JP2003337272A - Device for holding optical system, method of positionally adjusting optical device, lens barrel, exposure device, and method of manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device for holding an optical system and a lens barrel for the optical system by which the optical device is easily and accurately positioned and also a part of the optical device is positionally adjusted in the midst of working, and to provide a method of positionally adjusting the optical device by which exposing accuracy is improved, an exposure device, and a method of manufacturing the device. <P>SOLUTION: An image surface side lens 39a arranged at a lower part than a flange part 38a in the lens barrel 38 is held in an image surface side lens barrel module 37a through a fixed optical device holding device capable of positionally adjusting the lens at the time of attaching and keeping a specified set position at all times. A movable lens 39bm and a still lens arranged at an upper part than the flange part 38a in the lens barrel 38 are held in an object surface side lens barrel module 37b through a movable optical device holding device 40 capable of positionally adjusting the lens 39bm based on a signal from the outside in the midst of the working of the exposure device 31. The lens barrel 38 of a projection optical system 35 is constituted by piling up the several modules 37a and 37b. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used in a lithography process in a manufacturing process of a device such as a semiconductor device, a liquid crystal display device, an image pickup device, a thin film magnetic head, a micromachine, or a mask such as a reticle or a photomask. The present invention relates to an optical system holding device that holds an optical system including a plurality of optical elements in an exposure apparatus. The present invention also relates to a method of adjusting the holding device for the optical system. Further, the present invention relates to a lens barrel including the holding device for the optical system, and an exposure apparatus including the lens barrel. In addition, the present invention relates to a device manufacturing method using the exposure apparatus.

[0002]

2. Description of the Related Art As a holding device of this type of optical system, for example, the following structure is known. That is,
A frame body for housing an optical element such as a lens forming a part of an optical system is formed in an annular shape, and three seat surfaces for supporting the optical element are equiangularly spaced on the inner peripheral surface of the frame body. Is formed in. Three clamp members are attached to the frame body with bolts at equal angular intervals so as to correspond to those seat surfaces. In this way, the optical element is held by the frame body by sandwiching the outer peripheral flange portion of the optical element between each clamp member and the seat surface. Then, the lens barrel is constructed by stacking the frame bodies holding the optical element at a predetermined position.

[0003]

The pattern to be exposed is becoming finer with the high integration of semiconductor elements and the like. For this reason, an exposure apparatus for manufacturing a semiconductor device is required to have a projection optical system with less wavefront aberration and distortion. In order to meet such demands, it has become necessary to mount optical elements such as lenses in the projection optical system in a correctly positioned state.

In order to perform such accurate positioning of the optical element, the optical axis of the optical element can be positioned by adjusting the position of the frame when stacking the frames holding the optical elements such as lenses. Has been done. Therefore, it is necessary to pay close attention to the position adjustment of the frame body, which is very troublesome and troublesome.

In particular, recently, the demand for further high integration of semiconductor devices has been increasing day by day. In such a background, the pattern to be exposed is further miniaturized, and in order to respond to the exposure of this extremely fine pattern,
The exposure light used in the exposure device is also from ultraviolet light to far ultraviolet light,
Furthermore, the wavelength shortening to vacuum ultraviolet light is remarkable. When such exposure light having an extremely short wavelength is used, the temperature state of each optical element of the projection optical system easily changes due to the transmission of the exposure light. Then, the change in the temperature state of each optical element causes a change in the image forming characteristic in the projection optical system.

In order to correct the fluctuation of the image forming characteristics of the projection optical system during the exposure operation, at least a part of the optical elements of the projection optical system is moved during the operation of the exposure apparatus so that each optical element is moved. An exposure apparatus that adjusts the relative position has also been developed. In this exposure apparatus, a drive member that moves each optical element during operation of the exposure apparatus is mounted.However, in order to realize strict exposure, the reference position of the drive range of each drive member is set strictly. Need to be kept. That is, it is essential to strictly adjust the position of the frame body.

The present invention makes it possible to position some of the optical elements of the optical system easily and accurately, and
It is an object of the present invention to provide a holding device for an optical system that enables position adjustment of some other optical elements in an operating state. Another object of the present invention is to provide a method for adjusting the position of an optical element, which can adjust the position of the optical element more accurately. Still another object of the present invention is to provide a lens barrel that accommodates a more accurately positioned optical element and an optical element whose position can be adjusted in an operating state, and to improve exposure accuracy by including such a lens barrel. It is to provide a possible exposure apparatus. In addition, another object of the present invention is to provide a device manufacturing method capable of improving exposure accuracy.

[0008]

In order to achieve the above-mentioned object, the invention according to claim 1 of the present application is an optical system holding device for holding an optical system comprising a plurality of optical elements, wherein the plurality of optical elements are provided. A first position adjusting mechanism for adjusting the position of at least a part of the optical elements and a mechanism different from the first position adjusting mechanism, and the at least a part of the optical elements among the plurality of optical elements is A second position adjusting mechanism for adjusting the positions of different optical elements is provided.

In the invention according to claim 1 of the present application, the position of the optical element can be easily and accurately adjusted by adjusting the position of a part of the optical element of the optical system by the first position adjusting mechanism. Becomes Further, it becomes possible to adjust the position of an optical element different from the part of the optical elements in the operating state by the second position adjusting mechanism.

In the invention according to claim 2 of the present application, in the invention according to claim 1, the first position adjusting mechanism includes a holding portion for holding a peripheral portion of the optical element, and the holding portion. A plurality of flexure members to support, and two operation parts connected to at least one flexure member of the plurality of flexure members, the optical element,
By operating one of the operation sections, the optical element is moved in the first direction via the plurality of flexure members, and by operating the other operation section, the optical element is moved through the plurality of flexure members. It is characterized in that it moves in a second direction different from the first direction.

According to the invention of claim 2, in addition to the operation of the invention of claim 1, by operating each operation portion, the at least a part of the optical parts in two different directions. The element can be positioned easily and more accurately.

The invention according to claim 3 of the present application is the invention according to claim 1 or 2, wherein the second position adjusting mechanism includes an inner ring portion for holding a peripheral portion of the optical element. An outer ring portion formed integrally with the inner ring portion, and provided on the outer ring portion,
It has a drive member that is displaced in a predetermined direction, and a link mechanism that transmits the displacement amount of the drive member to the inner ring portion.

According to the invention of claim 3 of the present application, in addition to the operation of the invention of claim 1 or 2,
By the second position adjusting mechanism, it becomes possible to adjust the position of the optical element different from the at least some of the optical elements by displacing the driving member in the operating state of the exposure apparatus. Therefore, even if the temperature state of the optical element changes while the exposure apparatus is operating, as in the case of irradiating exposure light of a short wavelength, for example, it is possible to easily correct the change in the imaging characteristics due to the change. can do.

The invention according to claim 4 of the present application is the invention according to claim 3, wherein the positions of the at least some of the optical elements are adjusted to predetermined positions by the first position adjusting mechanism. It is characterized in that a reference position adjusting mechanism for setting a reference position for displacement in the second position adjusting mechanism is provided.

In the invention according to claim 4 of the present application, in addition to the operation of the invention according to claim 3, the reference position of the displacement in the second position adjusting mechanism is such that the position of some of the optical elements is adjusted. The optical system is adjusted to a predetermined state and then set. Therefore, the reference position of the second position adjusting mechanism can be set more accurately.

The invention according to claim 5 of the present application is the invention according to any one of claims 1 to 4, wherein the optical system is mounted on a frame on which the optical system is mounted. A flange portion for being supported, the at least a part of the optical element, with respect to the flange portion, is arranged on the image plane side of the optical system, the optical element different from the at least a part of the optical element, It is characterized in that it is arranged on the object plane side of the optical system with respect to the flange portion.

According to a fifth aspect of the present invention, in addition to the operation of the invention according to any one of the first to fourth aspects, at least a part of the optical element arranged on the image plane side is provided. By positioning the elements by the first position adjusting mechanism, it becomes possible to easily and more accurately adjust the image forming characteristics of the entire optical system. Then, the second position adjusting mechanism adjusts the positions of the optical elements different from at least a part of the optical elements arranged on the object plane side, thereby facilitating the fluctuation of the imaging characteristics of the optical system in the operating state. And it becomes possible to correct more accurately.

In a sixth aspect of the present invention, there is provided an optical element position adjusting method for adjusting the positions of a plurality of optical elements constituting an optical system, wherein the positions of the plurality of optical elements are set in the optical axis direction of each other. After arranging the plurality of optical elements, the positions of at least some of the optical elements among the plurality of optical elements are adjusted by the first position adjusting mechanism,
After adjusting the positions of the at least some of the optical elements, a displacement reference position of the drive member of the second position adjusting mechanism for adjusting the positions of the optical elements different from the at least some of the optical elements is set. It is what

In the invention according to claim 7 of the present application, in the invention according to claim 6, the position of an optical element different from the at least a part of the optical elements is adjusted by the second position adjusting mechanism. After that, the reference position is set.

In the inventions according to claims 6 and 7 of the present application, substantially the same operation as that of the invention according to claim 4 is realized. The invention according to claim 8 of the present application is a lens barrel that houses an optical system including a plurality of optical elements, wherein each optical element of the optical system is defined in any one of claims 1 to 5. It is characterized in that the optical system is held by the optical system holding device.

In the invention according to claim 8 of the present application, in a lens barrel which accommodates an optical system composed of a plurality of optical elements, almost the same as the invention according to any one of claims 1 to 5. The action is realized.

The invention according to claim 9 of the present application is the projection optical system according to claim 8, wherein the optical system projects an image of a predetermined pattern formed on a mask onto a substrate. It is characterized by being.

According to the ninth aspect of the present invention, in addition to the operation of the eighth aspect of the invention, it becomes possible to more accurately correct the image forming characteristic of the projection optical system, and the pattern on the mask is corrected. It is possible to more accurately project the image of the image on the substrate.

According to a tenth aspect of the present invention, an exposure apparatus that exposes an image of a pattern formed on a mask onto a substrate has the lens barrel according to the eighth or ninth aspect. It is a feature.

According to the tenth aspect of the present invention, the imaging performance of the projection optical system is improved, and the exposure accuracy can be improved. The invention described in claim 11 of the present application is characterized in that, in a device manufacturing method including a lithography process, exposure is performed using the exposure apparatus according to claim 10.

According to the eleventh aspect of the present invention, it is possible to improve the exposure accuracy and manufacture a highly integrated device with a high yield.

[0027]

BEST MODE FOR CARRYING OUT THE INVENTION An exposure apparatus, a lens barrel, and an optical system holding apparatus according to the present invention will be described below as an exposure apparatus for manufacturing a semiconductor element, a projection optical system of the exposure apparatus, and a lens forming the projection optical system. An embodiment embodied in a holding device that holds optical elements such as the above will be described with reference to FIGS. 1 to 26.

