JP2011119550A - Optical member deformation apparatus, optical system, aligner method of manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical member deformation apparatus wherein the optical characteristics of an optical member can be adjusted accurately, and to provide an optical system, an aligner and a method of manufacturing a device. <P>SOLUTION: A mirror deforming apparatus 53 which deforms the shape of a concave mirror 41 includes a contact member 70 which is brought into contact with the concave mirror 41; a displacement member 65 which is coupled to the contact member 70 and displaced based on a driving force transmitted from an actuator 61; a displacement magnification mechanism 73 having coupling members 57 and 63 which are displaced, based on the driving force from the actuator 61 and magnify and transmit the displacements of the coupling members 57 and 63 to the displacement member 65; a coil spring 69 provided between the contact member 70 and the displacement member 65 and reduces and transmits the displacement of the displacement member 65 transmitted from the displacement magnification mechanism 73 to the contact member 70; a displacement sensor 67 which measures the displacement of the displacement member 65; and a control mechanism 68 which controls the displacement of the displacement member 65; based on the measurement results from the displacement sensor 67. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an optical member deformation apparatus that deforms the shape of an optical member, an optical system including the optical member deformation apparatus, an exposure apparatus including the optical system, and a device manufacturing method using the exposure apparatus.

  In general, in a lithography process for manufacturing a device such as a semiconductor element or a liquid crystal display element, a predetermined pattern formed on a mask such as a reticle or photomask is applied to a wafer coated with a resist or the like via a projection optical system, An exposure apparatus for transferring onto a substrate such as a glass plate is used. In such an exposure apparatus, the optical member may be locally deformed when non-uniform thermal expansion is applied to at least some of the optical members constituting the projection optical system. When the optical member is deformed in such a manner, the optical characteristics of the projection optical system are changed, and there is a possibility that poor projection of the pattern image on the substrate may occur. Therefore, a conventional exposure apparatus is known in which a mechanism for positively deforming the shape of the optical member is provided in order to adjust the optical characteristics of the projection optical system (see, for example, Patent Document 1). .

  That is, the exposure apparatus is provided with a minute amount deformation mechanism for deforming the shape of the concave mirror (optical member) among the optical members constituting the projection optical system. The minute amount deformation mechanism includes a substantially U-shaped tip member, and the tip member is provided in such a manner as to sandwich the convex portion provided on the side surface of the concave mirror from both sides in the optical axis direction of the concave mirror. The minute amount deformation mechanism is provided with a load sensor for detecting a load applied from the tip member to the concave mirror. The load sensor includes a probe connected to the tip member in a manner extending in parallel to the optical axis direction of the concave mirror, and a sensor unit for detecting a load applied to the probe in the optical axis direction of the concave mirror. It is configured.

  In this exposure apparatus, when the probe is displaced in the optical axis direction of the concave mirror with the minute amount deformation mechanism in contact with the convex portion of the concave mirror, a load is applied from the tip member to the convex portion of the concave mirror. Thus, at least a part of the shape of the concave mirror is deformed. At this time, a reaction force from the convex portion of the concave mirror corresponding to the magnitude of the load applied from the tip member to the convex portion of the concave mirror is applied to the probe via the tip member. Then, the amount of deformation of the concave mirror is measured by detecting the reaction force applied to the probe by the sensor unit.

JP 2007-266511 A

  By the way, in the said exposure apparatus, when deform | transforming a concave mirror minutely, the magnitude | size of the load provided with respect to the convex part of a concave mirror from a front-end | tip member is finely adjusted. Therefore, the amount of change in the reaction force applied from the convex part of the concave mirror to the probe via the tip member is also small. Then, compared with the case of roughly adjusting the deformation of the concave mirror, there is a possibility that the detection accuracy when the sensor unit detects the load applied from the tip member to the convex portion of the concave mirror may be lowered, and thus the concave mirror There has been a problem that it is difficult to deform with high accuracy.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide an optical member deformation apparatus, an optical system, an exposure apparatus, and a device manufacturing method capable of accurately adjusting the optical characteristics of the optical member. Is to provide.

In order to achieve the above object, the present invention adopts the following configuration corresponding to FIGS. 1 to 11 shown in the embodiment.
The optical member deforming device of the present invention includes an abutting member (70) that abuts against the optical member (41) in the optical member deforming device (53) that deforms the shape of the optical member (41), and the abutting member. A displacement member (65) coupled to the member (70) and displaced based on the driving force transmitted from the driving source (61), and a coupling member (57, 57) displaced based on the driving force from the driving source (61). 63), a displacement enlarging mechanism (73) for enlarging the amount of displacement of the connecting members (57, 63) and transmitting it to the displacement member (65), the contact member (70) and the displacement member ( 65), a reduction mechanism (69) that reduces the amount of displacement of the displacement member (65) transmitted from the displacement enlargement mechanism (73) and transmits it to the contact member (70). Measuring member (67) for measuring the displacement of the displacing member (65) If, based on said measurement result of the measuring member (67), and summarized in that a control mechanism (68) for controlling the displacement amount of the displacement member (65).

  According to the above configuration, in the displacement enlarging mechanism, the displacement amount of the connecting member that is displaced by the driving force from the driving source is enlarged and transmitted to the displacement member. Further, the displacement amount of the displacement member is transmitted to the contact member in a state of being reduced by the reduction mechanism. Therefore, it is possible to avoid an excessive force from being applied to the optical member from the contact member as compared with the case where no reduction mechanism is provided.

  In the present invention, the displacement amount of the displacement member is adjusted based on the measurement result of the measurement member that measures the displacement amount of the displacement member. That is, the force acting on the optical member from the contact member is adjusted based on the displacement amount of the displacement member having a larger displacement amount than the contact member. Therefore, since the deformation amount of the optical member can be adjusted with high accuracy, the optical characteristics of the optical member can be adjusted with high accuracy.

  In addition, in order to explain this invention clearly, it demonstrated corresponding to the code | symbol of drawing which shows embodiment, but it cannot be overemphasized that this invention is not limited to embodiment.

  According to the present invention, the optical characteristics of the optical member can be adjusted with high accuracy.

1 is a schematic sectional view of an exposure apparatus according to a first embodiment. 2A is a cross-sectional view taken along line 2a-2a in FIG. 1, and FIG. 2B is a cross-sectional view of the mirror deformation device of the first embodiment. (A) is sectional drawing of the mirror deformation | transformation apparatus of an initial state, (b) is sectional drawing which shows the state which the actuator contracted rather than FIG. 3 (a), (c) has extended the actuator rather than FIG. 3 (a). Sectional drawing which shows a state. (A) is a schematic diagram showing a state before the mirror deforming device deforms the concave mirror, (b) is a schematic diagram showing a state where the mirror deforming device deforms the concave mirror in the + Y direction side, and (c) is a mirror deformed state. The schematic diagram which shows the state which the apparatus distorted and deformed the concave mirror to the -Y direction side. Sectional drawing of the mirror deformation | transformation apparatus of 2nd Embodiment. (A) is sectional drawing which shows the state which the load application mechanism is applying the preload with respect to a concave mirror, (b) is sectional drawing which shows the state which canceled the application of the preload with respect to the concave mirror by the load application mechanism. (A) is a schematic diagram which shows the state which both the load application mechanism and the contact member separated from the concave mirror, (b) is a schematic diagram which shows the state in which the load application mechanism is applying the preload with respect to a concave mirror. (A) is a schematic diagram showing a state immediately after the contact member comes into contact with the concave mirror, (b) is a schematic diagram showing a state in which the amount of deformation of the concave mirror becomes almost zero, and (c) is a diagram where the concave mirror is -Y. The schematic diagram which shows the state which has carried out distortion deformation to the direction side. The correlation diagram which shows the correlation with the expansion amount of an actuator, and the aberration of a concave mirror. The flowchart of the manufacture example of a device. The detailed flowchart regarding the board | substrate process in the case of a semiconductor device.

(First embodiment)
Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. In the present embodiment, in FIG. 1, the Z axis is parallel to the first optical axis AX1 of the catadioptric optical system constituting the projection optical system 15 to be described later, and the plane perpendicular to the first optical axis AX1 is in FIG. The Y axis is set parallel to the paper surface, and the X axis is set perpendicular to the paper surface.

