JP2011081406A - Optical member, optical system using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical member which can maintain a high performance antireflective effect over a long period of time with respect to an arbitrary substrate. <P>SOLUTION: The optical member includes a multilayer body formed on the surface of the substrate. In the optical member, at least one layer is a metal oxide layer 27 having a pore, and at least one layer mainly comprising an organic resin 26 is arranged between the substrate 25 and the metal oxide layer 27. The metal oxide layer is a plate-like crystal layer comprising a plate-like crystal mainly containing aluminum oxide, and the surface of the plate-like crystal layer has projections and recesses. At least a part of the organic resin has an aromatic ring and/or an imide ring. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an optical member having antireflection performance and an optical system using the same, and more specifically, an optical member suitable for stably obtaining high antireflection performance in the long term from the visible region to the near infrared region. And an optical system using the same.

  It is known that an antireflection structure using a fine periodic structure with a wavelength equal to or smaller than the wavelength in the visible light region exhibits excellent antireflection performance in a wide wavelength region by forming a fine periodic structure with an appropriate pitch and height. ing. As a method for forming a fine periodic structure, coating of a film in which fine particles having a particle diameter equal to or smaller than a wavelength are dispersed (Patent Document 1) is known.

  In addition, a method for forming a fine periodic structure by pattern formation using a fine processing apparatus (such as an electron beam drawing apparatus, a laser interference exposure apparatus, a semiconductor exposure apparatus, or an etching apparatus) can control the pitch and height. It is also known that a fine periodic structure having excellent antireflection properties can be formed (Patent Document 2).

  As another method, it is also known that boehmite, which is an aluminum hydroxide oxide, is grown on a substrate to obtain an antireflection effect. In these methods, an aluminum oxide (alumina) film formed by a vacuum film formation method (Patent Document 3) or a liquid phase method (sol-gel method) (Patent Document 4) is subjected to steam treatment or hot water immersion treatment, and the surface layer is boehmite. To form a fine periodic structure to obtain an antireflection film.

In addition, an antireflection film has been proposed in which a film having a refractive index intermediate between a base material and boehmite mainly composed of SiO ₂ is provided between the base material and boehmite (Patent Document 5).

Japanese Patent No. 0335944 Japanese Patent Laid-Open No. 50-70040 Japanese Patent Publication No. 61-48124 JP-A-9-202649 JP 2006-259711 A

  A metal oxide or metal halide layer formed by a technique using fine particles or a method of growing boehmite on a substrate has simple and high productivity and exhibits excellent optical performance. On the other hand, since the denseness is low and there are a large number of voids, moisture from the outside world easily reaches the base material, and base material erosion and base material components such as alkali ions are easily eluted. Furthermore, there is a problem that the elution component makes it difficult to maintain the fine structure and the performance is lowered.

In addition, in the antireflection film in which a film mainly composed of SiO ₂ is provided between the base material and boehmite, film components are eluted from the film mainly composed of SiO ₂ by hot water treatment, and the optical characteristics are changed. There was a thing.

  An antireflection film using a fine periodic structure that can be more easily formed and has high reliability by low-temperature firing is desired.

  The present invention has been made in view of such background art, and an optical member capable of maintaining a high-performance antireflection effect over a long period of time on an arbitrary base material, an optical system using the same, and an optical system An object of the present invention is to provide a manufacturing method of a member for use.

  In order to achieve the above object, the present invention provides an optical member configured as follows.

  The present invention is an optical member in which a laminate is formed on the surface of a substrate, and at least one layer is a plate crystal layer formed of a plate crystal mainly composed of aluminum oxide, and the substrate and the plate An optical member comprising a layer mainly composed of at least one organic resin between the crystal layer and the organic resin having an aromatic ring or / and an imide ring in the main chain.

  Further, the present invention is an optical system characterized in that it is one selected from an observation optical system, a photographing optical system, a projection optical system, and a scanning optical system having the optical member described above. .

ADVANTAGE OF THE INVENTION According to this invention, the optical member which can exhibit the high antireflection effect stably over a long term can be provided.
In addition, according to the present invention, an optical system having the above optical member can be provided.

It is the schematic which shows one embodiment of the transparent member for optics of this invention. It is the schematic which shows the refractive index distribution of one embodiment of the transparent member for optics of this invention. It is the schematic which shows one embodiment of the transparent member for optics of this invention. It is a photograph (magnification: 100,000 times) which shows the observation result from the upper surface by FE-SEM of the thin film which has the fine unevenness | corrugation on the surface formed in the glass substrate in Example 1. FIG. It is a photograph (magnification: 150,000 times) which shows the cross-sectional observation result by FE-SEM of the thin film which has the fine unevenness | corrugation on the surface formed in the glass substrate in Example 1. FIG. It is a front view of this invention Example 16. It is sectional drawing of this invention Example 16. FIG. It is a front view of this invention Example 17. It is sectional drawing of this invention Example 17. FIG. It is a front view of this invention Example 18. It is sectional drawing of this invention Example 18. FIG. It is a front view of this invention Example 19. It is sectional drawing of this invention Example 19. FIG. It is a front view of this invention Example 20. It is sectional drawing of this invention Example 21. FIG. It is sectional drawing of this invention Example 22. FIG. It is sectional drawing of this invention Example 23.

Hereinafter, the present invention will be described in detail.
FIG. 1 is a schematic schematic cross-sectional view showing an optical member according to this embodiment. In FIG. 1, the optical member of the present invention is a plate crystal in which a layer 26 mainly composed of an organic resin is formed on the surface of a substrate 25 and a plate crystal mainly composed of aluminum oxide is formed on the surface thereof. A laminate composed of the layer 27 is formed. The plate-like crystal forming the plate-like crystal layer 27 which is a layer of the laminate is a film in which the surface layer of the aluminum oxide film is subjected to a peptization action or the like by immersing a film mainly composed of aluminum oxide in warm water. This refers to plate-like crystals that precipitate and grow on the surface layer.

  The plate-like crystal layer 27 is preferably a layer whose refractive index continuously increases from the surface layer side toward the base material side, and the refractive index change with respect to the film thickness is as shown in FIG. It can be represented by a straight line or a curve such as (b) and (c). Since the refractive index continuously increases from the surface layer side toward the base material side, the reflectance reduction effect is greater than when layers having a high refractive index are stacked in order from the surface layer side.

  Furthermore, since the refractive index of the plate-like crystal layer 27 continuously increases from the surface layer side toward the base material side, the surface is preferably uneven. FIG. 3 shows a schematic schematic cross-sectional view showing the optical member according to the present embodiment in that case.

  In FIG. 3, the optical member of the present invention includes a plate-like crystal layer 30 formed on a base material 28 from a layer 29 mainly composed of an organic resin and a plate-like crystal mainly composed of aluminum oxide. Have

  The surface of the plate crystal layer 30 has an uneven shape 31.

The plate-like crystal layer 30 mainly composed of aluminum oxide is formed from crystals mainly composed of an oxide or hydroxide of aluminum or a hydrate thereof. A particularly preferable crystal is boehmite. Further, by arranging these plate crystals, the end portions form fine uneven shapes 31, so that the plate crystals are selectively used to increase the height of the fine unevenness and narrow the interval. It is arranged at a specific angle with respect to the surface of the substrate. In the present application, an oxide or hydroxide of aluminum or a hydrate thereof is referred to as aluminum oxide. In addition, aluminum oxide alone or one or more oxide layers containing any of ZrO ₂ , SiO ₂ , TiO ₂ , ZnO, and MgO and containing 70 mol% or more of aluminum oxide are mainly composed of aluminum oxide. It shall be called a layer.

  The case where the surface of the base material 28 is a flat surface such as a flat plate, a film or a sheet is shown in FIG. The plate-like crystal has an average angle of an angle θ1 of 45 ° or more and 90 ° or less, preferably 60 ° or more and 90 ° or less with respect to the surface of the substrate, that is, the inclination direction 32 of the plate-like crystal and the substrate surface. It is desirable to arrange so that.

