WO2008075493A1 - Base material processing apparatus and method for manufacturing display device using the base material processing apparatus - Google Patents

Base material processing apparatus and method for manufacturing display device using the base material processing apparatus Download PDF

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Publication number
WO2008075493A1
WO2008075493A1 PCT/JP2007/069247 JP2007069247W WO2008075493A1 WO 2008075493 A1 WO2008075493 A1 WO 2008075493A1 JP 2007069247 W JP2007069247 W JP 2007069247W WO 2008075493 A1 WO2008075493 A1 WO 2008075493A1
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WO
WIPO (PCT)
Prior art keywords
base material
substrate
continuously
flexible
chamber
Prior art date
Application number
PCT/JP2007/069247
Other languages
French (fr)
Japanese (ja)
Inventor
Yoshiki Nakatani
Hisao Ochi
Original Assignee
Sharp Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2006339982 priority Critical
Priority to JP2006-339982 priority
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Publication of WO2008075493A1 publication Critical patent/WO2008075493A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates

Abstract

A base material processing apparatus is provided with a base materail supplying means for continuously supplying a long flexible base material; a depressurizing transfer means, which continuously transfer the flexible base material supplied from the base material supplying means and depressurizes the transfer atmosphere to be in a vacuum state; a base material vacuum processing means, which performs prescribed processing under the vacuum atmosphere to the flexible base material transferred from the depressurizing transfer means while continuously transferring it; and a base material recovery means for continuously recovering the flexible base material processed by the base material vacuum processing means.

Description

 Specification

 Substrate processing apparatus and method for manufacturing display apparatus using the same

 Technical field

 The present invention relates to a substrate processing apparatus and a method for manufacturing a display device using the same.

 Background art

 [0002] In a manufacturing process of a liquid crystal display device or the like, a processing process performed in a vacuum state, such as depositing a predetermined film on a substrate by a CVD method, performing dry etching, or dropping a display medium into a display cell Exists.

 [0003] In recent years, research on liquid crystal display devices using a substrate having high flexibility and impact resistance such as a plastic substrate instead of a hard substrate such as a glass substrate or a silicon wafer has been actively conducted. Such a flexible plastic substrate cannot retain its shape by itself. For this reason, in the manufacturing process of a display device using the same, roll-to-roll conveyance for conveying from a scroll shape to a scroll shape is used in order to convey the substrate in a strip shape and applying tension.

 [0004] For example, Patent Document 1 discloses a continuous vacuum processing apparatus that performs a predetermined process in a vacuum state while conveying the plastic substrate as described above by roll-to-roll conveyance. Patent Document 1: Japanese Patent Laid-Open No. 2003-253442

 Disclosure of the invention

 Problems to be solved by the invention

[0005] In order to convey a flexible substrate such as a plastic substrate, it is necessary to convey a single rut roll in order to maintain its shape. However, if this roll-to-roll conveyance is used consistently, it becomes difficult to perform CVD film formation processing in a vacuum atmosphere or thin film processing processing by dry etching on the substrate.

 Means for solving the problem

[0006] The present invention has been made in view of the above-mentioned points, and an object of the present invention is to perform each treatment while maintaining the shape of the flexible substrate while maintaining the vacuum state. By providing a substrate processing apparatus for continuously and surely applying the same and a method for manufacturing a display device using the same is there.

 [0007] A substrate processing apparatus according to the present invention continuously supplies a substrate supply means for continuously supplying a long flexible substrate, and a flexible substrate from the substrate supply means. A vacuum processing unit that transports and depressurizes the transporting atmosphere to form a vacuum, and a substrate vacuum process that performs predetermined processing in a vacuum atmosphere while continuously transporting the flexible base material from the vacuum transporting unit. And a base material recovery means for continuously recovering the processed flexible base material from the base material vacuum processing means.

 [0008] Further, in the substrate processing apparatus according to the present invention, the decompression conveying unit continuously receives the flexible substrate from the substrate supply unit and stores or receives the flexible substrate. The first base material supply adjusting unit and the second base material that continuously sends out the flexible base material after receiving or storing the flexible base material from the first base material supply adjusting unit. Receiving a flexible substrate from a decompression chamber provided with a supply adjustment unit, a decompression unit that decompresses the indoor atmosphere, and a decompression unit that decompresses the indoor atmosphere; and a second substrate supply regulation unit After the storage, or while receiving, a decompression standby chamber provided with a third substrate supply adjustment unit that continuously feeds the flexible substrate, a decompression unit that decompresses the indoor atmosphere, and a third substrate After receiving and storing the flexible substrate from the supply adjustment unit, or while receiving it, send the flexible substrate continuously. And wood supply adjusting unit, a decompression unit for decompressing the room atmosphere, and carrying speed adjusting chamber provided may be provided with.

 [0009] Further, the substrate processing apparatus according to the present invention includes a vacuum processing unit in which the substrate vacuum processing unit performs a predetermined process on the flexible substrate continuously conveyed from the fourth substrate supply adjustment unit; You may have a vacuum processing chamber with a decompression section that depressurizes the indoor atmosphere! /.

 [0010] In addition, the substrate processing apparatus according to the present invention includes a decompression chamber, a decompression standby chamber, a carry-in speed adjustment chamber, and a vacuum treatment chamber, respectively, a flexible substrate carrying-in port and a carrying-out port, and a carrying-in port and a carrying-in port. An opening / closing unit that opens and closes the outlets may be provided.

Furthermore, in the substrate processing apparatus according to the present invention, each of the first, second, third, and fourth substrate supply adjusting units is flexible while rotating while contacting the surface of the flexible substrate. There may be provided a base material supply adjusting roll configured to change the transport path of the flexible base material by reciprocating in a direction crossing the transport direction of the flexible base material. [0012] Further, the base material processing apparatus according to the present invention is provided between the base material vacuum processing means and the base material recovery means, and continuously conveys the flexible base material from the base material vacuum processing means. At the same time, it is further equipped with a return pressure transfer means for recovering the transfer atmosphere.

 [0013] Further, in the substrate processing apparatus according to the present invention, the return pressure conveying unit receives the flexible substrate from the substrate vacuum processing unit and stores or receives the flexible substrate. Receives the flexible base material from the fifth base material supply adjustment unit, the unloading speed adjustment chamber provided with the fifth base material supply adjustment unit that continuously feeds out, the decompression unit that decompresses the indoor atmosphere. A 6th base material supply adjusting unit that continuously feeds the flexible base material while receiving or storing it, and a return pressure standby chamber provided with a pressure reducing unit for reducing the indoor atmosphere, After receiving and storing the flexible base material from the material supply adjustment unit, or while receiving, a seventh base material supply adjustment unit that continuously sends out the flexible base material, a decompression unit that decompresses the indoor atmosphere, A return pressure chamber for returning pressure to the indoor atmosphere, and a flexible base material received from the seventh base material supply adjustment portion. One and after stored, or while receiving a eighth substrate supply adjusting unit for feeding the flexible substrate in succession, may be provided.

