JP2011000760A - Hologram transfer foil and hologram transfer body using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hologram transfer foil allowing clear release of a release layer from a base material film in transferring of the hologram transfer foil, and canceling trade-off of facilitating formation of a hologram layer, and a hologram transfer body using the hologram transfer foil.SOLUTION: The hologram transfer foil includes the base material film 2, the release layer 3 disposed on one side of the base material film 2, a hologram layer 5 disposed on the opposite side to the base material film 2 of the release layer 3 and forming a hologram relief pattern, a heat seal layer 8 disposed on the opposite side to the release layer 3 in relation to the hologram layer 5, and an offset layer 4 disposed between the release layer 3 and hologram layer 5.

Description

  The present invention relates to a hologram transfer foil, and more particularly to a hologram transfer foil for transferring a hologram in a desired pattern to a transfer object and a hologram transfer body using the same.

  Holograms are, for example, three-dimensional image reproduction and design applications utilizing light interference, anti-counterfeiting applications utilizing the difficulty of forgery, image and information recording / reproduction medium applications, light diffraction, reflection, and scattering. It is an optical article that is used for optical element applications that control the above.

  Holograms include holograms such as relief holograms and volume holograms. Relief holograms record and reproduce images and information by forming fine irregularities on the surface. The volume hologram is a hologram formed by recording information in the layer in the thickness direction of the hologram layer and interference fringes corresponding to the wavefront of light from the object in the form of transmittance modulation and refractive index modulation. .

  The hologram here is not limited to a three-dimensional image, but also includes an optical element in which a constant continuous pattern or a discontinuous pattern is formed, for example, an antireflection element called a diffraction grating or a moth eye.

  Hologram formation methods include a method of recording and forming using the interference phenomenon between reflected light from an article and reference light, a method using a computer generated hologram to produce interference fringe data from a digital data related to an object, a diffraction grating, etc. And a method of drawing the pattern with an electron beam.

  As a method for applying such a hologram to an article, there is a method using a hologram transfer foil. A conventional hologram transfer foil, for example, a relief type hologram transfer foil, forms a resin layer to be a hologram layer through a release layer on a base film, and forms a hologram relief pattern on the resin layer to form a hologram layer. In addition, a reflection layer is provided on the hologram relief pattern, and a heat-sealable adhesive layer is further provided (see Patent Document 1).

JP 2000-272295 A

  In order to peel the release layer cleanly from the base film during transfer of such a hologram transfer foil, it is necessary to impart heat resistance to the release layer and to apply appropriate heat to the release layer and the base film. However, when the transfer foil has a hologram layer, and the release layer and the hologram layer are in contact with each other, if the release layer has heat resistance, the release layer is mixed into the hologram layer, and the hologram layer has heat resistance. I have it. Further, if the hologram layer has heat resistance before UV curing, there is a problem that it is difficult to form by heat embossing.

  The present invention has been made in view of such problems of the prior art. The purpose of the present invention is to remove the release layer cleanly from the substrate film during the transfer of the hologram transfer foil, and to shape the hologram layer. It is an object of the present invention to provide a hologram transfer foil that eliminates the trade-off of facilitation and a hologram transfer body using the same.

  The hologram transfer foil of the present invention that achieves the above object is provided with a base film, a release layer disposed on one side of the base film, and on the opposite side of the release layer from the base film. A hologram layer having a pattern formed thereon, a heat seal layer disposed on the opposite side of the release layer with respect to the hologram layer, and an offset layer disposed between the release layer and the hologram layer. It is characterized by that.

  The offset layer includes a wax.

  The offset layer is made of an acrylic resin.

  The offset layer is an isocyanic curable type.

The hologram transfer foil according to claim 4, wherein the coating amount (g / m ² ) of the offset layer satisfies the following conditional expression.
1 <M <25
However, M is the coating amount (g / m ² ) of the offset layer.

  Further, the heat seal layer includes, as first additive particles, additive particles having a particle size larger than the thickness of the heat seal layer, and second additive particles having a particle size smaller than the thickness of the heat seal layer. And

  The additive particles are made of silica.

  In addition, the heat seal layer includes a wax.

  The hologram layer is made of a resin having an ultraviolet curable crosslinked structure.

