JP2010272515A - Organic electroluminescence display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic electroluminescent display device with high light extraction efficiency, as well as, less image blurs. <P>SOLUTION: The organic electroluminescent device is provided with a pair of electrode layers; an organic compound layer arranged between the electrode layers and containing a light-emitting layer; a light-transmitting layer transmitting light emitted from light-emitting layer; and a light control layer controlling the light path of the above light, as well as, a plurality of organic electroluminescent display parts structured as pixels containing either sub pixels out of red, green and blue sub pixels, with the electrode layer being located on a side opposite to a light-extracting surface relieving the load of reflecting light. If the shortest distance between the adjacent sub pixels of the same color from among the sub pixels is 2R, and the total thickness of the organic compound layer, the electrode layer at the light-extracting surface side and the light control layer is t, formula: 9≤2R/t is satisfied. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an organic electroluminescence display device having high light extraction efficiency and less image blur.

  An organic electroluminescence (EL) display device (organic electroluminescence display device) is a self-luminous display device, and is used for displays and illumination. Organic electroluminescent displays have advantages in display performance such as higher visibility than conventional CRTs and LCDs and no viewing angle dependency. There is also an advantage that the display can be reduced in weight and thickness. In addition to the advantages of reducing the weight and the thickness of organic electroluminescent lighting, there is a possibility of realizing lighting in a shape that could not be realized so far by using a flexible substrate.

As described above, the organic light emitting display device has excellent characteristics, but generally the refractive index of each layer constituting the display device including the light emitting layer is higher than that of air. For example, in an organic light emitting display device, the refractive index of an organic thin film layer such as a light emitting layer is 1.6 to 2.1. For this reason, the emitted light is easily totally reflected at the interface, and the light extraction efficiency is less than 20%, and most of the light is lost.
For example, conventionally, an organic electroluminescent display unit in a generally known organic electroluminescent display device includes an organic compound layer disposed between a pair of electrode layers on a substrate. The organic compound layer includes a light emitting layer, and the organic light emitting display device emits light emitted from the light emitting layer from the light extraction surface side. In this case, there is a problem that the light extraction efficiency is low because the total reflection component that is light having a critical angle or more cannot be extracted at the light extraction surface or the interface between the electrode layer and the organic compound layer.

Therefore, in order to improve the light extraction efficiency, a light control layer that controls the optical path of the light emitted from the light emitting layer and emits the light emitted from the light emitting layer from the light extraction surface side is provided with a light Organic electroluminescence display devices arranged on the road have been proposed.
However, in this case, although the light extraction efficiency is improved, the emitted light spreads more radially than the desired emission direction due to the waveguide component existing in the light emitting layer, the light control layer, and the substrate. There is a problem that crosstalk (mutual interference) due to image blur occurs between the light guided in the direction and emitted from the adjacent light emitting display unit (pixel).

Therefore, an organic electroluminescence display device in which a light transmission layer is disposed on the optical path has been proposed in order to suppress blurring of the image. This light transmission layer is formed of a material having a low refractive index, guides the light emitted from the light emitting layer in a desired direction, and suppresses the spread of light due to the waveguide component existing on the optical path of the guided light. Can do.
For example, a first electrode, a second electrode, and a light emitting layer disposed between the first electrode and the second electrode, and a part of light emitted from the light emitting layer is used as emitted light. In the light emitting element to be extracted, a low refractive index having a refractive index lower than an average refractive index of the first electrode, the light extraction layer for extracting the emitted radiation, the light emitting layer, and the light extraction layer in the direction in which the emitted light is extracted An organic light emitting display device including a light emitting element in which an index layer is arranged has been proposed (see Patent Document 1).
In addition, the first electrode, the second electrode, a pixel layer that is interposed between the first electrode and the second electrode and includes at least a light-emitting layer, and purified light is extracted from the pixel layer An organic electroluminescent element including a transparent member positioned in a direction in which the transparent member is provided, and a diffraction grating is provided between the pixel layer and the transparent member, and the transparent member is disposed between the diffraction grating and the transparent member. There has been proposed an organic light emitting display device including an organic light emitting element including a low refractive index layer made of a material having a refractive index lower than that of the material forming the above (see Patent Document 2).
However, these organic electroluminescent display devices cannot suppress the spread of light because the light guided inside the light emitting layer and the light extraction layer is emitted to the outside. (Interference) occurs.
Accordingly, there is currently no satisfactory organic electroluminescence display device that achieves both improvement in light extraction efficiency and suppression of image bleeding.

JP 2005-251488 A JP 2006-108093 A

  An object of the present invention is to solve the above-described problems and achieve the following objects. That is, an object of the present invention is to provide an organic electroluminescence display device having high light extraction efficiency and less image blur.

In order to solve the above-mentioned problems, the present inventors have intensively studied and obtained the following knowledge.
The present inventors paid attention to the relationship between the distance between adjacent pixels and the thickness of the layer constituting the organic electroluminescent display unit as a measure for eliminating image bleeding while maintaining high light extraction efficiency. It has been found that the above-mentioned problem can be solved by restricting the above relationship to a certain condition.
That is, as shown in FIG. 8, the ratio 2R / t between the distance 2R between adjacent pixels and the thickness t of the layer changes in the direction of exponential logarithmically decreasing the image blur and is defined as a certain condition. In this case, it was found that the blurring of the image can be suppressed to almost zero.

The present invention is based on the above findings of the present inventors, and means for solving the above problems are as follows. That is,
<1> In a plane, a pair of electrode layers, an organic compound layer disposed between the electrode layers and including a light emitting layer, a light transmitting layer that transmits light emitted from the light emitting layer, and an optical path of the light A light control layer, and a plurality of organic electroluminescence display units configured as pixels including at least one of a red subpixel, a green subpixel, and a blue subpixel, and the light extraction surface side In the organic electroluminescence device in which the electrode on the opposite side is responsible for the reflection of the light,
Among the subpixels, the shortest distance between adjacent subpixels of the same color is 2R, and the total thickness of the organic compound layer, the electrode layer on the light extraction surface side, and the light control layer is t. In some cases, the organic electroluminescent display device satisfies the following formula: 9 ≦ 2R / t.
<2> In a plane, a pair of electrode layers, an organic compound layer disposed between the electrode layers and including a light emitting layer, a light transmitting layer that transmits light emitted from the light emitting layer, and an optical path of the light An organic light emitting display having a light control layer for controlling and a reflective layer for reflecting the light and configured as a pixel including at least one of a red subpixel, a green subpixel, and a blue subpixel The electrode layer on the side opposite to the light extraction surface side is responsible for transmission of the light, and the reflection layer is the electrode layer on the opposite side to the light extraction surface side. In the organic electroluminescent element formed on the opposite side,
Among the sub-pixels, the shortest distance between adjacent sub-pixels of the same color is 2R, the organic compound layer, the electrode layer on the light extraction surface side, and the electrode layer on the opposite side of the light extraction surface side An organic light emitting display device satisfying the following formula: 9 ≦ 2R / t, where t is the total thickness with the light control layer.
<3> The organic electroluminescent display according to any one of <1> to <2>, wherein a refractive index with respect to light in a visible wavelength region emitted from the light emitting layer of the light transmitting layer is 1.0 to 1.5. Device.
<4> The organic electroluminescence display device according to any one of <1> to <3>, wherein the light control layer includes a fine particle-containing layer.
<5> The <4>, wherein the fine particle-containing layer includes at least fine particles and a matrix agent, and a refractive index N with respect to light in a visible wavelength region emitted from the light emitting layer of the matrix agent is 1.5 <N. It is an organic electroluminescent display apparatus of description.
<6> The organic electroluminescence display device according to <5>, wherein the refractive index N is 1.65 <N.
<7> The organic electroluminescence display device according to any one of <1> to <6>, wherein the light control layer includes an uneven layer.
<8> The light transmission layer, the light control layer, and the light emitting layer are arranged in this order from the light extraction surface side, and the light transmission layer and the light control layer are adjacent to each other from <1> to <7> The organic electroluminescence display device according to any one of 7).
<9> The light transmissive layer, the light control layer, and the light emitting layer are disposed in this order from the light extraction surface side, and the light transmissive layer and the light control layer are further separated from each other. The organic electroluminescent display device according to any one of <1> to <7>.
<10> The organic electroluminescence display device according to any one of <1> to <7>, wherein the light transmission layer, the light emitting layer, and the light control layer are arranged in this order from the light extraction surface side. .
<11> The organic electroluminescence display device according to any one of <1> to <10>, wherein the light transmission layer includes at least one of a fluoride-based material, an alkoxysilane, an airgel, and air.

  According to the present invention, conventional problems can be solved, and the present invention can provide an organic light emitting display device having high light extraction efficiency and less image blur.

FIG. 1 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 100 according to an embodiment of the present invention. FIG. 2 is a partial cross-sectional view showing a layer structure of an organic light emitting display device 200 according to another embodiment of the present invention. FIG. 3 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 300 according to another embodiment of the present invention. FIG. 4 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 400 according to another embodiment of the present invention. FIG. 5 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 500 according to another embodiment of the present invention. FIG. 6 is a schematic view of the organic light emitting display device of the present invention as viewed from the top. FIG. 7 is a diagram schematically illustrating a method of measuring blurring in an organic light emitting display device in Examples and Comparative Examples. FIG. 8 is a graph showing the relationship between the image blur, the ratio 2R / t between adjacent pixels, and the ratio 2R / t of the thickness t of the layer constituting the organic electroluminescence display unit.

