JP2011002692A - Color filter correcting method, method for manufacturing color filter, and method for manufacturing liquid crystal display - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method of desirably and efficiently correcting recessed defects on the overcoat layer formed on the colored layer of a color filter.SOLUTION: The method of correcting the recessed defects on the overcoat layer 4 formed on the colored layer 3 of the color filter 5 includes a defect correction ink applying process to apply defect correction ink 7 to the recessed defects 6 found on the overcoat layer in the defect check carried out in advance and to correct them.

Description

  The present invention relates to a method for correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter used in, for example, a liquid crystal television.

  In recent years, many color liquid crystal display elements in which a color separation color filter is combined with a liquid crystal element have been proposed. Here, the color filter is composed of a large number of picture elements each of which is a pixel of the three primary colors of red, green, and blue formed on a light-transmitting substrate. In order to increase display contrast, Between each pixel, there is a light-shielding area (black matrix) with a certain width, and a frame made of a black matrix that surrounds the grid pattern of the pixels and the black matrix, which is the display portion, and an overlayer that is a protective film layer Some have a coat or ITO transparent electrode. This overcoat layer has adhesion to the pixels, glass, and light-shielding layer constituting the lower layer, adhesion to ITO and alignment layer constituting the upper layer, and adhesion to the sealing agent for constituting the liquid crystal cell. Wide range of properties, blocking of pixel impurity components, smoothness, light resistance, moisture and heat resistance, solvent resistance, chemical resistance, heat resistance, and pressure resistance and toughness in the substrate bonding process when manufacturing liquid crystal cells Characteristics are required.

  In particular, unlike a TFT liquid crystal display device in which a transparent electrode such as an ITO vapor deposition film is formed on a color filter, in an IPS (In Plane Switching) type liquid crystal display device that does not have a transparent electrode on a color filter, Usually, an overcoat layer is provided on the colored layer because the strict surface smoothness of the color filter and a barrier property for preventing impurities contained in the color filter layer from eluting into the liquid crystal are required. .

  Such an overcoat layer is generally formed by applying a coating solution for forming an overcoat layer onto a colored layer of a color filter by a printing method or the like. In some cases, the overcoat layer may have a recess defect in which the film thickness is locally reduced. In order to improve the yield of the color filter, when such a recess defect occurs in the overcoat layer, the recess defect is corrected.

  For example, as shown in FIG. 4A, a color filter 5 in which a colored layer 3 is formed in an opening of a black matrix 2 formed on a substrate 1 and an overcoat layer 4 is further formed thereon. When the correction is performed, the concave defect generated in the overcoat layer 4 is corrected in the same manner as the correction of the defect in the colored layer (for example, cited document 1). That is, after the overcoat layer 4 in the recessed portion 6 and its peripheral portion is removed by a laser or the like to expose the surface of the lower layer (FIG. 4B), the defect correcting ink 7 for the overcoat layer 4 is used. Is applied to fill in the removed defective portion (FIG. 4C).

  Defects for overcoat layers added with surfactants in order to properly wet and spread the defect correction ink into white defects having the same depth as the thickness of the overcoat layer, resulting from the removal of recess defects. Correction ink is used. However, when a defect-correcting ink containing a surfactant is used, the surfactant component is locally present only in the corrected portion of the entire overcoat layer. For this reason, when an alignment film or the like is formed on such an overcoat layer, there is a possibility that the corrected portion containing the surfactant component repels the coating liquid for forming the alignment film, resulting in white defects in the alignment film. There is sex.

JP 2008-170472 A

  The present invention has been made in view of the above problems, and provides a correction method for satisfactorily and efficiently correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter. This is the main purpose.

  As a result of intensive studies to solve the above-mentioned problems, the present inventors applied the defect-correcting ink as it is without removing the concave defect and its peripheral portion by using an appropriate defect-correcting ink. Even in this case, the present inventors have found that the above-described concave defect can be corrected satisfactorily and have completed the present invention. That is, the present invention is a method for correcting a color filter for correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter, the over-detection method detected in a defect detection inspection performed in advance. There is provided a method for correcting a color filter, characterized by having a defect correcting ink application step of applying a defect correcting ink to the recess defect present in a coat layer and correcting the recess defect.

  In the method for correcting a color filter of the present invention, the defect correction ink is applied as it is without removing the recess defects with a laser or the like, so that the defect correction can be easily and satisfactorily performed.

  In the said invention, it is preferable that the solvent whose vapor pressure in 20 degreeC is 400 Pa or more is used for the said defect correction ink. By preparing the defect correction ink using such a solvent, the defect correction ink can be satisfactorily wetted and spread in the recess defect.

  Moreover, in the said invention, it is preferable that the viscosity of the said ink for defect corrections exists in the range of 10 mPa * s-60 mPa * s. If the viscosity of the defect correcting ink is less than the above range, the viscosity is too low, and the defect correcting ink may spread to the periphery of the applied recess defect. On the other hand, when the viscosity of the defect correction ink exceeds the above range, the viscosity is too high, and the defect correction ink may not be sufficiently wetted and spread in the recess defect.

  Furthermore, in the said invention, it is preferable that surfactant is not contained in the said ink for defect correction. By using a defect-correcting ink that does not contain a surfactant, the surfactant component is locally present only in the corrected portion of the overcoat layer, and the coating of the layer formed on the overcoat layer is applied. Problems such as repelling the working fluid can be prevented.

  In the invention, the color filter is preferably used for a liquid crystal display device of a type in which an alignment film is formed directly on the overcoat layer. Since the overcoat layer of the color filter modified by the method for correcting a color filter of the present invention has extremely high smoothness, it is possible to improve the alignment film by forming an alignment film on such an overcoat layer. It is because it can form.

  The present invention also provides a color filter forming step for forming a color filter having an overcoat layer on the colored layer, an inspection step for detecting a recess defect present in the overcoat layer, and the recess detected in the inspection step. There is provided a method of manufacturing a color filter, comprising: a concave defect correcting step of correcting a defect using the color filter correcting method. In the recess defect correcting step, by correcting the recess defect by the color filter correcting method, a high-quality color filter with a high yield can be manufactured.

  Furthermore, the present invention provides a color filter forming step for forming a color filter having an overcoat layer on a colored layer, an inspection step for detecting a concave defect present in the overcoat layer, and the concave portion detected in the inspection step. A concave defect correcting step for correcting defects using the color filter correcting method, a counter substrate bonding step for arranging the counter substrate so as to have a predetermined gap with the color filter, and bonding the counter substrate, and the color There is provided a method for manufacturing a liquid crystal display device, comprising: a liquid crystal sealing step of injecting liquid crystal between a filter and the counter substrate and sealing with a sealing material. By correcting the concave defect of the color filter using the color filter correcting method, a high-quality liquid crystal display device with a high yield can be manufactured.

  In addition, the present invention provides a defect correcting ink used for correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter, and the defect correcting ink has a vapor pressure at 20 ° C. A solvent having a viscosity of 400 Pa or more is used, the viscosity of the defect correction ink is in the range of 10 mPa · s to 60 mPa · s, and the defect correction ink contains no surfactant. Provided is a defect-correcting ink. By using the defect correction ink having the above-mentioned physical properties and not containing a surfactant, it is possible to satisfactorily correct the concave defect present in the overcoat layer formed on the colored layer of the color filter.