  In addition, the hologram layer includes a cross-linking structure adjusting additive that adjusts the number of cross-links of the resin.

  The resin is made of polyurethane acrylate, and the cross-linking structure adjusting additive is made of an oligomer.

  The hologram layer includes a wax.

  The release layer is made of an acrylic resin in which wax is dispersed.

  Further, a vapor deposition layer having a refractive index different from that of the hologram layer is provided between the hologram layer and the heat seal layer.

  Furthermore, the hologram transfer body of the present invention is characterized by comprising the hologram transfer foil and a transfer body onto which the hologram transfer foil is transferred.

  Further, the transfer target is a card, paper, or booklet.

  According to the present invention, at the time of transferring the hologram transfer foil, the release layer is peeled off from the base film, and the hologram transfer foil that eliminates the trade-off of facilitating the shaping of the hologram layer and the hologram transfer using the same The body can be provided.

It is a figure which shows the hologram transfer foil of this embodiment. It is a figure which shows the heat seal layer of this embodiment. It is a figure which shows the example of a transfer using the hologram transfer foil of this embodiment. It is a figure which shows the manufacturing method of the hologram transfer foil of this embodiment. It is a figure which shows the manufacturing method of the hologram transfer foil of this embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a schematic sectional view showing an embodiment of the hologram transfer foil of the present invention. In FIG. 1, the hologram transfer foil includes a base film 2, a release layer 3 disposed on one side of the base film 2, and an offset layer 4 disposed on the opposite side of the release layer 3 from the base film 2. A hologram layer 5 having a hologram relief pattern disposed on the opposite side of the offset layer 4 from the release layer 3, a vapor deposition layer 6 disposed on the opposite side of the hologram layer 5 from the offset layer 4, and a substrate A timing mark 7 disposed on the other side of the film 2 and a heat seal layer 8 disposed on the opposite side of the vapor deposition layer 6 from the hologram layer 5 are provided.

  First, the base film 2 will be described.

  As the base film 2 constituting the hologram transfer foil 1 of the present invention, those having dimensional stability, heat resistance, toughness, etc. can be used. For example, polyethylene, ethylene-vinyl acetate copolymer, polyacetic acid Vinyl, polyvinylidene chloride, polyvinyl fluoride, polyvinylidene fluoride, polystyrene, polymethyl methacrylate, nylon (registered trademark), polynorbornene, polyamide, polyimide, polyether sulfone, polyether ether ketone, triacetyl cellulose, polyethylene terephthalate, poly Vinyl chloride, polypropylene, polycarbonate, cellophane, vinylon (registered trademark), acetate, polyvinyl alcohol, ethylene-vinyl alcohol copolymer, tetrafluoroethylene-perfluoroalkyl vinyl ether Coalescence, a resin film such as a polyamide-imide, paper such as condenser paper, it is possible to use these complexes, and the like. The thickness of the base film 2 can be appropriately set in consideration of the material to be used, and can be set, for example, in the range of about 6 to 50 μm. In particular, the range of about 16 to 25 μm is preferable.

  Next, the release layer 3 will be described.

  The release layer 3 constituting the hologram transfer foil 1 of the present invention is transferred to the transfer target and located on the outermost surface, and improves the peelability during transfer, the foil breakability, and the transferred hologram layer. It functions as a protective layer. In consideration of the use of a vinyl chloride cover or the like, it is preferable to disperse inorganic fine particles, finely powdered polyethylene wax or the like based on a hard and plasticizer-resistant acrylic resin or cellulose resin to make the film easily cut. The wax is preferably contained in a weight ratio of 10 to 20%.

  Examples of the release layer 3 include one or two of polymethacrylic ester resin, polyvinyl chloride resin, cellulose resin, silicone resin, chlorinated rubber, casein, various surfactants, metal oxides, and the like. A mixture of the above is used.

In particular, the release layer is preferably formed by appropriately selecting the material and the like so that the release force between the base film and the transfer layer is 1 to 5 g / inch (90 ° release). This release layer can be converted into an ink and formed on the surface of the substrate film by a known method such as coating, and the thickness is preferably in the range of 0.1 to 4 μm in consideration of the release force, foil breakage, and the like.
Moreover, the peeling layer 3 can also be made into the laminated structure which combined the 1st peeling layer and the 2nd peeling layer.