  A case where the surface of the substrate 28 has a two-dimensional or three-dimensional curved surface is shown in FIG. The plate-like crystal has an average angle θ2 of 45 ° or more and 90 ° or less, preferably 60 ° or more and 90 ° with respect to the surface of the substrate, that is, between the inclination direction 32 of the plate crystal and the tangent 33 of the substrate surface. It is desirable to arrange it so that it is below °. Note that the values of the angles θ1 and θ2 may exceed 90 ° depending on the inclination of the plate-like crystal. In this case, the values are measured to be 90 ° or less.

  The layer thickness of the plate-like crystal layer 30 is preferably 20 nm or more and 1000 nm or less, and more preferably 50 nm or more and 1000 nm or less. When the layer thickness for forming the unevenness is 20 nm or more and 1000 nm or less, the antireflection performance by the fine uneven structure is effective, and the mechanical strength of the uneven structure is eliminated, and the manufacturing cost of the fine uneven structure is advantageous. Become. In addition, when the layer thickness is 50 nm or more and 1000 nm or less, the antireflection performance is further improved, which is more preferable.

  The surface density of the fine irregularities of the present invention is also important, and the average surface roughness Ra ′ value obtained by expanding the corresponding centerline average roughness is 5 nm or more, more preferably 10 nm or more, more preferably 15 nm or more and 100 nm or less, The surface area ratio Sr is 1.1 or more. More preferably, it is 1.15 or more, More preferably, it is 1.2 or more and 3.5 or less.

  As one of the evaluation methods for the obtained fine uneven structure, there is observation of the surface of the fine uneven structure with a scanning probe microscope, and the average surface roughness Ra ′ obtained by extending the center line average roughness Ra of the film by the observation. The value and the surface area ratio Sr are determined. That is, the average surface roughness Ra ′ value (nm) is obtained by applying the centerline average roughness Ra defined in JIS B 0601 to the measurement surface and extending it three-dimensionally. The absolute value of the deviation up to the average value ”is expressed by the following equation (1).

Ra ′: average surface roughness value (nm),
S ₀ : Area when the measurement surface is ideally flat, | X _R −X _L | × | Y _T −Y _B |, F (X, Y): High at the measurement point (X, Y) X is the X coordinate, Y is the Y coordinate,
X _L to X _R : X coordinate range of the measurement surface,
Y _B to Y _T : Y coordinate range of the measurement surface,
Z ₀ : average height in the measurement plane

The surface area ratio Sr is Sr = S / S ₀ [S ₀ : Area when the measurement surface is ideally flat. S: Surface area of the actual measurement surface. ]. The actual surface area of the measurement surface is obtained as follows. First, it is divided into minute triangles composed of the three closest data points (A, B, C), and then the area ΔS of each minute triangle is obtained using a vector product. ΔS (ΔABC) = [s (s−AB) (s−BC) (s−AC)] 0.5 [where AB, BC, and AC are the lengths of each side, and s≡0.5 ( AB + BC + AC)], and the sum of ΔS is the surface area S to be obtained. When the surface density of the fine irregularities is Ra ′ is 5 nm or more and Sr is 1.1 or more, antireflection by the irregular structure can be expressed. If Ra ′ is 10 nm or more and Sr is 1.15 or more, the antireflection effect is higher than that of the former. When Ra ′ is 15 nm or more and Sr is 1.2 or more, the performance can withstand actual use. However, when Ra ′ is 100 nm or more and Sr is 3.5 or more, the effect of scattering by the concavo-convex structure is superior to the antireflection effect, and sufficient antireflection performance cannot be obtained.

  In the present invention, the plate crystal layer 30 formed of a plate crystal containing aluminum oxide as a main component is composed of a layer 29 containing an organic resin as a main component and a metal Al alone film or metal Al and metal Zn, metal A metal film containing any of Mg is formed. Then, it is formed by being immersed in warm water of 50 ° C. or higher and / or exposed to water vapor. At this time, an uneven shape 31 is formed on the metal surface by hydration, dissolution, and reprecipitation. A layer mainly composed of aluminum oxide is formed on the layer 29 mainly composed of an organic resin. The plate-like crystal layer 30 can be formed by selectively dissolving or precipitating the surface. The layer containing aluminum oxide as a main component can be formed by known CVD, PVD vapor phase method, liquid phase method such as sol-gel method, hydrothermal synthesis using an inorganic salt, or the like. In such a method of providing a plate-like crystal of aluminum oxide, an amorphous aluminum oxide layer may remain below the uneven shape 31 in the plate-like crystal layer 30.

  Since a uniform antireflection layer can be formed on a large area or non-planar substrate, a gel film formed by applying a sol-gel coating solution containing aluminum oxide is treated with warm water to produce alumina plate crystals. The method of growing is preferable.

As a raw material for a gel film obtained from a sol-gel coating solution containing aluminum oxide, an Al compound and / or at least one compound of each of Zr, Si, Ti, Zn, and Mg are used together with the Al compound. As raw materials for Al ₂ O ₃ , ZrO ₂ , SiO ₂ , TiO ₂ , ZnO, and MgO, each metal alkoxide, salt compound such as chloride and nitrate can be used. From the viewpoint of film forming properties, it is particularly preferable to use a metal alkoxide as a ZrO ₂ , SiO ₂ , or TiO ₂ raw material.

  Examples of the aluminum compound include aluminum ethoxide, aluminum isopropoxide, aluminum-n-butoxide, aluminum-sec-butoxide, aluminum-tert-butoxide, and aluminum acetylacetonate. Moreover, these oligomers, aluminum nitrate, aluminum chloride, aluminum acetate, aluminum phosphate, aluminum sulfate, aluminum hydroxide, etc. are mentioned.

  Specific examples of the zirconium alkoxide include the following. Zirconium tetramethoxide, zirconium tetraethoxide, zirconium tetra n-propoxide, zirconium tetraisopropoxide, zirconium tetra n-butoxide, zirconium tetra t-butoxide and the like.

As the silicon alkoxide, various compounds represented by the general formula Si (OR) ₄ can be used. R may be the same or different lower alkyl group such as methyl group, ethyl group, propyl group, isopropyl group, butyl group and isobutyl group.

  Examples of the titanium alkoxide include tetramethoxy titanium, tetraethoxy titanium, tetra n-propoxy titanium, tetraisopropoxy titanium, tetra n-butoxy titanium, and tetraisobutoxy titanium.

  Examples of the zinc compound include zinc acetate, zinc chloride, zinc nitrate, zinc stearate, zinc oleate, and zinc salicylate, with zinc acetate and zinc chloride being particularly preferred.

  Examples of the magnesium compound include magnesium alkoxides such as dimethoxy magnesium, diethoxy magnesium, dipropoxy magnesium and dibutoxy magnesium, magnesium acetylacetonate, magnesium chloride and the like.

  Any organic solvent may be used as long as it does not cause the alkoxide or the like to gel. For example, alcohols such as methanol, ethanol, 2-propanol, butanol, ethylene glycol, or ethylene glycol mono-n-propyl ether. Various aliphatic or alicyclic hydrocarbons such as n-hexane, n-octane, cyclohexane, cyclopentane, and cyclooctane. Various aromatic hydrocarbons such as toluene, xylene, and ethylbenzene. Various esters such as ethyl formate, ethyl acetate, n-butyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate. Various ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. Various ethers such as dimethoxyethane, tetrahydrofuran, dioxane, diisopropyl ether. Various chlorinated hydrocarbons such as chloroform, methylene chloride, carbon tetrachloride, tetrachloroethane. Examples include aprotic polar solvents such as N-methylpyrrolidone, dimethylformamide, dimethylacetamide, and ethylene carbonate. From the viewpoint of the stability of the solution, it is preferable to use alcohols among the various solvents described above.

  In the case of using an alkoxide raw material, aluminum, zirconium, and titanium alkoxides are particularly highly reactive with water, and are rapidly hydrolyzed by the addition of moisture and water in the air, resulting in cloudiness and precipitation of the solution. In addition, aluminum salt compounds, zinc salt compounds, and magnesium salt compounds are difficult to dissolve with only an organic solvent, and the stability of the solution is low. In order to prevent these, it is preferable to add a stabilizer to stabilize the solution.