FIG. 1 shows a schematic structure of an exposure apparatus 31 of this embodiment. As shown in FIG.
1 includes a light source 32, an illumination optical system 33, a reticle stage 34 that holds a reticle R as a mask, a projection optical system 35, and a wafer stage 36 that holds a wafer W as a substrate.

The light source 32 oscillates an ArF excimer laser having a wavelength of 193 nm, for example. The illumination optical system 33 is
An optical integrator (not shown) such as a fly-eye lens or a rod lens, various lens systems such as a relay lens and a condenser lens, and an aperture stop are included. Then, the exposure light EL emitted from the light source 32 is
By passing through the illumination optical system 33, the reticle R
Adjusted to evenly illuminate the above pattern.

In the reticle stage 34, on the exit side of the illumination optical system 33, that is, on the object plane side (incident side of the exposure light EL) of the projection optical system 35 described later, the mounting surface of the reticle R is the projection optical system. It is arranged so as to be substantially orthogonal to the optical axis direction of 35. The projection optical system 35 is composed of a lens barrel 38 in which a plurality of lens barrel modules 37 forming a holding member are laminated. In each lens barrel module 37, a lens 39 as a plurality of optical elements, a movable optical element holding device 40 (see FIG. 2) as a second position adjusting mechanism or a fixed optical element holding device 41 as a first position adjusting mechanism. (Fig. 13
(See).

The lens barrel 38 is mounted on a frame 42, which is a pedestal erected on the base board 31a of the exposure apparatus 31, at the flange portion 38a. Thereby, the lens barrel 38 is fixed on the base board 31 a of the exposure apparatus 31. Here, the lens barrel 38 has an image surface side lens barrel module 37a arranged on the image surface side of the flange portion 38a and an object surface side lens barrel module 37b arranged on the object surface side of the flange portion 38a. In the lens barrel 38, at least a part of the image surface side lens 39a as an optical element arranged in the image surface side lens barrel module 37a is held via the fixed optical element holding device 41 (see FIG. 13). There is. On the other hand, the object-side lenses 39bm and 39bs arranged in the object-side lens barrel module 37b are held via the movable optical element holding device 40.

The wafer stage 36 is arranged so that the mounting surface of the wafer W intersects with the optical axis direction of the projection optical system 35 on the image plane side (exposure side of the exposure light EL) of the projection optical system 35. . Then, in a state where the image of the pattern on the reticle R illuminated by the exposure light EL is reduced to a predetermined reduction magnification through the projection optical system 35, the wafer stage 3
The image is transferred onto the wafer W on the wafer 6 by projection.

Next, the object plane side lens barrel module 37b
The configuration will be described in detail. FIG. 2 is a view in which a part of the object plane side lens barrel module 37b is cut away. FIG. 3 is a plan view of the object plane side lens barrel module 37b. Further, FIG. 4 is a cross-sectional view of the object plane side lens barrel module 37b.

As shown in FIGS. 2 to 4, in the object side lens barrel module 37b, a movable lens 39bm and a stationary lens which are optical elements different from the movable optical element holding device 40 and at least some of the optical elements. 39bs. The movable lens 39bm is a movable optical element holding device 40.
The lens is held so that it can be moved in the optical axis direction and tilted by being driven by a lens driving mechanism 43 as a second position adjusting mechanism. On the other hand, the stationary lens 39
bs is a lens that is held at a predetermined position regardless of the driving of the lens driving mechanism 43.

The lens barrel body 44 of the object plane side lens barrel module 37b has an inner ring portion 44a and an outer ring portion 44b. The outer ring portion 44b receives the exposure light E
It is provided with a mounting surface 48 for another object plane side lens barrel module 37b arranged along the optical axis direction of L, and functions as a connecting portion for the other object plane side lens barrel module 37b.

The outer ring portion 44b and the inner ring portion 44a are integrally formed. Alternatively, the outer ring portion 44b and the inner ring portion 44a are formed of the same member. The outer ring portion 44b is formed in a cylindrical shape, and the base ring 45 is fixed to the lower end thereof. The inner ring portion 44a is formed in a cylindrical shape such that the outer diameter thereof is slightly smaller than the inner diameter of the outer ring portion 44b, and is arranged inside the base ring 45 so as to be movable and tiltable in the optical axis direction.

A movable lens 39bm, which is moved in the optical axis direction via the inner ring portion 44a, is attached to the inner ring portion 44a via a first lens cell 46. The movable lens 39bm is mounted on the first lens cell 46 such that its peripheral portion is mounted on, for example, a plurality of receiving seats (not shown) provided on the inner peripheral surface of the first lens cell 46 so as to project. It is fixed by a pressing member or the like. Specifically, a flange having parallel surfaces to each other is formed on the peripheral portion of the movable lens 39bm. The lower surface of the flange is placed on a plurality of receiving seats (not shown) protruding inward of the first lens cell 46, and a lens pressing member for sandwiching the flange together with the receiving seat is attached to the upper surface of the flange. .

A movable lens 3 is attached to the outer ring portion 44b.
A stationary lens 39bs serving as an optical element that is always kept stationary is attached via a second lens cell 47 above 9bm so that the optical axes of the optical axes coincide with each other or the optical characteristics are optimized. The stationary lens 39bs is always stationary on the lens barrel body 44. A lens chamber is defined between the movable lens 39bm held by the first lens cell 46 and the stationary lens 39bs held by the second lens cell 47.

As described above, the flange portion 3 of the lens barrel 38
The portion above 8a is formed by a plurality of object plane side lens barrel modules 37b stacked in the optical axis direction. The object-side lens barrel module 37b arranged closest to the reticle stage 34 has one mounting surface 48 on one end surface of the outer ring portion 44b. Each object plane side lens barrel module 37b arranged on the flange portion 38a side of the object plane side lens barrel module 37b has an outer ring portion 44b.
The mounting surfaces 48 are provided on both end surfaces of the.

More specifically, flat mounting surfaces 48 are formed on the upper end surface of the outer ring portion 44b and the lower end surface of the base ring 45, respectively. Then, between the plurality of object-plane-side lens barrel modules 37b, the upper and lower mounting surfaces 48 are in contact with each other and overlap each other, so that the lens barrel main bodies 44 of the respective lens barrel modules 37b become inner ring portions 44.
It is arranged to be stacked in a stable state in the optical axis direction without applying a load to a.

A plurality of object plane side lens barrel modules 37
b, that is, the mounting surface 4 of each lens barrel module 37b.
A space adjusting member for adjusting the space between the respective lens barrel modules 37b may be arranged between the eight. The gap adjusting member is formed by a ring-shaped washer having a diameter substantially the same as the diameter of the outer ring portion 44b or a washer having a diameter smaller than the radial length of the mounting surface 48. A plurality of the latter washers are arranged in the mounting surface 48 of the outer ring portion 44b at equal intervals. When the washers are used as described above, the plurality of object plane side lens barrel modules 37
When stacking b, the mounting surface 4 of each lens barrel module 37b
8 does not come into direct contact.

FIG. 5 is an enlarged view showing the periphery of the lens driving mechanism 43 of the object plane side lens barrel module 37b, and FIG. 6 is a sectional view thereof. Three notches 49 (see FIG. 2) are formed at equal angular intervals on the peripheral wall (side wall) of the outer ring portion 44b. As shown in FIGS. 3 and 5,
An actuator 50 serving as a drive source for the drive member and the second position adjusting mechanism is housed in each notch 49.

Each actuator 50 is arranged so that its longitudinal axis is along the tangential direction of the outer ring portion 44b. Each actuator 50 is exposed on the peripheral surface of the outer ring portion 44b. Each actuator 50
Is preferably composed of a piezo element having characteristics of high precision, low heat generation, high rigidity, and high cleanliness.

The control device 51 (see FIG. 1) includes the exposure device 3
1. Based on an external control signal from a main control system (not shown) that controls the overall operation of the actuator 1, a control voltage according to the control signal is applied to the actuator 50 to control the expansion and contraction of the actuator 50. The expansion / contraction direction of the actuator 50 is substantially parallel to the tangential direction of the outer ring portion 44b.

As shown in FIG. 2 and FIG. 5, the actuators 5 corresponding to one end of each actuator 50 are
A holding bolt 52 is screwed onto the peripheral wall of the outer ring portion 44b so as to extend in the same direction as 0. The outer ring portion 44 corresponds to the other end of each actuator 50.
The coupling tool 53 is fixed on the first link 62a of the displacement magnifying mechanism 60, which will be described later, formed on b. Both ends of each actuator 50 are rotatably coupled to the tip of the holding bolt 52 and the coupling tool 53 via a rotary pivot mechanism 54 including a conical groove and a ball.

FIG. 9 is a perspective view showing the lens barrel main body 44 of the object plane side lens barrel module 37b. FIG. 10 shows the cutout portion 4 in the lens barrel body 44 of the object plane side lens barrel module 37b.
It is an enlarged view of 9 periphery. Further, FIG. 11 is an enlarged view of the periphery of the actuator 50. As shown in FIGS. 9 to 11, three connecting arm portions 59 are formed on the upper end surface of the inner ring portion 44 a corresponding to each actuator 50. In the outer ring portion 44b, a displacement magnifying mechanism 60 forming a part of a flexure member and a link mechanism and a guide mechanism 61 forming a part of a flexure member are also arranged so as to be connected to both side edges of each connecting arm part 59, respectively. It is arranged. The inner ring portion 44a and the outer ring portion 44b have three actuators 5 at the three positions.
0, the displacement magnifying mechanism 60, the guide mechanism 61, and the coupling arm portion 59 are coupled so as to be relatively movable in the optical axis direction.

The inner ring portion 44a tilts with respect to the outer ring portion 44b when the expansion and contraction amounts of the actuators 50 at the three locations are different. In addition, the inner ring portion 44a moves substantially parallel to the outer ring portion 44b when the expansion and contraction amounts of the actuators 50 at the three locations are substantially equal. As mentioned above, the movable lens 39bm
Is the inner ring portion 44a via the first lens cell 46.
The movable lens 39bm moves and tilts in the optical axis direction as the inner ring portion 44a moves.

Each of the displacement magnifying mechanisms 60 has a role of expanding the expansion / contraction amount (displacement) of the actuator 50 and converting the displacement direction of the actuator 50 into the moving direction of the movable lens 39bm in the optical axis direction. . Further, each displacement magnifying mechanism 60 is composed of an elastic hinge link mechanism 62 including a plurality of slits 63 and a plurality of through holes 64.

The elastic hinge link mechanism 62 will be described below. As shown in FIG. 11, each connecting arm portion 59
On the right side of the drawing, the outer ring portion 44b has a plurality of through holes 64 that extend to intersect the optical axis direction of the optical element.
And a plurality of slits 63 connected to the plurality of through holes 64.
Are formed by wire cutting or the like. That is, the plurality of through holes 64 are formed so as to extend toward the axial center of the outer ring portion 44b. The plurality of slits 63 are formed along the through hole 64 from the outer surface of the outer ring portion 44b toward the inner surface thereof. Accordingly, the elastic hinge portions 65a to 65c are formed between the pair of adjacent through holes 64. The elastic hinge link mechanism 6 is formed by the plurality of slits 63 and the through holes 64.
Two first links 62a and second links 62b are defined.