(Organic light emitting display)
The organic electroluminescent display device of the present invention includes a plurality of organic electroluminescent display units in a plane.

<Organic electroluminescence display>
The organic light emitting display unit has a pair of electrode layers, an organic compound layer, a light transmission layer, and a light control layer, and includes a red subpixel, a green subpixel, and a blue subpixel. It is configured as a pixel including at least one of the sub-pixels, and further includes other layers as necessary. At this time, of the pair of electrode layers, the electrode layer opposite to the light extraction surface side is responsible for reflection. Here, “responsible for reflection” means to have a function of repeatedly using light by reflecting light, and the light extraction surface side of the electrode layer opposite to the light extraction surface side. It means that there is no layer on the opposite side (back side of the electrode layer opposite to the light extraction surface side) that bears the optical path of light emitted from the light emitting layer of the organic compound layer described later.
In addition, the organic electroluminescence display unit secondly includes a pair of electrode layers, an organic compound layer, a light transmission layer, a light control layer, and a reflection layer, and includes a red subpixel and a green subpixel. , And a blue pixel including at least one of the sub-pixels, and further includes other layers as necessary. At this time, of the pair of electrode layers, the electrode layer on the side opposite to the light extraction surface side is responsible for transmission, and the reflection layer is in the electrode layer on the side opposite to the light extraction surface side. It is formed on the side opposite to the side. Here, “the electrode layer on the side opposite to the light extraction surface in the pair of electrode layers is responsible for transmission” means that light emitted from the light emitting layer emitted from the light emitting layer of the organic compound layer described later is transmitted. The light emitting layer emits light on the electrode layer opposite to the light extraction surface side opposite to the light extraction surface side (the back side of the electrode layer opposite to the light extraction surface side). It means that there is a layer that carries the optical path of light.

-A pair of electrode layers-
The pair of electrode layers includes an anode and a cathode, and is configured as a layer that emits light from a light emitting layer included in the organic compound layer by applying positive and negative voltages to the organic compound layer.
In the organic electroluminescence display device, at least the electrode layer disposed on the light extraction surface side may be configured as a transparent electrode layer, and the electrode layer opposite to the light extraction surface side may be a transparent electrode layer. The transparent electrode layer may not be used. The transparent electrode layer disposed on the light extraction surface side may be either the anode or the cathode.
Here, the “transparent electrode layer on the light extraction surface side” means that an optical path of light emitted from the light emitting layer exists at least in a region opposite to the light emitting layer with respect to the electrode layer on the light extraction side. This means that semi-transparent electrodes (semi-transmissive electrodes) are also included in the range. As the semi-transmissive electrode, an Ag film formed with an extremely thin thickness is preferably used.

Although there is no restriction | limiting in particular as the refractive index of the light in the said transparent electrode layer, 1.5 or more are preferable and 1.8 or more are more preferable.
When the refractive index of the light emitting layer of a general organic electroluminescent element is 1.8 or more, high-angle guided light inside the light emitting layer can be taken out to the electrode. If the refractive index of the light-emitting layer of the element is less than 1.8, the high-angle component of light inside the light-emitting layer is totally reflected between the light-emitting layer and the electrode layer, and thus cannot be taken out to the outside. Ingredients may be present.
In the present specification, the refractive index of light indicates the refractive index of light with respect to light in the visible wavelength region of light emitted from a light emitting layer described later. The visible wavelength region is 380 nm to 800 nm.

  The thickness of the transparent electrode layer can be appropriately selected according to the electrode to be applied, and the thicknesses of the anode and cathode described later are preferable.

--- Anode--
The anode usually has a function as an electrode for supplying holes to the organic compound layer, and there is no particular limitation on the shape, structure, size, etc. Accordingly, it can be appropriately selected from known electrode materials. The anode is usually provided as a transparent anode.

  Suitable examples of the material for the anode include metals, alloys, metal oxides, conductive compounds, and mixtures thereof. Specific examples of the anode material include conductive metals such as tin oxide doped with antimony and fluorine (ATO, FTO), tin oxide, zinc oxide, indium oxide, indium tin oxide (ITO), and indium zinc oxide (IZO). Metals such as oxides, gold, silver, chromium, nickel, and mixtures or laminates of these metals and conductive metal oxides, inorganic conductive materials such as copper iodide and copper sulfide, polyaniline, polythiophene, polypyrrole, etc. Organic conductive materials, and a laminate of these and ITO. Among these, conductive metal oxides are preferable, and ITO is particularly preferable in terms of productivity, high conductivity, transparency, and the like.

  Examples of the anode include a printing method, a wet method such as a coating method, a physical method such as a vacuum deposition method, a sputtering method, and an ion plating method, and a chemical method such as a CVD method and a plasma CVD method. It can be formed on the substrate in accordance with a method appropriately selected in consideration of suitability with the constituent material. For example, when ITO is selected as the anode material, the anode can be formed according to a direct current or high frequency sputtering method, a vacuum deposition method, an ion plating method, or the like.

  The anode is preferably formed on the support substrate. In this case, the anode may be formed on the entire one surface of the support substrate, or may be formed on a part thereof.

  The patterning for forming the anode may be performed by chemical etching such as photolithography, or may be performed by physical etching using a laser or the like, or vacuum deposition or sputtering by overlapping a mask. It may be performed by a lift-off method or a printing method.

  The thickness of the anode can be appropriately selected depending on the material constituting the anode and cannot be generally defined, but is usually about 10 nm to 50 μm, and preferably 50 nm to 20 μm.

The resistance value of the anode is preferably 10 ³ Ω / □ or less, and more preferably 10 ² Ω / □ or less. When the anode is transparent, it may be colorless and transparent or colored and transparent. In order to extract light emission from the transparent anode side, the transmittance is preferably 60% or more, and more preferably 70% or more.

  The transparent anode is described in detail in Yutaka Sawada's “New Development of Transparent Conductive Film” published by CMC (1999), and the matters described here can be applied to the present invention. In the case of using a plastic substrate having low heat resistance, a transparent anode formed using ITO or IZO at a low temperature of 150 ° C. or lower is preferable.

--- Cathode--
The cathode usually has a function as an electrode for injecting electrons into the organic compound layer, and there is no particular limitation on the shape, structure, size, etc., depending on the use and purpose of the light emitting device. , Can be appropriately selected from known electrode materials.

  Examples of the material constituting the cathode include metals, alloys, metal oxides, electrically conductive compounds, and mixtures thereof. Specific examples include alkali metals (eg, Li, Na, K, Cs, etc.), alkaline earth metals (eg, Mg, Ca, etc.), gold, silver, lead, aluminum, sodium-potassium alloys, lithium-aluminum alloys, magnesium. -Rare earth metals such as silver alloys, indium and ytterbium. These may be used alone, but two or more can be suitably used in combination from the viewpoint of achieving both stability and electron injection.

Among these, the material constituting the cathode is preferably an alkali metal or an alkaline earth metal from the viewpoint of electron injecting property, and a material mainly composed of aluminum is preferable from the viewpoint of excellent storage stability.
The material mainly composed of aluminum is aluminum alone, an alloy of aluminum and 0.01% by mass to 10% by mass of alkali metal or alkaline earth metal, or a mixture thereof (for example, lithium-aluminum alloy, magnesium-aluminum). Alloy).

  The materials for the cathode are described in detail in JP-A-2-15595 and JP-A-5-121172, and the materials described in these publications can also be applied to the present invention.

  There is no restriction | limiting in particular about the formation method of the said cathode, According to a well-known method, it can carry out. For example, the cathode described above is configured from a wet method such as a printing method or a coating method, a physical method such as a vacuum deposition method, a sputtering method, or an ion plating method, or a chemical method such as CVD or plasma CVD method. It can be formed according to a method appropriately selected in consideration of suitability with the material. For example, when a metal or the like is selected as the cathode material, one or more of them can be simultaneously or sequentially performed according to a sputtering method or the like.

  The patterning for forming the cathode may be performed by chemical etching such as photolithography, or may be performed by physical etching using a laser or the like, and may be performed by vacuum deposition or sputtering with a mask overlapped. Alternatively, it may be performed by a lift-off method or a printing method.

The cathode forming position is preferably on the organic compound layer. In this case, the cathode may be formed on the entire organic compound layer or a part thereof.
In addition, a dielectric layer made of an alkali metal or alkaline earth metal fluoride or oxide may be inserted between the cathode and the organic compound layer with a thickness of 0.1 nm to 5 nm. This dielectric layer can also be regarded as a kind of electron injection layer. The dielectric layer can be formed by, for example, a vacuum deposition method, a sputtering method, an ion plating method, or the like.

The thickness of the cathode can be appropriately selected depending on the material constituting the cathode and cannot be generally defined, but is usually about 10 nm to 5 μm, and preferably 50 nm to 1 μm.
The cathode may be transparent or opaque. The transparent cathode can be formed by depositing a thin cathode material to a thickness of 1 nm to 10 nm and further laminating a transparent conductive material such as ITO or IZO.

