JP2011026702A - SPUTTERING TARGET MATERIAL OF Fe-Co-Ni-BASED ALLOY - Google Patents

SPUTTERING TARGET MATERIAL OF Fe-Co-Ni-BASED ALLOY Download PDF

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JP2011026702A
JP2011026702A JP2010149009A JP2010149009A JP2011026702A JP 2011026702 A JP2011026702 A JP 2011026702A JP 2010149009 A JP2010149009 A JP 2010149009A JP 2010149009 A JP2010149009 A JP 2010149009A JP 2011026702 A JP2011026702 A JP 2011026702A
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JP5656104B2 (en
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Tomonori Ueno
友典 上野
Atsushi Fukuoka
淳 福岡
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Proterial Ltd
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Hitachi Metals Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a sputtering target material of an Fe-Co-Ni-based alloy having low magnetic permeability, which can improve the efficiency of use in the magnetron sputtering, and can increase the plate thickness of the target. <P>SOLUTION: The sputtering target material of the Fe-Co-Ni-based alloy is formed of a sintered body having such a composition ratio as to satisfy Fe:Ni=90:10 to 65:35 and (Fe+Ni):Co=90:10 to 10:90 by atom ratio, and includes crystal phases containing 35 atom% or less Ni, 15 atom% or less Co and mainly Fe in the structure of the sintered target material, in which the ratio Ifcc(200)/Ibcc(200) of X-ray diffraction peak intensity (Ifcc(200)) obtained from the (200) face of the fcc phase containing mainly Fe of the crystal phases containing mainly Fe, to X-ray diffraction peak intensity (Ibcc(200)) obtained from the (200) face of the bcc phase containing mainly Fe is 10 or more. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、軟磁性膜を形成するためのFe−Co−Ni系合金スパッタリングターゲット材に関するものである   The present invention relates to an Fe—Co—Ni alloy sputtering target material for forming a soft magnetic film.

近年、高度情報化社会により磁気記録の高密度化が強く望まれている。この高密度化を実現する技術として、従来の面内磁気記録方式に代わり垂直磁気記録方式が実用化されている。   In recent years, high recording density has been strongly demanded by an advanced information society. As a technique for realizing this high density, a perpendicular magnetic recording system has been put into practical use instead of the conventional in-plane magnetic recording system.

垂直磁気記録方式とは、垂直磁気記録媒体の磁性膜を媒体面に対して磁化容易軸が垂直方向に配向するように形成したものであり、記録密度を上げて行ってもビット内の反磁界が小さく、記録再生特性の低下が少ない高記録密度に適した方法である。そして、垂直磁気記録方式においては、記録感度を高めた磁気記録膜層と軟磁性膜層とを有する記録媒体が開発されている。
このような磁気記録媒体の軟磁性膜としては、優れた軟磁気特性が要求されることから、アモルファス軟磁性合金が採用されている。代表的な軟磁性膜用アモルファス合金として、Fe、CoあるいはFe−Co合金に添加元素を含む合金膜、Co−Zr−Nb合金膜、Co−Zr−Ta合金膜などが既に実用化されている(例えば、特許文献1参照)。
Perpendicular magnetic recording is a method in which the magnetic film of a perpendicular magnetic recording medium is formed so that the axis of easy magnetization is oriented perpendicularly to the medium surface. This is a method suitable for high recording density with a small decrease in recording and reproduction characteristics. In the perpendicular magnetic recording system, a recording medium having a magnetic recording film layer and a soft magnetic film layer with improved recording sensitivity has been developed.
As the soft magnetic film of such a magnetic recording medium, an amorphous soft magnetic alloy is adopted because excellent soft magnetic properties are required. As typical amorphous alloys for soft magnetic films, Fe, Co or Fe—Co alloys containing an additive element, Co—Zr—Nb alloy films, Co—Zr—Ta alloy films, etc. have already been put into practical use. (For example, refer to Patent Document 1).

一般的に、軟磁性膜の成膜にはマグネトロンスパッタリング法が用いられることが知られている。マグネトロンスパッタリング法とは、ターゲット材の背後に磁石を配置し、ターゲット材の表面に磁束を漏洩させて、その漏洩磁束領域にプラズマが収束されることにより高速成膜を可能とするスパッタリング法である。このマグネトロンスパッタリング法はターゲット材のスパッタ表面に磁束を漏洩させることに特徴があるため、ターゲット材自身の透磁率が大きい場合あるいは飽和磁束密度が大きい場合にはターゲット材のスパッタ表面にマグネトロンスパッタリング法に必要十分な漏洩磁束を形成するのが難しくなる。そこで、ターゲット材自身の透磁率を極力低減しなければならないという要求がある。
このような要求に対して、スパッタリング後の軟磁性膜としては飽和磁束密度大きいが、ターゲット材としては十分な漏洩磁束が得られ、飽和磁束密度が低くなる材料が提案されている(例えば、特許文献2参照)。
In general, it is known that a magnetron sputtering method is used to form a soft magnetic film. The magnetron sputtering method is a sputtering method that enables high-speed film formation by placing a magnet behind the target material, leaking magnetic flux to the surface of the target material, and converging the plasma in the leakage magnetic flux region. . This magnetron sputtering method is characterized in that magnetic flux leaks to the sputtering surface of the target material. Therefore, when the magnetic permeability of the target material itself is large or the saturation magnetic flux density is large, the magnetron sputtering method is applied to the sputtering surface of the target material. It becomes difficult to form a necessary and sufficient leakage magnetic flux. Therefore, there is a requirement that the permeability of the target material itself must be reduced as much as possible.
In response to such requirements, a material has been proposed that has a high saturation magnetic flux density as a soft magnetic film after sputtering but a sufficient leakage magnetic flux as a target material and a low saturation magnetic flux density (for example, patents). Reference 2).