  Examples of the stabilizer include β-diketone compounds such as acetylacetone, dipyrobaylmethane, trifluoroacetylacetone, hexafluoroacetylacetone, benzoylacetone, and dibenzoylmethane. Methyl acetoacetate, ethyl acetoacetate, allyl acetoacetate, benzyl acetoacetate, acetoacetate-iso-propyl, acetoacetate-tert-butyl, acetoacetate-iso-butyl, acetoacetate-2-methoxyethyl, 3-keto-n Β-ketoester compounds such as methyl valeric acid. Furthermore, alkanolamines such as monoethanolamine, diethanolamine, and triethanolamine can be exemplified. The addition amount of the stabilizer is preferably about 1 in terms of molar ratio to the alkoxide or salt compound. Further, after the addition of the stabilizer, it is preferable to add a catalyst for the purpose of promoting a part of the reaction in order to form an appropriate precursor. Examples of the catalyst include nitric acid, hydrochloric acid, sulfuric acid, phosphoric acid, acetic acid, ammonia and the like. As a method of forming a film using the sol-gel coating solution, for example, a known coating means such as a dipping method, a spin coating method, a spray method, a printing method, a flow coating method, and a combination thereof may be appropriately employed. it can.

  After applying the sol-gel coating liquid, it is preferable to perform heat treatment in the range of 120 ° C. or higher and 230 ° C. or lower. The higher the heat treatment temperature, the more easily the film becomes denser. However, when the heat treatment temperature exceeds 230 ° C., the substrate is damaged such as deformation. More preferably, it is 150 degreeC or more and 210 degrees C or less. The heating time depends on the heating temperature, but is preferably 10 minutes or longer.

  The gel film that has been dried or heat-treated is immersed in warm water, thereby precipitating plate crystals mainly composed of aluminum oxide to form an uneven surface shape on the outermost surface. By soaking in warm water, the surface layer of the gel film containing aluminum oxide is subjected to peptization and the like, and some components are eluted. Due to the difference in solubility of various hydroxides in warm water, plate crystals mainly composed of aluminum oxide are precipitated and grown on the surface layer of the gel film. In addition, it is preferable that the temperature of warm water shall be 40 to 100 degreeC. The hot water treatment time is about 5 minutes to 24 hours.

In hot water treatment of a gel film in which an oxide such as TiO ₂ , ZrO ₂ , SiO ₂ , ZnO, or MgO is added as a different component to a film containing aluminum oxide as a main component, the difference in solubility of each component in hot water is used to crystallize the film. Is going on. Therefore, unlike the hot water treatment of an aluminum oxide single component film, the size of the plate crystal can be controlled over a wide range by changing the composition of the inorganic component. As a result, it is possible to control the concavo-convex shape formed by the plate crystal over the wide range. Further, when ZnO is used as a subcomponent, it can be co-deposited with aluminum oxide, so that the refractive index can be controlled over a wider range, and excellent antireflection performance can be realized.

  The organic resin used for the layer 29 mainly composed of the organic resin of the present invention has a function of adjusting the refractive index of the base material 28 and the plate crystal layer 30 mainly composed of aluminum oxide, and is used. It suffices if it is transparent in the wavelength region of light to be transmitted.

  The layer 29 mainly composed of the organic resin of the present invention contributes to the development of high antireflection performance by adjusting the refractive index difference between the base material 28 and the plate crystal layer 30 mainly composed of aluminum oxide. Therefore, it should have the optimum film thickness and refractive index. And it is desired that they are stably maintained from the time of film formation. In the present application, a layer in which the organic resin contains a resin component of 80% by weight or more is referred to as a layer containing the organic resin as a main component.

  It is preferable to use an organic resin having an aromatic ring or / and an imide ring in the main chain for the layer containing the organic resin of the present invention as a main component. Examples of the aromatic ring or imide ring include structures represented by the following chemical formula.

Since an aromatic ring or an imide ring has a planar structure, an organic resin in which these structures are introduced into the main chain easily aligns molecular chains parallel to the substrate during film formation. Therefore, even when the film is used with a film thickness of several hundred nm or less like the organic resin layer 29 of the present invention, the uniformity of the film thickness and refractive index is high. Furthermore, it has excellent solvent resistance, high glass transition temperature, excellent heat resistance, and film thickness and refractive index hardly change.

  When an organic resin having no aromatic ring and / or imide ring in the main chain is used, molecular chains are entangled randomly, so that a decrease in refractive index, which seems to be caused by a decrease in density, is observed when the film is thinned. The same applies to the case where the plate-like crystal layer 30 formed of plate-like crystals containing aluminum oxide as a main component is made from a sol-gel coating solution containing aluminum oxide. That is, for the same reason as described above, dissolution in a solvent contained in the sol-gel coating liquid, change in film thickness and refractive index due to swelling, deformation during heating and drying, decomposition, and coloration are likely to occur.

  Further, in order to obtain the plate crystal layer 30 formed of plate crystals mainly composed of aluminum oxide, the gel film containing aluminum oxide is exposed to water vapor or immersed in warm water. Sometimes it is desired that the thickness and refractive index of the organic resin layer do not change as much as possible. Also from this viewpoint, the organic resin layer 29 that does not easily decompose or swell with warm water or the like like an organic resin having an aromatic ring and / or an imide ring in the main chain is preferable. Further, since the plate-like crystal layer has low film density, moisture from the outside easily passes through the metal oxide layer and reaches the substrate surface. At this time, it has been a problem that the performance of the optical member is deteriorated because the surface of the base material is eroded by moisture or the base material components are eluted. Therefore, the layer 3 or 5 containing the organic resin of the present invention as a main component is desired to have an effect of blocking moisture or the like coming from the outside via the plate crystal layer. In order to obtain such an effect, it is preferable to use an organic resin having a low water absorption rate. Such an organic resin is an organic resin having a water absorption rate of 0.05% or more and 2% or less. If the water absorption is 2% or less, moisture entering from the outside can be blocked. The water absorption rate described here is the water absorption rate of the membrane left at 23 ° C./24 hours after film formation. On the other hand, in the case of an organic resin having a water absorption rate of less than 0.05%, the adhesiveness with the substrate is remarkably low, so that even if the substrate surface is pretreated, it peels off from the substrate during hot water treatment. .

  As the kind of organic resin, any of a cured resin or a thermoplastic resin can be used as long as it is an organic resin having an aromatic ring and / or an imide ring in the main chain. The cured resin has one or more reactive or polymerization-reactive substituents such as epoxy group, oxetanyl group, episulfide group, methylol group, isocyanate group, thioisocyanate group, vinyl ether group, acryloyl, methacryloyl group, and maleimide group. A cured product of a compound or oligomer may be mentioned. Even if two or more kinds of reactive or polymerization reactive substituents are contained in one compound or oligomer, two or more kinds of compounds or oligomers having different reactive or polymerization reactive substituents are mixed and cured. A cured resin can be used. Examples of the cured resin having an aromatic ring and / or imide ring in the main chain include a cured product of bisphenol A epoxy, a cured product of m-phenylene diisocyanate, a cured product of methylol melamine resin, guanamine resin and maleimide resin.

  When a curable resin is used, an initiator or a curing agent can be used in combination when the compound is cured. The initiator is often selected from radical, cation and anion initiators depending on the reactivity of the substituents of the above compounds. In the case of thermosetting, a thermal decomposition type initiator is widely used. Examples of the thermal decomposition type initiator include N, N-azobisbutyronitrile as a radical initiator, and p-toluenesulfonic acid pyridinium salt as a cationic initiator. In thermosetting, a small amount of an organic acid such as p-toluenesulfonic acid as a cationic initiator or an organic amine such as diazabicycloundecene as an anionic initiator may be mixed. When curing is performed with light such as ultraviolet rays, a photosensitive initiator is used.

