JP2011151567A - Tuning-fork type bending crystal vibration element - Google Patents

Tuning-fork type bending crystal vibration element Download PDF

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JP2011151567A
JP2011151567A JP2010010653A JP2010010653A JP2011151567A JP 2011151567 A JP2011151567 A JP 2011151567A JP 2010010653 A JP2010010653 A JP 2010010653A JP 2010010653 A JP2010010653 A JP 2010010653A JP 2011151567 A JP2011151567 A JP 2011151567A
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vibrating arm
arm portion
base
electrode
vibrating
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JP5520618B2 (en
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Ryota Kawai
良太 河合
Shigeru Kizaki
茂 木崎
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Kyocera Crystal Device Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To easily form an electrode without short-circuiting an electrode for excitation provided on a side face of a vibration arm unit. <P>SOLUTION: A tuning-fork type bending crystal vibration element comprises: a base part; two pairs of vibration arm parts extending from the base part; and a projecting part that is positioned in the middle of the two vibration arm parts, extends in the same direction as that of the two pairs of vibration arm parts from the base part, and is formed to be shorter than the vibration arm parts. In the projecting part, a slit is provided along an extension direction, and the slit penetrates in a thickness direction and has a length from the tip of the projecting part to a boundary to the base part. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、電子機器に用いられる音叉型屈曲水晶振動素子に関する。   The present invention relates to a tuning fork-type bending crystal resonator element used in electronic equipment.

従来、コンピュータ,携帯電話又は小型情報機器等の電子機器には、電子部品の一つとして圧電振動子又は圧電発振器が搭載されている。この圧電振動子又は圧電発振器は、基準信号源やクロック信号源として用いられる。又、圧電振動子や圧電発振器は、その内部に水晶からなる圧電振動素子が搭載されている。
以下、圧電材料に水晶を用いた圧電振動素子について説明する。
図3に示すように、圧電振動素子の一つである音叉型屈曲水晶振動素子400は、水晶振動片410と、その水晶振動片410の表面に設けられた励振用電極と接続用電極と周波数調整用金属膜と導配線パターンとにより概略構成される。
Conventionally, a piezoelectric vibrator or a piezoelectric oscillator is mounted as an electronic component in an electronic device such as a computer, a mobile phone, or a small information device. This piezoelectric vibrator or piezoelectric oscillator is used as a reference signal source or a clock signal source. In addition, piezoelectric vibrators and piezoelectric oscillators are equipped with a piezoelectric vibration element made of quartz.
Hereinafter, a piezoelectric vibration element using quartz as a piezoelectric material will be described.
As shown in FIG. 3, a tuning-fork type bending crystal resonator element 400, which is one of piezoelectric resonator elements, includes a crystal resonator element 410, an excitation electrode, a connection electrode, and a frequency provided on the surface of the crystal resonator element 410. It is roughly constituted by an adjustment metal film and a conductive wiring pattern.

水晶振動片410は、音叉形状となっており、基部411と基部411から延設する2本一対の振動腕部412と、により概略構成される。この振動腕部412には、対向する平面同士に同極となる励振用電極421が設けられている。
また、基部411は、平面視略四角形の平板となっている。振動腕部412は、第一の振動腕部412a及び第二の振動腕部412bとから成る。第一の振動腕部412a及び第二の振動腕部412bは、基部411の一辺から同一方向に延設されており、第一の振動腕部412a及び第二の振動腕部412bの長さ方向にはそれぞれ溝部GLが設けられている。溝部GLは、第一の振動腕部412a及び第二の振動腕部412bの両主面に、基部411との境界部分から振動腕部412の先端に向って、振動腕部412の長さ方向と平行に所定の長さで2本設けられている。このような水晶振動片410は、基部411と振動腕部412とが一体となって音叉形状を成しており、フォトリソグラフィ技術と化学エッチング技術、成膜技術により製造される。
The quartz crystal vibrating piece 410 has a tuning fork shape, and is roughly constituted by a base portion 411 and a pair of vibrating arm portions 412 extending from the base portion 411. The vibrating arm portion 412 is provided with an excitation electrode 421 having the same polarity on opposing planes.
The base 411 is a substantially rectangular flat plate in plan view. The vibrating arm portion 412 includes a first vibrating arm portion 412a and a second vibrating arm portion 412b. The first vibrating arm portion 412a and the second vibrating arm portion 412b are extended in the same direction from one side of the base portion 411, and the length direction of the first vibrating arm portion 412a and the second vibrating arm portion 412b. Each is provided with a groove GL. The groove portion GL is formed on both main surfaces of the first vibrating arm portion 412a and the second vibrating arm portion 412b from the boundary portion with the base portion 411 toward the tip of the vibrating arm portion 412 in the longitudinal direction. Are provided in parallel with each other at a predetermined length. In such a quartz crystal vibrating piece 410, the base portion 411 and the vibrating arm portion 412 are integrally formed into a tuning fork shape, and is manufactured by a photolithography technique, a chemical etching technique, and a film forming technique.

第一の振動腕部412aに設けられる電極は、励振用電極421と周波数調整用金属膜423とから成る。励振用電極421は、第一の振動腕部412aの溝部GL内表面を含む一方の主面と、第一の振動腕部412aの溝部GL内表面を含む他方の主面に設けられている。また、励振用電極421は、第二の振動腕部412bに対向する第一の振動腕部412aの内側側面と、この側面に対向する第一の振動腕部412aの外側側面とに異極となるように設けられている。周波数調整用金属膜423は、第一の振動腕部412aの先端部の両主面に設けられている。   The electrode provided on the first vibrating arm portion 412 a is composed of an excitation electrode 421 and a frequency adjusting metal film 423. The excitation electrode 421 is provided on one main surface including the inner surface of the groove portion GL of the first vibrating arm portion 412a and the other main surface including the inner surface of the groove portion GL of the first vibrating arm portion 412a. The excitation electrode 421 has a different polarity between the inner side surface of the first vibrating arm portion 412a facing the second vibrating arm portion 412b and the outer side surface of the first vibrating arm portion 412a facing the side surface. It is provided to become. The frequency adjusting metal film 423 is provided on both main surfaces of the distal end portion of the first vibrating arm portion 412a.

