JP2010504648A5 - - Google Patents

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Publication number
JP2010504648A5
JP2010504648A5 JP2009529393A JP2009529393A JP2010504648A5 JP 2010504648 A5 JP2010504648 A5 JP 2010504648A5 JP 2009529393 A JP2009529393 A JP 2009529393A JP 2009529393 A JP2009529393 A JP 2009529393A JP 2010504648 A5 JP2010504648 A5 JP 2010504648A5
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JP
Japan
Prior art keywords
dielectric constant
low dielectric
constant film
organosilicon compound
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2009529393A
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English (en)
Japanese (ja)
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JP2010504648A (ja
JP5544167B2 (ja
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Publication date
Priority claimed from US11/533,505 external-priority patent/US7598183B2/en
Application filed filed Critical
Publication of JP2010504648A publication Critical patent/JP2010504648A/ja
Publication of JP2010504648A5 publication Critical patent/JP2010504648A5/ja
Application granted granted Critical
Publication of JP5544167B2 publication Critical patent/JP5544167B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009529393A 2006-09-20 2007-09-20 低ｋ誘電膜の二層キャッピング Expired - Fee Related JP5544167B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/533,505 2006-09-20
US11/533,505 US7598183B2 (en) 2006-09-20 2006-09-20 Bi-layer capping of low-K dielectric films
PCT/US2007/079020 WO2008036810A2 (en) 2006-09-20 2007-09-20 Bi-layer capping of low-k dielectric films

Publications (3)

Publication Number Publication Date
JP2010504648A JP2010504648A (ja) 2010-02-12
JP2010504648A5 true JP2010504648A5 (enrdf_load_stackoverflow) 2010-11-11
JP5544167B2 JP5544167B2 (ja) 2014-07-09

Family

ID=39189171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009529393A Expired - Fee Related JP5544167B2 (ja) 2006-09-20 2007-09-20 低ｋ誘電膜の二層キャッピング

Country Status (4)

Country Link
US (2) US7598183B2 (enrdf_load_stackoverflow)
JP (1) JP5544167B2 (enrdf_load_stackoverflow)
KR (1) KR101376969B1 (enrdf_load_stackoverflow)
WO (1) WO2008036810A2 (enrdf_load_stackoverflow)

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US20080188074A1 (en) * 2007-02-06 2008-08-07 I-I Chen Peeling-free porous capping material
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