  As shown in FIG. 1, the exposure apparatus 11 of the present embodiment illuminates a transmissive reticle R on which a predetermined circuit pattern is formed with exposure light EL, so that the exposure surface Wa (the surface on the + Z direction side) is illuminated. 1 is an apparatus for forming a circuit pattern on a wafer W as a photosensitive substrate having a photosensitive material such as a resist coated on the upper surface in FIG. The exposure apparatus 11 includes an illumination optical system 13 that guides the exposure light EL emitted from the light source device 12 to the irradiated surface Ra (the surface on the + Z direction side) of the reticle R, and a reticle stage 14 that holds the reticle R. , A projection optical system 15 for guiding the exposure light EL transmitted through the reticle R to the exposure surface Wa of the wafer W, and a wafer stage 16 for holding the wafer W are provided. Note that the light source device 12 of this embodiment has an ArF excimer laser light source that outputs light having a wavelength of 193 nm, and light output from the ArF excimer laser light source is guided into the exposure device 11 as exposure light EL.

  A beam matching unit 17 is connected between the light source device 12 and the illumination optical system 13. The beam matching unit 17 optically connects the light source device 12 and the exposure device 11, and guides the exposure light EL emitted from the light source device 12 into the exposure device 11. Note that the spatial region from the light source device 12 to the optical member closest to the reticle R in the illumination optical system 13 is replaced with an inert gas such as helium gas or nitrogen, which is a gas having a low absorption rate of the exposure light EL.

  A stand 18 is provided below the illumination optical system 13. The gantry 18 includes a lower gantry 20 erected on the surface plate 19 and an upper gantry 21 supported on the lower gantry 20. A reticle stage 14 is placed on the upper surface of the upper frame 21. The reticle stage 14 is arranged so that the holding surface 14a for holding the reticle R is parallel to the XY plane. The reticle stage 14 is movable with a predetermined stroke in the Y-axis direction by driving a reticle stage drive unit (not shown). The reticle stage drive unit is also configured to move the reticle stage 14 by a minute amount in the X-axis direction, the Z-axis direction, and the rotation direction around the Z-axis. Then, the exposure light EL emitted from the illumination optical system 13 passes through the reticle R, and then is projected into the gantry 18 through the transmission port 22 formed in the approximate center of the upper wall portion of the upper gantry 21. It is guided to the optical system 15. When the reticle R is illuminated with the exposure light EL, a substantially rectangular illumination region extending in the X-axis direction is formed on a part of the irradiated surface Ra of the reticle R.

  The projection optical system 15 includes a substantially cylindrical upper barrel 23 centered on the first optical axis AX1 of the projection optical system 15 and a substantially cylindrical centered on the second optical axis AX2 orthogonal to the first optical axis AX1. And a substantially cylindrical lower barrel 25 that is disposed on the wafer W side of the upper barrel 23 and that has the first optical axis AX1 as the center. The lower lens barrel 25 passes through an opening 26 formed in the approximate center of the upper wall portion of the lower mount 20 in the vertical direction. These lens barrels 23, 24, 25 are coupled to each other via a coupling member 27. The coupling member 27 is attached near the mouth edge of the opening 26 in the lower gantry 20.

  A cover glass 31 that closes the opening of the upper barrel 23 is provided at the upper end of the upper barrel 23 (the end on the + Z direction side). The exposure light EL guided to the projection optical system 15 passes through the cover glass 31 and enters the upper barrel 23. Further, the lower end portion (the end portion on the −Z direction side) of the upper barrel 23 is inserted into the coupling member 27.

  A plurality of optical members 32 (only one is shown in FIG. 1) held by the upper barrel 23 constitutes a first imaging optical system 33. The first imaging optical system 33 forms a first intermediate image of the circuit pattern of the reticle R inside the upper barrel 23.

  The horizontal barrel 24 has a bottomed cylindrical shape, and the bottom 35 is inserted into the coupling member 27 through an opening 36 formed on the side surface of the coupling member 27. In addition, an opening 47 having a substantially center on the first optical axis AX1 is formed through the upper side wall of the horizontal barrel 24 (that is, the side wall on the upper barrel 23 side). The exposure light EL is incident through the opening 47 from the upper lens barrel 23 side. In addition, an opening 48 having the first optical axis AX1 substantially in the center is formed in the lower side wall of the horizontal barrel 24 (that is, the side wall on the lower barrel 25 side). The exposure light EL is emitted through the opening 48 to the lower lens barrel 25 side. Such a horizontal barrel 24 holds a right-angle reflecting mirror 38 by a bottom portion 35 inserted into the coupling member 27.

  The horizontal barrel 24 holds the negative lens 39 and the concave mirror 41 via a holding member (not shown) fixed to the inner wall of the horizontal barrel 24. A held portion 41a (see FIG. 2B) having a substantially annular shape is formed on the side surface of the concave mirror 41, and the holding member of the horizontal barrel 24 holds the concave mirror 41 via the held portion 41a. is doing. As an example, a plurality of (for example, three) holding members of the horizontal barrel 24 are arranged at equal intervals along the circumferential direction around the second optical axis AX2, and the concave mirror 41 has a plurality of points ( For example, 3 points).

  A disc-shaped reaction plate 42 having a diameter substantially the same as the inner diameter of the horizontal barrel 24 is provided on the right end side in the horizontal barrel 24 so as to close the opening of the horizontal barrel 24. . A sealing member 43 having a substantially cylindrical shape with a bottom is provided on the right side of the horizontal barrel 24 so as to cover the reaction plate 42 from the outside of the horizontal barrel 24. A predetermined space S is formed between the reaction plate 42 and the bottom wall of the sealing member 43 (the right wall portion in FIG. 1).

  A first optical path folding mirror 44 and a second optical path folding mirror 45 are formed on the right-angle reflecting mirror 38 held by the horizontal barrel 24. The first optical path folding mirror 44 is disposed in the vicinity of the first intermediate image formed by the first imaging optical system 33 and enters the horizontal lens barrel 24 from the first imaging optical system 33 through the opening 47. The exposure light EL to be reflected is reflected substantially at a right angle and guided to the negative lens 39. Further, the second optical path bending mirror 45 reflects the exposure light EL that has passed through the negative lens 39 and is reflected by the concave mirror 41, and then reflected substantially at a right angle after passing through the negative lens 39 again, and through the opening 48, the wafer. Injection to the W side. That is, in the present embodiment, the second imaging optical system 46 is configured by the right-angle reflecting mirror 38, the negative lens 39, and the concave mirror 41 held by the horizontal lens barrel 24. The second imaging optical system 46 forms a second intermediate image of the circuit pattern of the reticle R in the vicinity of the second optical path folding mirror 45 that is in the vicinity of the formation position of the first intermediate image. The second intermediate image is substantially the same size as the first intermediate image, and is a secondary image of the circuit pattern of the reticle R.

  The upper end side of the lower barrel 25 is inserted into the coupling member 27. A cover glass 50 that closes the opening of the lower barrel 25 is provided on the lower end side of the lower barrel 25. The exposure light EL that has passed through the projection optical system 15 passes through the cover glass 50 and is emitted from the projection optical system 15.

  In the lower lens barrel 25, a plurality of optical members 51 (only three are shown in FIG. 1) are held along the first optical axis AX1, and the third imaging optical system 52 is formed by each optical member 51. It is configured. Then, the third imaging optical system 52 is a reduced image of the circuit pattern of the reticle R (an image of the second intermediate image) based on the light beam from the second intermediate image formed by the second imaging optical system 46. The final image of the circuit pattern is formed on the exposure surface Wa of the wafer W. Further, the inside of the projection optical system 15 is in a state of being hermetically sealed by the cover glass 31, the reaction plate 42, and the cover glass 50, and helium gas, nitrogen, or the like, which is a gas having a low absorption rate of the exposure light EL. Replaced with active gas.

  A wafer stage 16 is provided on a surface plate 19 below the projection optical system 15. The wafer stage 16 is arranged so that the holding surface 16a for holding the wafer W is parallel to the XY plane. The wafer stage 16 can be moved in the Y-axis direction by a wafer stage drive unit (not shown). Further, the wafer stage driving unit is configured to move the wafer stage 16 by a minute amount also in the X-axis direction, the Z-axis direction, and the rotation direction around the Z-axis.