第二の振動腕部412bに設けられる電極は、励振用電極421と周波数調整用金属膜423とから成る。この励振用電極421は、第二の振動腕部412bの溝部GL内表面を含む一方の主面と、第二の振動腕部412bの溝部GL内表面を含む他方の主面に設けられている。また、励振用電極421は、第一の振動腕部412aに対向する第二の振動腕部412bの内側側面と、この側面に対向する第二の振動腕部412bの外側側面とに異極となるように設けられている。周波数調整用金属膜423は、第二の振動腕部412aの先端部の両主面に設けられている。   The electrode provided on the second vibrating arm portion 412 b is composed of an excitation electrode 421 and a frequency adjusting metal film 423. The excitation electrode 421 is provided on one main surface including the inner surface of the groove portion GL of the second vibrating arm portion 412b and the other main surface including the inner surface of the groove portion GL of the second vibrating arm portion 412b. . The excitation electrode 421 has a different polarity between the inner side surface of the second vibrating arm portion 412b facing the first vibrating arm portion 412a and the outer side surface of the second vibrating arm portion 412b facing the side surface. It is provided to become. The frequency adjusting metal film 423 is provided on both main surfaces of the distal end portion of the second vibrating arm portion 412a.

基部411は、2つ一対の接続用電極422が設けられる。一方の接続用電極422は、基部411の振動腕部412が形成されている辺とは反対側にあたる辺の一方の角端部及び基部411の一方の主面から他方の主面にわたって設けられている。また、他方の接続用電極422は、基部411の振動腕部412が形成されている辺とは反対側にあたる辺の他方の角端部及び基部411の一方の主面から他方の主面にわたって設けられている。
また、基部411及び振動腕部412には、所定の電極間を電気的に接続させるための導配線パターン424が設けられている。
The base 411 is provided with two pairs of connection electrodes 422. One connection electrode 422 is provided from one corner end of the side opposite to the side where the vibrating arm portion 412 of the base 411 is formed and from one main surface of the base 411 to the other main surface. Yes. The other connection electrode 422 is provided from the other corner end of the side opposite to the side where the vibrating arm portion 412 of the base 411 is formed and from one main surface of the base 411 to the other main surface. It has been.
The base portion 411 and the vibrating arm portion 412 are provided with a conductive wiring pattern 424 for electrically connecting predetermined electrodes.

一方の接続用電極422は、基部411の一方の主面に設けられた導配線パターン424により、第一の振動腕部412aの一方の主面に設けられた励振用電極421と電気的に接続し、かつ、第二の振動腕部412bの外側側面に設けられた励振用電極421と電気的に接続している。また、第二の振動腕部412bの外側側面に設けられた励振用電極421は、第二の振動腕部412bの内側側面に設けられた励振用電極421と電気的に接続している。更に、第一の振動腕部412の一方の主面に設けられた励振用電極421は、第一の振動腕部412の内側側面に設けられた導配線パターン424により、第一の振動腕部412aの他方の主面に設けられた励振用電極421と電気的に接続されている。   One connection electrode 422 is electrically connected to an excitation electrode 421 provided on one main surface of the first vibrating arm portion 412a by a conductive wiring pattern 424 provided on one main surface of the base 411. In addition, it is electrically connected to the excitation electrode 421 provided on the outer side surface of the second vibrating arm portion 412b. In addition, the excitation electrode 421 provided on the outer side surface of the second vibrating arm portion 412b is electrically connected to the excitation electrode 421 provided on the inner side surface of the second vibrating arm portion 412b. Furthermore, the excitation electrode 421 provided on one main surface of the first vibrating arm portion 412 is connected to the first vibrating arm portion by the conductive wiring pattern 424 provided on the inner side surface of the first vibrating arm portion 412. It is electrically connected to an excitation electrode 421 provided on the other main surface of 412a.

他方の接続用電極422は、基部411の他方の主面に設けられた導配線パターンにより、第二の振動腕部412bの他方の主面に設けられた励振用電極421と電気的に接続し、かつ、第一の振動腕部412aの外側側面に設けられた励振用電極421と電気的に接続している。また、第一の振動腕部412aの外側側面に設けられた励振用電極421は、第一の振動腕部412aの内側側面に設けられた励振用電極421と電気的に接続している。更に、第二の振動腕部412aの他方の主面に設けられた励振用電極421は、第二の振動腕部412bの内側側面に設けられた導配線パターン424により、第一の振動腕部412aの一方の主面に設けられた励振用電極421aと電気的に接続されている。   The other connection electrode 422 is electrically connected to the excitation electrode 421 provided on the other main surface of the second vibrating arm portion 412b by a conductive wiring pattern provided on the other main surface of the base portion 411. And, it is electrically connected to the excitation electrode 421 provided on the outer side surface of the first vibrating arm portion 412a. In addition, the excitation electrode 421 provided on the outer side surface of the first vibrating arm portion 412a is electrically connected to the excitation electrode 421 provided on the inner side surface of the first vibrating arm portion 412a. Further, the excitation electrode 421 provided on the other main surface of the second vibrating arm portion 412a is connected to the first vibrating arm portion by the conductive wiring pattern 424 provided on the inner side surface of the second vibrating arm portion 412b. It is electrically connected to an excitation electrode 421a provided on one main surface of 412a.

これら励振用電極421、接続用電極422、周波数調整用金属膜423a及び導配線パターン424aは、スパッタ技術、蒸着技術、フォトリソグラフィ技術により形成され、Cr層の上にAu層が設けられた積層構造となっている。   The excitation electrode 421, the connection electrode 422, the frequency adjusting metal film 423a, and the conductive wiring pattern 424a are formed by sputtering, vapor deposition, or photolithography, and a laminated structure in which an Au layer is provided on a Cr layer. It has become.