-Organic compound layer-
The organic compound layer is disposed between the pair of electrode layers and configured as a layer including at least a light emitting layer. Furthermore, it is configured to include each layer such as a hole transport layer, an electron transport layer, a charge blocking layer, a hole injection layer, and an electron injection layer as a layer other than the light emitting layer as necessary.

  The method for forming each layer constituting the organic compound layer is not particularly limited, and examples thereof include dry film forming methods such as vapor deposition and sputtering, wet coating methods, transfer methods, printing methods, and ink jet methods.

  Moreover, there is no restriction | limiting in particular as thickness of the said organic compound layer, For example, 2 nm-500 nm are preferable, and 2 nm-300 nm are more preferable from a viewpoint of light extraction efficiency improvement.

  Specific contents of the light emitting layer, the hole transport layer, the electron transport layer, the charge blocking layer, the hole injection layer, the electron injection layer, and the like, and the driving method of the organic light emitting display device constituted by these, However, there is no particular limitation, and it can be appropriately selected according to the purpose. For example, the contents described in JP 2009-016184 A, JP 2009-016579 A, JP 2009-031750 A, etc. are applied. be able to.

-Pixel
As described above, the organic light emitting display unit is configured as a pixel including at least one of a red subpixel, a green subpixel, and a blue subpixel.
As a configuration of such a pixel, for example, as described in “Monthly Display”, September 2000, pages 33 to 37, the light emitting layer in the organic compound layer corresponds to red, green, and blue. A known structure such as a three-color light emitting method in which sub-pixels are formed as light-emitting layers that respectively emit light and at least one of the red sub-pixel, the green sub-pixel, and the blue sub-pixel is arranged. Can be applied.

-Light transmission layer-
The light transmission layer is a layer that transmits light emitted from the light emitting layer and is made of a low refractive material.
That is, the refractive index of light of the light transmission layer is, for example, preferably 1.0 to 1.5, more preferably 1.0 to 1.4, and particularly preferably 1.0 to 1.1.
If the refractive index exceeds 1.5, the refractive index becomes larger than that of the substrate glass, and the waveguide component in the glass cannot be reduced, which may lead to the occurrence of bleeding.

Moreover, there is no restriction | limiting in particular as thickness of the said light transmissive layer, For example, 50 nm or more is preferable, 100 nm or more is more preferable, 200 nm or more is especially preferable.
In the case of a very thin film of less than 50 nm, the evanescent light oozes out strongly and the total reflection angle component may be guided to the substrate side.

Such a light transmission layer is not particularly limited, but is preferably a layer composed of, for example, a fluoride-based material, alkoxysilane, airgel, air, or the like.
The method for forming the light transmitting layer can be appropriately selected depending on the constituent materials, and examples thereof include vapor deposition methods such as PVD, CVD, and spin coating.
The fluoride material is not particularly limited, but magnesium fluoride, sodium fluoride, calcium fluoride, lanthanum fluoride, lithium fluoride and the like are preferable from the viewpoint of obtaining a low refractive index layer.
Moreover, there is no restriction | limiting in particular as said airgel, However, From a viewpoint of obtaining a low-refractive-index layer, a silica airgel etc. are preferable.

-Light control layer-
The light control layer is configured as a layer that controls an optical path of light emitted from the light emitting layer, and has a function of changing the direction of light.
In this specification, the light control layer is a layer including at least one of a scattering layer, a diffraction grating layer, an uneven layer, a microlens layer, and a hologram.

  The refractive index of light of the light control layer is not particularly limited, but is preferably 1.5 or more, more preferably 1.6 or more, and particularly 1.8 or more from the viewpoint of approaching the refractive index of the light emitting layer. preferable.

The thickness of the light control layer is not particularly limited, but is preferably 100 μm or less, more preferably 10 μm or less, and particularly preferably 1 μm or less.
Although it depends on the inter-pixel spacing, the greater the thickness of the light control layer, the more likely blurring occurs.

  The light control layer is not particularly limited as long as it controls the optical path of the light. For example, a scattering layer, a laminate of the scattering layer and an optical waveguide forming layer, the scattering layer and a sealing layer And the like.

  The scattering layer is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include a fine particle-containing layer, a porous layer, a prism layer, and a material layer having a roughened surface.

The optical waveguide forming layer has a function of reducing the total reflection component inside the light emitting layer by bringing the refractive index and refractive index of the light emitting layer close to each other, and guiding a high angle light component inside the light emitting layer to the light control layer, Further, in the configuration in which the organic electroluminescent layer is formed on the optical waveguide forming layer, the unevenness of the upper portion of the light control layer is reduced and flattened, thereby reducing short-circuit between the electrodes of the organic electroluminescent device and improving the device performance. It is formed from an optical waveguide forming resin having a function to improve.
Although there is no restriction | limiting in particular as thickness of the said optical waveguide formation layer, 100 micrometers or less are preferable and 10 micrometers or less are more preferable.
Although there is no restriction | limiting in particular as the refractive index of the light of the said optical waveguide formation layer, 1.5 or more are preferable and 1.8 or more are more preferable.
The optical waveguide forming resin is not particularly limited, but is preferably a halogen-based resin, a chalcogen-based resin, a resin containing an aromatic ring in the structure, or a resin containing inorganic fine particles of 10 nm or less inside.

The sealing layer has a function of preventing the entry of gas such as water vapor or oxygen that causes deterioration of the organic electroluminescent device.
Although there is no restriction | limiting in particular as thickness of the said sealing layer, 100 nm or more and 10 micrometers are preferable, and 300 nm-10 micrometers are more preferable from a viewpoint of sealing performance.
Although there is no restriction | limiting in particular as the refractive index of the light of the said sealing layer, 1.5 or more are preferable and 1.7 or more are more preferable.
As a constituent material of the sealing layer, SiON, SiNx, ZnS, ZnSe, and the like are preferable.
There is no restriction | limiting in particular as a formation method of the said sealing layer, It can form by well-known CVD method etc.

--- Particle-containing layer--
The fine particle-containing layer is preferably configured as a layer containing at least a matrix agent and fine particles. The fine particles may be composed of first fine particles and second fine particles.
Although there is no restriction | limiting in particular as the refractive index of the light of the said fine particle content layer, 1.5 or more are preferable and 1.65 or more are more preferable.
The thickness of the fine particle-containing layer is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably less than 5 μm.
When the fine particle-containing layer has a thickness of 5 μm or more, a decrease in light utilization efficiency and image bleeding may be a problem during light emission divided into pixels.

--- Matrix agent ---
The matrix agent is based on an organic resin material, and the organic resin material is not particularly limited and can be appropriately selected according to the purpose. For example, an imide resin, an acrylic resin, Examples include ether resins and silane resins.
Although there is no restriction | limiting in particular as the refractive index N of the light of the said matrix agent, 1.5 <N is preferable and 1.65 <N is more preferable.

--- First fine particle ---
There is no restriction | limiting in particular as said 1st microparticles | fine-particles, According to the objective, it can select suitably, For example, a zinc oxide (refractive index: 1.9-2.0), an alumina (refractive index: about 1.7). ), Titanium oxide (TiO ₂ ) (refractive index: about 2.6), inorganic fine particles such as zirconia (ZrO ₂ ) (refractive index: about 2.3), melamine (refractive index: about 1.6), benzoguanamine ( Examples thereof include organic fine particles having a refractive index of about 1.65). Among these, zinc oxide, titanium oxide (TiO ₂ ), and zirconia (ZrO ₂ ) are preferable in that the effect can be expected even with a small refractive index and a small amount.

  The mass average particle diameter of the first fine particles is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably less than 50 nm. When the mass average particle diameter of the first fine particles is 50 nm or more, the refractive index n1 of the organic resin material to which the first fine particles are added is set to be the refractive index n2 of the light emitting layer in the organic electroluminescent display device. May not be close enough. The mass average particle diameter of the first fine particles is measured and calculated by observation with a transmission electron microscope (TEM).

The first fine particles are preferably dispersed (monodispersed) as primary particles in the fine particle-containing layer. When the first fine particles are dispersed as primary particles in the fine particle-containing layer, the light extraction efficiency can be further improved.
The method for dispersing the first fine particles as primary particles in the fine particle-containing layer is not particularly limited and may be appropriately selected depending on the purpose. For example, ultrasonic irradiation to the particle-containing solution, silane cup Examples thereof include surface treatment of fine particles with an organic substance such as a ring agent, addition of a fine particle dispersant described later, and physical pulverization after mixing the dispersant and particles.
Whether or not the first fine particles are dispersed as primary particles can be confirmed based on the particle size distribution measured by a particle size distribution meter. One measured particle size distribution peak indicates primary particle dispersion, and two or more measured particle size distribution peaks indicate secondary particle dispersion.

--- Second fine particle ---
There is no restriction | limiting in particular as said 2nd microparticles | fine-particles, According to the objective, it can select suitably, For example, a zinc oxide (refractive index: 1.9-2.0), an alumina (refractive index: about 1.7). ), Titanium oxide (TiO ₂ ) (refractive index: about 2.6), inorganic fine particles such as zirconia (ZrO ₂ ) (refractive index: about 2.3), melamine (refractive index: about 1.6), benzoguanamine ( Examples thereof include organic fine particles having a refractive index of about 1.65). Among these, zinc oxide (refractive index: 1.9 to 2.0), titanium oxide (TiO ₂ ) (refractive index: about 2.6), zirconia (ZrO ₂ ) (refractive index in terms of a high refractive index. : About 2.3) is preferred.