  Then, when the circuit pattern of the reticle R is formed on one shot area of the wafer W using the exposure apparatus 11 of the present embodiment, the reticle stage driving unit with the illumination area formed on the reticle R by the illumination optical system 13. , The reticle R held by the reticle stage 14 is moved in the Y-axis direction (for example, from the + Y direction side to the −Y direction side) for each predetermined stroke. At the same time, the wafer stage driving unit drives the wafer W held on the wafer stage 16 in the Y-axis direction at a speed ratio corresponding to the reduction magnification of the projection optical system 15 with respect to the movement of the reticle R along the Y-axis direction. For example, the movement is performed in synchronization with the + Y direction side from the −Y direction side. When the pattern formation on one shot area is completed, the pattern formation on the other shot areas of the wafer W is continuously performed.

  In the exposure apparatus 11 of this embodiment, the optical characteristics of the projection optical system 15 are adjusted by intentionally deforming the shape of the concave mirror 41 held by the horizontal lens barrel 24. Then, next, the mirror deformation | transformation apparatus 53 for changing the shape of the concave mirror 41 is demonstrated.

  As shown in FIGS. 2A and 2B, the reaction plate 42 has a plurality of insertion portions 54 (eight in the present embodiment, only one is shown in FIG. 2B) in the thickness direction of the reaction plate 42. It is formed so as to penetrate in the (Y-axis direction). Each of these insertion portions 54 is substantially the same radial position as the held portion 41a of the concave mirror 41 in the radial direction centered on the second optical axis AX2, and substantially in the circumferential direction centered on the second optical axis AX2. They are arranged at equal intervals. In this embodiment, a plurality (eight in this embodiment) of mirror deforming devices 53 are individually inserted into the insertion portions 54 of the reaction plate 42. In addition, each mirror deformation | transformation apparatus 53 and each insertion part 54 are each arrange | positioned in the position different in the circumferential direction from the holding member of the horizontal barrel 24. In addition, since each mirror deformation | transformation apparatus 53 has the respectively same structure, only the mirror deformation | transformation apparatus 53 arrange | positioned in the -Y direction side most among these mirror deformation | transformation apparatuses 53 is easy for the understanding of description. This will be described below, and the description of the other mirror deformation device 53 will be omitted.

  As shown in FIG. 2B, the mirror deforming device 53 includes a support member 55 erected from the reaction plate 42 along the second optical axis AX2 of the projection optical system 15, and the support member 55 is In the predetermined space S, it is located radially inward of the insertion portion 54. The base end side (the upper end side in FIG. 2B) of the support member 55 is connected to the reaction plate 42 by a bolt 56. The support member 55 includes a first extending portion 55a that is bent at a right angle from the distal end side (the lower end side in FIG. 2B) and extends radially outward of the reaction plate 42, and a proximal end side. And a second extending portion 55b extending from the substantially central position on the distal end side toward the radially outer side of the reaction plate 42.

  A first connecting member 57 is connected to the first extending portion 55a of the support member 55 via an elastic hinge 58 made of an elastic material. The first connecting member 57 has a substantially L-shaped cross section, and has a bottom portion 57a extending substantially parallel to the extending direction of the first extending portion 55a of the support member 55, and one end side of the bottom portion 57a (FIG. 2 ( b) includes a side portion 57b which is bent substantially vertically from the left end side) and extends substantially parallel to the standing direction of the support member 55. The other end side (the right end side in FIG. 2B) of the bottom 57a of the first connecting member 57 is located on one side (the upper side in FIG. 2B) of the first extending portion 55a and is elastic. The first extending portion 55a is connected to one end side of the first extending portion 55a through the hinge 58 (outside in the radial direction, the left end side in FIG. 2B). The first connecting member 57 is relatively displaced with respect to the first extending portion 55a of the support member 55 as the elastic hinge 58 is elastically deformed. In addition, one surface of the bottom portion 57a of the first connecting member 57 is connected to the coil spring 59 on one end side (in the radial direction and on the right end side in FIG. 2B) from the connecting portion with the elastic hinge 58. The first extending portion 55a of the support member 55 is connected to the first extending portion 55a. The coil spring 59 presses the bottom 57a of the first connecting member 57 in the −Y direction.

  The other surface of the bottom portion 57a of the first connecting member 57 is supported via an actuator (for example, a piezoelectric element) 61 at a position between the elastic hinge 58 and the coil spring 59 in the radial direction on one surface. The member 55 is connected to the second extending portion 55b. The actuator 61 is configured to be extendable and contractable along a direction (Y-axis direction) substantially parallel to the second optical axis AX2. The actuator 61 has a base end connected to the second extending portion 55 b and a tip connected to the bottom 57 a of the first connecting member 57. A force is applied to the bottom portion 57 a of the first connecting member 57 from the actuator 61 as the actuator 61 is extended. As a result, the first connecting member 57 is elastically deformed as the elastic hinge 58 is elastically deformed. The hinge 58 swings around the X axis. Further, one end side (the upper end side in FIG. 2B) of the side portion 57b of the first connecting member 57 is connected to the second connecting member 63 via an elastic hinge 62 made of an elastic material. In other words, the connecting portion of the side portion 57 b connected to the second connecting member 63 in the first connecting member 57 is farther away from the elastic hinge 58 serving as a swing fulcrum than the connecting portion of the bottom portion 57 a connected to the actuator 61. is doing.

  The second connecting member 63 is disposed at a position closer to the reaction plate 42 in the Y-axis direction than the first connecting member 57, and is formed so that the length in the radial direction is longer than the length in the Y-axis direction. ing. The elastic hinge 62 is connected to a portion of the second connecting member 63 that is radially outward from the center in the radial direction and that is on the + Y direction side of the center in the Y-axis direction. The second connecting member 63 is configured to be displaced relative to the first connecting member 57 as the elastic hinge 62 is elastically deformed. A displacement member 65 is connected to the second connecting member 63 via an elastic hinge 64 made of an elastic material. The elastic hinge 64 is connected to a portion on the inner side in the radial direction from the center in the radial direction in the second connecting member 63 and to a portion on the −Y direction side from the center in the Y-axis direction.

  The displacement member 65 is located on the opposite side of the first connection member 57 across the second connection member 63 in the Y-axis direction, and is located closer to the reaction plate 42 in the Y-axis direction than the second connection member 63. It is arranged at a close position. The displacement member 65 is relatively displaced with respect to the second connecting member 63 as the elastic hinge 64 is elastically deformed.

  In addition, between the displacement member 65 and the support member 55, the radial direction centered on the second optical axis AX2 (left and right in FIG. 2B) is located at substantially the same position in the Y axis direction with respect to the displacement member 65. A flexible member 66 extending in the direction) is interposed. The flexible member 66 has high rigidity in the Z-axis direction and the X-axis direction, which are different from the Y-axis direction along the second optical axis AX2, and also in the Y-axis direction, which is also the standing direction of the support member 55. Has low stiffness. Therefore, since the flexible member 66 is easily bent and deformed in the Y-axis direction, the displacement member 65 can be freely displaced in the Y-axis direction along the second optical axis AX2 of the projection optical system 15 by the flexible member 66. Is allowed to. On the other hand, since the flexible member 66 hardly deforms (extends) in the X axis direction and the Z axis direction, the displacement member 65 restricts displacement in the XZ plane orthogonal to the Y axis direction by the flexible member 66. It has come to be.

  Further, a displacement amount of the displacement member 65 (more specifically, the displacement member 65 of the displacement member 65 is located at a position facing the displacement member 65 in the X-axis direction orthogonal to the displacement direction (Y-axis direction) of the displacement member 65. A displacement sensor 67 that measures a displacement amount in the Y-axis direction) is provided. The displacement sensor 67 measures the amount of displacement of the displacement member 65 by detecting position information of a scale (not shown) fixed to the displacement member 65, and transmits the measurement result to the control mechanism 68. The control mechanism 68 drives and controls the extension amount of the actuator 61 based on the measurement result received from the displacement sensor 67.

  A coil spring 69 is connected to the displacement member 65 at the same radial position as the insertion portion 54. The coil spring 69 is configured to be extendable in the direction along the second optical axis AX2 of the projection optical system 15. Further, the coil spring 69 is inserted into the horizontal barrel 24 via an insertion portion 54 formed on the reaction plate 42. The coil spring 69 is connected to the abutting member 70 housed in the horizontal barrel 24. A sealing member 71 that seals the inside of the horizontal barrel 24 in an airtight manner is disposed between the mouth of the insertion portion 54 formed on the reaction plate 42 and the coil spring 69. The sealing member 71 is made of a thin plate-like elastic material, and can be easily bent and deformed in the Y-axis direction in conjunction with the expansion / contraction operation of the coil spring 69, thereby inhibiting the expansion / contraction operation of the coil spring 69. There is no such thing.