特開2004−206805号公報JP 2004-206805 A 特開2007−59424号公報JP 2007-59424 A

上述の特許文献2では、ターゲットの飽和磁束密度を低下させてマグネトロンスパッタ装置のマグネットからの漏洩磁束を十分に確保するため、2種類以上の結晶相を含む磁性薄膜作製用ターゲットにおいて、結晶相のうち少なくとも1種類をFe:60〜80原子%、かつNi:20〜40原子%のFeNi合金に制御することが提案されている。このターゲットは、FeNi系合金を主成分とするターゲットにおいて、重量比でFe:Ni=70:30で磁性がなくなる特徴を利用したターゲットの組織制御を行うことでターゲット自身の飽和磁束密度を低減できる大変優れたものである。   In the above-mentioned Patent Document 2, in order to reduce the saturation magnetic flux density of the target and sufficiently secure the leakage magnetic flux from the magnet of the magnetron sputtering apparatus, in the magnetic thin film production target including two or more types of crystal phases, It has been proposed to control at least one of the FeNi alloys with Fe: 60 to 80 atomic% and Ni: 20 to 40 atomic%. This target can reduce the saturation magnetic flux density of the target itself by controlling the structure of the target using a feature in which Fe: Ni = 70: 30 in a weight ratio and the magnetism is lost in a target mainly composed of an FeNi alloy. It is very good.

本発明の目的は、マグネトロンスパッタリングにおけるさらなる使用効率改善やターゲット板厚を厚くすることが可能である、より透磁率の低いFe−Co−Ni系合金スパッタリングターゲット材を提供することである。   An object of the present invention is to provide a Fe—Co—Ni alloy sputtering target material having a lower magnetic permeability, which can further improve use efficiency in magnetron sputtering and increase a target plate thickness.

本発明者らは、垂直磁気記録媒体等に用いられる軟磁性膜を形成するためのFe−Co−Ni系合金スパッタリングターゲット材について、漏洩磁束の確保のため、Fe−Co−Ni合金の結晶相の結晶構造を検討した結果、ターゲット材の組織中に、Feを主体とする結晶相として磁気モーメントの比較的小さいfcc相を一定量以上残存させた結晶組織とすることにより、透磁率の低いスパッタリングターゲット材が得られることを見出し本発明に到達した。   In order to secure leakage magnetic flux, the present inventors have investigated the crystal phase of Fe—Co—Ni alloy for Fe—Co—Ni alloy sputtering target material for forming a soft magnetic film used for perpendicular magnetic recording media and the like. As a result of studying the crystal structure, sputtering with low permeability is achieved by forming a crystal structure in which a certain amount or more of the fcc phase having a relatively small magnetic moment remains as a crystal phase mainly composed of Fe in the structure of the target material. The inventors have found that a target material can be obtained and have reached the present invention.

すなわち本発明は、原子比でFe:Ni=90:10〜65:35、かつ(Fe+Ni):Co=90:10〜10:90の組成比を有する焼結体からなるFe−Co−Ni系合金スパッタリングターゲット材であって、前記ターゲット材の焼結組織中に、35原子%以下のNi、15原子%以下のCoを含有するFeを主体とする結晶相を有し、かつターゲット材の10mm以上の領域をX回折強度測定した時の前記Feを主体とする結晶相のFeを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))との比Ifcc(200)/Ibcc(200)が10以上であるFe−Co−Ni系合金スパッタリングターゲット材ある。好ましくは、(Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、B、Al、Si)から選ばれる1種もしくは2種以上の元素を30原子%以下含有する。 That is, the present invention provides an Fe—Co—Ni system comprising a sintered body having an atomic ratio of Fe: Ni = 90: 10 to 65:35 and (Fe + Ni): Co = 90: 10 to 10:90. An alloy sputtering target material having a crystal phase mainly composed of Fe containing 35 atomic% or less of Ni and 15 atomic% or less of Co in the sintered structure of the target material, and 10 mm of the target material. X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe of the crystal phase mainly composed of Fe when X diffraction intensity is measured in two or more regions and mainly composed of Fe Fe-Co-Ni-based alloy sputtering in which the ratio Ifcc (200) / Ibcc (200) to the X-ray diffraction peak intensity (Ibcc (200)) from the (200) plane of the bcc phase is 10 or more There is a target material. Preferably, 30 atomic% or less of one or more elements selected from (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, B, Al, Si) is contained.

本発明によれば、マグネトロンスパッタリングにおける使用効率改善やターゲット板厚を厚くすることが可能である透磁率が低い軟磁性膜形成用のFe−Co−Ni系合金スパッタリングターゲット材を安定提供でき、垂直磁気記録媒体のようにFe−Co−Ni系合金の軟磁性膜を必要とする工業製品を製造する上で極めて有効な技術となる。   ADVANTAGE OF THE INVENTION According to this invention, the Fe-Co-Ni type alloy sputtering target material for soft-magnetic film formation with a low magnetic permeability which can use efficiency improvement in magnetron sputtering and can make target plate thickness thick can be provided stably, and perpendicular | vertical. This is an extremely effective technique for manufacturing an industrial product that requires a soft magnetic film of an Fe—Co—Ni alloy, such as a magnetic recording medium.

実施例における試料1のX線回折強度チャートである。It is an X-ray diffraction intensity chart of sample 1 in an example. 実施例における試料2のX線回折強度チャートである。It is a X-ray diffraction intensity chart of the sample 2 in an Example. 実施例における試料3のX線回折強度チャートである。It is a X-ray diffraction intensity chart of the sample 3 in an Example. 実施例における試料4のX線回折強度チャートである。It is a X-ray diffraction intensity chart of the sample 4 in an Example. 実施例における試料5のX線回折強度チャートである。It is a X-ray diffraction intensity chart of the sample 5 in an Example. 実施例における試料6のX線回折強度チャートである。It is a X-ray diffraction intensity chart of the sample 6 in an Example. 実施例における試料7のX線回折強度チャートである。It is an X-ray diffraction intensity chart of sample 7 in an example.

上述したように、本発明の重要な特徴は、Fe−Co−Ni系合金スパッタリングターゲット材の組織中に、Feを主体とする結晶相としてfcc相を一定量以上残存させた結晶組織とすることで、従来にない低透磁率のスパッタリングターゲットを実現した点にある。   As described above, an important feature of the present invention is that the Fe-Co-Ni alloy sputtering target material has a crystal structure in which a certain amount or more of the fcc phase remains as a crystal phase mainly composed of Fe. Thus, an unprecedented low permeability sputtering target is realized.