この水晶振動片410を振動させる場合、接続用電極422に交番電圧を印加する。印加後のある電気的状態を瞬間的にとらえると、第一の振動腕部412aの両主面に設けられた励振用電極421はプラス電位となり、両側面に設けられた励振用電極421はマイナス電位となり、プラスからマイナスに電界が生じる。このときの第二の振動腕部412bの両主面の励振用電極421はマイナス電位となり、両側面に設けられた励振用電極421はプラス電位という第一の振動腕部412の励振用電極421に生じた極性とは反対の極性となり、プラスからマイナスに電界が生じる。この交番電圧により生じた電界によって、第一の振動腕部412a及び第二の振動腕部412bに伸縮現象が生じ、振動腕部412に設定した共振周波数の屈曲振動モードとなる。尚、この共振周波数は、水晶振動片410に設けられた周波数調整用金属膜423を構成する金属の量を増減させて調整することができる(例えば、特許文献1又は2参照)。   When the crystal vibrating piece 410 is vibrated, an alternating voltage is applied to the connection electrode 422. When an electrical state after application is instantaneously captured, the excitation electrodes 421 provided on both main surfaces of the first vibrating arm portion 412a have a positive potential, and the excitation electrodes 421 provided on both side surfaces are negative. An electric field is generated from positive to negative. At this time, the excitation electrodes 421 on both main surfaces of the second vibrating arm portion 412b have a negative potential, and the excitation electrodes 421 provided on both side surfaces have a positive potential, the excitation electrodes 421 of the first vibrating arm portion 412. The polarity is opposite to the polarity generated in, and an electric field is generated from plus to minus. The electric field generated by the alternating voltage causes an expansion / contraction phenomenon in the first vibrating arm portion 412a and the second vibrating arm portion 412b, and a bending vibration mode having a resonance frequency set in the vibrating arm portion 412 is set. The resonance frequency can be adjusted by increasing or decreasing the amount of metal constituting the frequency adjusting metal film 423 provided on the crystal vibrating piece 410 (see, for example, Patent Document 1 or 2).

また、このような音叉型屈曲水晶振動素子400は、音叉型に水晶振動片410を形成した後に電極の形成が行われる。
例えば、水晶ウェハ(図示せず)の表裏に例えば、Cr、Cr+Auなどの耐食膜(図示せず)をスパッタリングにて成膜する。
Further, in such a tuning fork type bending quartz crystal vibrating element 400, electrodes are formed after the crystal vibrating piece 410 is formed in a tuning fork type.
For example, a corrosion resistant film (not shown) such as Cr or Cr + Au is formed on the front and back of a quartz wafer (not shown) by sputtering.

次に耐食膜上に感光性レジスト(ポジ型)を両面に形成し、乾燥後表裏の両面に音叉形状の耐食膜が残るように露光、現像、乾燥(以下パターン化)と音叉形状以外の耐食膜のエッチングを行う。   Next, a photosensitive resist (positive type) is formed on both sides of the anticorrosion film, and after drying, exposure, development, drying (patterning) and anticorrosion other than the tuning fork shape so that the anticorrosion film on the front and back sides remains. Etch the film.

次に前記表裏の耐食膜上に電極の形状を決定するために感光性レジスト(ポジ型)をパターン化する。ここで、この感光性レジストの一部は、振動腕部と基部との接続部分を覆うように設けられている。   Next, a photosensitive resist (positive type) is patterned on the front and back corrosion-resistant films in order to determine the shape of the electrodes. Here, a part of the photosensitive resist is provided so as to cover a connection portion between the vibrating arm portion and the base portion.

次に露出する水晶部分をエッチングする。このとき、溝部の形状と水晶振動片410の形状とが同時に形成される。なお、振動腕部412と基部411との接続部分を覆う感光性レジストは、エッチングされることなく残る。そのため、この感光性レジストを残した状態で、基部411と振動腕部412とが形成される。したがって、この感光性レジストは、2つの振動腕部412を跨いだ状態で残されている。   Next, the exposed crystal portion is etched. At this time, the shape of the groove and the shape of the crystal vibrating piece 410 are formed simultaneously. Note that the photosensitive resist covering the connection portion between the vibrating arm portion 412 and the base portion 411 remains without being etched. Therefore, the base portion 411 and the vibrating arm portion 412 are formed with the photosensitive resist remaining. Therefore, this photosensitive resist is left in a state of straddling the two vibrating arm portions 412.

次に裏面に露出した耐食膜をエッチングし水晶表面を得る。次に全面に電極膜を蒸着技術により形成する。このとき、振動腕部412と基部411との接続部分を覆う感光性レジストにより、振動腕部412が接続している側の基部411の側面に電極膜が形成されずに、振動腕部412の側面のみに電極膜が形成される。
次に表裏に形成した感光性レジストとその上に形成された電極膜を剥離する。これは感光性レジストを溶解する液に浸すことで容易に除去できる。しかし、その下部に有する耐食膜は残る。次に前記の残りである耐食膜をエッチングする。
このようにして、水晶振動片410に電極が形成される(特許文献1参照)。
Next, the corrosion-resistant film exposed on the back surface is etched to obtain a crystal surface. Next, an electrode film is formed on the entire surface by a vapor deposition technique. At this time, an electrode film is not formed on the side surface of the base portion 411 to which the vibrating arm portion 412 is connected by the photosensitive resist that covers the connection portion between the vibrating arm portion 412 and the base portion 411, and the vibrating arm portion 412 An electrode film is formed only on the side surface.
Next, the photosensitive resist formed on the front and back and the electrode film formed thereon are peeled off. This can be easily removed by immersing it in a solution for dissolving the photosensitive resist. However, the anticorrosion film that remains in the lower portion remains. Next, the remaining corrosion-resistant film is etched.
In this way, electrodes are formed on the crystal vibrating piece 410 (see Patent Document 1).

