JP2011096709A - Substrate carrier in vacuum processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate carrier in a vacuum processing apparatus for carrying a long sheet-like substrate S through a vacuum processing chamber 2 and carrying out predetermined processing on the sheet-like substrate S, wherein the substrate carrier can carry the sheet-like substrate S without housing a delivery roller and winding roller in an upstream side auxiliary vacuum chamber 3<SB>1</SB>and a downstream side auxiliary vacuum chamber 3<SB>2</SB>respectively linked to an upstream side and a downstream side of the vacuum processing chamber 2 and without releasing the vacuum processing chamber 2 in an atmosphere. <P>SOLUTION: Partition valves 4 which close to sandwich the sheet-like substrate S are arranged respectively on an inlet part of the upstream side auxiliary vacuum chamber 3<SB>1</SB>, an outlet part of the downstream side auxiliary vacuum chamber 3<SB>2</SB>, and an inlet part and outlet part of the vacuum processing chamber. Substrate drawing mechanisms 5<SB>1</SB>, 5<SB>2</SB>draw the sheet-like substrate S of a predetermined length into the upstream side auxiliary vacuum chamber 3<SB>1</SB>and the downstream side auxiliary vacuum chamber 3<SB>2</SB>, and hold the drawn sheet-like substrate so as to freely draw the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a substrate transport apparatus in a vacuum processing apparatus that transports a long sheet-shaped substrate through a vacuum processing chamber and performs a predetermined process on the sheet-shaped substrate in the vacuum processing chamber.

Conventionally, as this type of vacuum processing apparatus, an auxiliary vacuum chamber is connected to the upstream side and the downstream side of the vacuum processing chamber, respectively, and a feeding roller around which a sheet-like substrate is wound is stored in the upstream side auxiliary vacuum chamber. It is known that a take-up roller is housed in a downstream auxiliary vacuum chamber, and a sheet-like substrate fed from the feed roller is wound by the take-up roller through the vacuum processing chamber (see, for example, Patent Document 1). .

  In the above conventional example, it is necessary to replace the feeding roller and the winding roller every time the feeding roller becomes empty. In this replacement operation, it is necessary to wind the leading end of the sheet-like substrate drawn out from the new feeding roller around the new winding roller via the vacuum processing chamber, which takes time. Since the size of the auxiliary vacuum chamber is limited, the length of the sheet-like substrate that can be wound around the feeding roller is also limited, so that the feeding roller and the winding roller must be frequently replaced. As a result, the time required for the replacement work increases, making it difficult to improve productivity.

  In addition, a gate valve that closes the sheet-like substrate between the inlet portion and the outlet portion of the vacuum processing chamber is disposed, and the upstream side auxiliary vacuum chamber and the downstream side auxiliary vacuum chamber are omitted, and the upstream side and the downstream side are omitted. A feeding roller and a winding roller are arranged in the atmospheric pressure space, and the sheet-like substrate is conveyed from the feeding roller to the winding roller for a predetermined length with the inlet and outlet gate valves opened. It is also conceivable to close the gate valve and perform processing in the vacuum processing chamber.

  However, in this method, since the vacuum processing chamber is released to the atmosphere when the substrate is transported, it takes time to depressurize the vacuum processing chamber to the required degree of vacuum after the gate valve is closed, and productivity cannot be improved. . Further, even if the gate valve is closed, there is a slight gap between the side edge of the sheet-like substrate and the gate valve, so that there is a problem that the vacuum processing chamber cannot be depressurized to a required degree of vacuum.

JP 2008-57020 A

  In view of the above, the present invention provides a vacuum processing apparatus in which a sheet-like substrate can be conveyed without accommodating a feeding roller and a winding roller in an auxiliary vacuum chamber and without releasing the vacuum processing chamber to the atmosphere. An object of the present invention is to provide a substrate transfer device.

