JP2011062853A - Method for manufacturing mold core, and mold core - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To efficiently produce a mold core which is used in the molding of a three-dimensionally shaped article having a minute region when the article is molded. <P>SOLUTION: A light shielding mask 2 of a shape corresponding to the plane projection shape of the three-dimensionally shaped article is formed on a light transmittable substrate 1, and a resist layer 4 which covers the light shielding mask 2 is formed on one side of the substrate 1. The resist layer 4 is processed in a three-dimensional shape having a body 4a and a plate part 4b by exposing and developing the resist layer 4 by using a gray scale mask. A resist matrix in a three-dimensional shape having the main boy and the plate part is produced by removing the plate part 4b of the resist layer 4 excluding the vicinity of the body 4a by developing the resist layer 4 by carrying out exposure to the resist layer 4 through the substrate 1. With the use of the resist matrix, an electroformed stamper having a three-dimensionally shaped recess with the three-dimensional shape of the resist matrix inverted is produced. By cutting the pattern surface of the electroformed stamper, a part corresponding to the plate part of the resist matrix is removed. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a mold core and a method for manufacturing a mold core used when manufacturing a mold core used for manufacturing a plastic puncture needle for blood sugar level measurement by injection molding. It is about the child.

  As this type of puncture needle, conventionally, a metal needle is frequently used (see, for example, Patent Document 1). However, a metal puncture needle cannot be finished in a three-dimensional shape with a microscopic area (puncture part) resembling a mosquito's groin, which not only reduces pain during puncture, but also consumes a large amount. Therefore, the disposal method has become a social problem.

  Therefore, a plastic puncture needle has been proposed to deal with such problems (see, for example, Patent Document 2). As a method of manufacturing this plastic puncture needle, a gray scale mask (reticle) suitable for manufacturing a three-dimensional shape of this puncture needle and photolithography using a thick resist layer are combined. Then, a resist mother mold is manufactured, a mold core is manufactured based on the resist mother mold, and a puncture needle is formed using the mold core (hereinafter referred to as manufacturing method 1). . If this manufacturing method 1 is used, a plastic molded product having a certain thickness (for example, 50 to 100 μm) can be formed.

JP 2007-38021 A JP 2002-172169 A

  However, when a resist matrix having a shape corresponding to a three-dimensional shape having a fine area is produced by this production method 1, development of the fine area is delicate, and it is difficult to determine the moment of completion of development. As a result, there is a possibility that excessive or insufficient development may occur, and there is a problem that it is impossible to efficiently manufacture a resist matrix having a fine area with high accuracy, and thus a mold core.

  Further, when there are a plurality of resist molds manufactured, uneven development occurs in these resist molds, and development slows between the resist molds. Therefore, the end points of development are divided in a plurality of resist molds, and among these resist molds, there are resist molds in which high-precision fine regions cannot be formed. As a result, there is a problem that it is impossible to manufacture a mold core in which a high-precision fine region is formed in all resist masters.

  In view of such circumstances, the present invention can efficiently manufacture a mold core used for forming a three-dimensional shape having a fine region such as a puncture needle, Mold core manufacturing method and mold core capable of manufacturing a mold core in which a high-precision fine area is formed in all resist mother molds even if the number of mold dies is plural. The purpose is to provide.

  A first mold core manufacturing method according to the present invention is a mold core manufacturing method for use in molding a three-dimensional shape object (9) having a fine region, A light shielding mask (2) having a shape corresponding to a planar projection shape is formed on a light transmitting substrate (1), a resist layer (4) is formed on one surface of the substrate so as to cover the light shielding mask, and gray scale By exposing and developing the resist layer using a mask, a three-dimensional shape having a main body (4a) corresponding to the three-dimensional object and a flat plate (4b) formed around the main body is obtained. A resist layer processing step for processing the resist layer; and exposing the resist layer processed in the resist layer processing step through the substrate and developing the resist layer, thereby removing the resist except the vicinity of the main body portion Layer flat A resist matrix production process for producing a three-dimensional resist matrix (6) having a main body corresponding to the three-dimensional object and a flat plate (6c) formed around the main body. , An electroforming stamper manufacturing process for manufacturing an electroforming stamper (8) having a three-dimensional recess (8a) obtained by inverting the three-dimensional shape of the resist matrix using the resist matrix; The method is characterized in that the die core manufacturing method includes an electroforming stamper cutting step of removing a portion corresponding to the flat plate portion of the resist matrix by cutting the pattern surface (8b).