The coating amount of the release layer 3 is preferably ² to 2.5 g / m2. When the coating amount of the release layer 3 is less than ² g / m ² , it is difficult to peel off due to the attack of the offset layer 4. On the other hand, when the coating amount of the release layer 3 exceeds 2.5 g / m ² , the release layer 3 becomes thick and the foil breakage becomes worse.

  Next, the offset layer 4 will be described.

  The offset layer 4 is disposed between the release layer 3 and the hologram layer 5 and is formed so that the ink of the release layer 3 does not enter the hologram layer 5. For the offset layer 4, it is preferable to use an acrylic resin or a polyester resin containing a wax component. It is more preferable to use an isocyanic curable acrylic resin or polyester resin. The heat resistance of the offset layer 4 is preferably 180 ° C to 200 ° C.

The coating amount of the offset layer 4, 1 to 25 g / m ² is preferred. When the coating amount of the offset layer 4 is less than 1 g / m ² , it becomes difficult to prevent the ink of the release layer 3 from being mixed into the hologram layer 5. Moreover, when the coating amount of the offset layer 4 exceeds 25 g / m ² , the foil breakage becomes worse.

  Next, the hologram layer 5 will be described.

  The hologram in the hologram layer 5 constituting the hologram transfer foil 1 of the present invention is not limited to a three-dimensional image, but also includes an optical element in which a constant continuous pattern or a discontinuous pattern is formed, for example, an antireflection element called a diffraction grating or a moth eye. included. For example, the hologram layer 5 can be a relief type hologram layer.

  The hologram layer 5 is preferably made of an ultraviolet curable crosslinked resin. The resin preferably contains a cross-linking structure adjusting additive that adjusts the number of cross-links.

  When the hologram layer 5 is a relief type hologram, it is formed using a thermosetting resin, a thermoplastic resin, an ionizing radiation curable resin, etc. in order to form a fine concavo-convex pattern, and has a thickness of 0.1 to 20 μm. Preferably, it can set in the range of 0.5-10 micrometers. A range of about 1 to 2 μm is more preferable. In particular, in the case of ionizing radiation curable resin, 1.7 to 3.0 μm is preferable. In this case, if it is below the lower limit, it becomes the curing alienation limit of radiation curing, and if it exceeds the upper limit, the cutting property at the time of transfer may be deteriorated.

  Examples of thermosetting resins include unsaturated polyester resins, acrylic urethane resins, epoxy resins, urethane resins, epoxy-modified acrylic resins, epoxy-modified unsaturated polyester resins, alkyd resins, melamine resins, urea resins, phenol resins, and cellulose resins. Organic-inorganic hybrid resins containing metal alkoxide groups capable of sol-gel reaction with organic components, such as diallyl phthalate resin and polyacetal resin. Thermoplastic resins include acrylic resin, acrylamide resin, polystyrene resin, polyester resin, polyolefin, polyamide, polyimide, polyamideimide, polyurethane, nylon (registered trademark), polyvinyl acetate, polyvinyl alcohol, polyvinyl butyral, polycarbonate, silicone. Examples thereof include resins. These resins can be used alone or in combination of two or more kinds, and various isocyanate resins, metal soaps such as cobalt naphthenate and zinc naphthenate, peroxides such as methyl ethyl ketone peroxide, Thermal or ultraviolet curing agents such as benzophenone, acetophenone, anthraquinone, naphthoquinone, azobisisobutyronitrile, and diphenyl sulfide may be blended.

  In addition, as the ionizing radiation curable resin, a monomer, oligomer, polymer, or the like having an ethylenically unsaturated bond can be used. Examples of the monomer include 1,6-hexanediol, neopentyl glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and the like. . Examples of the oligomer include epoxy acrylate, urethane acrylate, and polyester acrylate. Examples of the polymer include urethane-modified acrylic resins and epoxy-modified acrylic resins. From the viewpoints of heat resistance and processability, urethane-modified acrylic resins as described in JP-A No. 2000-63459 are preferably used.

  Further, as the photocurable resin used for the hologram layer 5, photocurable resins as described in JP-A-61-98751, JP-A-63-23909, and JP-A-63-23910 are disclosed. Resins can be mentioned.