  In order to solve the above problems, the present invention is a substrate transfer apparatus in a vacuum processing apparatus that transfers a long sheet-shaped substrate through a vacuum processing chamber and performs a predetermined process on the sheet-shaped substrate in the vacuum processing chamber. An upstream auxiliary vacuum chamber connected to the upstream side of the vacuum processing chamber; a downstream auxiliary vacuum chamber connected to the downstream side of the vacuum processing chamber; an inlet of the upstream auxiliary vacuum chamber; and the downstream A gate valve that is disposed at the outlet portion of the side auxiliary vacuum chamber and at the inlet portion and outlet portion of the vacuum processing chamber and closes so as to sandwich the sheet-like substrate, and the sheet-like substrate of a predetermined length is drawn in, and the sheet drawn in A substrate pull-in mechanism for detachably holding the substrate, and the substrate pull-in mechanism is disposed in each of the upstream auxiliary vacuum chamber and the downstream auxiliary vacuum chamber, and the inlet of the upstream auxiliary vacuum chamber Gate valve In the opened state, the substrate drawing mechanism disposed in the upstream side auxiliary vacuum chamber draws the sheet-like substrate into the upstream side auxiliary vacuum chamber from the upstream atmospheric pressure space, and the downstream side auxiliary vacuum chamber The sheet-like substrate is drawn out to the atmospheric pressure space on the downstream side of the downstream side auxiliary vacuum chamber from the substrate drawing mechanism arranged in the downstream side auxiliary vacuum chamber in a state where the gate valve of the outlet portion is opened. And

  According to the present invention, after the sheet-like substrate is drawn into the upstream auxiliary vacuum chamber from the upstream atmospheric pressure space by the substrate drawing mechanism disposed in the upstream auxiliary vacuum chamber, the inlet portion and the outlet portion of the vacuum processing chamber. With the gate valve opened, the substrate pulling mechanism disposed in the downstream auxiliary vacuum chamber causes the sheet-like substrate to be drawn from the substrate pulling mechanism disposed in the upstream auxiliary vacuum chamber to the vacuum processing chamber. The sheet-like substrate can be drawn into the downstream auxiliary vacuum chamber, that is, the sheet-like substrate can be transferred from the upstream auxiliary vacuum chamber to the downstream auxiliary vacuum chamber via the vacuum processing chamber. At this time, it is possible to prevent the vacuum processing chamber from being released into the atmosphere by closing the partition valve at the inlet of the upstream auxiliary vacuum chamber in advance and reducing the pressure in the upstream auxiliary vacuum chamber. Further, when the sheet-like substrate is drawn out to the atmospheric pressure space on the downstream side of the downstream auxiliary vacuum chamber with the partition valve at the outlet portion of the downstream auxiliary vacuum chamber opened, the partition of the outlet portion of the vacuum processing layer is previously provided. By closing the valve, the vacuum processing layer can be prevented from being released to the atmosphere.

  As described above, according to the present invention, since the sheet-like substrate can be transferred without releasing the vacuum processing chamber to the atmosphere, the vacuum processing chamber is decompressed to a required vacuum degree in a short time after the substrate transfer, and processed into a sheet-like substrate. The productivity can be improved. Further, unlike the case where the feeding roller and the winding roller are accommodated in the auxiliary vacuum chambers on the upstream side and the downstream side, frequent replacement work of these rollers becomes unnecessary. Furthermore, the sheet-like substrate is conveyed from the previous process to the vacuum processing apparatus as it is without being rolled up, or the sheet-shaped substrate is conveyed from the vacuum processing apparatus to the subsequent process as it is without being rolled up. It is possible to improve productivity significantly.

  In the present invention, it is desirable to dispose a substrate pull-in mechanism on the inlet side and the outlet side in the vacuum processing chamber, respectively. According to this, in the state where the gate valve of the inlet portion of the vacuum processing chamber is opened, the substrate pulling mechanism on the inlet portion side causes the vacuum processing chamber from the substrate pulling mechanism in which the sheet-like substrate is disposed in the upstream auxiliary vacuum chamber. Then, the gate valve of the inlet portion is closed, and the sheet processing substrate is transported in the vacuum processing chamber by the substrate pulling mechanism on the outlet portion side while the vacuum processing chamber is depressurized to a required degree of vacuum. The substrate can be continuously processed, and the productivity can be further improved.

  Even if the gate valve is closed, a slight gap is formed between the side edge of the sheet-like substrate and the gate valve, so that the vacuum processing chamber is located upstream of the atmospheric pressure space upstream of the vacuum processing apparatus. The gate valve of the inlet of the auxiliary vacuum chamber on the side and the gate valve of the inlet of the vacuum processing chamber are doubly sealed, and the vacuum processing chamber is connected to the atmospheric pressure space on the downstream side of the outlet of the downstream auxiliary vacuum chamber. Even if double sealing is performed between the gate valve and the gate valve at the outlet of the vacuum processing chamber, it is difficult to depressurize the vacuum processing chamber beyond a predetermined degree of vacuum.