  The mold core according to the present invention is a mold core (7) manufactured by the above-described mold core manufacturing method.

  Here, in order to explain the present invention in an easy-to-understand manner, the description has been made in association with the reference numerals of the drawings representing the embodiments, but it goes without saying that the present invention is not limited to the embodiments.

  According to the present invention, when forming a three-dimensional shape having a fine region, development is stopped in a development time slightly shorter than the time required for developing the resist layer to be a resist master, and then the resist master is inverted. By scraping the pattern surface of the manufactured electroforming stamper, it is possible to efficiently manufacture a resist matrix having a highly accurate fine region. Therefore, it is possible to efficiently manufacture a mold core used for molding a three-dimensional shape.

  In addition, when there are a plurality of resist molds manufactured, when developing the resist layer, the overall development time is based on the time required for developing the resist mold having the fastest development speed among the resist molds. By setting a little shorter, it is possible to manufacture a mold core in which a highly accurate fine region is formed in all resist mother molds even when the number of resist mother molds is plural.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows a part of resist layer process process in the manufacturing method of the metal mold | die core which concerns on Embodiment 1 of this invention, Comprising: (a) is a cross section of the state in which chromium and the resist were apply | coated to the whole surface on the glass substrate FIG. 4B is a cross-sectional view of the state where the resist portion corresponding to the unnecessary portion of the chromium layer is removed, FIG. 5C is a cross-sectional view of the state where the unnecessary portion of the chromium layer is removed, and FIG. Sectional drawing of the state in which the chromium pattern was completed in FIG. 2, (e) is a top view in the state in which the chromium pattern was completed on the glass substrate. It is sectional drawing which shows the remainder of the resist layer processing process in the manufacturing method of the metal mold core which concerns on the same Embodiment 1, Comprising: (a) is the state by which the resist was apply | coated whole surface covering the chromium pattern on the glass substrate FIG. 4B is a state diagram in which unnecessary portions of the resist layer are removed to a predetermined depth. It is sectional drawing which shows the resist mother mold manufacturing process in the manufacturing method of the metal mold | die core which concerns on Embodiment 1 of this invention. It is sectional drawing which shows the electroforming stamper manufacturing process in the manufacturing method of the mold core which concerns on Embodiment 1 of this invention. It is sectional drawing which shows the electroforming stamper cutting process in the manufacturing method of the metal mold | die core which concerns on Embodiment 1 of this invention. It is a perspective view of a puncture needle. It is sectional drawing which shows the resist layer process process in the manufacturing method of the metal mold | die core which concerns on Embodiment 2 of this invention, Comprising: (a) is the state by which the resist was apply | coated entirely covering the chromium pattern on the glass substrate FIG. 4B is a state diagram in which unnecessary portions of the resist layer are removed to a predetermined depth. It is sectional drawing which shows the resist mother mold manufacturing process in the manufacturing method of the mold core which concerns on the same Embodiment 2. FIG. It is sectional drawing which shows the electroforming stamper manufacturing process in the manufacturing method of the metal mold | die core which concerns on the same Embodiment 2. FIG. It is sectional drawing which shows the electroforming stamper cutting process in the manufacturing method of the metal mold | die core which concerns on the same Embodiment 2. FIG.

Embodiments of the present invention will be described below.
Embodiment 1 of the Invention

  1 to 6 are diagrams according to Embodiment 1 of the present invention.

  In the first embodiment, a plastic injection mold core used for molding a puncture needle 9 as shown in FIG. 6 is manufactured according to the following procedure.

  First, in the shape modeling step, the three-dimensional shape of the puncture needle 9 to be molded is modeled by three-dimensional CAD (computer aided design). As this three-dimensional CAD, for example, ICAD / SX-UP manufactured by Fujitsu Limited can be used.

  Next, the process proceeds to a coordinate group extraction step, and a three-dimensional coordinate group of the three-dimensional surface data of the puncture needle 9 is extracted. That is, surface data is created from the three-dimensional shape of the puncture needle 9 modeled earlier, cut out with a mesh of a predetermined vertical and horizontal size (for example, 0.5 μm × 0.5 μm), and then the Z at each position is created. The coordinates are extracted, and an (X, Y, Z) coordinate group, that is, a three-dimensional coordinate group is created.

