JP2011013681A5 - - Google Patents
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- JP2011013681A5 JP2011013681A5 JP2010179225A JP2010179225A JP2011013681A5 JP 2011013681 A5 JP2011013681 A5 JP 2011013681A5 JP 2010179225 A JP2010179225 A JP 2010179225A JP 2010179225 A JP2010179225 A JP 2010179225A JP 2011013681 A5 JP2011013681 A5 JP 2011013681A5
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- JP
- Japan
- Prior art keywords
- pupil
- pupil mirror
- projection
- exposure apparatus
- objective
- Prior art date
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Claims (6)
前記主放射光を形成して、パターンを担持するマスク上に入射する照明放射光を発生させる照明システムと、
前記パターンの像を放射光感応基板上に投影する投影対物器械であって、瞳ミラー及び瞳ミラーマニピュレータを含む前記投影対物器械と、
前記瞳ミラーマニピュレータを制御するように構成された瞳ミラー制御ユニットを含む制御システムと、
を含み、
前記投影対物器械が、投影対物器械の物体面に配置された物体視野から該投影対物器械の像面に配置された像視野上にパターンを結像するための反射屈折投影対物器械であって、
物体面からのパターンを第１の中間像内に結像させるように構成され、第１の瞳表面を有する第１の対物器械部と、
前記第１の中間像を第２の中間像内に結像させるように構成され、前記第１の瞳表面と光学的に共役な第２の瞳表面を有する第２の対物器械部と、
前記第２の中間像を像面内に結像させるように構成され、前記第１及び第２の瞳表面と光学的に共役な第３の瞳表面を有する第３の対物器械部と、
を含み、
前記瞳ミラーが、第１、第２、及び第３の瞳表面のうちの１つに又はその近くに位置決めされた反射瞳ミラー表面を有し、
前記瞳ミラーマニピュレータが、瞳ミラーに作動的に接続され、前記瞳ミラー表面の形状を変更するように構成されている、
ことを特徴とする投影露光装置。 A light source that generates main radiation,
An illumination system that forms the main radiation and generates illumination radiation incident on a mask carrying a pattern;
A projection objective for projecting an image of said pattern onto a radiation sensitive substrate, said projection objective comprising a pupil mirror and a pupil mirror manipulator;
A control system including a pupil mirror control unit configured to control the pupil mirror manipulator;
Including
The projection objective is a catadioptric projection objective for imaging a pattern from an object field located in the object plane of the projection objective onto an image field located in the image plane of the projection objective;
A first objective portion configured to image a pattern from the object plane into a first intermediate image, the first objective portion having a first pupil surface;
A second objective instrument portion configured to form the first intermediate image in a second intermediate image and having a second pupil surface optically conjugate with the first pupil surface;
A third objective part configured to form the second intermediate image in an image plane and having a third pupil surface optically conjugate with the first and second pupil surfaces;
Including
The pupil mirror has a reflective pupil mirror surface positioned at or near one of the first, second, and third pupil surfaces;
The pupil mirror manipulator is operatively connected to a pupil mirror and configured to change a shape of the pupil mirror surface;
A projection exposure apparatus.
前記投影対物器械の光学性能を測定することができる測定システムが、瞳表面における強度分布を示す入力信号を発生させる
ことを特徴とする請求項１に記載の投影露光装置。 The control system receives at least one input signal indicative of at least one status parameter of the projection objective or another part of the projection exposure apparatus, and determines the imaging characteristics of the projection objective in response to the input signal. A control circuit configured to output a control signal representing an adjustment of a surface shape of the pupil mirror for adaptation to the pupil mirror manipulator;
The projection exposure apparatus according to claim 1, wherein the measurement system capable of measuring the optical performance of the projection objective generates an input signal indicating an intensity distribution on the pupil surface.
前記制御システムは、前記モデルデータメモリに記憶された前記モデルデータから前記制御回路に対する少なくとも１つの入力信号を導出する、
ことを特徴とする請求項１又は請求項２に記載の投影露光装置。 The pupil mirror control unit includes or is connected to a model data memory that stores model data representing model parameters of a simulation model of at least one of the projection objective and a projection exposure apparatus including the projection objective. And
The control system derives at least one input signal to the control circuit from the model data stored in the model data memory;
The projection exposure apparatus according to claim 1 or 2, wherein
前記制御システムは、実質的に二重又は四重の放射対称性を有する前記選択された極照明に対応して前記瞳ミラー表面を調節するように構成される、
ことを特徴とする請求項１から請求項４のいずれか１項に記載の投影露光装置。 The illumination system is configured to provide at least one polar illumination environment having at least one of double and quadruple radial symmetry about the optical axis;
The control system is configured to adjust the pupil mirror surface in response to the selected polar illumination having substantially double or quadruple radial symmetry.