  On the other hand, thermoplastic resins having an aromatic ring or / and an imide ring in the main chain include aromatic polyethers such as polyether ketone and polyether sulfone, aromatic polyesters such as polyethylene terephthalate, aromatic polycarbonate, and aromatic polyurethane. , Aromatic polyurea, polyaromatic lyamide, thermoplastic polyimide and the like. Of these, aromatic polyethers, aromatic polysulfides, polycarbonate, and thermoplastic polyimide are more preferable from the viewpoint of heat resistance.

  Further, a thermoplastic resin is more preferable from the viewpoint that the refractive index and the film thickness do not change under baking conditions, and that there are few uncured monomers remaining.

In order to improve the adhesion between the base material 25 and the layer 29 containing an organic resin as a main component, it is preferable to use an organic resin containing a (—SiR ₂ —O—) _m siloxane structure. (However, R is a methyl group or a phenyl group, and m is an integer of 1-6.)
By improving the adhesion to the base material, it is possible to suppress film peeling, cracking and the like particularly under high temperature and high humidity.
(-SiR _{2 -O-)} an organic resin containing a _{m is, (-} SiR 2 _-O-) repeating units containing _m is 30 mol% per the total repeating units or less. If it is 30 mol% or more, a decrease in heat resistance due to a decrease in glass transition temperature and a decrease in wettability to a glass substrate occur.

  Further, the refractive index of the layer 2 or 5 containing the organic resin as a main component can be changed by changing the structure of the organic resin. For example, the refractive index increases by increasing the number of aromatic rings or the number of heterocycles contained in the organic resin. On the other hand, increasing the aliphatic chain, the alicyclic structure, the siloxane structure, the fluoroalkyl group, and the like improve the transparency and lower the refractive index. Examples of organic resins having an aromatic ring and / or imide ring in the main chain that can change the refractive index relatively easily depending on the structure include polyimide, aromatic polyethers, aromatic polysulfides, and aromatic polycarbonate. It is done. These polymers can introduce the said structure into a principal chain or a side chain together with an aromatic ring or an imide ring through a monomer.

  Polyimide is generally synthesized by polyaddition reaction and dehydration condensation reaction of acid dianhydride and diamine, but introducing an aliphatic chain, alicyclic structure or fluoroalkyl group into diamine and / or acid dianhydride. A transparent polyimide can be obtained in the visible light region. In particular, an acid dianhydride having an alicyclic structure is used for the acid dianhydride, and a refractive index is also 1 by introducing various types of structures such as a siloxane structure, an aliphatic chain, an alicyclic structure, and an aromatic ring into the diamine. .5 to 1.7 can be arbitrarily changed.

  Examples of acid dianhydrides used in the synthesis of thermoplastic polyimides include pyromellitic anhydride, 3,3′-biphthalic anhydride, 3,4′-biphthalic anhydride, 3,3 ′, 4, 4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride, 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride, 4,4 ′ -Anhydrous acid such as oxydiphthalic anhydride, meso-butane-1,2,3,4-tetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1 , 2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, bicyclo [2.2.2] oct-7-ene-2,3 5,6-te Lacarboxylic acid dianhydride, bicyclo [2.2.2] octane-2,3,5,6-tetracarboxylic dianhydride, bicyclo [2.2.1] heptane-2,3,5,6-tetra Carboxylic dianhydride, 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 4- (2,5-dioxotetrahydrofuran-3-yl ) -1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid anhydride, and the like. From the viewpoint of improving the solubility, coatability and transparency of polyimide, 3,3 ′, 4,4′-diphenylsulfonetetracarboxylic dianhydride, 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride 1,2,3,4-cyclobutanetetracarboxylic dianhydride, bicyclo [2.2.2] octane-2,3,5,6-tetracarboxylic dianhydride, bicyclo [2.2.1] Heptane-2,3,5,6-tetracarboxylic dianhydride, 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 4- ( 2,5-dioxotetrahydrofuran-3-yl) -1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride is more preferred.

Examples of diamines used for the synthesis of thermoplastic polyimide include m-phenylenediamine, p-phenylenediamine, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diamino-3,3. '-Dimethyldiphenylmethane, o-tolidine, m-tolidine, 4,4'-diaminobenzophenone, 1,1-bis (4-aminophenyl) cyclohexane, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl Ether, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4,4 ′ -Bis (4-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfo 4,4′-bis (3-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfone, 9,9-bis (4-aminophenyl) fluorene, 2,2-bis (4 -Aminophenyl) hexafluoropropane, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane, aromatic diamines such as 2,2′-bis (trifluoromethyl) benzidine, 1,4- Diaminobutane, 1,5-diaminopentane, 1,3-cyclohexanediamine, 1,4-cyclohexanediamine, 4,4′-methylenebis (cyclohexylamine), 4,4′-methylenebis (2-methylcyclohexylamine), 1 Aliphatic diamines such as 1,4-bis (aminomethyl) cyclohexane, 1,3-bis (3-aminopropyl ) Tetramethyl disiloxane, 1,4-bis (3-aminopropyl dimethyl silyl) -SiR ₂ -O- group-containing diamine such as benzene. From the viewpoint of adhesion to inorganic substrates such as glass, 1,3-bis (3-aminopropyl) tetramethyldisiloxane, 1,4-bis (3-aminopropyl dimethyl silyl) -SiR ₂ -O as benzene -It is more preferable to contain at least a group-containing diamine.

  Aromatic polyethers are generally synthesized by subjecting bisphenol and aromatic dihalide to a condensation reaction in a solvent in the presence of a base such as potassium carbonate. An aromatic polysulfide is synthesized by replacing bisphenol with an aromatic disulfide. The refractive index can be arbitrarily changed from 1.5 to 1.7 by introducing various types of bisphenol or aromatic disulfide and aromatic dihalide alone or in combination.

  Examples of bisphenols used in the synthesis of aromatic polyethers include resorcinol, hydroquinone, 4,4′-biphenol, 2,2-bis (4-hydroxyphenyl) propane, 4,4′-dihydroxydiphenylmethane, 1, 1-bis (4-hydroxyphenyl) cyclohexane, 1,1-bis (4-hydroxy-3-methylphenyl) cyclohexane, 4,4 ′-(1-α-methylbenzylidene) bisphenol, 1,3-bis [2 -(4-Hydroxyphenyl) -2-propyl] benzene, α, α'-bis (4-hydroxyphenyl) -1,4-diisopropylbenzene, α, α'-bis (4-hydroxy-3,5-dimethyl) Phenyl) -1,4-diisopropylbenzene, 9,9-bis (4-hydroxyphenyl) fluorene 9,9-bis (4-hydroxy-3-methylphenyl) fluorene, 4,4′-dihydroxybenzophenone, bis (4-hydroxyphenyl) sulfone, bis (4-hydroxy-3,5-dimethylphenyl) sulfone, Examples include octafluoro-4,4′-biphenol, bis (4-fluorophenyl) sulfone, and 2,2-bis (4-hydroxyphenyl) hexafluoropropane.

  Examples of the aromatic disulfide used for the synthesis of the aromatic polysulfide include p-benzenedithiol, m-benzenedithiol, 4,4′-oxybisbenzenethiol, 4,4′-thiobisbenzenethiol, 4,4 ′. -Biphenyldithiol etc. are mentioned.

  Examples of aromatic dihalides used in the synthesis of aromatic polyethers or aromatic polysulfides include 4,4′-dichlorobenzophenone, 4,4′-difluorobenzophenone, 4,4′-dichlorodiphenyl sulfone, bis (4 -Fluorophenyl) sulfone, bis (4-fluoro-3-nitrophenyl) sulfone, 2,6-dichlorobenzonitrile, 2,6-difluorobenzonitrile, 2,4-difluorobenzonitrile, tetrafluoroisophthalonitrile, Examples thereof include fluorobiphenyl and 3,5-dichloro-1-methoxytriazine. Further, dinitro compounds such as 2,4-dinitrobenzonitrile and 2,6-dinitrobenzonitrile can be used instead of dihalide.

