CN218938545U - Imprint master - Google Patents
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- CN218938545U CN218938545U CN202222303245.4U CN202222303245U CN218938545U CN 218938545 U CN218938545 U CN 218938545U CN 202222303245 U CN202222303245 U CN 202222303245U CN 218938545 U CN218938545 U CN 218938545U
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Abstract
The present utility model provides an imprint master comprising: a substrate; a first patterned structure and a second patterned structure formed on the substrate; the thickness of the substrate at the first patterned structure is smaller than that of the substrate at the second patterned structure. According to the technical scheme provided by the utility model, the first patterned structure and the second patterned structure with different thicknesses are formed, so that the imprinting master plate can be used for manufacturing the diffraction optical waveguide after synchronously transferring the patterns of the first patterned structure and the second patterned structure, and the coupling-out structure and the coupling-in structure with different morphologies can be manufactured separately, so that the influence on the morphology during simultaneous etching is avoided, the relative position deviation of the coupling-out structure and the coupling-in structure is eliminated, the morphology of the coupling-out structure and the coupling-in structure can reach the expected level, and the improvement of the overall performance of the diffraction optical waveguide is realized.
Description
Technical Field
The utility model relates to the field of diffraction optical waveguide preparation, in particular to an imprinting master.
Background
In general, a diffractive optical waveguide can be divided into two parts as viewed in terms of functional area division: the coupling-in grating region and the coupling-out grating region generally adopt grating structures with different morphologies according to the performance requirements of different functional regions. For example, the coupling-in region has a performance requirement of efficient coupling-in, a blazed grating is usually selected for the coupling-in grating region, and the coupling-out region has a performance requirement of uniform coupling-out, and a straight-tooth grating is usually selected for the coupling-out grating region.
Generally, the preparation difficulty of blazed gratings is high, and the process is complex, especially when etching is performed, the longer the etching time (or the deeper the etching depth is), the larger the influence on the surface morphology of the gratings is. If the blazed grating and the straight-tooth grating are formed by synchronous etching, the etching of the straight-tooth grating is limited by the etching conditions of the blazed grating, and particularly the effect is more obvious when the grating depths of the blazed grating and the straight-tooth grating are different, and the depth of the straight-tooth grating is generally deeper than that of the blazed grating, so that the performances of the blazed grating and the straight-tooth grating cannot be considered, and the finally obtained diffraction optical waveguide cannot achieve the expected effect. At present, blazed gratings and straight tooth gratings are generally formed by respectively etching through alignment, but the relative position deviation of coupling in and coupling out is easy to generate in the mode, and the overall performance of the diffraction optical waveguide is also affected. The development of a mode which can ensure the formation of structures with different coupling-in and coupling-out morphologies of the diffraction optical waveguide, simultaneously meets the requirement of no deviation of the coupling-in and coupling-out relative positions, is suitable for batch manufacturing and becomes a technical key point to be solved by the technicians in the field.
Disclosure of Invention
The utility model provides an imprinting master plate, which can ensure the formation of structures with different coupling-in and coupling-out morphologies of a diffraction optical waveguide, simultaneously meets the requirement of no deviation of the relative position of coupling-in and coupling-out, and is suitable for batch manufacturing.
According to a first aspect of the present utility model there is provided an imprint master comprising:
a substrate;
a first patterned structure and a second patterned structure formed on the substrate; the thickness of the substrate at the first patterned structure is smaller than that of the substrate at the second patterned structure.
Optionally, the first patterned structure includes a plurality of groove structures or a plurality of protrusion structures.
Optionally, the first patterned structure includes a groove structure with a uniform depth.
Optionally, the first patterned structure is a straight tooth structure.
Optionally, the second patterned structure is a blaze structure.
Optionally, the material of the imprint master is SiO 2 Si, quartz glass or high-fold glass.
Optionally, the shape of the first patterned structure and/or the second patterned structure is a closed shape surrounded by a curve and/or a straight line.
Optionally, the imprint master is used for preparing a diffraction optical waveguide, and the pattern of the first patterned structure is matched with the pattern of the coupling-out structure of the diffraction optical waveguide; the pattern of the second patterned structure matches the pattern of the coupling-in structure of the diffractive optical waveguide.
Optionally, the first patterned structure includes a groove structure with a position consistent with a groove position of the coupling-out structure of the diffractive optical waveguide, and the first patterned structure includes a groove structure with a width consistent with a groove width of the coupling-out structure of the diffractive optical waveguide.