  The mass average particle diameter of the second fine particles is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 50 nm or more and 5 μm or less. When the mass average particle diameter of the second fine particles is less than 50 nm, a light scattering effect may not be sufficiently imparted to the fine particle-containing layer, and when it exceeds 5 μm, the surface flatness is deteriorated or the film thickness is increased. When light is emitted divided into pixels, there may be a problem of a decrease in light utilization efficiency or image blurring. The mass average particle diameter of the second fine particles is measured by observation with a transmission electron microscope (TEM).

The second fine particles are preferably dispersed (monodispersed) as primary particles in the fine particle-containing layer. When the second fine particles are dispersed as primary particles in the fine particle-containing layer, the light extraction efficiency can be further improved.
The method for dispersing the second fine particles as primary particles in the fine particle-containing layer is not particularly limited and may be appropriately selected depending on the purpose. For example, ultrasonic irradiation to the particle-containing solution, silane cup Examples include surface treatment of fine particles with an organic substance such as a ring agent, addition of a fine particle dispersant described later, and physical pulverization after mixing the dispersant and particles. Whether or not the second fine particles are dispersed as primary particles can be confirmed based on the particle size distribution measured by a particle size distribution meter. One measured particle size distribution peak indicates primary particle dispersion, and two or more measured particle size distribution peaks indicate secondary particle dispersion.

  As a specific method for forming the fine particle-containing layer, as an example, propylene glycol monomethyl ether acetate (PGMEA) and dipentaerythritol hexaacrylate (DPHA) were mixed at a mass ratio of 17: 3 (PGMEA: DPHA). There is a method in which fine particles such as titanium oxide are added to a DPHA solution (matrix agent solution), and this is applied by spin coating.

--- Uneven layer ---
The concavo-convex layer is not particularly limited as long as it includes a concavo-convex structure, but a layer configured so that the concavo-convex structure is planarized by a planarizing film is preferable.
By using the light control layer including the concavo-convex layer, the direction of light can be changed by scattering or diffracting light, and light that has not been conventionally extracted can be extracted outside.
There is no restriction | limiting in particular as thickness of the said uneven | corrugated layer, 100 nm-10 micrometers are preferable, and 300 nm-10 micrometers are more preferable.

There is no restriction | limiting in particular as a structure of the convex part in the said uneven | corrugated structure, It can be set as columnar shape, square shape, spherical shape, etc.
The concavo-convex structure may be formed aperiodically, but is preferably formed periodically.
Although there is no restriction | limiting in particular as a period (pitch space | interval) of the said uneven structure, 400 nm-5 micrometers are preferable.
There is no restriction | limiting in particular as the depth in the recessed part of the said uneven structure, 100 nm-5 micrometers are preferable, and 300 nm-5 micrometers are more preferable.
If the depth in the recess is less than 100 nm, it may be difficult to obtain a desired diffraction performance.

  There is no restriction | limiting in particular as a formation method of the said uneven structure, According to the objective, it can select suitably, For example, it can form by well-known lithography method, the etching method, and the imprint method.

The material for the planarizing film is not particularly limited, but a high refractive material is preferable.
The high refractive material is not particularly limited, but is SiON, SiNx, ZrO ₂ , TiO ₂ , ZnS, or a halogen-based resin, a chalcogen-based resin, a resin containing an aromatic ring in the structure, or 10 nm or less inside. A resin containing inorganic fine particles is preferable.
Although there is no restriction | limiting in particular as the refractive index of the light of the said high refractive material, 1.5 or more are preferable and 1.65 or more are more preferable.

--Microlens layer--
The microlens layer is configured as a layer in which a plurality of microlenses are arranged on a fixing agent.
When the light control layer includes the microlens layer, the direction of light can be changed depending on the lens shape.
The shape of the microlens is not particularly limited, such as a spherical shape, an elliptical shape, or a trapezoidal shape, and the arrangement is preferably a square lattice or a honeycomb shape.
Although there is no restriction | limiting in particular as thickness (lens height) of the said micro lens, 1 micrometer-500 micrometers are preferable, and 5 micrometers-500 micrometers are more preferable.
The fixing agent is not particularly limited as long as it can fix a microlens, and examples thereof include immersion oil.

  Although there is no restriction | limiting in particular as thickness of the said micro lens layer, 1 micrometer-500 micrometers are preferable and 5 micrometers-500 micrometers are more preferable.

-Reflective layer-
The reflection layer is a layer having a function of repeatedly using light by reflecting light. The reflective layer may also serve as an electrode.
In the pair of electrode layers, when the electrode layer on the light extraction surface side and the electrode layer on the opposite side to the light extraction surface side are both transparent electrode layers, the reflection layer is on the opposite side to the light extraction surface side. The electrode layer is formed on the side opposite to the light extraction surface side. The transparent electrode layer includes a translucent electrode layer.
There is no restriction | limiting in particular as a constituent material of the said reflection layer, Ag, Al, etc. are mentioned.

-Other layers-
There is no restriction | limiting in particular as said other layer, According to the objective, it can select suitably, For example, a board | substrate, a buffer layer, etc. are mentioned.

--- Board--
The substrate is not particularly limited and may be appropriately selected depending on the purpose, but is preferably a substrate that does not scatter or attenuate light emitted from the organic compound layer. Specific examples include yttria-stabilized zirconia (YSZ), inorganic materials such as glass, polyesters such as polyethylene terephthalate, polybutylene phthalate, and polyethylene naphthalate, polystyrene, polycarbonate, polyethersulfone, polyarylate, polyimide, and polycycloolefin. And organic materials such as norbornene resin and poly (chlorotrifluoroethylene).
For example, when glass is used as the substrate, alkali-free glass is preferably used as the material in order to reduce ions eluted from the glass. Moreover, when using soda-lime glass, it is preferable to use what gave barrier coatings, such as a silica. In the case of an organic material, it is preferable that it is excellent in heat resistance, dimensional stability, solvent resistance, electrical insulation, and workability.

  The shape, structure, size, and the like of the substrate are not particularly limited and can be appropriately selected depending on the use, purpose, and the like of the light emitting device. In general, the shape of the substrate is preferably a plate shape. The structure of the substrate may be a single layer structure, a laminated structure, may be formed of a single member, or may be formed of two or more members.

  The substrate may be colorless and transparent or colored and transparent, but is preferably colorless and transparent in that it does not scatter or attenuate light emitted from the organic light emitting layer.

The substrate may be provided with a moisture permeation preventing layer (gas barrier layer) on the front surface or the back surface.
As a material for the moisture permeation preventing layer (gas barrier layer), inorganic materials such as silicon nitride and silicon oxide are preferably used. The moisture permeation preventing layer (gas barrier layer) can be formed by, for example, a high frequency sputtering method.
When a thermoplastic substrate is used, a hard coat layer, an undercoat layer, or the like may be further provided as necessary.

--- Buffer layer--
The buffer layer is a layer having a function of improving the adhesion between the base layer of the buffer layer and the light control layer or preventing the light control layer constituent material from entering the light transmission layer, for example, the light transmission layer and , And preferably between the light control layer.
There is no restriction | limiting in particular as a constituent material of the said buffer layer, SiON, SiNx, etc. are mentioned.
The thickness of the buffer layer is preferably 10 nm or more, and more preferably 50 nm or more.

<Arrangement of organic electroluminescence display>
As described above, the organic light emitting display unit is configured as a pixel including at least one of a red subpixel, a green subpixel, and a blue subpixel. A plurality of organic electroluminescence display portions are provided in the plane.
In the organic light emitting display device, a shortest distance between adjacent subpixels of the same color among the subpixels is 2R, and a total thickness of the organic compound layer, the transparent electrode layer, and the light control layer is set. When t, it is configured to satisfy the relationship of the following formula, 9 ≦ 2R / t.
If the 2R / t is 9 or more, image blur can be reduced (see FIG. 8).
If the 2R / t is less than 9, image blurring becomes a problem.
Further, the 2R / t is preferably 15 or more, and more preferably 40 or more.
In the preferable numerical range, it is extremely excellent and blurring of an image can be reduced. That is, the organic compound layer, the transparent electrode layer, and the light control layer having a total thickness t are not interrupted between pixels (subpixels) in any one of these layers, This is a layer configured as one common layer. According to the present invention, it is possible to reduce blurring of an image based on light guiding in the layer shared by the pixels.

2R (the shortest distance between adjacent subpixels of the same color among subpixels) will be described with reference to the drawings.
FIG. 6 is a schematic view of the organic light emitting display device of the present invention as seen from above. The organic light emitting display device includes pixels 50a, 50b, 50c, and 50d in a plane.
The pixels 50a, 50b, 50c, and 50d have red (51R), green (51G), and blue (51B) subpixels, respectively.
At this time, when the sub-pixel 51R in the pixel 50a is used as a reference, the sub-pixel 51R in the pixel 50b is sub-pixel 51R in the pixel 50c and the sub-pixel 51R in the pixel 50d and the sub-pixel 51R in the pixel 50d. In order to form the shortest distance between sub-pixels of the same color, the distance between the sub-pixel 51R in the pixel 50a and the sub-pixel 51R in the pixel 50b is 2R.