まず、本発明のFe−Co−Ni系合金スパッタリングターゲット材は、原子比でFe:Ni=90:10〜65:35、かつ(Fe+Ni):Co=90:10〜10:90の組成である。垂直式記録媒体の軟磁性膜としては、高飽和磁化を有することが望ましく、Fe、Ni、Coを含有する組成系が検討されている。本発明における組成を原子比Fe:Ni=90:10〜65:35としているのは、Niを10原子%以上とすることで磁歪を低減する効果が得られこと、また35原子%を超えると磁気モーメントの低下が大きく、磁気記録媒体の軟磁性膜として望ましい軟磁気特性が得がたくなるためである。また、原子比(Fe+Ni):Co=90:10〜10:90としているのは、Fe、Ni、Coの組成比率をこの値に制御することで、垂直磁気記録媒体に用いる軟磁性膜として高飽和磁化膜とすることが可能となるためである。   First, the Fe—Co—Ni-based alloy sputtering target material of the present invention has a composition of Fe: Ni = 90: 10 to 65:35 and (Fe + Ni): Co = 90: 10 to 10:90 in atomic ratio. . As the soft magnetic film of the perpendicular recording medium, it is desirable to have high saturation magnetization, and a composition system containing Fe, Ni, and Co has been studied. The composition in the present invention has an atomic ratio of Fe: Ni = 90: 10 to 65:35 because the effect of reducing magnetostriction can be obtained by making Ni 10 atomic% or more, and when the atomic ratio exceeds 35 atomic%. This is because the magnetic moment is greatly lowered and it is difficult to obtain soft magnetic characteristics desirable as a soft magnetic film of a magnetic recording medium. Also, the atomic ratio (Fe + Ni): Co = 90: 10 to 10:90 is high as a soft magnetic film used for a perpendicular magnetic recording medium by controlling the composition ratio of Fe, Ni, and Co to this value. This is because a saturated magnetization film can be obtained.

次に、本発明のスパッタリングターゲットの焼結組織について説明する。
本発明のスパッタリングターゲット材は、その焼結組織中に、35原子%以下のNi、15原子%以下のCoを含有するFeを主体とする結晶相を有し、ターゲット材の10mm以上の領域をX回折強度測定した時の当該Feを主体とする結晶相のFeを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))との比Ifcc(200)/Ibcc(200)が10以上になるように組織制御を行う。
本発明のFeを一定組成比以上含むFe−Co−Ni合金においては、Feが最も磁気モーメントが高いため、Feを主体とする結晶相の磁化を低減することが、Fe−Co−Ni系合金スパッタリングターゲット材の透磁率の低減において重要となる。
Next, the sintered structure of the sputtering target of the present invention will be described.
The sputtering target material of the present invention has a crystal phase mainly composed of Fe containing 35 atomic percent or less of Ni and 15 atomic percent or less of Co in the sintered structure, and a region of 10 mm 2 or more of the target material. X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe and the bcc phase mainly composed of Fe when X diffraction intensity is measured The structure is controlled so that the ratio Ifcc (200) / Ibcc (200) to the X-ray diffraction peak intensity (Ibcc (200)) from the (200) plane becomes 10 or more.
In the Fe—Co—Ni alloy containing Fe of a certain composition ratio or more according to the present invention, since Fe has the highest magnetic moment, it is possible to reduce the magnetization of the crystal phase mainly composed of Fe. This is important in reducing the magnetic permeability of the sputtering target material.

上述の特許文献2では、Fe:Ni=70:30で磁性がなくなる特徴を利用した組織制御を行うことで、ターゲット自身の飽和磁束密度を低減し、透磁率を低減することを見出したものである。一方、本発明では、原料粉末の粒度を粗くして拡散による組成変動を抑えたり、高温安定相であるfcc相を残留させるために急冷工程を含む熱処理を行うことにより、さらにFeを主体とする結晶相をfcc相として安定的に残存させることで、さらに透磁率の低減を図るものである。
一般にFeは磁気モーメントの大きいbcc相が安定であるが、fcc相は比較的磁気モーメントが小さい相となる。そこで、本発明においては、Feを主体とする結晶相において、fcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))との比Ifcc(200)/Ibcc(200)が10以上となるように、Feを主体とする結晶相として安定的にfcc相を形成することで透磁率のさらなる低減を実現するものである。
なお、X線回折強度は、ターゲット材の10mm以上の面積の領域にX線を照射した場合の回折強度として測定する。
In the above-mentioned patent document 2, it has been found that the saturation magnetic flux density of the target itself is reduced and the magnetic permeability is reduced by performing the structure control using the feature that the magnetism disappears at Fe: Ni = 70: 30. is there. On the other hand, in the present invention, the raw material powder is coarsened to suppress composition fluctuations due to diffusion, or heat treatment including a rapid cooling step is performed in order to leave the fcc phase that is a high-temperature stable phase, thereby further comprising mainly Fe. By allowing the crystal phase to remain stably as the fcc phase, the magnetic permeability is further reduced.
In general, Fe is stable in the bcc phase having a large magnetic moment, but the fcc phase is a phase having a relatively small magnetic moment. Therefore, in the present invention, in the crystal phase mainly composed of Fe, the X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase and the X-ray diffraction peak from the (200) plane of the bcc phase. Further reduction in magnetic permeability by stably forming an fcc phase as a crystalline phase mainly composed of Fe so that the ratio Ifcc (200) / Ibcc (200) to the strength (Ibcc (200)) is 10 or more. Is realized.
The X-ray diffraction intensity is measured as the diffraction intensity when X-rays are irradiated on a region having an area of 10 mm 2 or more of the target material.