  Here, at least one upstream buffer chamber is interposed between the upstream auxiliary vacuum chamber and the vacuum processing chamber, and at least one downstream buffer chamber is provided between the downstream auxiliary vacuum chamber and the vacuum processing chamber. If a partition valve is disposed between the inlet portion of the upstream buffer chamber and the outlet portion of the downstream buffer chamber and is closed so as to sandwich the sheet-like substrate, the vacuum processing chamber is at least relative to the atmospheric pressure space. Triple sealing is possible, and it is possible to cope with a case where the required vacuum degree of the vacuum processing chamber is high.

  When a plurality of vacuum processing chambers are provided, an intermediate auxiliary vacuum chamber in which the substrate drawing mechanism is disposed may be interposed between the vacuum processing chambers.

  Various substrate pull-in mechanisms are conceivable, including a pair of guide rollers disposed at intervals in the sheet-substrate conveyance direction, and a sheet-substrate conveyance direction disposed between the two guide rollers. If the substrate pull-in mechanism is constituted by a movable roller that is movable in the orthogonal direction, it is advantageous because the structure is simple and the operation is reliable.

1 is a schematic cross-sectional view showing a substrate transfer apparatus according to a first embodiment of the present invention. The expanded sectional view of the part of the gate valve of the board | substrate conveyance apparatus of FIG. Explanatory drawing which shows operation | movement of the board | substrate conveyance apparatus of 1st Embodiment. A typical sectional view showing a substrate transfer device of a 2nd embodiment. Explanatory drawing which shows operation | movement of the board | substrate conveyance apparatus of 2nd Embodiment. A typical sectional view showing a substrate transfer device of a 3rd embodiment. Typical sectional drawing which shows the board | substrate conveyance apparatus of 4th Embodiment.

  Referring to FIG. 1, reference numeral 1 denotes a vacuum processing apparatus that performs a film forming process on a long sheet-like substrate S. The vacuum processing apparatus 1 includes a vacuum processing chamber 2 that is evacuated by a vacuum pump (not shown). In the vacuum processing chamber 2, a pair of guide rollers 21, 21 arranged at intervals in the conveyance direction of the sheet-like substrate S (left-right direction in FIG. 1), and the lower guide rollers 21, 21 arranged between the guide rollers 21, 21, A cooling roller 22 that winds the sheet-like substrate S and a PVD film forming unit 23 disposed below the cooling roller 22 are accommodated on the half circumferential surface on the side. A thin film made of a film forming material generated by evaporation or sputtering from the film forming unit 23 is formed on the portion of the sheet-like substrate S wound around the cooling roller 22. The vacuum processing chamber 2 is provided with a partition plate 24 that partitions the upper space with respect to the lower space of the vacuum processing chamber 2 in which the film forming unit 23 is disposed.

Further, the vacuum processing apparatus 1, the upstream side of the vacuum processing chamber 2 and the first auxiliary vacuum chamber 3 ₁ serving upstream auxiliary vacuum chamber which is continuously provided (left side in FIG. 1), downstream of the vacuum processing chamber 2 (Fig. 1 and a second auxiliary vacuum chamber 3 ₂ serving downstream auxiliary vacuum chamber which is continuously provided on the right side). These auxiliary vacuum chambers 3 ₁ and 3 ₂ are evacuated by a vacuum pump that is common or dedicated to the vacuum processing chamber 2.

A first auxiliary vacuum chamber 3 _first inlet portion, the inlet portion and the outlet portion of the vacuum processing chamber 2, the second auxiliary vacuum chamber 3 _second outlet portion, closed so as to sandwich the respective sheet-like substrate S sluice valve 4 Is arranged. As shown in FIG. 2, the gate valve 4 includes a valve seat 41 provided at the inlet and the outlet, and a valve body 42 that can contact and separate from the valve seat 41. Then, the sheet-like substrate S is supported along the valve seat 41 by the guide roller 43, and the sheet-like substrate S is sandwiched between the valve seat 41 and the valve body 42 by the closing operation of the valve body 42. . Further, a seal member 44 is attached to the valve seat 41 and the valve body 42 in order to improve airtightness. In the present embodiment, the valve body 42 is a rotary type that rotates about the shaft 42a. However, a direct-acting valve body can also be used.