The projection exposure apparatus according to any one of claims 1 to 4, wherein the projection exposure apparatus is characterized in that:
前記瞳ミラー制御ユニットは、結像収差と、前記液浸層の光学特性の時間依存変化を含む投影システムの光学特性の時間依存変動に関連する結像収差に影響を与える条件とを示す信号を受信するように構成され、
前記制御システムは、前記瞳ミラー表面の前記形状の変形が、前記時間依存変動によって引き起こされる前記結像収差を少なくとも部分的に補償するように、前記信号に応じて該瞳ミラー表面の該形状を変更するように構成される、
ことを特徴とする請求項１から請求項５のいずれか１項に記載の投影露光装置。 By an immersion liquid having a refractive index n l substantially greater than 1 disposed between the exit surface of the projection objective and a substrate having a substrate surface disposed at the image plane of the projection objective Further comprising an immersion layer formed;
The pupil mirror control unit provides signals indicating imaging aberrations and conditions that affect imaging aberrations related to time-dependent variations in the optical properties of the projection system, including time-dependent changes in the optical properties of the immersion layer. Configured to receive,
The control system is configured to change the shape of the pupil mirror surface in response to the signal so that deformation of the shape of the pupil mirror surface at least partially compensates for the imaging aberration caused by the time dependent variation. Configured to change,
The projection exposure apparatus according to any one of claims 1 to 5, wherein the projection exposure apparatus is characterized.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83731706P | 2006-08-14 | 2006-08-14 | |
| EP06016914.1 | 2006-08-14 | ||
| EP06016914A EP1890191A1 (en) | 2006-08-14 | 2006-08-14 | Catadioptric projection objective with pupil mirror |
| US60/837,317 | 2006-08-14 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009524108A Division JP5462625B2 (en) | 2006-08-14 | 2007-08-10 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014004442A Division JP5684413B2 (en) | 2006-08-14 | 2014-01-14 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011013681A JP2011013681A (en) | 2011-01-20 |
| JP2011013681A5 true JP2011013681A5 (en) | 2011-03-10 |
| JP5462739B2 JP5462739B2 (en) | 2014-04-02 |
Family
ID=41591684
Family Applications (8)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009524108A Expired - Fee Related JP5462625B2 (en) | 2006-08-14 | 2007-08-10 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2010179225A Active JP5462739B2 (en) | 2006-08-14 | 2010-08-10 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2014004396A Expired - Fee Related JP5684412B2 (en) | 2006-08-14 | 2014-01-14 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2014004442A Expired - Fee Related JP5684413B2 (en) | 2006-08-14 | 2014-01-14 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2015003177A Pending JP2015109463A (en) | 2006-08-14 | 2015-01-09 | Catadioptric projection objective device having pupil mirror, projection exposure device and method |
| JP2016080405A Pending JP2016157137A (en) | 2006-08-14 | 2016-04-13 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
| JP2017146821A Withdrawn JP2017199031A (en) | 2006-08-14 | 2017-07-28 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
| JP2018015238A Withdrawn JP2018077534A (en) | 2006-08-14 | 2018-01-31 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009524108A Expired - Fee Related JP5462625B2 (en) | 2006-08-14 | 2007-08-10 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
Family Applications After (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014004396A Expired - Fee Related JP5684412B2 (en) | 2006-08-14 | 2014-01-14 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2014004442A Expired - Fee Related JP5684413B2 (en) | 2006-08-14 | 2014-01-14 | Catadioptric projection objective with pupil mirror, projection exposure apparatus and method |
| JP2015003177A Pending JP2015109463A (en) | 2006-08-14 | 2015-01-09 | Catadioptric projection objective device having pupil mirror, projection exposure device and method |
| JP2016080405A Pending JP2016157137A (en) | 2006-08-14 | 2016-04-13 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
| JP2017146821A Withdrawn JP2017199031A (en) | 2006-08-14 | 2017-07-28 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
| JP2018015238A Withdrawn JP2018077534A (en) | 2006-08-14 | 2018-01-31 | Catadioptric projection objective device having pupil mirror and projection exposure device and method |
Country Status (3)
| Country | Link |
|---|---|
| JP (8) | JP5462625B2 (en) |
| CN (1) | CN101523294B (en) |
| TW (6) | TW201426205A (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103135356B (en) * | 2011-11-23 | 2015-04-15 | 上海微电子装备有限公司 | Reflection-type photoetching projection objective |
| CN102436058B (en) * | 2011-12-14 | 2013-08-21 | 北京理工大学 | Full spherical catadioptric collimating objective lens applied to deep ultraviolet band |
| JP6028350B2 (en) * | 2012-03-16 | 2016-11-16 | 株式会社ニコン | Substrate processing apparatus, device manufacturing system, and device manufacturing method |