  In the said invention, it is preferable that the said defect correction ink is used for the correction method of the said color filter. By using the defect correcting ink, the color filter defect correcting method can be carried out easily and satisfactorily.

  According to the method for correcting a color filter of the present invention, it is possible to satisfactorily and efficiently correct a recess defect present in an overcoat layer formed on the colored layer of the color filter.

It is a schematic process drawing which shows an example of the correction method of the color filter of this invention. It is a schematic sectional drawing which shows an example of the applicator needle used suitably in the correction method of the color filter of this invention. It is a schematic process drawing which shows an example of the manufacturing method of the liquid crystal display device of this invention. It is a schematic process drawing which shows an example of the correction method of the conventional color filter.

Hereinafter, the color filter correcting method, the color filter manufacturing method, the liquid crystal display manufacturing method, and the defect correcting ink of the present invention will be described.
In the present specification, (meth) acryl represents acryl and methacryl, and (meth) acrylate represents acrylate and methacrylate. In addition, in this specification, light includes all wavelengths in the visible and non-visible regions that can cause photoreactive functional groups to cause photoreactions, for example, all electromagnetic waves such as microwaves, visible light, and ultraviolet rays. Although included, mainly ultraviolet rays and the like are used.

A. Color Filter Correction Method The color filter correction method of the present invention is a color filter correction method for correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter, the defect being implemented in advance. It has a defect correction ink application process in which defect correction ink is applied to the concave defects present in the overcoat layer detected in the detection inspection, and the concave defects are corrected.

  In the method for correcting a color filter of the present invention, the defect correction ink is applied as it is without removing the recess defects with a laser or the like, so that the defect correction can be easily and satisfactorily performed.

  For example, as illustrated in FIG. 1A, a color filter 5 in which a colored layer 3 is formed in an opening of a black matrix 2 formed on a substrate 1 and an overcoat layer 4 is further formed thereon. In the case where the recess defect 6 exists in the overcoat layer 4, in the conventional correction method, the correction is performed after removing the recess defect 6 and the overcoat layer 4 in the peripheral portion. However, in the present invention, as illustrated in FIG. 1B, the recess defect 6 and its peripheral portion are not removed (the state illustrated in FIG. 1A), and the recess defect 6 is defective. The correction ink 7 is applied to correct the recess defect 6.

  In the defect correction ink application process of the present invention, defect correction ink is applied to the recess defect present in the overcoat layer, detected in a defect detection inspection performed in advance, and the recess defect is corrected. The defect detection inspection performed in advance is not particularly limited as long as it can detect the above-described recess defect. For example, a stylus-type film thickness meter (for example, a product manufactured by KLA-Tencor Corporation, a product) Name: A concave defect can be detected by measuring the profile of the overcoat layer using a stylus thickness meter P-15). In addition, it can also be measured using a measuring instrument capable of three-dimensional detection such as a laser microscope.

  In the defect detection inspection, when the presence of a concave defect is confirmed, the position of the concave defect in the color filter is measured, and based on the positional information, the defect correction ink is applied in the defect correction ink application process described later. May be applied.

  In the present invention, the “recess defect” of the overcoat layer means a region where a depression is formed, such as a white defect, where the overcoat layer is partially thin. In the method for correcting a color filter according to the present invention, any concave defect as described above can be corrected regardless of the size.

  Among the above-described concave defects, the depth of the concave defects to be corrected in the present invention, that is, the dimension of the film thickness method (z direction) is in the range of 0 μm to 2 μm, particularly in the range of 0.3 μm to 1.5 μm. It is preferable. Further, the dimension of the recess defect to be corrected in the present invention in the x and y directions on the surface of the overcoat layer is in the range of 20 μm × 20 μm to 100 μm × 100 μm, and in particular in the range of 20 μm × 20 μm to 80 μm × 80 μm It is preferable. The diameter of a coating needle that is currently easy to manufacture and is generally used is about 20 μm to 100 μm, and the size of the recessed defect to be corrected is preferably the same size as the diameter of the coating needle. It is. Moreover, when the dimension of a recessed part defect is outside the said range, it will be difficult to obtain the smoothness of a finish, and it may fail in the final test | inspection after correction | amendment.

Further, in the present invention, “applying defect correction ink to the recess defect present in the overcoat layer detected in a defect detection inspection performed in advance” means that the detected recess defect or its periphery is detected. This means that the defect-correcting ink is applied to the recess defect as it is detected in the defect detection inspection without performing the defect removal work of punching out the portion with a laser or the like.
Hereinafter, the defect correcting ink application process in the present invention will be described in detail.

1. Physical Properties of Defect Correction Ink The physical properties of the defect correction ink used in the present invention are not particularly limited as long as it can be appropriately applied in the above-described concave defect, and the concave defect of the overcoat layer is not limited. What is generally used for correction can be used.

  For example, in the present invention, the defect-correcting ink has a viscosity in the range of 10 mPa · s to 60 mPa · s, particularly in the range of 10 mPa · s to 50 mPa · s, particularly in the range of 15 mPa · s to 35 mPa · s. It is preferable that If the viscosity of the defect correcting ink is less than the above range, the viscosity is too low, and the defect correcting ink may spread to the periphery of the applied recess defect. On the other hand, when the viscosity of the defect correction ink exceeds the above range, the viscosity is too high, and the defect correction ink may not be sufficiently wetted and spread in the recess defect.

  The viscosity of the defect correction ink is measured at 25 ° C. for 1 minute using a B-type viscometer (for example, product name: VISCOMETER TV-20, manufactured by TOKIMEC) using a BL adapter, M1 rotor, or M2 rotor. Can be obtained.

  The defect correction ink having a viscosity in the above range can be prepared by selecting the type of solvent used in the defect correction ink.

2. Composition of defect correction ink The composition of the defect correction ink used in the present invention is not particularly limited as long as the desired physical properties for appropriate application in the above-described recess defect can be obtained. It can have a composition similar to that commonly used to correct a recess defect in a layer.

  Among these, in the present invention, it is preferable that the defect correction ink does not contain a surfactant. By using a defect-correcting ink that does not contain a surfactant, the surfactant component is locally present only in the corrected portion of the overcoat layer, and the coating of the layer formed on the overcoat layer is applied. Problems such as repelling the working fluid can be prevented. In addition, when the overcoat layer contains a surfactant component, the surfactant component may ooze out into a layer adjacent to the overcoat layer, which may contribute to problems such as a liquid crystal layer. In particular, in a liquid crystal display device of a type in which an alignment film is directly formed on the overcoat layer, such as IPS (In Plane Switching), the overcoat layer is a surfactant component because the above-mentioned problem is likely to occur. It is preferable not to contain.

In the present invention, “the surfactant is not included” in the defect-correcting ink means “Megafac F171, Megafac F172, Megafac F173 (manufactured by Dainippon Ink & Chemicals, Inc.); Fluorard FC-430, Fluorad FC-431 (manufactured by Sumitomo 3M); Asahi Guard AG710, Surflon S-382, Surflon SC-101, Surflon SC-102, Surflon SC-103, Surflon SC-104, Surflon SC-105, Surflon SC- Fluorosurfactant marketed under a trade name such as 106 (Asahi Glass Co., Ltd.), or a silicon surfactant such as organosiloxane polymer KP341 (Shin-Etsu Chemical Co., Ltd.), etc. It means that the correction ink is not included. Specifically, for example, the defect correcting ink may be composed of only a solvent component, a monomer component having a reactive functional group, a polymer component, and an initiator component.
Hereinafter, each component which may be contained in the defect correction ink used in the present invention will be described.

