JP2010250299A - Color filter and method for manufacturing color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter which is capable of accurately securing flatness and of improving the manufacturing efficiency, and a method for manufacturing a color filter. <P>SOLUTION: The color filter includes: a substrate 1; a color layer 2 formed on the substrate 1; and a transparent substrate 7 including a film 3, a transparent conductive layer 4 formed on one surface of the film 3, and a transparent adhesive layer 5 formed on the other surface of the film 3. The adhesive layer 5 of the transparent substrate 7 and the color layer 2 of the substrate 1 are bonded to each other. The method of manufacturing the color filter includes a step of forming the color layer 2 on the substrate 1, a step of forming the transparent substrate 7 by forming the transparent conductive layer 4 on one surface of the film 3 and forming the transparent adhesive layer 5 on the other surface of the film 3, and a step of bonding the adhesive layer 5 of the transparent substrate 7 and the color layer 2 of the substrate 1 to each other. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a color filter in which a colored pattern made of a plurality of colors, a transparent conductive layer, and the like are provided on a flexible base material such as glass or plastic, and a method for manufacturing the color filter.

  Currently, liquid crystal displays are widely used in televisions, personal computers, portable electronic devices, and the like. In this liquid crystal display, it is an important factor to keep the gap of the liquid crystal cell at a constant interval. Since the cell gap is the thickness of the liquid crystal layer, there is a difference of only a few μm in the thickness of the cell in a part of the panel. Causes of unevenness and defects in color reproduction appear.

  In order to keep the cell gap constant, it is important that the height accuracy of the spacer and the flatness of the TFT (Thin Film Transistor) side substrate and the color filter substrate are ensured to a high degree.

  Among them, the color filter plays a role of controlling color display, contrast and spectral characteristics in the liquid crystal display. As a method for producing a color filter, a photolithography method, an ink jet method (partition wall method / image receiving layer method), a printing method, and the like have been proposed and implemented, but there is a problem in the flatness of the product in any of the production methods.

  Currently, in order to flatten the color filter substrate, an overcoat agent is applied on the colored layer to reduce the level difference of the pixels, or a method of polishing the surface after forming the colored layer. However, each method has a problem in that the manufacturing cost increases due to an increase in the number of steps and apparatuses, and the colored layer is scratched by polishing and causes a deterioration in quality.

  Further, when a colored layer is formed on a roll-shaped plastic substrate, it is very difficult to polish while rotating the substrate as in the case where a colored layer is formed on a single wafer substrate, and it cannot be adopted.

  In order to deal with these problems, for example, Patent Document 1 employs a method of rolling and flattening a colored layer using a roller. However, in this method, a pattern having a gap for each pattern cannot be used because the pattern shape is two-dimensionally deformed by pressurization.

  In addition, in a method of manufacturing a display device by forming a transparent semiconductor circuit on a colored layer (see Patent Documents 2 and 3), if the flatness of the colored layer is low, it may cause defective circuit formation or disconnection. .

  On the other hand, as a method of forming a transparent conductive layer on a colored layer, a method of forming a metal oxide thin film on a colored pattern formed on a substrate by sputtering is widely used. However, in this method, since the substrate on which the colored pattern is formed is set in the chamber and then the inside of the chamber is depressurized to form a vacuum before forming the film, the production efficiency is not high.

JP-A-3-278003 JP 2007-299833 A JP 2007-298601 A

  The objective of this invention is providing the manufacturing method of the color filter which can ensure flatness with high precision, and can improve production efficiency, and a color filter.

A configuration for solving the above problems will be described below.
(Claim 1)
(A) forming a colored layer on the substrate;
(B) forming a transparent conductive layer on one surface of the transparent film and forming a transparent adhesive layer on the other surface to form a transparent substrate;
(C) bonding and bonding the adhesive layer of the transparent substrate and the colored layer of the substrate;
A method for producing a color filter, comprising:
(Claim 2)
The method for producing a color filter according to claim 1, wherein a thickness of the adhesive layer is 0.1 μm or more and 20 μm or less.
(Claim 3)
The method for producing a color filter according to claim 1, wherein a liquid crystal alignment control layer is further formed on the transparent conductive layer in the step (b).
(Claim 4)
At least a substrate having a colored layer formed on one side;
A transparent conductive layer is formed on one side, and a transparent substrate made of a transparent film having a transparent adhesive layer formed on the other surface.
A color filter, wherein an adhesive layer of the transparent substrate and a colored layer of the substrate are bonded together.
(Claim 5)
The color filter according to any one of claims 2 to 4, wherein a thickness of the transparent film of the transparent substrate is 1 µm or more and 50 µm or less.