FIG. 12 shows the object-side lens barrel module 37b.
The operation of the actuator 50, the displacement magnifying mechanism 60, and the guide mechanism 61 in FIG. Figure 11
As shown in FIG. 12, the first link 62a is rotatable on the peripheral wall of the outer ring portion 44b with the elastic hinge portion 65a at the right end (the other end of the actuator 50 being the right end) as a fulcrum P1 in the drawing. Connected to. The first link 62a is connected to the right end of the actuator 50 via the rotary pivot mechanism 54 forming the connection point P2. Further, the second link 62b uses the elastic hinge portion 65b at the right end as the connection point P3, and the first link 62a.
Is connected to the lower end of the
It is connected to the right side edge of the connecting arm portion 59 with c as the connecting point P4. Here, the rotary pivot mechanism 54 at one end (the left end in the drawing) of the actuator 50 corresponds to the fulcrum P0.

Then, when the actuator 50 is extended and displaced while being rotated with the leftmost rotary pivot mechanism 54 as the fulcrum P0, the first link 62a is rotated about the fulcrum P1 in the clockwise direction in FIG. The second link 62b is moved upward, and the connecting arm portion 59 is moved upward and displaced. In this case, the displacement of the actuator 50 is enlarged by the operation of the first link 62a and the second link 62b, and the displacement direction thereof is converted into the displacement in the direction intersecting the extension direction of the actuator 50, and thus the connecting arm. It is transmitted to the part 59. This allows the movable lens 39bm held by the inner ring portion 44a.
Is moved in the optical axis direction.

On the other hand, each of the guide mechanisms 61 is shown in FIGS.
As shown in FIG. 1, it is formed on the left side of the drawing of each connecting arm portion 59, and the relative movement of the inner ring portion 44a with respect to the outer ring portion 44b is set in a predetermined direction, that is, in a direction substantially parallel to the optical axis of the movable lens 39bm. invite. Each guide mechanism 61 is arranged so as to substantially coincide with the optical pivotal position of the movable lens 39bm, that is, the position on the optical axis where the image shift that occurs when the movable lens 39bm is tilted is zero. . Each guide mechanism 61 is composed of a parallel link mechanism 66 including a plurality of slits 63 and a plurality of through holes 64, which are substantially the same as the elastic hinge link mechanism 62.

More specifically, the plurality of slits 63 and the plurality of through holes 64 constitute an optical system (for example, the movable lens 39b).
m) is formed so as to extend in a direction intersecting the optical axis, that is, toward the axis of the outer ring portion 44b. In addition, the plurality of slits 63 have a plurality of through holes 64.
Are formed continuously. Therefore, the plurality of slits 6
3 is formed along the through hole 64 from the outer surface of the outer ring portion 44b toward the inner surface thereof. That is, the plurality of through holes 64 and the plurality of slits 63 that form the displacement magnifying mechanism 60 and the guide mechanism 61 are the outer ring portion 44b.
The outer ring portion 44b is formed from the outer surface to the inner surface or from the inner surface to the outer surface on an imaginary plane including the central axis including the ring center. When each lens barrel module 37b holds an optical element, the central axis including the ring center indicates the optical axis of the optical element.

Here, the elastic hinge portions 65d to 65g are formed between the pair of through holes 64 that are closely opposed to each other. And
The slit 63 and the through hole 64 form a pair of parallel levers 66 a and 66 b of the parallel link mechanism 66. Each of the parallel levers 66a and 66b is formed in the outer ring portion 44b such that its longitudinal direction is along the tangent line of the movable lens 39bm, that is, along the peripheral wall of the outer ring portion 44b.

As shown in FIGS. 11 and 12, the pair of parallel levers 66a and 66b are provided with the elastic hinge portion 6 at the left end.
5d and 65e are rotatably connected to the peripheral wall of the outer ring portion 44b with fulcrums P5 and P6, and the right end elastic hinge portions 65f and 65g are connected to the left edge of the connecting arm portion 59 with connecting points P7 and P8. It is connected. Then, with the extension displacement of the actuator 50, the inner ring portion 4 is passed through the displacement magnifying mechanism 60 and the connecting arm portion 59.
When 4a is moved in the optical axis direction, a pair of parallel levers 6
6a and 66b are rotated counterclockwise in FIG. 12 about the fulcrums P5 and P6. Thereby, the movable lens 39b
The movement of the inner ring portion 44a that supports m is allowed only in the optical axis direction while being restricted in the radial direction and the tangential direction of the movable lens 39bm.

As shown in FIGS. 5 and 6, spring bearings 67 are attached to the outer surfaces of the connecting arm portions 59, respectively, and the spring bearings are provided on the outer peripheral surface of the base ring 45 so as to correspond to the spring bearings 67. 68 is attached. A pair of tension springs 69 are provided between the spring supports 67 and 68.
Each is hung. Then, by the biasing force of these tension springs 69, the inner ring portion 44a supporting the movable lens 39bm is returned to the original position within its movable range when the actuator 50 is in the non-operating state.

FIG. 7 shows the periphery of the sensor 72 which constitutes the reference position adjusting mechanism in the object side lens barrel module 37b, and FIG. 8 is a sectional view taken along line 8-8 of FIG. As shown in FIGS. 2 and 3, the outer ring portion 4
On the outer side of 4b, an opening 44d is formed in the peripheral wall (side wall) of the outer ring portion 44b by cutting out at an intermediate position between the actuators 50 adjacent to the outer peripheral direction. A sensor 72 for measuring the position of the inner ring portion 44a with respect to the outer ring portion 44b is arranged in the opening 44d.

As shown in FIGS. 7 and 8, each sensor 72
Is composed of a non-contact type encoder, for example, an optical encoder, and includes a scale 74 and a detection head 76. The scale 74 is attached to the scale base 44c on the inner ring portion 44a via the scale holder 73. Each scale 74 is arranged in a state of being accommodated in the opening 44d of the outer ring portion 44b. The detection head 76 is mounted on the outer ring portion 44b via the head holder 75 so as to correspond closely to the scale 74, and the opening portion 44d of the outer ring portion 44b.
It is arranged so as to face.

Here, the scale 74 and the detection head 76 of each sensor 72 are exposed from the outer surface of the outer ring portion 44b. Then, the detection head 76 reads the scale 74a of the scale 74 attached to the inner ring portion 44a from the opening 44d. The movement amount of the inner ring portion 44a is measured based on the reading result.

Next, the operation when the movable lens 39bm is moved in the optical axis direction by the movable optical element holding device 40 configured as described above will be described. As shown in FIGS. 11 and 12, when the actuator 50 is rotated with the rotary pivot mechanism 54 at the left end of the drawing as the fulcrum P0 with the application of voltage, the actuator 50 is extended and displaced by the displacement amount dL.
Elastic hinge link mechanism 62 constituting the displacement magnifying mechanism 60
The first link 62a is rotated clockwise about the fulcrum P1. As a result, the connecting point P3 at the lower end of the first link 62a with respect to the second link 62b is displaced to the left by the displacement amount d.
While being displaced by x, it is displaced upward by the displacement amount dy.

At this time, the connecting arm portion 59 on the inner ring portion 44a is guided and held by the guide mechanism 61 constituted by the parallel link mechanism 66 so as to be movable only in the optical axis direction. Therefore, when the above-mentioned displacement is applied to the connection point P3 at the right end of the second link 62b, the second
The link 62b is pushed up, whereby the connecting arm portion 59 is moved and displaced upward by the displacement amount dY.
Therefore, the guide mechanism 61 and the elastic hinge link mechanism 62 cooperate with each other in the displacement of the actuator 50,
The connecting arm portion 59 is moved upward.

In this case, the displacement of the actuator 50 is changed by the first link 62a and the second link 62b of the elastic hinge link mechanism 62 while changing the displacement direction.
It is enlarged in stages and transmitted to the connecting arm portion 59. Therefore, based on the slight displacement of the actuator 50, the movable lens 39bm supported by the inner ring portion 44a is moved and displaced in the optical axis direction by a large displacement amount.

Next, the image side lens barrel module 37a will be described in detail. 13 is a perspective view showing the image side lens barrel module 37a, FIG. 14 is a plan view of the image side lens barrel module 37a, and FIG. 15 is a side view of the image side lens barrel module 37a. Yes, FIG. 16 is FIG.
FIG. 16 is a sectional view taken along line 16-16 of No. 4.

As shown in FIGS. 13 to 16, the image plane side lens barrel module 37a includes the fixed optical element holding device 41 and the image plane side lens 39a. The fixed optical element holding device 41 includes a frame body 80, three flexure members 81, a lens frame body 82 forming a holding portion, and a support member 83. On the frame 80, three flexure members 81 are fixed at equal angular intervals. A lens frame body 82 is fixed to the upper surface of the flexure member 81, and three support members 83 are arranged on the lens frame body 82 at equal angular intervals.

FIG. 17 is a partial perspective view mainly showing a portion of the supporting member 83 which holds the image side lens 39a in the lens frame 82, and FIG. 18 is an enlarged partial exploded view showing the supporting member 83 as a center. It is a perspective view. 17 and 1
As shown in FIG. 8, the support member 83 roughly includes a base member 85 and a clamp member 86. The lens frame 82 is made of an annular metal material such as iron or aluminum, and mounting grooves 84 to which the clamp members 86 are attached are formed on one surface of the lens frame body 82 at equal angular intervals. There is. Further, on the inner peripheral surface of the lens frame body 82, a seat surface block 90a in a base member 85 described later is provided.
A holding portion accommodation recess 100 for accommodating the upper half portion including is formed at a position corresponding to the mounting groove 84. The holding portion accommodating recess 100 prevents the lens frame 82 from having a large diameter.

As described above, by forming the mounting groove 84 on one surface of the lens frame 82, the clamp member 86 is formed.
When is attached to the lens frame body 82 with the pair of bolts 108, the heads of the pair of bolts 108 do not project from one surface of the lens frame body 82. Therefore, when one surface is overlapped with the other lens frame body 82 and the frame body 80, the bolt 1 for the other lens frame body 82 and the frame body 80 is overlapped.
08 interference can be prevented.

Between the front surface of one lens frame body 82 and the back surfaces of the other lens frame bodies 82 and 80, the optical axis direction of the image side lens 39a held by each lens frame body 82 is set. A spacer is arranged to adjust the spacing between the lens frames 82 to determine the position at. Therefore, even if the image side lens 39a slightly projects from the surface of the lens frame body 82, as long as it is within the thickness of the spacer, the image side lens 39a
a does not come into contact with the back surface of the other lens frame body 82. And
The base member 85 includes the mounting groove 8 formed in the lens frame 82.
It is fixed to a surface opposite to 4, that is, the other surface of the lens frame 82 by a pair of bolts (not shown).

