JP2010254810A5 - - Google Patents

Description

In order to solve the above-mentioned problems, the polymer production method of the present invention polymerizes two or more kinds of monomers α _{1 to} α _n (where n represents an integer of 2 or more) to form a structural unit. It is a method for producing a polymer (P) comprising α ′ _{1 to} α ′ _n (where α ′ _{1 to} α ′ _n represent structural units derived from monomers α _{1 to} α _n , respectively). A step of previously charging the reactor with a first solution containing the monomers α _{1 to} α _n in a first composition, and a second step of charging the monomers α _{1 to} α _n into the reactor. a step of dropping a second solution containing the composition of said second solution further includes a step of maintaining the polymerization temperature after the step of addition was terminated, the second composition, the polymer (P ) is the same as the design composition representing a target value of the content ratio of the constituent unit alpha _'1 to?' _n in the first composition, and the design composition, et employed in the polymerization It obtained in advance composition in consideration of the reactivity of each monomer that.

Claims (6)

Two or more types of monomers α _{1 to} α _n (where n represents an integer of 2 or more) are polymerized to form structural units α ′ _{1 to} α ′ _n (where α ′ _{1 to} α ′ _n are A method for producing a polymer (P) consisting of structural units derived from monomers α _{1 to} α _n .
Advance in the reactor, said a step of charging a first solution containing the monomer alpha ₁ to? _N in the first composition, the reactor in the monomer alpha ₁ to? _N of the second further comprising a step of dropping a second solution containing a composition, the process step of dropping said second solution is held at polymerization temperature after completion,
The second composition is the same as the design composition representing the target value of the content ratio of the structural units α ′ _{1 to} α ′ _n in the polymer (P),
The said 1st composition is a manufacturing method of a polymer which is a composition calculated | required previously in consideration of this design composition and the reactivity of each monomer used for superposition | polymerization. When the design composition (unit: mol%) in the polymer (P) is α ′ ₁ : α ′ ₂ :...: Α ′ _n , the first composition (unit: mol%) is α ₁ : α _2. :...: When expressed by α _n and the factors obtained by the following methods (1) to (3) are expressed by F ₁ , F ₂ ,... F _n , α ₁ = α ′ ₁ / F ₁ , α ₂ = α The method for producing a polymer according to claim 1, wherein “ ₂ / F ₂ ,... Α _n = α ′ _n / F _n .
(1) First, a monomer solution whose monomer composition is the same as the design composition α ′ ₁ : α ′ ₂ :...: Α ′ _n and a dropping solution containing a solvent are placed in a reactor containing only the solvent. The composition of the monomers α _{1 to} α _n remaining in the reactor when the elapsed time from the start of dropping is t ₁ , t ₂ , t ₃ . Mol%) M ₁ : M ₂ :...: M _n and constitutional units α ′ _{1 to} α ′ _n in the polymer produced between t ₁ and t ₂ , t ₂ to t ₃ , respectively. Ratio (unit: mol%) P ₁ : P ₂ :...: P _n is determined.
(2) the _{P 1: P 2: ...:} P n is, designed composition _{α '1: α' 2:} ...: α ' between the closest time zone _n from _{"t m} to _{t m + 1} (m is 1 or more Find an integer.)
(3) From the value of P ₁ : P ₂ :...: P _n in “between t _m and t _{m + 1} ” and the value of M ₁ : M ₂ :...: M _{n at} the elapsed time t _m , Factors F ₁ , F ₂ ,... F _n are obtained from the equations. F ₁ = P ₁ / M ₁ , F ₂ = P ₂ / M ₂ ,... F _n = P _n / M _n . The ratio W ₀ (unit: total amount of monomers present in the reactor at the elapsed time t _m to the total amount of monomers initially contained in the dropping solution used in (1) above. Mass%), and a mass ratio of the total amount of monomers contained in the first solution and the total amount of monomers contained in the second solution (first solution: second solution). the _{W 0: (100-W 0} ) to method for producing a polymer of claim 2 wherein.   The resist polymer obtained by the manufacturing method as described in any one of Claims 1-3.   A resist composition comprising the resist polymer according to claim 4 and a compound capable of generating an acid upon irradiation with actinic rays or radiation.   A step of applying the resist composition according to claim 5 on a processed surface of a substrate to form a resist film, a step of exposing the resist film, and a step of exposing the exposed resist film to a developer. And a step of developing using the method.