 [0014] A method for manufacturing a display device according to the present invention includes a base material supplying step of continuously supplying a long flexible base material, and a continuous supply of the flexible base material. A vacuum process step for transporting and depressurizing the transport atmosphere to bring it into a vacuum state, and a substrate vacuum for performing a predetermined treatment in a vacuum atmosphere while continuously transporting the flexible base material transported with a reduced pressure A special feature is that it includes a processing step and a base material recovery step for continuously recovering the flexible base material that has been subjected to the predetermined processing.

 [0015] In addition, in the method for manufacturing a display device according to the present invention, after the decompression transport step receives and stores the flexible base material supplied in the base material supply step, or while receiving the flexible base material, The base material supply adjustment step that continuously feeds materials and the flexible base material that is sent out in the previous base material supply adjustment step is received and stored, and the surrounding atmosphere is depressurized to maintain the vacuum state. After holding the base material, the decompression step for continuously transporting the flexible base material, and the flexible base material continuously transported in the decompression step after being received and stored in a vacuum atmosphere or while receiving A decompression standby step for continuously conveying the flexible substrate while maintaining a vacuum state;

Receive and store the flexible substrate that has been continuously conveyed in the decompression standby step in a vacuum atmosphere. And a receiving speed adjusting step for continuously transporting the flexible base material while maintaining a vacuum state.

 Furthermore, in the method for manufacturing a display device according to the present invention, the decompression step is performed in the decompression chamber, the flexible base material is sent out from the decompression chamber, the decompression chamber is decompressed, and the decompression chamber is decompressed. You may receive the flexible base material supplied by the base material supply step in the state.

 [0017] Further, the method for manufacturing a display device according to the present invention is provided between the base material vacuum processing step and the base material recovery step, and continuously applies the flexible base material from the base material vacuum processing step. While carrying, it may further comprise a return pressure carrying step for restoring the pressure of the carrying atmosphere.

 [0018] Further, in the method for manufacturing a display device according to the present invention, the return pressure transport step receives and stores the flexible base material continuously transported in the base material vacuum processing step in a vacuum atmosphere. While receiving the vacuum while maintaining the vacuum state, the unloading speed adjustment step, and after receiving and storing the flexible substrate continuously conveyed in the unloading speed adjustment step, or receiving the vacuum Recovering pressure standby step for continuously feeding the flexible base material while maintaining the state, and receiving and storing the flexible base material from the recovery pressure standby step, and returning the surrounding atmosphere to the flexible base material After holding, after receiving and storing the flexible substrate from the decompression step, or while receiving the flexible substrate, continuously A post-stage base material supply adjusting step for feeding out, Good.

 [0019] Further, in the method for manufacturing a display device according to the present invention, the return pressure step is performed in the return pressure chamber, and after the flexible base material is sent out from the return pressure chamber, the pressure return chamber is decompressed, The flexible substrate supplied in the return pressure standby step in a state where the pressure is reduced may be received.

 The invention's effect

 [0020] According to the present invention, a substrate processing apparatus and a display apparatus using the substrate processing apparatus that reliably and continuously performs each process while maintaining a vacuum state while maintaining the shape of the flexible substrate. Manufacturing methods can be provided.

 Brief Description of Drawings

 FIG. 1 shows a schematic diagram of a substrate processing apparatus according to an embodiment of the present invention. It is.

 FIG. 2 is a start view of a first step of a method for manufacturing a display device according to an embodiment of the present invention.

FIG. 3 is a completion diagram of the first step of the display device manufacturing method according to the embodiment of the present invention. FIG. 4 is a diagram showing a second step of the method for manufacturing the display device according to the embodiment of the present invention.

FIG. 5 is a start view of a third step of the method for manufacturing the display device according to the embodiment of the present invention.

FIG. 6 is a completion drawing of the third step of the method for manufacturing the display device according to the embodiment of the present invention.

FIG. 7 is a diagram showing a fourth step of the method for manufacturing the display device according to the embodiment of the present invention. Explanation of symbols

10 Substrate processing equipment

 11 Substrate supply means

 12 Pressure reducing means

 13 Substrate vacuum processing means

 14 Reverse pressure transfer means

 15 Base material collection means

 16, 46

 17, 47 Roll body

 21 First base material supply adjustment section

 22 Second base material supply adjustment section

 23 Third base material supply adjustment section

 24 Fourth substrate supply adjustment section

 25 Fifth base material supply adjustment section

 26 6th substrate supply adjustment section

 27 7th substrate supply adjustment section

 28 8th base material supply adjustment section

 30 decompression chamber

 31 Vacuum waiting room

 32 Loading speed adjustment room

 33 Vacuum processing chamber

 34 Unloading speed adjustment room

35 Restoration waiting room 41 First transport roll

 42 Second transport roll

 43 3rd transport roll

 44 4th transport roll

 45 Fifth transport roll

 50 Pressure reduction part

 51 Restoring section

 52 Loading port

 53, 55, 65, 66, 67, 68 Carry-in P and Carry-out P

 69 Unloading

 BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, a substrate processing apparatus 10 according to an embodiment of the present invention and a method for manufacturing a display device using the same will be described in detail with reference to the drawings. The present invention is not limited to the following embodiment.

[0024] (Embodiment)

 (Configuration of substrate processing equipment 10)

 FIG. 1 shows a schematic diagram of a substrate processing apparatus 10 according to an embodiment of the present invention. The substrate processing apparatus 10 is composed of a substrate supply means 11, a decompression conveyance means 12, a substrate vacuum processing means 13, a reverse pressure conveyance means 14, a substrate recovery means 15, and a control unit (not shown). ing.

[0025] The base material supply means 11 is a long plastic base material 100 (flexible base material) force to be processed. S Plastic base material loo drawn from a base material roll wound in a roll shape It is placed in the position where it is supplied. The base material supply means 11 is provided so as to come into contact with the surface of the plastic base material 100 to be supplied. The base material supply means 11 includes a roll shaft 16 and a roll body 17.