The 2R distance can be measured by observation with a microscope or the like.
The thickness of the t can be measured by cross-sectional observation such as SEM.

  Note that the image blur (see FIG. 8) is placed under the microscope with the organic electroluminescence display portion turned on, and the luminescence image is captured by the CCD. The luminescence image indicates the luminance amount on the X line. It can be measured by taking several lines and performing data processing for averaging and graphing them (see FIG. 7).

  Hereinafter, embodiments of the organic light emitting display device of the present invention will be described with reference to the drawings. However, the idea of the present invention is not limited to these embodiments.

<< First Embodiment >>
FIG. 1 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 100 according to an embodiment of the present invention.
As shown in FIG. 1, the organic light emitting display 100 includes a transparent substrate 1, a light transmission layer 2, a scattering layer 3 (light control layer), a transparent electrode layer 4, and a light emitting layer from the light extraction surface side. 5 and the reflective electrode layer 6 are arranged in this order.
In the organic electroluminescent display device 100 having such a layer structure, light emitted from the light emitting layer is repeatedly used in the scattering layer 3 (light control layer), the transparent electrode layer 4 and the light emitting layer 5, and the scattering layer. Therefore, the light extraction efficiency can be improved.

<< Second Embodiment >>
FIG. 2 is a partial cross-sectional view showing a layer configuration of the organic light emitting display device 200 according to the embodiment of the present invention.
As shown in FIG. 2, the organic electroluminescence display device 200 includes a transparent substrate 1, a light transmission layer 2, a buffer layer 7, a scattering layer 3 (light control layer), and a transparent electrode layer from the light extraction surface side. 4, the light emitting layer 5, and the reflective electrode layer 6 are arranged in this order.
In the organic electroluminescent display device 200 having such a layer configuration, light emitted from the light emitting layer is repeatedly emitted from the buffer layer 7, the scattering layer 3 (light control layer), the transparent electrode layer 4, and the light emitting layer 5. Since it is used and is extracted to the outside by the scattering layer 3 (light control layer), the light extraction efficiency can be improved.

<< Third Embodiment >>
FIG. 3 is a partial cross-sectional view illustrating a layer configuration of the organic light emitting display 300 according to an embodiment of the present invention.
As shown in FIG. 3, the organic light emitting display device 300 includes a transparent substrate 1, a light transmission layer 2, a transparent electrode layer 4, a light emitting layer 5, a transparent electrode layer 4, and a scattering from the light extraction surface side. The layer 3 (light control layer) and the reflective layer 8 are arranged in this order.
In the organic light emitting display device 300 having such a layer structure, light emitted from the light emitting layer 5 is converted into the transparent electrode layer 4, the light emitting layer 5, the transparent electrode layer 4, and the scattering layer 3 (light control layer). The light extraction efficiency can be improved because it is repeatedly used and extracted to the outside by the scattering layer 3 (light control layer).

<< Fourth Embodiment >>
FIG. 4 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 400 according to an embodiment of the present invention.
As shown in FIG. 4, the organic light emitting display 400 has a light transmission layer 2, a transparent electrode layer 4, a light emitting layer 5, a transparent electrode layer 4, and a scattering layer 3 (light control) from the light extraction surface side. Layer), the reflective layer 8, and the substrate 9 are arranged in this order.
In the organic light emitting display 400 having such a layer structure, light emitted from the light emitting layer 5 is repeatedly used by the transparent electrode layer 4, the scattering layer 3 (light control layer), and the light emitting layer 5, and scattered. Since the light is extracted to the outside by the layer 3 (light control layer), the light extraction efficiency can be improved.

<< Fifth Embodiment >>
FIG. 5 is a partial cross-sectional view illustrating a layer configuration of an organic light emitting display 500 according to an embodiment of the present invention.
As shown in FIG. 5, the organic light emitting display 500 includes a light transmission layer 2, a scattering layer 3 (light control layer), a sealing layer 10 (light control layer), and a transparent electrode from the light extraction surface side. The layer 4, the light emitting layer 5, the reflective electrode layer 6, and the substrate 9 are arranged in this order.
In the organic electroluminescent display device 500 having such a layer structure, the light emitted from the light emitting layer 5 is converted into the scattering layer 3 (light control layer), the sealing layer 10 (light control layer), and the transparent electrode layer 4. In addition, since the light emitting layer 5 is repeatedly used and extracted to the outside by the scattering layer 3 (light control layer), the light extraction efficiency can be improved.

  EXAMPLES The present invention will be specifically described below with reference to examples of the present invention, but the present invention is not limited to these examples.

Example 1
-Preparation of dispersion 1-
DPHA solution in which propylene glycol monomethyl ether acetate (PGMEA: manufactured by Wako) and dipentaerythritol hexaacrylate (DPHA: n = 1.54, manufactured by Nippon Kayaku) are mixed at a mass ratio of 17: 3 (PGMEA: DPHA) Was prepared.
After adding 0.05 part by mass of titanium oxide (n = 2.6: manufactured by Ishihara Sangyo) having a mass average primary particle size of 300 nm and 0.005 part by mass of a dispersant solsperse 36000: to 1 part by mass of the DPHA solution, Dispersion 1 was prepared by ultrasonic dispersion.

-Manufacture of organic light emitting display devices-
Magnesium fluoride is deposited on a glass substrate by vapor deposition (n = 1.37, light transmission layer), and dispersion liquid 1 is applied by spin coating on the magnesium fluoride film and then dried at 200 ° C. To form a scattering layer (light control layer). The thickness of the scattering layer after drying was 0.8 μm.
On the scattering layer, a transparent electrode layer made of an ITO film (electrode layer on the light extraction surface side) of 0.25 μm, an organic compound layer of 0.35 μm, and a reflective electrode layer are formed in this order in a vacuum to form an organic electric field. A light emitting display portion was produced. The total thickness of the scattering layer (light control layer), the organic compound layer, and the ITO layer was 1.4 μm.
An organic electroluminescent display unit similar to the organic electroluminescent display unit was fabricated on a glass substrate so that the inter-pixel distance was 100 μm, and the organic electroluminescent display device in Example 1 was manufactured.
The inter-pixel distance (100 μm) corresponds to the shortest distance between adjacent sub-pixels of the same color, and the same applies to the following examples and comparative examples.
In addition, the layer configuration of the organic electroluminescence display unit in Example 1 is the layer configuration 1 including the substrate / light transmission layer / light control layer / transparent electrode layer / organic compound layer / reflection electrode layer from the light extraction surface side. (See FIG. 1).

(Example 2)
-Preparation of dispersion 2-
In the preparation of Dispersion 1, the addition amount of titanium oxide was changed from 0.05 part by mass to 0.017 part by mass, and the addition amount of dispersant solsperse 36000 was changed from 0.005 part by mass to 0.0017 part by mass. A dispersion 2 was prepared in the same manner as the preparation of the dispersion 1, except that.

-Manufacture of organic light emitting display devices-
In Example 1, the scattering layer (light control layer) was formed using the dispersion 2 instead of the dispersion 1, and the scattering layer was changed so that the thickness after drying was changed to 0.8 μm to 2.4 μm. As in Example 1, except that the total thickness of the scattering layer (light control layer), the organic compound layer, and the ITO layer was changed to 1.4 μm to 3.0 μm. Thus, an organic light emitting display in Example 2 was manufactured.

(Example 3)
-Preparation of dispersion 3-
In the preparation of Dispersion 1, the addition amount of titanium oxide was changed from 0.05 parts by mass to 0.004 parts by mass, and the addition amount of the dispersant solsperse 36000 was changed from 0.005 parts by mass to 0.0004 parts by mass. Except that, Dispersion 3 was prepared in the same manner as Dispersion 1.

-Manufacture of organic light emitting display devices-
In Example 1, the scattering layer (light control layer) was formed using the dispersion liquid 3 instead of the dispersion liquid 1, and the scattering layer was changed so that the thickness after drying was changed to 0.8 μm to be 9.4 μm. This was the same as in Example 1 except that the total thickness of the scattering layer (light control layer), organic compound layer, and ITO layer was changed to 1.4 μm to 10.0 μm. Thus, an organic light emitting display in Example 3 was manufactured.

Example 4
-Preparation of dispersion 4-
In the preparation of Dispersion 1, the amount of titanium oxide added was changed from 0.05 parts by weight to 0.1 parts by weight, and the amount of dispersant solsperse 36000 was changed from 0.005 parts by weight to 0.01 parts by weight. A dispersion 4 was prepared in the same manner as in the preparation of the dispersion 1, except that.

-Organic light emitting display-
In Example 1, the thickness was not changed, and the organic electric field in Example 4 was the same as Example 1 except that the scattering layer (light control layer) was formed using the dispersion 4 instead of the dispersion 1. A light emitting display device was manufactured.

(Example 5)
-Preparation of dispersion 5-
In the preparation of Dispersion 1, the amount of titanium oxide added was changed from 0.05 parts by weight to 0.01 parts by weight, and the amount of dispersant solsperse 36000 was changed from 0.05 parts by weight to 0.001 parts by weight. Except that, Dispersion 5 was prepared in the same manner as Dispersion 1.

-Organic light emitting display-
In Example 1, the thickness was not changed, and the organic electric field in Example 5 was the same as Example 1 except that the scattering layer (light control layer) was formed using the dispersion 5 instead of the dispersion 1. A light emitting display device was manufactured.