  Aromatic polycarbonate is generally synthesized by a method of reacting bisphenol and phosgene in a solution or a method of reacting bisphenol and a carbonate such as diphenyl carbonate in a molten state. The refractive index can be arbitrarily changed from 1.5 to 1.65 by introducing various types of bisphenol alone or in a plurality of types.

  As the bisphenol used for the synthesis of the aromatic polycarbonate, the bisphenol used for the synthesis of the aforementioned aromatic polyether is used.

  In addition to the above-described bisphenol or aromatic disulfide, an aliphatic diol or an aliphatic disulfide can be used in combination with the aromatic polyether, aromatic polysulfide, or aromatic polycarbonate.

More preferably, a part of bisphenol or aromatic disulfide is replaced with a compound having one or more o-hydroxyphenoxypropylsiloxy groups. By this method, the (—SiR ₂ —O—) _n group can be introduced into the resin, and the adhesion to the substrate is improved.

  The refractive index ni of the layer 29 mainly composed of the organic resin of the present invention is the refractive index nb of the substrate 25 and the refractive index ns of the plate crystal layer 30 formed of a plate crystal mainly composed of the aluminum oxide. On the other hand, it is preferable that nb ≧ ni ≧ ns. It is preferable to select an organic resin or a structure in the organic resin so as to be like this. By adjusting ni within this range, higher antireflection performance can be exhibited.

In addition to the organic resin, the layer 29 containing the organic resin as a main component can contain a silane coupling agent in order to improve adhesion. Further, a small amount of inorganic fine particles such as SiO ₂ , TiO ₂ , ZrO ₂ , SiO ₂ , ZnO, MgO, Al ₂ O ₃ can be mixed in order to adjust the refractive index and reduce the water absorption. Components other than the organic resin that can be mixed when the total organic resin layer is 100 parts by weight are less than 20 parts by weight, and if mixed more than that, the transparency and uniformity of the film thickness may be impaired.

  An organic resin is preferable because it can be easily formed into a solution and coated on a substrate and is suitable for forming a thin film. In the case of a curable resin, a reactive or polymerization-reactive compound or oligomer can be used by dissolving it in an organic solvent together with an initiator or a curing agent. On the other hand, the thermoplastic resin can be used alone or dissolved in an organic solvent together with components other than the organic resin. When the thermoplastic resin itself is insoluble or difficult to dissolve in the organic solvent, the thermoplastic resin precursor can be dissolved in the organic solvent and used. However, in the latter case, a process for converting the precursor into a thermoplastic resin is required.

  The organic solvent used when forming the layer 29 mainly composed of the organic resin of the present invention is ketones such as 2-butanone, methyl isobutyl ketone, cyclopentanone, and cyclohexanone. Esters such as ethyl acetate, n-butyl acetate, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, and ethyl lactate. Ethers such as tetrahydrofuran, dioxane and diisopropyl ether. Various aromatic hydrocarbons such as toluene, xylene, and ethylbenzene. Chlorinated hydrocarbons such as chloroform, methylene chloride and tetrachloroethane. In addition, solvents such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, sulfolane and the like can be mentioned. Furthermore, alcohols such as 1-butanol, methyl cellosolve, diglyme and methoxypropanol can also be used.

  As a method of forming the layer 29 mainly composed of an organic resin using an organic resin solution, known coating methods such as a dipping method, a spin coating method, a spray method, a printing method, a flow coating method, and a combination thereof are used. Means can be appropriately employed.

  After application of the organic resin solution, it is preferable to perform heating at 60 to 240 ° C. for about 5 minutes to 2 hours in order to remove the solvent. In the case of a resin that is cured by heat, removal of the solvent and curing can be performed simultaneously by this heat treatment. On the other hand, in the case of a resin that is cured by other than heat, it is necessary to appropriately select and perform irradiation with light such as ultraviolet rays, lasers, electron beams, X-rays, microwaves, radiation, or electromagnetic waves. Even in the case of curing other than heat, the reaction can be promoted by further heat treatment.

  The thickness of the layer 29 mainly composed of the organic resin of the present invention is preferably 10 nm or more and 150 nm or less, and more preferably 20 nm or more and 100 nm or less. If it is thinner than this, it is difficult to form a uniform coating film, so that desired optical properties cannot be obtained. On the other hand, if it is thicker than this, contribution to the reflection reduction effect is reduced due to interference or the like.

  Examples of the substrate used in the present invention include glass, resin, glass mirror, and resin mirror. The following are mentioned as a typical thing of a resin base material. Films of thermoplastic resins such as polyester, triacetyl cellulose, cellulose acetate, polyethylene terephthalate, polypropylene, polystyrene, polycarbonate, polysulfone, polyacrylate, polymethacrylate, ABS resin, polyphenylene oxide, polyurethane, polyethylene, polycycloolefin, polyvinyl chloride And molded products. Moreover, the crosslinked film obtained from various thermosetting resins, such as unsaturated polyester resin, a phenol resin, bridge | crosslinking-type polyurethane, a bridge | crosslinking-type acrylic resin, a bridge | crosslinking-type saturated polyester resin, the bridge | crosslinking molded article, etc. are mentioned. Specific examples of the glass include alkali-free glass and alumina silicate glass. The substrate used in the present invention may be any substrate that can be finally shaped according to the purpose of use, such as a flat plate, film or sheet, and having a two-dimensional or three-dimensional curved surface. Also good. The thickness can be appropriately determined and is generally 5 mm or less, but is not limited thereto.

  In addition to the layers described above, the optical transparent member of the present invention can further include layers for imparting various functions. For example, a hard coat layer can be provided on the plate-like crystal layer to improve the film hardness, or a water-repellent film layer such as fluoroalkylsilane or alkylsilane can be provided to impart water repellency. . In addition, for the purpose of preventing the adhesion of dirt, a layer made of a material having a lower refractive index than that of a plate crystal mainly composed of aluminum oxide or a layer made of an amphiphilic compound can be provided. On the other hand, an adhesive layer or a primer layer can be provided in order to improve the adhesion between the base material and the layer containing an organic resin as a main component.

  Hereinafter, the present invention will be described specifically by way of examples. However, the present invention is not limited to such examples. The optical film having fine irregularities on the surface obtained in each example and comparative example was evaluated by the following method.

(1) Synthesis of polyimide 1 to 5 A total of 0.012 mol of diamine (1), diamine (2) and diamine (3) were dissolved in N, N-dimethylacetamide (hereinafter abbreviated as DMAc). While cooling this diamine solution with water, 0.012 mol of acid dianhydride was added. The amount of DMAc was used such that the total mass of diamine and acid dianhydride was 20% by weight. This solution was stirred at room temperature for 15 hours to conduct a polymerization reaction. Furthermore, after adjusting to 8 wt% by dilution with DMAc, 7.4 ml of pyridine and 3.8 ml of acetic anhydride were added and stirred at room temperature for 1 hour. Furthermore, it stirred for 5 hours, heating to 50 degreeC with an oil bath. The polymer solution was reprecipitated in methanol and the polymer was taken out, and then washed several times in methanol. After vacuum drying at 100 ° C., a light yellow powdery polyimide was obtained. ^The residual amount of carboxyl groups was measured from the ¹ H-NMR spectrum, and the imidization rate was determined. The composition table of polyimides 1 to 5 is shown in Table 1.

(2) Synthesis of polyetheretherketone 6. 2.18 g of 4,4′-difluorobenzophenone, 3.79 g of 9,9-bis (4-hydroxy-3-methylphenyl) fluorene and 1.72 g of potassium carbonate. The mixture was added to 15 ml of DMAc and stirred at room temperature. Further, 7.5 ml of toluene was added, and water in the system was removed azeotropically while heating to 120 ° C. The temperature was raised to 150 ° C. to completely remove toluene. Furthermore, it heated up to 165 degreeC and superposed | polymerized for 8 hours. After dilution with 15 ml of DMAc, the polymerization solution was poured into acidic methanol to obtain a white fibrous polymer. After repeatedly washing with methanol, it was dried to obtain polyetheretherketone 6 with a yield of 95%.