(Effect of each invention)
According to the first aspect of the present invention, since the adhesive layer of the transparent substrate and the colored layer of the substrate are bonded and adhered, the flatness of the color filter can be ensured and the production efficiency can be improved. .

According to a second aspect of the present invention, there is provided a color filter manufacturing method according to the first aspect, wherein the adhesive layer has a thickness of 0.1 μm to 20 μm.

According to the invention of claim 2, since it has the effect of claim 1 and the thickness of the adhesive layer is 0.1 μm or more and 20 μm or less, the flatness can be ensured with higher accuracy.

According to a third aspect of the present invention, in the color filter manufacturing method according to the first or second aspect, the transparent substrate further includes a liquid crystal alignment control layer formed on the transparent conductive layer. It is characterized by.

According to the invention of claim 3, since it has the effect of the invention of any one of claims 1 and 2 and the transparent substrate further has a liquid crystal alignment control layer formed on the transparent conductive layer, Color filters can be manufactured efficiently

The color filter according to the invention of claim 4 includes a substrate, a colored layer formed on the substrate, a transparent film, a transparent conductive layer formed on one surface of the transparent film, and the transparent film. A transparent substrate having a transparent adhesive layer formed on the other surface, and the adhesive layer of the transparent substrate and the colored layer of the substrate are bonded and bonded together.

According to the invention of claim 4, since the adhesive layer of the transparent substrate and the colored layer of the substrate are bonded and adhered, the flatness of the color filter can be ensured and the production efficiency can be improved. .

The color filter according to the invention of claim 5 is characterized in that, in the invention of claim 4, the thickness of the transparent film of the transparent substrate is 1 μm or more and 50 μm or less.

According to the invention of claim 5, since it has the effect of the invention of claim 4 and the thickness of the transparent film of the transparent substrate is 1 μm or more and 50 μm or less, the flatness of the color filter is ensured with higher accuracy. can do.

  According to the present invention, since the adhesive layer of the transparent substrate and the colored layer of the substrate are bonded and adhered, the flatness of the color filter can be ensured and the production efficiency can be improved.

It is a schematic sectional drawing for demonstrating the process of the manufacturing method of the color filter which concerns on Embodiment 1 of this invention. It is a schematic sectional drawing for demonstrating the other process of the manufacturing method of the color filter which concerns on Embodiment 1 of this invention. It is a schematic sectional drawing for demonstrating the other process of the manufacturing method of the color filter which concerns on Embodiment 1 of this invention.

  1, 2 and 3 are schematic cross-sectional views for explaining the steps of the color filter manufacturing method according to the embodiment of the present invention.

  As shown in FIG. 1, the colored layer 2 is formed on the substrate 1. Further, as shown in FIG. 2, the transparent conductive layer 4 is formed on one surface of the transparent film 3, the transparent adhesive layer 5 is formed on the other surface of the transparent film 3, and the surface of the transparent conductive layer 4 is formed. The transparent substrate 7 is formed by forming the liquid crystal alignment control layer 6.

  Next, as shown in FIG. 3, the adhesive layer 5 of the transparent substrate 7 and the colored layer 2 of the substrate 1 are bonded together to form a color filter. The transparent substrate 7 may have a configuration without the liquid crystal alignment control layer 6.

  As the substrate 1, a known material such as glass or a plastic substrate can be used. For example, films and sheets of polyethylene terephthalate, polyethylene naphthalate, polyether sulfone, cycloolefin polymer, polyimide, polyamide, aramid, polycarbonate, polymethyl methacrylate, polyvinyl chloride, triacetyl cellulose, and the like can be used.

  As the transparent film 3, a known material can be used. As the transparent film 3, for example, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, cycloolefin polymer, polyimide, polyamide, aramid, polycarbonate, methacrylic resin, polymethyl methacrylate, polychlorinated, as with the plastic substrate of the substrate 1. A film or sheet of vinyl, triacetyl cellulose or the like can be used. The film 3 is formed by appropriately selecting from these materials in consideration of heat resistance, solvent resistance, optical characteristics and the like required in the process.

  The thickness of the transparent film 3 is preferably 1 μm or more and 50 μm or less. When the thickness of the transparent film 3 is less than 1 μm, handling becomes difficult, and when the thickness of the film 3 exceeds 50 μm, the thickness accuracy is not good and the transparency is impaired.

