JP2010527011A5 - - Google Patents

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Publication number
JP2010527011A5
JP2010527011A5 JP2010507726A JP2010507726A JP2010527011A5 JP 2010527011 A5 JP2010527011 A5 JP 2010527011A5 JP 2010507726 A JP2010507726 A JP 2010507726A JP 2010507726 A JP2010507726 A JP 2010507726A JP 2010527011 A5 JP2010527011 A5 JP 2010527011A5
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Japan
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sample
probe
ultrasound
source
ultrasonic
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JP2010507726A
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Japanese (ja)
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JP2010527011A (ja
JP5695902B2 (ja
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Priority claimed from PCT/US2008/063462 external-priority patent/WO2008141301A1/en
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JP2010507726A 2007-05-10 2008-05-12 近接場ａｆｍ検出を用いたウェハスケールの非破壊的な表面下超音波顕微鏡法 Active JP5695902B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US91730107P 2007-05-10 2007-05-10
US60/917,301 2007-05-10
PCT/US2008/063462 WO2008141301A1 (en) 2007-05-10 2008-05-12 Non-destructive wafer-scale sub-surface ultrasonic microscopy employing near field afm detection

Publications (3)

Publication Number Publication Date
JP2010527011A JP2010527011A (ja) 2010-08-05
JP2010527011A5 true JP2010527011A5 (enExample) 2011-06-30
JP5695902B2 JP5695902B2 (ja) 2015-04-08

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JP2010507726A Active JP5695902B2 (ja) 2007-05-10 2008-05-12 近接場ａｆｍ検出を用いたウェハスケールの非破壊的な表面下超音波顕微鏡法

Country Status (4)

Country Link
US (1) US8322220B2 (enExample)
EP (1) EP2150973B1 (enExample)
JP (1) JP5695902B2 (enExample)
WO (1) WO2008141301A1 (enExample)

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FR3054667B1 (fr) * 2016-07-26 2020-07-10 Universite De Bourgogne Dispositif d'analyse volumetrique d'un echantillon organique ou inorganique
EP3291286A1 (en) * 2016-08-31 2018-03-07 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method of and system for performing defect detection on or characterization of a layer of a semiconductor element or semimanufactured semiconductor element
EP3290929A1 (en) * 2016-08-31 2018-03-07 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method for measuring damage of a substrate caused by an electron beam
US11815347B2 (en) * 2016-09-28 2023-11-14 Kla-Tencor Corporation Optical near-field metrology
EP3349017A1 (en) * 2017-01-13 2018-07-18 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Atomic force microscopy device, method and lithographic system
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EP3349002A1 (en) * 2017-01-13 2018-07-18 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method of and system for detecting structures on or below the surface of a sample using a probe including a cantilever and a probe tip
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EP3396390A1 (en) 2017-04-24 2018-10-31 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Subsurface atomic force microscopy with guided ultrasound waves
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EP3422104A1 (en) 2017-06-29 2019-01-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method, atomic force microscopy system and computer program product
EP3480603A1 (en) * 2017-11-03 2019-05-08 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Method of performing atomic force microscopy
CN111527438B (zh) 2017-11-30 2023-02-21 徕卡生物系统成像股份有限公司 冲击重新扫描系统
EP3644067A1 (en) * 2018-10-25 2020-04-29 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Frequency tracking for subsurface atomic force microscopy
EP3742178A1 (en) 2019-05-21 2020-11-25 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO Heterodyne scanning probe microscopy method and scanning probe microscopy system
EP3745125A1 (en) 2019-05-27 2020-12-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk Onderzoek TNO Ultrasound sub-surface probe microscopy device and corresponding method
US12091313B2 (en) 2019-08-26 2024-09-17 The Research Foundation For The State University Of New York Electrodynamically levitated actuator
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CN115363628B (zh) * 2022-09-02 2024-06-11 郑州人民医院(郑州人民医院医疗管理中心) 一种超声立体成像全向扫描设备
WO2024064306A2 (en) * 2022-09-21 2024-03-28 Geegah LLC Method to image wafers and chiplet systems using ultrasonic arrays
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