(Example 6)
-Preparation of dispersion 6-
In Example 1, instead of DPHA solution, propylene glycol monomethyl ether acetate (PGMEA: manufactured by Wako), copolymer of polypentabromobenzyl methacrylate and glycyl methacrylate (n = 1.71: manufactured by Sigma-Aldrich) Dispersion 6 was prepared in the same manner as Dispersion 1, except that a copolymer solution mixed at a mass ratio of 17: 3 was used.

-Organic light emitting display-
In Example 1, the thickness was not changed, and the organic electric field in Example 6 was the same as Example 1 except that the scattering layer (light control layer) was formed using the dispersion 6 instead of the dispersion 1. A light emitting display device was manufactured.

(Example 7)
In Example 1, instead of forming magnesium fluoride on a glass substrate by vapor deposition (n = 1.37, light transmission layer), a silica airgel film (n = 1.05, light transmission) having the same thickness. Layer), after applying dispersion 1 on the light transmission layer by spin coating, drying at 200 ° C. to form a scattering layer (light control layer), instead of forming on the light transmission layer An organic electroluminescence display device in Example 7 was manufactured in the same manner as in Example 1 except that after the SiO ₂ was vacuum-formed, the scattering layer (light control layer) was formed by spin coating with the same thickness.
In addition, the layer structure of the organic electroluminescence display part in Example 7 is the layer which consists of a board | substrate / light transmission layer / light control layer (buffer layer) / transparent electrode layer / organic compound layer / reflecting electrode layer from the light extraction surface side. Configuration 2 was adopted.
The silica airgel film (n = 1.05, light transmission layer) was formed as follows. That is, a tetramethoxysilane solution in which polyethylene glycol (PEG) and ethanol were mixed was spin-coated on a glass substrate. Subsequently, the gelation reaction was promoted by holding the substrate in a container filled with ammonia water vapor at room temperature to form a wet gel.
The substrate after the gelation treatment was immersed in ethanol, and the entire wet gel was replaced with ethanol. The thin film immersed in ethanol was supercritically dried.
The membrane obtained after drying was treated with hexamethyldisilazane (HMDS) vapor to form a silica airgel membrane (n = 1.05).

(Example 8)
In Example 1, instead of forming magnesium fluoride on a glass substrate (n = 1.37, light transmission layer), the Ag reflection layer was vacuum-deposited on the glass substrate, and the scattering layer was formed. Instead of vacuum-depositing a transparent electrode layer made of an ITO film, an organic compound layer, and a reflective electrode layer in this order, a transparent electrode layer made of an ITO film, 0.15 μm, and organic A compound layer of 0.3 μm and a transparent electrode layer made of an IZO film (electrode layer on the light extraction surface side) of 0.15 μm are vacuum-formed in this order, and further, CYTOP (CTX-807-AP) which is a fluororesin. ), Manufactured by Asahi Glass Co., Ltd. by spin coating (n = 1.34, light transmission layer), and then heat cured at 100 ° C. for 1 hour to produce an organic electroluminescence display portion, as in Example 1. Thus, the organic electroluminescence display device in Example 8 was manufactured. It was. The total thickness of the scattering layer, the transparent electrode layer made of the ITO film, the organic compound layer, and the transparent electrode layer made of the IZO film was 1.4 μm.
In addition, the layer structure of the organic electroluminescence display part in Example 8 is a layer structure consisting of a light transmission layer / transparent electrode layer / organic compound layer / transparent electrode layer / light control layer / reflection layer / substrate from the light extraction surface side. 3 (see FIG. 4).

Example 9
In Example 8, the thickness of the scattering layer was changed from 0.8 μm to 0.6 μm. On the scattering layer, a transparent electrode layer made of an ITO film, an organic compound layer, and a transparent electrode layer made of an IZO film ( Instead of vacuum-depositing the electrode layer on the light extraction surface side in this order, the transparent electrode layer 0.38 μm made of ITO film, the organic compound layer 0.4 μm, and the Ag semi-transmissive electrode layer (light extraction electrode) The organic electroluminescence display device of Example 9 was manufactured in the same manner as Example 8 except that the surface side electrode layer) 0.02 μm was vacuum-deposited in this order. The total thickness of the scattering layer, the semi-transmissive electrode layer (Ag layer), the organic compound layer, and the transparent electrode layer made of the ITO film was 1.4 μm.
In addition, the layer structure of the organic electroluminescent display part in Example 9 is a layer composed of a light transmission layer / semi-transmission electrode layer / organic compound layer / transparent electrode layer / light control layer / reflection layer / substrate from the light extraction surface side. Configuration 4 was adopted.

(Example 10)
After film formation of magnesium fluoride by vapor deposition on a glass substrate (n = 1.37, light transmission layer), dispersion 1 is formed by spin coating, dried at 200 ° C., and a dry film thickness of 0.6 μm is scattered. A layer (light control layer) was obtained. On the scattering layer, an optical waveguide forming resin (n = 1.7 manufactured by NTT-AT, light control layer) was formed by spin coating (thickness: 4 μm).
Next, a reflective electrode layer, an organic compound layer 0.38 μm, and a semi-transmissive electrode layer (electrode layer on the light extraction surface side) 0.02 μm made of an Ag film are vacuum-formed in this order on another glass substrate. After that, the glass substrate is bonded to each other in a state where the transparent electrode layer of the glass substrate and the optical waveguide forming resin layer formed on the other glass substrate are in contact with each other, and UV curing is performed to produce an organic electroluminescence display unit. did. The total thickness of the light control layer (scattering layer and optical waveguide forming resin layer), the organic compound layer, and the transparent electrode layer was 5 μm.
An organic electroluminescent display unit similar to the organic electroluminescent display unit was prepared so that the inter-pixel distance was 100 μm, and the organic electroluminescent display device in Example 10 was manufactured.
In addition, the layer structure of the organic electroluminescent display part in Example 10 is substrate // light transmission layer / light control layer (scattering layer and optical waveguide forming resin layer) / transparent electrode layer / organic compound layer from the light extraction surface side. Layer structure 5 consisting of: / reflective electrode layer / substrate.

(Comparative Example 1)
In Example 1, the organic electroluminescence display in Comparative Example 1 was performed in the same manner as in Example 1 except that the DPHA solution was spin-coated instead of spin-coating the dispersion 1 and no light control layer was formed. The device was manufactured.

(Comparative Example 2)
-Preparation of dispersion 7-
In the preparation of Dispersion 1, the addition amount of titanium oxide was changed from 0.05 parts by mass to 0.003 parts by mass, and the addition amount of the dispersant (solsperse 36000) was changed from 0.005 parts by mass to 0.0003 parts by mass. A dispersion 7 was prepared in the same manner as the preparation of the dispersion 1, except that the changes were made.

-Manufacture of organic light emitting display devices-
In Example 1, the scattering layer was formed using the dispersion liquid 7 instead of the dispersion liquid 1, and the scattering layer was formed so that the thickness after drying was changed to 0.8 μm to 14.4 μm. The organic electroluminescent display in Comparative Example 2 was performed in the same manner as in Example 1 except that the total thickness of the scattering layer, organic compound layer, and ITO layer was changed to 1.4 μm to 15.0 μm. The device was manufactured.

(Comparative Example 3)
-Preparation of dispersion 8-
In the preparation of Dispersion 1, the amount of titanium oxide added was changed from 0.05 parts by mass to 0.001 parts by mass, and the amount of dispersant (solsperse 36000) added was changed from 0.005 parts by mass to 0.0001 parts by mass. A dispersion 8 was prepared in the same manner as the preparation of the dispersion 1, except that the changes were made.

-Manufacture of organic light emitting display devices-
In Example 1, the scattering layer (light control layer) was formed using the dispersion 8 instead of the dispersion 1, and the scattering layer was changed so that the thickness after drying was changed to 0.8 μm to 29.4 μm. As in Example 1, except that the total thickness of the scattering layer (light control layer), organic compound layer, and ITO electrode layer was changed to 1.4 μm to 30.0 μm. Thus, an organic electroluminescence display device in Comparative Example 3 was manufactured.

(Comparative Example 4)
In Example 6, instead of spin-coating the dispersion 6, the organic electric field in Comparative Example 4 was used in the same manner as in Example 6 except that the copolymer solution was spin-coated and the light control layer was not formed. A light emitting display device was manufactured.

(Comparative Example 5)
In Example 6, the scattering layer (light control layer) was formed so that the thickness after drying was changed to 0.8 μm to 19.4 μm. As a result, the scattering layer (light control layer) and the organic compound layer were formed. And the organic electroluminescent display apparatus in the comparative example 5 was manufactured like Example 6 except having changed the total thickness with an ITO electrode layer into 1.4 micrometers, and having been 20 micrometers.

(Comparative Example 6)
In Example 8, an organic electroluminescence display device in Comparative Example 6 was prepared in the same manner as in Example 8 except that the DPHA solution was spin-coated instead of spin-coating the dispersion 1 and no light control layer was formed. Manufactured.