Further, the first and second auxiliary vacuum chambers 3 ₁ and 3 ₂ are pulled in by a predetermined length of the sheet-like substrate S, and the first and second auxiliary vacuum chambers 3 ₁ and ₂ hold the drawn sheet-like substrate S so that they can be pulled out. each substrate retraction mechanism ₅ 1, _{5 2} are disposed. Mechanism 5 _1, 5 ₂ pull each substrate, a pair of guide rollers 51, 51 arranged in the conveying direction of the sheet-like substrate S at intervals and placed between the two guide rollers 51, the sheet-like substrate S And a movable roller 52 that can be moved by an actuator such as a cylinder (not shown) in the vertical direction perpendicular to the conveying direction. Then, by moving the movable roller 52 downward, the sheet-like substrate S is drawn between the guide rollers 51 and 51 by a predetermined length, and by making the movable roller 52 free, the drawn sheet-like substrate S can be pulled out freely. It is trying to become.

Here, the sheet-like substrate S is transferred from the previous process F to the vacuum processing apparatus 1 through the atmospheric pressure space, and is transferred from the vacuum processing apparatus 1 to the subsequent process R through the atmospheric pressure space. Then, conveyance of the sheet-like substrate S in the vacuum processing apparatus 1 is performed by operating the first and mechanism 5 ₁ retraction second respective _substrates, 5 _2. Hereinafter, the conveyance of the sheet-like substrate S in the vacuum processing apparatus 1 will be described with reference to FIG. In FIG. 3, the gate valve 4 in the opened state is shown in white.

In conveyance of the sheet-like substrate S, first, as shown in FIG. 3 (a), the first auxiliary vacuum chamber 3 ₁ in a state where the gate valve 4 is opened in the inlet portion, pull the first substrate mechanism 5 ₁ The movable roller 52 is moved downward. Thus, a sheet-like substrate S having a predetermined length amount is drawn from the atmospheric pressure space of the upstream side to the first auxiliary vacuum chamber 3 _1. Thereafter, the gate valve 4 of the first auxiliary vacuum chamber 3 ₁ of the inlet portion and closed, to depressurize the first auxiliary vacuum chamber 3 _1.

Next, as shown in FIG. 3 (b), in a state of being opened gate valve 4, 4 of the inlet and outlet of the vacuum processing chamber 2, a constant stroke of the second movable roller 52 of the substrate retraction mechanism 5 ₂ in intermittently moved downward, intermittently conveyed from mechanism 5 ₁ pull first substrate sheet substrate S by a predetermined length to a second auxiliary vacuum chamber 3 ₂ via the vacuum processing chamber 2. At this time, cool the rollers 22 are rotated synchronously by the second substrate retraction mechanism 5 ₂ in the retracted sheet substrate S, excessive tension between the sheet-like substrate S and the cooling roller 22 and the second retraction mechanism 5 ₂ To prevent it from working. And after each intermittent conveyance, the gate valves 4 and 4 of the inlet part and the outlet part of the vacuum processing chamber 2 are closed, the vacuum processing chamber 2 is depressurized to a required degree of vacuum, and the sheet-like substrate S has a certain length. A film forming process is performed one by one.

Next, as shown in FIG. 3 (c), in a state in which the gate valve 4 is opened in the second outlet of the auxiliary vacuum chamber 3 _2, the drawer mechanism provided on the rear step R side, a sheet-like substrate S withdrawn from the second substrate retraction mechanism 5 ₂ to the atmospheric pressure space of the second auxiliary vacuum chamber 3 ₂ of the downstream side. Thereafter, the gate valve 4 of the second outlet portion of the auxiliary vacuum chamber 3 ₂ by closing, with a second auxiliary vacuum chamber 3 ₂ depressurizing, as shown in FIG. 3 (a), the first auxiliary vacuum chamber 3 ₁ The sheet-like substrate S is drawn into the substrate. By repeating the above operation, the film forming process and the substrate transfer are continuously performed.

In the present embodiment, when the intermittent transport in the second auxiliary vacuum chamber 3 ₂ via the second substrate retraction mechanism 5 ₂ vacuum processing chamber 2 a sheet-like substrate S from the first auxiliary vacuum chamber 3 ₁ , the inlet portion of the vacuum processing chamber 2 and also by opening the gate valve 4, 4 in the outlet portion, pre-gate valve 4 and the second auxiliary vacuum chamber 3 _second outlet portion of the first auxiliary vacuum chamber 3 _first inlet portion Since the first and second auxiliary vacuum chambers 3 ₁ and 3 ₂ can be depressurized by closing the gate valve 4, the vacuum processing chamber 2 is not released to the atmosphere during intermittent transfer. . Therefore, after the intermittent transfer, the vacuum processing chamber 2 can be decompressed to a required degree of vacuum in a short time and the film forming process can be resumed, thereby improving productivity.