なお、本発明におけるFeを主体とする結晶相では、fcc相を主相にするためNiやCoを添加することが有効であるが、35原子%を超えるNiや15原子%を超えるCoがFeを主体とする結晶相に含有されるとfcc相が主相となってもfcc相自体の磁化が大きくなるため、Feを主体とする結晶相を35原子%以下のNi、15原子%以下のCoを含有するFeを主体とする結晶相とした。また、FeはNiの含有量が30原子%以下の領域においては平衡状態で安定的にfcc構造を得がたいため、特に30原子%以下でNiを含有するFeを主体とする結晶相である場合にfcc相を安定的に残存させることが効果的で望ましい。   In addition, in the crystal phase mainly composed of Fe in the present invention, it is effective to add Ni or Co in order to make the fcc phase the main phase, but Ni exceeding 35 atomic% or Co exceeding 15 atomic% is Fe. When the fcc phase is the main phase, the magnetization of the fcc phase itself is increased, so that the Fe-based crystal phase contains 35 atomic% or less Ni and 15 atomic% or less. The crystal phase was mainly composed of Fe containing Co. In addition, since Fe is difficult to obtain an fcc structure stably in an equilibrium state in a region where the Ni content is 30 atomic% or less, especially when it is a crystal phase mainly composed of Fe containing Ni at 30 atomic% or less. It is effective and desirable to leave the fcc phase stably.

また、Feを主体とする結晶相のFeを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))の比Ifcc(200)/Ibcc(200)が10未満であるとfcc相の存在がターゲット材の磁化低減には十分では無く、10以上とすることによりターゲット材の磁化低減の効果が得られることが確認された。なお、X線回折ピーク強度(Ifcc(200)/Ibcc(200))は大きければ大きいほど好ましいことは言うまでもない。
なお、本来、最密面であるfcc相(111)面とbcc相(110)面のX線回折ピーク強度比を比較することが好ましいが、fcc相(111)面とbcc相(110)はピーク位置が隣接するため、bcc相からのピークはfcc相からのいずれのピークとも隣接しない(200)面を選定した。また、bcc(200)面のピーク強度は比較的弱いためIfcc(200)/Ibcc(200)が10以上でなければターゲット材の磁化低減に十分なfcc相の量比とはならない。
Further, the X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe in the crystal phase mainly composed of Fe and the (200) plane of the bcc phase mainly composed of Fe. When the ratio Ifcc (200) / Ibcc (200) of the X-ray diffraction peak intensity (Ibcc (200)) is less than 10, the presence of the fcc phase is not sufficient for reducing the magnetization of the target material, and the ratio is made 10 or more. It was confirmed that the effect of reducing the magnetization of the target material was obtained. Needless to say, the larger the X-ray diffraction peak intensity (Ifcc (200) / Ibcc (200)), the better.
Although it is originally preferable to compare the X-ray diffraction peak intensity ratios of the fcc phase (111) plane and the bcc phase (110) plane, which are the closest packed plane, the fcc phase (111) plane and the bcc phase (110) are Since the peak positions are adjacent, the (200) plane that is not adjacent to any peak from the fcc phase is selected as the peak from the bcc phase. Further, since the peak intensity of the bcc (200) plane is relatively weak, the amount ratio of the fcc phase sufficient for reducing the magnetization of the target material cannot be obtained unless Ifcc (200) / Ibcc (200) is 10 or more.

また、本発明のFe−Co−Ni系合金スパッタリングターゲット材は、(Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、B、Al、Si)から選ばれる1種もしくは2種以上の元素を30原子%以下含有することが好ましい。それは、これらの元素を含有することにより、軟磁性膜として必要な特性を改善することが可能となる。特に、膜のアモルファス化、高耐食性、高透磁率には、(Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、B、Al、Si)から選ばれる2種以上の元素を5原子%以上添加することが好ましい。   In addition, the Fe—Co—Ni alloy sputtering target material of the present invention is one or two selected from (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, B, Al, Si). It is preferable to contain 30 atomic% or less of the above elements. By containing these elements, it is possible to improve the characteristics required as a soft magnetic film. In particular, two or more elements selected from (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, B, Al, Si) are used for film amorphization, high corrosion resistance, and high magnetic permeability. It is preferable to add 5 atomic% or more.

本発明のFe−Co−Ni系合金ターゲット材の製造方法としては、例えば以下の方法が適用できる。
本発明のFe−Co−Ni系合金スパッタリングターゲット材は、Feを主体とする結晶相として安定的にfcc相を形成することに特徴を有するため、ターゲットを焼結法で作製する際には、Feはfcc構造を有する原料粉末として用いるのが良い。例えば、35原子%以下のNi、15原子%以下のCoを含有する残部Feからなるfcc構造のFeを主体とする合金粉末を必須の原料粉末とする。
焼結に適用する原料粉末の組合せとしては、上記のFeを主体とする合金粉末とその他の1種の合金粉末で所望のターゲット組成になることが好ましいが、Feを主体とする合金粉末と複数の合金粉末や純金属粉末を用いても本発明の効果は得られる。
As a method for producing the Fe—Co—Ni alloy target material of the present invention, for example, the following method can be applied.
Since the Fe—Co—Ni based alloy sputtering target material of the present invention is characterized by stably forming an fcc phase as a crystal phase mainly composed of Fe, when producing a target by a sintering method, Fe is preferably used as a raw material powder having an fcc structure. For example, an alloy powder mainly composed of fcc structure Fe composed of the remaining Fe containing 35 atomic% or less of Ni and 15 atomic% or less of Co is used as the essential raw material powder.
As a combination of the raw material powders applied to the sintering, it is preferable that the above-mentioned alloy powder mainly composed of Fe and one other kind of alloy powder have a desired target composition. The effects of the present invention can be obtained even when an alloy powder or a pure metal powder is used.