(A) Solvent The solvent that can be used in the defect correction ink used in the present invention is not particularly limited, but it is preferable to use a solvent having good solubility or dispersibility with respect to the monomer or polymer having a reactive functional group, A mixed solvent using two or more kinds of solvents may be used.

Examples of the solvent include alcohol solvents such as methyl alcohol, ethyl alcohol, N-propyl alcohol and i-propyl alcohol; cellosolv solvents such as methoxy alcohol and ethoxy alcohol; carbitols such as methoxyethoxyethanol and ethoxyethoxyethanol. Solvents; Ester solvents such as ethyl acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate, and ethyl lactate; Ketone solvents such as acetone, methyl isobutyl ketone, cyclohexanone; methoxyethyl acetate, ethoxyethyl acetate, ethyl cellosolve acetate Cellosolve acetate solvents such as carbitol acetate solvents such as methoxyethoxyethyl acetate and ethoxyethoxyethyl acetate; Ether solvents such as ethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether and tetrahydrofuran; aprotic amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone; Lactones such as γ-butyrolactone Non-aqueous organic solvents such as solvents; unsaturated hydrocarbon solvents such as benzene, toluene, xylene and naphthalene; saturated hydrocarbon solvents such as N-heptane, N-hexane and N-octane. Among these solvents, cellosolve acetate solvents such as methoxyethyl acetate, ethoxyethyl acetate, and ethyl cellosolve acetate; carbitol acetate solvents such as methoxyethoxyethyl acetate and ethoxyethoxyethyl acetate; ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, propylene Ether solvents such as glycol diethyl ether; ester solvents such as methyl methoxypropionate, ethyl ethoxypropionate and ethyl lactate are particularly preferably used. Particularly preferably, PGMEA (propylene glycol monomethyl ether acetate, CH ₃ OCH ₂ CH (CH ₃ ) OCOCH ₃ ) (trade name: methoxypropyl acetate (manufactured by Daicel Chemical Industries)), MBA (3-methoxybutyl acetate, CH ₃ CH (OCH ₃ ) CH ₂ CH ₂ OCOCH ₃ ), DMDG (diethylene glycol dimethyl ether, CH ₃ OC ₂ H ₄ OCH ₃ ), or a mixture thereof can be used.

  Among the above, in the present invention, a solvent having a vapor pressure at 20 ° C. of 400 Pa or higher, particularly in the range of 400 Pa to 600 Pa, particularly in the range of 400 Pa to 500 Pa is used for the defect correcting ink. preferable. If the vapor pressure of the solvent used in the defect correcting ink is less than the above range, the vapor pressure is too low, and the solvent does not evaporate much even if time passes after application. Therefore, it takes too much time for the defect correction ink applied in the recess defect to lose its fluidity, resulting in a decrease in productivity, and the applied defect correction ink wets and spreads around the recess defect. May cause problems. On the other hand, if the vapor pressure of the solvent used for the defect correction ink exceeds the above range, the vapor pressure is too high, and the solvent evaporates immediately after application of the defect correction ink. There is a possibility that the defect correction ink loses its fluidity before it spreads wet.

  Examples of the solvent having a vapor pressure at 20 ° C. within the above range include 3-methoxybutyl acetate, methoxypropyl acetate, methoxybutyl acetate, cyclohexanone, etc. Among them, 3-methoxybutyl acetate, methoxybutyl acetate and the like are preferable. Used.

  In the present invention, the vapor pressure at 20 ° C. can be measured by using a u-type pressure gauge, a suggested diaphragm pressure gauge, a gas flow method, a boiling point measurement method, or the like. In addition, mmHg having a boiling point described in a material safety data sheet (MSDS) of a chemical substance of the solvent used can be calculated and converted to Pa.

  The solvent is used in the defect correction ink used in the present invention in the range of 25% to 70% by weight, particularly in the range of 25% to 55% by weight, and more preferably in the range of 30% to 45% by weight. It is preferable to mix.

(B) Monomer having reactive functional group The defect correction ink used in the present invention may have a monomer having a reactive functional group.
It is preferable that the defect correction ink used in the present invention contains both a polymer described later and a monomer having a reactive functional group as a binder component. By containing a monomer having a reactive functional group together with the polymer, functions such as viscosity adjustment, film formability and curability after coating, and adhesion to the surface to be coated, which have been required for conventional polymers, can be achieved. As a result, the degree of freedom in selecting a polymer is increased, for example, the polymer does not necessarily require curability, and the degree of freedom in designing as a defect correction ink is increased. . Therefore, by adjusting the types and amounts of monomers and polymers having reactive functional groups, the physical properties related to the coating suitability such as viscosity are adjusted to an appropriate range, and the binder component quantity ratio is also set to an appropriate range. By adjusting, sufficient adhesion to the substrate can be obtained.

  Moreover, by including the monomer which has a reactive functional group, compared with the case where only a polymer is contained, the solvent resistance of a correction part, heat resistance, and the adhesiveness with respect to a to-be-coated surface can be improved.

  Furthermore, since a monomer having a reactive functional group can partially substitute for the solvent, the content of the solvent in the ink for defect correction can be reduced by adding the monomer having the reactive functional group, the viscosity, etc. It can also be used as a component for adjusting the physical properties. For this reason, the volatilization amount of the solvent is reduced, the stability of physical properties such as the viscosity of the ink is improved during storage and use, and the volume reduction rate due to the volatilization of the solvent is reduced after application of the ink. Since the volume reduction rate is small, it is possible to sufficiently increase the thickness of the overcoat layer formed on the defective part by applying a small amount of defect correction ink to the defective part, and the trouble of applying repeatedly Disappear. Further, since the adhered droplets of the defect correcting ink have a small volume even before drying, it is difficult to protrude to the surroundings, and the formation of new protrusions can be avoided.

  When the defect correction ink contains a monomer having a reactive functional group, the monomer having a reactive functional group constitutes a binder component for imparting film formability and adhesion to the coated surface together with the polymer described later. In particular, it acts to impart curing reactivity.

  A monomer having a reactive functional group is a compound that can serve as a structural unit of a polymerization reaction in the defect correction ink used in the present invention. For example, an oligomer in which two or more monomers are polymerized has a reactive functional group. However, as long as it has fluidity at room temperature, it can be used as the monomer in the present invention.

  Monomers having such reactive functional groups can be used alone or in admixture of two or more.

  When a polyfunctional reactive monomer having two or more reactive functional groups in one molecule is used as the monomer having a reactive functional group, it is preferable because a high crosslinking density is obtained and sufficient curability is exhibited.

  The reaction type of the reactive functional group is not particularly limited as long as it is a curing reaction. For example, it may belong to either photoreaction or thermal reaction in terms of reaction energy, radical polymerization in terms of active species, It may belong to any of cationic polymerization, anionic polymerization, photodimerization reaction and the like. Specifically, for example, when the monomer has an ethylenically unsaturated bond as a reactive functional group, photo radical polymerization and thermal radical polymerization are possible, and when the monomer has an epoxy group as a reactive functional group Thermosetting and photocationic polymerization are possible.