Optionally, the pattern of the second patterned structure is complementary to the pattern of the coupling-in structure of the diffractive optical waveguide.
The technical scheme provided by the utility model is that an imprinting master is designed as follows: the embossing master plate comprises a first graphical structure and a second graphical structure, wherein the thickness of a substrate at the first graphical structure is smaller than that of a substrate at the second graphical structure, so that when the embossing master plate is used for manufacturing a diffraction optical waveguide, patterns of the first graphical structure and the second graphical structure can be synchronously transferred onto the diffraction optical waveguide, and the first graphical structure and the second graphical structure respectively correspond to a coupling-in structure and a coupling-out structure, so that the problem that the relative positions of the coupling-out structure and the coupling-in structure are deviated is solved; and the coupling-in structure and the coupling-out structure have different glue thickness when the pattern is transferred, so that the coupling-out structure and the coupling-in structure with different shapes are formed by designing the preparation mode with larger degree of freedom, the coupling-in structure and the coupling-out structure are not mutually influenced, and the improvement of the overall performance of the diffraction optical waveguide is realized.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions of the prior art, the drawings which are used in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the utility model, and that other drawings can be obtained according to these drawings without inventive faculty for a person skilled in the art.
FIG. 1 is a schematic diagram of an imprint master according to an embodiment of the present utility model;
FIGS. 2-7 are schematic device structures at various stages of the process of imprint mastering provided by an embodiment of the present utility model;
reference numerals illustrate:
101-imprinting a master;
1011-substrate;
1012-a first patterned structure;
1013-a second patterned structure;
201-a waveguide substrate;
202-patterning the imprinting glue;
2021-remaining patterned imprint gum;
203-a coupling-in structure;
204—a hard mask layer;
205-a second mask;
206-out-coupling structure.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The terms "first," "second," "third," "fourth" and the like in the description and in the claims and in the above drawings, if any, are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the embodiments of the utility model described herein may be implemented in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Conventional imprint masters typically have only one topography and are typically formed by one imprint when the imprint master is used to prepare a diffractive optical waveguide. That is, when the grating structure of the imprint master is in face-to-face bonding with the grating structure of the diffraction optical waveguide, the protrusions of the grating structure of the imprint master fill the grooves of the grating structure of the diffraction optical waveguide and are closely bonded, and similarly, the protrusions of the grating structure of the diffraction optical waveguide fill the grooves of the grating structure of the imprint master and are closely bonded. Therefore, the structure of the imprinting master plate in the prior art can not prepare the coupling-out structure and the coupling-in structure with different morphologies, which is not beneficial to improving the performance of the diffraction optical waveguide. In the prior art, coupling-out structures and coupling-in structures with different shapes are formed by means of alignment and etching respectively, so that relative position deviation of coupling-in and coupling-out is easy to generate, and the overall performance of the diffraction optical waveguide is also affected.
In view of this, the present application proposes a new structure of an imprint master designed to: the first patterning structure and the second patterning structure are formed on the substrate, and the relative positions of the first patterning structure and the second patterning structure are fixed, so that the patterns of the first patterning structure and the second patterning structure can be transferred onto the adhesive layer at one time when the patterning embossing adhesive is formed by transferring the patterns of the embossing master plate to the embossing adhesive in the process of preparing the diffraction optical waveguide by utilizing the embossing master plate, and the problem that the relative positions of the coupling-in structure and the coupling-out structure are deviated is solved. The thickness of the substrate at the first patterned structure is smaller than that at the second patterned structure, so that the patterned imprinting glue is used as a first mask to etch on the waveguide substrate, after the second patterned structure with larger thickness is formed on the waveguide substrate, the residual patterned imprinting glue at the corresponding position of the first patterned structure with smaller thickness also keeps the pattern of the patterned imprinting glue, thereby providing greater freedom degree to design how to protect the formed coupling-in part (the part corresponding to the first patterned structure) and continuing to form the coupling-out part (the part corresponding to the second patterned structure) to be formed; finally, the coupling-out structure and the coupling-in structure with different morphologies can be etched, and the morphologies of the coupling-out structure and the coupling-in structure can reach the expectations.
Therefore, the technical scheme provided by the application can solve the problem of eliminating the relative position deviation of the coupling-out structure and the coupling-in structure when etching the coupling-out structure and the coupling-out structure with different morphologies, and improve the overall performance of the diffraction optical waveguide.
The technical scheme of the utility model is described in detail below by specific examples. The following embodiments may be combined with each other, and some embodiments may not be repeated for the same or similar concepts or processes.