  Thereafter, the process proceeds to a gray scale mask production step, and a gray scale mask is produced based on the three-dimensional coordinate group of the three-dimensional surface data of the puncture needle 9. That is, the gray scale value (transmittance) is calculated by multiplying the Z coordinate of the three-dimensional coordinate group extracted earlier by a predetermined function. This function is based on the sensitivity of the resist used in the resist layer forming process described later and the optical characteristics of the projection lens. Next, based on the gray scale value, an original gray scale mask of a predetermined magnification (for example, 25 times) of the three-dimensional shape of the puncture needle 9 is drawn with a laser plotter. At this time, a square area having a predetermined length (for example, 12.5 μm) on one side is defined as one gradation area, and the open area ratio is gray at the position (for example, (25X, 25Y)) of the original grayscale mask. Scale value. Then, the original grayscale mask is used for reduction exposure at a predetermined reduction rate (for example, 1/5) using a reduction projection type exposure apparatus (for example, Nikon Corporation's i-line stepper NSR-I12 type), and puncture A gray scale mask having a predetermined magnification (for example, 5 times) of the three-dimensional shape of the needle 9 is prepared.

  Next, the process proceeds to a resist layer processing step, and a resist layer 4 having a main body portion 4a and a flat plate portion 4b corresponding to the three-dimensional shape of the puncture needle 9 is formed as described below.

  First, as shown in FIG. 1A, a chromium layer 2 is formed on a glass substrate 1 by coating chromium over the entire surface by a predetermined thickness T1 (for example, T1 = 0.2 to 0.3 μm). After that, a positive or negative resist is applied on the entire surface of the chromium layer 2 by a predetermined thickness T2 (for example, T2 = 0.5 to 1 μm) to form a resist layer 3. Next, as shown in FIG. 1B, the resist layer 3 portion corresponding to the unnecessary portion of the chromium layer 2 is removed by exposure and development. Thereafter, as shown in FIG. 1C, unnecessary portions of the chromium layer 2 are removed by etching by using the resist layer 3 remaining on the chromium layer 2 as a mask. Next, as shown in FIG. 1D, the resist layer 3 remaining on the chromium layer 2 is removed with a chemical (peeling agent). Finally, as shown in FIG. 1 (e), alignment marks 5 are created at two locations on the glass substrate 1. As a result, a chromium layer 2 having a shape corresponding to the planar projection shape of the puncture needle 9 is formed on the glass substrate 1 and two alignment marks 5 are created. Next, as shown in FIG. 2A, a positive resist is applied over the entire surface of the glass substrate 1 to a predetermined thickness T3 (for example, T3 = 110 μm) so that the chromium layer 2 is covered. A resist layer 4 is formed. Thereafter, as shown in FIG. 2B, the resist layer 4 is exposed to a predetermined depth D1 (for example, D1 = 90 μm) and developed by photolithography using the gray scale mask produced earlier. That is, with a reduction projection type exposure apparatus (for example, g-line stepper NSR-G8 type manufactured by Nikon Corporation), a predetermined exposure time with a predetermined reduction ratio (for example, 1/5) using the gray scale mask produced earlier. After reduction exposure (for example, 45 seconds), development is performed for a predetermined development time (for example, 25 minutes) using an organic developer. Then, the resist layer 4 is processed into a three-dimensional shape having a main body portion 4a corresponding to the puncture needle 9 and a flat plate-like portion 4b formed around the main body portion 4a with a predetermined thickness T4 (for example, T4 = 20 μm). It will be in the state. At this time, by determining the exposure position with reference to the two alignment marks 5 on the glass substrate 1, the resist layer 4 can be processed accurately and quickly.