  Moreover, in order to form the uneven | corrugated pattern shape of a relief hologram correctly, polymers, such as a non-reactive acrylic resin, polyester resin, a urethane resin, an epoxy resin, can be added.

  Moreover, when utilizing photocationic polymerization, an epoxy group-containing monomer, oligomer, polymer, oxetane skeleton-containing compound, and vinyl ethers can be used.

  Further, when the ionizing radiation curable resin is cured by light such as ultraviolet rays, a photopolymerization initiator can be added. Depending on the resin, a radical photopolymerization initiator, a cationic photopolymerization initiator, or a combination thereof (hybrid type) can be selected.

  Examples of the photo radical polymerization initiator include benzoin compounds such as benzoin, benzoin methyl ether, and benzoin ethyl ether, anthraquinone compounds such as anthraquinone and methylanthraquinone, acetophenone, diethoxyacetophenone, benzophenone, hydroxyacetophenone, and 1-hydroxycyclohexyl. Examples include phenyl ketone compounds such as phenyl ketone, α-aminoacetophenone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, benzyldimethyl ketal, thioxanthone, acylphosphine oxide, Michler's ketone, and the like. be able to.

  As a photocationic polymerization initiator when using a compound capable of photocationic polymerization, aromatic diazonium salt, aromatic iodonium salt, aromatic sulfonium salt, aromatic phosphonium salt, mixed ligand metal salt, etc. should be used. Can do.

  In the case of so-called hybrid type materials that use both radical photopolymerization and cationic photopolymerization, each polymerization initiator can be mixed and used, and a fragrance that has the function of initiating polymerization of both with a single initiator. Group iodonium salts, aromatic sulfonium salts, and the like can be used.

  Furthermore, a release agent can be added to the hologram layer 5 in order to facilitate the formation of the concavo-convex pattern of the hologram. Examples of the release agent include known release agents and surfactants, for example, solid waxes such as polyethylene wax and amide wax, fluorine compounds, fluorine polymers, phosphate esters, silicone oils, and silicone resins.

  Moreover, in order to make the uneven shape of the relief accurate, or to impart hardness and heat resistance, inorganic oxide fine particles such as silica, titania and alumina, metal alkoxide, metal alkoxide oligomer and the like can be added.

  Furthermore, a polymerization inhibitor, an antioxidant, a sensitizer, an ultraviolet absorber, a stabilizer, a plasticizer, an antifoaming agent, and the like can be added to the hologram layer 5.

  In this embodiment, an embossed hologram and a hologram having diffraction grating pattern irregularities formed thereon are pressed on the hologram forming layer to form a replication embossed hologram and diffraction grating pattern replication hologram, and then UV curing is performed. Further, like the release layer 3, it is preferable to disperse inorganic fine particles, finely powdered polyethylene wax or the like. Furthermore, since the resin itself has a film break, it is preferable to add an oligomer. In addition, when the hologram layer is transferred, it is preferable to use a photoinitiator because it is easier to cut the film if the crosslink density is reduced to such an extent that the relief does not disappear due to heat or the luminance is not lowered. Furthermore, in order to adjust the crosslinking density, it is more preferable to appropriately adjust the UV irradiation time, irradiation intensity, and irradiation amount.

  In addition, as a hologram material, JP-A-2002-268523, JP-A-2000-272295, JP-A-3357013, JP-A-33557014, JP-A-2005-55473, JP-A-2001-329031 or special Reference may be made to the materials described in Japanese Unexamined Patent Publication No. 2005-115264.

  The vapor deposition layer 6 of the present embodiment uses a hologram effect thin film that combines with the hologram layer 5 to express a hologram and does not conceal the lower layer. The vapor deposition layer 6 is formed as a transparent reflection layer by performing easy adhesion treatment on the corona-treated hologram layer 5 and then forming a thin film having a thickness of 50 nm to 100 nm with TiO 2 or ZnS by a physical vapor deposition device. .

  In addition, regarding the material of the vapor deposition layer 6, it is good to refer to the material described in Japanese Patent Publication No. 5-87835. In particular, TiO2 that does not undergo oxidative degradation is preferable for high durability, but ZnS is preferable for low cost and high luminance.

  In addition, regarding the material of the vapor deposition layer 6, it is good to refer to the material described in Japanese Patent Publication No. 5-87835.