(Comparative Example 7)
In Example 8, the scattering layer (light control layer) was formed so that the thickness after drying was changed to 0.8 μm and became 19.4 μm. As a result, the scattering layer (light control layer) and the organic compound layer were formed. And the organic electroluminescent display apparatus in the comparative example 7 was manufactured like Example 8 except having changed the total thickness with an ITO electrode layer into 1.4 micrometers, and having been 20 micrometers.

(Comparative Example 8)
In Example 9, the organic electroluminescence display in Comparative Example 8 was performed in the same manner as in Example 9 except that the DPHA solution was spin-coated instead of spin-coating the dispersion 1 and no light control layer was formed. The device was manufactured.

(Comparative Example 9)
In Example 9, the scattering layer (light control layer) was formed so that the thickness after drying was changed to 0.6 μm to 19.2 μm, and as a result, the scattering layer (light control layer) and Ag semi-transmissive An organic electroluminescence display device in Comparative Example 9 was produced in the same manner as in Example 9, except that the total thickness of the electrode layer and the organic compound layer was changed to 1.4 μm to 20 μm.

(Comparative Example 10)
In Example 10, the organic electroluminescence display of Comparative Example 10 was performed in the same manner as in Example 10 except that the DPHA solution was spin-coated instead of spin-coating the dispersion 1 and no light control layer was formed. The device was manufactured.

(Comparative Example 11)
In Example 10, the thickness of the optical waveguide forming resin was changed from 4 μm to 16 μm, and the total thickness of the light control layer (scattering layer and optical waveguide forming resin layer), the organic compound layer, and the transparent electrode layer was 5 μm. The organic electroluminescent display device in Comparative Example 11 was produced in the same manner as in Example 10 except that the thickness was set to 17 μm.

(Example 11)
In Example 1, the organic electroluminescence display device in Example 11 was manufactured in the same manner as in Example 1 except that the light control layer was formed with a concavo-convex layer having a concavo-convex structure instead of the scattering layer. .
The uneven layer was formed as follows. That is, a 1 μm thick SiO ₂ thin film was deposited on the light transmission layer by CVD. The SiO ₂ thin film was subjected to lithography and dry etching with a chlorine-based gas to form a Cr metal pattern. The Cr metal pattern is dry-etched with a fluorine-based gas to form a plurality of convex portions having a columnar shape having a period of 1.8 μm, an outer shape (diameter) of 1.4 μm, and a height of 1.2 μm, thereby forming an uneven structure. Obtained. The refractive index of the SiO ₂ thin film with the Cr metal removed was 1.5. A SiON layer (refractive index: 1.7 to 1.9) as a high refractive material is formed by CVD to have a thickness of 2 μm so as to fill the concave portion of the concave-convex structure, and is flattened. A layer was formed (thickness 2 μm).
A transparent electrode layer (electrode on the light extraction surface side) made of an ITO film, an organic compound layer, and a reflective electrode layer were vacuum-deposited in this order on the uneven layer to produce an organic electroluminescent display unit. Except for this, the organic electroluminescent display device of Example 11 was produced in the same manner as Example 1. The total thickness of the light control layer (uneven layer), the organic compound layer, and the transparent electrode layer was 2.6 μm.

(Example 12)
In Example 11, the thickness of the concavo-convex layer composed of SiO ₂ and the SiON layer was changed from 2 μm to 3.6 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was An organic light emitting display device in Example 12 was manufactured in the same manner as Example 11 except that the thickness was changed from 2.6 μm to 4.2 μm.

(Example 13)
In Example 11, the thickness of the concave-convex layer was changed from 2 μm to 10.5 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 11.1 μm. Except for this, the organic electroluminescent display device of Example 13 was produced in the same manner as Example 11.

(Example 14)
In Example 7, it replaced with a scattering layer as a light control layer, and formed the uneven | corrugated layer which has an uneven structure as described in Example 11, the total of a light control layer, an organic compound layer, and a transparent electrode layer. The organic electroluminescent display device in Example 14 was manufactured in the same manner as in Example 7 except that the thickness of was changed from 1.4 μm to 2.6 μm.

(Example 15)
In Example 8, it replaced with a scattering layer as a light control layer, and formed the uneven | corrugated layer which has the uneven structure as described in Example 11, the total of a light control layer, an organic compound layer, and a transparent electrode layer. The organic electroluminescent display device in Example 15 was manufactured in the same manner as in Example 8 except that the thickness of was changed from 1.4 μm to 2.6 μm.

(Example 16)
In Example 9, the organic electric field in Example 16 was obtained in the same manner as in Example 9 except that the light-control layer was formed by forming the uneven layer having the uneven structure described in Example 11 instead of the scattering layer. A light emitting display device was manufactured.

(Example 17)
Magnesium fluoride was deposited on a glass substrate by vapor deposition (n = 1.37, light transmissive layer), and then a concavo-convex layer having the concavo-convex structure described in Example 11 was formed on the light transmissive layer. On the concavo-convex layer, an optical waveguide forming resin (n = 1.7, manufactured by NTT-AT, light control layer) was formed by spin coating so as to fill the concave portion of the concavo-convex structure, thereby forming the concavo-convex layer (thickness). 2 μm).
Next, a reflective electrode layer, an organic compound layer, and a transparent electrode layer made of an Ag film (electrode layer on the light extraction surface side) are vacuum-deposited in this order on another glass substrate. Each glass substrate was bonded together in a state where the transparent electrode layer and the optical waveguide forming resin layer formed on another glass substrate were in contact with each other, and UV curing was performed, whereby an organic electroluminescence display device in Example 17 was produced. The total thickness of the light control layer (uneven layer and optical waveguide forming resin layer), the organic compound layer, and the transparent electrode layer was 2.6 μm.
In addition, the layer structure of the organic electroluminescent display part in Example 17 is substrate / light transmission layer / light control layer (uneven layer and optical waveguide forming resin layer) / transparent electrode layer / organic compound layer / from the light extraction surface side. The layer structure 5 is composed of a reflective electrode layer / substrate.

(Comparative Example 12)
In Example 11, an organic electroluminescent display device of Comparative Example 12 was produced in the same manner as in Example 11 except that the light control layer was not formed.

(Comparative Example 13)
In Example 11, the thickness of the uneven layer was changed from 2 μm to 16.1 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 16.7 μm. The organic electroluminescent display device in Comparative Example 13 was manufactured in the same manner as Example 11 except for the above.

(Comparative Example 14)
In Example 11, the thickness of the uneven layer was changed from 2 μm to 32.7 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 33.3 μm. Except that, the organic electroluminescent display device in Comparative Example 14 was produced in the same manner as in Example 11.

(Comparative Example 15)
In Example 15, the organic electroluminescence display device in Comparative Example 15 was manufactured in the same manner as Example 15 except that the light control layer was not formed.

(Comparative Example 16)
In Example 15, the thickness of the uneven layer was changed from 2 μm to 19.4 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 20.0 μm. Except that, the organic electroluminescent display device in Comparative Example 16 was produced in the same manner as Example 15.

(Comparative Example 17)
In Example 16, an organic light emitting display device in Comparative Example 17 was manufactured in the same manner as Example 16 except that the light control layer was not formed.

(Comparative Example 18)
In Example 16, the thickness of the uneven layer was changed from 2 μm to 19.4 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 20.0 μm. An organic light emitting display device in Comparative Example 18 was produced in the same manner as Example 16 except for the above.

(Comparative Example 19)
In Example 17, an organic electroluminescence display device in Comparative Example 19 was produced in the same manner as in Example 17 except that the light control layer was not formed.

(Comparative Example 20)
In Example 17, the thickness of the uneven layer was changed from 2 μm to 16.1 μm, and the total thickness of the light control layer, the organic compound layer, and the transparent electrode layer was changed from 2.6 μm to 16.7 μm. Except that, the organic electroluminescent display device in Comparative Example 20 was produced in the same manner as in Example 17.

(Example 18)
Light that functions as a sealing layer after vacuum-depositing an Al reflective electrode layer, an organic compound layer, and a transparent electrode layer made of an ITO film (electrode layer on the light extraction surface side) in this order on a glass substrate As a control layer, a SiON layer was formed to a thickness of 1 μm by CVD (n = 1.7). The dispersion 1 was applied thereon by a spin coating method and dried at 100 ° C. for 30 minutes to form a 0.8 μm scattering layer (light control layer). On this light control layer, glass sealing was performed via an air layer as a light transmission layer, and an organic electroluminescence display part was produced. The total thickness of the organic compound layer, the transparent electrode layer, and the light control layer (sealing layer and scattering layer) was 2.4 μm.
An organic electroluminescent display unit similar to the organic electroluminescent display unit was fabricated on a glass substrate so that the inter-pixel distance was 100 μm, and the organic electroluminescent display device in Example 18 was manufactured.
In addition, the layer structure of the organic electroluminescence display part in Example 18 is transparent substrate / light transmission layer / light control layer (sealing layer and scattering layer) / transparent electrode layer / organic compound layer / reflection from the light extraction surface side. A layer structure 6 composed of an electrode layer / substrate was formed (see FIG. 5).

(Example 19)
In Example 18, as the light control layer functioning as the sealing layer, the thickness is not changed, and the SiNx layer is formed by the CVD method instead of the SiON layer (n = 2.0). Similarly, an organic light emitting display device of Example 19 was manufactured.