[0026] The roll shaft 16 is formed in an elongated cylindrical shape. Roll axis 16 is a plastic substrate

There are 100 transport directions (in Fig. 1,! /, The direction from left to right) and in the horizontal plane! / The roll shaft 16 is supported and fixed to a support base (not shown) at its tip. The roll body 17 is wound around the roll shaft 16. [0027] The reduced-pressure transport means 12 includes a first base material supply adjusting unit 21 provided downstream of the base material supply unit 11, a decompression chamber 30 provided with a second base material supply adjusting unit 22, and a third base material. A decompression standby chamber 31 provided with the supply adjusting unit 23 and a carry-in speed adjusting chamber 32 provided with the fourth base material supply adjusting unit 24 are configured.

 [0028] The first base material supply adjusting unit 21 receives the plastic base material 100 from the base material supply means 11, the first transport roll 41, and the plastic base material 100 sent out from the first transport roll 41 one after another. The second, third, fourth, and fifth transport rolls 42 to 45 are configured. The first transport roll 41 that receives the plastic substrate 100 and the fifth transport roll 45 that feeds the plastic substrate 100 to the decompression chamber 30 are fixedly arranged. The second and fourth transport rolls 42, 44 are configured to reciprocate at the same distance in the direction intersecting the transport direction of the plastic substrate 100. The third transport roll 43 is configured to reciprocate so as to be opposite to the movement direction of the second and fourth transport rolls 42 and 44 in a direction intersecting the transport direction of the plastic substrate 100. Has been. The first to fifth transport rolls 41 to 45 are each composed of a roll shaft 46 and a roll body 47. The roll shaft 46 is formed in an elongated cylindrical shape. The roll body 47 is wound around the roll shaft 46.

 [0029] In the decompression chamber 30, a second base material supply adjusting unit 22, a decompression unit 50, and a decompression unit 51 are provided in the chamber. The decompression chamber 30 is formed with a carry-in port 52 and a carry-out port 53 for the plastic substrate 100. The carry-in port 52 and the carry-out port 53 are each configured to be opened and closed by an opening / closing part 54. The opening / closing part 54 includes partition valves provided above and below the carry-in port 52 and the carry-out port 53. The second base material supply adjusting unit 22 is configured in the same manner as the first to fifth transport rollers 41 to 45 of the first base material supply adjusting unit 21 described above, and performs the same operation as the first to fifth transports. It consists of rolls 4i-45. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere. The return pressure unit 51 includes a return pressure leak valve, and is configured to return the pressure in the decompressed chamber 30 to the atmospheric atmosphere.

[0030] In the decompression standby chamber 31, the third base material supply adjusting unit 23, the purge unit 58, and the decompression unit 50 are provided in the room. The decompression waiting room 31 is provided with an inlet 53 and an outlet 5 for the plastic substrate 100. 5 is formed. Above and below the carry-in port 53 and the carry-out port 55, open / close units 54 having the same configuration and operation as the above-described open / close unit 54 are provided. The third base material supply adjustment unit 23 is configured in the same manner as the first to fifth transport rollers 41 to 45 of the first base material supply adjustment unit 21 described above, and performs the same operations as the first to fifth materials. Conveying roll 4; The purge unit 58 includes a purge gas cylinder 59 containing nitrogen or the like for purging indoor air and a purge gas valve 60. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere.

 [0031] The carry-in speed adjustment chamber 32 includes a fourth base material supply adjustment unit 24, a purge unit 58, and a decompression unit 50 in the chamber. In the carry-in speed adjustment chamber 32, a carry-in port 55 and a carry-out port 65 for the plastic substrate 100 are formed. Above and below the carry-in entrance 55 and the carry-out exit 65, open / close portions 54 having the same configuration and operation as the above-described open / close portion 54 are provided. The fourth base material supply adjusting unit 24 is configured in the same manner as the first to fifth transport rollers 41 to 45 of the first base material supply adjusting unit 21 described above, and performs the same operations as the first to fifth materials. Conveying roll 4; The purge unit 58 includes a purge gas cylinder 59 containing nitrogen and the like for expelling indoor air, and a purge gas valve 60. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere.

 The substrate vacuum processing means 13 is provided at the subsequent stage of the decompression and transport means 12 and performs a predetermined process, a processing section (not shown), a processing gas cylinder 61 for supplying a processing gas, a processing gas valve 62, and a decompression section 50. Is provided with a vacuum processing chamber 33 provided in the room. In the vacuum processing chamber 33, a carry-in port 65 and a carry-out port 66 for the plastic substrate 100 are formed. Above and below the carry-in port 65 and the carry-out port 66, open / close units 54 having the same configuration and operation as the above-described open / close unit 54 are provided. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere!

 [0033] The return pressure conveying means 14 is provided in the subsequent stage of the base material vacuum processing means 13, and is provided with a carry-out speed adjusting chamber 34 provided with a fifth base material supply adjusting part 25, and a sixth base material supply adjusting part 26. The return pressure standby chamber 35, the return pressure chamber 36 provided with the seventh base material supply adjusting unit 27, and the eighth base material supply adjusting unit 28 are configured.

[0034] The unloading speed adjusting chamber 34 is a treated plastic substrate sent out from the vacuum processing chamber 33. A fifth base material supply adjusting unit 25 for receiving the material 100, a purge unit 58, and a pressure reducing unit 50 are provided. In the carry-out speed adjusting chamber 34, a carry-in port 66 and a carry-out port 67 for the plastic substrate 100 are formed. Above and below the carry-in port 66 and the carry-out port 67, open / close units 54 having the same configuration and operation as the above-described open / close unit 54 are provided. The fifth base material supply adjusting unit 25 is configured in the same manner as the first to fifth transport rolls 41 to 45 of the first base material supply adjusting unit 21 described above, and performs the same operations as the first to fifth transports. Roll 4; consists of! ~ 45. The purge unit 58 includes a purge gas cylinder 59 and a purge gas valve 60 containing nitrogen or the like for expelling indoor air. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere!

 The return pressure standby chamber 35 is provided with a sixth substrate supply adjusting unit 26, a purge unit 58, and a decompression unit 50 that receive the plastic substrate 100 sent out from the carry-out speed adjusting chamber 34. In the return pressure standby chamber 35, a carry-in port 67 and a carry-out port 68 for the plastic substrate 100 are formed. Above and below the carry-in port 67 and the carry-out port 68, open / close units 54 having the same configuration and operation as the above-described open / close unit 54 are provided. The sixth base material supply adjusting unit 26 is configured in the same manner as the first to fifth transport rollers 4;! To 45 of the first base material supply adjusting unit 21 described above, and performs the same operation. ~ Fifth transport roll 4;! ~ 45. The purge unit 58 includes a purge gas cylinder 59 containing nitrogen and the like and a purge gas valve 60 for expelling indoor air. The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to reduce the indoor atmosphere!