また、Feを主体とする合金粉末は粉末の粒度が粗い方が製造過程での拡散による組成変動領域による結晶構造の変位が抑制されるためfcc相を安定的に形成可能となる。例えば、Feを主体とする合金粉末としては、平均粒度として35μmを超える粉末を使用することが望ましい。
本発明のターゲット材は、Feを主体とする合金粉末を必須で用い、所望のターゲット組成となるように準備した複数の粉末を混合して焼結を行うことで得られる。焼結方法としては、焼結温度800℃〜1100℃、加圧圧力50MPa以上の加圧焼結法、具体的には熱間静水圧プレス、ホットプレス、通電焼結、押し出し焼結等を用いることが可能である。さらに、焼結後の冷却過程で550℃以上かつ焼結温度以下の温度から水冷等の急冷を行うか、一旦冷却した後に550℃以上かつ焼結温度以下に加熱を行いその後の冷却過程で水冷等の急冷を行うことで、Feを主体とする結晶相をfcc相としてより安定して形成可能になる。
Further, in the case of an alloy powder mainly composed of Fe, when the particle size of the powder is coarser, the displacement of the crystal structure due to the composition variation region due to diffusion in the manufacturing process is suppressed, so that the fcc phase can be stably formed. For example, as an alloy powder mainly composed of Fe, it is desirable to use a powder having an average particle size exceeding 35 μm.
The target material of the present invention can be obtained by using an alloy powder mainly composed of Fe and sintering by mixing a plurality of powders prepared to have a desired target composition. As a sintering method, a sintering temperature of 800 ° C. to 1100 ° C. and a pressing pressure of 50 MPa or more, specifically, hot isostatic pressing, hot pressing, current sintering, extrusion sintering, etc. are used. It is possible. Furthermore, rapid cooling such as water cooling is performed from a temperature not lower than 550 ° C. and not higher than the sintering temperature in the cooling process after sintering, or heating is performed not lower than 550 ° C. and not higher than the sintering temperature after cooling, and water cooling is performed in the subsequent cooling process. By performing such rapid cooling, the crystal phase mainly composed of Fe can be more stably formed as the fcc phase.

(実施例1)
Fe−29原子%Ni、Co−25原子%Zr、Co−20原子%Nb、純Co、純Niのガスアトマイズ粉末を準備した。
まず、試料1では、上記で準備したFe−29原子%Ni、Co−25原子%Zr、Co−20原子%Nb、純Co、純Niのガスアトマイズ粉末をそれぞれ網目250μmの篩で篩い分けをして、篩を通過した粉末を原料粉末とした。上記の原料粉末を((Fe66−Ni3438−Co6292−Nb−Zr(原子%)[原子比でFe:Ni=66:34かつ(Fe+Ni):Co=38:62、Nb:4原子%、Zr:4原子%]となるよう原料粉末を秤量、混合して混合粉末を作製した。得られた混合粉末を、軟鋼カプセルに充填し脱気封止した後、温度950℃、圧力100MPa、保持時間2時間の条件で熱間静水圧プレス(HIP)によって加圧焼結し、焼結体を作製した。
Example 1
Gas atomized powders of Fe-29 atomic% Ni, Co-25 atomic% Zr, Co-20 atomic% Nb, pure Co, and pure Ni were prepared.
First, in Sample 1, the gas atomized powders of Fe-29 atomic% Ni, Co-25 atomic% Zr, Co-20 atomic% Nb, pure Co, and pure Ni prepared above were sieved through a sieve having a mesh size of 250 μm. The powder that passed through the sieve was used as the raw material powder. The raw material powder is changed to ((Fe 66 -Ni 34 ) 38 -Co 62 ) 92 -Nb 4 -Zr 4 (atomic%) [Fe: Ni = 66: 34 and (Fe + Ni): Co = 38: 62 in atomic ratio) , Nb: 4 atomic%, Zr: 4 atomic%], the raw material powder was weighed and mixed to prepare a mixed powder. The obtained mixed powder is filled into a mild steel capsule and degassed and sealed, and then subjected to pressure sintering by hot isostatic pressing (HIP) under conditions of a temperature of 950 ° C., a pressure of 100 MPa, and a holding time of 2 hours. The body was made.

試料2では、上記原料粉末のうちFe−29原子%Niのガスアトマイズ粉末をさらに網目74μmの篩で篩い分けし、篩を通過した粉末を除去した粉末を原料粉末とし((Fe66−Ni3438−Co6292−Nb−Zr(原子%)[原子比でFe:Ni=66:34かつ(Fe+Ni):Co=38:62、Nb:4原子%、Zr:4原子%]となるよう原料粉末を秤量、混合して混合粉末を作製した。得られた混合粉末を、軟鋼カプセルに充填し脱気封止した後、温度950℃、圧力100MPa、保持時間2時間の条件で熱間静水圧プレス(HIP)によって加圧焼結し、焼結体を作製した。
また、試料2の焼結体の一部を切り出し600℃に加熱後30分保持し、水冷で常温まで冷却した焼結体を試料3とした。
In sample 2, the gas atomized powder of Fe-29 atomic% Ni of the raw material powder was further sieved with a sieve having a mesh size of 74 μm, and the powder obtained by removing the powder that passed through the sieve was used as the raw material powder ((Fe 66 -Ni 34 ) 38 -Co 62) 92 -Nb 4 -Zr 4 ( atomic%) [Fe atomic ratio: Ni = 66: 34 and (Fe + Ni): Co = 38: 62, Nb: 4 atomic%, Zr: 4 atomic%] The raw material powder was weighed and mixed so that a mixed powder was prepared. The obtained mixed powder is filled into a mild steel capsule and degassed and sealed, and then subjected to pressure sintering by hot isostatic pressing (HIP) under conditions of a temperature of 950 ° C., a pressure of 100 MPa, and a holding time of 2 hours. The body was made.
Further, a part of the sintered body of sample 2 was cut out, heated to 600 ° C., held for 30 minutes, and cooled to room temperature with water cooling, which was used as sample 3.