Referring to FIG. 1, according to one embodiment of the present utility model, an imprint master 101 is provided; it should be noted that fig. 1 is only a schematic diagram of an imprint master 101 according to an embodiment of the present utility model, but the present application is not limited thereto, and any imprint master 101 structure that can achieve the purposes of the present application within the scope of the present application is within the scope of protection of the present application; as shown in fig. 1, the imprint master 101 includes:
a substrate 1011; typically the material of substrate 1011 may be SiO 2 Si, quartz glass, high-refractive-index glass, or the like. The base material is not limited to this.
A first patterned structure 1012 and a second patterned structure 1013 formed on a substrate 1011; wherein the thickness of the substrate 1011 at the first patterned structure 1012 is smaller than the thickness of the substrate 1011 at the second patterned structure 1013; in a specific embodiment, an application of the imprint master 101 is shown in FIG. 1. Wherein the first patterned structure 1012 and the second patterned structure 1013 are different in pattern.
In one embodiment, the shape of the first patterned structure 1012 and/or the second patterned structure 1013 is a closed shape surrounded by a curve and/or a straight line. The shape herein refers to the shape of the region where the first patterned structure 1012 and/or the second patterned structure 1013 are located.
In one embodiment, the imprint master 101 is used to prepare a diffractive optical waveguide, and the pattern of the first patterned structure 1012 matches the pattern of the coupling-out structure 206 of the diffractive optical waveguide.
In practice, the pattern of the first patterned structure 1012 matches the pattern of the coupling-out structure 206 of the diffractive optical waveguide, and may be that the pattern of the first patterned structure 1012 is complementary to the pattern of the coupling-out structure 206 of the diffractive optical waveguide; or the pattern of the first patterned structure 1012 coincides with the pattern of the coupling-out structure 206 of the diffractive optical waveguide, i.e. the groove position of the first patterned structure 1012 coincides with the groove position and width of the coupling-out structure 206 of the diffractive optical waveguide.
In one embodiment, the first patterned structure 1012 is a straight tooth structure, which is a structure recessed with respect to the surface of the substrate 1011. The coupling-out structure of the diffractive optical waveguide is also a straight-tooth structure, and may specifically be a structure that is raised with respect to the surface of the diffractive optical waveguide, or a structure that is recessed with respect to the surface of the diffractive optical waveguide.
In one embodiment, the pattern of the second patterned structure 1013 matches the pattern of the coupling structure 203 of the diffractive optical waveguide. In practice, the pattern of the second patterned structure 1013 is complementary to the pattern of the coupling-in structure 203 of the diffractive optical waveguide.
In one embodiment, the second patterned structure 1013 is a blaze structure; the incoupling structure 203 of the diffractive optical waveguide is a blazed structure, the two blazed structures being complementary.
In one embodiment, the first patterned structure 1012 includes a number of recessed structures or a number of raised structures; fig. 1 shows a first patterned structure 1012 of a groove structure.
When first patterned structure 1012 includes a plurality of groove structures, in one embodiment, first patterned structure 1012 includes groove structures having widths that are designed to correspond to the groove widths of coupling-out structures 206 of the diffractive optical waveguide.
The method for preparing the imprint master 101 provided by the utility model specifically comprises the following steps:
s11: the imprint master 101 is formed using a micro-nano patterning process or a dry etching technique.
S12: the imprint master 101 is subjected to a cleaning process.
The method specifically comprises the following steps: the first step: soaking the imprinting master 101 in a cleaning solution, heating to 125 ℃, and soaking and cleaning for 10min; and a second step of: proportioning NH4OH, H2O2 and H2O solution, heating to 70 ℃, soaking and cleaning for 10min; thereby eventually forming an imprint master 101; in one embodiment, the cleaning solution used for cleaning the imprint master 101 is: h2SO4, H2O2 and H2O solution.