[0036] In the return pressure chamber 36, a seventh base material supply adjusting unit 27, a decompression unit 50, and a return pressure unit 51 are provided in the room. In the return pressure chamber 36, a carry-in port 68 and a carry-out port 69 for the plastic substrate 100 are formed. Above and below the carry-in port 68 and the carry-out port 69, open / close units 54 having the same configuration and operation as the above-described open / close unit 54 are provided. The seventh base material supply adjustment unit 27 is configured in the same manner as the first to fifth transport rollers 41 to 45 of the first base material supply adjustment unit 21 described above, and performs the same operation as the first to fifth materials. Conveying roll 4; The decompression unit 50 includes an exhaust valve 56 and a vacuum exhaust pump 57, and is configured to decompress the indoor atmosphere. The decompression unit 51 includes a decompression leak valve, and is configured to restore the decompressed room atmosphere to return it to the atmosphere. [0037] The eighth base material supply adjusting unit 28 receives the plastic base material 100 from the base material supply means 11, the first transport roll 41, and the plastic base material 100 sent out from the first transport roll 41 one after another. The second, third, fourth, and fifth transport rolls 42 to 45 are configured. The configurations and operations of the first to fifth transport rolls 41 to 45 are the same as those of the first to fifth transport rolls 4;! To 45 of the first base material supply adjusting unit 21 described above.

 [0038] The base material collecting means 15 is provided at the subsequent stage of the return pressure conveying means 14, and is placed at a position where the treated plastic base material 100 is finally collected. The base material collecting means 15 is provided so as to come into contact with the surface of the plastic base material 100 to be collected. Similar to the base material supply means 11, the base material recovery means 15 includes a roll shaft 16 and a roll body 17.

 [0039] The first to fifth transport rolls 4;! To 45 are not limited in size, and are appropriately selected depending on the size of the long plastic substrate 100 to be transported. For example, if the length of a long plastic substrate to be transported is 100m and the length is 100m and the width is about 10cm, the length is about several tens of centimeters and the length is about several tens of centimeters! Good! /

 [0040] Further, the configurations of the decompression unit 50 and the decompression unit 51 are not limited to those described above, and are not particularly limited.

 [0041] (Operation of substrate processing apparatus 10)

 Next, the operation of each component of the substrate processing apparatus 10 according to the embodiment of the present invention will be described. Further, in the following, the rotation directions of the roll shafts 16, 46, the roll main bodies 17, 47, the first to fifth transport rolls 4;! -45 indicate the directions when FIG.

 [0042] The base material supply means 11 rotates the roll shaft 16 and the roll body 17 to the right while being fixed to a plastic base material 100 conveyed by a roll-to-roll conveyance system while abutting below the plastic base material 100. Send it out.

 [0043] The first transport roll 41 feeds out the plastic substrate 100 that has been transported by making a right rotation while abutting the plastic base material 100 while being in contact therebelow.

 The second transport roll 42 sends out the plastic substrate 100 transported by the first transport roll 41 by rotating counterclockwise while abutting on the plastic substrate 100 above. The second transport roll 42 reciprocates up and down, thereby changing the transport path of the plastic substrate 100.

[0045] The third transport roll 43 is used for the plastic substrate 100 transported by the second transport roll 42. Then, it feeds out by rotating clockwise while abutting on the lower side. The third transport roll 43 reciprocates up and down, thereby changing the transport path of the plastic substrate 100.

[0046] The fourth transport roll 44 is used for the plastic substrate 100 transported by the third transport roll 43.

Then, it feeds out by rotating counterclockwise while abutting above. The fourth transport roll 44 reciprocates up and down, thereby changing the transport path of the plastic substrate 100.

[0047] Further, as will be described later, the second to fourth transport rollers 42 to 44 move up and down in a reciprocating manner in conjunction with each other at a predetermined timing.

[0048] The fifth transport roll 45 is sent out by rotating right while remaining fixed to the plastic substrate 100 transported from the fourth transport roll 44 while abutting below the plastic base material 100.

[0049] With the combination of the first to fifth transport rolls 4;! To 45 described above, it is possible to perform flexible transport operations such as continuously receiving the plastic substrate 100 from one side, storing it, or sending it out as it is. It becomes.

 [0050] The opening / closing unit 54 opens the carry-in port and the carry-out port by opening the partition valve, and closes and seals the carry-in port and the carry-out port by closing the partition valve. For this reason, the vacuum state in the room can be kept effective.

[0051] The vacuum processing unit deposits a predetermined film, performs dry etching, or displays a display medium on the plastic substrate 100 continuously conveyed in the vacuum processing chamber 33, for example, by the CVD method. Processing such as dropping into the display cell is performed.

[0052] The base material collecting means 15 makes a plastic base material 1 by rotating to the right while being fixed to the plastic base material 100 sent out from the return pressure chamber 36 while being in contact with the lower part thereof.

Collect 00.

 [0053] (Method of manufacturing display device using substrate processing apparatus 10!)

 Next, a manufacturing method of the display device using the substrate processing apparatus 10 according to the embodiment of the present invention will be described in detail.

[0054] The manufacturing method of the display device using the substrate processing apparatus 10 is a plastic substrate continuously by a roll-and-roll conveyance system that can be divided into the first to fourth steps in order as shown below. In order to process 100 in a vacuum state, the plastic substrate 100 is continuously processed from the 4th process and back to the 1st process. [0055] In the steps;! To 4, the five chambers from the decompression standby chamber 31 to the decompression standby chamber 35 are kept in a substantially vacuum state by the purge unit 58 and the decompression unit 50 in advance.

 [0056] (First step)

 In the first step, as shown in FIG. 2, a plastic substrate 100 made of polyimide having a thickness of 200 111, a width of 105 mm, and a length of 100 m is continuously sent out from the substrate supply means 11, for example. Yes.

 [0057] The first base material supply adjusting unit 21 is configured to make the plastic base material from the base material supply means 11 while gradually decreasing the vertical distance between the second and fourth transport rolls 42, 44 and the third transport roll 43. Conveying continuously while receiving 100. At this time, in addition to the received plastic base material 100, the stored plastic base material 100 is also sent out, so that the delivery amount is larger than the received amount.

 The decompression chamber 30 is in a state in which the partition valve of the carry-in port 52 is open, and continuously receives the plastic substrate 100 from the first substrate supply adjustment unit 21. The inside of the decompression chamber 30 is not decompressed, and has an atmosphere similar to the atmosphere in which the first base material supply adjusting unit 21 is placed. In the second base material supply adjusting unit 22 in the decompression chamber 30, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored in the decompression chamber 30 without being sent out. The decompression chamber 30 is in a state where the partition valve of the carry-out port 53 is closed.