  The abutting member 70 has a concave portion 72, and the inner side in the radial direction centering on the second optical axis AX2 is open. A part of the held portion 41a of the concave mirror 41 is accommodated in the concave portion 72 of the contact member through the opening. Further, in the vicinity of the opening end of the recess 72, a pair of protrusions 72 a and 72 b protrude from the inner wall surface of the recess 72 so as to face each other in the Y-axis direction. And each convex part 72a, 72b of the contact member 70 is arrange | positioned so that it can contact | abut with respect to the to-be-held part 41a of the concave mirror 41 from the both sides of a Y-axis direction. Note that the abutting member 70 can be easily detached from the concave mirror 41 during maintenance and replacement of the mirror deforming device 53, so that the convex portions 72 a and 72 b of the abutting member 70 and the held portion 41 a of the concave mirror 41 can be removed. It is designed so that a slight gap is secured in the Y-axis direction between them. Further, the held portion 41a of the concave mirror 41 is formed in a concave groove or V shape, the contact member 70 is formed in a convex shape, and the convex shape of the contact member 70 is formed in the concave groove or V shape of the held portion 41a. You may make it contact | abut.

  Next, taking as an example the mirror deformation device 53 arranged on the most −Z direction side among the mirror deformation devices 53 configured as described above, the mirror deformation device 53 moves the displacement member 65 in accordance with the extension drive of the actuator 61. The effect | action at the time of displacing is demonstrated below. FIG. 3A shows an initial state in which the actuator 61 is extended by a predetermined amount in the Y-axis direction.

  In such an initial state, as shown in FIG. 3A, the bottom portion 57a of the first connecting member 57 extends substantially parallel to the extending direction of the first extending portion 55a of the supporting member 55, and the first connecting member 57 The side portion 57b of the member 57 is disposed so as to extend substantially parallel to the standing direction of the support member 55. The elastic hinge 58 that connects the first extending portion 55 a of the support member 55 and the bottom portion 57 a of the first connecting member 57, and the elastic hinge that connects the side portion 57 b of the first connecting member 57 and the second connecting member 63. 62 and the elastic hinge 64 that connects the second connecting member 63 and the displacement member 65 have almost zero deformation. Further, the flexible member 66 interposed between the displacement member 65 and the support member 55 is disposed so as to extend substantially parallel to the Z-axis direction, and the amount of deformation thereof is substantially zero.

  Here, as shown in FIG. 3B, it is assumed that the extension amount of the actuator 61 in the Y-axis direction is reduced based on the control command from the control mechanism 68. In this case, since the proximal end of the actuator 61 is fixed to the second extending portion 55b of the support member 55, the distal end thereof is displaced to the −Y direction side. Further, one end side of the bottom portion 57 a of the first connecting member 57 is pressed toward the −Y direction side according to the urging force of the coil spring 59 interposed between the first extending portion 55 a of the support member 55.

  Then, since the first connecting member 57 is fixed by the elastic hinge 58 interposed between the first extending portion 55a of the support member 55, the first connecting member 57 has the elastic hinge 58 as a fulcrum. A pressing force is applied from the coil spring 59 so as to rotate the one connecting member 57 counterclockwise when viewed from the + X direction side. Therefore, the elastic hinge 58 is elastically deformed so as to be on the −Z direction side that is opposite to the coil spring 59 when viewed from the elastic hinge 58.

  In this case, the first connecting member 57 rotates toward the + Y direction side while the connecting portion with respect to the second connecting member 63 draws an arcuate trajectory having the elastic hinge 58 as an axis. As a result, the first connecting member 57 is on the −Z direction side and the + Y direction side via the elastic hinge 62 interposed between the first connecting member 57 and the second connecting member 63 (FIG. 3). In (b), the second connecting member 63 is pulled toward the diagonally lower left. In addition, the second connecting member 63 pulls the displacement member 65 in the −Z direction side and the + Y direction side via the elastic hinge 64 interposed between the second connection member 63 and the displacement member 65. It becomes like this. That is, the displacement member 65 is pulled by the second connecting member 63 in a direction away from the support member 55 and away from the reaction plate 42, that is, diagonally to the left in FIG. 3B.

  The flexible member 66 has a structure that hardly deforms in the Z-axis direction in which the displacement member 65 and the support member 55 face each other. Therefore, even if the displacement member 65 is pulled to the −Z direction side by the second connecting member 63, the flexible member 66 hardly deforms (extends) to the −Z direction side, and the −Z of the displacement member 65. The displacement to the direction side is regulated, and the displacement member 65 is displaced to the Y direction side. As a result, the first connecting member 57 is relatively displaced in the −Z direction with respect to the support member 55, while the displacement member 65 is hardly displaced in the Z axis direction with respect to the support member 55. That is, the first connecting member 57 is relatively displaced with respect to the displacement member 65 so as to be separated in the Z-axis direction.

  Then, the elastic hinge 62 interposed between the first connecting member 57 and the second connecting member 63 is elastically deformed so as to be on the + Z direction side. As a result, the second connecting member 63 is displaced relative to the first connecting member 57 in the + Z direction side. At the same time, the elastic hinge 64 interposed between the second connecting member 63 and the displacement member 65 is similarly elastically deformed so as to be on the + Z direction side. Further, the second connecting member 63 rotates in the counterclockwise direction when viewed from the + X direction side so as to interlock with the first connecting member 57 according to the elastic restoring force of both the elastic hinges 62 and 64. Thus, even if the positional relationship between the displacement member 65 and the connection members 57 and 63 in the Z-axis direction changes, the connection state of the connection members 57 and 63 and the displacement member 65 is the elasticity of the elastic hinges 62 and 64. It is maintained by the deformation and the rotation of the second connecting member 63.

  On the other hand, the flexible member 66 interposed between the displacement member 65 and the support member 55 has a structure in which the displacement member 65 and the reaction plate 42 are easily bent and deformed in the direction of the Y axis facing each other. Yes. Therefore, when the displacement member 65 is pulled to the + Y direction side by the second connecting member 63, the flexible member 66 is bent and deformed to be on the + Y direction side, so that the displacement member 65 is displaced to the + Y direction side. Permissible.

  Further, as shown in FIG. 3C, it is assumed that the extension amount of the actuator 61 in the Y-axis direction is increased from the initial state based on the control command from the control mechanism 68. In this case, since the base end of the actuator 61 is fixed to the second extending portion 55b of the support member 55, the tip end is displaced to the + Y direction side. Then, the actuator 61 comes to press the one end side of the bottom portion 57 a of the first connecting member 57 against the urging force of the coil spring 59 in the + Y direction side.

  Then, since the first connecting member 57 is fixed by the elastic hinge 58 interposed between the first extending portion 55a of the support member 55, the first connecting member 57 has the elastic hinge 58 as a fulcrum. A pressing force is applied from the actuator 61 so as to rotate the one connecting member 57 in the clockwise direction when viewed from the + X direction side. Therefore, the elastic hinge 58 is elastically deformed so as to be on the + Z direction side on the actuator 61 side when viewed from the elastic hinge 58.

  In this case, the first connecting member 57 rotates toward the −Y direction side while the connecting portion with respect to the second connecting member 63 forms an arc-shaped trajectory having the elastic hinge 58 as the axis. As a result, the first connecting member 57 is positioned in the + Z direction side and the −Y direction side (diagonally to the right) via the elastic hinge 58 interposed between the first connecting member 57 and the second connecting member 63. The second connecting member 63 is pressed toward the upper side. Further, the second connecting member 63 presses the displacement member 65 in the + Z direction side and the −Y direction side via the elastic hinge 64 interposed between the second connection member 63 and the displacement member 65. To come. That is, the displacement member 65 is pressed by the second connecting member 63 in a direction approaching the support member 55 and in a direction approaching the reaction plate 42.