  In addition, the sheet-like substrate S is transported to the vacuum processing apparatus 1 as it is without being wound in a roll form from the previous process F, or is directly transferred to the subsequent process R without being wound in a roll form from the vacuum processing apparatus 1. It can be transported, and productivity can be greatly improved.

Incidentally, the atmospheric pressure space upstream and downstream of the vacuum processing apparatus 1 installed respectively feed roller and the take-up roller, pulling the mechanism 5 ₁ pull first substrate sheet substrate S from the feed roller, a second substrate it is also possible to draw the pulling mechanism 5 ₂ a sheet-like substrate S by the take-up roller. In this case, unlike the conventional example in which the feeding roller is housed in the auxiliary vacuum chamber, the size of the feeding roller is not limited, and the sheet-like substrate S having a great length can be wound around the feeding roller. . As a result, the replacement frequency of the feeding roller and the winding roller can be reduced, and productivity is improved.

Next, a second embodiment shown in FIG. 4 will be described. The difference of the second embodiment from the first embodiment is that a pair of substrate drawing mechanisms 5 in and 5 out are arranged in the vacuum processing chamber 2 on the inlet side and the outlet side. . Each of these substrates retraction mechanism 5in, 5Out, like the first and the mechanism ₅ 1, _{5 2} pull second respective substrates arranged first and the second auxiliary vacuum chamber ₃ 1, _{3 2,} a pair of guide rollers 51, 51 and a movable roller 52 disposed between the two guide rollers 51, 51.

In the second embodiment, first, as shown in FIG. 5 (a), in a state in which the gate valve 4 is opened in the first auxiliary vacuum chamber 3 _first inlet portion, the first substrate retraction mechanism 5 _first movable roller 52 the moved downward, after retracted from atmospheric space the sheet-like substrate S first auxiliary vacuum chamber 3 ₁ upstream thereof, to close the gate valve 4 of the first auxiliary vacuum chamber 3 ₁ of the inlet portion, a first auxiliary vacuum chamber _{3 1} under reduced pressure. Next, as shown in FIG. 5B, the movable roller 52 of the inlet-side substrate pull-in mechanism 5 in is moved downward with the gate valve 4 at the inlet of the vacuum processing chamber 2 opened, so that the sheet-like substrate is moved down. S drawn into the vacuum processing chamber 2 from the first substrate retraction mechanism 5 _1.

  Next, the gate valve 4 at the inlet of the vacuum processing chamber 2 is closed, the vacuum processing chamber 2 is depressurized to a required degree of vacuum, and the film forming process is started. Then, during the film forming process, as shown in FIG. 5C, the movable roller 52 of the outlet side substrate pulling mechanism 5out is intermittently moved downward at a constant stroke, and the cooling roller 22 is moved from the inlet side substrate pulling mechanism 5in. Then, the sheet-like substrate S is intermittently conveyed to the outlet-side substrate drawing mechanism 5out by a certain length, and the film-forming process is performed on the sheet-like substrate S by a certain length.

Thereafter, as shown in FIG. 5 (d), in a state of being opened gate valve 4 in the outlet portion of the vacuum processing chamber 2, the second movable roller 52 of the substrate retraction mechanism 5 ₂ is moved downward, the sheet-like substrate S the pull from the outlet side substrate retraction mechanism 5out the second auxiliary vacuum chamber _{3 2.} Then, after closing the gate valve 4 in the outlet portion of the vacuum processing chamber 2, FIG. 5 as (a), the first auxiliary vacuum chamber 3 ₁ of the inlet portion of the gate valve 4 and the second auxiliary vacuum chamber 3 the gate valve 4 of the _second outlet portion while it is opened, with the first auxiliary vacuum chamber 3 ₁ by the first substrate retraction mechanism 5 ₁ draw sheet substrate S, the drawer mechanism provided on the rear step R side draws second substrate sheet substrate S mechanism 5 drawn from ₂ to the second downstream side of the auxiliary vacuum chamber 7 _2. By repeating the above operation, the film forming process and the substrate transfer are continuously performed.