 [0059] The decompression standby chamber 31 has a carry-in port 53 serving as a carry-out port 53 of the decompression chamber 30, and is closed in this state. The decompression standby chamber 31 does not receive the plastic substrate 100 from the second substrate supply adjustment unit 22, but sends out the plastic substrate 100 stored up to that time to the carry-in speed adjustment chamber 32. For this reason, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 of the third base material supply adjusting unit 23 gradually decreases. The decompression standby chamber 31 is depressurized and is almost in a vacuum state. The decompression standby chamber 31 is in a state where the partition valve of the outlet 55 is open!

The carry-in speed adjusting chamber 32 has a carry-in port 55 serving as a carry-out port 55 of the decompression standby chamber 31 and is open in this state. The fourth base material supply adjusting unit 24 in the carry-in speed adjusting chamber 32 continuously receives the plastic base material 100 from the third base material supply adjusting unit 23. Loading speed The pressure adjusting chamber 32 is depressurized and is almost in a vacuum state. The fourth base material supply adjusting unit 24 in the carry-in speed adjusting chamber 32 is constant while the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 is widened. As a result, the plastic substrate 100 is continuously received, while the received amount is continuously sent out. In the carry-in speed adjustment chamber 32, the partition valve of the carry-out port 65 is open.

 [0061] The vacuum processing chamber 33 has a carry-in port 65 serving as a carry-out port 65 of the carry-in speed adjusting chamber 32, and is open in this state. The vacuum processing section of the vacuum processing chamber 33 performs, for example, a film forming process by the CVD method on the plastic base material 100 continuously conveyed by the third base material supply adjusting section 23. The inside of the vacuum processing chamber 33 is depressurized and is almost in a vacuum state. In the vacuum processing chamber 33, the partition valve of the outlet 66 is open. Since the vacuum processing chamber 33 operates in the same manner from the first to the fourth process, the description of the second to fourth processes is omitted.

 [0062] The carry-out speed adjusting chamber 34 has a carry-in port 66 serving as a carry-out port 66 of the vacuum processing chamber 33, and is open in this state. The fifth base material supply adjusting unit 25 in the carry-out speed adjusting chamber 34 continuously receives the plastic base material 100 from the vacuum processing chamber 33. The inside of the carry-out speed adjustment chamber 34 is depressurized and is almost in a vacuum state. The fifth substrate supply adjusting unit 25 in the carry-out speed adjusting chamber 34 is constant with the vertical distance between the second and fourth transfer rolls 42 and 44 and the third transfer roll 43 kept small. As a result, the plastic base material 100 is continuously received, while the received amount is continuously sent out. In the unloading speed adjusting chamber 34, the partition valve of the unloading port 67 is open! /.

 [0063] The return pressure standby chamber 35 has a carry-in port 67 serving as a carry-out port 67 of the carry-out speed adjustment chamber 34, and is open in this state, and the plastic substrate 100 from the fifth substrate supply adjustment unit 25 is opened. Are received continuously. The return pressure standby chamber 35 is depressurized and is almost in a vacuum state. In the sixth base material supply adjusting unit 26 in the return pressure standby chamber 35, the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored in the return pressure standby chamber 35 without being sent out. The decompression standby chamber 35 is in a state in which the partition valve of the carry-out port 68 is closed.

[0064] The return pressure chamber 36 has a carry-in port 68 serving as a carry-out port 68 of the return pressure standby chamber 35. Then it is closed. The return pressure chamber 36 does not receive the plastic base material 100 from the sixth base material supply adjustment unit 26, but sends out the plastic base material 100 stored so far to the eighth base material supply adjustment unit 28. For this reason, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 of the seventh base material supply adjusting unit 27 is gradually reduced. The inside of the return pressure chamber 36 is not depressurized and has an atmosphere similar to the atmosphere in which the eighth base material supply adjusting unit 28 is placed. The return pressure chamber 36 is in a state in which the partition valve of the carry-out port 69 is opened.

[0065] The eighth base material supply adjusting unit 28 removes the plastic base material 100 from the return pressure chamber 36 while maintaining a large vertical distance between the second and fourth transport rolls 42, 44 and the third transport roll 43. Conveying continuously while receiving.

 [0066] The base material recovery means 15 continuously recovers the plastic base material 100 from the eighth base material supply adjustment unit 28.

 [0067] FIG. 3 shows a state when the storage of the plastic substrate 100 in the decompression chamber 30 is completed as described above.

 [0068] (Second step)

 When the first step is completed, the substrate processing apparatus 10 then proceeds to the second step as shown in FIG. At this time, first, the loading ports 52, 55, 67 of the decompression chamber 30, the loading speed adjustment chamber 32 and the return pressure standby chamber 35, and the loading port 69 of the return pressure chamber 36 are closed. There is no limitation on the timing of transferring to the first process force and the second process. In addition, when the process shifts from the first step to the second step, the plastic substrate 100 is continuously supplied from the substrate supply means 11, and the substrate recovery means 15 continues the plastic substrate 100 by the supplied amount. And collected.

 [0069] In the first base material supply adjusting unit 21, the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored without being sent out.

 [0070] The decompression chamber 30 does not receive or send out the plastic substrate 100, and keeps it stored. In the decompression chamber 30, the carry-in port 52 and the carry-out port 53 are closed! /, And the gap is closed. In this state, the pressure in the chamber is gradually reduced.

[0071] The decompression standby chamber 31 is kept in a vacuum state, and does not receive or send out the plastic substrate 100 but remains stored. The decompression waiting room 31 has its inlet 53 and The carry-out port 55 is! /, And the gap is closed! /

 The carry-in speed adjustment chamber 32 has a carry-in port 55 closed and a carry-out port 65 opened. The inside of the loading speed adjustment chamber 32 is depressurized and is almost in a vacuum state. The carry-in speed adjusting chamber 32 does not receive the plastic base material 100 from the third base material supply adjusting unit 23, but sends out the plastic base material 100 stored up to that time to the carry-in speed adjusting chamber 32. For this reason, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 of the third base material supply adjusting unit 23 is gradually reduced.

 The carry-out speed adjustment chamber 34 has its carry-in port 66 open, and continuously receives the plastic substrate 100 from the vacuum processing chamber 33. The inside of the carry-out speed adjusting chamber 34 is depressurized and is almost in a vacuum state. In the fifth base material supply adjusting unit 25 in the carry-out speed adjusting chamber 34, the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored in the unloading speed adjusting chamber 34 without being sent out. The carry-out speed adjustment chamber 34 is in a state in which the carry-out port 67 is closed.

 [0074] In the return pressure standby chamber 35, the chamber is kept in a vacuum state, and does not receive or send out the plastic substrate 100, but remains stored. The return pressure standby chamber 35 has both a carry-in port 67 and a carry-out port 68 closed.