特開2007−329879号公報JP 2007-329879 A 特開2004−248237号公報JP 2004-248237 A

しかしながら、このような音叉型屈曲水晶振動素子400は、電極を形成する際、蒸着技術を用いると、溝部などの狭い空間に金属材料が入り込みにくいため電極膜が形成されない場合がある。
これを解決するために、蒸着技術に代えてスパッタ技術を用いて電極を形成する場合、振動腕部412と基部411との接続部分を覆う感光性レジストがマスクの役割を果たすことができず、振動腕部412の側面と基部411の側面とに電極膜が形成されてしまい、励振用電極421が振動腕部412aと振動腕部412bとが向かい合う側面部の電極間においてショートした状態で形成されてしまう。
However, in such a tuning fork-type bending crystal resonator element 400, when an electrode is formed, if an evaporation technique is used, an electrode film may not be formed because a metal material hardly enters a narrow space such as a groove.
In order to solve this, when forming an electrode using a sputtering technique instead of the vapor deposition technique, the photosensitive resist covering the connection portion between the vibrating arm portion 412 and the base portion 411 cannot serve as a mask, An electrode film is formed on the side surface of the vibrating arm portion 412 and the side surface of the base portion 411, and the excitation electrode 421 is formed in a short state between the electrodes on the side surface where the vibrating arm portion 412a and the vibrating arm portion 412b face each other. End up.

そこで、本発明では、前記した問題を解決し、振動腕部の側面に設けられる励振用電極がショートするのを防ぐ音叉型屈曲水晶振動素子を提供することを課題とする。   Therefore, an object of the present invention is to provide a tuning fork-type bending crystal resonator element that solves the above-described problems and prevents the excitation electrode provided on the side surface of the vibrating arm portion from being short-circuited.

前記課題を解決するため、本発明は、音叉型屈曲水晶振動素子であって、基部と、基部から延設する2つ一対の振動腕部と、前記振動腕部の間であって前記基部から延設しつつ前記振動腕部より短く形成される突起部と、前記突起部に、延設方向に沿ってスリットが設けられて構成されていることを特徴とする。   In order to solve the above-described problem, the present invention provides a tuning fork-type bending quartz crystal resonator element, which includes a base, a pair of vibrating arms extending from the base, and the vibrating arms between the base and the base. A protruding portion that is formed to be shorter than the vibrating arm portion while being extended, and a slit is provided in the protruding portion along the extending direction.

また、本発明は、前記一対の振動腕部のそれぞれに、延設方向に沿って溝部が設けられていても良い。   In the present invention, a groove portion may be provided in each of the pair of vibrating arm portions along the extending direction.

また、このような本発明の音叉型屈曲水晶振動素子によれば、前記突起部に、延設方向に沿ってスリットが設けられているので、スパッタ技術を用いて電極膜を設けても、スリットにより電極膜が切断されて振動腕部の側面に設けられる励振用電極がショートするのを防ぐことができる。これにより、振動腕部の側面に設けられる励振用電極の形成するのが容易となる。   Further, according to the tuning fork-type bending quartz crystal resonator element of the present invention, since the slit is provided in the projecting portion along the extending direction, the slit can be provided even if the electrode film is provided by using the sputtering technique. This prevents the electrode film from being cut and the excitation electrode provided on the side surface of the vibrating arm portion from being short-circuited. Thereby, it becomes easy to form the excitation electrode provided on the side surface of the vibrating arm portion.

また、本発明の音叉型屈曲水晶振動素子が、前記一対の振動腕部のそれぞれに、延設方向に沿って溝部を設けたので、それぞれの振動腕部に生じる電界効率を向上させることができる。   Moreover, since the tuning fork-type bending quartz crystal resonator element according to the present invention is provided with the groove portion along the extending direction in each of the pair of vibrating arm portions, the electric field efficiency generated in each vibrating arm portion can be improved. .

本発明の実施形態に係る音叉型屈曲水晶振動素子の一例を示す斜視図である。It is a perspective view which shows an example of the tuning fork type bending crystal vibration element which concerns on embodiment of this invention. 本発明の実施形態に係る音叉型屈曲水晶振動素子の一例を示す平面図である。It is a top view which shows an example of the tuning fork type bending crystal vibration element which concerns on embodiment of this invention. 従来の音叉型屈曲水晶振動素子の一例を示す斜視図である。It is a perspective view which shows an example of the conventional tuning fork type bending crystal vibration element.

本発明を実施するための最良の形態(以下、「実施形態」という。)について、適宜図面を参照しながら詳細に説明する。なお、各構成要素について、状態をわかりやすくするために、誇張して図示している。   The best mode for carrying out the present invention (hereinafter referred to as “embodiment”) will be described in detail with reference to the drawings as appropriate. Note that each component is exaggerated for easy understanding of the state.

図1及び図2に示すように、本発明の実施形態に係る音叉型屈曲水晶振動素子100は、水晶振動片110と、その水晶振動片110に設けられた励振用電極121と接続用電極122a,122bと、周波数調整用金属膜123と、導配線パターン124とから主に構成されている。   As shown in FIGS. 1 and 2, a tuning-fork type bending crystal resonator element 100 according to an embodiment of the present invention includes a crystal resonator element 110, an excitation electrode 121 and a connection electrode 122a provided on the crystal resonator element 110. , 122b, a frequency adjusting metal film 123, and a conductive wiring pattern 124.