Here, in the first embodiment, the vacuum processing chamber 2 in mechanism 5 ₂ pull second substrate from the first substrate retraction mechanism 5 ₁ each time intermittently conveying the sheet-like substrate S by a predetermined length inlet section and an outlet It is necessary to open the gate valve 4 of the part. Since the degree of vacuum in the vacuum processing chamber 2 slightly decreases due to the opening of the gate valve 4, after the gate valve 4 is closed, wait until the vacuum processing chamber 2 is depressurized to the required degree of vacuum. Then, it is necessary to restart the film forming process. On the other hand, in the second embodiment, the sheet-like substrate S can be intermittently conveyed in the vacuum processing chamber 2 with the gate valves 4 at the inlet and outlet of the vacuum processing chamber 2 closed. Therefore, the film forming process can be resumed immediately after intermittent conveyance, and productivity is improved.

  In the second embodiment, the movable roller 52 of the outlet side substrate pulling mechanism 5out is moved down to a descending end position at a constant speed, and the sheet-like substrate S continues from the inlet side substrate pulling mechanism 5in to the outlet side substrate pulling mechanism 5out. A film forming process can also be performed while being conveyed.

Next, a third embodiment shown in FIG. 6 will be described. Differences from the first embodiment of the third embodiment, the first buffer chamber ₆₁ as well as interposed between the first auxiliary vacuum chamber 3 ₁ and the vacuum processing chamber 2, the second auxiliary vacuum chamber 3 between the ₂ and the vacuum processing chamber 2 is that the second interposed the buffer chamber 6 _2.

The first and second buffer chambers 6 ₁ and 6 ₂ are evacuated by a vacuum pump shared with the vacuum processing chamber 2 and the first and second auxiliary vacuum chambers 3 ₁ and 3 ₂ or by a dedicated vacuum pump. The Further, the first inlet portion of the buffer chamber ₆₁ to the second outlet of the buffer chamber 6 _2, gate valve 4 to close so as to sandwich the respective sheet-like substrate S is placed.

Here, even if the gate valve 4 is closed, a slight gap is generated between the side edge of the sheet substrate S and the gate valve 4. Therefore, as in the first embodiment, the vacuum processing apparatus 1 to the upstream atmospheric pressure space of the vacuum processing chamber 2 in the first auxiliary vacuum chamber 3 ₁ of the inlet portion of the gate valve 4 and the vacuum processing chamber 2 inlet of with sealed double by the gate valve 4, the vacuum processing apparatus 1 downstream of the vacuum processing chamber 2 to atmospheric pressure space of the second auxiliary vacuum chamber 3 ₂ outlet gate valve 4 and the vacuum processing chamber 2 of Even if double sealing is performed with the gate valve 4 at the outlet, it is difficult to depressurize the vacuum processing chamber 2 beyond a predetermined degree of vacuum.

In contrast, according to the third embodiment, a gate valve 4 of the inlet portion of the vacuum processing chamber 2 a first auxiliary vacuum chamber 3 ₁ to the upstream atmospheric pressure space of the vacuum processing apparatus 1 first buffer chamber 6 The gate valve 4 at the inlet of ₁ and the gate valve 4 at the inlet of the vacuum processing chamber 2 can be triple sealed. Gate valve 4 and the vacuum of the sluice valve 4 and the second outlet portion of the buffer chamber 6 ₂ of the second outlet portion of the auxiliary vacuum chamber 3 ₂ vacuum processing chamber 2 to similarly atmospheric pressure space downstream of the vacuum processing apparatus 1 It is possible to provide a triple seal with the gate valve 4 at the outlet of the processing chamber 2. Then, than the first and second respective auxiliary vacuum chambers 3 _1, 3 ₂ of the vacuum degree becomes higher in the first and second of each buffer chamber 6 _1, 6 ₂ of the vacuum degree of the vacuum processing chamber 2 the degree of vacuum even higher than the vacuum degree of each buffer chamber 6 _1, 6 _2. Therefore, the vacuum processing chamber 2 can be depressurized to a considerably high degree of vacuum, and the case where a high degree of vacuum of the vacuum processing chamber 2 is required can be dealt with.

In the third embodiment, the number of each of the first and second buffer chambers 6 ₁ , 6 ₂ is one. However, depending on the required vacuum degree of the vacuum processing chamber 2, each buffer chamber 6 ₁ , 6 _{2 is used.} The number may be two or more. In the third embodiment, a substrate drawing mechanism may be arranged on the inlet side and the outlet side in the vacuum processing chamber 2 as in the second embodiment.