  As the transparent conductive layer 4, a known material can be used. The transparent conductive layer 4 is formed by, for example, depositing a conductive polymer such as ITO, IZO, IWO, ICO, ZnO, SnO2, carbon nanotube, and polythiophene, an ion plating method, a sputtering method, a laser ablation method, plasma CVD (Chemical). Vapor Deposition) method, hot wire CVD method, sol-gel method, coating method, PLD method or the like is selected as appropriate.

  The transparent conductive layer 4 is etched after film formation, or a desired pattern is formed in advance using a lift-off method at the time of film formation, and then bonded to the colored layer 2 while being aligned. However, it can also be used as a gate electrode. The transparent conductive layer 4 can also be used as a gate electrode by forming a desired pattern after being bonded onto the colored layer 2 and etching.

  As the adhesive layer 5, a known material can be used. The adhesive layer 5 is formed by appropriately selecting, for example, heat resistance, solvent resistance, or optical properties required from an ultraviolet curable resin, a pressure-sensitive adhesive, a heat-sensitive adhesive, or a reactive adhesive. Is done.

  As a method for forming the adhesive layer 5, a known method can be used. The adhesive layer 5 is formed by, for example, a dipping method, a roll coat, a gravure coat, a reverse coat, an air knife coat, a comma coat, a die coat, a screen printing method, a spray coat, or a gravure offset method. Moreover, the formation method of the contact bonding layer 5 can also use the dry laminating method etc., and it selects and uses suitably according to the viscosity of an adhesive agent to be used, pot life, the target coating film thickness, etc.

  The thickness of the adhesive layer 5 is preferably 0.1 μm or more and 20 μm or less, and more preferably 0.3 μm or more and 10 μm or less. When the thickness of the adhesive layer 6 is less than 0.1 μm, it is difficult to relax the step of the colored layer 2 and it is difficult to flatten it. In addition, since the thickness of the adhesive layer 6 is significantly smaller than the step of the colored layer 2, the adhesive layer 6 cannot follow the step, resulting in poor adhesion. On the other hand, if the thickness of the adhesive layer 6 exceeds 20 μm, the film thickness accuracy of the adhesive layer 6 decreases, which is not preferable.

  As the material of the liquid crystal alignment control layer 6, a known material can be used. The liquid crystal alignment control layer 6 includes, for example, polyvinyl alcohol, polyethylene, polyamide, polybutylene terephthalate, polyester, polyimide, polycyclohexyl methacrylate, crosslinked nylon, Polyvinyl methyl ketone, polyvinyl cinnamate, polyacetal, polybenzyl methacrylate, polybrene, etc. and materials having the above polymer skeleton or precursors thereof, etc. are selected as appropriate in consideration of heat resistance, solvent resistance, optical properties, etc. Formed.

  The liquid crystal alignment control layer material 6 is coated on the transparent conductive layer 4, and is subjected to a drying / heating process or the like as necessary, and then used to develop a liquid crystal alignment control function. Coating methods for the liquid crystal alignment control layer material 6 include dipping method, roll coating, gravure coating, reverse coating, air knife coating, comma coating, die coating, screen printing method, spray coating, gravure offset method, and spin coating for single wafers. The liquid crystal alignment control layer material can be appropriately selected and used depending on the viscosity of the liquid crystal alignment control layer material and the target film thickness. The method for developing the liquid crystal alignment control function can be selected according to the material of the liquid crystal alignment control layer 6 to be used, and examples thereof include rubbing alignment or photo alignment.

  The adhesive layer 5 of the transparent substrate 7 can be bonded to the colored layer 2 by a known method. The method for adhering the adhesive layer 5 and the colored layer 2 is appropriately selected in consideration of the characteristics of the adhesive layer material selected from, for example, laminating, heat laminating, vacuum laminating and the like.

  The color filter of the present invention can be formed by the members and processes as described above. The color filter of the present invention forms not only a liquid crystal display device but also an image display body of a reflection type display device such as so-called electronic paper on a color filter, and forms a reflection type display device by bonding it to a drive electrode substrate. It is also possible.

Example 1
Next, Example 1 of the present invention will be described. As the substrate 1, glass (Corning Japan, # 1737, 300 mm × 300 mm × 0.7 mmt) was used. A 200 mm × 150 mm square black matrix and a colored layer 2 made of Red, Green, and Blue were formed on the substrate 1 by photolithography. The 10-point average roughness (Rz) in the colored layer 2 was 0.7 μm.