  Thus, when the resist layer 4 having the main body portion 4a and the flat plate portion 4b corresponding to the three-dimensional shape of the puncture needle 9 is formed, the process proceeds to a resist matrix manufacturing process, as shown in FIG. After exposing the resist layer 4 by irradiating it with parallel light from the back side of the glass substrate 1 through the glass substrate 1 for a predetermined exposure time (for example, 4 minutes), the resist layer 4 is developed for a predetermined development time. . Here, the predetermined development time means a development time slightly shorter than the required development time of the resist layer 4. Then, the flat plate-like portion 4b is removed from the resist layer 4 except for the vicinity of the main body portion 4a. As a result, the body portion 6a corresponding to the three-dimensional shape of the puncture needle 9 is processed into a three-dimensional shape having a flat plate portion 6c formed with a predetermined thickness T5 (for example, T5 = 5 μm) around the body portion 6a. A resist matrix 6 is obtained.

  When the resist matrix 6 is thus obtained, the process proceeds to an electroforming stamper manufacturing process. As shown in FIG. 4, the resist matrix 6 is used to reverse the three-dimensional shape of the resist matrix 6 as shown in FIG. An electroforming stamper 8 having a recess 8a is manufactured. That is, an electrode film is formed on the resist matrix 6 and electrocasting (electrocasting) using a normal sulfamine nickel bath is performed to produce an electroforming stamper 8 having a predetermined thickness T6 (eg, T6 = about 1.5 mm). To do.

  When the electroforming stamper 8 is obtained in this way, the process proceeds to an electroforming stamper cutting process. After the back surface of the electroforming stamper 8 is processed to obtain the back surface accuracy when the mold is attached, That is, the pattern surface 8b is cut by a predetermined lapping amount D2 (for example, D2 = 5 μm) with a lapping machine (not shown). Then, as shown in FIG. 5, a portion of the recess 8 a of the electroforming stamper 8 corresponding to the flat plate portion 6 c of the resist mother die 6 is removed, and this becomes the mold core 7.

  Note that when the pattern surface 8b of the electroforming stamper 8 is cut, the pattern surface 8b is partially wrapped using a flat plate having a small size (for example, 10 mm square). The partial lap means an NC (numerical control) lap by a small tool method. As a result, even if the electroforming stamper 8 is warped due to its internal stress, the pattern surface 8b of the electroforming stamper 8 can be cut with high accuracy.

  Here, the production work of the mold core 7 is completed. A cavity having a predetermined three-dimensional shape is formed by incorporating the mold core 7 thus manufactured in a mold (not shown).

As described above, in the first embodiment, when the puncture needle 9 is formed, after the development is stopped in a development time slightly shorter than the time required for developing the resist layer 4 to be the resist master 6, this resist master The pattern surface 8b of the electroforming stamper 8 manufactured by inverting 6 is cut out. Therefore, it is possible to efficiently manufacture the resist matrix 6 having a highly accurate fine region corresponding to the three-dimensional shape of the puncture needle 9. As a result, the mold core 7 used for molding the puncture needle 9 can be efficiently manufactured.
[Embodiment 2 of the Invention]

  7 to 10 are diagrams according to Embodiment 2 of the present invention.

  In the second embodiment, when manufacturing a plastic injection mold core used when simultaneously molding two puncture needles 9 as shown in FIG. 6, the following procedure is used.

  First, in the shape modeling step, the three-dimensional shape of the puncture needle 9 to be molded is modeled by three-dimensional CAD in accordance with the procedure in the first embodiment described above.

  Next, the process proceeds to a coordinate group extraction step, and a three-dimensional coordinate group of the three-dimensional surface data of the puncture needle 9 is extracted according to the procedure in the first embodiment described above.

  Thereafter, the process proceeds to a gray scale mask manufacturing process, and a gray scale mask is manufactured based on the three-dimensional coordinate group of the three-dimensional surface data of the puncture needle 9 according to the procedure in the first embodiment described above.

  Next, the process proceeds to a resist layer processing step, and by exposing the resist layer 4 through the clay scale mask, the resist layer 4 having a main body part 4a and a flat part 4b corresponding to the three-dimensional shape of the puncture needle 9 is obtained. Form. The resist layer 4 corresponding to the two puncture needles 9 is formed by performing the above series of steps while changing the exposure position. Further, in accordance with the procedure in the first embodiment described above, a chromium layer 2 having a shape corresponding to the planar projection shape of the puncture needle 9 is formed on the glass substrate 1 and two alignment marks (not shown). Then, as shown in FIG. 7A, a positive resist is applied on the entire surface of the glass substrate 1 so as to cover the chromium layer 2 to form a resist layer 4. Thereafter, as shown in FIG. 7B, the resist layer 4 is exposed and developed by photolithography using the gray scale mask produced earlier. Then, the resist layer 4 is processed into a three-dimensional shape having two main body portions 4a corresponding to the two puncture needles 9 and a flat plate portion 4b formed around the main body portions 4a. At this time, by determining the exposure position with reference to the two alignment marks on the glass substrate 1, the resist layer 4 can be processed accurately and quickly.