 [0075] The return pressure chamber 36 does not receive or send out the plastic substrate 100, and remains stored. The return pressure chamber 36 has both its carry-in port 68 and carry-out port 69 closed, and in this state, the pressure in the chamber is gradually reduced.

 [0076] The eighth base material supply adjusting unit 28 does not receive the plastic base material 100, and gradually reduces the vertical distance between the second and fourth transporting rolls 42 and 44 and the third transporting roll 43. Thus, the stored plastic base material 100 is continuously sent out to the base material collecting means 15.

 [0077] (3rd step)

When the second step is completed, the substrate processing apparatus 10 then proceeds to the third step as shown in FIG. At this time, first, the inlets 53 and 68 of the decompression standby chamber 31 and the decompression chamber 36 are opened. The timing for shifting from the second step to the third step is not limited. In the present embodiment, the process proceeds to the third step when the decompression chamber 30 and the decompression chamber 36 are in a vacuum state in the second step. Shall be migrated. In addition, when the process shifts from the second process to the third process, the base material supply means 11 continuously supplies the plastic base material 100, and the base material recovery means 15 is supplied to the plastic base material by the supplied amount. 100 is collected continuously.

 [0078] The first base material supply adjusting unit 21 continuously increases the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 so that the plastic base material 100 continues. On the other hand, store without sending out.

 [0079] The decompression chamber 30 is almost in a vacuum state, and continuously feeds the stored plastic base material 100. The inlet 52 of the decompression chamber 30 is closed and the outlet 53 is open!

 [0080] The decompression standby chamber 31 has its carry-in port 53 open, and continuously receives the plastic substrate 100 from the decompression chamber 30. The inside of the decompression standby chamber 31 is almost in a vacuum state. In the third base material supply adjusting unit 23 in the decompression standby chamber 31, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored in the decompression standby chamber 31 without being sent out. The decompression standby chamber 31 is in a state in which its outlet 55 is closed.

 The carry-in speed adjustment chamber 32 has a carry-in port 55 closed and a carry-out port 65 opened. The inside of the loading speed adjustment chamber 32 is depressurized and is almost in a vacuum state. The carry-in speed adjustment chamber 32 does not receive the plastic base material 100 from the third base material supply adjustment unit 23 as in the second process, but sends out the plastic base material 100 that has been stored up to that time to the carry-in speed adjustment chamber 32. ing. Therefore, the vertical force between the second and fourth transport rolls 42 and 44 and the third transport roll 43 of the fourth base material supply adjusting unit 24 is further reduced.

 [0082] The carry-out speed adjustment chamber 34 has its carry-in entrance 66 open, and continuously receives the plastic substrate 100 from the vacuum processing chamber 33! /. The inside of the carry-out speed adjustment chamber 34 is depressurized and is almost in a vacuum state. In the fifth base material supply adjusting unit 25 in the carry-out speed adjusting chamber 34, the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43 gradually increases as in the second step. As a result, the plastic substrate 100 is continuously received, but stored in the carry-out speed adjusting chamber 34 without being sent out. The unloading speed adjusting chamber 34 is in a state where its unloading port 67 is closed.

[0083] The return pressure standby chamber 35 is almost in a vacuum state, and the stored plastic base material 100 is stored in the vacuum chamber 35. Send out continuously. The inlet port 67 of the return pressure standby chamber 35 is closed and the outlet port 68 is open.

[0084] The return pressure chamber 36 has its carry-in port 68 open, and continuously receives the plastic substrate 100 from the return pressure standby chamber 35. The inside of the return pressure chamber 36 is almost in a vacuum state. In the seventh base material supply adjusting unit 27 in the return pressure chamber 36, the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 gradually increases. As a result, the plastic substrate 100 is continuously received, but stored in the return pressure chamber 36 without being sent out. The return pressure chamber 36 is in a state where its outlet 69 is closed.

 [0085] Similar to the second step, the eighth base material supply adjusting unit 28 does not receive the plastic base material 100, and gradually increases the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43. The plastic base material 100 that has been stored is continuously sent out to the base material recovery means 15

FIG. 6 shows a state where the feeding of the plastic substrate 100 from the reduced pressure conveying means 12 side to the return pressure conveying means 14 side is completed in the third step as described above.

 [0087] (Process 4)

 When the third step is completed, the substrate processing apparatus 10 then proceeds to the fourth step as shown in FIG. At this time, first, the inlets 53 and 68 of the decompression standby chamber 31 and the decompression chamber 36 are closed. The timing for shifting from the third process to the fourth process is not limited. In the present embodiment, it is assumed that in the third step, the process immediately shifts to the fourth step at the timing when the feeding of the plastic substrate 100 from the reduced pressure conveying means 12 side to the return pressure conveying means 14 side is completed. In addition, when the process shifts from the third step to the fourth step, the plastic base material 100 is continuously supplied from the base material supply means 11, and the base material recovery means 15 removes the plastic base material 100 by the supplied amount. Collected continuously.

 [0088] The first base material supply adjusting unit 21 continuously increases the vertical distance between the second and fourth transport rollers 42 and 44 and the third transport roller 43 so that the plastic base material 100 continues. On the other hand, store without sending out.

[0089] The decompression chamber 30 does not receive or send out the plastic substrate 100. In the decompression chamber 30, both the carry-in port 52 and the carry-out port 53 are closed. Stop the operation, gradually introduce the outdoor air, and restore the pressure in the room.

 [0090] The decompression standby chamber 31 is kept in a vacuum state, and does not receive or send out the plastic substrate 100, and remains stored. The decompression standby chamber 31 has its carry-in port 53 and carry-out port 55! /, And the gap is also closed! /.

 The carry-in speed adjustment chamber 32 has a carry-in port 55 closed and a carry-out port 65 opened. The inside of the loading speed adjustment chamber 32 is depressurized and is almost in a vacuum state. The carry-in speed adjustment chamber 32 does not receive the plastic base material 100 from the third base material supply adjustment unit 23 as in the third process, but sends the plastic base material 100 that has been stored up to that time to the carry-in speed adjustment chamber 32. ing. Therefore, the vertical force between the second and fourth transport rolls 42 and 44 and the third transport roll 43 of the fourth base material supply adjusting unit 24 is further reduced.

 [0092] The carry-out speed adjusting chamber 34 has its carry-in entrance 66 open, and continuously receives the plastic substrate 100 from the vacuum processing chamber 33! /. The inside of the carry-out speed adjustment chamber 34 is depressurized and is almost in a vacuum state. In the fifth base material supply adjusting unit 25 in the carry-out speed adjusting chamber 34, the vertical distance between the second and fourth transport rolls 42 and 44 and the third transport roll 43 gradually increases as in the third step. As a result, the plastic substrate 100 is continuously received, but stored in the carry-out speed adjusting chamber 34 without being sent out. The unloading speed adjusting chamber 34 is in a state where its unloading port 67 is closed.

