JP2010528286A5 - - Google Patents
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- Publication number
- JP2010528286A5 JP2010528286A5 JP2010509404A JP2010509404A JP2010528286A5 JP 2010528286 A5 JP2010528286 A5 JP 2010528286A5 JP 2010509404 A JP2010509404 A JP 2010509404A JP 2010509404 A JP2010509404 A JP 2010509404A JP 2010528286 A5 JP2010528286 A5 JP 2010528286A5
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- JP
- Japan
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/805,907 US20110073982A1 (en) | 2007-05-25 | 2007-05-25 | Inspection system using back side illuminated linear sensor |
| US11/805,907 | 2007-05-25 | ||
| PCT/US2008/006654 WO2008153770A2 (en) | 2007-05-25 | 2008-05-23 | Inspection system using back side illuminated linear sensor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010528286A JP2010528286A (ja) | 2010-08-19 |
| JP2010528286A5 true JP2010528286A5 (ja) | 2011-07-07 |
| JP5230730B2 JP5230730B2 (ja) | 2013-07-10 |
Family
ID=40130382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010509404A Active JP5230730B2 (ja) | 2007-05-25 | 2008-05-23 | 裏面照射型線形センサーを使用する検査システム |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20110073982A1 (ja) |
| JP (1) | JP5230730B2 (ja) |
| WO (1) | WO2008153770A2 (ja) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2316221A1 (en) * | 2008-08-28 | 2011-05-04 | MESA Imaging AG | Demodulation pixel with daisy chain charge storage sites and method of operation therefor |
| US9793673B2 (en) | 2011-06-13 | 2017-10-17 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
| US8873596B2 (en) | 2011-07-22 | 2014-10-28 | Kla-Tencor Corporation | Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal |
| US9250178B2 (en) | 2011-10-07 | 2016-02-02 | Kla-Tencor Corporation | Passivation of nonlinear optical crystals |
| US10197501B2 (en) | 2011-12-12 | 2019-02-05 | Kla-Tencor Corporation | Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors |
| US9496425B2 (en) | 2012-04-10 | 2016-11-15 | Kla-Tencor Corporation | Back-illuminated sensor with boron layer |
| US9601299B2 (en) | 2012-08-03 | 2017-03-21 | Kla-Tencor Corporation | Photocathode including silicon substrate with boron layer |
| US9151940B2 (en) | 2012-12-05 | 2015-10-06 | Kla-Tencor Corporation | Semiconductor inspection and metrology system using laser pulse multiplier |
| US8929406B2 (en) | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
| US9529182B2 (en) | 2013-02-13 | 2016-12-27 | KLA—Tencor Corporation | 193nm laser and inspection system |
| US9608399B2 (en) | 2013-03-18 | 2017-03-28 | Kla-Tencor Corporation | 193 nm laser and an inspection system using a 193 nm laser |
| US9478402B2 (en) | 2013-04-01 | 2016-10-25 | Kla-Tencor Corporation | Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor |
| US9347890B2 (en) | 2013-12-19 | 2016-05-24 | Kla-Tencor Corporation | Low-noise sensor and an inspection system using a low-noise sensor |
| US9748294B2 (en) | 2014-01-10 | 2017-08-29 | Hamamatsu Photonics K.K. | Anti-reflection layer for back-illuminated sensor |
| US9410901B2 (en) | 2014-03-17 | 2016-08-09 | Kla-Tencor Corporation | Image sensor, an inspection system and a method of inspecting an article |
| US9804101B2 (en) | 2014-03-20 | 2017-10-31 | Kla-Tencor Corporation | System and method for reducing the bandwidth of a laser and an inspection system and method using a laser |
| US9767986B2 (en) | 2014-08-29 | 2017-09-19 | Kla-Tencor Corporation | Scanning electron microscope and methods of inspecting and reviewing samples |
| US9419407B2 (en) | 2014-09-25 | 2016-08-16 | Kla-Tencor Corporation | Laser assembly and inspection system using monolithic bandwidth narrowing apparatus |
| US9748729B2 (en) | 2014-10-03 | 2017-08-29 | Kla-Tencor Corporation | 183NM laser and inspection system |
| US9860466B2 (en) * | 2015-05-14 | 2018-01-02 | Kla-Tencor Corporation | Sensor with electrically controllable aperture for inspection and metrology systems |