Next, the specific structure of the support member 83 will be described. As shown in FIGS. 17 and 18, the base member 85 is
The seat block 90a and the holding part support block 90b are provided. The seat surface block 90a has a seat surface 89 that engages with one flange surface of the flange portion 39af forming the peripheral edge portion of the image side lens 39a. A seat surface block support mechanism 91 that supports the seat surface block 90a so that the posture of the seat surface block 90a is adjustable is formed on the holding portion support block 90b.

The seat block 90a is arranged such that its longitudinal direction is along the tangential direction of the image side lens 39a, and the seat surfaces 89 are formed at both ends of the seat block 90a in the longitudinal direction. . That is, the seat surface 89 is formed so as to project from the seat surface block 90a toward the flange portion 39af of the image-side lens 39a. The seat surface 89 has a flat shape having a predetermined area, and its peripheral edge is formed into a curved surface having a predetermined curvature. This is to avoid damage to the image-side lens 39a due to corner contact of the seat surface 89 with the flange portion 39af.

A plurality of slits 93 penetrating in the radial direction (X-axis direction in FIG. 18) of the image side lens 39a is provided between the seat surface block 90a and the holding portion support block 90b and in the holding portion support block 90b. Has been formed. When forming the plurality of slits 93, a non-processed portion is left between the slits 93 so that all the slits 93 are not continuous with each other. The engraved portion 94 is formed by engraving the non-processed portion from the center side in the radial direction of the image-side lens 39a and engraving it from the outside in the same direction.

Here, a large hole is formed in the engraved portion 94 on the outer side in the radial direction of the image-side lens 39a. Due to the processing from both directions, a plurality of holding portion neck portions 95a to
95d (bent portion) is formed.

In order to prevent unpredictable strain from remaining in the holding portion neck portions 95a to 95d, the dug portions 9 are formed.
In the vicinity of the neck portions 95a to 95d in the depth direction of 4, the both sides of the holding portion neck portions 95a to 95d are cut by the same processing method. As this processing method, for example, die-sinking electric discharge machining, mechanical cutting, etc. are effective.

The holding part support block 90b is roughly divided into three parts by the plurality of slits 93. That is, the holding portion support block 90b includes a holding portion fixing portion 96 fixed to the lens frame body 82 and a first holding portion fixing portion 96.
It is divided into a holding block 97a and a second holding block 98a.

Here, the holding portion fixing portion 96 and the first holding block 97a are connected by the first holding portion neck portion 95a. The holding portion fixing portion 96 and the second holding block 98a are connected by the second holding portion neck portion 95b. First
The holding block 97a and the second holding block 98a are connected by the third holding portion neck 95c. The fourth holding block 98a and the seat block 90a are connected to each other by a fourth
The holding portion neck portion 95d is connected. The plurality of holding portion neck portions 95a to 95d are formed by engraving to have a square cross section, and the first holding block 97.
a, the second holding block 98a, the holding portion fixing portion 96, and the seating surface block 90a have a remarkably small cross-sectional area.

As a result, the first holding block 97a is
It is fixed to the second holding block 98a and the holding portion fixing portion 96 by the first holding portion neck portion 95a and the third holding portion neck portion 95c. The first holding block 97a is rotatably held around the tangential direction of the image-side lens 39a by the cooperation of the first holding portion neck portion 95a and the third holding portion neck portion 95c, but is not displaced in the tangential direction. Be detained. Therefore, the first holding block 97a, the first holding portion neck portion 95a, and the third holding portion neck portion 95c form a tangential direction restraining link 97 that restrains the displacement of the image-side lens 39a in the tangential direction.

The second holding block 98a is fixed to the seat block 90a and the holding portion fixing portion 96 by the second holding portion neck portion 95b and the fourth holding portion neck portion 95d.
The second holding block 98a cooperates with the second holding portion neck portion 95b and the fourth holding portion neck portion 95d to cause the image-side lens 39 to move.
It is held rotatably around a direction parallel to the optical axis of a,
The displacement in the direction parallel to the optical axis is restricted. Therefore, the second holding block 98a, the second holding portion neck 95b and the fourth holding block 98a
An optical axis restraint link 98 that restrains the displacement of the image-side lens 39a in the direction parallel to the optical axis by the holding portion neck portion 95d.
Is formed. The restraint direction of the tangential direction restraint link 97 and the restraint direction of the optical axis direction restraint link 98 are substantially orthogonal to each other. In other words, the rotation axis of the tangential restraint link 97 and the rotation axis of the optical axis restraint link 98 are substantially orthogonal to each other.

The seat block 90a is connected to the holding part support block 90b by the fourth holding part neck 95d. That is, the seating surface block 90a is supported by the holding portion fixing portion 96 by a pair of link mechanisms including a tangential restraint link 97 and an optical axis restraint link 98.

Further, these holding portion neck portions 95a to 95d are provided.
Of these, the second and fourth holding portion neck portions 95b and 95d are parallel to the optical axis of the image-side lens 39a and are arranged in the seat block 90.
It is arranged on a line that passes through the intermediate position between the two seat surfaces 89 of a. This line is orthogonal to the line connecting the pair of seat surfaces 89. On the other hand, the first and third holding portion neck portions 95a and 95c are arranged on a line parallel to the line connecting the pair of seat surfaces 89. Furthermore, the third holding portion neck portion 95c is arranged near the fourth holding portion neck portion 95d.

In this base member 85, the seat surface block 90
a is parallel to the radial direction (X direction), the tangential direction (Y direction), and the optical axis of the image side lens 39a with respect to the holding unit fixing unit 96 by the tangential direction and optical axis direction restraining links 97 and 98. It is supported so as to be rotatable around each direction (Z direction) and the displacement in the Y direction and the Z direction is suppressed. Further, the seat surface block 90a is supported by the fourth holding portion neck portion 95d so as to be displaceable in the X direction.

The seat surface block 90a has a seat surface 8 on the outer side of the seat surface 89 in the radial direction of the image side lens 39a.
9 is provided with a seating surface side mounting portion 99 formed to extend in the Z direction (that is, the thickness direction of the flange portion 39af of the image surface side lens 39a).

The clamp member 86 is disposed above the seat surface block 90a so as to correspond to the clamp main body 10.
2 and a pad member 87. Clamp body 1
02 is equipped with a pressing surface block 103 and a pressing surface block support mechanism 104 for supporting the pressing surface block 103. At both ends of the lower surface of the pressing surface block 103, pressing surfaces 105 are formed so as to face the seat surface 89 of the seat surface block 90a. The pressing surface 105 is formed in a triangular shape in cross section having a ridge line substantially along the tangential direction of the image-side lens 39a.
The ridges of the two pressing surfaces 105 are arranged such that the midpoint of a straight line connecting the two ridges is located above the fourth holding portion neck 95d that connects the seat block 90a and the optical axis direction restraining link 98. Has been formed.

The pressing surface block support mechanism 104 is
It is composed of an arm portion 106 and a holding surface side mounting portion 107, and the holding surface side mounting portion 107 and the holding surface block 103 are separated from each other by a predetermined distance. Then, the holding surface side mounting portion 107 and the seat surface side mounting portion 9
9 and 9 are joined with each other via the pad member 87, and are fastened by the bolt 108, so that the clamp member 8
6 is fixed to the seat block 90a.

A pair of arms 106 are provided so as to connect both ends of the pressing surface block 103 and the pressing surface side mounting portion 107. Each arm portion 106 has a planar U-shape, and has a length that is elastically deformable in a state where the pressing surface side mounting portion 107 and the seating surface side mounting portion 99 are joined via the pad member 87. Has been formed. Further, the arm portion 106, when mounted on the lens frame body 82, is housed in the mounting groove 84 of the lens frame body 82 in a state of being separated from the inner peripheral surface thereof.

The pad member 87 is provided on the both mounting portions 9
9 and 107, the holding portion 111, the pressing surface 105, and the flange portion 39af of the image side lens 39a.
And an operating portion 112 interposed between the holding portion 11 and
1 and the action portion 112 are connected to each other, and a thin plate portion 113 having a thin plate shape that is elastically deformable is formed. The action part 1
The lower surface of 12 has a flange portion 39 of the image side lens 39a.
An action surface 114 that engages with af is formed in a flat shape so as to correspond to the seat surface 89. The peripheral edge of the action surface 114 is formed into a curved surface having a predetermined curvature in order to avoid damage to the flange portion 39af due to corner contact.

In the clamp member 86 having such a structure, the arm portion 106 is elastically deformed by tightening the bolt 108, so that the pressing surface block 10 is pressed.
A pressing force is applied to the pressing surface 105 of No. 3 toward the seat surface block 90a. This pressing force is applied to the working surface 1 of the pad member 87.
Via the flange portion 39a of the image side lens 39a.
acts on f. As a result, the flange portion 39af of the image side lens 39a and the seat surface 89 of the seat surface block 90a,
It is sandwiched between the pressing surface block 103 and the pressing surface 105.

Further, as shown in FIGS. 13 to 15 and 17, on the outer peripheral surface of the lens frame 82 in the vicinity of each of the mounting grooves 84, a lens frame position detecting mechanism 122, which will be described later, is disposed so as to be opposed thereto. A rectangular column-shaped position detecting projection 116 is provided so as to project. Further, a flat plate-shaped flexure joint portion 117 that is joined to the flexure member 81 is formed so as to extend outward in the middle of each support member 83 on the upper surface of the lens frame 82.

Next, the specific structure of the frame body 80 will be mainly described with reference to FIG.
And it demonstrates based on FIGS. 19 is a perspective view showing the entire frame 80, FIG. 20 is an enlarged partial plan view showing a mounting portion of the flexure member 81 of the frame 80, and FIG. 21 is a portion centering on the mounting portion. It is a side view. As shown in FIGS. 19 to 21, the frame 80
Is made of a metal material such as iron or aluminum and has an annular shape. On the inner peripheral surface side of the upper surface of the frame body 80, three flexure mounting portions 120 for mounting the flexure members 81 are formed at equal angular intervals.

Then, on the inner peripheral surface and the lower surface of the frame 80,
The flexure housing concave portion 12 for housing the flexure member 81 of another frame body 80 when the frame bodies 80 are stacked.
Three 1 are provided so as to correspond to intermediate positions of the flexure mounting portions 120. The flexure accommodating recess 121 has a main body accommodating portion 121a for accommodating a flexure main body 124, which will be described later, as a center, and lever accommodating portions 121b for accommodating drive levers 125a, 125b, which will be described later, formed so as to be continuous with both side ends thereof. Has been done. Here, the flexure mounting portion 120 and the flexure housing recess 12
1 and 18 alternately in the circumferential direction of the frame 80, and
They are formed with a 0 ° phase shift.