  Next, the timing mark 7 will be described.

  The timing mark 7 is a mark for stamping that is directly printed on the base film 2.

  Next, the heat seal layer 8 will be described.

  In the present embodiment, the heat seal layer 8 preferably uses a water-based ethylene-acrylic acid copolymer emulsion in order to improve low-temperature adhesion and facilitate adhesion to paper.

  As the heat seal layer 8, it is preferable to use a thermoplastic resin. Moreover, as a thermoplastic resin, the thermoplastic resin conventionally used as a heat seal agent can be used. For example, rubber systems such as polybutadiene, polyisoprene, polyisobutylene, styrene-butadiene rubber, styrene-isoprene rubber, polymethyl (meth) acrylic acid, polymethyl (meth) acrylate, poly (meth) acrylic acid, polyethyl (meth) acrylate, Acrylic resin systems such as polypropyl (meth) acrylate, polybutyl (meth) acrylate, poly (2-ethylhexyl) (meth) acrylate, polystyrene systems such as polystyrene and acrylic-styrene copolymers, and polyvinyl ether systems such as polyisobutyl ether , Polyolefins such as polyethylene, polypropylene, polybutene, etc., polyvinyl acetate, vinyl chloride-vinyl acetate, polyvinyl alcohol, polyvinylidene chloride, polyvinyl chloride, polyacrylamide, Li-methylolacrylamide, polyester, polyvinyl butyral, polyurethane, polycarbonate resins, silicone resins, acrylic - silicone resin, polyethylene oxide and the like can be used. Examples of the copolymer include copolymers of vinyl acetate and acrylic resin such as vinyl acetate-butyl (meth) acrylate and vinyl acetate-octyl (meth) acrylate, vinyl chloride-butyl (meth) acrylate, vinylidene chloride- Copolymers such as butyl (meth) acrylate, copolymers such as ethylene-butyl (meth) acrylate, ethylene-methyl (meth) acrylate, and the like can be used. Two or more of these resins may be used. From the viewpoint of softening temperature and adhesion, a copolymer of an olefin resin and an acrylic resin, such as ethylene- (meth) acrylic acid, ethylene-methyl (meth) acrylate, or a blend of an olefin resin and an acrylic resin is particularly preferable. .

  In the present invention, a known filler such as silica fine particles, alumina fine particles, colloidal fine particles and the like may be added to the heat seal layer 8 in order to improve the foil breakability. However, since these fine particles are not usually softened by heat during transfer, the content in the heat seal layer 8 is preferably 10% by weight or less from the viewpoint of low-temperature sealability.

  In addition, as shown in FIG. 2, it is preferable that a part of the first additive particles 6a protrude from the film by making the diameter of the first additive particles 6a larger than the coating thickness. For example, it is preferable that the thickness of the heat seal layer 8 is 7 to 9 μm, and a part of the first additive particles 6 a having a particle size larger than that is blended. As shown in FIG. 2, when heat is applied to the heat seal layer 8 from one surface, the second additive particles 6b made of silica or the like having a particle size smaller than the film thickness of the heat seal layer 8 Is polymerized in the opposite direction, and the third additive particles 6c made of wax or the like are polymerized in the direction of heat. By applying heat in this way, the heat seal layer 8 can be easily cut.

  Regarding the material of the heat seal layer 8, the materials described in Japanese Patent No. 3140820, Japanese Patent Laid-Open No. 4-185498, and Japanese Patent Laid-Open No. 9-39391 may be referred to.

  The hologram transfer foil of the present invention can be transferred by heating and pressurizing, and a transfer system such as a heat stamp type or a roll type can be used as the transfer device. Examples of the transfer object of the hologram transfer foil of the present invention include booklets, paper, synthetic paper, plastic, metal films and sheets, plastic plates, glass plates, and the like. Examples of the plastic include a vinyl chloride resin, an acrylic resin, a polystyrene resin, a polyester resin such as polyethylene terephthalate, and a polycarbonate resin. In addition, for the purpose of utilizing the design property of the hologram, a wrapping paper, a packaging film, a premium card, a magazine, a book, or the like may be used as a transfer target. Also, utilizing the fact that holograms are difficult to counterfeit, a medium for authenticity that requires high anti-counterfeiting properties, such as bank savings cards, passbooks, credit cards, identification cards, examination cards, passports, Bills, gift certificates, stock certificates, boarding tickets, air tickets, prepaid cards such as transportation and public telephones, and the like may be used as the transfer target. Or luxury watches, precious metals, jewelry, world-renowned luxury products that are said to be so-called brand goods, and products that are subject to counterfeiting, tags attached to them, music software, video software, computer software, game software, etc. Articles such as recording media on which these are recorded and cases thereof can also be cited as the transfer target. In addition, information can be recorded on the hologram layer as necessary.