| US10748730B2 (en) | 2015-05-21 | 2020-08-18 | Kla-Tencor Corporation | Photocathode including field emitter array on a silicon substrate with boron layer |
| US10462391B2 (en) | 2015-08-14 | 2019-10-29 | Kla-Tencor Corporation | Dark-field inspection using a low-noise sensor |
| US10313622B2 (en) | 2016-04-06 | 2019-06-04 | Kla-Tencor Corporation | Dual-column-parallel CCD sensor and inspection systems using a sensor |
| US10778925B2 (en) | 2016-04-06 | 2020-09-15 | Kla-Tencor Corporation | Multiple column per channel CCD sensor architecture for inspection and metrology |
| US10175555B2 (en) | 2017-01-03 | 2019-01-08 | KLA—Tencor Corporation | 183 nm CW laser and inspection system |
| US11114489B2 (en) | 2018-06-18 | 2021-09-07 | Kla-Tencor Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
| US10943760B2 (en) | 2018-10-12 | 2021-03-09 | Kla Corporation | Electron gun and electron microscope |
| US11114491B2 (en) | 2018-12-12 | 2021-09-07 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor |
| US11848350B2 (en) | 2020-04-08 | 2023-12-19 | Kla Corporation | Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US245386A (en) * | 1881-08-09 | Ordnance on ships | ||
| US3796932A (en) * | 1971-06-28 | 1974-03-12 | Bell Telephone Labor Inc | Charge coupled devices employing nonuniform concentrations of immobile charge along the information channel |
| US3953733A (en) * | 1975-05-21 | 1976-04-27 | Rca Corporation | Method of operating imagers |
| FR2353957A1 (fr) * | 1976-06-04 | 1977-12-30 | Thomson Csf | Procede de fabrication d'un dispositif semi-conducteur a transfert de charge a deux phases, et dispositif obtenu par ce procede |
| FR2559957B1 (fr) * | 1984-02-21 | 1986-05-30 | Thomson Csf | Barrette multilineaire a transfert de charge |
| US4782394A (en) * | 1985-06-03 | 1988-11-01 | Canon Kabushiki Kaisha | Image pickup apparatus having saturation prevention control modes |
| US4975777A (en) * | 1989-06-15 | 1990-12-04 | Eastman Kodak Company | Charge-coupled imager with dual gate anti-blooming structure |
| US5840592A (en) * | 1993-12-21 | 1998-11-24 | The United States Of America As Represented By The Secretary Of The Navy | Method of improving the spectral response and dark current characteristics of an image gathering detector |
| JP3361378B2 (ja) * | 1994-03-02 | 2003-01-07 | 浜松ホトニクス株式会社 | 半導体デバイスの製造方法 |
| JP3019797B2 (ja) * | 1997-02-07 | 2000-03-13 | 日本電気株式会社 | 固体撮像素子とその製造方法 |
| US5965910A (en) * | 1997-04-29 | 1999-10-12 | Ohmeda Inc. | Large cell charge coupled device for spectroscopy |
| US6282309B1 (en) * | 1998-05-29 | 2001-08-28 | Kla-Tencor Corporation | Enhanced sensitivity automated photomask inspection system |
| US6621571B1 (en) * | 1999-10-29 | 2003-09-16 | Hitachi, Ltd. | Method and apparatus for inspecting defects in a patterned specimen |
| JP4009409B2 (ja) * | 1999-10-29 | 2007-11-14 | 株式会社日立製作所 | パターン欠陥検査方法及びその装置 |
| US20020190207A1 (en) * | 2000-09-20 | 2002-12-19 | Ady Levy | Methods and systems for determining a characteristic of micro defects on a specimen |
| US6836560B2 (en) * | 2000-11-13 | 2004-12-28 | Kla - Tencor Technologies Corporation | Advanced phase shift inspection method |
| US6922236B2 (en) * | 2001-07-10 | 2005-07-26 | Kla-Tencor Technologies Corp. | Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection |
| US20050029553A1 (en) * | 2003-08-04 | 2005-02-10 | Jaroslav Hynecek | Clocked barrier virtual phase charge coupled device image sensor |
| US7609309B2 (en) * | 2004-11-18 | 2009-10-27 | Kla-Tencor Technologies Corporation | Continuous clocking of TDI sensors |
| JP4394631B2 (ja) * | 2005-10-24 | 2010-01-06 | 株式会社日立製作所 | 欠陥検査方法およびその装置 |
-
2007
- 2007-05-25 US US11/805,907 patent/US20110073982A1/en not_active Abandoned
-
2008
- 2008-05-23 WO PCT/US2008/006654 patent/WO2008153770A2/en active Application Filing
- 2008-05-23 JP JP2010509404A patent/JP5230730B2/ja active Active