  As the photoreactive monomer, a monomer having an ethylenically unsaturated bond is preferably used. Monomers with ethylenically unsaturated bonds as radical photopolymerizable groups are those that cause a polymerization reaction directly by light irradiation or indirectly by the action of an initiator. After applying the ink, it is preferably used for fixing the ink in a short time by light irradiation.

  Specific examples of the monomer having an ethylenically unsaturated bond include the following polyfunctional acrylate monomers: dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol tetra (meth) ) Acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol (meth) acrylate, diallyl phthalate, tripropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate propylene oxide addition Products, ethylene glycol (meth) acrylate, diethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropiate Glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, hexane di (meth) acrylate, neopentyl glycol di (meth) acrylate, glycerin di (meth) acrylate, glycerin tri (meta) ) Acrylate, glycerin tetra (meth) acrylate, tetratrimethylolpropane tri (meth) acrylate, 1,4-butanediol diacrylate, etc., among others, dipentaerythritol hexaacrylate, dipentaerythritol penta (Meth) acrylate, pentaerythritol tetra (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meta Acrylate, high crosslinking density can be obtained, preferably exhibits sufficient curability.

  Examples of the cationic photopolymerizable monomer include monomers having a cyclic ether group such as an epoxy group or an oxetanyl group, a thioether group, a vinyl ether group, or the like. Examples of the photoanion polymerizable monomer include monomers having a vinyl group having an electron withdrawing group, a cyclic urethane group, a cyclic urea, a cyclic siloxane group, and the like.

  As the heat-reactive system, for example, a ring-opening addition reaction system such as an epoxy group and active hydrogen or a cyclic urea group and a hydroxyl group can be used. Particularly preferably, a combination of a monomer (including an oligomer) having a glycidyl group, an alicyclic epoxy group, or an oxetanyl group and a polyvalent carboxylic acid anhydride or a polyvalent carboxylic acid can be exemplified from the viewpoint of stability over time. From the viewpoint of curability, it is disclosed in a monomer having a glycidyl group, an alicyclic epoxy group, and an oxetanyl group, as well as in Japanese Patent No. 2682256, Japanese Patent No. 2850897, Japanese Patent No. 2894317, and JP-A No. 2001-350010. It is particularly preferred to use a combination of such block carboxylic acids.

  Moreover, as a monomer which has a glycidyl group, an alicyclic epoxy group, and an oxetanyl group, a liquid novolak type epoxy, an alicyclic epoxy, a cardo epoxy etc. can be illustrated at room temperature, for example, brand name BPEFG (made by Nagase ChemteX) , Celoxide 2021P, 3000, 2000, Styrene oxide, Epolide GT300, GT400 (manufactured by Daicel Chemical Industries), Epicoat 901, 801P, 802, 802XA, 806, 806L, 807, 815, 819, 825, 827, 828, 815XA 828EL, 828XA, 152, 604, 630 (above, made by oil-based shell epoxy), and the like. Of these, Epolide GT400, which is an alicyclic epoxy, is preferable from the viewpoints of viscosity and reactivity.

  Specific examples of the polyvalent carboxylic acid anhydride used in combination with the monomer having an epoxy group include phthalic anhydride, itaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, tricarballylic anhydride, maleic anhydride, Aliphatic or alicyclic dicarboxylic anhydrides such as hexahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, hymic anhydride, nadic anhydride; 1,2,3,4-butanetetracarboxylic dianhydride, cyclopentane Aliphatic polycarboxylic acid dianhydrides such as tetracarboxylic dianhydride; aromatic polycarboxylic acid anhydrides such as pyromellitic anhydride, trimellitic anhydride, and benzophenone tetracarboxylic anhydride; ethylene glycol bis trimellitate, Ester group-containing acid anhydrides such as glycerin tristrimericate It can be mentioned, particularly preferably, and aromatic polycarboxylic acid anhydrides. Moreover, the epoxy resin hardening | curing agent which consists of a commercially available carboxylic acid anhydride can also be used suitably.

  Specific examples of the polyvalent carboxylic acid used in combination with the monomer having an epoxy group include aliphatic polyvalent carboxylic acids such as succinic acid, glutaric acid, adipic acid, butanetetracarboxylic acid, maleic acid, and itaconic acid; Aliphatic polycarboxylic acids such as hydrophthalic acid, 1,2-cyclohexanedicarboxylic acid, 1,2,4-cyclohexanetricarboxylic acid, cyclopentanetetracarboxylic acid, and phthalic acid, isophthalic acid, terephthalic acid, pyromellitic acid, Aromatic polyvalent carboxylic acids such as trimellitic acid, 1,4,5,8-naphthalenetetracarboxylic acid and benzophenonetetracarboxylic acid can be mentioned, and aromatic polyvalent carboxylic acids can be mentioned preferably.

  These polyvalent carboxylic acid anhydrides and polyvalent carboxylic acids can be used singly or in combination of two or more. The amount of the curing agent is usually in the range of 50 to 200 parts by weight per 100 parts by weight of the monomer having an epoxy group.

  Examples of the photoreactive and heat-reactive monomer include monomers having an ethylenically unsaturated bond and an epoxy group. Specifically, glycidyl acrylate, glycidyl methacrylate, α-ethyl acrylate glycidyl, α-n -Glycidyl propyl acrylate, glycidyl α-n-butyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, -4,5-epoxypentyl methacrylate, acrylate-6, (Meth) acrylates such as 7-epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, α-ethylacrylic acid-6,7-epoxyheptyl; o-vinylphenyl glycidyl ether, m-vinylphenyl glycidyl ether, p -Vinyl phenyl glycidyl ether, o-vinyl benzyl group Vinyl glycidyl ethers such as sidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether; 2,3-diglycidyloxystyrene, 3,4-diglycidyloxystyrene, 2,4-diglycidyloxystyrene, 3,5-diglycidyloxystyrene, 2,6-diglycidyloxystyrene, 5-vinyl pyrogallol triglycidyl ether, 4-vinyl pyrogallol triglycidyl ether, vinyl phloroglicinol triglycidyl ether, 2,3-dihydroxymethylstyrene di Glycidyl ether, 3,4-dihydroxymethylstyrene diglycidyl ether, 2,4-dihydroxymethylstyrene diglycidyl ether, 3,5-dihydroxymethylstyrene diglycidyl ether 2,6-dihydroxymethylstyrene diglycidyl ether, 2,3,4-trihydroxymethylstyrene triglycidyl ether, and 1,3,5-trihydroxymethylstyrene triglycidyl ether, cycloaliphatic epoxy (meth) acrylate Etc.

  The monomer having a reactive functional group is preferably contained in the defect correction ink in an amount of 15% to 65% by weight, more preferably 20% to 55% by weight, and more preferably 25% to 45% by weight. It is particularly preferred that

(C) Polymer In the defect correction ink used in the present invention, as a binder component for imparting film formability and adhesion to the surface to be coated, and having a higher viscosity than the monomer in the ink state. Therefore, a polymer may be blended as a component for adjusting physical properties such as the viscosity of the ink. When the defect-correcting ink used in the present invention contains the above-mentioned monomer having a reactive functional group, in particular, the function as a binder component is shared with the monomer having the reactive functional group. , Design freedom increases.

  The polymer that can be used in the defect-correcting ink used in the present invention is not particularly limited as long as it is soluble in the solvent used or compatible with the monomer used. In the defect correcting ink used in the present invention, when the amount of the solvent is reduced and the monomer having a reactive functional group has a partial function of replacing the solvent, the monomer used has a higher compatibility. preferable.

