JP2011123357A5 - - Google Patents

Download PDF

Info

Publication number
JP2011123357A5
JP2011123357A5 JP2009281732A JP2009281732A JP2011123357A5 JP 2011123357 A5 JP2011123357 A5 JP 2011123357A5 JP 2009281732 A JP2009281732 A JP 2009281732A JP 2009281732 A JP2009281732 A JP 2009281732A JP 2011123357 A5 JP2011123357 A5 JP 2011123357A5
Authority
JP
Japan
Prior art keywords
conductive
rubber roller
mask member
roller according
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009281732A
Other languages
Japanese (ja)
Other versions
JP2011123357A (en
JP5414497B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2009281732A priority Critical patent/JP5414497B2/en
Priority claimed from JP2009281732A external-priority patent/JP5414497B2/en
Publication of JP2011123357A publication Critical patent/JP2011123357A/en
Publication of JP2011123357A5 publication Critical patent/JP2011123357A5/ja
Application granted granted Critical
Publication of JP5414497B2 publication Critical patent/JP5414497B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (6)

芯金と、表面に硬度の異なる領域をパターン状に有する導電性加硫ゴム層とを有する導電性ゴムローラの製造方法であって、
芯金の周囲に形成した導電性加硫ゴム層の周面に、電子線の透過率の異なる部分がパターン状に配置されてなるマスク部材を介して電子線を照射し、該導電性加硫ゴム層の表面に電子線の照射強度の差に由来する硬度の異なる領域を形成する工程を有することを特徴とする導電性ゴムローラの製造方法。
A method for producing a conductive rubber roller having a cored bar and a conductive vulcanized rubber layer having a pattern of regions having different hardness on the surface,
The conductive vulcanized rubber layer formed around the core metal is irradiated with an electron beam through a mask member in which portions having different electron beam transmittances are arranged in a pattern on the peripheral surface of the conductive vulcanized rubber layer. A method for producing a conductive rubber roller, comprising a step of forming regions of different hardness derived from a difference in electron beam irradiation intensity on a surface of a rubber layer.
前記マスク部材が、スリット形状に開口が設けられている請求項1に記載の導電性ゴムローラの製造方法。  The method for manufacturing a conductive rubber roller according to claim 1, wherein the mask member is provided with an opening in a slit shape. 前記マスク部材が、薄膜部と厚膜部からなり、該厚膜部が格子形状に設けられている請求項1に記載の導電性ゴムローラの製造方法。  The method of manufacturing a conductive rubber roller according to claim 1, wherein the mask member includes a thin film portion and a thick film portion, and the thick film portion is provided in a lattice shape. 前記マスク部材が、円形状の開口部が等間隔に設けられている請求項1に記載の導電性ゴムローラの製造方法。  The method for producing a conductive rubber roller according to claim 1, wherein the mask member is provided with circular openings at equal intervals. 前記マスク部材が、メッシュ形状であり、四角形状の開口部を有する請求項1に記載の導電性ゴムローラの製造方法。  The method of manufacturing a conductive rubber roller according to claim 1, wherein the mask member has a mesh shape and has a quadrangular opening. 前記導電性加硫ゴム層が、カーボンブラックとニトリルゴムとを含む請求項1〜5のいずれか一項に記載の導電性ゴムローラの製造方法。
The method for producing a conductive rubber roller according to any one of claims 1 to 5, wherein the conductive vulcanized rubber layer contains carbon black and nitrile rubber.
JP2009281732A 2009-12-11 2009-12-11 Manufacturing method of rubber roller Expired - Fee Related JP5414497B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009281732A JP5414497B2 (en) 2009-12-11 2009-12-11 Manufacturing method of rubber roller

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009281732A JP5414497B2 (en) 2009-12-11 2009-12-11 Manufacturing method of rubber roller

Publications (3)

Publication Number Publication Date
JP2011123357A JP2011123357A (en) 2011-06-23
JP2011123357A5 true JP2011123357A5 (en) 2013-01-24
JP5414497B2 JP5414497B2 (en) 2014-02-12

Family

ID=44287283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009281732A Expired - Fee Related JP5414497B2 (en) 2009-12-11 2009-12-11 Manufacturing method of rubber roller

Country Status (1)

Country Link
JP (1) JP5414497B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6053354B2 (en) * 2011-07-06 2016-12-27 キヤノン株式会社 Charging member, method for manufacturing the same, and electrophotographic apparatus
JP5876684B2 (en) * 2011-08-08 2016-03-02 キヤノン株式会社 Method for manufacturing charging roller and conductive roller
JP6270471B2 (en) * 2013-12-27 2018-01-31 キヤノン株式会社 Method for producing elastic roller
JP2016206457A (en) * 2015-04-23 2016-12-08 住友ゴム工業株式会社 Semiconductive roller
CN110204747A (en) * 2019-06-21 2019-09-06 江南大学 A method of improving rubber roller cushion rubber performance

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08283578A (en) * 1995-04-18 1996-10-29 Shin Etsu Polymer Co Ltd Conductive rubber roll and production thereof
JP3714740B2 (en) * 1996-09-30 2005-11-09 信越ポリマー株式会社 Semi-conductive roll
JPH11208921A (en) * 1998-01-27 1999-08-03 Seiko Epson Corp Printer paper feed roller and manufacture thereof
JP2005212372A (en) * 2004-01-30 2005-08-11 Canon Inc Method and equipment for surface treatment of elastic member
JP4012171B2 (en) * 2004-05-24 2007-11-21 キヤノン株式会社 Conductive member for electrophotography, electrophotographic apparatus and process cartridge
JP4781381B2 (en) * 2008-03-31 2011-09-28 東海ゴム工業株式会社 Elastic material for electrophotographic equipment and member for electrophotographic equipment
JP2010014887A (en) * 2008-07-02 2010-01-21 Canon Chemicals Inc Method for manufacturing conductive roller

Similar Documents

Publication Publication Date Title
JP2011123357A5 (en)
JP2017210657A5 (en)
FR2936360B1 (en) PROCESS FOR MANUFACTURING A MASK WITH SUBMILLIMETRIC OPENINGS FOR SUBMILLIMETRIC ELECTROCONDUCTIVE GRID, MASK AND SUBMILLIMETRIC ELECTROCONDUCTIVE GRID.
JP2014186333A5 (en) Transmission mask blank, transmission mask, and method for manufacturing semiconductor device
JP2013153140A5 (en) Method for manufacturing semiconductor device
BR112013016671A2 (en) defined photo aperture plate and method to produce the same
JP2015028537A5 (en) Method for manufacturing light diffusing member
JP2013247367A5 (en)
JP2010532429A5 (en)
JP2012138570A5 (en)
JP2012509194A5 (en)
JP2017002408A5 (en)
ES2570383T3 (en) Method of improving the printing performance of flexographic printing elements
JP2020073726A5 (en)
JP2009520376A5 (en)
JP2015028204A5 (en)
JP2014502418A5 (en)
JP2011159850A (en) Template, method of manufacturing the same and method of forming pattern
WO2016112050A9 (en) Multi-tone amplitude photomask
WO2009082150A3 (en) Forming method of magnetic pattern and manufacturing method of patterned media using the same
JP2012082510A5 (en)
WO2012021498A3 (en) Multiple exposure with image reversal in a single photoresist layer
JP2009086384A5 (en)
JP2008078634A5 (en)
JP2018059211A5 (en)