  Thus, when the resist layer 4 having the two main body portions 4a and the flat plate-like portion 4b corresponding to the three-dimensional shape of the two puncture needles 9 is formed, the process proceeds to the resist matrix manufacturing process, and the above-described implementation is performed. In accordance with the procedure in the first mode, as shown in FIG. 8, the resist layer 4 is irradiated with parallel light from the back side of the glass substrate 1 through the glass substrate 1 for a predetermined exposure time (for example, 4 minutes). After the exposure, the resist layer 4 is developed for a predetermined development time. Then, the flat plate-like portion 4b is removed from the resist layer 4 except for the vicinity of the main body portion 4a. As a result, the two body parts 6a corresponding to the three-dimensional shape of the two puncture needles 9 and processed into a three-dimensional shape having a flat plate part 6c formed with a predetermined thickness T7 around each body part 6a. Two resist molds 6 are obtained. In each resist matrix 6, the thickness T7 of the flat plate portion 6c may be slightly different from each other due to uneven development.

  Here, the predetermined development time means a time slightly shorter than the time required for disappearance of the flat plate portion 6c of the resist mother die 6 having a high development speed among the two resist mother dies 6. Then, even if a slow development occurs between the resist molds 6, these resist molds 6 are in a state where the thin flat plate portion 6c remains as shown in FIG.

  Next, the process proceeds to an electroforming stamper manufacturing process, and in accordance with the procedure in the first embodiment described above, using these resist mother dies 6, as shown in FIG. An electroforming stamper 8 having two concave portions 8a having a three-dimensional shape in which is inverted is manufactured.

  Finally, the process proceeds to the electroforming stamper cutting step, and after the back surface of the electroforming stamper 8 is processed according to the procedure in the first embodiment to obtain the back surface accuracy when the mold is attached, Then, the surface of the electroforming stamper 8, that is, the pattern surface 8b is shaved with a lapping machine (not shown).

  At this time, the wrap amount of the pattern surface 8b of the electroforming stamper 8 is such that the portion of the two recesses 8a corresponding to the flat plate portion 6c of the resist mother die 6 has a deep recess 8a (left recess 8a in FIG. 9). Match. Then, as shown in FIG. 10, in the electroforming stamper 8, a portion corresponding to the flat plate portion 6 c of the resist mother die 6 is removed in the two recesses 8 a, and this becomes the mold core 7.

  Further, since the pattern surface 8b of the electroforming stamper 8 is shaved by the partial lap, the pattern surface 8b of the electroforming stamper 8 can be shaved with high accuracy even if the electroforming stamper 8 is warped by its internal stress. .

  Here, the production work of the mold core 7 is completed. A cavity having a predetermined three-dimensional shape is formed by incorporating the mold core 7 thus manufactured in a mold (not shown).

As described above, in the second embodiment, when the number of manufactured resist molds 6 is 2, when developing the resist layer 4, the resist mold 6 having a fast development speed among the resist molds 6. The overall development time is set slightly shorter with reference to the required development time. Therefore, even if the number of resist molds 6 is two, it is possible to manufacture a mold core 7 in which a high-precision fine region is formed with two resist molds 6.
[Other Embodiments of the Invention]

  In the first embodiment described above, the case where the number of manufactured resist mother dies 6 is 1 has been described. In the second embodiment described above, the case where the number of manufactured resist mother dies 6 is two has been described. However, it is of course possible to apply the present invention in the same manner when the number of manufactured resist mother dies 6 is three or more (for example, 4, 8, etc.). When the number of manufactured resist molds 6 is 3 or more, when developing the resist layer 4, the entire development process is performed based on the time required for developing the resist mold 6 having the fastest development speed among the resist molds 6. Set the development time slightly shorter. Therefore, even if the number of manufactured resist molds 6 is 3 or more, it is possible to manufacture the mold core 7 in which the high-precision fine regions are formed in all the resist molds 6.