  The polymer has a higher viscosity than the monomer in the ink state, and can be used to adjust the viscosity to a high level. The weight average molecular weight is 30,000 or more (measured by gel permeation chromatography (GPC)). (Polystyrene equivalent weight average molecular weight), preferably 50,000 or more. In such a case, a sufficient viscosity increase effect can often be obtained with a small amount.

  Such polymers can be used alone or in admixture of two or more.

  In particular, it is preferable to use the same type of polymer as the polymer used in the defective portion of the color filter to be corrected in terms of familiarity with the correction site of the defect correcting ink and adhesion. For example, polymers generally used for the overcoat layer of the color filter are acrylic resins, epoxy resins, and the like, and these polymers can be preferably used.

  The polymer may be either reactive or non-reactive. However, when a reactive polymer is used, it is preferable because the film strength can be increased by reacting and curing the coating film. The reaction form of the reactive functional group is not particularly limited, and the same reaction form as exemplified for the monomer having the reactive functional group can be used.

  Here, as the non-reactive polymer, for example, a polymer comprising the following monomers or a copolymer using two or more monomers: (meth) acrylic acid, methyl (meth) acrylate, 2-hydroxyethyl ( (Meth) acrylate, benzyl (meth) acrylate, styrene, polystyrene macromonomer, and polymethyl methacrylate macromonomer, cyclohexyl (meth) acrylate, α-hydroxymethyl (meth) acrylate, α-hydroxyethyl (meth) acrylate, tricyclode Nical (meth) acrylate; etc. can be used.

  The reactive polymer may be a polymer having a reactive functional group, for example, a polymer having an ethylenically unsaturated bond, a polymer having an epoxy group, a polymer having an oxazoline group, a polymer having a cyclic urea group, A polymer having a cyclic ester group, a polyimide precursor (polyamic acid), a melamine resin, or the like can be used. From the viewpoint of stability and reactivity, a polymer having an ethylenically unsaturated bond and a polymer having an epoxy group are preferable. Used.

  As the polymer having an ethylenically unsaturated bond, polymers and copolymers using one or more of the above-mentioned polyfunctional acrylate monomers containing an ethylenically unsaturated bond can be used. Among these, a diallyl phthalate prepolymer and a polymer disclosed in JP-A No. 2000-239497 are preferably used from the viewpoint of thermosetting.

  The polymer may be blended in the defect correction ink within a range of 1% to 25% by weight, particularly within a range of 2% to 20% by weight, and further within a range of 2% to 12% by weight. preferable.

(D) Polymerization initiator

  For the purpose of improving the reactivity of a monomer having a reactive functional group or a reactive polymer, it is preferable that a polymerization initiator is blended during the production of the defect correction ink used in the present invention.

  For example, when a monomer and / or polymer having a radical polymerizable group such as an ethylenically unsaturated bond is used, a radical polymerization initiator is usually added. Examples of radical polymerization initiators include acetophenones, benzophenones, ketals, anthraquinones, thioxanthones, azo compounds, peroxides, 2,3-dialkyldione compounds, disulfide compounds, thiuram compounds, fluoroamines. A compound or the like is used. More specifically, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, benzyldimethylketone, 1- (4-dodecyl) Phenyl) -2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane Examples thereof include -1-one and benzophenone. Among these, initiators of acetophenones and thioxanthones are preferably used, and specifically, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1, 2-methyl -1- (4-Methylthiophenyl) 2-morpholino-propan-1-one and diethylthioxanthone are preferably used in the present invention in terms of sensitivity and low oxygen inhibitory properties. These can be used either alone or in combination.

  Photocationic polymerization initiators include sulfonic acid esters, imide sulfonates, dialkyl-4-hydroxysulfonium salts, arylsulfonic acid-p-nitrobenzyl esters, silanol-aluminum complexes, (η6-benzene) (η5-cyclopentadienyl). ) Iron (II) and the like are exemplified, and more specific examples include benzoin tosylate, 2,5-dinitrobenzyl tosylate, N-tosiphthalimide, and the like, but are not limited thereto.

  Examples of photo radical polymerization initiators and photo cationic polymerization initiators include aromatic iodonium salts, aromatic sulfonium salts, aromatic diazonium salts, aromatic phosphonium salts, triazine compounds, iron arene complexes, etc. More specifically, diphenyliodonium, ditolyliodonium, bis (p-tert-butylphenyl) iodonium, bis (p-chlorophenyl) iodonium and the like iodonium chloride, bromide, borofluoride, hexafluorophosphate salt, Iodonium salts such as hexafluoroantimonate salt, chlorides of sulfonium such as triphenylsulfonium, 4-tert-butyltriphenylsulfonium, tris (4-methylphenyl) sulfonium, bromide, borofluoride, hex Sulfonium salts such as fluorophosphate salts and hexafluoroantimonate salts, 2,4,6-tris (trichloromethyl) -1,3,5-triazine, 2-phenyl-4,6-bis (trichloromethyl) -1, 2,4,6-substituted-1,3,5 triazine compounds such as 3,5-triazine, 2-methyl-4,6-bis (trichloromethyl) -1,3,5-triazine, etc. It is not limited to these.

  Examples of photoanionic polymerization initiators include compounds that generate amines upon irradiation with ultraviolet light, and more specifically 1,10-diaminodecane, 4,4′-trimethylenedipiperidine, carbamates and derivatives thereof, and cobalt-amines. Complexes, aminooxyiminos, ammonium borates and the like can be exemplified, and a commercial product is Midori Chemical Co., Ltd. NBC-101.

  The polymerization initiator is preferably blended in the defect correction ink in an amount of 2 to 20% by weight, more preferably 2 to 15% by weight, particularly preferably 5 to 9% by weight. preferable.

(E) Other additives In the defect correction ink used in the present invention, when a relatively large amount of a monomer having a reactive functional group is blended, the obtained defect correction ink is prevented from gelation and stored. In order to improve the stability of the ink, it is preferable to add a polymerization inhibitor during the production of the ink. The polymerization inhibitor is not particularly limited, and diphenylpicrylhydrazide, tri-p-nitrophenylmethyl, p-benzoquinone, p-tert-butylcatechol, picric acid, copper chloride, methylhydroquinone, methoquinone, tert-butylhydroquinone. Polymerization inhibitors for reactions such as these can be used, but among these, hydroquinone polymerization inhibitors are preferred from the viewpoint of storage stability, and methylhydroquinone is particularly preferred.

  The polymerization inhibitor is contained in the defect correcting ink in the range of 0.01% by weight to 1% by weight, in particular in the range of 0.01% by weight to 0.5% by weight, and further 0.01% by weight to 0.00%. It is preferable to mix in the range of 05% by weight.

  Furthermore, in addition to the defect correction ink used in the present invention, a crosslinking agent or the like may be blended. When a crosslinking agent is used, the solvent resistance and heat resistance of the correction part can be improved, and in the case of a silane-based crosslinking agent, the adhesion of the correction part can be improved.

  The crosslinking agent is not particularly limited as long as it is effective for curing the monomer or polymer to be used. For example, an aminoalkyl polyvalent alkoxysilane or a hydrolyzate of aminoaryl polyvalent alkoxysilane or a condensate thereof is preferable. Can be used. In addition to aminoalkyl polyvalent alkoxysilanes or aminoaryl polyvalent alkoxysilanes, or their hydrolyzates or condensates and polyvalent carboxylic acids or polycarboxylic dianhydrides, as well as metal chelates, etc. It can be preferably used.

