ層34の上に金属枠36を固定するための仮付け工程において、一対の電極18の最下部を金属枠36の上面の2箇所に接触させる位置は、前記図8〜図11で示した位置の何れを選んでも良い。
そして、全ての配線基板28に対して仮付け工程を施したベース基板20を、加熱炉(図示せず)内に挿入し、配線基板28ごとのロウ材層35全体を溶融・凝固させる本ロウ付け工程を行った際、ベース基板20が反ったり、金属枠36が熱変形するなどの不具合を低減することができた。従って、封止用である箱形状の金属蓋(図示せず)を金属枠36に対し、高い気密性をもって確実に接合できるので、封止性の高い配線基板28を効率良く製造することが可能となった。
In the temporary attachment step for fixing the metal frame 36 on the metallized layer 34 of the wiring board 28, the positions where the lowermost portions of the pair of electrodes 18 are brought into contact with the two positions on the upper surface of the metal frame 36 are as shown in FIG. Any of the positions shown in FIG. 11 may be selected.
Then, the base substrate 20 that has been subjected to the temporary attachment process for all the wiring boards 28 is inserted into a heating furnace (not shown), and the entire brazing material layer 35 for each wiring board 28 is melted and solidified. When the attaching process was performed, problems such as the base substrate 20 being warped and the metal frame 36 being thermally deformed could be reduced. Accordingly, since a box-shaped metal lid (not shown) for sealing can be reliably bonded to the metal frame 36 with high airtightness, it is possible to efficiently manufacture the wiring board 28 with high sealing performance. It became.

本発明は、前記のような各形態および実施例に限定されるものではない。
例えば、前記ベース基板1,20の基板本体2,22を構成する絶縁材は、窒化アルミニウムやムライトなどの高温焼成セラミック、ガラス−セラミックなどの低温焼成セラミック、あるいはエポキシ系以外の樹脂であっても良い。
また、前記配線基板8,28の表面3,23および裏面4,24は、平面視が正方形ないしほぼ正方形の矩形であっても良く、これに応じて、前記メタライズ層14,34、ロウ材層15,35、および金属枠16,36も平面視が正方形ないしほぼ正方形の矩形とされる。
更に、前記一対の電極は、昇降および移動可能なピン状の形態であっても良い。
加えて、前記配線基板8のキャビティ9内、あるいは配線基板28の表面23上に実装する電子部品は、圧電素子、半導体集積回路、SAWフィルタ、あるいは高周波スイッチモジュールなどであっても良い。
The present invention is not limited to the above embodiments and examples.
For example, the insulating material constituting the substrate bodies 2 and 22 of the base substrates 1 and 20 may be a high-temperature fired ceramic such as aluminum nitride or mullite, a low-temperature fired ceramic such as glass-ceramic, or a resin other than epoxy. good.
Further, the front surfaces 3 and 23 and the back surfaces 4 and 24 of the wiring boards 8 and 28 may have a square shape or a substantially square rectangle in plan view, and according to this, the metallized layers 14 and 34 and the brazing material layer 15 and 35 and the metal frames 16 and 36 are also square or substantially square in plan view.
Further, the pair of electrodes may be in the form of a pin that can be moved up and down.
In addition, the electronic component mounted in the cavity 9 of the wiring board 8 or on the surface 23 of the wiring board 28 may be a piezoelectric element, a semiconductor integrated circuit, a SAW filter, a high frequency switch module, or the like.

本発明によれば、多数個取りによる配線基板の製造方法において、配線基板ごとの表面に形成した平面視が矩形の金属層の上に金属枠を仮付けする際、該金属枠の変形や、多数個取り用のベース基板および配線基板の反りやクラックを確実に低減することが可能となる。   According to the present invention, in the method for manufacturing a wiring board by multi-cavity, when the metal frame is temporarily attached on the rectangular metal layer in plan view formed on the surface of each wiring board, the deformation of the metal frame, It is possible to reliably reduce warpage and cracks in the base substrate and the wiring substrate for multi-piece production.