 [0093] In the return pressure standby chamber 35, the chamber is kept in a vacuum state, and does not receive or send out the plastic substrate 100, and remains stored. The return pressure standby chamber 35 has both a carry-in port 67 and a carry-out port 68 closed.

 [0094] The return pressure chamber 36 does not receive or send out the plastic substrate 100, and remains stored. The return pressure chamber 36 has both its inlet 68 and outlet 69 closed. In this state, the operation of the decompression unit 50 is stopped, the outdoor air is gradually introduced, and the room is restored.

 [0095] The eighth base material supply adjusting unit 28 does not receive the plastic base material 100, and further gradually reduces the vertical distance between the second and fourth transport holes 42, 44 and the third transport roll 43. As a result, the stored plastic base material 100 is continuously sent out to the base material collecting means 15.

[0096] When the fourth step is completed, the substrate processing apparatus 10 then proceeds to the first step again as shown in FIG. At this time, first, the decompression chamber 30, the carry-in speed adjustment chamber 32, and the return pressure standby chamber 35 The carry-in ports 52, 55, 67 and the carry-out port 69 of the return pressure chamber 36 are opened. There is no limitation on the timing of the transition from the fourth process to the first process. In the present embodiment, it is assumed that the first process is immediately started at the timing when the decompression of the decompression chamber 30 and the decompression chamber 36 is completed in the fourth process and the atmosphere becomes the same as the outdoor air. In addition, the plastic substrate 100 is continuously supplied from the substrate supply means 11 when shifting from the fourth process to the first process, and the substrate recovery means 15 continues the plastic substrate 100 by the supplied amount. And collected. Subsequent processing is further performed on the plastic substrate 100 that has been subjected to the predetermined processing to manufacture, for example, a TFT substrate or its counter substrate, and a display device such as a liquid crystal display device is manufactured using the TFT substrate.

 [0097] Through the cycle of the first to fourth steps described above, the plastic substrate 100 is continuously supplied in a vacuum state while being continuously supplied, and can be continuously recovered as it is.

 That is, the decompression chamber 30 provided with the first base material supply adjustment unit 21 and the second base material supply adjustment unit 22 provided in the rear stage of the base material supply means 11 in the front stage of the vacuum processing chamber 33, It is provided with a decompression conveying means 12 composed of a decompression standby chamber 31 provided with a third base material supply adjustment unit 23 and a carry-in speed adjustment chamber 32 provided with a fourth base material supply adjustment unit 24. Therefore, the plastic substrate 100 placed in an air atmosphere by a combination of these transport operations can be reliably processed in a vacuum state while being transported continuously. In addition, the unloading speed adjusting chamber 34 and the sixth substrate supply adjusting unit 26 provided in the subsequent stage of the substrate vacuum processing means 13 and provided with the fifth substrate supply adjusting unit 25 are provided in the subsequent stage of the vacuum processing chamber 33. Provided with the return pressure waiting chamber 35, the return pressure chamber 36 provided with the seventh base material supply adjusting unit 27, and the return pressure conveying means 14 configured by the eighth base material supply adjusting unit 28. The combination of these transport operations enables the plastic substrate 100 placed in a vacuum state to be reliably sent out to the atmosphere while being transported continuously.

[0099] The plastic base material 100 supplied to the base material supply means 11 does not have to be in the form of a scroll, and is continuously transported from another processing step according to the transport speed of the entire apparatus. It may be a thing. In addition, it may be intermittently conveyed so that conveyance and stop are repeated as long as the average conveyance speed is met. Also, it is sent out from the substrate recovery means 15 If the plastic base material 100 to be collected does not have to be collected in the form of a scroll, the plastic base material 100 may be transported to the next step as it is, and then subjected to predetermined processing. Moreover, if it matches with the conveyance speed at the time of averaging, it may be conveyed intermittently and repeatedly to the next process. Also, in the vacuum processing chamber 33, the carrying of the plastic substrate 100 from the carry-in speed adjusting chamber 32 and the carrying out to the carry-out speed adjusting chamber 34 are stopped and transferred in accordance with the vacuum processing method in the vacuum processing chamber 33. It is good also as intermittent conveyance which repeats. In addition, the transfer valve 65 of the vacuum processing chamber 33 and the partition valve of the discharge item 66 may be opened and closed in accordance with the stop of the intermittent transfer.

 [0100] Further, if the treated plastic substrate 100 is to be collected at a place in a vacuum state, it is processed by the substrate collecting means 15 directly from the vacuum processing means without going through the return pressure conveying means 14. The plastic substrate 100 may be recovered.

 [0101] Furthermore, the substrate processing apparatus according to the present invention includes PD (plasma display panel; ¾ I ^ KL ^ organic electroluminescence), (u, ¾ It can also be used effectively in the manufacture of other display devices such as ED (surface-conduction electron-emitter display).

 [0102] (Function and effect)

 Next, the function and effect will be described.

 [0103] The substrate processing apparatus 10 according to the embodiment of the present invention includes a substrate supply unit 11 that continuously supplies a long plastic substrate 100, and a plastic substrate 100 from the substrate supply unit 11. The vacuum conveying means 12 for reducing the conveying atmosphere to a vacuum state and the plastic substrate 100 from the reduced pressure conveying means 12 for a predetermined treatment in a vacuum atmosphere while continuously conveying And a base material recovery means 15 for continuously recovering the processed plastic base material 100 from the base material vacuum processing means 13.

 [0104] According to such a configuration, each treatment can be reliably and continuously performed on the plastic substrate 100 while maintaining its shape and maintaining a vacuum state.

 Industrial applicability

[0105] As described above, the present invention provides a substrate processing apparatus and a manufacturing of a display device using the same. Useful for the method.

