JP2010278207A - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP2010278207A
JP2010278207A JP2009129011A JP2009129011A JP2010278207A JP 2010278207 A JP2010278207 A JP 2010278207A JP 2009129011 A JP2009129011 A JP 2009129011A JP 2009129011 A JP2009129011 A JP 2009129011A JP 2010278207 A JP2010278207 A JP 2010278207A
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JP
Japan
Prior art keywords
plate
processing apparatus
vacuum
plasma processing
space
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Pending
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JP2009129011A
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English (en)
Japanese (ja)
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JP2010278207A5 (enrdf_load_stackoverflow
Inventor
Kohei Sato
浩平 佐藤
Masashi Okiguchi
昌司 沖口
Shingo Kimura
伸吾 木村
Takashi Uemura
崇 植村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Hitachi High Tech Corp
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Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Priority to JP2009129011A priority Critical patent/JP2010278207A/ja
Publication of JP2010278207A publication Critical patent/JP2010278207A/ja
Publication of JP2010278207A5 publication Critical patent/JP2010278207A5/ja
Pending legal-status Critical Current

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JP2009129011A 2009-05-28 2009-05-28 プラズマ処理装置 Pending JP2010278207A (ja)

Priority Applications (1)

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JP2009129011A JP2010278207A (ja) 2009-05-28 2009-05-28 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009129011A JP2010278207A (ja) 2009-05-28 2009-05-28 プラズマ処理装置

Publications (2)

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JP2010278207A true JP2010278207A (ja) 2010-12-09
JP2010278207A5 JP2010278207A5 (enrdf_load_stackoverflow) 2012-07-12

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JP2009129011A Pending JP2010278207A (ja) 2009-05-28 2009-05-28 プラズマ処理装置

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JP (1) JP2010278207A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013204053A (ja) * 2012-03-27 2013-10-07 Ulvac Japan Ltd 成膜装置
CN112534552A (zh) * 2019-07-18 2021-03-19 株式会社日立高新技术 等离子处理装置
JP2022114542A (ja) * 2021-01-27 2022-08-08 株式会社日立ハイテク 真空処理装置
CN115483085A (zh) * 2022-10-17 2022-12-16 盛吉盛半导体科技(北京)有限公司 一种用于集成电路设备改善抽气均匀性的装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11345801A (ja) * 1998-05-29 1999-12-14 Shibaura Mechatronics Corp 真空処理装置
JP2000058294A (ja) * 1998-08-07 2000-02-25 Furontekku:Kk プラズマ処理装置
JP2003243365A (ja) * 2002-02-20 2003-08-29 Hitachi High-Technologies Corp プラズマエッチング方法
JP2004349375A (ja) * 2003-05-21 2004-12-09 Nec Kansai Ltd ドライエッチング装置のガス分散板
JP2008172044A (ja) * 2007-01-12 2008-07-24 Hitachi High-Technologies Corp 真空処理装置
JP2009111301A (ja) * 2007-11-01 2009-05-21 Hitachi High-Technologies Corp プラズマ処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11345801A (ja) * 1998-05-29 1999-12-14 Shibaura Mechatronics Corp 真空処理装置
JP2000058294A (ja) * 1998-08-07 2000-02-25 Furontekku:Kk プラズマ処理装置
JP2003243365A (ja) * 2002-02-20 2003-08-29 Hitachi High-Technologies Corp プラズマエッチング方法
JP2004349375A (ja) * 2003-05-21 2004-12-09 Nec Kansai Ltd ドライエッチング装置のガス分散板
JP2008172044A (ja) * 2007-01-12 2008-07-24 Hitachi High-Technologies Corp 真空処理装置
JP2009111301A (ja) * 2007-11-01 2009-05-21 Hitachi High-Technologies Corp プラズマ処理装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013204053A (ja) * 2012-03-27 2013-10-07 Ulvac Japan Ltd 成膜装置
CN112534552A (zh) * 2019-07-18 2021-03-19 株式会社日立高新技术 等离子处理装置
US20220415618A1 (en) * 2019-07-18 2022-12-29 Hitachi High-Tech Corporation Plasma processing apparatus
CN112534552B (zh) * 2019-07-18 2024-04-12 株式会社日立高新技术 等离子处理装置
US12014903B2 (en) * 2019-07-18 2024-06-18 Hitachi High-Tech Corporation Plasma processing apparatus
JP2022114542A (ja) * 2021-01-27 2022-08-08 株式会社日立ハイテク 真空処理装置
JP7644606B2 (ja) 2021-01-27 2025-03-12 株式会社日立ハイテク 真空処理装置
CN115483085A (zh) * 2022-10-17 2022-12-16 盛吉盛半导体科技(北京)有限公司 一种用于集成电路设备改善抽气均匀性的装置

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