Further, a substrate drawing mechanism may be arranged in each buffer chamber 6 ₁ , 6 ₂ . In this case, the substrate retraction mechanism disposed in the first buffer chamber ₆₁ draws the first substrate retraction mechanism 5 ₁ placing the sheet-like substrate S to a first auxiliary vacuum chamber 3 ₁ into the first buffer chamber 6 _1, also , by a substrate retraction mechanism disposed in the second buffer chamber 6 ₂ draws sheet substrate S from the substrate retraction mechanism disposed in the first buffer chamber ₆₁ into the second buffer chamber 6 ₂ via the vacuum processing chamber 2, further, the second substrate retraction mechanism 5 ₂ disposed on the second auxiliary vacuum chamber 3 _2, a sheet-like substrate S as the substrate retraction mechanism disposed in the second buffer chamber 6 ₂ drawn into the second auxiliary vacuum chamber 3 ₂ To do. It should be noted that the placement of the substrate drawing mechanism in each of the buffer chambers 6 ₁ , 6 ₂ means that each of the first and second auxiliary vacuum chambers 5 ₁ incorporating the first and _second substrate drawing mechanisms 5 ₁ , 5 ₂ is included. is equivalent to each of a plurality placing 5 ₂ on the upstream side and the downstream side of the vacuum processing chamber 2.

Next, a fourth embodiment shown in FIG. 7 will be described. The difference of the fourth embodiment from the first embodiment is that the vacuum processing apparatus 1 is provided with a plurality of vacuum processing chambers, for example, first and second two vacuum processing chambers 2 ₁ and 2 ₂ , both the vacuum processing chamber 2 _1, 2 serving intermediate auxiliary vacuum chamber between the ₂ third auxiliary vacuum chamber 3 ₃ interposed, is to have the third substrate retraction mechanism ₃ is disposed on the third auxiliary vacuum chamber 3 ₃ . The third substrate retraction mechanism _3, a mechanism ₅ 1 first and retraction second respective substrates, _{5 2} in the same manner as a pair of guide rollers 51, 51 and the movable roller 52 disposed between the two guide rollers 51, 51 Consists of.

In the fourth embodiment, the first substrate retraction mechanism 5 ₁ arranged in a first auxiliary vacuum chamber 3 _1, and to draw the sheet-like substrate S from atmospheric space into a first auxiliary vacuum chamber 3 _1, third substrate the retraction mechanism _3, and be drawn into the third auxiliary vacuum chamber 3 ₃ mechanism 5 ₁ pull first substrate sheet substrate S via a first vacuum processing chamber 2 _1, second auxiliary vacuum chamber 3 ₂ the second substrate retraction mechanism 5 ₂ placed, and to draw the sheet-like substrate S on the third from the substrate retraction mechanism ₃ through the second vacuum processing chamber 2 ₂ second auxiliary vacuum chamber 3 _2, a sheet-like substrate and it is carried out to draw S from the second substrate retraction mechanism 5 ₂ to the atmospheric pressure space downstream. In a state where the gate valve 4 was closed partition valve 4 and the second outlet portion of the auxiliary vacuum chamber 3 ₂ of the first auxiliary vacuum chamber 3 _first inlet portion, the first vacuum processing chamber 2 ₁ and a second vacuum processing chamber 2 ₂ conveys a sheet-like substrate S, each vacuum processing chamber 2 _1, 2 ₂ from being exposed to the atmosphere.

In the fourth embodiment, a substrate drawing mechanism is arranged on the inlet side and the outlet side in each of the first and second vacuum processing chambers 2 ₁ and 2 _{2 as} in the second embodiment, and during and between the second auxiliary vacuum chamber 3 ₂ and the second vacuum processing chamber 2 ₂ of the first auxiliary vacuum chamber 3 ₁ and the first vacuum processing chamber 2 _1, via a respective buffer chamber as in the third embodiment You may set up.

As mentioned above, although embodiment of this invention was described with reference to drawings, this invention is not limited to this. For example, in the above embodiment, each of the substrate drawing mechanisms 5 ₁ , 5 ₂ , 5 ₃ , 5 in, 5 out is constituted by a pair of guide rollers 51, 51 and a movable roller 52 arranged between the guide rollers 51, 51. However, it is also possible to configure each substrate pull-in mechanism with a pinch roller that rotates with the sheet-like substrate S interposed therebetween. However, when a pinch roller is used, the sheet-like substrate S may be pulled in poorly due to slippage between the sheet-like substrate S and the pinch roller. On the other hand, if the movable roller 52 is used as in the above embodiment, the sheet-like substrate S can be reliably pulled in, which is advantageous.