水晶振動片110は、音叉形状となっており、基部111と基部111から延設する2本一対の振動腕部112と2本の振動腕部112の間であって基部111から延設する突起部113とにより概略構成される。この振動腕部112には、対向する平面同士に同極となる励振用電極121が設けられている。
また、基部111は、平面視略四角形の平板となっている。振動腕部112は、第一の振動腕部112a及び第二の振動腕部112bとから成る。第一の振動腕部112a及び第二の振動腕部112bは、基部111の一辺から同一方向に延設されており、第一の振動腕部112a及び第二の振動腕部112bの長さ方向にはそれぞれ溝部GLが設けられている。溝部GLは、第一の振動腕部112a及び第二の振動腕部112bの両主面に、基部111との境界部分から振動腕部112の先端に向って、振動腕部112の長さ方向と平行に所定の長さで2本設けられている。このような水晶振動片110は、基部111と振動腕部112とが一体となって音叉形状を成しており、フォトリソグラフィ技術と化学エッチング技術、成膜技術により製造される。
The quartz crystal vibrating piece 110 has a tuning fork shape, and is a projection extending from the base 111 between the pair of vibrating arms 112 and the two vibrating arms 112 extending from the base 111. Part 113. The vibrating arm portion 112 is provided with excitation electrodes 121 having the same polarity on opposing planes.
The base 111 is a flat plate having a substantially rectangular shape in plan view. The vibrating arm portion 112 includes a first vibrating arm portion 112a and a second vibrating arm portion 112b. The first vibrating arm portion 112a and the second vibrating arm portion 112b extend in the same direction from one side of the base 111, and the length direction of the first vibrating arm portion 112a and the second vibrating arm portion 112b. Each is provided with a groove GL. The groove portion GL is formed on both main surfaces of the first vibrating arm portion 112a and the second vibrating arm portion 112b in the length direction of the vibrating arm portion 112 from the boundary portion with the base 111 toward the tip of the vibrating arm portion 112. Are provided in parallel with each other at a predetermined length. In such a quartz crystal vibrating piece 110, the base portion 111 and the vibrating arm portion 112 are integrally formed into a tuning fork shape, and is manufactured by a photolithography technique, a chemical etching technique, and a film forming technique.

第一の振動腕部112aに設けられる電極は、励振用電極121と周波数調整用金属膜123とから成る。第一の振動腕部112aに設けられる励振用電極121は、第一の振動腕部112aの溝部GL内表面を含む一方の主面と、第一の振動腕部112aの溝部GL内表面を含む他方の主面に設けられている。また、第一の振動腕部112aに設けられる励振用電極121は、第二の振動腕部112bに対向する第一の振動腕部112aの内側側面と、この側面に対向する第一の振動腕部112aの外側側面とに設けられ、第一の振動腕部112aの両主面に設けられる励振用電極121と異極となるように設けられている。第一の振動腕部112aに設けられる周波数調整用金属膜123は、第一の振動腕部112aの先端部の両主面に設けられている。なお、周波数調整用金属膜123は、すくなくとも一方の主面に設ける構成としても良い。   The electrode provided on the first vibrating arm portion 112 a is composed of an excitation electrode 121 and a frequency adjusting metal film 123. The excitation electrode 121 provided on the first vibrating arm portion 112a includes one main surface including the inner surface of the groove portion GL of the first vibrating arm portion 112a and the inner surface of the groove portion GL of the first vibrating arm portion 112a. It is provided on the other main surface. The excitation electrode 121 provided on the first vibrating arm portion 112a includes an inner side surface of the first vibrating arm portion 112a facing the second vibrating arm portion 112b and a first vibrating arm facing the side surface. It is provided on the outer side surface of the portion 112a and is provided so as to have a different polarity from the excitation electrode 121 provided on both main surfaces of the first vibrating arm portion 112a. The frequency adjusting metal film 123 provided on the first vibrating arm portion 112a is provided on both main surfaces of the distal end portion of the first vibrating arm portion 112a. The frequency adjusting metal film 123 may be provided on at least one main surface.

第二の振動腕部112bに設けられる電極は、励振用電極121と周波数調整用金属膜123とから成る。第二の振動腕部112bに設けられる励振用電極121は、第二の振動腕部112bの溝部GL内表面を含む一方の主面と、第二の振動腕部112bの溝部GL内表面を含む他方の主面に設けられている。また、第二の振動腕部112bに設けられる励振用電極121は、第一の振動腕部112aに対向する第二の振動腕部112bの内側側面と、この側面に対向する第二の振動腕部112bの外側側面とに設けられ、第二の振動腕部112bの両主面に設けられる励振用電極121と異極となるように設けられている。第二の振動腕部112bに設けられる周波数調整用金属膜123は、第二の振動腕部112aの先端部の両主面に設けられている。なお、周波数調整用金属膜123は、すくなくとも一方の主面に設ける構成としても良い。   The electrode provided on the second vibrating arm portion 112 b is composed of an excitation electrode 121 and a frequency adjusting metal film 123. The excitation electrode 121 provided on the second vibrating arm portion 112b includes one main surface including the inner surface of the groove portion GL of the second vibrating arm portion 112b and the inner surface of the groove portion GL of the second vibrating arm portion 112b. It is provided on the other main surface. The excitation electrode 121 provided on the second vibrating arm portion 112b includes an inner side surface of the second vibrating arm portion 112b facing the first vibrating arm portion 112a and a second vibrating arm facing the side surface. It is provided on the outer side surface of the portion 112b and is provided so as to have a different polarity from the excitation electrode 121 provided on both main surfaces of the second vibrating arm portion 112b. The frequency adjusting metal film 123 provided on the second vibrating arm portion 112b is provided on both main surfaces of the distal end portion of the second vibrating arm portion 112a. The frequency adjusting metal film 123 may be provided on at least one main surface.

基部111は、接続用電極122a及び122bが設けられる。接続用電極122aは、基部111の振動腕部112が形成されている辺とは反対側にあたる辺の一方の角端部及び基部111の一方の主面から他方の主面にわたって設けられている。また、接続用電極122bは、基部111の振動腕部112が形成されている辺とは反対側にあたる辺の他方の角端部及び基部111の一方の主面から他方の主面にわたって設けられている。
また、基部111及び振動腕部112には、所定の電極間を電気的に接続させるための導配線パターン124が設けられている。
The base 111 is provided with connection electrodes 122a and 122b. The connection electrode 122 a is provided from one corner end of the side opposite to the side where the vibrating arm portion 112 of the base 111 is formed and from one main surface of the base 111 to the other main surface. The connection electrode 122b is provided from the other corner end of the side opposite to the side on which the vibrating arm portion 112 of the base 111 is formed and from one main surface of the base 111 to the other main surface. Yes.
Further, the base portion 111 and the vibrating arm portion 112 are provided with a conductive wiring pattern 124 for electrically connecting predetermined electrodes.