  The crosslinking agent is preferably blended in the defect correction ink in an amount of 0.1 to 5% by weight, more preferably 0.1 to 3% by weight, and more preferably 0.1 to 1.5%. It is particularly preferable to blend by weight%.

  The solid content concentration in the defect correcting ink used in the present invention is preferably 40% to 55% by weight, more preferably 45% to 52% by weight, and 45% to 50% by weight. Is more preferable.

  The binder component in the solid content is preferably 30% by weight to 60% by weight, more preferably 35% by weight to 60% by weight, and still more preferably 40% by weight to 55% by weight.

  In addition, solid content concentration is weight% with respect to the ink weight of the ink content other than a solvent, ie, the net weight of the monomer which has a reactive functional group, a polymer, and other arbitrary components here. Moreover, the density | concentration of the binder component in solid content is represented by weight% of the binder component (For example, the total amount of the monomer and polymer which have a reactive functional group) with respect to the weight of the solid content contained in ink.

3. Method for preparing defect correcting ink The method for preparing the defect correcting ink used in the present invention is not particularly limited as long as it is a method capable of preparing a defect correcting ink having desired physical properties. Each component is mixed separately in advance. Then, a method of mixing the whole and the like can be used.

4). Application Method of Defect Correction Ink As a method of applying defect correction ink to the concave defect, a method of dripping a necessary amount of defect correction ink with a dispenser, an inkjet method, or a tip as illustrated in FIG. For example, there is a method in which the defect-correcting ink 7 is attached to the tip of a needle-like object (coating needle 8) forming a flat surface and pressed against the defect of the recess. Since it is possible to deal with finer recess defects, in the present invention, among the above methods, it is preferable that the recesses are applied to the recess defects by an application needle. When the defect correction ink 7 is applied by the application needle 8 illustrated in FIG. 2, it is necessary to attach the defect correction ink to the application needle, apply the defect correction ink to the defect portion, and appropriately wet and spread it. By preparing a defect correcting ink having such physical properties and composition, these steps can be easily and satisfactorily performed.

5. In the present invention, the defect correction ink can be cured by irradiating with ultraviolet rays or the like after the defect correction ink applied by the above-described method or the like is wet and spread in the defect. . For example, an ultraviolet light source can be used when the defect correction ink is an ultraviolet curable resin, and a visible or infrared light source can be used when the defect correction ink is a thermosetting resin.

6). Applications The color filter modified by the above-described color filter modification method of the present invention can be used for a liquid crystal display device, an organic electroluminescent (EL) display, and the like. Especially, it is preferable that it is what is used for the liquid crystal display device of the type in which alignment film is directly formed on the said overcoat layer, such as IPS type. Unlike TFT liquid crystal display devices in which transparent electrodes such as ITO deposited films are formed on color filters, IPS liquid crystal display devices that do not have transparent electrodes on color filters have severe surface smoothness of color filters. Is required. Since the overcoat layer of the color filter corrected by the method for correcting a color filter of the present invention has extremely high smoothness, the alignment film is formed by forming an alignment film on the overcoat layer. Can be formed satisfactorily.

  Further, as described above, the defect-correcting ink used in the present invention does not contain a surfactant, so that the surfactant component oozes out to the layer formed on the overcoat layer. Problems can be prevented. Also in this respect, the color filter modified by the color filter modification method of the present invention does not have a transparent electrode or the like on the color filter, and an IPS type or the like forms an alignment film directly on the overcoat layer. It is preferable to be used for a liquid crystal display device of the type.

B. Method for Producing Color Filter The method for producing a color filter of the present invention comprises a color filter forming step for forming a color filter having an overcoat layer on a colored layer, and an inspection step for detecting a recess defect present in the overcoat layer. And a concave defect correcting step for correcting the concave defect detected in the inspection step using the correction method of the color filter. In the recess defect correcting step, by correcting the recess defect by the color filter correcting method, a high-quality color filter with a high yield can be manufactured.
Hereinafter, each process in the manufacturing method of the color filter of this invention is demonstrated.

1. Color filter forming step The color filter formed in the color filter forming step in the present invention is not particularly limited as long as it is a color filter having an overcoat layer on a colored layer, such as a color pattern or a black matrix on a substrate. A general color filter having an overcoat layer formed thereon can be formed by a known method.

  The transparent substrate used in the color filter forming step is not particularly limited as long as it is generally used as a transparent substrate. For example, quartz glass, Pyrex (registered trademark), synthetic quartz plate and the like are acceptable. Examples thereof include a transparent rigid material having no flexibility, or a transparent flexible material having flexibility such as a transparent resin film and an optical resin plate.

  In addition, the color layer of the color filter formed in the color filter forming step may be a single color or a multi-color pattern such as red (R), green (G), and blue (B). These may be formed in various patterns such as mosaic, triangle, and stripe patterns. As a method for forming a color pattern in the color filter forming step, a conventional pigment dispersion method, a printing method using an ink jet method, or the like can be used, and the present invention is not particularly limited.

  Furthermore, the colored layer may be disposed between the color patterns forming the pixel portion, and may have a black matrix formed to block light. The method for producing the black matrix on the transparent substrate is not particularly limited. For example, a thin metal film such as chromium having a thickness of about 1000 to 2000 mm is formed by a sputtering method, a vacuum deposition method, or the like. The method of forming by patterning etc. can be mentioned.

  Further, the black matrix may be a layer containing light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, organic pigments in a resin binder, and the resin binder used is a polyimide resin, One or a mixture of two or more resins such as acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose, photosensitive resin, and O / W emulsion type resin composition, for example, What emulsified reactive silicone can be used. As a method for patterning such a resinous black matrix, a generally used method such as a photolithography method or a printing method can be used.

  The overcoat layer formed on the colored layer has impurity blocking properties, light resistance, smoothness, heat resistance, moist heat resistance, chemical resistance, solvent resistance, transparency, toughness, and the like. It is preferable. In the present invention, the specific resistance value is particularly preferably 106 Ω · cm or more. By using such an overcoat layer, when the IPS color filter is used in a liquid crystal display device, the influence of the light shielding portion on the electric field can be reduced even by the overcoat layer.

  Specifically, an acrylic resin, an epoxy resin, an acrylic / epoxy resin, a siloxane resin precursor, a silicone polyimide resin precursor, or the like can be used as such an overcoat layer. Furthermore, in the present invention, the overcoat layer preferably has a low swelling rate. This is because when the IPS color filter is used in a liquid crystal display device, the overcoat layer may be in direct contact with the sealing material. Examples of the method for reducing the swelling rate of the overcoat layer include a method for controlling the crosslinking density and polarity of the overcoat layer. Examples of the method for improving the crosslinking density include a method of structurally increasing the number of crosslinking points, such as a method using polyfunctional acrylic, polyfunctional epoxy, trialkoxysilane and the like. In addition, a method of performing a coating film formation reaction under conditions that allow the crosslinking reaction to proceed sufficiently may be used. For example, a method of reacting at a high temperature for a long time within a range in which the overcoat layer does not undergo degradation or color change. Is mentioned. In terms of structure, it is preferable to use an aliphatic compound rather than an aromatic compound.