  Further, as a transfer object of the hologram transfer foil of the present invention, an optical element having an optical function or controlling reflected light, such as a reflection plate, an antireflection plate, a polarizing plate, a light guide plate, etc. Examples thereof include members installed inside or on the surface of display windows of instruments, mobile phones and the like.

  The transfer of the hologram transfer foil of the present invention may be either a transfer to a part of the transfer object or a transfer to the entire surface. In the case of transfer to a part, transfer of a complicated pattern or character, etc. Transfer may be performed using a mold. Further, the hologram transfer body is configured by transferring the hologram transfer foil to the transfer target.

  FIG. 3 is a diagram showing a transfer example using the above-described hologram transfer foil 1 of the present invention. As shown in FIG. 3, the hologram transfer foil 1 of the present invention is placed on the transfer target 11 so that the heat seal layer 8 is in contact therewith, and thermocompression bonding is performed from the base film 2 side by a heat stamp 21 having a desired pattern. Then, heat sealing is performed, and then the base film 2 side is peeled off. At the time of peeling, the fine particles contained in the heat seal layer 8 cause a good foil breakage at the boundary between the heat-sealed part and the other part, and the peeling layer 3 in the area pressed by the heat stamp 21 and the hologram The layer 5, the vapor deposition layer 6, and the heat seal layer 8 are transferred to the transfer target 11. Moreover, in the area | region pressed with the heat stamp 21, since microparticles | fine-particles also soften and express sealing property, the adhesiveness of the heat seal layer 8 will become a very high thing.

  Next, a method for manufacturing a hologram transfer foil according to the present invention will be described using the hologram transfer foil 1 shown in FIG. 1 as an example. 4 and 5 are diagrams showing a method for manufacturing the hologram transfer foil of the present embodiment.

  In the production method of the present invention, the release layer 3 is formed on the base film 2, the offset layer 4 is formed on the release layer 3, and the resin layer that becomes the hologram layer 5 is formed on the offset layer 4. The step of forming a hologram relief pattern on the resin layer to form the hologram layer 5, the step of providing the vapor deposition layer 6 on the hologram relief pattern of the hologram layer 5, and the step of providing the heat seal layer 8 on the vapor deposition layer 6 And have. In addition, before the process of providing the vapor deposition layer 6 on the hologram relief pattern of the hologram layer 5, it is preferable to perform the process of silkscreen printing the timing mark 7 on the base film 2 and forming the backcoat layer 7 thereon. .

The release layer 3 formed on the base film 2 shown in FIG. 4 (a) as shown in FIG. 4 (b) is made of the material used for the release layer 3 as necessary with acetone, methyl ethyl ketone, cyclohexanone, A coating solution is prepared by mixing with a solvent such as benzene, toluene, xylene, ethyl acetate, methanol, ethanol, isopropanol, 1-butanol and the like. This coating solution is formed by a known coating method, for example, gravure coating method, roll coating method, curtain coating method, flow coating method, lip coating method, doctor blade coating method, comma coating method, die coating method, spin coating method, etc. The release layer 3 can be formed by coating on the film 2. In addition, after application | coating, if necessary, it dries at 50-180 degreeC, for example, volatilizes a solvent, and if necessary, it can dry again and the peeling layer 3 can be formed.
[Base film]
Polyethylene terephthalate film (hereinafter referred to as “PET film”)
(Lumilar 25T60C manufactured by Toray Industries, Inc.)