Further, as shown in FIGS. 13 and 19, a detection mechanism mounting seat for mounting the lens frame body position detection mechanism 122 on the outer peripheral surface of the frame body 80 in the vicinity of the flexure accommodating recess 121. 123 is formed. A lens frame body position detection mechanism 122 having, for example, an electrostatic capacitance detection type L-shaped cross section is attached to the detection mechanism mounting seat 123 so as to project to the outside of the frame body 80. This frame 80
When the lens frame body 82 is mounted on the flexure member 81, the lens frame body position detecting mechanism 12 is attached.
2 and the position detecting projection 116 of the lens frame 82 are arranged to face each other with a predetermined gap.
When the lens frame body 82 is relatively moved with respect to the frame body 80, the position detecting protrusion 116 is displaced with respect to the lens frame body position detecting mechanism 122, and the displacement amount is used to detect the lens frame body position. It is adapted to be detected by the mechanism 122.

Next, the detailed structure of the flexure member 81 will be described with reference to FIGS. 13 and 19 to 24. FIG. 22 shows the flexure body 1 in the frame 80.
It is a partial side view which expands and shows the attachment part of 24.

As shown in FIG. 13, the flexure member 81 has a flexure body 124, and a vertical drive lever 125a and a horizontal drive lever 125b as a pair of operating portions. The flexure body 124
Is a flexure joint 117 of the lens frame 82,
The frame 80 is attached so as to be sandwiched between the frame 80 and the flexure attaching portion 120. This flexure body 124
The connection block 12 to which the flexure joint portion 117 of the lens frame body 82 is joined and fixed via a bolt 138.
4a and a flexure support block 124b in which a connection block support mechanism 132 (see FIG. 22) that supports the posture of the connection block 124a is adjustable.

Here, FIG. 23 is a partial sectional view of the flexure member 81 and the frame body 80 along the drive levers 125a and 125b. Further, FIG. 24 is an enlarged partial cross-sectional view in which the flexure member 81 and the frame body 80 are broken along the radial direction of the image-side lens 39a at approximately the center of the flexure body 124.

As shown in FIGS. 22 to 24, the flexure body 124 has a substantially rectangular parallelepiped shape, and the flexure support block 124b and the connection block 124a are shown in FIG.
A plurality of first slits 126 and second slits 127 penetrating in the X-axis direction are formed. The first slits 126 are formed on the flexure body 124 by the slits 126,
The second slit 127 is formed above the reference hole 124c when the 127 is processed, and the second slit 127 is formed in the reference hole 12c.
It is formed on the lower side of 4c.

The first and second slits 126 and 127
When forming, the slits 126 and 127 are left unprocessed so that all the slits 126 and 127 are not continuous with each other. The engraved portion 126a is formed on the portion not processed corresponding to the first slit 126.
Is engraved from the + direction of the X direction (the front side of the paper surface of FIG. 22), and the-direction of the X direction (the other side of the paper surface of FIG. 22)
It is formed by the carving process.

The engraved portion 126a is formed along the radial direction of the image-side lens 39a. Large holes are formed on both ends of the engraved portion 126a. By the processing from the + direction and the processing from the-direction of the X direction, a plurality of flexure neck portions 129a forming a rotary pivot and a notch spring are provided between the connection block 124a and the flexure support block 124b and on the flexure support block 124b. ~ 129d are formed. Then, on both sides of each flexure neck portion 129a to 129d, a rectangular through hole 128a penetrating in the radial direction of the image side lens 39a is formed.

In order to avoid the unpredictable strain remaining in the flexure neck portions 129a to 129d, the flexure neck portion 12 in the depth direction of each rectangular through hole 128a.
The flexure neck portion 129a is located near 9a to 129d.
Both sides of ˜129d are cut by the same processing method. As this processing method, for example, die-sinking electric discharge machining, mechanical cutting, etc. are effective.

Further, a circular through hole 128b having a substantially circular cross section is formed on both sides of a portion (two places) which is not processed corresponding to the second slit 127 and which penetrates in the radial direction of the image side lens 39a. Are formed. First and second thin-walled portions 130a and 130b forming a notch spring are formed between the pair of opposing circular through holes 128b.

Here, the flexure support block 124b
Is due to the first and second slits 126 and 127.
It is divided into 6 parts. That is, the flexure support block 124 b is the flexure fixing portion 131.
And the first restraint block 133a and the second restraint block 1
34a, a first drive block 135a, and a second drive block 136a. The flexure fixing portion 131 is fixed to the flexure attaching portion 120 of the frame body 80 via a bolt 137 (FIGS. 19 and 2).
2).

The plurality of flexure neck portions 129a-12.
9d is formed by engraving the flexure body 124, and in the present embodiment, 9d includes four flexure neck portions 129a to 129d. The first flexure neck portion 129a corresponds to the first drive block 135a.
And the first constraining block 133a.
The second flexure neck portion 129b connects the second drive block 136a and the second restraint block 134a. The third flexure neck portion 129c connects the first constraining block 133a and the second constraining block 134a. The fourth flexure neck portion 129d connects the first restraint block 133a and the connection block 124a. The plurality of flexure necks 129a-1
29d has a substantially square cross section, and each constraining block 133
a, 134a, each drive block 135a, 136a, and the connection block 124a have a remarkably small cross-sectional area.

The first constraining block 133a includes the first flexure neck portion 129a and the fourth flexure neck portion 12a.
It is fixed to the first drive block 135a and the connection block 124a by 9d. This first restraint block 13
3a is operated in the Z direction (image surface side lens 3 by cooperation of the first flexure neck 129a and the fourth flexure neck 129d).
9a is rotatably held around the optical axis 9a), but the displacement in the Z direction is restricted. Therefore, the first restraint block 1
33a, the first flexure neck portion 129a and the fourth flexure neck portion 129d restrain the displacement in the vertical direction (optical axis direction) of the image side lens 39a.
33 is formed.

The second restraint block 134a has a second
Flexure neck 129b and third flexure neck 129
It is fixed to the second drive block 136a and the first constraining block 133a by c. This second restraint block 1
The second flexure neck portion 129b and the third flexure neck portion 129c cooperate to hold 34a rotatably around the Y direction (tangential direction of the image-side lens 39a).
The displacement in the direction is restricted. Therefore, the horizontal restraint link 1 that restrains the displacement of the image-side lens 39a in the horizontal direction (tangential direction) by the second restraint block 134a, the second flexure neck portion 129b, and the third flexure neck portion 129c.
34 is formed.

The restraint direction of the vertical restraint link 133 and the restraint direction of the horizontal restraint link 134 are substantially orthogonal to each other. In other words, the vertical restraint link 13
The rotation axis of No. 3 and the rotation axis of the horizontal restraint link 134 are substantially orthogonal to each other.

The connection block 124a is connected to the flexure support block 124b by the fourth flexure neck portion 129d. That is, the connection block 124a is supported by a pair of link link mechanisms including the vertical restraint link 133 and the horizontal restraint link 134.

Further, as shown in FIGS. 22 to 24, among the flexure neck portions 129a to 129d, the first and fourth flexure neck portions 129a and 129d pass through substantially the center of the connection block 124a and are parallel to the Z axis. It is arranged on a straight line. On the other hand, the second and third flexure necks 1
29b and 129c are arranged on a line substantially parallel to the surface of the connection block 124a. Further, the third flexure neck portion 129c is arranged near the fourth flexure neck portion 129d.

In the flexure body 124, the connecting block 124a is connected to the first and second drive blocks 135a and 136a by the vertical restraint link 133 and the horizontal restraint link 134, in the X, Y and Z directions.
It is supported so as to be rotatable around the direction and to be restrained from being displaced in the Y and Z directions. Further, the connection block 124a is supported by the fourth flexure neck portion 129d so as to be displaceable in the X direction.

By the way, the first drive block 135a is
The first constraining block 1 by the first flexure neck portion 129a.
33a, and the flexure fixing portion 131 by the first thin portion 130a. The elongated vertical drive lever 125a is integrally formed on the outer end of the first drive block 135a so as to extend along the tangential direction of the image-side lens 39a. The first drive block 135a applies a driving force applied to the vertical drive lever 125a in a direction (vertical direction) parallel to the optical axis of the image side lens 39a, and the connection block 124a.
It is converted into a vertical driving force that is the first direction and is transmitted to the first flexure neck portion 129a on the side. This conversion of the driving force is brought about by the action of the first thin portion 130a forming the cutout spring. Therefore, the first drive block 13
5a, the first flexure neck portion 129a and the first thin portion 13
0a transmits the vertical driving force applied to the vertical driving lever 125a to the vertical restraint link 133 as the vertical driving force.
5 is formed.

On the other hand, the second drive block 136a has a second
The second restraint block 134 by the flexure neck portion 129b.
It is connected to a and is connected to the flexure fixing portion 131 by the second thin portion 130b. The elongated horizontal drive lever 125b is integrally formed at the outer end of the second drive block 136a so as to extend along the tangential direction of the image surface side lens 39a. This second
The drive block 136a includes the horizontal drive lever 12
5b is applied to the second flexure neck 129b on the side of the connection block 124a to apply the driving force applied in the direction (vertical direction) parallel to the optical axis of the image-side lens 39a to the image-side lens 39a.
It is converted into a driving force in the tangential direction (horizontal direction) forming the second direction of a and transmitted. This conversion of the driving force is brought about by the action of the second thin portion 130b forming the cutout spring.
Therefore, the vertical drive force applied to the horizontal drive lever 125b is transmitted to the horizontal restraint link 134 as a horizontal drive force by the second drive block 136a, the second flexure neck 129b and the second thin portion 130b. A horizontal drive link 136 is formed.

Here, the first flexure neck portion 129a.
Are arranged on a straight line passing through the center of the first thin portion 130a and extending along the tangential direction of the image side lens 39a.
On the other hand, the second flexure neck portion 129b is arranged on a straight line passing through the center of the second thin portion 130b and extending along the optical axis direction of the image side lens 39a.

As shown in FIGS. 19 to 21 and FIG.
Both the drive levers 125a, 12 in the frame body 80
An adjustment washer 139 as a position adjusting member and an adjustment button 140 also as a position adjusting member are provided on the upper surface of the tip of the tip 5b as replacement members (for example, bolts, plugs, etc.) 14
1 (see FIG. 23), it is exchangeably fixed. The adjustment washers 139 have a thickness of, for example, every 1 μm, and the adjustment buttons 140 have a thickness of, for example, every 10 μm, and a plurality of them are prepared in advance. That is, the adjustment washer 139 is used for fine adjustment, and the adjustment button 140 is used for remote adjustment. And these adjustment washers 1
By selectively fitting 39 and adjustment button 140,
The distance between the drive levers 125a and 125b and the frame body 80 is adjusted, whereby the drive levers 125a and 125b are adjusted.
The driving force applied to a and 125b is set.

Moreover, both drive levers 125a, 12
5b is formed to have a predetermined length along the tangential direction of the image side lens 39a. Therefore, the driving force set by the adjustment washer 139 and the adjustment button 140 and applied to both drive levers 125a and 125b is reduced at a rate according to the length thereof and transmitted to the flexure body 124. Has become.