  In the first and second embodiments, the case where the electroformed stamper 8 is manufactured directly from the resist matrix 6 has been described. However, after a photopolymer (not shown) is manufactured using the resist matrix 6, the electroforming stamper 8 may be manufactured using this photopolymer. In this case, the electroforming stamper 8 can be manufactured industrially efficiently even if the resist mother die 6 can be used only once.

  Further, in the first and second embodiments, the mold core 7 for injection molding has been described, but it is used for plastic molding other than injection molding (for example, extrusion molding, blow molding, compression molding, vacuum molding, etc.). The present invention can be similarly applied to the mold core 7 to be used.

  In the first and second embodiments described above, the case where the original grayscale mask is drawn by the laser plotter in the grayscale mask manufacturing process has been described. However, the original grayscale is used by using an electron beam drawing apparatus instead of the laser plotter. A mask may be drawn.

  In the first and second embodiments, the case where parallel light is irradiated from the back side of the glass substrate 1 for the purpose of uniformizing the illuminance distribution during exposure has been described in the resist matrix manufacturing process. However, when a method for making the illuminance distribution at the time of exposure uniform is used together, or when it is not necessary to make the illuminance distribution at the time of exposure uniform, the diffused light may be irradiated instead of the parallel light. I do not care.

  In the first and second embodiments described above, the puncture needle 9 is described as an example of a three-dimensional shape having a fine region. However, a three-dimensional shape other than the puncture needle 9 (for example, a liquid collection channel is used). The present invention is similarly applied to the molding of a puncture needle, a biodegradable plastic container for placing a medicine therein, a fine free three-dimensional connector, a MEMS (Micro Electro Mechanical Systems) component, etc.) It is also possible.

  The present invention is widely applied in the production of various medical devices such as plastic puncture needles (with or without a collection channel) used for blood glucose level measurement, insulin administration, infusion, and blood transfusion. can do.

1 …… Glass substrate (substrate)
2 ... Chromium layer (shading mask)
3, 4 ...... Resist layer 4 a ...... Body part 4 b ...... Flat plate part 5 ...... Alignment mark 6 ...... Resist master 6 a ...... Body part 6 c ...... Flat plate part 7 ...... Mold core 8 …… Electric Casting stamper 8a …… Recess 8b …… Pattern surface 9 …… Puncture needle (three-dimensional shape)
D1: Exposure / development depth of resist layer D2: Lapping amount T1: Chrome layer thickness T2, T3: Resist layer thickness T4: Flat plate thickness T5, T7: Flat plate portion Thickness of T6 …… Electroforming stamper thickness

Claims (4)

A method for producing a mold core for use in molding a three-dimensional object having a fine region,
A light shielding mask having a shape corresponding to the planar projection shape of the three-dimensional object is formed on a light-transmitting substrate, a resist layer is formed on one surface of the substrate so as to cover the light shielding mask, and a gray scale mask is used. Resist layer processing for processing the resist layer into a three-dimensional shape having a main body corresponding to the three-dimensional shape and a flat plate formed around the main body by exposing and developing the resist layer Process,
The resist layer processed in the resist layer processing step is exposed through the substrate, and the resist layer is developed to remove the plate-like portion of the resist layer excluding the vicinity of the main body, and the 3 A resist matrix production process for producing a three-dimensional resist matrix having a body portion corresponding to a three-dimensional object and a flat plate portion formed around the body portion;
An electroforming stamper manufacturing process for manufacturing an electroforming stamper having a three-dimensional concave portion obtained by reversing the three-dimensional shape of the resist master mold using the resist master mold;
A method of manufacturing a die core, comprising: a step of cutting a pattern surface of the electroforming stamper to remove a portion corresponding to the flat plate portion of the resist mother die. The number of production of the resist matrix is plural,
In the resist matrix manufacturing process, when developing the resist layer, the development time is equal to or less than the time required for disappearance of the flat portion of the resist matrix having the fastest development speed among the plurality of resist matrices. The method for producing a mold core according to claim 1, wherein: In the electroforming stamper cutting process,
3. The method for manufacturing a mold core according to claim 1, wherein the pattern surface is cut by partially wrapping the pattern surface of the electroforming stamper.   A mold core manufactured by the method for manufacturing a mold core according to any one of claims 1 to 3.

Images