| DE102013204391B3 (en) * | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projection lens for imaging projection lens pattern from object plane into image plane, has field point in field plane of outgoing beam illuminating manipulator surface with sub-aperture, and manipulation system comprising manipulator |
| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
| CN103353669B (en) * | 2013-07-30 | 2015-07-15 | 中国科学院光电技术研究所 | High-numerical aperture immersion projection objective lens |
| TW201514541A (en) * | 2013-09-19 | 2015-04-16 | 尼康股份有限公司 | Projection optical system, adjusting method thereof, exposing device and method, and device manufacturing method |
| CN105116527B (en) * | 2015-09-25 | 2018-10-30 | 上海新跃仪表厂 | A kind of infrared refractive and reflective optical system of low distortion wide-angle length of object lens of large relative aperture |
| JP6748482B2 (en) * | 2016-05-25 | 2020-09-02 | キヤノン株式会社 | Exposure apparatus and method for manufacturing article |
| CN108152940B (en) * | 2016-12-05 | 2021-04-27 | 佳能株式会社 | Catadioptric optical system, illumination optical system, and exposure apparatus |
| CN109581622B (en) * | 2017-09-29 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | Projection objective |
| JP2019124796A (en) * | 2018-01-16 | 2019-07-25 | キヤノン株式会社 | Imaging optical system, image projection device, and camera system |
| US11067389B2 (en) * | 2018-03-13 | 2021-07-20 | Kla Corporation | Overlay metrology system and method |
| CN109298517B (en) * | 2018-11-05 | 2020-10-30 | 中国航空工业集团公司洛阳电光设备研究所 | Multispectral coaxial catadioptric afocal optical system |
| US20220334499A1 (en) | 2019-09-10 | 2022-10-20 | Asml Netherlands B.V. | Sub-field control of a lithographic process and associated apparatus |
| KR102409108B1 (en) * | 2020-09-18 | 2022-06-15 | 삼성전기주식회사 | Optical Imaging System |
| CN113687500B (en) * | 2021-08-03 | 2024-03-26 | 润坤(上海)光学科技有限公司 | Optical system of deflection type detector |
| TWI813395B (en) * | 2022-07-22 | 2023-08-21 | 新鉅科技股份有限公司 | Optical lens assembly and head-mounted electronic device |
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| JPH01120855U (en) * | 1988-02-08 | 1989-08-16 | ||
| JPH0215131U (en) * | 1988-07-13 | 1990-01-30 | ||
| JP3368091B2 (en) * | 1994-04-22 | 2003-01-20 | キヤノン株式会社 | Projection exposure apparatus and device manufacturing method |
| JP3781044B2 (en) * | 1994-11-07 | 2006-05-31 | 株式会社ニコン | Catadioptric optical system and projection exposure apparatus |
| JPH10301058A (en) * | 1997-04-30 | 1998-11-13 | Nikon Corp | Reflection refraction type projecting optical system |
| DE19824030A1 (en) * | 1998-05-29 | 1999-12-02 | Zeiss Carl Fa | Catadioptric projection lens with adaptive mirror and projection exposure method |
| DE10120446C2 (en) * | 2001-04-26 | 2003-04-17 | Zeiss Carl | Projection exposure system and method for compensating imaging errors in a projection exposure system, in particular for micro-lithography |
| JP2005037896A (en) * | 2003-05-23 | 2005-02-10 | Canon Inc | Projection optical system, exposure apparatus and device manufacturing method |
| JP2005019628A (en) * | 2003-06-25 | 2005-01-20 | Nikon Corp | Optical apparatus, aligner, manufacturing method of device |
| CN102169226B (en) * | 2004-01-14 | 2014-04-23 | 卡尔蔡司Smt有限责任公司 | Catadioptric projection objective |
| JP2005311020A (en) * | 2004-04-21 | 2005-11-04 | Nikon Corp | Exposure method and method of manufacturing device |
| KR101213831B1 (en) * | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | Catadioptric projection objective with intermediate images |
| JP4843272B2 (en) * | 2004-07-31 | 2011-12-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical system for microlithographic projection exposure apparatus |
| JP4581662B2 (en) * | 2004-12-07 | 2010-11-17 | 株式会社ニコン | Projection optical system, exposure apparatus, and device manufacturing method |
| JP2009122247A (en) * | 2007-11-13 | 2009-06-04 | Kayaba Ind Co Ltd | Article in contact with human body during use |
-
2007
- 2007-08-10 CN CN2007800383365A patent/CN101523294B/en active Active
- 2007-08-10 JP JP2009524108A patent/JP5462625B2/en not_active Expired - Fee Related
- 2007-08-13 TW TW103101879A patent/TW201426205A/en unknown
- 2007-08-13 TW TW104136142A patent/TWI529502B/en not_active IP Right Cessation
- 2007-08-13 TW TW104136141A patent/TWI531874B/en active
- 2007-08-13 TW TW107116998A patent/TW201908871A/en unknown
- 2007-08-13 TW TW96129863A patent/TWI430042B/en not_active IP Right Cessation
- 2007-08-13 TW TW105139440A patent/TW201732443A/en unknown
-
2010
- 2010-08-10 JP JP2010179225A patent/JP5462739B2/en active Active
-
2014
- 2014-01-14 JP JP2014004396A patent/JP5684412B2/en not_active Expired - Fee Related
- 2014-01-14 JP JP2014004442A patent/JP5684413B2/en not_active Expired - Fee Related
-
2015
- 2015-01-09 JP JP2015003177A patent/JP2015109463A/en active Pending
-
2016
- 2016-04-13 JP JP2016080405A patent/JP2016157137A/en active Pending
-
2017
- 2017-07-28 JP JP2017146821A patent/JP2017199031A/en not_active Withdrawn
-
2018
- 2018-01-31 JP JP2018015238A patent/JP2018077534A/en not_active Withdrawn
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