接続用電極122aは、基部111の一方の主面に設けられた導配線パターン124により、第一の振動腕部112aの一方の主面に設けられた励振用電極121と電気的に接続し、かつ、第二の振動腕部112bの外側側面に設けられた励振用電極121と電気的に接続している。また、第二の振動腕部112bの外側側面に設けられた励振用電極121は、第二の振動腕部112bの内側側面に設けられた励振用電極121と電気的に接続している。更に、第一の振動腕部112aの一方の主面に設けられた励振用電極121は、基部111の側面に設けられた導配線パターンにより、第一の振動腕部112aの他方の主面に設けられた励振用電極121と電気的に接続されている。   The connection electrode 122a is electrically connected to the excitation electrode 121 provided on one main surface of the first vibrating arm portion 112a by the conductive wiring pattern 124 provided on one main surface of the base 111, And it is electrically connected to the excitation electrode 121 provided on the outer side surface of the second vibrating arm portion 112b. Further, the excitation electrode 121 provided on the outer side surface of the second vibrating arm portion 112b is electrically connected to the excitation electrode 121 provided on the inner side surface of the second vibrating arm portion 112b. Further, the excitation electrode 121 provided on one main surface of the first vibrating arm portion 112a is formed on the other main surface of the first vibrating arm portion 112a by a conductive wiring pattern provided on the side surface of the base 111. It is electrically connected to the provided excitation electrode 121.

接続用電極122bは、基部111の他方の主面に設けられた導配線パターンにより、第二の振動腕部112bの他方の主面に設けられた励振用電極と電気的に接続し、かつ、第一の振動腕部112aの外側側面に設けられた励振用電極と電気的に接続している。また、第一の振動腕部112aの外側側面に設けられた励振用電極は、第一の振動腕部112aの内側側面に設けられた励振用電極121と電気的に接続している。更に、第二の振動腕部112aの他方の主面に設けられた励振用電極121は、基部111の内側側面に設けられた導配線パターンにより、第二の振動腕部112bの一方の主面に設けられた励振用電極121と電気的に接続されている。   The connection electrode 122b is electrically connected to the excitation electrode provided on the other main surface of the second vibrating arm portion 112b by a conductive wiring pattern provided on the other main surface of the base 111, and It is electrically connected to an excitation electrode provided on the outer side surface of the first vibrating arm portion 112a. In addition, the excitation electrode provided on the outer side surface of the first vibrating arm portion 112a is electrically connected to the excitation electrode 121 provided on the inner side surface of the first vibrating arm portion 112a. Furthermore, the excitation electrode 121 provided on the other main surface of the second vibrating arm portion 112a is connected to one main surface of the second vibrating arm portion 112b by a conductive wiring pattern provided on the inner side surface of the base portion 111. Is electrically connected to the excitation electrode 121 provided on the substrate.

これら励振用電極121、接続用電極122a,122b及び導配線パターン124は、フォトリソグラフィ技術により形成され、Ti層の上にPd又はAu層が設けられた積層構造となっている。   The excitation electrode 121, the connection electrodes 122a and 122b, and the conductive wiring pattern 124 are formed by a photolithography technique and have a laminated structure in which a Pd or Au layer is provided on a Ti layer.

この音叉型の水晶振動片110を振動させる場合、接続用電極122a及び122bに交番電圧を印加する。印加後のある電気的状態を瞬間的にとらえると、第一の振動腕部112aの両主面に設けられた励振用電極121はプラス電位となり、両側面に設けられた励振用電極121はマイナス電位となり、プラスからマイナスに電界が生じる。このときの第二の振動腕部112bの両主面の励振用電極121はマイナス電位となり、両側面に設けられた励振用電極121はプラス電位という第一の振動腕部112aの励振用電極121に生じた極性とは反対の極性となり、プラスからマイナスに電界が生じる。この交番電圧により生じた電界によって、第一の振動腕部112a及び第二の振動腕部112bに伸縮現象が生じ、振動腕部112に設定した共振周波数の屈曲振動モードとなる。尚、この共振周波数は、音叉型の水晶振動片110に設けられた周波数調整用金属膜123を構成する金属の量を増減させて調整することができる。   When this tuning-fork type crystal vibrating piece 110 is vibrated, an alternating voltage is applied to the connection electrodes 122a and 122b. When an electrical state after application is instantaneously captured, the excitation electrodes 121 provided on both main surfaces of the first vibrating arm portion 112a have a positive potential, and the excitation electrodes 121 provided on both side surfaces are negative. An electric field is generated from positive to negative. At this time, the excitation electrodes 121 on both main surfaces of the second vibrating arm portion 112b have a negative potential, and the excitation electrodes 121 provided on both side surfaces have a positive potential, the exciting electrodes 121 of the first vibrating arm portion 112a. The polarity is opposite to the polarity generated in, and an electric field is generated from plus to minus. The electric field generated by the alternating voltage causes an expansion / contraction phenomenon in the first vibrating arm portion 112a and the second vibrating arm portion 112b, and a bending vibration mode having a resonance frequency set in the vibrating arm portion 112 is set. The resonance frequency can be adjusted by increasing or decreasing the amount of metal constituting the frequency adjusting metal film 123 provided on the tuning-fork type crystal vibrating piece 110.