Specifically, referring to fig. 2 to fig. 7, according to the imprint master 101 provided by the embodiment of the present utility model, and the diffractive optical waveguide is prepared by a nanoimprint technology, the imprint master 101 of the present utility model is suitable for preparing the diffractive optical waveguides coupled in and coupled out of different morphological structures, and includes the following steps:
s1: making an imprint master 101;
s2: coating embossing glue on the waveguide substrate 201 by adopting micro-nano processing modes such as spin coating or spray coating;
s3: the imprint master 101 is fully contacted with the imprint adhesive by adopting an integrated nano imprinting process, so that the imprint master 101 is transferred to the imprint adhesive in a complete structure to form a patterned imprint adhesive 202 (shown in fig. 1);
s4: the patterned imprint resist 202 is fully cured by adopting an ultraviolet lamp exposure or thermal curing technology; a de-molding process is then performed to separate the master from the patterned imprint resist 202. Obtaining structural information corresponding to the master plate on the patterned imprinting glue 202 after demolding, wherein the information can be used as a mask for later dry etching;
s5: the first stage etching is performed by using the patterned imprint resist 202 as a first mask by adopting a dry etching process, and when the patterned imprint resist 202 in the coupling-in region is just etched, and the structure is completely formed on the substrate 1011, the dry etching process is stopped, so that the coupling-in structure 203 is formed on the waveguide substrate 201, and meanwhile, the remaining patterned imprint resist 2021 in the coupling-out region retains the pattern of the patterned imprint resist 202 corresponding to the coupling-out region (as shown in fig. 3).
S6: on the basis of the step 5, a hard mask layer 204 (shown in fig. 4) is deposited by vacuum coating technology, and the mask layer is far more resistant to dry etching than the photoresist. Removing the remaining patterned imprint resist 2021 and the hard mask layer 204 on top thereof by a stripping process to expose the substrate 1011 of the coupling-out structure 206; taking the residual hard mask layer 204 as a second mask 205 (shown in fig. 5), performing second-stage etching on the target material substrate by adopting a dry etching process, forming a coupling-out region structure on the waveguide substrate 201, and stopping etching when the target depth is reached; removing the residual hard mask layer from the etched waveguide substrate 201 to obtain a final coupled-in and coupled-out diffraction optical waveguide structure (shown in fig. 6) with different morphologies and no positional deviation; and the morphology of the resulting in-coupling and out-coupling structure can also reach the desired level.
Of course, when it is desired to etch the coupling-out structures 206 having different etching depths, the coupling-out structures 206 having different etching depths may be etched using the photoresist as a mask before removing the remaining hard mask layer 204 (as shown in fig. 7).
It can be seen that, since the thickness of the substrate 1011 at the first patterned structure 1012 is smaller than the thickness of the substrate 1011 at the second patterned structure 1013, the imprint master 101 provided by the present utility model is used to imprint the patterned imprint resist 202; the thickness of the imprint resist imprinted at the first patterned structure 1012 is greater than the thickness of the imprint resist imprinted at the second patterned structure 1013; when the coupling-in structure 203 is etched on the waveguide substrate 201 by using the patterned imprint resist 202 as a first mask, the remaining imprint resist on the coupling-out structure 206 also retains the pattern of the patterned imprint resist 202, and then the coupling-out structure 206 is etched by using the second mask 205; the etch depth of the fabricated out-coupling structure 206 is greater than the etch depth of the in-coupling structure 203; therefore, the coupling-out structure 206 and the coupling-in structure 203 with different shapes can be etched by using the diffraction optical waveguide manufactured by the imprint master 101 provided by the application, namely, the etching depth of the coupling-in structure 203 and the etching depth of the coupling-out structure 206 are considered, meanwhile, the problem of relative position deviation of the coupling-in coupling-out manufactured by using the imprint master 101 in the prior art is eliminated, and the improvement of the overall performance of the diffraction optical waveguide is realized.
The technical scheme provided by the utility model is that an imprinting master is designed as follows: the embossing master plate comprises a first graphical structure and a second graphical structure, wherein the thickness of a substrate at the first graphical structure is smaller than that of a substrate at the second graphical structure, so that when the embossing master plate is used for manufacturing a diffraction optical waveguide, patterns of the first graphical structure and the second graphical structure can be simultaneously transferred onto the diffraction optical waveguide, and the first graphical structure and the second graphical structure respectively correspond to a coupling-in structure and a coupling-out structure, so that the problem that the relative positions of the coupling-out structure and the coupling-in structure are deviated is solved; and the coupling-in structure and the coupling-out structure have different glue thickness when the pattern is transferred, so that the coupling-out structure and the coupling-in structure with different shapes are formed by designing the preparation mode with larger degree of freedom, the coupling-in structure and the coupling-out structure are not mutually influenced, and the improvement of the overall performance of the diffraction optical waveguide is realized.