  At this time, the first connecting member 57 is relatively displaced in the + Z direction side with respect to the support member 55 as the extension amount of the actuator 61 increases, and is connected to the first connecting member 57 via the elastic hinge 62. The second connecting member 63 is also displaced relative to the support member 55 in the + Z direction side. On the other hand, the displacement member 65 is restricted from being displaced in the + Z direction by the flexible member 66. That is, the relative positional relationship of the connecting members 57 and 63 with respect to the displacement member 65 in the Z-axis direction changes. Even in such a situation, the elastic hinges 62 and 64 are elastically deformed so as to be on the −Z direction side, and the second connecting member 63 rotates in conjunction with the first connecting member 57. The connected state of the members 57 and 63 and the displacement member 65 is maintained.

  On the other hand, when the displacement member 65 is pressed to the −Y direction side from the second connecting member 63, the flexible member 66 is bent and deformed so as to be on the −Y direction side. Displacement in the Y direction is allowed.

  In the first connecting member 57, the connecting portion with respect to the second connecting member 63 is far away from the elastic hinge 58 serving as a fulcrum than the connecting portion with respect to the actuator 61. Therefore, the second connecting member 63 connected to the first connecting member 57 and the displacement member 65 connected to the second connecting member 63 are separated from the actuator 61 on the basis of the principle of the lever having the elastic hinge 58 as a fulcrum. The driving force is increased and transmitted respectively. That is, each displacement amount in the Y-axis direction of the second connecting member 63 and the displacement member 65 is larger than the extension amount of the actuator 61. Therefore, in the present embodiment, the displacement transmitted by the support member 55, the elastic hinges 58, 62, 64, the first connecting member 57, and the second connecting member 63 is expanded and transmitted to the displacement member 65. An enlargement mechanism 73 is configured.

  Next, an operation when the shape of the concave mirror 41 is deformed with the extension driving of the actuator 61 will be described below. 4A shows an initial state in which the actuator 61 in the mirror deforming device 53 is extended by a predetermined amount in the Y-axis direction. Further, when each mirror deforming device 53 is in the initial state, it is assumed that the optical axis (center axis) of the concave mirror 41 and the second optical axis AX2 of the projection optical system 15 substantially coincide with each other. In this case, each contact member 70 is disposed such that the pair of convex portions 72a and 72b are separated from the held portion 41a of the concave mirror 41 with a slight gap in the Y-axis direction. .

  Now, as shown in FIG. 4B, it is assumed that the extension amount in the Y-axis direction of the actuator 61 in the mirror deforming device 53 is reduced from the initial state based on a control command from the control mechanism 68. Then, the reduction amount of the extension amount of the actuator 61 is enlarged by the displacement magnifying mechanism 73 and transmitted to the displacement member 65, so that the displacement amount of the displacement member 65 in the + Y direction side is the −Y direction side of the tip of the actuator 61. More than the amount of displacement. Further, since the contact member 70 is connected to the displacement member 65 via the coil spring 69, the contact member 70 is displaced in the + Y direction side in conjunction with the displacement member 65. Then, of the pair of convex portions 72 a and 72 b of the contact member 70, the convex portion 72 a on the reflecting surface side is based on the force transmitted from the displacement member 65 side via the coil spring 69 and the held portion of the concave mirror 41. Press 41a toward the + Y direction. As a result, a part of the concave mirror 41 (the part pressed to the + Y direction side) is deformed.

  At this time, the contact member 70 that contacts the held portion 41a of the concave mirror 41 via the convex portion 72a attenuates the force transmitted from the displacement member 65 side by the coil spring 69. That is, the displacement amount of the contact member 70 in the + Y direction side is reduced by the coil spring 69 more than the displacement amount of the displacement member 65 in the + Y axis direction.

  Further, as shown in FIG. 4C, it is assumed that the extension amount of the actuator 61 in the Y-axis direction has increased from the initial state based on the control command from the control mechanism 68. Then, since the increase amount of the extension amount of the actuator 61 is enlarged by the displacement enlargement mechanism 73 and transmitted to the displacement member 65, the displacement amount of the displacement member 65 toward the −Y direction side is the + Y direction side of the tip of the actuator 61. More than the amount of displacement. Further, since the contact member 70 is connected to the displacement member 65 via the coil spring 69, the contact member 70 is displaced in the −Y direction side in conjunction with the displacement member 65. Then, of the pair of convex portions 72 a and 72 b of the contact member 70, the convex portion 72 b on the reaction plate 42 side is held by the concave mirror 41 based on the force transmitted from the displacement member 65 side via the coil spring 69. The part 41a is pressed to the −Y direction side. As a result, a part of the concave mirror 41 (a part pressed in the −Y direction side) is deformed.

  At this time, the contact member 70 that contacts the held portion 41a of the concave mirror 41 via the convex portion 72b attenuates the force transmitted from the displacement member 65 side by the coil spring 69. That is, the displacement amount of the contact member 70 in the −Y direction side is reduced by the coil spring 69 more than the displacement amount of the displacement member 65 in the −Y direction side.

  In the present embodiment, compared to the case where the displacement member 65 and the contact member 70 are directly coupled, the coil spring 69 is interposed between the displacement member 65 and the contact member 70, so that the concave mirror is removed from the contact member 70. The pressing force acting on the held portion 41a of 41 is reduced. Therefore, the shape of the concave mirror 41 is gradually changed as the actuator 61 expands and contracts. In other words, the optical characteristic of the concave mirror 41, that is, the optical characteristic of the projection optical system 15 is changed little by little as the actuator 61 expands and contracts.

  Further, in the mirror deformation device 53 of the present embodiment, the displacement amount of the displacement member 65 is enlarged by the displacement enlargement mechanism 73 when the actuator 61 is driven to extend. That is, the displacement sensor 67 measures the displacement amount of the displacement member 65 having the largest displacement amount in the Y-axis direction among the members constituting the mirror deformation device 53. Then, the control mechanism 68 feedback-controls the actuator 61 based on the amount of displacement of the displacement member 65 in the Y-axis direction measured by the displacement sensor 67, so that the pressing force acting on the concave mirror 41 from the contact member 70 is controlled. The magnitude is estimated by the control mechanism 68. For this reason, the degree of deformation of the concave mirror 41, that is, the optical characteristics of the concave mirror 41, compared to the case where the extension amount of the actuator 61 is measured without providing the displacement enlarging mechanism 73 and the case where the displacement sensor 67 is provided on the contact member 70, etc. Is adjusted with high accuracy by the control mechanism 68.

  Further, in the mirror deformation device 53 of the present embodiment, the magnitude of the force transmitted from the displacement magnifying mechanism 73 side to the concave mirror 41 side is reduced by the damping action of the coil spring 69. Therefore, an excessive force is suppressed from being transmitted from the displacement member 65 side to the concave mirror 41 side via the contact member 70. Therefore, when the shape of the concave mirror 41 is deformed, excessive distortion stress is not applied to the concave mirror 41 from the contact member 70, and the deformation amount of the concave mirror 41 is finely adjusted.

Therefore, in this embodiment, the following effects can be obtained.
(1) Since the deformation amount of the concave mirror 41 is very small, it is difficult to directly measure the displacement amount of the contact member 70 contacting the concave mirror 41 by the displacement sensor 67. In this regard, in this embodiment, the displacement sensor 67 measures the displacement amount of the displacement member 65 enlarged by the displacement enlargement mechanism 73, and the displacement amount of the contact member 70 based on the measured displacement amount of the displacement member 65. Therefore, it is possible to measure the displacement amount of the contact member 70 with high accuracy. And since the extension degree of the actuator 61 is controlled based on the measurement result of this displacement sensor 67, the magnitude | size of the pressing force which acts on the concave mirror 41 from the contact member 70 can be adjusted with high precision. Therefore, the shape of the concave mirror 41 can be adjusted precisely, and consequently the optical characteristics of the projection optical system 15 can be adjusted precisely, so that the accuracy of the circuit pattern formed on the wafer W can be improved.

  (2) A coil spring 69 is interposed between the displacement member 65 and the contact member 70. Then, the force based on the displacement of the displacement member 65 is transmitted to the contact member 70 while being attenuated by the coil spring 69. Therefore, even when the displacement of the displacement member 65 is increased by the displacement expansion mechanism 73, it is possible to avoid an excessive strain stress from acting on the concave mirror 41 from the contact member 70.