上記で作製した試料1〜3の焼結体を直径180mm×厚さ7mmに機械加工してFe−Co−Ni系合金ターゲット材を作製した。作製した各ターゲット材の端材から長さ30mm、幅10mm、厚さ5mmの試験片を採取し、東英工業(株)製直流磁気特性測定装置TRF5Aを使用してこれらの試験片の磁化曲線を測定した。なお、最大印加磁場400(KA/m)として、得られた磁化曲線から最大透磁率を求めた。   The sintered bodies of Samples 1 to 3 prepared above were machined into a diameter of 180 mm and a thickness of 7 mm to prepare an Fe—Co—Ni alloy target material. Test pieces having a length of 30 mm, a width of 10 mm, and a thickness of 5 mm were collected from the end materials of each of the prepared target materials, and the magnetization curves of these test pieces were measured using a DC magnetic property measuring apparatus TRF5A manufactured by Toei Industry Co., Ltd. Was measured. In addition, the maximum magnetic permeability was calculated | required from the obtained magnetization curve as the maximum applied magnetic field 400 (KA / m).

また、作製した各ターゲット材の中心部より10mm×10mm×7mmの試験片を採取しバフ研磨を施した後、ターゲット材のスパッタ面についてX線回折強度測定を行った。なお、X線回折強度測定には(株)リガク製RINT2500Vを使用し、線源にはCoを用い、10mmの領域にX線を照射して測定した。X線回折強度測定結果より、Feを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))を算出し、強度比Ifcc(200)/Ibcc(200)を求めた。なお、X線回折ピーク強度の算出にあたっては、バックグラウンドを差引いた値として算出した。作製したターゲット材の原料粉末、熱処理、最大透磁率およびX線回折ピーク強度比を表1にまとめる。また、試料1〜3のそれぞれのターゲット材のX線回折強度のチャートをそれぞれ図1〜3として示す。 In addition, a 10 mm × 10 mm × 7 mm test piece was collected from the center of each of the prepared target materials and buffed, and then the X-ray diffraction intensity measurement was performed on the sputtered surface of the target material. For measurement of X-ray diffraction intensity, RINT2500V manufactured by Rigaku Corporation was used, Co was used as a radiation source, and X-rays were irradiated onto a 10 mm 2 region. From the X-ray diffraction intensity measurement results, the X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe and the X-ray from the (200) plane of the bcc phase mainly composed of Fe. The diffraction peak intensity (Ibcc (200)) was calculated, and the intensity ratio Ifcc (200) / Ibcc (200) was obtained. The X-ray diffraction peak intensity was calculated as a value obtained by subtracting the background. Table 1 summarizes the raw material powder, heat treatment, maximum magnetic permeability, and X-ray diffraction peak intensity ratio of the prepared target material. Moreover, the chart of the X-ray diffraction intensity of each target material of samples 1-3 is shown as FIGS. 1-3, respectively.

表1および図1〜3から、X線回折ピーク強度比Ifcc(200)/Ibcc(200)が10以上である試料2および3では、試料1との比較で最大透磁率が大きく低減されたターゲットが得られることが分かる。また、試料2と試料3の比較から、焼結体を550℃以上に加熱した後に水冷で急冷した試料3はよりX線回折ピーク強度比が大きく、最大透磁率が低減されていることが分かる。
なお、エネルギー分散型蛍光X線分析装置(EDX)による観察から、試料2および3のターゲット材のFeを主体とする結晶相は、Niを29原子%含有するFeを主体とする相であることを確認した。
From Table 1 and FIGS. 1 to 3, in Samples 2 and 3 where the X-ray diffraction peak intensity ratio Ifcc (200) / Ibcc (200) is 10 or more, the maximum magnetic permeability is greatly reduced as compared with Sample 1. It can be seen that In addition, from comparison between sample 2 and sample 3, it is found that sample 3 that has been heated to 550 ° C. or higher and then rapidly cooled by water cooling has a larger X-ray diffraction peak intensity ratio and reduced maximum magnetic permeability. .
From the observation with an energy dispersive X-ray fluorescence spectrometer (EDX), the crystal phase mainly composed of Fe of the target materials of Samples 2 and 3 is a phase mainly composed of Fe containing 29 atomic% of Ni. It was confirmed.

(実施例2)
試料4では、まず、Co−10原子%Ta−2原子%Zr粉末(−250μm)、Co−19原子%Al粉末(−250μm)のガスアトマイズ粉末と、実施例1の試料2で使用した篩分けをしたFe−29原子%Ni(74−250μm)、Co−25原子%Zr(−250μm)、純Co(−250μm)、純Ni(−250μm)のガスアトマイズ粉末を準備した。これらの各粉末を((Fe65−Ni3537−Co6390−Ta−Zr−Al(原子%)[原子比でFe:Ni=65:35かつ(Fe+Ni):Co=37:63、Ta:3原子%、Zr:5原子%、Al:2原子%]となるよう原料粉末を秤量、混合して混合粉末を作製した。得られた混合粉末を、軟鋼カプセルに充填し脱気封止した後、温度950℃、圧力100MPa、保持時間2時間の条件で熱間静水圧プレス(HIP)によって加圧焼結し、焼結体を作製した。
また、試料4の焼結体の一部を切り出し600℃に加熱後30分保持し、水冷で常温まで冷却した焼結体を試料5とした。
(Example 2)
In Sample 4, first, a gas atomized powder of Co-10 atomic% Ta-2 atomic% Zr powder (-250 μm) and Co-19 atomic% Al powder (-250 μm) and sieving used in Sample 2 of Example 1 were used. Fe-29 atomic% Ni (74-250 μm), Co-25 atomic% Zr (−250 μm), pure Co (−250 μm), and pure Ni (−250 μm) gas atomized powder were prepared. Each of these powders ((Fe 65 -Ni 35 ) 37 -Co 63 ) 90 -Ta 3 -Zr 5 -Al 2 (atomic%) [at an atomic ratio of Fe: Ni = 65: 35 and (Fe + Ni): Co = 37:63, Ta: 3 atomic%, Zr: 5 atomic%, Al: 2 atomic%] The raw material powder was weighed and mixed to prepare a mixed powder. The obtained mixed powder is filled in a mild steel capsule and degassed and sealed, and then subjected to pressure sintering by hot isostatic pressing (HIP) under conditions of a temperature of 950 ° C., a pressure of 100 MPa, and a holding time of 2 hours. The body was made.
Further, a part of the sintered body of Sample 4 was cut out, heated to 600 ° C. and held for 30 minutes, and then the sintered body cooled to room temperature by water cooling was used as Sample 5.