Claims

The scope of the claims
 [1] a substrate supply means for continuously supplying a long flexible substrate;
 A reduced-pressure conveying means for continuously conveying the flexible base material from the base material supplying means and reducing the conveying atmosphere to a vacuum state;
 A base material vacuum processing means for performing a predetermined treatment in a vacuum atmosphere while continuously transporting the flexible base material from the reduced pressure transport means;
 Base material collecting means for continuously collecting the processed flexible base material from the base material vacuum processing means;
 A substrate processing apparatus comprising:
 [2] In the substrate processing apparatus according to claim 1,! /
 The reduced pressure conveying means is
 After receiving and storing the flexible base material from the base material supply means, or while receiving it, a first base material supply adjusting section for continuously sending out the flexible base material;
 After receiving and storing the flexible substrate from the first substrate supply adjustment unit, or while receiving it, the second substrate supply adjustment unit that continuously sends out the flexible substrate, and the indoor atmosphere is depressurized. A decompression chamber provided with a decompression section that performs decompression of the indoor atmosphere, and after receiving and storing the flexible base material from the second base material supply adjustment section, or while receiving A decompression standby chamber provided with a third base material supply adjusting section for continuously sending out the flexible base material, and a decompression section for decompressing the indoor atmosphere;
 After receiving and storing the flexible base material from the third base material supply adjustment unit, or while receiving it, the fourth base material supply adjustment unit that continuously sends out the flexible base material, and reducing the indoor atmosphere A depressurization section, a carry-in speed adjustment chamber provided with,
 A substrate processing apparatus comprising:
[3] In the substrate processing apparatus according to claim 2,
 The base material vacuum processing means includes a vacuum processing unit that performs a predetermined process on the flexible base material continuously conveyed from the fourth base material supply adjustment unit, and a decompression unit that decompresses the indoor atmosphere. A substrate processing apparatus provided with a vacuum processing chamber.
[4] In the substrate processing apparatus according to claim 3, The decompression chamber, the decompression standby chamber, the carry-in speed adjustment chamber, and the vacuum processing chamber are respectively opened and closed to open and close the carry-in port and the carry-out port of the flexible base material, and the carry-in port and the carry-out port, respectively. And a substrate processing apparatus provided with a section.
[5] In the substrate processing apparatus according to claim 2,
 Each of the first, second, third and fourth base material supply adjusting sections reciprocates in a direction intersecting the conveyance direction of the flexible base material while rotating while contacting the surface of the flexible base material. By this, the substrate processing apparatus which has the substrate supply adjustment tool comprised so that the conveyance path | route of a flexible substrate may be changed.
[6] In the substrate processing apparatus according to claim 1,! /
 A return pressure conveying means provided between the substrate vacuum processing means and the substrate recovery means, for continuously conveying the flexible substrate from the substrate vacuum processing means and for restoring the conveying atmosphere; A substrate processing apparatus further provided.
[7] In the substrate processing apparatus according to claim 6,
 The return pressure conveying means includes:
 After receiving and storing the flexible base material from the base material vacuum processing means, or receiving the flexible base material, the fifth base material supply adjusting section for continuously sending out the flexible base material and the indoor atmosphere are depressurized. A decompression section, a carry-out speed adjustment chamber provided with,
 After receiving and storing the flexible base material from the fifth base material supply adjusting unit, or receiving the flexible base material, the sixth base material supply adjusting unit that continuously sends out the flexible base material, and the indoor atmosphere is depressurized. A decompression section, a return pressure standby chamber provided with,
 After receiving and storing the flexible substrate from the sixth substrate supply adjusting unit, or while receiving it, the seventh substrate supply adjusting unit that continuously sends out the flexible substrate, and the indoor atmosphere is reduced. A decompression unit that performs the decompression, a decompression unit that decompresses the indoor atmosphere, and after receiving and storing the flexible base material from the seventh base material supply adjustment unit or while receiving the flexible base material An eighth base material supply adjusting unit for continuously feeding out the flexible base material;
 A substrate processing apparatus comprising:
[8] A substrate supplying step for continuously supplying a long flexible substrate;
The continuously supplied flexible base material is continuously transported and the transport atmosphere is reduced. A reduced-pressure conveying step to press and form a vacuum state;
 A base material vacuum processing step for performing predetermined processing in a vacuum atmosphere while continuously transporting the flexible base material transported under reduced pressure;
 A substrate recovery step of continuously recovering the flexible substrate that has been subjected to the predetermined treatment, and a method for manufacturing a display device.
[9] In the method for manufacturing a display device according to claim 8,
 The reduced pressure conveying step includes
 After receiving and storing the flexible base material supplied in the base material supply step, or receiving the flexible base material, the front base material supply adjusting step for continuously feeding the flexible base material, and the pre-stage base material supply Receiving and storing the flexible substrate sent out in the adjustment step, holding the flexible substrate while reducing the surrounding atmosphere to a vacuum state, and then continuously conveying the flexible substrate Steps,
 A pressure reduction standby step of continuously conveying the flexible base material while maintaining the vacuum state after receiving and storing the flexible base material continuously conveyed in the decompression step in a vacuum atmosphere, or receiving it;
 The carry-in speed adjustment step of continuously transporting the flexible base material while maintaining the vacuum state after receiving or storing the flexible base material transported continuously in the vacuum standby step in a vacuum atmosphere When,
 A method for manufacturing a display device comprising:
[10] In the manufacturing method of the display device according to claim 9,
 The decompression step is performed in the decompression chamber, and after the flexible base material is sent out from the decompression chamber, the decompression chamber is decompressed, and the decompression chamber is decompressed and supplied in the base material supply step. A method for manufacturing a display device that receives a flexible substrate.
[11] In the method for manufacturing a display device according to claim 8,
 Provided between the base material vacuum processing step and the base material recovery step, and continuously transporting the flexible base material from the base material vacuum processing step and returning the transport atmosphere. A method for manufacturing a display device, further comprising a step.
[12] A method for manufacturing a display device according to claim 11! / The return pressure transfer step
 The unloading speed for continuously transporting the flexible substrate while maintaining the vacuum state after receiving or storing the flexible substrate continuously transported in the substrate vacuum processing step in a vacuum atmosphere or while receiving it. An adjustment step;
 After receiving and storing the flexible base material continuously conveyed in the unloading speed adjusting step, or while receiving it, waiting for the return pressure to continuously send out the flexible base material while maintaining the vacuum state. From the pressure-recovering step of continuously conveying the flexible substrate, and holding the flexible substrate while restoring the ambient atmosphere. A subsequent base material supply adjustment step of continuously feeding out and storing the flexible base material while receiving or storing the flexible base material,
A method for manufacturing a display device comprising:
 In the manufacturing method of the display device according to claim 12,
 The return pressure step is performed in the return pressure chamber, and after returning the flexible base material from the return pressure chamber, the return pressure chamber is depressurized, and the return pressure waiting step is performed in a state where the return pressure chamber is reduced. A method of manufacturing a display device that receives a flexible base material supplied in the above.
PCT/JP2007/069247 2006-12-18 2007-10-02 Base material processing apparatus and method for manufacturing display device using the base material processing apparatus WO2008075493A1 (en)

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JP5838964B2 (en) * 2010-04-09 2016-01-06 株式会社ニコン Substrate cartridge and substrate processing system

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