(3) Preparation of polyimide solutions 6 to 10 Polyimide solutions 6 to 10 were prepared by dissolving 2.5 g of polyimide 1 to 5 powder in 10 g of cyclohexanone.

(4) Preparation of polycarbonate solution 11 Polycarbonate solution 11 was prepared by dissolving 2.5 g of bisphenol Z polycarbonate (trade name: Z-400, manufactured by Mitsubishi Gas Chemical Co., Ltd.) in 10 g of cyclohexanone.

(5) Preparation of thermosetting resin solution 12 5 g of melamine resin (trade name: Nicalac MX-750LM, manufactured by Nippon Carbide) and 0.025 g of p-toluenesulfonic acid were dissolved in 95 g of 1-methoxy-2-propanol. Thus, a thermosetting resin solution 12 was prepared.

(6) Preparation of SiO ₂ —TiO ₂ Sol Solution 13 3.15 g of 0.01 M diluted hydrochloric acid [HClaq. ] And 29.5 g of 1-butanol / 2-propanol (hereinafter abbreviated as IPA) 1/1 (wt.) Mixed solvent was slowly added, followed by stirring at room temperature. After stirring for 6 hours, the mixture was diluted with 92.5 g of a 1-butanol / IPA 1/1 (wt.) Mixed solvent to prepare a solution A. 10.2 g of tetra n-butoxytitanium and 3.9 g of ethyl acetoacetate were sequentially dissolved in 25.5 g of 1-butanol / IPA 1/1 (wt.) Mixed solvent. This solution was stirred at room temperature for 3 hours to obtain a liquid B. The solution B was slowly added while stirring the solution A, and further stirred at room temperature for 3 hours to prepare a SiO ₂ —TiO ₂ sol solution 13 having a Si / Ti molar ratio of 7/3.

(7) Preparation of Aluminum Oxide (Alumina (Al ₂ O ₃ )) Sol Solution 14 24.6 g of Al (O-sec-Bu) ₃ was replaced with 115.3 g of 1-butanol / 2-propanol (hereinafter abbreviated as IPA). ) In a mixed solvent of 1/1 (wt.), 6.51 g of 3-oxybutanoic acid ethyl ester was added, and the mixture was stirred for about 1 hour at room temperature. Thereafter, 0.01 M diluted hydrochloric acid [HClaq. And stirred at room temperature for about 3 hours. Further, alumina (Al ₂ O ₃ ) sol solution 13 was prepared by stirring in an oil bath at 120 ° C. for 6 hours.

(8) Preparation of Aluminum Oxide (Alumina (Al ₂ O ₃ )) Sol Solution 15 17.2 g of Al (O-sec-Bu) ₃ was replaced with 122.3 g of 1-butanol / 2-propanol (hereinafter abbreviated as IPA). ) In a 1/1 (wt.) Mixed solvent, 4.56 g of 3-oxybutanoic acid ethyl ester was added, and the mixture was stirred for about 1 hour at room temperature. Thereafter, 0.01 M diluted hydrochloric acid [HClaq. And stirred at room temperature for about 3 hours. Further, an alumina (Al ₂ O ₃ ) sol solution 14 was prepared by stirring in an oil bath at 120 ° C. for 6 hours.

(9) Preparation of silane coupling agent solution 16 0.5 g of 3-aminopropyltriethoxysilane was dissolved in 99.5 g of ethanol, and 0.5 g of ion-exchanged water was further added. This solution was stirred overnight at room temperature to obtain a silane coupling agent 15 solution.

(10) Preparation of polyetheretherketone solution 17 Polyetheretherketone solution 17 was prepared by dissolving 2.5 g of polyetheretherketone 6 powder in 10 g of cyclohexanone.

(11) Preparation of Polysulfone Solution 18 Polysulfone solution 18 was prepared by dissolving 2.5 g of pellet-shaped polysulfone (Mn˜16,000: manufactured by Sigma-Aldrich) in 10 g of γ-butyrolactone.

(12) Preparation of Polystyrene Solution 19 A polystyrene solution 19 was prepared by dissolving 2.5 g of polystyrene (manufactured by Sigma-Aldrich) in 10 g of cyclohexanone.

(13) Measurement of water absorption rate of organic resin Various organic resin coating films are formed on a silicon substrate. After baking at 200 ° C. for 60 minutes, the water absorption of the membrane immersed in ion exchange water at 23 ° C. for 24 hours was measured with a thermogravimetric analyzer (TG / DTA, Rigaku Thermoplus 2) to determine the water absorption of the membrane. .

(14) Cleaning of substrate Various glass substrates having a size of about φ30 mm and a thickness of about 2 mm polished on both surfaces were ultrasonically cleaned with an alkaline detergent and IPA and then dried in an oven.

(15) Film shape observation Photographic observation (acceleration voltage: 10.0 kV, magnification: 30,000 times) of the surface of the film was performed using a scanning electron microscope (FE-SEM, Hitachi S4500).

(16) Transmittance measurement Using an automatic optical element measuring apparatus (V-570, manufactured by JASCO Corporation), transmittance measurement was performed in the range of 350 nm to 850 nm. A disk-shaped glass plate was used. The incident angle of light in the transmittance measurement was 0 °.

(17) Measurement of film thickness and refractive index Using a spectroscopic ellipsometer (VASE, manufactured by JA Woollam Japan), the wavelength was measured from 380 nm to 800 nm.

Example 1
An appropriate amount of the polyimide solution 6 was dropped on one surface of the S-TIH53 (n _{550 nm} = 1.84) substrate cleaned by the above method, and spin coating was performed at 3000 rpm for 20 seconds. This substrate was pre-dried at 80 ° C. for 10 minutes, and the other surface was similarly spin-coated with the polyimide solution 6. Then, the board | substrate with the organic resin layer to which the polyimide 1 adhered was produced by baking for 30 minutes in a 200 degreeC hot-air circulation oven. Table 2 shows the film thickness, refractive index, and water absorption rate of the polyimide 1 film.

An appropriate amount of alumina sol solution 14 was dropped on one surface of the substrate with the polyimide 1 film, spin-coated at 4000 rpm for 20 seconds, and then pre-dried at 80 ° C. for 10 minutes. Similarly, an alumina sol solution was spin-coated on the other surface. Then baked for 30 minutes at 200 ° C. in a circulating hot air oven, it was coated a transparent amorphous _Al 2 _{O 3} film.

  Next, after being immersed in hot water at 80 ° C. for 30 minutes, it was dried at 60 ° C. for 10 minutes.

When the FE-SEM observation of the obtained film surface was performed, a fine concavo-convex structure in which plate crystals mainly composed of Al ₂ O ₃ as shown in FIG. . As a result of FE-SEM observation of the cross section, a plate-like crystal composed mainly of Al ₂ O ₃ as shown in FIG. An image was observed.

  Subsequently, the film thickness and refractive index of the obtained film were measured using ellipsometry. The film thickness and refractive index of each are shown in Table 3.

  The substrate was subjected to a high-temperature and high-humidity test at 60 ° C. and a humidity of 90% as an accelerated test for examining the durability of the optical performance, and the transmittance was measured at the start, after 250 hours and after 500 hours. The results are shown in Table 3.

Example 2
The same operation as in Example 1 was performed except that the polyimide solution 7 was used instead of the polyimide solution 6 and an organic resin layer made of polyimide 2 was formed.

Example 3
The same operation as in Example 2 was performed except that the substrate was replaced with S-LAH65 (n _{550 nm} = 1.80).

Example 4
The same operation as in Example 3 was performed except that the polyimide solution 8 was used instead of the polyimide solution 7 and an organic resin layer made of polyimide 3 was formed.

Example 5
The same operation as in Example 3 was performed except that the polyimide solution 9 was used in place of the polyimide solution 7 and an organic resin layer made of polyimide 4 was formed.