Further, a lift lever 142 is movable up and down in the vicinity of the adjustment washer 139 and the adjustment button 140 and on the upper surface of the frame body 80 on the flexure body 124 side, and can be brought into contact with and separated from the drive levers 125a and 125b. It is provided in. Furthermore, both drive levers 125a, 1
25b has one end near the lift lever 142 and on the side of the flexure main body 124 at one end.
The other end of a return spring 143, which is a tension spring fixed to, is attached. As a result, both drive levers 125
a and 125b are urged toward the frame 80, and when the lift lever 142 is not in contact with the drive levers 12a and 125b.
The tips of 5a and 125b come into contact with the upper surface of the adjustment button 140.

This lift lever 142 is connected to the drive lever 12
By moving the drive levers 125a and 125b in the direction in which the drive levers 125a and 125b are in contact with the 5a and 125b, that is, in the upward direction, the drive levers 125a and 125b are separated from the frame body 80 against the biasing force of the return spring 143. Moving. In this way, the drive levers 125a and 125b are attached to the adjustment button 1
The adjustment button 140 and the adjustment washer 139 are exchanged in a state in which the adjustment button 140 is separated from the adjustment button 140. After the replacement of the adjustment button 140 and the adjustment washer 139 is completed, the lift lever 1
By returning 42 to the original position, each drive lever 12
5a and 125b come into contact with the upper surface of the adjustment button 140 by the urging force of the return spring 143.

As shown in FIGS. 13 and 25, when the frame bodies 80 are stacked on each other, the overlapping surfaces 80a with the other frame bodies 80 are formed on the outer peripheral portions of the upper and lower surfaces of the frame body 80. Has been formed. Then, each of the plurality of fixed optical element holding devices 41 configured as described above sets its phase to 1
The overlapping surface 80 of the frame body 80 while being shifted by 80 °
In a, they are laminated on each other via a spacer for adjusting the distance. In this way, in the state where the plurality of fixed optical element holding devices 41 are superposed and arranged, the lens frame body 82 of the fixed optical element holding device 41 arranged below is fixed to the lens frame body 82 of the fixed optical element holding device 41 arranged above. It is housed in the frame 80. Further, at this time, the flexure member 81 of the fixed optical element holding device 41 on the lower side has the upper frame body 8
It is accommodated in the flexure accommodation recess 121 of 0.

Next, the operation of the flexure body 124 of the fixed optical element holding device 41 will be described in more detail. FIG. 26 shows the three flexure bodies 124.
It is a schematic drawing of a part of one flexure body 124.

Here, the vertical drive lever 125a.
Consider a case in which a predetermined driving force F1 is applied to the tip of the. In FIG. 26, in the first thin portion 130a on the vertical drive lever 125a side, the circular through holes 128b on both sides thereof are formed.
Are arranged to face each other vertically. Therefore, when the tip portion of the vertical drive lever 125a is displaced in the vertical direction by the driving force F1, the first thin portion 130 of the vertical drive lever 125a is displaced.
At a, rotational force M1 is generated with the radial direction of the image-side lens 39a as the axis.

Here, the first flexure neck portion 129a is
It is formed on a straight line L1 passing through the center of the first thin portion 130a and along the tangential direction of the image-side lens 39a. Therefore, the turning force M1 in the first thin portion 130a is converted into a vertical linear drive in the first flexure neck portion 129a via the first drive block 135a. This linear drive connects the connecting block 1 through the first restraining block 133a and the fourth flexure neck 129d.
Image plane side lens 3 in the lens frame 82.
A displacement along the optical axis direction at 9a is realized.

Next, consider a case where a predetermined driving force F2 is applied to the tip of the horizontal drive lever 125b. In the second thin portion 130b on the side of the horizontal drive lever 125b, the circular through holes 128b on both sides of the second thin portion 130b are arranged so as to be horizontally opposed. Therefore, when a predetermined driving force F2 is applied and the tip of the horizontal drive lever 125b is displaced in the vertical direction, the turning force with the radial direction of the image-side lens 39a as the axis is generated in the second thin portion 130b. M2 occurs.

Here, the second flexure neck portion 129b is
It is formed on a straight line L2 passing through the center of the second thin portion 130b and along the optical axis direction of the image-side lens 39a. Therefore, the turning force M2 in the second thin portion 130b is converted into a horizontal linear drive in the second flexure neck portion 129b via the second drive block 136a. This linear drive is the second restraint block 134a,
Third flexure neck 129c and fourth flexure neck 1
It is transmitted to the connection block 124a via 29d, and the displacement in the tangential direction of the image-side lens 39a in the lens frame body 82 is realized.

Furthermore, when predetermined driving forces F1 and F2 are applied to displace the front ends of both drive levers 125a and 125b in the vertical direction, the first restraint block 13 is released.
The driving forces in the two directions are combined via the 3a, the second restraint block 134a, and the third flexure neck portion 129c. That is, when considering a polar coordinate R-θ-Z system in which the optical axis of the image-side lens 39a is the Z axis, the θ coordinate and the Z coordinate of the third flexure neck portion 129c are both drive levers 125.
The position changes according to the movement of a and 125b.

On the other hand, the first restraint block 133a and the second restraint block 134a are restrained along the driving force transmitting direction (without changing their length), and the third restraint block 133a and the third restraint block 134a are restrained.
The flexure neck portion 129c is the first flexure neck portion 1 described above.
A straight line L3 connecting 29a and the second flexure neck 129b
It is possible to make a minute rotation about the center axis. That is, the direction R in polar coordinates (the image plane side lens 39a
Has the degree of freedom of displacement in the radial direction.

Therefore, the third flexure neck portion 129c, which is an immovable point with respect to the lens frame body 82, is constrained in the desired degree of freedom of θ and Z translational movements in polar coordinates, and is free of R translational movements. Have a degree. Further, since the third flexure neck portion 129c is a rotary pivot, R,
It has rotational degrees of freedom around the θ and Z axes.

The above-mentioned movement and restraint state is 3 of the frame body 80.
It occurs independently in each of the flexure bodies 124 installed at various locations. Therefore, the degrees of freedom of the lens frame body 82 are constrained by two at each of the three points (third flexure neck portion 129c) fixed to the lens frame body 82, and the posture of the lens frame body 82 (6 degrees of freedom). Is restrained according to the teaching of mechanics. Moreover, since the posture thereof corresponds to the drive amount of both drive levers 125a and 125b in a ratio of 1: 1, the postures of the lens frame body 82 and the image plane side lens 39a held by the lens frame body 82 can be adjusted by an unreasonable force, It is possible to adjust freely without giving distortion.

As described above, the lens frame body 82 is so-called kinematically supported by the frame body 80 via the flexure members 81. Here, the center of the image surface side lens 39a is the origin, the optical axis direction of the image surface side lens 39a is the Z axis, the radial direction of the image surface side lens 39a is the R axis, and the circumferential direction of the image surface side lens 39a is the θ axis. Polar coordinate system R-
Consider the θ-Z system. According to the link mechanism 144 of the flexure member 81, the lens frame body 82 and the link mechanism 144
The third flexure neck portion 129c forming a connection point with
It is possible to displace in the R, θ, and Z axial directions within a predetermined range. Further, in the frame link mechanisms 144, the height of the third flexure neck portion 129c from the frame 80 is appropriately changed and combined, whereby the lens frame 8 is formed.
2 can be tilted in any direction with respect to the frame 80. As a result, the lens frame 82 is so-called kinematically moved relative to the frame 80, that is, the movement in the directions of the R, θ, and Z axes and the rotation around the R axis, the θ axis, and the Z axis. Retained as possible.

Next, the assembling of the lens barrel 38 will be described. First, a lens 39 that holds a plurality of image-plane-side lens-barrel modules 37a and a plurality of object-plane-side lens-barrel modules 37b in each of the modules 37a and 37b in the present embodiment.
a, 39bm, 39bs are stacked along the optical axis direction.

Then, with respect to each of the modules 37a and 37b, the positions of the modules 37a and 37b are adjusted by relatively adjusting the position in the direction orthogonal to the optical axis direction.
Adjust the position between b. This position adjustment is performed based on the amount of eccentricity when the frame body 80 of the image plane side lens barrel module 37a and the lens barrel body 44 of the object plane side lens barrel module 37b are rotated.

The frame 80 of the image plane side lens barrel module 37a and the lens barrel body 44 of the object plane side lens barrel module 37b.
The positioning of the lenses 39a, 39bm, 39bs with respect to
This is performed by rotating the frame body 80 holding 39 bs and the lens barrel body 44. Here, each lens 39a, 39bm, 39b
s is, when the frame body 80 and the lens barrel body 44 are rotated,
The frame body 80 and the lens barrel body 4 are preliminarily set so that the degree of deflection of the optical axes of the lenses 39a, 39bm, 39bs is reduced.
It is positioned with respect to 4. Further, the respective positions of the modules 37a and 37b described above are adjusted by the lenses 39a and 39b with respect to the frame body 80 and the lens barrel body 44.
It shall be performed after the positioning of m and 39bs is completed.

In this way, each module 37a, 37b
The lens barrel 38 is completed by adjusting the positions between them. The completed lens barrel 38 is placed on the frame 42 and assembled as the exposure device 31. An error may occur in the above-described position adjustment due to an impact when the lens barrel 38 is placed on the frame 42, an impact caused when the lens barrel 38 is transported, or the like. Therefore, with the lens barrel 38 placed on the frame 42 of the exposure apparatus 31, the projection optical system 3
The wavefront aberration of No. 5 is measured by a wavefront aberration measuring device. Then, based on the measurement result, the positions of the drive levers 125a and 125b in the fixed optical element holding device 41 are adjusted so that the aberration amount of the wavefront aberration becomes small, and the image side lens 3
After displacing the position of 9a, the adjustment washer 139 or the adjustment button 140 is replaced if necessary. By exchanging the adjustment washer 139 and the adjustment button 140, the imaging performance of the lens barrel 38 placed on the frame 42, that is, the projection optical system 35 mounted on the exposure device 31 is set to an optimum state. It In this way, the projection optical system 35
After the performance is set to the optimum state, the reference position for the operation of the actuator 50 that drives the movable lens 39bm in the object-side lens barrel module 37b is set.

First, with the actuator 50 in the non-actuated state and the inner ring portion 44a supporting the movable lens 39bm being placed in the original position, the detection head 7 is moved.
At 6, the scale 74a on the scale 74 is read. The detection value of the detection head 76 at this time is set as the origin for measuring the movement amount of the inner ring portion 44a, and the position of the actuator 50 at this time is set as the reference position of the displacement of the actuator 50. Further, when the inner ring portion 44a is moved in the optical axis direction by the actuator 50, the scale 74a on the scale 74 is read by the detection head 76 to move the inner ring portion 44a based on the origin. The quantity is measured.