上記で作製した試料4、5の焼結体を直径180mm×厚さ7mmに機械加工してFe−Co−Ni系合金ターゲット材を作製した。作製した各ターゲット材の端材から長さ30mm、幅10mm、厚さ5mmの試験片を採取し、東英工業(株)製直流磁気特性測定装置TRF5Aを使用してこれらの試験片の磁化曲線を測定した。なお、最大印加磁場400(KA/m)として、得られた磁化曲線から最大透磁率を求めた。   The sintered bodies of Samples 4 and 5 prepared above were machined into a diameter of 180 mm and a thickness of 7 mm to prepare an Fe—Co—Ni alloy target material. Test pieces having a length of 30 mm, a width of 10 mm, and a thickness of 5 mm were collected from the end materials of each of the prepared target materials, and the magnetization curves of these test pieces were measured using a DC magnetic property measuring apparatus TRF5A manufactured by Toei Industry Co., Ltd. Was measured. In addition, the maximum magnetic permeability was calculated | required from the obtained magnetization curve as the maximum applied magnetic field 400 (KA / m).

また、作製した各ターゲット材の中心部より10mm×10mm×7mmの試験片を採取しバフ研磨を施した後、ターゲット材のスパッタ面について実施例1と同一の方法でX線回折強度測定を行った。X線回折強度測定結果より、Feを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))を算出し、強度比Ifcc(200)/Ibcc(200)を求めた。なお、X線回折ピーク強度の算出にあたっては、バックグラウンドを差引いた値として算出した。作製したターゲット材の原料粉末、熱処理、最大透磁率およびX線回折ピーク強度比を表2にまとめる。また、試料4、5のそれぞれのターゲット材のX線回折強度のチャートをそれぞれ図4、5として示す。   In addition, a 10 mm × 10 mm × 7 mm test piece was sampled from the center of each prepared target material and buffed, and then the X-ray diffraction intensity measurement was performed on the sputtered surface of the target material by the same method as in Example 1. It was. From the X-ray diffraction intensity measurement results, the X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe and the X-ray from the (200) plane of the bcc phase mainly composed of Fe. The diffraction peak intensity (Ibcc (200)) was calculated, and the intensity ratio Ifcc (200) / Ibcc (200) was obtained. The X-ray diffraction peak intensity was calculated as a value obtained by subtracting the background. Table 2 summarizes the raw material powder, heat treatment, maximum magnetic permeability, and X-ray diffraction peak intensity ratio of the prepared target material. Moreover, the chart of the X-ray diffraction intensity of each target material of the samples 4 and 5 is shown as FIGS.

表2および図4、5から、X線回折ピーク強度比Ifcc(200)/Ibcc(200)が10以上である試料4および5では、低い最大透磁率のターゲットが得られることが分かる。
なお、エネルギー分散型蛍光X線分析装置(EDX)による観察から、試料4および5のターゲット材のFeを主体とする結晶相は、Niを29原子%含有するFeを主体とする相であることを確認した。
From Table 2 and FIGS. 4 and 5, it can be seen that samples 4 and 5 having an X-ray diffraction peak intensity ratio Ifcc (200) / Ibcc (200) of 10 or more can obtain a target having a low maximum magnetic permeability.
From the observation with an energy dispersive X-ray fluorescence spectrometer (EDX), the crystal phase mainly composed of Fe of the target material of Samples 4 and 5 is a phase mainly composed of Fe containing 29 atomic% of Ni. It was confirmed.

(実施例3)
試料6では、まず、Co−10原子%Zr(−250μm)、Co−37原子%B(−250μm)のガスアトマイズ粉末、純Ti粉末(−250μm)と、実施例1の試料2で使用した篩分けをしたFe−29原子%Ni(74−250μm)、純Co(−250μm)のガスアトマイズ粉末を準備した。これらの各粉末を((Fe71−Ni2965−Co3592−Zr−B−Ti(原子%)[原子比でFe:Ni=71:29かつ(Fe+Ni):Co=65:35、Zr:3原子%、B:3原子%、Ti:2原子%]となるよう原料粉末を秤量、混合して混合粉末を作製した。得られた混合粉末を、軟鋼カプセルに充填し脱気封止した後、温度950℃、圧力100MPa、保持時間2時間の条件で熱間静水圧プレス(HIP)によって加圧焼結し、焼結体を作製した。
また、試料6の焼結体の一部を切り出し600℃に加熱後30分保持し、水冷で常温まで冷却した焼結体を試料7とした。
(Example 3)
In sample 6, first, a gas atomized powder of Co-10 atomic% Zr (-250 μm), Co-37 atomic% B (−250 μm), pure Ti powder (−250 μm), and the sieve used in sample 2 of Example 1 were used. Separated gas atomized powders of Fe-29 atomic% Ni (74-250 μm) and pure Co (−250 μm) were prepared. Each of these powders ((Fe 71 -Ni 29 ) 65 -Co 35 ) 92 -Zr 3 -B 3 -Ti 2 (atomic%) [at atomic ratio of Fe: Ni = 71: 29 and (Fe + Ni): Co = 65:35, Zr: 3 atomic%, B: 3 atomic%, Ti: 2 atomic%] The raw material powder was weighed and mixed to prepare a mixed powder. The obtained mixed powder is filled into a mild steel capsule and degassed and sealed, and then subjected to pressure sintering by hot isostatic pressing (HIP) under conditions of a temperature of 950 ° C., a pressure of 100 MPa, and a holding time of 2 hours. The body was made.
Further, a part of the sintered body of Sample 6 was cut out, heated to 600 ° C. and held for 30 minutes, and then the sintered body cooled to room temperature by water cooling was used as Sample 7.

