JP2011097107A5 - - Google Patents

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Publication number
JP2011097107A5
JP2011097107A5 JP2011026014A JP2011026014A JP2011097107A5 JP 2011097107 A5 JP2011097107 A5 JP 2011097107A5 JP 2011026014 A JP2011026014 A JP 2011026014A JP 2011026014 A JP2011026014 A JP 2011026014A JP 2011097107 A5 JP2011097107 A5 JP 2011097107A5
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JP
Japan
Prior art keywords
outlets
outlet
substrate
liquid
confinement system
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JP2011026014A
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English (en)
Japanese (ja)
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JP5346046B2 (ja
JP2011097107A (ja
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Publication of JP2011097107A5 publication Critical patent/JP2011097107A5/ja
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JP2011026014A 2006-12-07 2011-02-09 リソグラフィ投影装置 Active JP5346046B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63507906A 2006-12-07 2006-12-07
US11/635,079 2006-12-07

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2007309567A Division JP4902505B2 (ja) 2006-12-07 2007-11-30 リソグラフィ装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2011097107A JP2011097107A (ja) 2011-05-12
JP2011097107A5 true JP2011097107A5 (https=) 2012-02-09
JP5346046B2 JP5346046B2 (ja) 2013-11-20

Family

ID=39607423

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007309567A Active JP4902505B2 (ja) 2006-12-07 2007-11-30 リソグラフィ装置およびデバイス製造方法
JP2011026014A Active JP5346046B2 (ja) 2006-12-07 2011-02-09 リソグラフィ投影装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2007309567A Active JP4902505B2 (ja) 2006-12-07 2007-11-30 リソグラフィ装置およびデバイス製造方法

Country Status (1)

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JP (2) JP4902505B2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036253A1 (nl) 2007-12-10 2009-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP4922359B2 (ja) 2008-07-25 2012-04-25 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造、リソグラフィ装置及びデバイス製造方法
NL2003333A (en) * 2008-10-23 2010-04-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP2010205914A (ja) * 2009-03-03 2010-09-16 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
EP2256553B1 (en) * 2009-05-26 2016-05-25 ASML Netherlands B.V. Fluid handling structure and lithographic apparatus
JP5016705B2 (ja) 2009-06-09 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造
NL2005089A (nl) * 2009-09-23 2011-03-28 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005655A (en) * 2009-12-09 2011-06-14 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006389A (en) * 2010-04-15 2011-10-18 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and a device manufacturing method.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
US20120162619A1 (en) * 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
JP5241862B2 (ja) 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
NL2008979A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009139A (en) * 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009271A (en) * 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
JP6606618B2 (ja) * 2016-01-13 2019-11-13 エーエスエムエル ネザーランズ ビー．ブイ． 流体ハンドリング構造及びリソグラフィ装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3186100B2 (ja) * 1991-07-12 2001-07-11 ミノルタ株式会社 画像読取り装置
KR100585476B1 (ko) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
EP1679738A4 (en) * 2003-10-28 2008-08-06 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JP4954444B2 (ja) * 2003-12-26 2012-06-13 株式会社ニコン 流路形成部材、露光装置及びデバイス製造方法
JP4797984B2 (ja) * 2004-02-19 2011-10-19 株式会社ニコン 露光装置及びデバイス製造方法
JP4479269B2 (ja) * 2004-02-20 2010-06-09 株式会社ニコン 露光装置及びデバイス製造方法
WO2006064851A1 (ja) * 2004-12-15 2006-06-22 Nikon Corporation 基板保持装置、露光装置、及びデバイス製造方法
JP2006173295A (ja) * 2004-12-15 2006-06-29 Jsr Corp 液浸型露光装置及び液浸型露光方法
WO2006101024A1 (ja) * 2005-03-18 2006-09-28 Nikon Corporation 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法

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