When the lens barrel 38 is mounted on the frame 42 of the exposure device 31, it is so-called "kinematically" supported by three points. That is, the lower surface of the flange portion 38a (see FIG. 1) of the lens barrel 38 and the frame 42
A kinematic coupling mechanism is installed between the upper surface and the upper surface of the. This kinematic coupling mechanism
A first engaging member attached to one of the flange portion 38a and the frame 42 and having a V groove formed therein, and the flange portion 3
8a and a second engaging member that is attached to the other of the frame 42 and has a convex portion (for example, a ball) that engages with the first engaging member.

Further, the flange portion 38a and the frame 42
A load canceling mechanism (for example, a spring mechanism using a spring as an elastic member) for canceling the load of the lens barrel 38 is attached between the and. Also, instead of the load canceling mechanism, an air pad (washer pad)
May be used.

As described above, by installing the load canceling mechanism and the air pad between the flange portion 38a and the frame 42, the stress generated when the lens barrel 38 is placed on the flange portion 38a is made uniform. Can be planned
It is possible to prevent uneven stress from being applied to the lens barrel 38.

Therefore, according to this embodiment, the following effects can be obtained. (A) In the exposure apparatus 31, first, the image-side lens 39
The position of a is adjusted to a predetermined position by the fixed optical element holding device 41. Then, in this state, the origin of the measurement of the sensor 72 that detects the drive amount of the actuator 50 is set, so that the actuator 5 that drives the movable lens 39bm.
A reference position for displacement at 0 is set. Therefore, the displacement reference position of the actuator 50 is set in a state where the optical axis of the image-side lens 39a is adjusted, that is, after the projection optical system 35 is adjusted to a predetermined state. As a result, the reference position of the actuator 50 can be set more accurately,
It is possible to reduce an error when correcting the image forming characteristic of the projection optical system 35.

(B) In the exposure device 31, the position of the movable lens 39bm arranged on the object plane side of the projection optical system 35 is adjusted by the movable optical element holding device 40, and the image plane arranged on the image plane side is adjusted. The position of the side lens 39a is adjusted by the fixed optical element holding device 41. Therefore, each of the image-side lenses 39 arranged on the image surface side
By positioning the optical axis a by the fixed optical element holding device 41 with the fixed optical element holding device 41, the imaging characteristics of the entire projection optical system 35 can be adjusted easily and more accurately. Then, by the movable optical element holding device 40,
By adjusting the position of the movable lens 39bm arranged on the object plane side, it is possible to easily and more accurately correct the variation in the imaging characteristics of the projection optical system 35 in the operating state.

(C) In this exposure apparatus 31, the position of each lens 39a, 39bm of the projection optical system 35 for projecting the image of the predetermined pattern formed on the reticle R onto the wafer W is fixed to the fixed optical element holding device 41. Alternatively, the movable optical element holding device 40 is used for adjustment. Therefore, the image forming characteristic of the projection optical system 35 can be corrected more accurately, and the image of the pattern on the reticle R can be more accurately projected onto the wafer W. Then, the exposure accuracy in the exposure device 31 can be improved.

(Modification) The embodiment of the present invention may be modified as follows. -In the said embodiment, the movable optical element holding | maintenance apparatus 40 is arrange | positioned rather than the flange part 38a at the image surface side, and the flange part 38a
Although the configuration in which the fixed optical element holding device 41 is arranged closer to the object surface side has been described, the present invention is not limited to this configuration. For example, the movable optical element holding device 40 and the fixed optical element holding device 41 may be arranged in combination on the image plane side and the object plane side of the flange portion 38a. Further, the movable optical element holding device 40 may be arranged on the object surface side of the flange portion 38a, and the movable optical element holding device 40 may be arranged on the object surface side of the flange portion 38a.

In the above embodiment, each image side lens 3
The position of 9a is adjusted to a predetermined position by the fixed optical element holding device 41. Then, in this state, the actuator 50
By setting the origin of measurement of the sensor 72 that detects the driving amount of, the reference position of the displacement of the actuator 50 that drives the movable lens 39bm is set. On the other hand, a plurality of tension springs 69 having different spring constants are prepared in advance. Then, each image side lens 39
After adjusting the position of "a" to a predetermined set position, a tension spring 69 that has a predetermined length in a non-actuated state of the actuator 50 is selected and mounted between the inner ring portion 44a and the outer ring portion 44b. You may make it set the reference position of the displacement in the actuator 50.

In the above-described embodiment, the fixed optical element holding device eliminates an error in position adjustment caused by an impact when the lens barrel 38 is placed on the frame 42, an impact caused when the lens barrel 38 is transported, and the like. Drive lever 125a at 41,
The position of 125b is adjusted and the position of the image side lens 39a is displaced and adjusted. Then, after the performance of the projection optical system 35 is set to the optimum state, the reference position for the operation of the actuator 50 that drives the movable lens 39bm in the object plane side lens barrel module 37b is set.

On the other hand, for example, by the following method,
The error may be corrected. That is, the drive levers 125 a, 1 in the fixed optical element holding device 41
The position of 25b is adjusted to displace the position of the image-side lens 39a, and the actuator 50 is driven to displace the position of the movable lens 39bm. Then, after the performance of the projection optical system 35 is set to the optimum state, the reference position for the operation of the actuator 50 may be set.

In the above embodiment, the lenses 39a, 39bm and 39bs are illustrated as the optical elements, but the optical elements may be other optical elements such as a parallel plate, a mirror and a half mirror.

The movable optical element holding device 40 of the present invention
Further, the fixed optical element holding device 41 is not limited to the holding structure of the horizontal type lenses 39a, 39bm, 39bs in the projection optical system 35 of the exposure apparatus 31 of the above-described embodiment. For example, the illumination optical system 33 of the exposure device 31
It may be embodied in the holding structure of the optical element and the holding structure of the vertical type optical element. Further, it may be embodied as a holding structure of an optical element in another optical machine, for example, an optical system such as a microscope or an interferometer.

Even in the above-described case, the same effect as that of the above-described embodiment can be obtained. Further, as an exposure apparatus, a contact exposure apparatus that exposes the mask pattern by bringing the mask and the substrate into close contact with each other without using a projection optical system, and a proximity exposure that exposes the mask pattern by bringing the mask and the substrate into close proximity It can also be applied to the optical system of the device. Further, the projection optical system is not limited to the total refraction type, but may be a catadioptric type.

Further, the exposure apparatus of the present invention is not limited to the reduction exposure type exposure apparatus, and may be, for example, a 1 × exposure type or an enlargement exposure type exposure apparatus. Also, not only devices such as semiconductor elements, but also optical exposure equipment, EUV
The present invention is also applied to an exposure apparatus that transfers a circuit pattern from a mother reticle to a glass substrate, a silicon wafer, or the like in order to manufacture a reticle or mask used in an exposure apparatus, an X-ray exposure apparatus, an electron beam exposure apparatus, or the like. it can.
Here, a transmissive reticle is generally used in an exposure apparatus that uses DUV (deep ultraviolet) light, VUV (vacuum ultraviolet) light, and the like, and a reticle substrate is made of quartz glass, fluorine-doped quartz glass, fluorite, fluorite, or the like. Magnesium or crystal is used. Further, in a proximity type X-ray exposure apparatus, an electron beam exposure apparatus, etc., a transmissive mask (stencil mask, memberlen mask) is used,
A silicon wafer or the like is used as the mask substrate.

Of course, the present invention can be applied not only to the exposure apparatus used to manufacture semiconductor elements, but also to the exposure apparatus used to manufacture displays including liquid crystal display elements (LCD) etc. to transfer a device pattern onto a glass plate. Can be applied. The present invention can also be applied to an exposure apparatus used for manufacturing a thin film magnetic head or the like to transfer a device pattern onto a ceramic wafer or the like, and an exposure apparatus used for manufacturing an image sensor such as a CCD.

Furthermore, the present invention can be applied to a scanning stepper that transfers a pattern of a mask to a substrate in a state where the mask and the substrate are relatively moved and sequentially moves the substrate in steps. The present invention can also be applied to a step-and-repeat stepper that transfers a mask pattern onto a substrate while the mask and the substrate are stationary and sequentially moves the substrate.

As the light source of the exposure apparatus, for example, g-line (436 nm), i-line (365 nm), KrF excimer laser (248 nm), F2 laser (157n)
m), Kr2 laser (146 nm), Ar2 laser (1
26 nm) or the like may be used. Further, a single-wavelength laser light in the infrared range or visible range emitted from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium) to obtain a nonlinear optical crystal. It is also possible to use a harmonic wave whose wavelength is converted to ultraviolet light.

The exposure apparatus 31 of the above embodiment is manufactured, for example, as follows. That is, first, the plurality of lenses 39 that form the illumination optical system 33 and the projection optical system 35.
a, 39bm, 39bs or at least a part of the optical element such as a mirror is held by the fixed optical element holding device 41 or the movable optical element holding device 40 of the above-described embodiment or each of the modified embodiments. The illumination optical system 33 and the projection optical system 35 are incorporated in the main body of the exposure device 31 to perform optical adjustment. Next, the wafer stage 36 (including the reticle stage 34 in the case of a scan type exposure apparatus) including a large number of mechanical parts is attached to the main body of the exposure apparatus 31 and the wiring is connected. Then, after connecting a gas supply pipe for supplying gas into the optical path of the exposure light EL, further comprehensive adjustment (electrical adjustment, operation confirmation, etc.) is performed.

Here, each component constituting the movable optical element holding device 40 or the fixed optical element holding device 41 is assembled after removing processing oil and impurities such as metal substances by ultrasonic cleaning or the like. The exposure apparatus 31 is preferably manufactured in a clean room where the temperature, humidity and atmospheric pressure are controlled and the cleanliness is adjusted.

As the glass material in the above embodiment, fluorite,
Although explained using quartz as an example, from crystals such as lithium fluoride, magnesium fluoride, strontium fluoride, lithium-calcium-aluminum-fluoride, and lithium-strontium-aluminum-fluoride, and zirconium-barium-lanthanum-aluminum. Fluorine glass, quartz glass doped with fluorine, quartz glass doped with hydrogen in addition to fluorine, O
The fixed optical element holding device 41 and the movable optical element holding device 40 of the above-described embodiment are also applied when using modified quartz such as quartz glass containing an H group and quartz glass containing an OH group in addition to fluorine. can do.

Next, an embodiment of a device manufacturing method using the above-described exposure apparatus 31 in a lithography process will be described. FIG. 27 is a diagram showing a flowchart of a manufacturing example of a device (semiconductor element such as IC or LSI, liquid crystal display element, image pickup element (CCD or the like), thin film magnetic head, micromachine or the like). As shown in FIG. 27, first, in step S151 (design step), function / performance design of a device (microdevice) (for example, circuit design of semiconductor device) is performed, and pattern design for realizing the function is performed. To do. Continuing, step S152
In (mask manufacturing step), a mask (Rectile R or the like) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S153 (substrate manufacturing step),
A substrate (wafer W when a silicon material is used) is manufactured using a material such as silicon or a glass plate.