突起部113は、2本一対の振動腕部112の中間であって、振動腕部112に沿って基部111から延設されている。
また、突起部113は、振動腕部112よりも短く設けられており、幅を振動腕部112よりも大きく又は小さく若しくは同じとなるように設けられる。
この突起部113の先端側には、延設方向に沿ってスリット113bが設けられている。このスリット113bは、突起部113の厚み方向に貫通している。また、スリット113bの長さは、先端側から基部111の境目までの間で形成されれば、どの長さでも良い。
The protruding portion 113 is intermediate between the pair of vibrating arm portions 112, and extends from the base portion 111 along the vibrating arm portion 112.
Further, the protrusion 113 is provided shorter than the vibrating arm 112 and is provided so that the width is larger, smaller, or the same as that of the vibrating arm 112.
A slit 113b is provided on the distal end side of the protruding portion 113 along the extending direction. The slit 113b penetrates the protrusion 113 in the thickness direction. Further, the slit 113b may have any length as long as it is formed between the tip side and the boundary of the base 111.

突起部113に設けられたこのスリット113bは、第一の振動腕部112aと第二の振動腕部112bとからなる振動腕部112の側面に励振用電極をスパッタ技術及びフォトリソグラフィ技術にて形成する際に、第一の振動腕部112aの側面の励振用電極121と第二の振動腕部112bの側面の励振用電極121とのショートした状態を切断する役割を果たす。
また、突起部113は、スリット113bが形成できる程度の長さを有していれば良く、例えば、第一の振動腕部112aと第二の振動腕部112bとの距離よりも小さくなる長さで形成されていれば良い。言い換えれば、2つ一対の振動腕部112の間隔より短くなるように突起部113を設ければよい。
The slit 113b provided in the protrusion 113 forms an excitation electrode on the side surface of the vibrating arm portion 112 including the first vibrating arm portion 112a and the second vibrating arm portion 112b by a sputtering technique and a photolithography technique. In doing so, it plays a role of cutting the short-circuited state between the excitation electrode 121 on the side surface of the first vibrating arm portion 112a and the excitation electrode 121 on the side surface of the second vibrating arm portion 112b.
The protrusion 113 only needs to have a length that allows the slit 113b to be formed. For example, the protrusion 113 has a length smaller than the distance between the first vibrating arm 112a and the second vibrating arm 112b. If it is formed by. In other words, the protrusion 113 may be provided so as to be shorter than the distance between the pair of vibrating arms 112.

具体的には、以下のように突起部113に設けられたこのスリット113bが用いられる。このスリットの113bの役割を説明するために、本発明の実施形態に係る音叉型屈曲水晶振動素子100の製造方法を説明する。   Specifically, this slit 113b provided in the protrusion 113 is used as follows. In order to explain the role of the slit 113b, a method of manufacturing the tuning-fork type bending crystal resonator element 100 according to the embodiment of the present invention will be described.

例えば、本発明の実施形態に係る音叉型屈曲水晶振動素子100は、音叉型に水晶振動片110を形成した後に電極の形成が行われる。
例えば、水晶ウェハ(図示せず)の表裏に例えば、Cr、Cr+Auなどの耐食膜(図示せず)をスパッタリングにて成膜する。
For example, in the tuning fork-type bending crystal resonator element 100 according to the embodiment of the present invention, the electrodes are formed after the crystal resonator element 110 is formed on the tuning fork.
For example, a corrosion resistant film (not shown) such as Cr or Cr + Au is formed on the front and back of a quartz wafer (not shown) by sputtering.

次に耐食膜上に感光性レジスト(ポジ型)を両面に形成し、乾燥後表裏の両面に音叉形状の耐食膜が残るように露光、現像、乾燥(以下パターン化)と音叉形状以外の耐食膜のエッチングを行う。   Next, a photosensitive resist (positive type) is formed on both sides of the anticorrosion film, and after drying, exposure, development, drying (patterning) and anticorrosion other than the tuning fork shape so that the anticorrosion film on the front and back sides remains. Etch the film.

次に前記表裏の耐食膜上に電極の形状を決定するために感光性レジスト(ポジ型)をパターン化する。ここで、この感光性レジストの一部は、スリット113bの内部を含む突起部113と振動腕部112と基部111との接続部分を覆うように設けられている。   Next, a photosensitive resist (positive type) is patterned on the front and back corrosion-resistant films in order to determine the shape of the electrodes. Here, a part of the photosensitive resist is provided so as to cover a connection portion between the protruding portion 113 including the inside of the slit 113 b, the vibrating arm portion 112, and the base portion 111.

次に露出する水晶部分をエッチングする。このとき、スリット113bの形状と溝部GLの形状と水晶振動片110の形状とが同時に形成される。なお、突起部113と振動腕部112と基部111との接続部分を覆う感光性レジストは、エッチングされることなく残る。そのため、この感光性レジストを残した状態で、基部111と振動腕部112と突起部113とが形成される。したがって、この感光性レジストは、スリット113を跨いだ状態で少なくとも突起部113に残されている。   Next, the exposed crystal portion is etched. At this time, the shape of the slit 113b, the shape of the groove GL, and the shape of the quartz crystal vibrating piece 110 are formed simultaneously. Note that the photosensitive resist covering the connection portion of the protrusion 113, the vibrating arm 112, and the base 111 remains without being etched. Therefore, the base 111, the vibrating arm 112, and the protrusion 113 are formed with the photosensitive resist remaining. Therefore, this photosensitive resist remains at least on the protrusion 113 in a state of straddling the slit 113.