Example 6
An appropriate amount of the silane coupling agent solution 16 was dropped on one surface of the cleaned S-LAH65 (n _{550 nm} = 1.80) substrate, and spin coating was performed at 4000 rpm for 20 seconds. After drying at 80 ° C. for 10 minutes, the other surface was similarly spin-coated with the silane coupling agent solution 16. Then, it baked at 80 degreeC for 10 minutes. An appropriate amount of the polycarbonate solution 11 was dropped on one surface of the substrate, and spin coating was performed at 3000 rpm for 20 seconds. After preliminary drying at 80 ° C. for 10 minutes, the polycarbonate solution 11 was similarly spin-coated on the other surface. This substrate was baked in a hot air circulating oven at 200 ° C. for 60 minutes to produce a substrate with an organic resin layer made of bisphenol Z polycarbonate. Table 2 shows the film thickness, refractive index, and water absorption rate of the thermosetting resin film.

Thereafter, a transparent amorphous Al ₂ O ₃ film was coated in the same manner as in Example 1 and evaluated.

Example 7
The same operation as in Example 6 was performed except that the thermosetting resin solution 12 was used instead of the polycarbonate solution 11 and an organic resin layer made of the thermosetting resin was formed.

Example 8
The same operation as in Example 4 was performed, except that the substrate was replaced with S-LAH66 (n _{550 nm} = 1.77).

Example 9
The same operation as in Example 8 was performed except that the polyimide solution 9 was used instead of the polyimide solution 8 and an organic resin layer made of polyimide 4 was formed.

Example 10
The same operation as in Example 6 was performed except that the substrate was changed to S-LAH66 (n _{550 nm} = 1.77).

Example 11
The same operation as in Example 7 was performed except that the substrate was replaced with S-LAH66 (n _{550 nm} = 1.77).

Example 12
The same operation as in Example 1 was performed except that the substrate was replaced with S-TIH1 (n _{550 nm} = 1.71), the polyimide solution 10 was used instead of the polyimide solution 6, and an organic resin layer composed of the polyimide 5 was formed. .

Example 13
The same operation as in Example 6 was performed except that the substrate was replaced with S-TIH1 (n _{550 nm} = 1.71).

Example 14
An appropriate amount of polyimide solution 7 was dropped on one side of the washed S-LAH65 (n _{550 nm} = 1.80) substrate, and spin coating was performed at 3000 rpm for 20 seconds. This substrate was pre-dried at 80 ° C. for 10 minutes, and the other surface was similarly spin-coated with the polyimide solution 7. Then, the board | substrate with the organic resin layer which polyimide 2 attached to both surfaces was produced by baking for 30 minutes in 200 degreeC hot-air circulation oven.

An appropriate amount of alumina sol solution 15 was dropped on one surface of the substrate with the polyimide 2 film, spin-coated at 2700 rpm for 20 seconds, and then pre-dried at 80 ° C. for 10 minutes. Similarly, an alumina sol solution 15 was spin-coated on the other surface. Then, it baked for 10 minutes in 200 degreeC hot-air circulation oven. Further, the alumina sol solution 15 was applied again on both sides by the same method, and finally baked at 200 ° C. for 30 minutes to coat a transparent amorphous Al ₂ O ₃ film.

Next, after being immersed in hot water at 80 ° C. for 30 minutes, it was dried at 60 ° C. for 10 minutes.
Hereinafter, the same evaluation as in Example 1 was performed.

Example 15
The same operation as in Example 14 was performed except that the polycarbonate solution 11 was used instead of the polyimide solution 9 and an organic resin layer made of polycarbonate was formed.

Example 16
The same operation as in Example 6 was performed except that the polyether ether ketone solution 17 was used instead of the polycarbonate solution 11 and an organic resin layer made of polyether ether ketone was formed.

Example 17
The same operation as in Example 6 was performed except that the polysulfone solution 18 was used instead of the polycarbonate solution 11 and an organic resin layer made of polysulfone was formed.

Comparative Example 1
An appropriate amount of the alumina sol solution 14 was dropped on one surface of the washed S-TIH53 (n _{550 nm} = 1.84) substrate, spin-coated at 4000 rpm for 20 seconds, and then pre-dried at 80 ° C. for 10 minutes. Similarly, an alumina sol solution was spin-coated on the other surface. Then baked for 30 minutes at 200 ° C. in a circulating hot air oven, it was coated a transparent amorphous _Al 2 _{O 3} film.

Next, after being immersed in hot water at 80 ° C. for 30 minutes, it was dried at 60 ° C. for 10 minutes.
Hereinafter, the same evaluation as in Example 1 was performed.

Comparative Example 2
The same operation as in Comparative Example 1 was performed except that the substrate was changed to S-LAH65 (n _{550 nm} = 1.80).

Comparative Example 3
An appropriate amount of SiO ₂ —TiO ₂ sol solution 13 was dropped on one surface of the cleaned S-TIH53 (n _{550 nm} = 1.84) substrate, and spin coating was performed at 3000 rpm for 20 seconds. After this substrate was pre-dried at 80 ° C. for 10 minutes, the other surface was similarly spin-coated with a SiO ₂ —TiO ₂ sol solution 13. Thereafter, by baking 60 minutes at 200 ° C. in a circulating hot air oven, amorphous _SiO 2 -TiO ₂ films were prepared substrate attached to both surfaces. Table 2 shows the film thickness, refractive index, and water absorption rate of the amorphous SiO ₂ —TiO ₂ film.

Hereinafter, after coating the amorphous Al ₂ O ₃ film, an antireflection film was formed by the same method as in Example 1 and evaluated.

Comparative Example 4
The same operation as in Comparative Example 3 was performed except that the substrate was changed to S-LAH65 (n _{550 nm} = 1.80).

Comparative Example 5
The same operation as in Example 6 was performed except that the polystyrene solution 19 was used instead of the polycarbonate solution 11 and an organic resin layer made of polystyrene was formed. However, when the amorphous Al ₂ O ₃ film was coated and then immersed in warm water, film peeling occurred from the organic intermediate layer, and an antireflection film could not be obtained.

(Note) Water absorption: After immersion in ion exchange water at 23 ° C for 24 hours

(Note) The refractive index of the crystal layer of the plate-like crystal indicates the starting point and ending point values of the gradient refractive index portion. For example, 1.42-1.0 in Example 1 indicates that the refractive index continuously decreases from 1.42 to 1.0.

[Performance evaluation]
When the transmittance at 550 nm was compared for the produced optical films, in Examples 1 to 17, an optical member was obtained in which a high transmittance was maintained even after an accelerated durability test at high temperature and high humidity. On the other hand, in Comparative Example 5, an antireflection film capable of evaluating performance could not be obtained due to film peeling. Comparative Examples 1 and 2 have low transmittance from the beginning, and Comparative Examples 3 and 4 have reduced transmittance after the accelerated durability test.

Example 18
FIG. 6 is a front view of an optical member according to Example 16 of the present invention. In the figure, the optical member 1 is a concave lens and has a structure in which an optical member 3 is provided on a substrate 2.

  FIG. 7 shows a cross section of the optical member of Example 18 cut along the A-A ′ cross section in FIG. 6. By forming a film having an organic resin as a main component on the optical surface and a layer in which a plate crystal having aluminum oxide as a main component is arranged, and forming the optical member 3 having an uneven surface on the outermost surface, The reflection of light on the optical surface is reduced.

  In this embodiment, the case of a concave lens is shown, but the present invention is not limited to this, and the lens may be a convex lens or a meniscus lens.

Example 19
FIG. 8 is a front view of an optical member according to Example 19 of the present invention. In the figure, the optical member 1 is a prism and has a structure in which an optical member 3 is provided on a base 2.

  FIG. 9 shows a cross section of the optical member of Example 19 cut along the A-A ′ cross section in FIG. 8. By forming a film having an organic resin as a main component on the optical surface and a layer in which a plate crystal having aluminum oxide as a main component is arranged, and forming the optical member 3 having an uneven surface on the outermost surface, The reflection of light on the optical surface is reduced.