  As the transparent film 3 of the transparent substrate 7, a transparent polyimide film (300 mm × 50 m × 25 μmt) is used. After forming the transparent conductive layer 4 by sputtering ITO on the film, the material for the liquid crystal alignment control layer 6 (Nissan) “SE-410” manufactured by Kagaku Kogyo Co., Ltd. was applied onto the transparent conductive layer 4 with a die coater so that the dry film thickness was 0.1 μm, and heat-treated at 200 ° C. for 30 minutes in a drying oven. Subsequently, the liquid crystal alignment control layer 6 was obtained by subjecting this substrate to rubbing treatment in a certain direction.

Subsequently, the back surface of the transparent film 3 on which the transparent conductive layer 4 was formed was coated with a UV curable adhesive having a thickness of 3 μm using a roll coater to obtain a transparent substrate 7.
[Adhesive component]
Butyl methacrylate 3 parts by weight
Aronix M-305 (manufactured by Toagosei Chemical Industry Co., Ltd.) 2 parts by weight
Aronix M-400 (manufactured by Toagosei Chemical Industry Co., Ltd.) 5 parts by weight
Photopolymerization initiator Irgagua 907 (Ciba Specialty Chemicals) 0.2 parts by weight

  After bonding the transparent substrate 7 obtained as described above to the colored layer 2 formed on the substrate 1 using a vacuum laminator, the adhesive 2 is cured by irradiating ultraviolet rays from the transparent substrate 7 side. The color filter was obtained by bonding the transparent substrate 7 and the substrate 1 on which the colored layer 2 was formed. The obtained color filter had a 10-point average roughness (Rz) of 0.1 μm.

(Example 2)
Next, a second embodiment of the present invention will be described. A transparent polyimide (300 mm × 30 m × 100 μm) processed into a roll shape was used as the substrate 1. A pattern of the colored layer 2 similar to that in Example 1 was formed on the substrate 1 by photolithography.

  Five patterns of this pattern were continuously formed on the substrate 1 with an interval of 100 mm. The average of 10-point average roughness (Rz) in each colored layer 2 was 0.8 μm.

  The substrate 1 on which the colored layer 2 obtained as described above is formed and the transparent substrate 7 obtained in the same manner as in Example 1 are continuously fed out and transparent after being continuously bonded using a roll laminator. The adhesive 2 was cured by irradiating ultraviolet rays from the substrate 7 side, and the transparent substrate 7 and the substrate 1 on which the colored layer 2 was formed were bonded to obtain a color filter. The average of 10-point average roughness (Rz) of the obtained color filter was 0.08 μm.

(Comparative Example 1)
Next, Comparative Example 1 of the present invention will be described. As the adhesive layer 5, the same materials as in Example 1 were mixed at the same ratio, and the film thickness was 0.05 μm. Other members and processes were the same as in Example 1 to produce a color filter, but the transparent substrate 7 and the colored layer 2 were poorly bonded and easily peeled off.

(Comparative Example 2)
Next, Comparative Example 2 of the present invention will be described. As the adhesive layer 5, the same materials as in Example 1 were mixed at the same ratio, and the film thickness was 25 μm. Other members and processes were obtained in the same manner as in Example 1, but the 10-point average roughness (Rz) was 1.2 μm, which was larger than Rz of the colored layer 2.

DESCRIPTION OF SYMBOLS 1 Substrate 2 Colored layer 3 Transparent film 4 Transparent conductive layer 5 Adhesive layer 6 Liquid crystal alignment control layer 7 Transparent substrate

Claims (5)

(A) forming a colored layer on the substrate;
(B) forming a transparent conductive layer on one surface of the transparent film and forming a transparent adhesive layer on the other surface to form a transparent substrate;
(C) bonding and bonding the adhesive layer of the transparent substrate and the colored layer of the substrate;
A method for producing a color filter, comprising:   The method for producing a color filter according to claim 1, wherein the adhesive layer has a thickness of 0.1 μm or more and 20 μm or less. The method for producing a color filter according to claim 1, wherein a liquid crystal alignment control layer is further formed on the transparent conductive layer in the step (b). At least a substrate having a colored layer formed on one side;
A transparent conductive layer is formed on one side, and a transparent substrate made of a transparent film having a transparent adhesive layer formed on the other surface.
A color filter, wherein an adhesive layer of the transparent substrate and a colored layer of the substrate are bonded together.   The color filter according to any one of claims 2 to 4, wherein a thickness of the transparent film of the transparent substrate is 1 µm or more and 50 µm or less.

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