In one example, the first patterned structure 1012 includes a groove structure sized to correspond to the groove size of the predetermined coupling-out structure 206 of the diffractive optical waveguide, and the groove is also positioned to correspond to the groove; the size of the pattern of patterned imprint resist 2021 remaining after the first stage etch is consistent with the size of the groove structure of first patterned structure 1012; when the remaining patterned imprint resist 2021 on the surface of the coupling-out structure 206 and the hard mask layer 204 on the surface thereof are removed by using a solution process, the size of the substrate 1011 of the coupling-out structure 206 exposed is consistent with the size and the position of the groove structure included in the first patterned structure 1012 on the imprint master 101, and the size of the groove of the coupling-out structure 206 etched on the waveguide substrate 201 by using the hard mask layer 204 as the second mask 205 is consistent with the preset size of the groove of the coupling-out structure 206; the first patterned structure 1012 includes a groove structure sized to correspond to the groove size of the coupling-out structure 206 of the diffractive optical waveguide refers to: the width of the groove structures corresponds to the width of the grooves of the out-coupling structures 206.
In one example, the first patterned structure 1012 includes a groove structure of uniform depth.
The imprinting master 101 provided by the utility model can be applied to manufacturing the diffraction optical waveguides of the coupling-out structures 206 with the same etching depth, and can also be used for manufacturing the diffraction optical waveguides of the coupling-out structures 206 with different etching depths. Specifically, on the basis of etching the coupling-out structures 206 of the diffractive optical waveguides having the same etching depth, the photoresist is used as a mask to continuously etch the local positions of the coupling-out structures 206 having the deeper depth, so as to form the coupling-out structures 206 of the diffractive optical waveguides having different etching depths.
It can be seen that the imprint master 101 provided by the present utility model can be used to fabricate the out-coupling structures 206 and the in-coupling structures 203 of different morphologies. In addition, the optical waveguide substrate 201 can be manufactured by using the coupling-out structures 206 with different etching depths, so that the imprint master 101 provided by the utility model is widely applied and is easy to manufacture the optical waveguide substrate 201 in batch.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and not for limiting the same; although the utility model has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the utility model.
Claims (9)
1. An imprint master, comprising:
a substrate;
a first patterned structure and a second patterned structure formed on the substrate; wherein the thickness of the substrate at the first patterned structure is smaller than the thickness of the substrate at the second patterned structure;
the imprinting master is used for preparing the diffraction optical waveguide, and the pattern of the first patterned structure is matched with the pattern of the coupling-out structure of the diffraction optical waveguide; the pattern of the second patterned structure matches the pattern of the coupling-in structure of the diffractive optical waveguide.
2. The imprint master of claim 1 wherein the first patterned structure comprises a number of groove structures or a number of land structures.
3. The imprint master of claim 2 wherein the first patterned structure comprises a uniform depth of groove structures.
4. The imprint master of claim 2 wherein the first patterned structure is a straight tooth structure.
5. The imprint master of claim 1 wherein the second patterned structure is a blaze structure.
6. The imprint master of any one of claims 1-5 wherein the material of the imprint master is SiO 2 Si, quartz glass or high-fold glass.
7. The imprint master of any one of claims 1-5, wherein the shape of the first patterned structure and/or the second patterned structure is a closed shape surrounded by curves and/or lines.
8. The imprint master of claim 1 wherein the first patterned structure comprises groove structures having a position that corresponds to a groove position of the coupling-out structure of the diffractive optical waveguide, and wherein the first patterned structure comprises groove structures having a width that corresponds to a groove width of the coupling-out structure of the diffractive optical waveguide.
9. The imprint master of claim 1 wherein the pattern of the second patterned structure is complementary to the pattern of the coupling-in structure of the diffractive optical waveguide.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222303245.4U CN218938545U (en) | 2022-08-31 | 2022-08-31 | Imprint master |
| PCT/CN2023/113098 WO2024046111A1 (en) | 2022-08-31 | 2023-08-15 | Preparation method for diffractive optical waveguide, diffractive optical waveguide, and imprinting master mold |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222303245.4U CN218938545U (en) | 2022-08-31 | 2022-08-31 | Imprint master |
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| Publication Number | Publication Date |
|---|---|
| CN218938545U true CN218938545U (en) | 2023-04-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202222303245.4U Active CN218938545U (en) | 2022-08-31 | 2022-08-31 | Imprint master |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024046111A1 (en) * | 2022-08-31 | 2024-03-07 | 上海鲲游科技有限公司 | Preparation method for diffractive optical waveguide, diffractive optical waveguide, and imprinting master mold |
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2022
- 2022-08-31 CN CN202222303245.4U patent/CN218938545U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024046111A1 (en) * | 2022-08-31 | 2024-03-07 | 上海鲲游科技有限公司 | Preparation method for diffractive optical waveguide, diffractive optical waveguide, and imprinting master mold |
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