(Example 20)
As an electrode layer on the light extraction surface side, in place of a transparent electrode layer made of an ITO film, a semi-transmissive electrode layer made of an Ag film was vacuum-formed with the same thickness as in Example 18, 20 organic electroluminescent display devices were manufactured.

(Example 21)
In Example 18, instead of the scattering layer made of the dispersion 1, an immersion oil (TYPE B, manufactured by Cargill Co.) film 10 μm on the SiON layer (sealing layer), and a microlens whose rear surface was polished (product code 11) -1254-100-000, manufactured by SUSS Micro optics) 100 μm, and as a result, the total of the organic compound layer, the transparent electrode layer, and the light control layer (sealing layer and scattering layer) The organic electroluminescence display device in Example 21 was manufactured in the same manner as in Example 18 except that the thickness of was changed to 100 μm and changed to 110 μm, and the distance between pixels was changed from 100 μm to 1,000 μm.

(Example 22)
In Example 19, instead of the scattering layer made of the dispersion 1, an immersion oil (TYPE B, manufactured by Cargill Co.) film 10 μm on the SiNx layer (sealing layer), and a microlens with a polished back surface (product code 11) -1254-100-000, manufactured by SUSS Micro optics) 100 μm, and as a result, the total of the organic compound layer, the transparent electrode layer, and the light control layer (sealing layer and scattering layer) The organic electroluminescence display device in Example 22 was manufactured in the same manner as in Example 19 except that the thickness of the film was changed to 100 μm to 110 μm and the distance between pixels was changed from 100 μm to 1,000 μm.

(Comparative Example 21)
In Example 18, instead of spin-dispersing the dispersion 1, the DPHA solution was spin-coated to form a film, and the light control layer was not formed. An organic electroluminescent display device was manufactured.

(Comparative Example 22)
In Example 18, the scattering layer was formed using the dispersion 8 instead of the dispersion 1, and the scattering layer was formed so that the thickness after drying was changed to 0.8 μm to 29.4 μm. In the same manner as in Example 18 except that the total thickness of the organic compound layer, the transparent electrode layer, and the light control layer (sealing layer and scattering layer) was changed from 2.4 μm to 30.0 μm. An organic light emitting display device of Comparative Example 22 was manufactured.

(Comparative Example 23)
In Example 19, instead of spin-coating the dispersion 1, the DPHA solution was spin-coated to form a film, and the light control layer was not formed. An organic electroluminescent display device was formed.

(Comparative Example 24)
In Example 19, the scattering layer was formed using the dispersion 8 instead of the dispersion 1, and the scattering layer was formed so that the thickness after drying was changed to 0.8 μm to 29.4 μm. In the same manner as in Example 19, except that the total thickness of the organic compound layer, the transparent electrode layer, and the light control layer (sealing layer and scattering layer) was changed from 2.4 μm to 30.0 μm. An organic electroluminescent display device of Comparative Example 24 was manufactured.

(Comparative Example 25)
In Example 20, instead of spin-dispersing the dispersion 1, the DPHA solution was spin-coated to form a film, and the light control layer was not formed. An organic electroluminescent display device was formed.

(Comparative Example 26)
In Example 20, the scattering layer was formed using the dispersion 8 instead of the dispersion 1, and the scattering layer was formed so that the thickness after drying was changed to 0.8 μm to 29.4 μm. In the same manner as in Example 20, except that the total thickness of the organic compound layer, the semi-transmissive electrode layer, and the light control layer (sealing layer and scattering layer) was changed from 2.4 μm to 30.0 μm. Thus, an organic electroluminescence display device of Comparative Example 26 was manufactured.

(Comparative Example 27)
In Example 21, an organic electroluminescence display device in Comparative Example 27 was formed in the same manner as in Example 21 except that quartz glass having the same thickness was used instead of the microlens and no scattering layer was formed. .

(Comparative Example 28)
In Example 21, the microlens thickness was changed from 100 μm to 500 μm. As a result, the total thickness of the organic compound layer, the transparent electrode layer, and the light control layer was changed from 110 μm to 510 μm. In the same manner as in Example 21, an organic electroluminescent display device in Comparative Example 28 was produced.

(Comparative Example 29)
In Example 22, an organic electroluminescence display device of Comparative Example 29 was produced in the same manner as in Example 22 except that quartz glass having the same thickness was used instead of the microlens and no scattering layer was formed.
(Comparative Example 30)
In Example 22, except that the thickness of the microlens was changed from 100 μm to 500 μm, and as a result, the total thickness of the organic compound layer, the transparent electrode layer, and the light control layer was changed from 110 μm to 510 μm. In the same manner as in Example 22, an organic electroluminescent display device in Comparative Example 30 was produced.

(Evaluation methods)
-Image blurring-
In the organic electroluminescent display devices of Examples 1 to 22 and Comparative Examples 1 to 30, with the organic electroluminescent display portion turned on, the organic electroluminescent display unit was placed under the microscope and the luminescent image was captured by the CCD (see FIG. 7). .
The luminescent image was graphed by taking in several lines of luminance on the X line, performing averaging data processing (see FIG. 7).
From the graph, the peak value is compared with the peak value at the organic electroluminescence display part at the position where the gap is 2R and the distance R is separated (difference (%)). Evaluation was made and A to C were regarded as acceptable. The results are shown in Tables 1 to 3 below.
Criteria for determining image blur:
A: 0% ≦ A <1%
B: 1% ≦ B <5%
C: 5% ≦ C <10%
D: 10% ≦ D <20%
E: 20% ≦ E

-Light extraction efficiency-
The light extraction efficiency was determined by measuring the total amount of light emitted to the outside of the integrating sphere using an integrating sphere, and evaluating the light extraction efficiency using this light amount. The results are shown in Tables 1 to 3 below.

  The organic electroluminescent display device of the present invention is suitable for use as a display device in various devices because of its high light extraction efficiency and low image blurring.

DESCRIPTION OF SYMBOLS 1 Transparent substrate 2 Light transmission layer 3 Scattering layer (light control layer)
4 Transparent electrode layer (semi-transmissive electrode layer)
DESCRIPTION OF SYMBOLS 5 Light emitting layer 6 Reflective electrode layer 7 Buffer layer 8 Reflective layer 9 Substrate 10 Sealing layer 50a, 50b, 50c, 50d Pixel 51R, 51G, 51B Subpixel 100, 200, 300, 400, 500 Organic electroluminescent display device

Claims (11)

In a plane, a pair of electrode layers, an organic compound layer that is disposed between the electrode layers and includes a light emitting layer, a light transmitting layer that transmits light emitted from the light emitting layer, and light that controls an optical path of the light And a plurality of organic electroluminescence display units configured as pixels including at least one of a red subpixel, a green subpixel, and a blue subpixel, and opposite to the light extraction surface side In the organic electroluminescent device in which the electrode layer is responsible for the reflection of the light,
Among the subpixels, the shortest distance between adjacent subpixels of the same color is 2R, and the total thickness of the organic compound layer, the electrode layer on the light extraction surface side, and the light control layer is t. An organic electroluminescent display device satisfying the following formula: 9 ≦ 2R / t. In a plane, a pair of electrode layers, an organic compound layer that is disposed between the electrode layers and includes a light emitting layer, a light transmitting layer that transmits light emitted from the light emitting layer, and light that controls an optical path of the light A plurality of organic electroluminescence display units each including a control layer and a reflective layer that reflects the light, the pixel including at least one of a red subpixel, a green subpixel, and a blue subpixel. The electrode layer on the opposite side to the light extraction surface side is responsible for the transmission of the light, and the reflection layer is on the opposite side of the light extraction surface side in the electrode layer on the opposite side to the light extraction surface side In the formed organic electroluminescent element,
Among the sub-pixels, the shortest distance between adjacent sub-pixels of the same color is 2R, the organic compound layer, the electrode layer on the light extraction surface side, and the electrode layer on the opposite side of the light extraction surface side An organic light emitting display device satisfying the following formula: 9 ≦ 2R / t, where t is the total thickness with the light control layer.   The organic electroluminescence display device according to claim 1, wherein a refractive index with respect to light in a visible wavelength region emitted from the light emitting layer of the light transmission layer is 1.0 to 1.5.   The organic electroluminescence display device according to claim 1, wherein the light control layer has a fine particle-containing layer.   The organic material according to claim 4, wherein the fine particle-containing layer includes at least fine particles and a matrix agent, and a refractive index N with respect to light in a visible wavelength region emitted from the light emitting layer of the matrix agent is 1.5 <N. Electroluminescent display device.   6. The organic electroluminescent display device according to claim 5, wherein the refractive index N is 1.65 <N.   The organic electroluminescent display device according to claim 1, wherein the light control layer includes an uneven layer.   The light transmission layer, the light control layer, and the light emitting layer are arranged in this order from the light extraction surface side, and the light transmission layer and the light control layer are adjacent to each other. The organic electroluminescent display device described.   8. The light transmission layer, the light control layer, and the light emitting layer are disposed in this order from the light extraction surface side, and the light transmission layer and the light control layer are further separated from each other. An organic electroluminescent display device according to any one of the above.   The organic electroluminescence display device according to claim 1, wherein the light transmission layer, the light emitting layer, and the light control layer are arranged in this order from the light extraction surface side.   The organic electroluminescence display device according to claim 1, wherein the light transmission layer includes at least one of a fluoride material, an alkoxysilane, an airgel, and air.