  (3) The support member 55 supports the first connecting member 57 so as to be swingable about the elastic hinge 58. Here, the first connecting member 57 is configured such that the connecting portion with respect to the second connecting member 63 is farther away from the elastic hinge 58 than the connecting portion with respect to the actuator 61. When the first connecting member 57 swings about the elastic hinge 58, the change amount of the extension amount of the actuator 61 is the first connecting member 57 and the second connecting member 57 in a state where the displacement amount is enlarged based on the lever principle. It is transmitted to the displacement member 65 via the connecting member 63. Therefore, it is possible to easily realize a configuration in which the change amount of the extension amount of the actuator 61 is transmitted to the displacement member 65 in a state where the change amount is enlarged via the first connection member 57 and the second connection member 63.

  (4) The flexible member 66 defines the displacement direction of the displacement member 65 in one direction along the optical axis of the concave mirror 41 (Y-axis direction). Therefore, the direction of the strain stress acting on the concave mirror 41 from the contact member 70 is defined as one direction. Therefore, since the deformation amount of the concave mirror 41 based on the strain stress acting on the concave mirror 41 from the contact member 70 is adjusted more precisely, the optical characteristics of the concave mirror 41 can be adjusted with high accuracy.

  (5) The reaction force received by the displacement enlarging mechanism 73 from the actuator 61 is received by the reaction plate 42. Therefore, the displacement enlarging mechanism 73 can expand the change amount of the extension amount of the actuator 61 and transmit it to the displacement member 65 while being stably supported by the reaction plate 42.

  (6) The reaction plate 42 is provided with an insertion portion 54 that allows a part of the mirror deformation device 53 to be inserted into the horizontal barrel 24, and the actuator 61 is provided outside the horizontal barrel 24. Yes. Therefore, the actuator 61 and the concave mirror 41 are arranged to be separated from each other with the reaction plate 42 interposed therebetween, and it is possible to suppress the vibration generated from the actuator 61 due to the extension driving of the actuator 61 from being propagated to the concave mirror 41.

  (7) The insertion portion 54 formed on the reaction plate 42 is provided with a sealing member 71 so as to close the space between the mouth of the insertion portion 54 and the mirror deformation device 53. Therefore, the gas outside the horizontal lens barrel 24 is prevented from entering the inside of the horizontal lens barrel 24 via the insertion portion 54 of the reaction plate 42. Similarly, even when outgas is generated from an actuator 61 provided outside the horizontal barrel 24 or an electric wire (not shown) connected to the actuator 61, the outgas passes through the insertion portion 54 of the reaction plate 42. It is avoided to enter the inside of the horizontal barrel 24 via Therefore, these outgasses do not cause fogging due to photochemical reaction on the reflecting surface of the concave mirror 41, and the optical characteristics of the concave mirror 41 can be adjusted with high reliability.

  (8) The horizontal lens barrel 24 is provided with a sealing member 43 so as to cover the reaction plate 42 from the outside of the horizontal lens barrel 24. Therefore, it is possible to avoid the gas (that is, the atmosphere) outside the exposure apparatus 11 from entering the inside of the horizontal barrel 24 via the insertion portion 54 of the reaction plate 42. If the amount of outgas generated from an electric wire (not shown) connected to the actuator 61 is zero or within an allowable range, the sealing member 43 can be omitted. Further, by using both the sealing member 71 and the sealing member 43 together, it is possible to more reliably avoid the gas outside the exposure apparatus 11 from entering the inside of the horizontal barrel 24.

(Second Embodiment)
Next, a second embodiment of the present invention will be described with reference to FIGS. The second embodiment is different from the first embodiment in that a load application mechanism 74 for applying a preload to the held portion 41a of the concave mirror 41 is further provided. Therefore, in the following description, parts different from those of the first embodiment will be mainly described, and the same or corresponding member configurations as those of the first embodiment are denoted by the same reference numerals, and redundant description will be omitted. Shall.

  As shown in FIG. 5, in the mirror deforming device 53 of the present embodiment, a flat plate-like contact member 70 is in contact with the end surface on the + Y direction side of the held portion 41 a of the concave mirror 41 so as to be able to contact and separate. . That is, the contact member 70 of the present embodiment can apply a pressing force toward the −Y direction side to the held portion 41a of the concave mirror 41, while applying a pressing force toward the + Y direction side. It is impossible. A load application mechanism 74 for applying a preload to the held portion 41a of the concave mirror 41 is disposed at a position facing the abutting member 70 with the held portion 41a of the concave mirror 41 interposed therebetween. That is, in the present embodiment, the same number (eight in this embodiment) of load application mechanisms 74 as the insertion portions 54 are arranged at equal intervals along the circumferential direction with the second optical axis AX2 as the center.

  The load application mechanism 74 includes a base member 75 made of a rigid body, and the base member 75 is connected to the vicinity of the outer edge side of the insertion portion 54 in the reaction plate 42 via a coil spring 76. The base member 75 is displaced relative to the reaction plate 42 as the coil spring 76 expands and contracts. The base member 75 supports a leaf spring 77 made of a flat elastic body. The leaf spring 77 is embedded in the base member 75 at the base end side, and extends from the end surface of the base member 75 on the + Z direction side to the concave mirror 41 side. Further, a convex portion 78 is formed on the distal end side of the leaf spring 77, and this convex portion 78 comes into contact with the end surface on the −Y direction side of the held portion 41 a of the concave mirror 41.

  Further, the load application mechanism 74 includes a pressing member 79 that presses the base member 75 in a direction in which the base member 75 approaches the reaction plate 42. The pressing member 79 has a substantially L-shaped cross section, and is provided so as to be rotatable about an axis 80 extending in the X-axis direction orthogonal to the optical axis of the concave mirror 41. The pressing member 79 rotates about the axis 80 so that the amount of protrusion toward the base member 75 changes.

  Here, as shown in FIG. 6A, when the pressing member 79 maximizes the protruding amount toward the base member 75, the pressing member 79 resists the biasing force of the coil spring 76 against the base member 75. Press to approach the reaction plate 42. Then, the leaf spring 77 has a proximal end side embedded in the base member 75 closer to the reaction plate 42 side than an end surface of the held portion 41a of the concave mirror 41 on the −Y direction side. And the convex part 78 of the leaf | plate spring 77 receives the reaction force from the concave mirror 41 in the state contact | abutted to the to-be-held part 41a of the concave mirror 41. FIG. Therefore, the leaf spring 77 is elastically deformed so that the tip side where the convex portion 78 is formed is on the −Y direction side. As a result, the leaf spring 77 applies a preload in the + Y direction side to the held portion 41a of the concave mirror 41.

  On the other hand, as shown in FIG. 6B, when the pressing member 79 minimizes the protruding amount toward the base member 75, the pressing member 79 is separated from the base member 75 to eliminate the pressing force on the base member 75. To do. The base member 75 is displaced so as to be separated from the reaction plate 42 according to the urging force of the coil spring 76. Then, the base end side of the leaf spring 77 embedded in the base member 75 is further away from the reaction plate 42 than the end surface on the −Y direction side of the held portion 41 a of the concave mirror 41. And the convex part 78 of the leaf | plate spring 77 comes away from the to-be-held part 41a of the concave mirror 41, and the preload with respect to the to-be-held part 41a of the concave mirror 41 is cancelled | released.

  Next, an operation when the shape of the concave mirror 41 is deformed in accordance with the extension driving of the actuator 61 in the mirror deforming device 53 configured as described above will be described below. FIG. 7A shows an initial state in which the amount of expansion and contraction of the actuator 61 is zero and the contact member 70 is disposed so as to be separated from the held portion 41 a of the concave mirror 41. At this time, it is assumed that the load applying mechanism 74 is fixed by rotating around the axis 80 so that the pressing member 79 minimizes the protruding amount toward the base member 75 side.

  As shown in FIG. 7A, when both the abutting member 70 and the leaf spring 77 are arranged so as to be separated from the held portion 41a of the concave mirror 41, the held portion 41a of the concave mirror 41 is opposed to the held portion 41a. Therefore, since the pressing force does not act, the deformation amount of the concave mirror 41 becomes zero or close to zero.

  Here, as shown in FIG. 7B, in the load application mechanism 74, it is assumed that the pressing member 79 rotates around the axis 80 so as to maximize the amount of protrusion toward the base member 75. In this case, the convex portion 78 of the leaf spring 77 applies a preload in the + Y direction side to the held portion 41a of the concave mirror 41 that is fixed by the holding member. As a result, the vicinity of the position where the preload is applied by the load applying mechanism 74 in the concave mirror 41 is distorted and deformed in the + Y direction side.