In the present embodiment, a coating solution made of the following materials was applied and dried at 100 ° C. for 20 seconds. In addition, you may put a hardening | curing agent in a coating liquid.
[Peeling layer]
CAP B20 100 parts by weight KT-11 100 parts by weight

Next, as shown in FIG. 4C, the offset layer 4 is formed on the release layer 3. The offset layer 4 of this embodiment was formed by applying an acrylic coating solution made of the following materials and drying at 100 ° C. for 20 seconds.
[Offset layer]
Haklinis 48wx6 100 parts by weight KT-11 100 parts by weight

  The hologram layer 5 is formed by first using the material used for the hologram layer 5 as necessary with acetone, methyl ethyl ketone, cyclohexanone, benzene, toluene, xylene, ethyl acetate, methanol, ethanol, isopropanol, 1-butanol. A coating solution is prepared by mixing with a solvent such as the above. This coating solution can be obtained by a known coating method such as gravure coating method, roll coating method, curtain coating method, flow coating method, lip coating method, doctor blade coating method, comma coating method, die coating method, spin coating method, etc. As shown in FIG. 4D, the resin layer is formed by applying on the offset layer 4. In addition, after application | coating, as needed, it can dry at 50-180 degreeC, for example, and a solvent is volatilized, If necessary, it can dry again and a resin layer can be formed.

  In the formation of the relief-type hologram layer 5, a hologram or diffraction grating produced using a laser beam or an electron beam is used as an original, and this original is brought into close contact with an uncured resin layer. The hologram layer 5 is formed by curing with ionizing radiation such as an electron beam or heat. Alternatively, a nickel stamper produced by electroforming using the above master as a mother mold, a stamper, a thermosetting resin, or a photocurable resin composition that has a concavo-convex pattern replicated by hot pressing using a thermoplastic resin. A resin stamper made by pouring into a concavo-convex pattern and curing is adhered to an uncured resin layer, and in that state, the resin layer is cured by ionizing radiation such as ultraviolet rays and electron beams, or by heat. Layer 5 is formed.

  In addition, after forming a solid resin layer at room temperature, the stamper prepared from the hologram master or the master is in close contact with the uncured resin layer (heat-adhered as necessary), and after peeling the master or stamper, The resin layer may be cured by ultraviolet rays, electron beams, heat, or the like to form the hologram layer 5.

  Further, in order to promote the refractive index modulation and complete the polymerization reaction, after the interference exposure, it is possible to appropriately perform a process such as full exposure with ultraviolet rays or heating.

  The hologram layer 5 of the present embodiment is first coated with a hologram forming coating solution and dried at 100 ° C. for 30 seconds to form a hologram forming layer with a thickness of 2 μm. The hologram-forming coating liquid comprises the following components.

[Hologram layer]
・ Photo curable resin (MHX405, manufactured by The Inktec Co., Ltd.)
Polyurethane acrylate 34% by weight
Photopolymerization initiator: 2% by weight
Solvent (Releasable silicone): 65% by weight

  Thereafter, the hologram having the embossed hologram and the diffraction grating pattern unevenness formed thereon is pressed on the hologram forming layer to form a replication embossed hologram and a diffraction grating pattern replication hologram.

The hologram replication will be described. First, a hologram master is produced using laser light, and this hologram master is mounted on an embossing roller of a continuous replication device. Next, the hologram layer base is installed on the paper feeding side of the continuous replication device, supplied to the embossing roller at a speed of 20 m / min, and pressed at a press pressure of 1 × 10 ⁵ Pa and a roll temperature of 140 ° C. Was formed in the resin layer. Subsequently, the resin layer is cured by irradiating ultraviolet rays generated from a high-pressure mercury lamp with a normal irradiation amount of ½, and a relief is formed to form the hologram layer 5.

  Next, as shown in FIG. 5A, a step of forming a vapor deposition layer 6 is performed.

  In the vapor deposition layer 6 of this embodiment, the vapor deposition layer 6 forms a thin film having a thickness of 50 nm to 100 nm with TiO 2 or ZnS by a physical vapor deposition device after performing an easy adhesion process on the hologram layer 5 subjected to the corona treatment. Thus, it is formed as a transparent reflective layer.

  In the step of providing the vapor deposition layer 6 on the relief pattern of the relief hologram layer 5, known methods such as vacuum vapor deposition, sputtering, reactive sputtering, ion plating, electroplating, and coating can be used.

  The vapor deposition layer 6 consists of the following components.

