JP2010261776A5 - - Google Patents
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- JP2010261776A5 JP2010261776A5 JP2009112050A JP2009112050A JP2010261776A5 JP 2010261776 A5 JP2010261776 A5 JP 2010261776A5 JP 2009112050 A JP2009112050 A JP 2009112050A JP 2009112050 A JP2009112050 A JP 2009112050A JP 2010261776 A5 JP2010261776 A5 JP 2010261776A5
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- Prior art keywords
- light source
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- wavelength
- light
- phase
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- 230000003287 optical effect Effects 0.000 claims description 15
- 238000001228 spectrum Methods 0.000 claims description 5
- 230000004907 flux Effects 0.000 claims description 4
- 230000010287 polarization Effects 0.000 claims description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009112050A JP2010261776A (ja) | 2009-05-01 | 2009-05-01 | 光波干渉計測装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009112050A JP2010261776A (ja) | 2009-05-01 | 2009-05-01 | 光波干渉計測装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010261776A JP2010261776A (ja) | 2010-11-18 |
JP2010261776A5 true JP2010261776A5 (enrdf_load_stackoverflow) | 2012-06-14 |
Family
ID=43359978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009112050A Pending JP2010261776A (ja) | 2009-05-01 | 2009-05-01 | 光波干渉計測装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2010261776A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5172040B2 (ja) * | 2010-12-17 | 2013-03-27 | パナソニック株式会社 | 表面形状測定方法及び表面形状測定装置 |
JP5984351B2 (ja) * | 2011-09-14 | 2016-09-06 | キヤノン株式会社 | 計測装置 |
JP2013088316A (ja) * | 2011-10-19 | 2013-05-13 | Canon Inc | 計測装置及び計測方法 |
JP5849231B2 (ja) * | 2012-04-23 | 2016-01-27 | パナソニックIpマネジメント株式会社 | 表面形状測定装置及び方法 |
FR3105439B1 (fr) * | 2019-12-20 | 2022-01-14 | Thales Sa | Systeme lidar comprenant deux composatns diffractifs |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6118300A (ja) * | 1984-07-04 | 1986-01-27 | Matsushita Electric Ind Co Ltd | 光学的マイクロホン |
DE4033013C2 (de) * | 1990-10-18 | 1994-11-17 | Heidenhain Gmbh Dr Johannes | Polarisationsoptische Anordnung |
US5153669A (en) * | 1991-03-27 | 1992-10-06 | Hughes Danbury Optical Systems, Inc. | Three wavelength optical measurement apparatus and method |
JPH05118922A (ja) * | 1991-10-24 | 1993-05-14 | Advantest Corp | 分光器の回折格子角度−波長特性誤差測定方法 |
JPH05203408A (ja) * | 1991-11-26 | 1993-08-10 | Olympus Optical Co Ltd | 位相差検出器 |
JPH11183116A (ja) * | 1997-12-18 | 1999-07-09 | Nikon Corp | 光波干渉測定方法および装置 |
US6421120B1 (en) * | 1999-10-29 | 2002-07-16 | Agilent Technologies, Inc. | Extended wavelength calibration reference |
JP4362631B2 (ja) * | 2003-09-26 | 2009-11-11 | 日本電信電話株式会社 | 可変波長光発生装置 |
DE112005001980T5 (de) * | 2004-08-18 | 2007-07-12 | National University Corporation Tokyo University Of Agriculture And Technology | Verfahren und Vorrichtung zur Gestaltmessung, sowie Frequenzkammlichtgenerator |
WO2008090599A1 (ja) * | 2007-01-22 | 2008-07-31 | School Juridical Person Kitasato Institute | オプティカル・コヒーレンス・トモグラフィー装置 |
JP2009025245A (ja) * | 2007-07-23 | 2009-02-05 | Optical Comb Inc | 光干渉観測装置 |
JP5228828B2 (ja) * | 2008-11-19 | 2013-07-03 | 株式会社ニコン | 低コヒーレンス干渉計、低コヒーレンス干渉装置、及び低コヒーレンス干渉測定方法 |
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2009
- 2009-05-01 JP JP2009112050A patent/JP2010261776A/ja active Pending
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