上記で作製した試料6、7の焼結体を直径180mm×厚さ7mmに機械加工してFe−Co−Ni系合金ターゲット材を作製した。作製した各ターゲット材の端材から長さ30mm、幅10mm、厚さ5mmの試験片を採取し、東英工業(株)製直流磁気特性測定装置TRF5Aを使用してこれらの試験片の磁化曲線を測定した。なお、最大印加磁場400(KA/m)として、得られた磁化曲線から最大透磁率を求めた。   The sintered bodies of Samples 6 and 7 prepared above were machined into a diameter of 180 mm and a thickness of 7 mm to prepare an Fe—Co—Ni alloy target material. Test pieces having a length of 30 mm, a width of 10 mm, and a thickness of 5 mm were collected from the end materials of each of the prepared target materials, and the magnetization curves of these test pieces were measured using a DC magnetic property measuring apparatus TRF5A manufactured by Toei Industry Co., Ltd. Was measured. In addition, the maximum magnetic permeability was calculated | required from the obtained magnetization curve as the maximum applied magnetic field 400 (KA / m).

また、作製した各ターゲット材の中心部より10mm×10mm×7mmの試験片を採取しバフ研磨を施した後、ターゲット材のスパッタ面について実施例1と同一の方法でX線回折強度測定を行った。X線回折強度測定結果より、Feを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))を算出し、強度比Ifcc(200)/Ibcc(200)を求めた。なお、X線回折ピーク強度の算出にあたっては、バックグラウンドを差引いた値として算出した。作製したターゲット材の原料粉末、熱処理、最大透磁率およびX線回折ピーク強度比を表3にまとめる。また、試料6、7のそれぞれのターゲット材のX線回折強度のチャートをそれぞれ図6、7として示す。   In addition, a 10 mm × 10 mm × 7 mm test piece was sampled from the center of each prepared target material and buffed, and then the X-ray diffraction intensity measurement was performed on the sputtered surface of the target material by the same method as in Example 1. It was. From the X-ray diffraction intensity measurement results, the X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe and the X-ray from the (200) plane of the bcc phase mainly composed of Fe. The diffraction peak intensity (Ibcc (200)) was calculated, and the intensity ratio Ifcc (200) / Ibcc (200) was obtained. The X-ray diffraction peak intensity was calculated as a value obtained by subtracting the background. Table 3 summarizes the raw material powder, heat treatment, maximum magnetic permeability, and X-ray diffraction peak intensity ratio of the prepared target material. In addition, charts of the X-ray diffraction intensities of the target materials of the samples 6 and 7 are shown in FIGS.

表3および図6、7から、X線回折ピーク強度比Ifcc(200)/Ibcc(200)が10以上である試料6、7では、低い最大透磁率のターゲットが得られることが分かる。また、試料6と試料7の比較から、焼結体を550℃以上に加熱した後に水冷で急冷した試料7はよりX線回折ピーク強度比が大きく、最大透磁率が低減されていることが分かる。
なお、エネルギー分散型蛍光X線分析装置(EDX)による観察から、試料6、7のターゲット材のFeを主体とする結晶相は、Niを29原子%含有するFeを主体とする相であることを確認した。
From Table 3 and FIGS. 6 and 7, it can be seen that samples 6 and 7 having an X-ray diffraction peak intensity ratio Ifcc (200) / Ibcc (200) of 10 or more can obtain a target having a low maximum magnetic permeability. Moreover, from the comparison between sample 6 and sample 7, it can be seen that sample 7, which was rapidly cooled by water cooling after heating the sintered body to 550 ° C. or higher, had a larger X-ray diffraction peak intensity ratio and a reduced maximum magnetic permeability. .
From the observation with an energy dispersive X-ray fluorescence spectrometer (EDX), the crystal phase mainly composed of Fe of the target material of Samples 6 and 7 is a phase mainly composed of Fe containing 29 atomic% of Ni. It was confirmed.

本発明は透磁率が低いFe−Co−Ni系合金スパッタリングターゲット材の安定提供を可能とし、軟磁性膜の安定製造に欠かせない技術を提供する。   The present invention makes it possible to stably provide a Fe—Co—Ni alloy sputtering target material having a low magnetic permeability, and provides a technique indispensable for stable production of a soft magnetic film.

Claims (2)

原子比でFe:Ni=90:10〜65:35、かつ(Fe+Ni):Co=90:10〜10:90の組成比を有する焼結体からなるFe−Co−Ni系合金スパッタリングターゲット材であって、
前記ターゲット材の焼結組織中に、35原子%以下のNi、15原子%以下のCoを含有するFeを主体とする結晶相を有し、かつターゲット材の10mm以上の領域をX回折強度測定した時の前記Feを主体とする結晶相のFeを主体とするfcc相の(200)面からのX線回折ピーク強度(Ifcc(200))とFeを主体とするbcc相の(200)面からのX線回折ピーク強度(Ibcc(200))の比Ifcc(200)/Ibcc(200)が10以上であることを特徴とするFe−Co−Ni系合金スパッタリングターゲット材。
An Fe—Co—Ni alloy sputtering target material comprising a sintered body having a composition ratio of Fe: Ni = 90: 10 to 65:35 and (Fe + Ni): Co = 90: 10 to 10:90 in atomic ratio. There,
The sintered structure of the target material has a crystal phase mainly composed of Fe containing 35 atomic% or less of Ni and 15 atomic% or less of Co, and a region of 10 mm 2 or more of the target material has an X diffraction intensity. X-ray diffraction peak intensity (Ifcc (200)) from the (200) plane of the fcc phase mainly composed of Fe in the crystal phase mainly composed of Fe and (200) of the bcc phase mainly composed of Fe when measured. An Fe—Co—Ni alloy sputtering target material, wherein the ratio Ifcc (200) / Ibcc (200) of the X-ray diffraction peak intensity (Ibcc (200)) from the surface is 10 or more.
(Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、B、Al、Si)から選ばれる1種もしくは2種以上の元素を30原子%以下含有することを特徴とする請求項1に記載のFe−Co−Ni系合金スパッタリングターゲット材。   It contains 30 atomic% or less of one or more elements selected from (Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, B, Al, Si). The Fe—Co—Ni-based alloy sputtering target material according to 1.
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