[Deposition layer]
ZnS and TiO2

  Here, as shown in FIG. 5B, the timing mark 7 is silk-screen printed on the base film 2.

[Timing mark]
-Black silk ink (JETE 1 black, manufactured by Seiko Advance Co., Ltd.)

  As shown in FIG.5 (c), in the process which provides the heat seal layer 8 on the vapor deposition layer 6 of this embodiment, the coating liquid containing the thermoplastic resin which has heat sealability, a hollow resin particle, water, and alcohol ( Emulsion is preferable) is applied on the vapor deposition layer 6, dried at 100 to 130 ° C., preferably 130 ° C. for 1 minute, and dried again as necessary to form the heat seal layer 8. The above-mentioned materials can be used for the thermoplastic resin and fine particles used.

[Heat seal layer]
・ Coating solution (THDHS-S (64) -15, Showa Ink Industries, Ltd.)

  When the hologram foil prepared in this embodiment was transferred to paper at 120 ° C. with a hologram transfer machine (Security Foiling Co., Ltd .: Micropoise PRO), it was transferred well with good foil breakage.

In addition, when forming the receiving layer which does not adhere directly to the vapor deposition layer 6, on the vapor deposition layer 6, an anchor layer having a thickness of 0.4 to 0.8 g / m ² is first made of colored OP nismedium, THF plummer, or silica. After that, it is preferable to form a receiving layer having a thickness of 2.5 to 4.0 g / m ² . The drying is preferably performed at 100 ° C. for 30 seconds.

  As mentioned above, although the hologram transfer foil of this invention has been demonstrated based on embodiment, this invention is not limited to these embodiment, A various deformation | transformation is possible.

DESCRIPTION OF SYMBOLS 1 ... Hologram transfer foil 2 ... Base film 3 ... Release layer 4 ... Offset layer 5 ... Hologram layer 6 ... Deposition layer 7 ... Timing mark 8 ... Heat seal layer

Claims (16)

A base film;
A release layer disposed on one of the substrate films;
A hologram layer disposed on the opposite side of the release layer from the substrate film and having formed a hologram relief pattern;
A heat seal layer disposed on the opposite side of the release layer with respect to the hologram layer;
An offset layer disposed between the release layer and the hologram layer;
A hologram transfer foil characterized by comprising:   The hologram transfer foil according to claim 1, wherein the offset layer contains a wax.   The hologram transfer foil according to claim 1, wherein the offset layer is made of an acrylic resin. The hologram transfer foil according to claim 3, wherein the offset layer is an isocyanic curable type. The hologram transfer foil according to claim 1, wherein the coating amount (g / m ² ) of the offset layer satisfies the following conditional expression.
1 <M <25
However, M is the coating amount (g / m ² ) of the offset layer. The heat seal layer is
The additive particles having a particle size larger than the thickness of the heat seal layer are used as the first additive particles
The hologram transfer foil according to any one of claims 1 to 5, further comprising second additive particles having a particle diameter smaller than the thickness of the heat seal layer. The hologram transfer foil according to claim 6, wherein the additive particles are made of silica. The hologram transfer foil according to claim 6 or 7, wherein the heat seal layer contains a wax. The hologram transfer foil according to any one of claims 1 to 8, wherein the hologram layer is made of a resin having an ultraviolet curable crosslinked structure. The hologram transfer foil according to claim 9, wherein the hologram layer includes a crosslinking structure adjusting additive that adjusts the number of crosslinks of the resin. The resin is made of polyurethane acrylate,
The hologram transfer foil according to claim 10, wherein the crosslinking structure adjusting additive comprises an oligomer. The hologram transfer foil according to claim 9, wherein the hologram layer includes a wax. The hologram transfer foil according to any one of claims 1 to 12, wherein the release layer is made of an acrylic resin in which wax is dispersed. The hologram transfer foil according to any one of claims 1 to 13, further comprising a vapor deposition layer having a refractive index different from that of the hologram layer between the hologram layer and the heat seal layer. The hologram transfer foil according to any one of claims 1 to 14,
A transfer object to which the hologram transfer foil is transferred;
A hologram transfer body comprising: The hologram transfer body according to claim 15, wherein the transfer object is a card, paper, or a booklet.

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