  Subsequently, as shown in FIG. 8A, it is assumed that the actuator 61 extends in the Y-axis direction based on a control command from the control mechanism 68. Then, the extension amount of the actuator 61 is enlarged by the displacement magnifying mechanism 73 and transmitted to the displacement member 65, so that the displacement member 65 is largely displaced in the −Y direction side. In this case, since the contact member 70 is connected to the displacement member 65 via the coil spring 69, the contact member 70 is displaced in the −Y direction side in conjunction with the displacement member 65, so that the contact portion 70 of the concave mirror 41 is held. To come into contact.

  Further, as shown in FIG. 8B, it is assumed that the actuator 61 is further extended in the Y-axis direction based on a control command from the control mechanism 68. Then, the displacement member 65 is further displaced in the −Y direction side, and the contact member 70 is further displaced in the −Y direction side in conjunction with the displacement member 65. The abutting member 70 presses the held portion 41a of the concave mirror 41 toward the -Y direction side against the urging force of the leaf spring 77 in a state where it comes into contact with the held portion 41a of the concave mirror 41. As a result, in the vicinity of the position where the pressing force from the contact member 70 and the load application mechanism 74 is applied in the concave mirror 41, the pressing force applied from the contact member 70 and the pressing force applied from the leaf spring 77 cancel each other. Therefore, the amount of deformation of the concave mirror 41 is zero or close to zero.

  When the abutting member 70 presses the held portion 41a of the concave mirror 41 toward the -Y direction side, the abutting member 70 receives a reaction force from the held portion 41a of the concave mirror 41 toward the + Y direction side. Then, the coil spring 69 interposed between the contact member 70 and the displacement member 65 is pressed and contracted by the contact member 70 toward the + Y direction. The contact member 70 connected to the coil spring 69 attenuates the relative displacement amount with respect to the concave mirror 41 as the coil spring 69 contracts.

  Further, as shown in FIG. 8C, it is assumed that the actuator 61 is further extended in the Y-axis direction based on a control command from the control mechanism 68. Then, the displacement member 65 is further displaced in the −Y direction side, and the contact member 70 is further displaced in the −Y direction side in conjunction with the displacement member 65. Then, the abutting member 70 presses the held portion 41a of the concave mirror 41 more strongly on the −Y direction side against the urging force of the leaf spring 77 in a state of contacting the held portion 41a of the concave mirror 41. As a result, in the vicinity of the position where the pressing force from the contact member 70 and the load application mechanism 74 is applied in the concave mirror 41, the pressing force acting from the contact member 70 exceeds the pressing force acting from the leaf spring 77. become. Therefore, the abutting member 70 displaces the held portion 41a of the concave mirror 41 further to the −Y direction side from the state of FIG. 8B, so that the concave mirror 41 can be pushed from the abutting member 70 and the load applying mechanism 74. The vicinity of the position where the pressure is applied is distorted and deformed in the −Y direction side.

  By the way, in the mirror deformation device 53 of the present embodiment, in the vicinity of the position where the pressing force from the contact member 70 and the load application mechanism 74 is applied in the concave mirror 41, the pressing force acting from the contact member 70 is the plate. When it is larger than the pressing force acting from the spring 77, it is distorted and deformed in the -Y direction side. On the other hand, in the vicinity of the position where the pressing force from the contact member 70 and the load application mechanism 74 is applied in the concave mirror 41, the pressing force acting from the leaf spring 77 is larger than the pressing force acting from the contact member 70. In this case, the distortion is deformed in the + Y direction. That is, in the mirror deformation device 53 of the present embodiment, the magnitude of the strain stress acting on the concave mirror 41 is the pressing force acting on the concave mirror 41 from the contact member 70 and the pressing force acting on the concave mirror 41 from the leaf spring 77. It changes according to the difference.

  Therefore, as shown in FIG. 9, the control mechanism 68 applies a load to the concave mirror 41 until the actuator 61 is extended to drive the contact member 70 against the held portion 41 a of the concave mirror 41. Since a constant preload is applied from the mechanism 74, the aberration of the concave mirror 41 does not change. On the other hand, the control mechanism 68 extends the actuator 61 so as to change the pressing force acting on the concave mirror 41 from the contact member 70 in a state where the contact member 70 is in contact with the held portion 41a of the concave mirror 41. By driving, the aberration of the concave mirror 41 can be continuously changed.

Therefore, in this embodiment, in addition to the effects (1) to (8) of the first embodiment, the following effects can be obtained.
(9) The load application mechanism 74 is disposed so as to face the mirror deformation device 53 with the concave mirror 41 interposed therebetween, and applies a preload to the held portion 41 a of the concave mirror 41. The deformation amount of the concave mirror 41 changes according to the difference between the preload applied from the load application mechanism 74 and the pressing force applied from the mirror deforming device 53. Therefore, the mirror deformation device 53 can continuously control the aberration of the concave mirror 41 by adjusting the pressing force applied to the concave mirror 41.

  (10) The load application mechanism 74 releases the contact state with the concave mirror 41 by the rotation operation of the pressing member 79. Further, the mirror deforming device 53 is displaced between a contact position where the contact member 70 is brought into contact with the concave mirror 41 and a separated position where the contact member 70 is separated from the concave mirror 41 in accordance with the extension driving of the actuator 61. Therefore, the maintenance and replacement of the concave mirror 41 can be easily performed by separating both the load application mechanism 74 and the mirror deformation device 53 from the concave mirror 41.

The above embodiment may be changed to another embodiment as described below.
In each of the above embodiments, the actuator 61 may be a direct-acting MEMS (Micro Electro Mechanical System) or a direct-acting motor.

  In each of the above embodiments, the mirror deforming device 53 may be arranged in any manner as long as it is arranged at substantially the same radial position as the held portion 41a of the concave mirror 41 in the radial direction around the second optical axis AX2. Can be adopted.

  In each of the above embodiments, at least one of the sealing member 71 or the sealing member 43 may be fixed to the reaction plate 42 so as to cover the mirror deforming device 53 from the outside of the horizontal barrel 24.

  In the second embodiment, each load application mechanism 74 may be disposed at a position different from each insertion portion 54 in the circumferential direction. In this case, each load application mechanism 74 may be arranged at a position different from the holding member of the horizontal barrel 24 in the circumferential direction.

  In the second embodiment, the load application mechanism 74 may be configured to continuously adjust the magnitude of the load applied to the concave mirror 41. For example, the pressing force applied from the pressing member 79 to the base member 75 may be adjusted according to the rotation position of the pressing member 79.

  In the second embodiment, a mirror deformation device having the same configuration as that of the mirror deformation device 53 may be provided at a position facing the mirror deformation device 53 with the held portion 41a of the concave mirror 41 interposed therebetween.

In each of the above embodiments, the mirror deforming device 53 may be configured to be accommodated inside the horizontal barrel 24.
In each of the above embodiments, the displacement magnifying mechanism 73 may be configured to be fixed to the gantry 18 that houses the projection optical system 15 therein.

  In each of the above embodiments, a parallel link mechanism may be employed as a holding mechanism for holding the concave mirror 41, and the parallel link mechanism may be fixedly disposed on the horizontal barrel 24 or the reaction plate 42.

In each of the above embodiments, the holding member for holding the concave mirror 41 may be omitted, and the concave mirror 41 may be held by a plurality of mirror deformation devices 53.
In each of the above embodiments, the object whose shape is deformed by the mirror deforming device 53 is not limited to the concave mirror 41, and may be another optical member constituting the projection optical system 15. Further, various optical members constituting the illumination optical system 13, and the reticle R and the wafer W may be targeted.

  In each of the above embodiments, the light source device 12 includes, for example, g-line (436 nm), i-line (365 nm), KrF excimer laser (248 nm), F2 laser (157 nm), Kr2 laser (146 nm), Ar2 laser (126 nm), etc. May be a light source capable of supplying The light source device 12 amplifies the infrared or visible single wavelength laser light oscillated from the DFB semiconductor laser or fiber laser, for example, with a fiber amplifier doped with erbium (or both erbium and ytterbium). Alternatively, a light source capable of supplying harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. The light source device 12 may be a light source capable of supplying extreme ultraviolet light, that is, EUV (Extreme Ultraviolet) light having a wavelength of about 100 nm or less in a soft X-ray region.