  Moreover, although the said embodiment applies this invention to the board | substrate conveyance apparatus of the vacuum processing apparatus which performs the film-forming process by PVD to the sheet-like board | substrate S, the vacuum processing apparatus which performs the film-forming process by CVD, The present invention can be similarly applied to a substrate transfer device of a vacuum processing apparatus that performs vacuum processing other than film formation processing such as etching.

DESCRIPTION OF SYMBOLS 1 ... Vacuum processing apparatus, 2, 2 ₁ , 2 ₂ ... Vacuum processing chamber, 3 ₁ ... 1st auxiliary vacuum chamber (upstream side auxiliary vacuum chamber), 3 ₂ ... 2nd auxiliary vacuum chamber (downstream side auxiliary vacuum chamber), 3 ₃ ... 3rd auxiliary vacuum chamber (intermediate auxiliary vacuum chamber), 4 ... Gate valve, 5 ₁ , 5 ₂ , 5 ₃ , 5 in, 5 out ... Substrate drawing mechanism, 51 ... Guide roller, 52 ... Movable roller, 6 ₁ ... First buffer chamber (upstream buffer chamber), 6 ₂ ... Second buffer chamber (downstream buffer chamber).

Claims (5)

A substrate transport apparatus in a vacuum processing apparatus that transports a long sheet-shaped substrate through a vacuum processing chamber and performs a predetermined process on the sheet-shaped substrate in the vacuum processing chamber,
An upstream auxiliary vacuum chamber connected to the upstream side of the vacuum processing chamber;
A downstream auxiliary vacuum chamber connected to the downstream side of the vacuum processing chamber;
A gate valve disposed so as to sandwich the sheet-like substrate, which is disposed at the inlet portion of the upstream auxiliary vacuum chamber, the outlet portion of the downstream auxiliary vacuum chamber, and the inlet portion and outlet portion of the vacuum processing chamber, respectively.
With a substrate pull-in mechanism that pulls in a sheet-like substrate for a predetermined length and holds the drawn sheet-like substrate freely,
The substrate drawing mechanism is arranged in each of the upstream side auxiliary vacuum chamber and the downstream side auxiliary vacuum chamber,
With the gate valve at the inlet of the upstream side auxiliary vacuum chamber opened, the substrate drawing mechanism disposed in the upstream side auxiliary vacuum chamber causes the sheet-like substrate to move to the upstream side auxiliary vacuum chamber. The downstream auxiliary from the substrate pull-in mechanism in which the sheet-like substrate is disposed in the downstream auxiliary vacuum chamber in a state where the downstream side auxiliary vacuum chamber is drawn in and the gate valve at the outlet of the downstream auxiliary vacuum chamber is opened. A substrate transfer apparatus in a vacuum processing apparatus, wherein the substrate transfer apparatus is pulled out to an atmospheric pressure space downstream of the vacuum chamber.   2. The substrate transfer apparatus in a vacuum processing apparatus according to claim 1, wherein the substrate drawing mechanism is arranged on each of an inlet portion side and an outlet portion side in the vacuum processing chamber.   At least one upstream buffer chamber is interposed between the upstream auxiliary vacuum chamber and the vacuum processing chamber, and at least one downstream buffer is interposed between the downstream auxiliary vacuum chamber and the vacuum processing chamber. A partition valve is disposed between the inlet portion of the upstream buffer chamber and the outlet portion of the downstream buffer chamber so as to sandwich the sheet-like substrate, respectively. A substrate transfer apparatus in the vacuum processing apparatus according to Item.   The vacuum according to any one of claims 1 to 3, wherein a plurality of the vacuum processing chambers are provided, and an intermediate auxiliary vacuum chamber in which the substrate drawing mechanism is disposed is interposed between the vacuum processing chambers. A substrate transfer apparatus in a processing apparatus.   The substrate pull-in mechanism includes a pair of guide rollers arranged at intervals in the conveyance direction of the sheet-like substrate, and a movable roller arranged between the guide rollers and movable in a direction orthogonal to the conveyance direction of the sheet-like substrate. The substrate transfer apparatus in a vacuum processing apparatus according to claim 1, wherein the substrate transfer apparatus is configured as follows.

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