  In this embodiment, the angle formed by each optical surface of the prism is 90 ° and 45 °. However, the present invention is not limited to this, and a prism having an optical surface formed at any angle. I do not care.

Example 20
FIG. 10 is a front view of an optical member according to Example 20 of the present invention. In the figure, an optical member 1 is a fly eye integrator, and has a structure in which an optical member 3 is provided on a substrate 2.

  FIG. 11 shows a cross section of the optical member of Example 20 cut along the A-A ′ cross section in FIG. 10. By forming a film having an organic resin as a main component on the optical surface and a layer in which a plate crystal having aluminum oxide as a main component is arranged, and forming the optical member 3 having an uneven surface on the outermost surface, The reflection of light on the optical surface is reduced.

Example 21
FIG. 12 is a front view of an optical member according to Example 21 of the present invention. In the figure, the optical member 1 is an fθ lens and has a structure in which an optical member 3 is provided on a substrate 2.

  FIG. 13 shows a cross section of the optical member of Example 21 cut along the A-A ′ cross section in FIG. 12. By forming a film having an organic resin as a main component on the optical surface and a layer in which a plate crystal having aluminum oxide as a main component is arranged, and forming the optical member 3 having an uneven surface on the outermost surface, The reflection of light on the optical surface is reduced.

Example 22
As Example 22 of the present invention, an example in which the optical member of the present invention is used in an observation optical system will be described. FIG. 14 shows a cross section of one of a pair of optical systems of binoculars.

  In the same figure, 4 is an objective lens for forming an observation image, 5 is a prism for reversing the image (development is shown), 6 is an eyepiece, 7 is an image plane, and 8 is a pupil plane (evaluation plane). is there. In the figure, 3 (indicated by a legend) is an optical transparent member according to the present invention. By forming a film with organic resin as the main component and a layer with plate-like crystals with aluminum oxide as the main component, the outermost surface has an irregular shape, which reduces the reflection of light on each optical surface. ing. In the present embodiment, the optical member 3 having a fine concavo-convex structure is not provided on the optical surface 9 closest to the object side of the objective lens and the optical surface 10 closest to the evaluation surface of the eyepiece lens. This is not provided because the performance deteriorates due to contact of the optical member 3 during use or the like, but is not limited to this, and the optical transparent member 3 may be provided on the optical surfaces 9 and 10.

Example 23
As Example 23 of the present invention, an example in which the optical member of the present invention is used in an imaging optical system is shown. FIG. 15 shows a cross section of a photographic lens such as a camera (here, a telephoto lens is shown).

  In the figure, reference numeral 7 denotes a film which is an image formation surface, or a solid-state image pickup device (photoelectric conversion device) such as a CCD or CMOS, and 11 denotes a stop. In the figure, 3 (indicated by a legend) is an optical member according to the present invention. By forming a film with organic resin as the main component and a layer with plate-like crystals with aluminum oxide as the main component, the outermost surface has an irregular shape, which reduces the reflection of light on each optical surface. ing. In this embodiment, the optical member 3 having a fine concavo-convex structure is not provided on the optical surface 9 closest to the object side of the objective lens. This is not provided because the performance deteriorates due to contact of the optical member 3 during use, but the present invention is not limited to this, and the optical member 3 may be provided on the optical surface 9.

Example 24
As Example 24 of the present invention, an example in which the optical member of the present invention is used in a projection optical system (projector) will be described. FIG. 16 shows a cross section of the projector optical system.

  In this figure, 12 is a light source, 13a and 13b are fly eye integrators, 14 is a polarization conversion element, 15 is a condenser lens, 16 is a mirror, 17 is a field lens, 18a, 18b, 18c and 18d are prisms, 19a, 19b, 19c is a light modulation element. Reference numeral 20 denotes a projection lens. In the figure, 3 (indicated by a legend) is an optical transparent member according to the present invention. Forming a film with organic resin as the main component and a plate crystal with aluminum oxide as the main component, and the outermost surface has a concavo-convex shape to reduce the reflection of light on each optical surface Yes.

  In addition, since the optical member 3 of this example is composed mainly of an inorganic component such as silica or alumina, it has high heat resistance, is close to the light source 12, and is used at the position 13a exposed to high heat. There is no worry about performance degradation.

Example 25
As Example 25 of the present invention, an example in which the optical member of the present invention is used in a scanning optical system (laser beam printer) will be described. FIG. 17 shows a cross section of the scanning optical system.

  In the figure, 12 is a light source, 21 is a collimator lens, 11 is an aperture stop, 22 is a cylindrical lens, 23 is an optical deflector, 24a and 24b are fθ lenses, and 7 is an image plane. In the figure, 3 (indicated by a legend) is an optical transparent member according to the present invention. Form a film with organic resin as the main component and a plate crystal with aluminum oxide as the main component, and reduce the reflection of light on each optical surface because the outermost surface is uneven. Realizes high-quality image formation.

  The optical member of the present invention can correspond to a transparent base material having an arbitrary refractive index, exhibits an excellent antireflection effect for visible light, and has long-term weather resistance. Therefore, a word processor, a computer, a television, Various displays such as plasma display panels. Optical members such as polarizing plates used in liquid crystal display devices, sunglasses lenses made of various optical glass materials and transparent plastics, prescription eyeglass lenses, camera finder lenses, prisms, fly-eye lenses, toric lenses, various optical filters, sensors, and the like. Furthermore, a photographing optical system using them, an observation optical system such as binoculars, and a projection optical system used for a liquid crystal projector or the like. Various optical lenses such as scanning optical systems used in laser beam printers. It can be used for optical members such as covers of various instruments, window glass of automobiles, trains and the like.

DESCRIPTION OF SYMBOLS 1 Optical member 2 Board | substrate, base | substrate 3 Optical member 4 Objective lens 5 Prism 6 Eyepiece 7 Imaging surface 8 Pupil surface 9 Most object side optical surface 10 Optical surface on the most evaluation surface (pupil surface or imaging surface) side 11 Aperture 12 Light source 13 Fly eye integrator 14 Polarization conversion element 15 Condenser lens 16 Mirror 17 Field lens 18 Prism 19 Light modulation element 20 Projection lens 21 Collimator lens 22 Cylindrical lens 23 Optical deflector 24 fθ lens 25 Base material 26 Mainly organic resin Component layer 27 Plate-like crystal layer mainly composed of aluminum oxide 28 Base material 29 Layer mainly composed of organic resin 30 Plate-like crystal layer mainly composed of aluminum oxide 31 Concavity and convexity 32 Direction of inclination of plate crystal 32 Tangent of substrate surface

Claims (12)

  In the optical member in which the laminate is formed on the substrate surface, at least one layer is a plate crystal layer formed of a plate crystal mainly composed of aluminum oxide, and the substrate and the plate crystal layer An optical member comprising an organic resin having an aromatic ring and / or an imide ring in the main chain.   2. The optical member according to claim 1, wherein the plate crystal is a crystal mainly composed of aluminum hydroxide or aluminum oxide hydrate.   The optical member according to claim 1 or 2, wherein the water absorption of the organic resin is 0.05% or more and 2% or less.   The optical member according to claim 1, wherein the organic resin is a thermoplastic resin. (—SiR ₂ —O—) _{m in} at least part of the organic resin
Having repeating units of
However, R is a methyl group or a phenyl group, m is an integer of 1-6, The optical member of Claim 4 characterized by the above-mentioned.   The optical member according to claim 1, wherein the organic resin is polyimide. The optical member according to claim 6, wherein the polyimide has a structure represented by the following chemical formula.

  The optical member according to claim 6, wherein the polyimide includes an aromatic ring.   The optical member according to claim 6, wherein the polyimide includes an alicyclic structure.   The optical member according to claim 1, wherein a thickness of the organic resin as a main component is 10 nm or more and 150 nm or less.   The optical member according to claim 1, wherein the base material is glass.   An optical system comprising the optical member according to claim 1, wherein the optical system is one selected from an observation optical system, a photographing optical system, a projection optical system, and a scanning optical system.

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