  In each of the above embodiments, the exposure apparatus 11 is exposed in a state where an arbitrary liquid (for example, pure water) having a refractive index larger than 1.1 is supplied to a predetermined space between the cover glass 50 and the wafer W. A so-called immersion type exposure apparatus may be used.

In each of the above embodiments, the exposure apparatus 11 may be embodied as a step-and-repeat apparatus.
In each of the above embodiments, the present invention may be embodied in a maskless exposure apparatus using a variable pattern generator (for example, DMD (Digital Mirror Device or Digital Micro-mirror Device)).

  In each of the above embodiments, the exposure apparatus 11 manufactures a reticle or mask used in not only a microdevice such as a semiconductor element but also a light exposure apparatus, an EUV exposure apparatus, an X-ray exposure apparatus, and an electron beam exposure apparatus. Therefore, an exposure apparatus that transfers a circuit pattern from a mother reticle to a glass substrate or a silicon wafer may be used. The exposure apparatus 11 is used for manufacturing a display including a liquid crystal display element (LCD) and the like, and is used for manufacturing an exposure apparatus that transfers a device pattern onto a glass plate, a thin film magnetic head, and the like. It may be an exposure apparatus that transfers to a wafer or the like, and an exposure apparatus that is used to manufacture an image sensor such as a CCD.

  Next, an embodiment of a microdevice manufacturing method using the device manufacturing method by the exposure apparatus 11 of the embodiment of the present invention in the lithography process will be described. FIG. 10 is a flowchart showing a manufacturing example of a microdevice (a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, a micromachine, etc.).

  First, in step S101 (design step), function / performance design (for example, circuit design of a semiconductor device) of a micro device is performed, and pattern design for realizing the function is performed. Subsequently, in step S102 (mask manufacturing step), a mask (reticle R or the like) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S103 (substrate manufacturing step), a substrate (a wafer W when a silicon material is used) is manufactured using a material such as silicon, glass, or ceramics.

  Next, in step S104 (substrate processing step), using the mask and substrate prepared in steps S101 to S104, an actual circuit or the like is formed on the substrate by lithography or the like, as will be described later. Next, in step S105 (device assembly step), device assembly is performed using the substrate processed in step S104. Step S105 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation) as necessary. Finally, in step S106 (inspection step), inspections such as an operation confirmation test and a durability test of the microdevice manufactured in step S105 are performed. After these steps, the microdevice is completed and shipped.

FIG. 11 is a diagram illustrating an example of a detailed process of step S104 in the case of a semiconductor device.
In step S111 (oxidation step), the surface of the substrate is oxidized. In step S112 (CVD step), an insulating film is formed on the substrate surface. In step S113 (electrode formation step), an electrode is formed on the substrate by vapor deposition. In step S114 (ion implantation step), ions are implanted into the substrate. Each of the above steps S111 to S114 constitutes a pretreatment process at each stage of the substrate processing, and is selected and executed according to a necessary process at each stage.

  When the above-mentioned pretreatment process is completed in each stage of the substrate process, the posttreatment process is executed as follows. In this post-processing process, first, in step S115 (resist formation step), a photosensitive material is applied to the substrate. Subsequently, in step S116 (exposure step), the circuit pattern of the mask is transferred to the substrate by the lithography system (exposure apparatus 11) described above. Next, in step S117 (development step), the substrate exposed in step S116 is developed to form a mask layer made of a circuit pattern on the surface of the substrate. Subsequently, in step S118 (etching step), the exposed member in a portion other than the portion where the resist remains is removed by etching. In step S119 (resist removal step), the photosensitive material that has become unnecessary after the etching is removed. That is, in step S118 and step S119, the surface of the substrate is processed through the mask layer. By repeatedly performing these pre-processing steps and post-processing steps, multiple circuit patterns are formed on the substrate.

  DESCRIPTION OF SYMBOLS 11 ... Exposure apparatus, 15 ... Projection optical system as an optical system, 24 ... Horizontal lens tube, 41 ... Concave mirror as an optical member, 42 ... Reaction plate as reaction force receiving member, 43 ... Sealing member, 53 ... Optical member Mirror deformation device as a deformation device, 54... Insertion portion, 55... Support member, 57... First connection member, 58 .. elastic hinge as support portion, 61. ... Displacement member, 67 ... Displacement sensor as measurement member, 68 ... Control mechanism, 69 ... Coil spring as reduction mechanism, 70 ... Contact member, 71 ... Sealing member, 73 ... Displacement enlargement mechanism, 74 ... Load application mechanism , EL: exposure light as a radiation beam, W: wafer as an irradiation object.

Claims (17)

In the optical member deformation device for deforming the shape of the optical member,
A contact member that contacts the optical member;
A displacement member coupled to the abutting member and displaced based on a driving force transmitted from a driving source;
A displacement enlarging mechanism that includes a connecting member that is displaced based on a driving force from the drive source, and that transmits a displacement amount of the connecting member to the displacement member;
A reduction mechanism that is provided between the abutting member and the displacement member and that reduces the amount of displacement of the displacement member transmitted from the displacement enlarging mechanism and transmits it to the abutment member;
A measurement member for measuring the displacement amount of the displacement member;
An optical member deformation device comprising: a control mechanism that controls a displacement amount of the displacement member based on a measurement result of the measurement member. The optical member deformation apparatus according to claim 1,
The displacement enlarging mechanism is
A support member configured to support the connecting member via a support portion;
The connecting member is connected to the driving source via the connecting portion, and swings about the support portion based on a driving force from the driving source. The optical member deformation apparatus according to claim 2,
The connection member is configured such that a distance between the connection portion of the connection member with respect to the displacement member and the support portion is larger than a distance between the connection portion of the connection member with respect to the driving source and the support portion. An optical member deformation device characterized by supporting the above. In the optical member deformation device according to any one of claims 1 to 3,
An optical member deformation device further comprising a load applying mechanism that is disposed so as to face the contact member with the optical member interposed therebetween, and that applies a load to the optical member. The optical member deformation apparatus according to claim 4,
The apparatus for deforming an optical member, wherein the load application mechanism is configured to be displaceable between an abutting position where the load applying mechanism abuts against the optical member and a separated position separated from the optical member. In the optical member deformation device according to any one of claims 1 to 5,
The displacement member is separated from the optical member and a contact position where the contact member is brought into contact with the optical member when a driving force from the drive source is transmitted via the displacement magnifying mechanism. An optical member deforming device configured to be displaced between the separated positions. In the optical member deformation | transformation apparatus as described in any one of Claims 1-6,
The optical member deforming apparatus, wherein the contact member is in contact with a peripheral portion of the optical member. In an optical system including a plurality of optical members for guiding light to an irradiated body,
A lens barrel for holding the optical member;
An optical system comprising: the optical member deforming device according to any one of claims 1 to 7, which is provided in the lens barrel and deforms at least a part of a shape of the optical member. The optical system according to claim 8, wherein
An optical system further comprising a reaction force receiving member connected to the displacement magnifying mechanism and receiving a reaction force from the drive source transmitted through the displacement magnifying mechanism. The optical system according to claim 9, wherein
The reaction force receiving member constitutes at least a part of a wall surface that partitions the inside and outside of the lens barrel,
An optical system, wherein the reaction force receiving member is provided with an insertion portion that allows the optical member deformation device to be inserted inside the lens barrel. The optical system according to claim 10.
The optical system, wherein the drive source is provided outside the lens barrel. The optical system according to claim 11, wherein
An optical system further comprising: a sealing member that hermetically seals the inside of the lens barrel. The optical system according to claim 12, wherein
The optical system, wherein the sealing member is fixed to the lens barrel. The optical system according to claim 12, wherein
The optical system, wherein the sealing member is fixed to the reaction force receiving member. In the optical system according to any one of claims 12 to 14,
The optical system, wherein the sealing member is provided so as to close a space region between a mouth edge of the insertion portion and the optical member deformation device. The optical system according to any one of claims 8 to 15, comprising:
An exposure apparatus that irradiates an irradiated body with a radiation beam through an optical member held by the lens barrel and forms a predetermined pattern on the irradiated body. In a device manufacturing method including a lithography process,
A device manufacturing method using the exposure apparatus according to claim 16 in the lithography process.

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