1,20……ベース基板
3,23……表面
4,24……裏面
8,28……配線基板
14,34…メタライズ層
15,35…ロウ材層
16,36…金属枠
18…………ローラ電極
cp…………中心
bp…………ロウ付け部(ロウ材層の一部)
DESCRIPTION OF SYMBOLS 1,20 ... Base substrate 3,23 ... Front surface 4, 24 ... Back surface 8, 28 ... Wiring substrate 14, 34 ... Metallized layer 15, 35 ... Brazing material layer 16, 36 ... Metal frame 18 ......... Roller electrode cp ………… Center bp ………… Brass (part of brazing material layer)

Claims (5)

絶縁材からなり、平面視が矩形の表面および裏面を有する配線基板を縦横の平面方向に沿って複数個配置した多数個取りのベース基板において、
上記配線基板ごとの表面の各辺に沿って形成した平面視が矩形枠状のメタライズ層の上に、平面視が矩形で且つ底面にロウ材層が配置された金属枠を載置し、かかる金属枠の上面の2箇所に一対の電極を個別に接触および通電して、上記ロウ材層の一部のみを溶融・凝固することで、上記金属枠を上記配線基板の表面に固定する仮付け工程を含む配線基板の製造方法であって、
上記仮付け工程において、一対の電極は、平面視で上記金属枠を構成する四辺の上面のうち、かかる四辺の中心に対して互いに点対称とはならない2つの位置に個別に接触した状態で通電される、
ことを特徴とする配線基板の製造方法。
In a multi-piece base substrate that is made of an insulating material and has a plurality of wiring boards arranged in a vertical and horizontal plane direction having a rectangular front surface and back surface in a plan view,
A metal frame having a rectangular shape in plan view and a brazing material layer disposed on the bottom surface is placed on the metallized layer in a plan view formed along each side of the surface of each wiring board. Temporarily attaching the metal frame to the surface of the wiring board by individually contacting and energizing a pair of electrodes at two locations on the upper surface of the metal frame to melt and solidify only a part of the brazing material layer A method of manufacturing a wiring board including steps,
In the tacking step, the pair of electrodes are energized while individually contacting two positions that are not point-symmetric with respect to the center of the four sides of the four sides constituting the metal frame in plan view. To be
A method for manufacturing a wiring board.
前記仮付け工程において、一対の電極は、平面視で前記金属枠を構成する四辺のうち、何れか一つの辺の両端付近に接触するか、あるいは、隣接する一対の辺の中間同士の位置に接触した状態で通電される、
ことを特徴とする請求項1に記載の配線基板の製造方法。
In the tacking step, the pair of electrodes is in contact with the vicinity of both ends of any one of the four sides constituting the metal frame in plan view, or at a position between the adjacent pair of sides. Energized in contact,
The method for manufacturing a wiring board according to claim 1.
前記仮付け工程において、一対の電極は、平面視で前記金属枠の隣接する一対の辺のうち、一方の辺の中間位置と、他方の辺で且つ一方の辺から離れた端部と接触した状態で通電される、
ことを特徴とする請求項1に記載の配線基板の製造方法。
In the tacking step, the pair of electrodes are in contact with an intermediate position of one side of the pair of adjacent sides of the metal frame in plan view and an end portion on the other side and away from the one side. Energized in a state,
The method for manufacturing a wiring board according to claim 1.
前記複数の配線基板の表面は、平面視が長方形であり、前記仮付け工程において、一対の電極は、平面視で前記金属枠を構成する四辺のうち、対向する一対の短辺ごとにおける長手方向の中央付近を除いた異なる位置に個別に接触した状態で通電される、
ことを特徴とする請求項1乃至3の何れか一項に記載の配線基板の製造方法。
The surfaces of the plurality of wiring boards are rectangular in plan view, and in the tacking step, the pair of electrodes are in the longitudinal direction for each pair of opposing short sides among the four sides constituting the metal frame in plan view. Energized in a state of individual contact with different positions except near the center of
The method for manufacturing a wiring board according to any one of claims 1 to 3, wherein
前記仮付け工程に用いる一対の電極は、複数の前記配線基板の表面に対して接近および離間可能で、且つ上記配線基板の表面に沿って移動可能とされた一対のローラ電極である、
ことを特徴とする請求項1乃至4の何れか一項に記載の配線基板の製造方法。
The pair of electrodes used in the tacking step is a pair of roller electrodes that can be moved toward and away from the surfaces of the plurality of wiring boards and can be moved along the surfaces of the wiring boards.
The method for manufacturing a wiring board according to any one of claims 1 to 4, wherein:
JP2010027065A 2010-02-10 2010-02-10 Wiring board manufacturing method Expired - Fee Related JP5331022B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010027065A JP5331022B2 (en) 2010-02-10 2010-02-10 Wiring board manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010027065A JP5331022B2 (en) 2010-02-10 2010-02-10 Wiring board manufacturing method

Publications (2)

Publication Number Publication Date
JP2011165899A true JP2011165899A (en) 2011-08-25
JP5331022B2 JP5331022B2 (en) 2013-10-30