2. Inspection process In this process, the recessed part defect which exists in the said overcoat layer is detected. The method for detecting the recess defect is not particularly limited as long as it can detect the recess defect. For example, a stylus type film thickness meter (for example, a product manufactured by KLA-Tencor Corporation, a product) Name: A concave defect can be detected by measuring the profile of the overcoat layer using a stylus thickness meter P-15). In addition, it can also be measured using a measuring instrument capable of three-dimensional detection such as a laser microscope.

  In this step, if the presence of a concave defect is confirmed, the position of the concave defect in the color filter is measured, and based on the positional information, the defect correction ink is applied in the defect correction ink application process described later. You may do.

3. Recess Defect Correction Step In this step, the recess defect detected in the inspection step is corrected using the above-described color filter correction method. Since the method for correcting the concave defect in this step is the same as that in the section “A. Method for correcting color filter”, description thereof is omitted here.

  Moreover, the manufacturing method of the color filter of this invention may have the transparent electrode formation process which forms a transparent electrode, the alignment layer formation process which forms an alignment layer, etc. other than each process mentioned above. These steps are preferably performed after an overcoat layer is formed on the colored layer, the overcoat layer is inspected, and defects are corrected. The alignment layer and the like can be formed by a known method using a material generally used when forming a layer having such a function.

C. Manufacturing method of liquid crystal display device The manufacturing method of the liquid crystal display device of the present invention includes a color filter forming step of forming a color filter having an overcoat layer on a colored layer, and an inspection for detecting a recess defect present in the overcoat layer. A concave substrate defect correcting step of correcting the concave defect detected in the inspection step using the color filter correcting method, and arranging the counter substrate so as to have a predetermined gap with the color filter, and the counter substrate And a counter substrate bonding step of bonding the liquid crystal, and a liquid crystal sealing step of injecting liquid crystal between the color filter and the counter substrate and sealing with a sealing material. By correcting the concave defect of the color filter using the color filter correcting method, a high-quality liquid crystal display device with a high yield can be manufactured.

In the method for manufacturing a liquid crystal display device of the present invention, as illustrated in FIG. 3A, first, a colored layer 3 is formed in the opening of the black matrix 2 formed on the substrate 1, and further over it. A sealing material 31 is formed on the outer peripheral portion of the color filter 5 on which the coat layer 4 is formed, a counter substrate 32 is disposed on the sealing material 31, and the sealing material 31 is cured (counter substrate bonding step). Thereafter, as illustrated in FIG. 3B, liquid crystal 33 is injected between the color filter 5 bonded to the sealing material 31 and the counter substrate 32 and sealed with a sealing material (not shown). (Liquid crystal encapsulation process).
Hereinafter, each step will be described.

1. Color filter forming step The color filter formed in the color filter forming step in the present invention is not particularly limited as long as it is a color filter having an overcoat layer on a colored layer, such as a color pattern or a black matrix on a substrate. A general color filter having an overcoat layer formed thereon can be formed by a known method.

  The configuration of the color filter, the material used for the color filter, and the like are the same as those in “1. Color filter forming step” in “B. Color filter manufacturing method”, and thus the description thereof is omitted here.

2. Inspection process In this process, the recessed part defect which exists in the said overcoat layer is detected. The method for detecting the concave defect in this step is the same as that in the “B. Color filter manufacturing method” and “2. Inspection step”, and the description thereof is omitted here.

3. Recess Defect Correction Step In this step, the recess defect detected in the inspection step is corrected using the above-described color filter correction method. Since the method for correcting the concave defect in this step is the same as that in the section “A. Method for correcting color filter”, description thereof is omitted here.

4). Counter substrate bonding step In this step, the counter substrate is disposed so as to have a predetermined gap from the color filter, and the counter substrate is bonded. In the present invention, the method for bonding the color filter and the counter substrate is not particularly limited as long as the two can be bonded so as to have a predetermined gap. Can be done by various methods.

  For example, the color filter and the counter substrate are bonded by forming a sealing material on the outer periphery of the color filter, disposing the counter substrate on the sealing material, curing the sealing material, and bonding the counter substrate. Can be matched. The method for forming the sealing material is not particularly limited. For example, in a general manufacturing method of a liquid crystal display device, a roll coating method, a screen printing method, a dispenser discharge method, and an ink jet used for forming the sealing material. The law etc. can be used. Here, the sealing material is usually formed along the outer periphery of the non-effective display area by opening a liquid crystal injection port for injecting liquid crystal in a liquid crystal sealing process described later.

  Here, as the sealing material used in this step, a thermosetting resin or an ultraviolet curable resin used in a general liquid crystal display device can be used, and in particular, a seal using both ultraviolet curing and thermosetting together. It is preferable to use a material.

  The counter substrate to be bonded to the color filter is not particularly limited, and those generally used for liquid crystal display devices can be used. For example, a lateral electric field type liquid crystal display device such as IPS can be obtained by forming an alignment film on the color filter and bonding the color filter to a counter substrate provided with a liquid crystal driving electrode. . Further, by forming a transparent electrode such as ITO on the color filter and bonding the color filter and a counter substrate having a counter electrode, a vertical electric field type liquid crystal display device such as TN can be obtained.

  Among the above, the liquid crystal display device manufactured in the present invention is preferably a liquid crystal display device of a type in which an alignment film is formed directly on the overcoat layer, such as an IPS type. This is because the overcoat layer of the color filter corrected in the recess defect correcting step has extremely high smoothness and can be suitably used for the above-described type of liquid crystal display device. In addition, the defect-correcting ink used for correction does not contain a surfactant, preventing problems such as the surfactant component seeping out into the alignment film formed directly on the overcoat layer. can do.

5. Liquid crystal sealing step In this step, liquid crystal is injected between the color filter and the counter substrate and sealed with a sealing material. As a method for injecting liquid crystal between the color filter and the counter substrate in this step, a method used in a general method for manufacturing a liquid crystal display device of a color filter can be used. In between, it can carry out by inject | pouring a liquid crystal from the liquid crystal injection port in which the sealing material is not partially formed.

  In this step, the liquid crystal and the sealing material sealed between the color filter and the counter substrate can be those used in a general liquid crystal display device, and the description thereof is omitted here. To do.

D. Defect correcting ink The defect correcting ink of the present invention is a defect correcting ink used for correcting a concave defect existing in an overcoat layer formed on a colored layer of a color filter, and is used for the defect correcting ink. Uses a solvent having a vapor pressure of 400 Pa or higher at 20 ° C., and the viscosity of the defect correction ink is in the range of 10 mPa · s to 60 mPa · s. Is not included. By using the defect correction ink having the above-mentioned physical properties and not containing a surfactant, it is possible to satisfactorily correct the concave defect present in the overcoat layer formed on the colored layer of the color filter.

  In the defect correcting ink of the present invention, a solvent having a vapor pressure at 20 ° C. of 400 Pa or more, more preferably 400 Pa to 600 Pa, and still more preferably 400 Pa to 500 Pa is used. If the vapor pressure of the solvent used in the defect correcting ink is less than the above range, the vapor pressure is too low, and the solvent does not evaporate much even if time passes after application. Therefore, it takes too much time for the defect correction ink applied in the recess defect to lose its fluidity, resulting in a decrease in productivity, and the applied defect correction ink wets and spreads around the recess defect. May cause problems. On the other hand, if the vapor pressure of the solvent used for the defect correction ink exceeds the above range, the vapor pressure is too high, and the solvent evaporates immediately after application of the defect correction ink. There is a possibility that the defect correcting ink loses its fluidity before it spreads wet.