次に表裏面に露出した耐食膜をエッチングし水晶表面を得る。次に全面に電極膜をスパッタ技術により形成する。このとき、スリット113bを跨いで突起部113を覆う感光性レジストにより、スリット113bを跨いで突起部113の側面に電極膜が形成される。
次に表裏に形成した感光性レジストとその上に形成された電極膜を剥離する。これは感光性レジストを溶解する液に浸すことで容易に除去できる。しかし、その下部に有する耐食膜は残る。スリット113bを跨いだ感光性レジストも除去されるため、第一の振動腕部112aの側面の電極と第二の振動腕部112bの側面の電極とが切断した状態となる。次に前記の残りである耐食膜をエッチングする。
このようにして、水晶振動片110に電極が形成されるので、スパッタ技術を用いても、第一の振動腕部112aの側面の電極と第二の振動腕部112bの側面の電極とがショートした状態から切断した状態にすることができる。
Next, the corrosion-resistant film exposed on the front and back surfaces is etched to obtain a crystal surface. Next, an electrode film is formed on the entire surface by sputtering. At this time, an electrode film is formed on the side surface of the protrusion 113 across the slit 113b by the photosensitive resist that covers the protrusion 113 across the slit 113b.
Next, the photosensitive resist formed on the front and back and the electrode film formed thereon are peeled off. This can be easily removed by immersing it in a solution for dissolving the photosensitive resist. However, the anticorrosion film that remains in the lower portion remains. Since the photosensitive resist straddling the slit 113b is also removed, the electrode on the side surface of the first vibrating arm portion 112a and the electrode on the side surface of the second vibrating arm portion 112b are cut. Next, the remaining corrosion-resistant film is etched.
In this way, since the electrodes are formed on the crystal vibrating piece 110, the electrodes on the side surface of the first vibrating arm portion 112a and the electrodes on the side surface of the second vibrating arm portion 112b are short-circuited even when sputtering is used. The cut state can be changed to the cut state.

なお、本発明の実施形態について説明したが、本発明は、適宜、変更可能である。
例えば、周波数調整用金属膜には、別途、Ag(銀)、Au(金)等の金属材料を用いて、厚みを厚くしても良い。
また、本発明の音叉型屈曲水晶振動素子は、所定のパッケージに封入して圧電振動子に用いることができ、また、この状態で発振回路を備えた集積回路素子と接続する構成にして圧電発振器に用いても良い。
In addition, although embodiment of this invention was described, this invention can be changed suitably.
For example, the metal film for frequency adjustment may be separately thickened using a metal material such as Ag (silver) or Au (gold).
Further, the tuning fork-type bending crystal resonator element of the present invention can be used in a piezoelectric vibrator by being enclosed in a predetermined package. In this state, the piezoelectric oscillator is configured to be connected to an integrated circuit element including an oscillation circuit. You may use for.

100 音叉型屈曲水晶振動素子
110a 水晶振動片
111 基部
112 振動腕部
112a 第一の振動腕部
112b 第二の振動腕部
121 励振用電極
122a,122b 接続用電極
123 周波数調整用金属膜
124 導配線パターン
113 突起部
113b スリット
GL 溝部
DESCRIPTION OF SYMBOLS 100 Tuning fork type bending crystal vibrating element 110a Quartz vibrating piece 111 Base 112 Vibrating arm part 112a First vibrating arm part 112b Second vibrating arm part 121 Excitation electrode 122a, 122b Connection electrode 123 Frequency adjusting metal film 124 Conductive wiring Pattern 113 Projection 113b Slit GL Groove

Claims (2)

基部と、
基部から延設する2つ一対の振動腕部と、
前記振動腕部の間であって前記基部から延設しつつ前記振動腕部より短く形成される突起部と、
前記突起部に、延設方向に沿ってスリットが設けられて構成されていることを特徴とする音叉型屈曲水晶振動素子。
The base,
Two pairs of vibrating arms extending from the base,
A projection formed between the vibrating arms and extending from the base while being shorter than the vibrating arms;
A tuning-fork-type bent quartz crystal vibrating element, wherein the protrusion is provided with a slit along the extending direction.
前記一対の振動腕部のそれぞれに、延設方向に沿って溝部が設けられていることを特徴とする請求項1に記載の音叉型屈曲水晶振動素子。   The tuning fork-type bending crystal resonator element according to claim 1, wherein a groove portion is provided in each of the pair of vibrating arm portions along the extending direction.
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JP2014023134A (en) * 2012-07-24 2014-02-03 Kyocera Crystal Device Corp Tuning fork type bending crystal vibrator, and method of manufacturing the same
JP2014064206A (en) * 2012-09-21 2014-04-10 Kyocera Crystal Device Corp Quartz oscillation element
JP2014090298A (en) * 2012-10-30 2014-05-15 Kyocera Crystal Device Corp Crystal vibration element and process of manufacturing the same
US8922286B2 (en) 2012-09-13 2014-12-30 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, and mobile object
JP2015115752A (en) * 2013-12-11 2015-06-22 京セラクリスタルデバイス株式会社 Crystal vibration element and method for manufacturing the same
US9255802B2 (en) 2013-12-27 2016-02-09 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, physical quantity sensor, mobile object, and frequency adjustment method of resonator element
US9287848B2 (en) 2012-10-25 2016-03-15 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, and moving object having reduced vibration leakage
US10181836B2 (en) 2012-12-19 2019-01-15 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic device, and moving object

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JP2006345517A (en) * 2005-06-09 2006-12-21 Eta Sa Manufacture Horlogere Suisse Small-sized piezoelectric resonator

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JPS5085170U (en) * 1973-12-10 1975-07-21
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JP2004357178A (en) * 2003-05-30 2004-12-16 River Eletec Kk Piezoelectric vibrator
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014023134A (en) * 2012-07-24 2014-02-03 Kyocera Crystal Device Corp Tuning fork type bending crystal vibrator, and method of manufacturing the same
US8922286B2 (en) 2012-09-13 2014-12-30 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, and mobile object
JP2014064206A (en) * 2012-09-21 2014-04-10 Kyocera Crystal Device Corp Quartz oscillation element
US9287848B2 (en) 2012-10-25 2016-03-15 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, and moving object having reduced vibration leakage
JP2014090298A (en) * 2012-10-30 2014-05-15 Kyocera Crystal Device Corp Crystal vibration element and process of manufacturing the same
US10181836B2 (en) 2012-12-19 2019-01-15 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic device, and moving object
JP2015115752A (en) * 2013-12-11 2015-06-22 京セラクリスタルデバイス株式会社 Crystal vibration element and method for manufacturing the same
US9255802B2 (en) 2013-12-27 2016-02-09 Seiko Epson Corporation Resonator element, resonator, oscillator, electronic apparatus, physical quantity sensor, mobile object, and frequency adjustment method of resonator element

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