Next, in step S154 (substrate processing step), using the mask and the substrate prepared in steps S151 to S153, as will be described later, an actual circuit or the like is formed on the substrate by a lithography technique or the like. Next, in step S155 (device assembly step), device assembly is performed using the substrate processed in step S154. This step S155 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation, etc.) as necessary.

Finally, in step S156 (inspection step), inspections such as an operation confirmation test and a durability test of the device manufactured in step S155 are performed. After these steps, the device is completed and shipped.

FIG. 28 is a diagram showing an example of a detailed flow of step S154 of FIG. 27 in the case of a semiconductor device. In FIG. 28, in step S161 (oxidation step), the surface of the wafer W is oxidized. In step S162 (CVD step), an insulating film is formed on the surface of the wafer W. In step S163 (electrode forming step), electrodes are formed on the wafer W by vapor deposition.
In step S164 (ion implantation step), ions are implanted in the wafer W. Steps S161 to S above
Each of 164 constitutes a pretreatment process of each stage of wafer processing, and is selected and executed in accordance with a required process in each stage.

At each stage of the wafer process, after the above-mentioned pretreatment process is completed, the posttreatment process is executed as follows. In this post-processing step, first, step S
At 165 (resist forming step), a photosensitive agent is applied to the wafer W. Subsequently, in step S166 (exposure step), the circuit pattern of the mask (reticle R) is transferred onto the wafer W by the lithography system (exposure device 31) described above. Next, step S
In step 168 (developing step), the exposed wafer W is developed, and in step S168 (etching step), the exposed member other than the part where the resist remains is removed by etching. Then, step S16
In 9 (resist removing step), the resist that has become unnecessary after etching is removed.

By repeating these pre-processing step and post-processing step, multiple circuit patterns are formed on the wafer W. When the device manufacturing method of the present embodiment described above is used, the exposure apparatus 31 is used in the exposure step (step S166), the resolution can be improved by the exposure light EL in the vacuum ultraviolet region, and the exposure amount can be controlled. It can be performed with high precision. Therefore, as a result, a highly integrated device having a minimum line width of about 0.1 μm can be produced with high yield.

[0155]

As described above in detail, according to the invention described in claim 1 of the present application, the optical element can be mounted in a state in which the optical axis of the optical element is positioned more strictly, and the temperature of the optical element can be increased, for example. It is possible to correct the fluctuation of the image formation characteristic due to the change of the state in the movable state of the exposure apparatus.

According to the second aspect of the present invention, in addition to the effect of the first aspect of the invention, at least some of the optical elements can be positioned easily and more accurately by operating the operating portion. Can be done.

According to the invention of claim 3 of the present application, in addition to the operation of the invention of claim 1 or 2, at least a part of the optical elements is provided with an optical element different from the exposure apparatus. The position can be adjusted by displacing the drive member in the operating state of.

Further, according to the inventions of claims 4, 6, and 7, in addition to the effect of the invention of claim 3, the positioning of the optical element can be performed more accurately. Therefore, it is possible to reduce an error when correcting the image forming characteristic of the optical system.

According to the invention described in claim 5 of the present application, in addition to the effect of the invention described in any one of claims 1 to 4, at least one arranged on the image plane side is provided. By performing the positioning of the optical element of the part by the first position adjusting mechanism, it is possible to easily and more accurately adjust the imaging characteristics of the entire optical system. Then, the second position adjusting mechanism adjusts the positions of the optical elements different from the at least a part of the optical elements arranged on the object plane side, thereby changing the image forming characteristics of the optical system in the operating state. It can be corrected easily and more accurately.

According to the invention described in claim 8 of the present application, in the lens barrel housing the optical system composed of a plurality of optical elements, the invention according to any one of claims 1 to 5 It is possible to achieve almost the same effect.

According to the invention described in claim 9 of the present application, in addition to the effect of the invention described in claim 8, the image of the pattern on the mask can be more accurately projected onto the substrate. .

According to the invention of claim 10 of the present application, in addition to the effect of the invention of claim 8 or 9, the imaging performance of the projection optical system is improved, and the exposure accuracy is improved. It is possible to improve.

According to the eleventh aspect of the present invention, highly integrated devices can be manufactured with high yield.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing an embodiment of an exposure apparatus of the present invention.

FIG. 2 is a partially cutaway perspective view of the object side lens barrel module of FIG.

FIG. 3 is a plan view of the object plane side lens barrel module of FIG.

4 is a sectional view taken along line 4-4 of FIG.

5 is a side view of an enlarged main part around an actuator of the object-side lens barrel module of FIG.

6 is a partial cross-sectional view taken along line 6-6 of FIG.

7 is a side view of an enlarged main part around a sensor of the object-side lens barrel module of FIG.

8 is a partial cross-sectional view taken along line 8-8 of FIG.

9 is a perspective view showing a lens barrel body of the object-side lens barrel module of FIG.

10 is an enlarged perspective view of a main part of the lens barrel body of FIG.

FIG. 11 is a side view of a main part of the actuator, the displacement magnifying mechanism, and the guide mechanism in the object-side lens barrel module shown in FIG.

FIG. 12 is an explanatory diagram explaining an operation of the configuration of FIG. 11.

13 is a perspective view showing the image side lens barrel module of FIG. 1. FIG.

14 is a plan view of the image side lens barrel module of FIG. 13. FIG.

FIG. 15 is a side view of the image side lens barrel module of FIG.

16 is a sectional view taken along line 16-16 of FIG.

FIG. 17 is a partially enlarged perspective view showing the lens frame body of FIG.

FIG. 18 is a partially enlarged exploded perspective view showing the support member of FIG.

FIG. 19 is a perspective view showing the frame body of FIG.

20 is a partially enlarged plan view showing the peripheral configuration of the flexure body shown in FIG.

21 is a partially enlarged side view showing the peripheral configuration of the flexure body shown in FIG.

22 is a partially enlarged side view mainly showing the flexure body of FIG. 21. FIG.

23 is a sectional view taken along line 23-23 of FIG.

24 is a sectional view taken along line 24-24 of FIG.

FIG. 25 is a perspective view showing the image-side lens barrel module of FIG. 13 in a stacked state.

FIG. 26 is an explanatory view schematically showing the fixed optical element holding device of FIG.

FIG. 27 is a flowchart of a device manufacturing example.

28 is a detailed flowchart of the substrate processing of FIG. 27 in the case of a semiconductor device.

[Explanation of symbols]

31 ... Exposure device, 35 ... Projection optical system, 37a ... Image plane side barrel module, 37b ... Object plane side barrel module, 38
... Lens barrel, 38a ... Flange portion, 39a ... Image surface side lens as at least a part of optical element, 39af ... Flange portion as a peripheral edge portion, 39bm ... Movable lens as an optical element different from at least a part of optical element , 39bs ...
A stationary lens as an optical element different from at least some of the optical elements, 40 ... A movable optical element holding device forming a second position adjusting mechanism, 41 ... A fixed optical element holding device forming a first position adjusting mechanism, 42 ... As a mount , 44a ... Inner ring portion, 44b ... Outer ring portion, 50 ... Actuator forming drive member, 60 ... Displacement magnifying mechanism forming link mechanism, 72 ... Sensor forming reference position adjusting mechanism, 81
... flexure member, 82 ... lens frame body that forms a holding portion, 1
25a ... Vertical drive lever as operation part, 125b
... a horizontal drive lever as an operation unit, R ... a reticle as a mask, W ... a wafer as a substrate.

─────────────────────────────────────────────────── ─── Continued Front Page (51) Int.Cl. ⁷ Identification Code FI Theme Coat (Reference) H01L 21/027 H01L 21/30 515D

Claims (11)

[Claims] 1. A holding device for an optical system, which holds an optical system comprising a plurality of optical elements, comprising: a first position adjusting mechanism for adjusting the positions of at least some of the optical elements of the plurality of optical elements; A second position adjusting mechanism having a mechanism different from the position adjusting mechanism and adjusting a position of an optical element different from at least a part of the optical elements among the plurality of optical elements. Optical system holding device. 2. The first position adjusting mechanism includes a holder that holds a peripheral edge of the optical element, a plurality of flexure members that supports the holder, and at least one flexure member of the plurality of flexure members. Two operating parts connected to a member, the optical element moves the optical element in the first direction via the plurality of flexure members by operating one of the operating parts, and the other of the optical elements is moved. The optical system holding device according to claim 1, wherein the optical element is moved in a second direction different from the first direction via the plurality of flexure members by an operation of an operation unit. 3. The second position adjusting mechanism is provided in an inner ring portion that holds a peripheral edge portion of the optical element, an outer ring portion that is integrally formed with the inner ring portion, and the outer ring portion. The optical system holding device according to claim 1 or 2, further comprising: a drive member that is displaced in a predetermined direction, and a link mechanism that transmits a displacement amount of the drive member to the inner ring portion. 4. A reference position adjusting mechanism for setting a reference position for displacement in the second position adjusting mechanism in a state where the positions of the at least some of the optical elements are adjusted to predetermined positions by the first position adjusting mechanism. The holding device for an optical system according to claim 3, wherein 5. The optical system includes a flange portion for being supported on a frame on which the optical system is mounted, and at least a part of the optical elements is an image of the optical system with respect to the flange portion. An optical element arranged on the surface side and different from the at least a part of the optical elements is arranged on the object surface side of the optical system with respect to the flange portion.
The optical system holding device according to claim 4. 6. An optical element position adjusting method for adjusting the positions of a plurality of optical elements constituting an optical system, wherein the positions of the plurality of optical elements are arranged along the optical axis direction of each other, and the plurality of optical elements are arranged. After arranging the elements, the positions of at least some of the plurality of optical elements are changed to the first position.
Displacement reference in the drive member of the second position adjusting mechanism, which is adjusted by the position adjusting mechanism to adjust the positions of the at least some optical elements and then adjusts the positions of the optical elements different from the at least some optical elements. A method for adjusting a position of an optical element, which comprises setting a position. 7. The optical device according to claim 6, wherein the reference position is set after the position of an optical element different from the at least a part of the optical elements is adjusted by the second position adjusting mechanism. Element position adjustment method. 8. A lens barrel that accommodates an optical system including a plurality of optical elements, wherein the optical system holding device according to any one of claims 1 to 5 is provided for each optical element of the optical system. A lens barrel characterized by being held through. 9. The lens barrel according to claim 8, wherein the optical system is a projection optical system that projects an image of a predetermined pattern formed on a mask onto a substrate. 10. An exposure apparatus for exposing an image of a predetermined pattern formed on a mask onto a substrate, comprising the lens barrel according to claim 8 or 9. 11. A method of manufacturing a device, which comprises a lithography step, wherein exposure is performed by using the exposure apparatus according to claim 10 in the lithography step.