  The solvent used in the defect correction ink, such as the method for measuring the vapor pressure of the solvent and the preferred solvent type, is described in “2. Defect correction ink application process” in “A. Color filter correction method”. Since it is the same as the item “(a) Solvent” in “(2) Composition of defect correcting ink”, description thereof is omitted here.

  The viscosity of the defect correcting ink of the present invention is in the range of 10 mPa · s to 60 mPa · s, more preferably in the range of 10 mPa · s to 50 mPa · s, and particularly in the range of 15 mPa · s to 35 mPa · s. If the viscosity of the defect correcting ink is less than the above range, the viscosity is too low, and the defect correcting ink may spread to the periphery of the applied recess defect. On the other hand, when the viscosity of the defect correction ink exceeds the above range, the viscosity is too high, and the defect correction ink may not be sufficiently wetted and spread in the recess defect.

  Regarding the physical properties of the defect correcting ink, such as the method for measuring the viscosity of the defect correcting ink, refer to “(1) Defect correction” in “2. Since it is the same as the section “Physical properties of the ink for use”, the description thereof is omitted here.

  Further, the defect correcting ink of the present invention does not contain a surfactant. By using a defect-correcting ink that does not contain a surfactant, the surfactant component is locally present only in the corrected portion of the overcoat layer, and the coating of the layer formed on the overcoat layer is applied. Problems such as repelling the working fluid can be prevented. In addition, when the overcoat layer contains a surfactant component, the surfactant component may ooze out into a layer adjacent to the overcoat layer, which may contribute to problems such as a liquid crystal layer. In particular, in a liquid crystal display device of a type in which an alignment film is directly formed on the overcoat layer, such as IPS (In Plane Switching), the overcoat layer is a surfactant component because the above-mentioned problem is likely to occur. It is preferable not to contain.

  Regarding the composition of the defect correcting ink, such as a specific example of the defect correcting ink that does not contain a surfactant, in “2. Defect correcting ink application process” in “A. Color filter correcting method” above. Since it is the same as the section of “(2) Composition of defect correcting ink”, description thereof is omitted here.

  In the said invention, it is preferable that the said defect correction ink is used for the correction method of the said color filter. That is, as illustrated in FIG. 1, in the correction method performed by applying the defect correction ink 7 as it is to the detected recess defect 6 without removing the recess defect 6 and the overcoat layer 4 in the peripheral portion thereof. It is preferable to be used. This is because, by using the defect correction ink of the present invention in the color filter correction method, the color filter defect correction method can be carried out easily and satisfactorily.

  In addition, the details of the defect correcting ink of the present invention, the preparation method of the defect correcting ink of the present invention, and the like are the same as in the above section “A. Correction method of color filter”, so the description here is as follows. Omitted.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

The following examples illustrate the present invention in more detail.
Using the defect correction ink having the composition shown in Table 1 below, the concave defects of the overcoat layer were corrected. For the correction, the defect correction ink is attached to the tip of the application needle, and the droplet of the defect correction ink attached to the application needle is brought into contact with the recess defect of the overcoat layer, thereby correcting the defect in the recess defect. The ink was applied, and the defect correction ink was cured by irradiating the region with ultraviolet rays.

  In addition, in the following Table 1, the composition of the general coating liquid for overcoat layer formation used for formation of an overcoat layer is shown as a reference example. Table 2 shows the vapor pressure at 20 ° C. of the solvents used in the examples and the viscosity of the defect correcting ink.

  Table 3 below shows the voltage holding ratio, the smoothness after the correction, and the determination of the concave defect area after the correction. The voltage holding ratio is preferably a value in which the corrected region of the overcoat layer is close to the uncorrected region. That is, the voltage holding ratio of the overcoat layer formed by using the overcoat layer forming coating solution shown as the reference example is 93%, and a value close to this value, that is, 87% or more, particularly 90% or more. Preferably there is. Table 3 below shows the voltage holding ratio of the region corrected in each example.

  The smoothness after correction of the region corrected in each example was confirmed using a stylus type film thickness meter (trade name: stylus type film thickness meter P-15, manufactured by KLA-Tencor Corporation). Table 3 shows the results in each example when the unevenness of the corrected portion is less than 0.3 μm and is “very good”, and when 0.3 μm to 0.7 μm is “good”.

  Further, when the alignment film is formed by applying the alignment film forming coating solution on the overcoat layer corrected in Examples 1 to 4, the alignment film forming coating solution in the corrected region The presence or absence of "hajiki" was examined. The alignment film is pre-baked (80 ° C.) after applying an alignment film forming coating solution (alignment film material: SE-7492 (manufactured by Nissan Chemical Industries, Ltd.)) at 2000 rpm with a spin coater on the overcoat layer. × 3 minutes) It was formed by heating and baking in an oven (230 ° C. × 30 minutes). Table 3 shows the result of visual confirmation of the occurrence of repellency of the alignment film at the corrected location.

DESCRIPTION OF SYMBOLS 1 ... Board | substrate 2 ... Black matrix 3 ... Colored layer 4 ... Overcoat layer 5 ... Color filter 6 ... Concave defect 7 ... Defect correction ink

Claims (9)

A method of correcting a color filter for correcting a recess defect present in an overcoat layer formed on a colored layer of a color filter,
It has a defect correction ink application step of applying defect correction ink to the concave defect present in the overcoat layer, which is detected in a defect detection inspection performed in advance, and correcting the concave defect. How to correct the color filter.   The method for correcting a color filter according to claim 1, wherein a solvent having a vapor pressure of 400 Pa or higher at 20 ° C. is used for the defect correction ink.   The method for correcting a color filter according to claim 1, wherein the defect correction ink has a viscosity in a range of 10 mPa · s to 60 mPa · s.   The method for correcting a color filter according to any one of claims 1 to 3, wherein the defect-correcting ink does not contain a surfactant.   5. The color according to claim 1, wherein the color filter is used for a liquid crystal display device of a type in which an alignment film is formed directly on the overcoat layer. How to modify the filter. A color filter forming step of forming a color filter having an overcoat layer on the colored layer;
An inspection step of detecting a recess defect present in the overcoat layer;
A concave defect correcting step of correcting the concave defect detected in the inspection step using the color filter correcting method according to any one of claims 1 to 5. Production method. A color filter forming step of forming a color filter having an overcoat layer on the colored layer;
An inspection step of detecting a recess defect present in the overcoat layer;
A concave defect correction step of correcting the concave defect detected in the inspection step using the color filter correction method according to any one of claims 1 to 5,
A counter substrate bonding step of arranging the counter substrate so as to have a predetermined gap with the color filter, and bonding the counter substrate;
A liquid crystal sealing step of injecting liquid crystal between the color filter and the counter substrate, and sealing with a sealing material;
A method for manufacturing a liquid crystal display device, comprising: A defect-correcting ink used for correcting a concave defect present in an overcoat layer formed on a colored layer of a color filter,
For the defect correction ink, a solvent having a vapor pressure of 400 Pa or higher at 20 ° C. is used,
The viscosity of the defect correcting ink is in the range of 10 mPa · s to 60 mPa · s,
The defect correction ink, wherein the defect correction ink contains no surfactant.   The defect correction ink according to claim 8, wherein the defect correction ink is used in the color filter correction method according to claim 1.

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