Family

ID=44596223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010027065A Expired - Fee Related JP5331022B2 (en) 2010-02-10 2010-02-10 Wiring board manufacturing method

Country Status (1)

Country Link
JP (1) JP5331022B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013099854A1 (en) * 2011-12-27 2013-07-04 日本特殊陶業株式会社 Circuit board and multi-cavity circuit board

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09205160A (en) * 1996-01-25 1997-08-05 Nippon Avionics Co Ltd Method for seam-joining lid
JP2007088966A (en) * 2005-09-26 2007-04-05 Daishinku Corp Method for manufacturing piezoelectric oscillating device and piezoelectric oscillating device manufactured by the method
JP2007237239A (en) * 2006-03-08 2007-09-20 Sumitomo Metal Electronics Devices Inc Brazing method for rectangular metallic ring
JP2008147348A (en) * 2006-12-08 2008-06-26 Nippon Avionics Co Ltd Small wiring substrate on multi-piece wiring board, and sealing method of same small wiring substrate
JP2009207068A (en) * 2008-02-29 2009-09-10 Kyocera Kinseki Corp Piezoelectric device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09205160A (en) * 1996-01-25 1997-08-05 Nippon Avionics Co Ltd Method for seam-joining lid
JP2007088966A (en) * 2005-09-26 2007-04-05 Daishinku Corp Method for manufacturing piezoelectric oscillating device and piezoelectric oscillating device manufactured by the method
JP2007237239A (en) * 2006-03-08 2007-09-20 Sumitomo Metal Electronics Devices Inc Brazing method for rectangular metallic ring
JP2008147348A (en) * 2006-12-08 2008-06-26 Nippon Avionics Co Ltd Small wiring substrate on multi-piece wiring board, and sealing method of same small wiring substrate
JP2009207068A (en) * 2008-02-29 2009-09-10 Kyocera Kinseki Corp Piezoelectric device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013099854A1 (en) * 2011-12-27 2013-07-04 日本特殊陶業株式会社 Circuit board and multi-cavity circuit board
CN103703871A (en) * 2011-12-27 2014-04-02 日本特殊陶业株式会社 Circuit board and multi-cavity circuit board
US9215802B2 (en) 2011-12-27 2015-12-15 Ngk Spark Plug Co., Ltd. Wiring substrate and multi-piece wiring substrate

Also Published As

Publication number Publication date
JP5331022B2 (en) 2013-10-30

Similar Documents

Publication Publication Date Title
US9215802B2 (en) Wiring substrate and multi-piece wiring substrate
EP2980048B1 (en) Apparatus and method for producing (metallic plate)-(ceramic board) laminated assembly, and apparatus and method for producing substrate for power modules
JP2015128276A (en) Surface-mounted crystal vibrator and manufacturing method of the same
JP2016171094A (en) Ceramic package, electronic component device, and method of manufacturing the same
KR101955955B1 (en) Piezoelectric device
JP2017011045A (en) Ceramic package, method of manufacturing the same, and method of manufacturing electronic component device
JP5331022B2 (en) Wiring board manufacturing method
JP6504762B2 (en) Module manufacturing method
JP5383407B2 (en) Multi-wiring board
JPWO2007052422A1 (en) Circuit device manufacturing method and circuit device
JP4424226B2 (en) Thermoelectric conversion module and method for fixing post electrode in thermoelectric conversion module
JP4833678B2 (en) Method for manufacturing piezoelectric oscillator
JP5131205B2 (en) Power module substrate manufacturing method
JP5905728B2 (en) Device storage package and mounting structure
JP6129491B2 (en) Multi-wiring board
JP6201297B2 (en) Power module substrate with copper plate and method for manufacturing power module substrate with copper plate
JP6760788B2 (en) Semiconductor packages and semiconductor devices
JP2008021716A (en) Power module substrate and method of manufacturing the same, and power module
JP2013243232A (en) Metal frame for ceramic package and ceramic package
JP2008289055A (en) Sheet substrate and method of manufacturing piezoelectric vibration device employing sheet substrate
JP2011073194A (en) Metal-ceramics joint base and method of manufacturing the same
JP2017010981A (en) Method of manufacturing wiring substrate
JP2013140874A (en) Electronic device, ceramic substrate, manufacturing method, and piezoelectric oscillator
JP2008124152A (en) Solder sheet, semiconductor device, and semiconductor device manufacturing method
JP2006179740A (en) Sealing method for package

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120713

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130619

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130702

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130726

R150 Certificate of patent or registration of utility model

Ref document number: 5331022

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees