JP2010282213A - Method for manufacturing color filter for display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter for a display device suppressing reduction of reliability due to various causes generated when used as the color filter. <P>SOLUTION: In the method for manufacturing the color filter for the display device, a plastic film is heated at a temperature equal to or higher than the heat treatment temperature during formation of a color filter layer prior to formation of the color filter layer, the color filter having the color filter layer formed by heat treatment on the plastic film. For heating the plastic film prior to the formation of the color filter layer, the heating is continuously performed by a roll to roll method using a heat treatment device provided with at least a roll wind-up device, a heating furnace and a roll wind-off device. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a color filter for a display device using a plastic film as a base material.

  Flat panel displays such as liquid crystal display devices and organic electroluminescence (organic EL) display devices are widely used as thin and space-saving display devices. Among these display devices, most of those that perform color display (particularly most of liquid crystal display devices) are colored by RGB color filters corresponding to pixels formed using a glass substrate. A substrate on which three primary color patterns are formed is generally called a color filter.

  In recent years, it has been proposed to use a plastic film as a substrate in place of glass in order to further reduce the thickness and weight of a display device for a portable device such as a mobile phone (Patent Document 1). As types of plastic films, in addition to thermoplastic films such as polyethylene terephthalate, polycarbonate, and polyethersulfone, crosslinkable resins such as epoxy resins have been proposed.

JP 2000-284303 A

By the way, when manufacturing a color filter using a plastic film, the following is a problem.
First, when a color resist is used when manufacturing a color filter, patterning is performed by photolithography and a heat treatment step of about 200 ° C. is required. When this process is performed three times for each of the red, green, and blue colored portions, or when a resin black matrix is formed between the colored portions in addition to these colored portions, at least four heat treatment steps are required. When a plastic film is used for the substrate, the heat treatment process is repeated a plurality of times. For example, in the case of a thermoplastic resin, deformation may occur in the process when, for example, an external force such as a tension is applied during transportation, and particularly in the case of a stretched film, shrinkage due to relaxation occurs. Even in the case of a crosslinkable resin, curing shrinkage occurs due to thermal history. Since the heat treatment process is repeated, a dimensional change due to such deformation occurs, and there is a problem that the dimensional accuracy deviates from the design value compared to when a glass substrate is used.

  Second, when forming the color filter layer, since the plastic film as the substrate is flexible unlike the glass substrate, there is a coating method similar to that used for the glass substrate, for example, a coating method such as spinner coating. There is a problem that it can not be taken. As a means for solving this problem, a transfer method and an ink jet method can be considered. Regarding the ink jet method, an image receiving layer method, a partition wall method, and a new hydrophobic method have been proposed, but these all have a problem that the number of steps increases. In contrast, the transfer method can provide a color filter layer directly on the plastic film surface, and the transfer method can transfer images continuously. Further, the development process in the transfer method has an advantage that the conventional process can be used. Furthermore, the method of directly applying a color sensitive material with a gravure coater or a die coater has an advantage that a further shortening of the process can be obtained.

  Thirdly, the plastic film has no gas barrier property as compared with the glass substrate, and there is a problem that the life of the plastic film is shortened by deteriorating the liquid crystal or the organic EL due to the contact of gas such as water vapor or oxygen.

  Therefore, an object of the present invention is to provide a method for manufacturing a color filter for a display device that suppresses a decrease in reliability due to various causes when used as a color filter.

In order to solve the above problems, a method for producing a color filter for a display device according to the present invention has a color filter layer formed by heat treatment on a plastic film, and the color filter layer is formed before the color filter layer is formed. A method for producing a color filter for a display device, wherein the plastic film is heated at a temperature equal to or higher than a heat treatment temperature at the time of forming a filter layer,
When the plastic film is heated prior to the formation of the color filter layer, the heating is continuously performed roll-to-roll using a heat treatment apparatus including at least a roll unwinding device, a heating furnace, and a roll winding device. It is characterized by.

  In this way, the heat resistance temperature of the plastic film can be increased by heating the plastic film at a temperature equal to or higher than the heating temperature at the time of forming the color filter layer before the formation of the color filter layer. As a result of the temperature being higher than the temperature, it is possible to reduce the dimensional change based on the heat treatment at the time of forming the color filter layer, and to manufacture a color filter for a display device with improved reliability.

  In this method of manufacturing a color filter for a display device, when the plastic film is heated prior to the formation of the color filter layer, the heating may be performed in an atmosphere excluding oxygen.

  Thereby, the coloring of a plastic film by an air oxidation etc. and the fall of intensity | strength can be prevented.

  In the method for producing a color filter for a display device, when the plastic film is heated prior to the formation of the color filter layer, the heating is performed using a heat treatment device including at least a roll unwinding device, a heating furnace, and a roll winding device. Continuous roll-to-roll.

  Thereby, a plastic film can be obtained by roll-to-roll, and productivity improves compared with the former which has obtained the plastic film in the cut sheet form.

  In this color filter manufacturing method, the color filter uses a transfer material in which a colored ionizing radiation curable resin layer is formed on a base plastic film, and the colored ionizing radiation curable resin layer is used as the transfer material. Thermally pressure-bonding on the plastic film substrate facing the plastic film substrate, and after exposing and exposing the base plastic film through a photomask before exposing the colored ionizing radiation curable resin layer, or exposure A continuous process of peeling the base plastic film and developing to form a colored pattern, and repeating these steps for a layer of colored ionizing radiation curable resin having a different hue, roll-to-roll It may be formed by a process.

  In the method for producing a color filter for a display device, the color filter is formed by directly applying a colored ionizing radiation curable resin layer on a plastic film substrate, then laminating a protective film, and through a photomask. And after the protective film is peeled off and exposed before exposing the colored ionizing radiation curable resin layer, or after the protective film is peeled off and developed to form a colored pattern, These steps may be repeated for layers of colored ionizing radiation curable resins having different hues so as to be formed by a roll-to-roll process.

  In the method for producing a color filter for a display device, the color filter is formed by directly coating a colored ionizing radiation curable resin layer on a plastic film substrate, and forming the colored ionizing radiation curable resin through a photomask. It is formed by a roll-to-roll process by repeating each of these steps for a layer of colored ionizing radiation curable resin having a different hue, including a continuous step of exposing the layer and developing to form a colored pattern. You may do it.

  According to these color filter forming methods, a colored layer can be effectively formed on a plastic film obtained by roll-to-roll. In addition, since the colored layer can be formed roll-to-roll, the colored layer forming process can be highly automated, and a color filter for a display device can be efficiently produced. .

  The method for manufacturing a color filter for a display device may further include a step of providing a gas barrier layer made of an inorganic thin film.

  Further, in the step of providing the gas barrier layer, the gas barrier layer is continuously rolled on a long roll of plastic film using a roll film forming apparatus including at least a roll unwinding device, a film forming device, and a roll winding device. The film may be formed by two rolls.

  Accordingly, gas barrier properties against water vapor, oxygen, and the like can be imparted to the color filter, and the life of the color display device due to the contact of gas such as water vapor, oxygen, and the like is prevented from being deteriorated.

  In any one of the above-described methods for producing a color filter for a display device, prior to heating the plastic film, the method may further include a step of irradiating and curing the photocurable resin, or prior to heating the plastic film. A step of heating and curing the thermosetting resin may be further included.

  According to this, after the process of forming a plastic film, the said plastic film is heat-processed at the temperature more than the heating temperature at the time of the above-mentioned color filter layer formation.

  According to the present invention, it is possible to suppress a decrease in reliability due to various causes when used as a color filter.

It is an enlarged plan view of the principal part of the color filter for display apparatuses which concerns on embodiment of this invention. 2A is a cross-sectional view taken along the plane AA in FIG. 1, and FIG. 2B is a cross-sectional view taken along the line BB in FIG. It is a figure which shows 1 pitch's worth of the coloring pattern in this embodiment. It is a figure which shows typically the structure of an example of the heat processing apparatus used by this embodiment. It is process sectional drawing which shows the manufacturing process of this embodiment. It is process sectional drawing which shows the manufacturing process of this embodiment. It is process sectional drawing which shows the manufacturing process of this embodiment. FIG. 8A is a plan view of a plastic film on which the black matrix pattern obtained in this embodiment is formed, and FIG. 8B is a cross-sectional view of the CC plane in FIG. 8A. FIG. 9A is a plan view of a plastic film on which a black matrix pattern and a RED coloring pattern obtained in this embodiment are formed, and FIG. 9B is a diagram of the DD plane in FIG. 9A. It is sectional drawing. It is process sectional drawing which shows the manufacturing process of this embodiment. It is process sectional drawing which shows the manufacturing process of this embodiment.

Embodiments of a method for manufacturing a color filter for a display device according to the present invention will be described below.
FIG. 1 is an enlarged plan view of a main part of the color filter for a display device according to this embodiment. 2A is a cross-sectional view taken along the plane AA in FIG. 1, and FIG. 2B is a cross-sectional view taken along the line BB in FIG.

  The color filter 10 is provided with a black matrix pattern 16 and an RGB coloring pattern composed of a red pattern 18, a green pattern 20 and a blue pattern 22 on the main surface of the plastic film 12 on which gas barrier layers 14 are formed on both sides, and further transparent. A column spacer 26 is provided in this order for securing a space between the electrode layer 24 and adjacent elements when stacked. Here, the gas barrier layer 14, the transparent electrode layer 24, and the column spacer 26 have arbitrary configurations and can be omitted as appropriate.

  Further, as shown in FIG. 1, the black matrix pattern 16 is provided in a lattice pattern on the plastic film 12, and each color pattern of the RGB coloring pattern is provided at the position of the square surrounded by the black matrix pattern 16. It has been. The column spacers 26 are provided on the intersections in the black matrix pattern 16 and / or on the black matrix pattern 16.

Here, the pattern of each color is arranged in a predetermined direction with a period of red, green, and blue.
FIG. 3 is a diagram showing one pitch of the colored pattern.
In FIG. 3, one pitch is constituted by the black matrix pattern 16, the red pattern 18, the black matrix pattern 16, the green pattern 20, the black matrix pattern 16, and the blue pattern 22 from the end face of the blue pattern 22 to the end face of the next blue pattern 22. An example is shown.

  The distance h for one pitch is appropriately determined depending on the required resolution and the like. For example, the distance h is determined in the range of 80 ppi to 200 ppi (corresponding to 320 μm to 125 μm), while the distance d between the colored patterns of each color is, for example, It is determined in the range of 5 to 10 μm. For example, when the distance h for one pitch is 126 μm, the width of the colored pattern of each color in the pitch direction can be 35 μm and the distance d can be 7 μm.

  Therefore, in the color filter manufacturing process, it is necessary to suppress an error in forming a colored pattern within several μm.

  Therefore, a color filter for a display device that makes it possible to minimize an error in forming a colored pattern (patterning process) in such a manufacturing process has a color filter layer formed by heat treatment on a plastic film. The plastic film is heated at a temperature equal to or higher than the heat treatment temperature for forming the color filter layer prior to the formation of the color filter layer.

  Thus, the plastic film that has been heat-treated at a predetermined temperature before the formation of the color filter layer can suppress dimensional changes that may occur when receiving a thermal history during the formation of the color filter layer. Patterning process errors can be minimized.

  Examples of the resin used for the plastic film include thermoplastic resins, crosslinkable resins, and multilayer films thereof. In particular, when a crosslinkable resin is used, deformation when stress such as tension is applied during heating is reduced.

  Examples of the crosslinkable resin include a photocrosslinkable resin and a heat crosslinkable resin. In addition, an acrylic resin can be used as the photocrosslinkable resin, and an epoxy resin can be used as the heat crosslinkable resin. When these resins are used, the compatibility between the processing method and the resin characteristics is good. Become.

  Moreover, the linear expansion coefficient of a plastic film can be 40 ppm / degrees C or less. In this case, dimensional deviation due to temperature variations during the patterning process can be kept small. This plastic film having a linear expansion coefficient of 40 ppm / ° C. or less can be obtained by including an inorganic substance in the crosslinkable resin.

  Examples of the inorganic material include silica, glass and other silicon oxide as a main component, and metal oxides such as alumina, zirconia and titania. Although not necessarily limited thereto, silicon dioxide is mainly used. When used as a component, the difference in refractive index between the inorganic substance and the resin is small, and it becomes easy to obtain good transparency. Further, the surface of these inorganic substances may be surface-treated with acrylic silane or the like.

  The plastic film used in the present invention preferably has a total light transmittance of 80% or more. In particular, when the resin is used by including an inorganic substance, the particle size of the inorganic substance in the plastic film is 100 nm or less, or the difference in refractive index between the crosslinkable resin and the inorganic substance in the plastic film is ± 0.005. By making it within the range, it becomes easy to obtain a film having a light transmittance of 80% or more.

  Furthermore, as the plastic film used in the present invention, one having a glass transition temperature of 200 ° C. or higher can be used. When a plastic film having such a glass transition temperature of 200 ° C. or higher is used, the problem of thermal deformation during post-baking of the color filter layer is less likely to occur as will be described later.

  Moreover, in this invention, it is also possible to set it as the structure which has an undercoat layer on the surface of a plastic film. By providing the undercoat layer, when the gas barrier layer is formed on the plastic film, the adhesion of the gas barrier layer to the plastic film can be further improved. Examples of such an undercoat layer include acrylic crosslinkable resins and epoxy crosslinkable resins, but are not particularly limited thereto.

  Plastic films generally transmit gases such as oxygen and water vapor, but when applied to, for example, liquid crystal displays and organic EL displays such as color filters for display devices using glass substrates, the gas permeability is very high. It is necessary to be low, and by providing the gas barrier layer on the surface, it is possible to provide the properties required for such a color filter for a display device. In this case, it is particularly preferable to have a gas barrier layer of an inorganic thin film with little change in transmittance due to temperature and humidity.

  Here, the material of the inorganic thin film that can be used as the gas barrier layer is one or more selected from Si, Al, In, Sn, Zn, Ti, Cu, Ce, Mg, La, Cr, Ca, Zr, and Ta. Including, but not limited to, one or more selected from Si, Ta, and Al is included. Those mainly composed of oxide, nitride or oxynitride are particularly preferred. The inorganic gas barrier layer may be one layer or two or more layers.

  The method for producing a color filter for a display device according to the present invention includes a step of forming a plastic film as a base material, and a step of forming a color filter layer on the formed plastic film. Prior to forming the plastic film, the plastic film is processed at a temperature higher than the highest temperature employed in the process of forming the color filter layer, preferably 10 ° C. or higher, more preferably 30 ° C. or higher. The process to perform is included.

  In the process of processing a plastic film, the heat treatment time of the plastic film is higher at a temperature higher by 30 ° C. than at a higher processing temperature, that is, a temperature about 10 ° C. higher than the heating temperature at the time of forming the color filter. Is preferable because it is effective even for a short time.

  Here, when heat-treating the plastic film, it can be carried out in a heating furnace such as a hot air oven, an infrared furnace, a hot plate or the like. Further, when this heat treatment is performed under conditions excluding oxygen, such as a vacuum atmosphere or a nitrogen substitution atmosphere, it is preferable because coloring of the plastic film due to air oxidation or the like and prevention of strength reduction can be prevented.

FIG. 4 is a diagram schematically illustrating a configuration of an example of the heat treatment apparatus.
In this heat treatment apparatus 40, the plastic film 48 unwound from the roll unwinding apparatus 42 in which a roll-shaped plastic film is set to be unwindable is conveyed to a heating furnace 44 equipped with a heater 56, and the predetermined film After being heat-treated at a temperature equal to or higher than the temperature, it is wound up by a roll winding device 46.

  Here, in order to make the plastic film 48 stretch in the heating furnace 44, nip rolls 50 and 54 are provided at the unwinding port and the winding port, respectively, so that the tension of the plastic film 48 can be controlled. It has become. Furthermore, a tension measuring roll 52 is also provided on the unwinding port side of the heating furnace 44, and the operation of the nip rolls 50 and 54 is controlled in accordance with the tension measurement result, thereby enabling the feedback control of the tension of the plastic film 48.

  Thus, when using a heat treatment apparatus equipped with a roll unwinding device, a heating furnace, and a roll winding device, the heat treatment can be performed continuously in a roll-to-roll manner, thereby increasing the production efficiency. Can do.

Subsequently, a gas barrier layer 14 is formed on the plastic film 12 (FIG. 5A) heat-treated at a predetermined temperature (FIG. 5B).
Such a gas barrier layer can be produced by a physical vapor deposition (PVD) method such as vapor deposition, ion plating or sputtering, a chemical vapor deposition method such as plasma CVD (chemical vapor deposition), or a sol-gel method, among others. It is preferable because a dense film, that is, a film having a good gas barrier property is easily obtained.

  Either a single wafer or a roll-to-roll process can be applied to the process of forming the inorganic gas barrier layer. Since film formation is performed on a plastic film, roll-to-roll is preferable because productivity is improved.

By providing such a gas barrier layer, the gas permeability can be reduced. However, the color filter preferably has a water vapor permeability of 0.1 g / m ² · 24 h or less, and an oxygen permeability of 0. it is preferred because it can longer life before failure due to bubble generation occurs in the liquid crystal layer of the liquid crystal display is less than ^{5ml / m 2 · 24h · atm} .

  Subsequently, a color filter layer is formed on the surface of the plastic film on which the gas barrier layer is formed. In the following, an embodiment for forming a color pattern with a black matrix and RGB colorants in the step of forming a color filter layer will be described.

  In the present invention, the black matrix and the RGB color pattern can be formed by photolithography. In this embodiment, it can be performed in a single sheet (cut sheet form) or in a roll-to-roll continuous process. In particular, when it is carried out in a roll-to-roll continuous process, productivity is high.

  Here, the black matrix and the colorant are either a photosensitive resin composition, a black matrix forming coating composition and a coloring pattern forming coating composition, which are directly applied onto a plastic film and patterned and heat cured, These coating compositions can be separately applied in advance on a base film and dried to form a dry film, which is laminated on a plastic film serving as a substrate, transferred, patterned, and thermally cured.

Here, examples of the photosensitive resin composition include a radiation-sensitive composition containing (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photopolymerization initiator. It is done.
The colorant (A) is a material for color-displaying each colored pattern or shielding the black matrix pattern when the color filter is irradiated with transmitted light. Examples of the coloring material include a red organic pigment and a green organic material. Examples of pigments, blue organic pigments, and light-shielding materials include carbon black pigments.
The alkali-soluble resin (B) is a material that dissolves during development to remove the layer of the photosensitive resin composition, and examples thereof include a benzyl methacrylate / methacrylic acid copolymer.
The polyfunctional monomer (C) is a material for polymerizing a layer of the photosensitive resin composition at the time of exposure to form an insoluble pattern at the time of development. For example, dipentaerythritol hexa An acrylate is mentioned.
The photopolymerization initiator (D) is a material for polymerizing a polyfunctional monomer during exposure. For example, 2-benzyl-2-dimethylamino-1- (4-monophoriophenyl) butanone-1 Can be mentioned.
By using such a radiation-sensitive composition, a high-resolution colored pattern and a black matrix pattern can be formed on a roll-to-roll, and a flexible pattern that follows the flexibility of a plastic film can be formed.

  Here, a mode in which a black matrix is laminated on a plastic film from a dry film will be described. The dry film for black matrix paint used here is a paint composition layer in which a black matrix-forming paint composition is applied on a base film 62 (FIG. 6A) in a wet state using a die coat and dried. After forming 64 (FIG. 6B), the cover film 66 can be laminated as shown in FIG. 6C.

  As a coating method of the coating composition, there are gravure coating, gravure reverse coating, slit reverse coating, micro gravure coating, comma coating, slide coating, spray coating, curtain coating and the like in addition to die coating.

  The thickness of the base film 62 is preferably 2.5 to 100 [mu] m, more preferably 6 [mu] m or more in order to improve the transportability of the film, and 50 [mu] m to increase the followability to the unevenness of the substrate to be transferred. The following is more preferable.

  The base film 62 is made of polyethylene terephthalate (PET), polyethylene, polypropylene, polyester, polyolefin, polyacrylonitrile, ethylene vinyl acetate copolymer (EVA), cellulose triacetate (TAC), polyethylene naphthalate, polycarbonate, Examples thereof include single films and multilayer films of synthetic resins such as polyphenylene sulfide, polyimide, polyvinyl chloride, polyethersulfone, polyamideimide, polyamide, and aromatic polyamide. Of these, polyethylene terephthalate is preferable because of its excellent transparency and smoothness.

  On the other hand, the thickness of the cover film 66 is preferably 2.5 to 100 μm, and more preferably 6 to 50 μm in consideration of the peelability from the base film 62. The cover film 66 is made of polyethylene terephthalate (PET), polyethylene, polypropylene, polyester, polyolefin, polyacrylonitrile, ethylene vinyl acetate copolymer (EVA), cellulose triacetate (TAC), polyethylene naphthalate, polycarbonate, polyphenylene. Examples thereof include synthetic resins such as sulfide, polyimide, polyvinyl chloride, polyethersulfone, polyamideimide, polyamide, and aromatic polyamide. Among them, polyethylene terephthalate is preferable because of its excellent transparency and smoothness.

  The cover film 66 is peeled in advance from the dry film thus obtained, and as shown in FIG. 7, the base film 62 is disposed so that the coating composition layer 64 faces the gas barrier layer 14 on the plastic film 12 serving as the substrate. Are laminated, and the layer of the photosensitive resin composition for forming the black matrix is subjected to heat and pressure treatment with a pressure and heating roller and continuously transferred to prepare a laminated original fabric 70.

  Here, for the heat and pressure treatment, a general pressure and heating roller can be used. Specifically, the film can be sandwiched between two upper and lower rolls, and the other roll is heated by one roll. It has a structure that receives pressure. A material whose surface is mainly covered with heat-resistant rubber is used for one roll, and a chromium roll-treated metal roll is used for the other. Thus, pressurization can be made uniform by using one as a rubber roll and the other as a metal roll.

  As a result of various experiments conducted by the inventors, it has been found that the upper roll is covered with heat-resistant rubber and can be heated, and the lower roll is a metal roll, so that temperature control is performed with higher accuracy and transfer quality is improved. I found it.

Further, the conditions of the pressure heat treatment are such that the roller pressure is 0.5 to 10 kg / cm ² , the heating temperature is 50 to 150 ° C., and the conveyance speed is 100 to 2000 mm / min, thereby improving the transfer quality. be able to. The reason for this is that if the roller pressure and heating temperature are low, the adhesion between the transfer layer and the substrate to be transferred becomes insufficient and defects in the transfer tend to occur, and conversely if it is high, the transfer layer, the non-transfer substrate and the base film For example, deformation or the like may occur due to the influence of heat pressure on the toner, and transfer quality may deteriorate. If the conveying speed is low, the throughput is lowered and the transfer quality is deteriorated due to heat pressure. If it is fast, the heat pressure is insufficient at the time of transfer, and the transfer is not performed accurately.

  Next, an exposure treatment is performed on the layer of the photosensitive resin composition, with the base film peeled off as necessary, on the heated and pressure-treated laminated original fabric.

  In addition, when the photosensitive resin composition, which is a black matrix forming coating composition, is applied directly on a plastic film, all of the above steps are omitted or a base film is laminated after application to create a laminated original fabric, You may perform an exposure process in the state which attached the base film on the layer of the photosensitive resin composition to this lamination | stacking original fabric.

  In the step of exposing to the photosensitive resin composition, an exposure unit having an exposure table for exposing light from a light source described later, and an unwinding device upstream to introduce the photosensitive resin composition into the exposure unit, The exposure apparatus having a winding device on the downstream side and further a pair of nip rolls on the inlet side and the outlet side is passed through the lamination raw material obtained above, and the continuous lamination raw material is driven by driving the nip roll pair. In the exposure section, the laminated original fabric is attracted and fixed on the exposure table, and the laminated original fabric is exposed by proxy exposure.

  It is preferable that the driving of the nip roller is stopped while the laminated raw material is adsorbed and fixed on the exposure table. In addition, with respect to the tension applied to the original fabric during conveyance, from the viewpoint that if the strength is weak, the meandering of the original fabric is likely to occur due to poor conveyance, and if the tension is strong, the elongation of the original fabric is affected. The width is preferably 300 mm.

  In addition, the above-described raw material conveyance form is separate from the apparatus for performing the black matrix coating or the patterning process using the base film, the apparatus for performing the exposure / development process, and the baking apparatus described below. However, in the case of a continuous device configuration, the idea of winding in each device is not necessarily required.

  Here, the temperature of the exposure unit of the exposure apparatus is 20 ° C. ± 0.1 ° C. to 25 ° C. ± 0 in consideration of the temperature at the time of exposure of the apparatus, the air temperature that is the fluctuation range of the humidity condition, and the atmospheric stability of humidity. It is preferable that the humidity is 50% ± 1% to 65% ± 1% in consideration of the stability of each material and the hygroscopicity of the material at this temperature.

  Further, the interval (gap) between the base film of the laminated raw fabric or the photosensitive resin composition layer for forming the black matrix and the pattern (photomask) is automatically adjusted every time so as to be constantly constant. The gap amount in this case considers the resolution of the pattern to be formed. That is, if the gap amount is too large, the resolution decreases, and conversely, the resolution improves and adhesion of dust and dirt to the photomask increases. Therefore, 5 to 200 μm is preferable.

  In addition, the exposure position of the pattern of the laminated film is automatically detected from the distance from the end surface of the laminated film, and exposure is performed after automatic adjustment so that the photomask pattern position is a fixed distance from the laminated film according to the detection result. . At this time, it is preferable to create an alignment mark for aligning the exposure position when forming a color pattern for each color of RGB described later.

  Examples of the light source used in the exposure process include a high-pressure mercury lamp, a DEEP UV lamp, a metal halide lamp, a low-pressure mercury lamp, and a halogen lamp. When the above-described photosensitive resin composition for forming a black matrix is used. In particular, exposure using a wavelength of 350 to 450 nm is preferable from the viewpoint of sensitivity and resolution.

  Subsequently, development processing and post-baking processing are performed. The development process is performed by a developing device installed on the downstream side of the exposure machine. Specifically, the layered film after exposure is conveyed at a constant speed and the base film is peeled off while developing on the surface of the peeled plastic film. By discharging the liquid in a spray form at room temperature, a composite film in which a black matrix having a predetermined pattern is laminated on a plastic film can be obtained. In addition, when the exposure is performed with the base film attached, the developer is applied after the base film is peeled off and developed. Thereafter, the composite film is passed through a baking furnace while being conveyed at a constant speed in a continuous baking furnace, and subjected to baking treatment, whereby the resin pattern of the black matrix can be thermally cured. Here, the baking temperature is preferably 120 to 250 ° C., if the temperature is too low, thermal curing is insufficient, and if the temperature is high, the resin is yellowed.

FIG. 8A is a plan view of the plastic film on which the black matrix pattern obtained in this way is formed, and FIG. 8B is a cross-sectional view of the CC plane in FIG. 8A.
According to FIGS. 8A and 8B, the black matrix pattern 16 is formed on the gas barrier layer 14 of the plastic film 12 in a lattice shape.

  Subsequently, after forming a black matrix pattern, an RGB coloring pattern is formed. When the RGB coloring pattern is transferred using a dry film as described above, a dry film of a coloring material corresponding to each color of RGB can be formed in the same manner as in the case of the black matrix described above.

  For example, in order to pattern red (RED) in a black matrix, a plastic film having a black matrix formed thereon is prepared, and then a RED dry film having a cover film previously peeled off is applied to the coating composition layer on the plastic film side. Lamination is carried out so as to face each other, and a layer of a photosensitive resin composition for forming a colored pattern corresponding to RED is continuously transferred by a pressure heating roller to form a laminated original fabric. The transfer process of the colored pattern by the pressure heating roller can be performed by the same apparatus and conditions as the black matrix formation described above.

  Next, in the exposure process for the transferred RED coloring pattern, alignment is performed using an alignment mark patterned simultaneously with the black matrix. Thereafter, an exposure process, a development process, and a post-bake process are performed in the same manner as in the case of the black matrix, and a heat-cured colored pattern can be formed on the plastic film on which the black matrix is formed.

  In addition, it can carry out similarly to the case of black matrix formation also by apply | coating the photosensitive resin composition for colored pattern formation directly on the said plastic film with black matrix formation, and forming a colored pattern.

FIG. 9A is a plan view of the plastic film on which the black matrix pattern and the RED coloring pattern obtained as described above are formed, and FIG. 9B is a diagram of the DD plane in FIG. 9A. It is sectional drawing.
According to FIGS. 9A and 9B, red patterns 18 that are RED coloring patterns are formed at predetermined intervals in the square area surrounded by the black matrix pattern 16 formed in a lattice shape.

  Furthermore, GREEN and BLUE can be formed in the same manner on a plastic film on which a black matrix and RED are formed. A transparent overcoat layer may be provided on these layers. Furthermore, the order of forming the black matrix and the RGB colorant can be arbitrarily determined. Further, two or more layers may be continuously formed in a single roll-out-roll-to-roll process.

FIG. 10 is a cross-sectional view of the main part of the plastic film on which the black matrix pattern and the colored pattern of each color of RED thus obtained are formed.
According to FIG. 10, the red pattern 18, the green pattern 20, and the blue pattern 22 are periodically formed in each square area surrounded by the black matrix pattern 16 formed in a lattice shape.

  Further, a transparent conductive layer and a column spacer may be provided on the black matrix pattern and the RGB coloring pattern formed on the plastic film.

  The transparent conductive layer is formed by, for example, roll-to-roll sputtering or vapor deposition. Examples of the transparent electrode layer include thin films formed of thin films such as indium tin oxide (ITO), zinc oxide, tin oxide, and indium zinc oxide (IZO), but the material is not limited to this.

FIG. 11 is a cross-sectional view of the main part of the plastic film in which the transparent electrode layer 24 is formed on the black matrix pattern and the colored patterns of each color of RED thus obtained.
According to FIG. 11, the transparent electrode layer 24 is formed on the RGB colored pattern composed of the black matrix pattern 16, the red pattern 18, the green pattern 20, and the blue pattern 22.

  For example, the column spacer is formed by applying a column spacer material paint on a base film in a wet state using a die coater, drying, pre-baking after drying, and further using a dry film obtained by laminating a cover film. The transfer process, the exposure process, the development process and the post-bake process similar to those for the black matrix and the colorant are carried out to form a black matrix and a color pattern (for example, RGB), and in some cases, the plastic film on which the transparent conductive layer is formed. Formed on the surface.

  Examples of the column spacer include negative photosensitive resins such as acrylic resins and positive photosensitive resins such as novolac resins.

  As the material of the base film, for example, PET can be used as described above. Examples of column spacer material paints include negative photosensitive resins such as acrylic resins, and positive photosensitive resins such as novolac resins. As the material of the cover film, for example, PET can be cited as described above. Moreover, as conditions of a prebaking process, 0.5 to 10 minutes are mentioned in the range of 50-120 degreeC.

  The color filter in which the column spacers are formed in this way is shown in FIGS. 1, 2A and 2B.

  As described above, according to this embodiment, a color filter can be accurately manufactured using a plastic film as a substrate. Thereby, a thin and light color display device using a plastic film as a substrate can be manufactured efficiently and inexpensively.

  EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited thereto.

Example 1
(Manufacture of plastic film)
A film comprising 32 parts of alicyclic epoxy resin, 18 parts of silica filler with an average particle size of 50 nm, 50 parts of solvent (parts are based on mass) and a die coater, a stainless steel endless belt, and a drying furnace Cast on the stainless steel endless belt of the film forming apparatus, heat to 150 ° C in a drying oven, dry and cure, then peel continuously from the endless belt, and then heat cure to 170 ° C in a continuous drying oven. Then, a plastic film (1) having a width of 30 cm, a length of 100 m, and a thickness of 100 μm was obtained. Further, heating was performed at 220 ° C. for 20 minutes using a continuous drying furnace set by replacing the heating furnace 14 of the heat treatment apparatus 10 shown in FIG. 2 with nitrogen. When the linear expansion coefficient and glass transition temperature of this plastic film (1) at 30 ° C. to 150 ° C. were measured, they were 30 ppm / ° C. and 225 ° C., respectively. The light transmittance at a wavelength of 550 nm was 87%.

(Gas barrier layer deposition)
This plastic film (1) is loaded into a sputter roll coater, and SiOx having a film thickness of 50 nm is formed on the undercoat using Si as a target by reactive sputtering using oxygen as a reactive gas by DC sputtering. 5 to 1.9) was formed, and this was used as a gas barrier layer.

(Formation of black matrix)
As shown below, a laminated raw fabric is prepared, and this is used to perform lamination, exposure processing, development processing, and baking processing in a roll-to-roll manner. A black matrix was formed on the film (1).
(Preparation of dry film)
As a dry film for a black matrix coating, a black matrix-forming coating composition having the following composition is applied onto a PET base film having a thickness of 25 μm using a die coater so that the thickness becomes 10 μm in a wet state. Then, after pre-baking for 2 minutes at a temperature of 90 ° C. to obtain a thickness of 2 μm, a PET cover film having a thickness of 25 μm was laminated thereon.

(Black matrix forming coating composition)
The composition of the black matrix forming coating composition is shown below.
150 parts of benzyl methacrylate / methacrylic acid copolymer (molar ratio = 73/27)
・ Dipentaerythritol hexaacrylate 80 parts ・ Carbon black dispersion 150 parts ・ Photopolymerization initiator (2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1) 2.5 parts ・ Propylene glycol 600 parts monomethyl ether acetate * All parts are based on mass

(Creation of laminated raw material)
A photosensitive resin composition for forming a black matrix is formed by laminating a dry film having a cover film previously peeled on a plastic film (1) on which a gas barrier layer is formed so that the coating composition layer faces the plastic film side. The coating composition layer consisting of was continuously transferred under the conditions of roller pressure: 5 kg / cm ² , roller surface temperature: 120 ° C., and speed: 800 mm / min, to produce a laminated original fabric. At this time, the base film was not peeled off, and proceeded to the next exposure processing step in a state of being attached on the layer of the photosensitive resin composition.

(Exposure process)
Through the unwinding device on the upstream side and the exposure device provided with the winding device on the downstream side, the laminated raw material obtained above is passed, and the nip roller pair installed on the entrance side and the exit side of the exposure device is driven, A continuous laminated raw material was conveyed. In this conveying state, the tension applied to the laminated original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the laminated original fabric was adsorbed and fixed on the exposure table, the gap (gap) between the base film of the laminated original fabric and the pattern (photomask) was automatically adjusted to be 30 μm. In addition, the exposure position of the pattern on the stack is automatically detected from the distance from the end surface of the stack, and exposure is performed after automatic adjustment so that the photomask pattern position is a fixed distance from the stack in accordance with the detection result. It was. As a light source, a high-pressure mercury lamp was used, the exposure area was 200 mm × 200 mm, I-line (wavelength: 365 nm) was used, and exposure was performed at an illuminance of 15 mW / cm ² for 20 seconds to obtain an exposure amount of 300 mJ / cm ² . .

(Development and post-baking process)
The developing process is performed by installing a developing device on the downstream side of the exposure machine, peeling the base film of the laminated raw material after exposure in the developing device, and transporting it at a constant speed of 400 mm / min. A composite film was obtained in which a black matrix having a predetermined pattern was laminated on a plastic film (1) having a film formed thereon. Thereafter, post baking was performed at 200 ° C. for 30 minutes in a baking furnace, and the resin pattern of the black matrix was thermally cured.

  The obtained black matrix was measured under the conditions of temperature; 23 ° C. ± 0.1 ° C., relative humidity; 60% ± 1%, and was within a range of ± 2 μm per 200 mm with respect to the design dimension.

(Formation of RGB coloring pattern)
Next, a layered raw material for RGB transfer was prepared as follows, and using this layered raw material, an RGB coloring pattern was formed by roll-to-roll to obtain a color filter.
(Preparation of dry film)
As a dry film for coloring material coating, a coating composition for forming a colored pattern having the following composition is applied on a PET base film having a thickness of 25 μm using a die coater so that the thickness becomes 10 μm in a wet state. Then, after pre-baking for 2 minutes at a temperature of 90 ° C. to obtain a thickness of 2 μm, a PET cover film having a thickness of 25 μm was laminated thereon.

(Coloring pattern forming coating composition)
The composition of RED, which is a red paint composition, is shown below. When the red pigment is an arbitrary blue pigment, a BLUE composition is obtained, and when a red pigment is used, a GREEN composition is obtained.

Benzyl methacrylate / methacrylic acid copolymer 50 parts (molar ratio = 73/27)
40 parts trimethylolpropane triacrylate 90 parts red pigment (CI Pigment Red 177) Photoinitiator (2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone-1 ) 1.5 parts · Propylene glycol monomethyl ether acetate 600 parts * All parts are based on mass

(Creation of laminated raw material)
On the composite film with the black matrix pattern obtained above, a RED dry film from which the cover film has been peeled in advance is laminated so that the coating composition layer faces the plastic film side. The coating composition layer composed of the composition was continuously transferred under the conditions of roller pressure: 5 kg / cm ² , roller surface temperature: 120 ° C., and speed: 800 mm / min to prepare a laminated original fabric. At this time, the base film was not peeled off, and proceeded to the next exposure processing step in a state of being attached on the layer of the photosensitive resin composition.

(Exposure process)
Through the unwinding device on the upstream side and the exposure device provided with the winding device on the downstream side, the laminated raw material obtained above is passed, and the nip roller pair installed on the entrance side and the exit side of the exposure device is driven, A continuous laminated raw material was conveyed. In this conveying state, the tension applied to the laminated original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the laminated original fabric was adsorbed and fixed on the exposure table, the gap (gap) between the base film of the laminated original fabric and the pattern (photomask) was automatically adjusted to be 30 μm. In addition, the exposure position of the pattern of the laminated original fabric is automatically detected by detecting the distance from the end surface of the laminated original fabric, and automatically adjusting the position of the photomask pattern from the laminated original fabric to a certain distance according to the detection result. Alignment with the photomask for RED was performed using the alignment mark formed simultaneously with the matrix formation, and then exposure was performed. As a light source, a high-pressure mercury lamp was used, the exposure area was 200 mm × 200 mm, I-line (wavelength: 365 nm) was used, and exposure was performed at an illuminance of 15 mW / cm ² for 20 seconds to obtain an exposure amount of 100 mJ / cm ² . .

(Development and post-baking process)
The development process is performed by installing a developing device on the downstream side of the exposure machine, peeling the base film of the laminated raw material after exposure in the developing device, and transporting it at a constant speed of 400 mm / min. A composite film in which the RED pattern was laminated at a predetermined position of the opening of the black matrix pattern on the composite film with the matrix pattern was obtained. Thereafter, post baking was performed at 200 ° C. for 30 minutes in a baking furnace, and the RED resin pattern was thermally cured.

  Also, for GREEN and BLUE, a plastic film (1) in which a dry film is prepared using each colorant and a pattern similar to the above RED is repeated to form each pattern and a gas barrier layer is formed. A color filter having a black matrix and RGB coloring patterns formed thereon was obtained.

(Formation of ITO electrode layer)
Subsequently, this color filter is loaded into a sputter roll coater, and a black matrix and an RGB color pattern are formed by reactive sputtering using oxygen as a reactive gas by DC sputtering and using ITO (indium tin oxide) as a target. An ITO film having a thickness of 150 nm was formed on the color filter, and this was used as a transparent conductive film.

(Formation of column spacer)
(Preparation of dry film) As a dry film for a column spacer (CS) material paint, a CS material paint composition made of a negative photosensitive resin on a PET base film having a thickness of 25 μm, and a thickness of 20 μm in a wet state. After coating using a die coater and drying, prebaking was performed for 2 minutes at a temperature of 90 ° C. to obtain a thickness of 5 μm, and a PET cover film having a thickness of 25 μm was laminated thereon.

(Creation of laminated raw material)
On the composite film on which the black matrix and RGB coloring patterns obtained above and the ITO electrode layer were formed, a CS dry film from which the cover film had been peeled in advance was laminated so that the coating composition layer faced the plastic film side. The coating composition layer made of the photosensitive resin composition for forming the CS pattern is continuously transferred under the conditions of roller pressure: 5 kg / cm ² , roller surface temperature: 120 ° C., and speed: 800 mm / min. Then, a laminated raw material was created. At this time, the base film was not peeled off, and the process proceeded to the next exposure step with the base film attached on the layer of the photosensitive resin composition.
(Exposure process)
Through the unwinding device on the upstream side and the exposure device provided with the winding device on the downstream side, the laminated raw material obtained above is passed, and the nip roller pair installed on the entrance side and the exit side of the exposure device is driven, A continuous laminated raw material was conveyed. In this conveying state, the tension applied to the laminated original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the laminated original fabric was adsorbed and fixed on the exposure table, the gap (gap) between the base film of the laminated original fabric and the pattern (photomask) was automatically adjusted to be 30 μm. In addition, the exposure position of the pattern of the laminated original fabric is automatically detected by detecting the distance from the end surface of the laminated original fabric, and automatically adjusting the position of the photomask pattern from the laminated original fabric to a certain distance according to the detection result. After alignment with the CS photomask using the alignment marks formed simultaneously with the matrix formation, exposure was performed. As the light source, using a high-pressure mercury lamp, an exposure area as 200 mm × 200 mm, I-line (wavelength; 365 nm) using an exposure for 20 seconds at an intensity of 15 mW / cm ^2, and an exposure amount of 300 mJ / cm ² .

(Development and post-baking process)
The development process is performed by installing a developing device on the downstream side of the exposure machine, peeling the base film of the laminated raw material after exposure in the developing device, and transporting it at a constant speed of 400 mm / min. A composite film in which a CS pattern was formed at a predetermined position of the lattice pattern portion of the black matrix pattern on the composite film on which the matrix pattern and the RGB coloring pattern and the ITO electrode layer were formed was obtained. Thereafter, post-baking treatment was performed at 200 ° C. for 30 minutes in a baking furnace to heat cure the CS resin pattern.

  In this way, a color filter in which a black matrix and RGB coloring patterns, an ITO electrode layer and CS were formed on the plastic film (1) on which the gas barrier layer was formed was obtained.

  Further, when this color filter pattern was measured under the conditions of temperature; 23 ° C. ± 0.1 ° C. and relative humidity; 60% ± 1%, it was within the range of ± 2 μm per 200 mm with respect to the design dimension.

The water vapor permeability of the color filter was measured based on JIS K7129B method was 0.02g ^/ m 2 · 24h. The oxygen permeability was 0.1 ml / m ² · 24 h · atm.

(Example 2)
(Manufacture of plastic film)
A liquid in which 27 parts of a polyfunctional acrylate resin, 23 parts of silica filler with an average particle size of 30 nm, and 50 parts of propylene glycol monomethyl ether (parts are based on mass) are uniformly dispersed is added to a die coater, a stainless steel endless belt, and a drying furnace. Cast on a stainless steel endless belt of the film deposition equipment provided, heat to 150 ° C in a drying oven, dry and cure, then peel continuously from the endless belt, and then heat to 170 ° C in a continuous drying oven It was cured and wound up to obtain a plastic film having a width of 30 cm, a length of 100 m, and a thickness of 100 μm. Using a coater head, a drying furnace, and a coating machine with an ultraviolet irradiation device, apply a liquid consisting of a polyfunctional acrylate resin, photoinitiator, and solvent on both sides of the film, dry the solvent, and then irradiate with ultraviolet rays. And a plastic film (2) having an undercoat layer formed thereon was obtained. The plastic film (2) had a light transmittance of 89% at a wavelength of 550 nm.

(Gas barrier layer deposition)
This plastic film (2) was loaded into a sputter roll coater having a pretreatment chamber capable of heat treatment with a heater, and heating at 230 ° C. for 10 minutes in a vacuum and sputter film formation were continuously performed. In the sputtering film formation, TaOx (x is 1.5 to 2.5) having a film thickness of 50 nm is formed on the undercoat by RF sputtering using Ta ₂ O ₅ as a target, and this is used as a gas barrier layer. . Moreover, when the linear expansion coefficient and glass transition temperature in 30 to 150 degreeC were measured, they were 27 ppm / degrees C and 240 degreeC, respectively.

(Formation of black matrix)
(Black matrix forming coating composition application process)
On the gas barrier layer of the plastic film (2) on which the gas barrier layer is formed, a black matrix-forming coating composition having the following composition is applied using a die coater so as to have a thickness of 10 μm in a wet state and dried. After that, prebaking was performed for 2 minutes at a temperature of 90 ° C. to obtain an original fabric on which a coating film of a coating composition for forming a black matrix having a thickness of 2 μm was formed.

(Black matrix forming coating composition)
The composition of the black matrix forming coating composition is shown below.
150 parts of benzyl methacrylate / methacrylic acid copolymer (molar ratio = 73/27)
・ Dipentaerythritol hexaacrylate 80 parts ・ Carbon black dispersion 150 parts ・ Photopolymerization initiator (2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1) 2.5 parts ・ Propylene glycol 600 parts monomethyl ether acetate * All parts are based on mass

(Exposure process)
A pair of nip rollers installed on the entrance side and the exit side of the exposure apparatus are passed through an exposure apparatus provided with an unwinding apparatus on the upstream side and a winding apparatus on the downstream side through the raw material on which the coating film obtained above is formed. Was driven to convey a continuous raw material. In this conveying state, the tension applied to the original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the original film on which the coating film was formed was adsorbed and fixed on the exposure table, the gap (gap) between the surface of the original film and the pattern (photomask) was automatically adjusted to 100 μm. Further, the exposure position of the original pattern was automatically detected by detecting the distance from the end face of the original pattern, and exposure was performed after automatic adjustment so that the photomask pattern position would be a fixed distance from the original pattern according to the detection result. As a light source, a high-pressure mercury lamp was used, the exposure area was 200 mm × 200 mm, I-line (wavelength: 365 nm) was used, and exposure was performed at an illuminance of 15 mW / cm ² for 20 seconds to obtain an exposure amount of 300 mJ / cm ² . .

(Development and baking process)
The development process is carried out by installing a developing device downstream of the exposure machine, and carrying the original film after exposure at a constant speed of 400 mm / min in this developing device to form a plastic film (2 A composite film in which a black matrix having a predetermined pattern was laminated thereon was obtained. Thereafter, post baking was performed at 200 ° C. for 30 minutes in a baking furnace, and the resin pattern of the black matrix was thermally cured.
The obtained black matrix was measured under the conditions of temperature; 23 ° C. ± 0.1 ° C., relative humidity; 60% ± 1%, and was within a range of ± 2 μm per 200 mm with respect to the design dimension.

(Formation of RGB coloring pattern)
On the composite film on which the black matrix pattern obtained above is formed, a coating composition for forming a colored pattern having the following composition is applied using a die coater so as to have a thickness of 10 μm in a wet state, and after drying , Temperature: prebaked for 2 minutes under the condition of 90 ° C. to obtain an original fabric on which a coating film having a thickness of 2 μm was formed.

(Coloring pattern forming coating composition)
The composition of RED, which is a red paint composition, is shown below. When the red pigment is an arbitrary blue pigment, a BLUE composition is obtained, and when a red pigment is used, a GREEN composition is obtained.

Benzyl methacrylate / methacrylic acid copolymer 50 parts (molar ratio = 73/27)
40 parts of trimethylolpropane triacrylate 90 parts of red pigment (CI Pigment Red 177) Photoinitiator (2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone-1 ) 1.5 parts · Propylene glycol monomethyl ether acetate 600 parts * All parts are based on mass

(Exposure process)
Pass the raw material obtained above through an exposure apparatus equipped with an unwinding device on the upstream side and a winding device on the downstream side, and drive a pair of nip rollers installed on the inlet side and the outlet side of the exposure device to continuously The raw material was conveyed. In this conveying state, the tension applied to the original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the original film was adsorbed and fixed on the exposure table, the gap (gap) between the surface of the original film and the pattern (photomask) was automatically adjusted to 100 μm. In addition, the exposure position of the original pattern is automatically detected by detecting the distance from the end face of the original film, and after the automatic adjustment so that the photomask pattern position is a fixed distance from the original film according to this detection result, After aligning with the photomask for RED using the alignment mark formed simultaneously, exposure was performed. As a light source, a high-pressure mercury lamp was used, the exposure area was 200 mm × 200 mm, I-line (wavelength: 365 nm) was used, and exposure was performed at an illuminance of 15 mW / cm ² for 20 seconds to obtain an exposure amount of 100 mJ / cm ² . .

(Development and post-baking process)
The development processing is performed by installing a developing device downstream of the exposure machine, and transporting the exposed raw material at a constant speed of 400 mm / min in the developing device, thereby opening the black matrix pattern on the composite film. A composite film having a RED pattern laminated at a predetermined position was obtained. Thereafter, post baking was performed at 200 ° C. for 30 minutes in a baking furnace, and the RED resin pattern was thermally cured.

  For GREEN and BLUE, the same method as in RED is repeated using the respective colorants to form each pattern, and a black matrix and a black matrix are formed on the plastic film (2) on which the gas barrier layer is formed. A color filter in which an RGB coloring pattern was formed was obtained.

(Formation of ITO electrode layer)
Subsequently, this color filter is loaded into a sputter roll coater, and a black matrix and an RGB color pattern are formed by reactive sputtering using oxygen as a reactive gas by DC sputtering and using ITO (indium tin oxide) as a target. An ITO film having a thickness of 150 nm was formed on the color filter, and this was used as a transparent conductive film.

(Formation of column spacer)
(Coating process for forming column spacers)
A coating composition for forming a column spacer (CS) made of a negative photosensitive resin on the composite film on which the black matrix pattern and the RGB coloring pattern obtained above, and the ITO electrode layer are formed, in a wet state. It was applied using a die coater so as to have a thickness of 20 μm, dried, and then pre-baked for 2 minutes at a temperature of 90 ° C. to obtain a composite film on which a CS film having a thickness of 5 μm was formed.

(Exposure process)
Pass the raw material obtained above through an exposure apparatus equipped with an unwinding device on the upstream side and a winding device on the downstream side, and drive a pair of nip rollers installed on the inlet side and the outlet side of the exposure device to continuously The raw material was conveyed. In this conveying state, the tension applied to the original fabric was 2 kg / 300 mm width.
The temperature of the main body of the exposure apparatus was adjusted to 23 ° C. ± 0.1 ° C., and the relative humidity was adjusted to 60% ± 1%.

After the original film was adsorbed and fixed on the exposure table, the gap (gap) between the CS film surface of the original film and the pattern (photomask) was automatically adjusted to 100 μm. In addition, the exposure position of the original pattern is automatically detected by detecting the distance from the end face of the original film, and after the automatic adjustment so that the photomask pattern position is a fixed distance from the original film according to this detection result, After alignment with the photomask for CS using the alignment mark formed simultaneously, exposure was performed. As a light source, a high-pressure mercury lamp was used, the exposure area was 200 mm × 200 mm, I-line (wavelength: 365 nm) was used, and exposure was performed at an illuminance of 15 mW / cm ² for 20 seconds to obtain an exposure amount of 300 mJ / cm ² . .

(Development treatment / post-bake treatment step) The development treatment is carried out by installing a development device downstream of the exposure machine and conveying the exposed material at a constant speed of 400 mm / min in the development device. A composite film in which a CS pattern was formed at a predetermined position of the lattice pattern portion of the black matrix pattern on the composite film on which the black matrix pattern and the RGB coloring pattern and the ITO electrode layer were formed was obtained. Thereafter, post-baking treatment was performed at 200 ° C. for 30 minutes in a baking furnace to heat cure the CS resin pattern.

  In this way, a color filter in which a black matrix and RGB coloring patterns, an ITO electrode layer and CS were formed on the plastic film (2) on which the gas barrier layer was formed was obtained.

  When this color filter pattern was measured under the conditions of temperature: 23 ° C. ± 0.1 ° C. and relative humidity: 60% ± 1%, it was within a range of ± 2 μm per 200 mm with respect to the design dimension.

It was 0.01 g / m < ² > * 24h when the water-vapor-permeation rate of this color filter was measured based on JISK7129B method. The oxygen permeability was ^{0.1ml / m 2 · 24h · atm} .

(Example 3)
(Manufacture of plastic film)
A glass powder (refractive index of 1.510) having an average particle diameter of 1.0 μm was surface-treated with acrylic silane. 150 parts of this glass powder was mixed with 80 parts of norbornane dimethylol diacrylate, 20 parts by weight of neopentyl glycol-modified trimethylol propane diacrylate, and 0.5 part by weight of 1-hydroxy-cyclohexyl-phenyl-ketone as a photopolymerization initiator (parts: All were dispersed in a resin (refractive index after cross-linking: 1.510) consisting of a mass basis and defoamed. This liquid is cast on a stainless steel endless belt of a film deposition apparatus equipped with a die coater, a stainless steel endless belt, an ultraviolet irradiation device, and a continuous drying furnace, and after being cured by irradiation with ultraviolet light, continuously from the endless belt. The film was peeled and further heated and cured to 160 ° C. in a continuous drying furnace, and wound up to obtain a plastic film having a width of 30 cm, a length of 100 m and a thickness of 100 μm. Furthermore, heating was performed at 220 ° C. for 20 minutes using a continuous drying furnace purged with nitrogen. Using a coater head, a drying furnace, and a coating machine with an ultraviolet irradiation device, apply a liquid consisting of a polyfunctional acrylate resin, photoinitiator, and solvent on both sides of the film, dry the solvent, and then irradiate with ultraviolet rays. And a plastic film (3) having an undercoat layer formed thereon was obtained. The plastic film (3) had a light transmittance of 87% at a wavelength of 550 nm. Moreover, when the linear expansion coefficient and glass transition temperature in 30 to 150 degreeC of this plastic film (3) were measured, they were 26 ppm / degrees C and 220 degreeC, respectively.

(Gas barrier layer deposition)
This plastic film (3) was loaded into a sputtering roll coater, and SiAlON with a film thickness of 50 nm was formed on the undercoat by RF sputtering using SiAlON as a target, and this was used as a gas barrier layer.

  Thereafter, in the same manner as in Example 2, a color filter in which a black matrix and RGB coloring patterns were formed on a plastic film (3) on which a gas barrier layer was formed was obtained. Further, an ITO electrode layer and CS were formed in the same manner as in Example 1.

  When this color filter pattern was measured under the conditions of temperature: 23 ° C. ± 0.1 ° C. and relative humidity: 60% ± 1%, it was within a range of ± 2 μm per 200 mm with respect to the design dimension.

Furthermore, the water vapor permeability of the color filter was measured based on JIS K7129B method was 0.03g ^/ m 2 · 24h. The oxygen permeability was 0.1 ml / m ² · 24 h · atm.

(Comparative example)
In Example 1, after forming the plastic film, a color filter was obtained in the same manner as in Example 1 except that heating was not performed at 220 ° C. for 20 minutes using a continuous drying furnace substituted with nitrogen.

  When this color filter pattern was measured under the conditions of temperature; 23 ° C. ± 0.1 ° C., relative humidity; 60% ± 1%, there was a change of −20 μm per 200 mm with respect to the design dimension, and the range from ± 2 μm It was far off.

  As described above, in Examples 1 to 3, the deviation from the design dimension after forming the color filter is 2 μm, and as described above, this deviation can withstand a color filter that requires a resolution of about 200 ppi. However, since the deviation of 20 μm generated in the comparative example corresponds to a deviation of about one coloring pattern for the 200 ppi color filter, the reliability of the color filter created in the comparative example is impaired.

  As described above, the color filter for a display device of the present invention is used for a flat panel display such as a liquid crystal display device or an organic EL display device, and particularly useful for a color filter used for a flexible ultra-thin display device. It is.

  The present invention can be applied to a method for manufacturing a color filter for a display device using a plastic film as a base material, and manufactures a color filter for a display device that suppresses a decrease in reliability due to various causes when used as a color filter.

DESCRIPTION OF SYMBOLS 10 Color filter 12 Plastic film 14 Gas barrier layer 16 Black matrix pattern 18 Red pattern 20 Green pattern 22 Blue pattern 24 Transparent electrode layer 26 Column spacer 62 Base film 64 Coating composition layer 66 Cover film

Claims (13)

A color filter for a display device having a color filter layer formed by heat treatment on a plastic film, and heating the plastic film at a temperature equal to or higher than a heat treatment temperature at the time of forming the color filter layer before forming the color filter layer. Is a manufacturing method of
When the plastic film is heated prior to the formation of the color filter layer, the heating is continuously performed roll-to-roll using a heat treatment apparatus including at least a roll unwinding device, a heating furnace, and a roll winding device. A method for producing a color filter for a display device. When heating the plastic film prior to the formation of the color filter layer,
The method for producing a color filter for a display device according to claim 1, wherein the heating is performed in an atmosphere excluding oxygen. The color filter is
Using a transfer material in which a colored ionizing radiation curable resin layer is formed on a base plastic film, the transfer material is thermocompression bonded onto the plastic film substrate with the colored ionizing radiation curable resin layer facing the plastic film substrate. And a process of
After exposing the layer of colored ionizing radiation curable resin through a photomask before exposing and exposing, or after exposing, the base plastic film is peeled off and developed to form a colored pattern. Including a continuous process,
3. The color filter for a display device according to claim 1, wherein the layers are formed by a roll-to-roll process by repeating the steps described above for layers of colored ionizing radiation curable resins having different hues. Manufacturing method. The color filter is
A step of laminating a protective film after directly forming and forming a colored ionizing radiation curable resin layer on a plastic film substrate;
After the protective film is peeled off and exposed before exposing the colored ionizing radiation curable resin layer through a photomask, or after the exposure, the protective film is peeled off and developed to form a colored pattern. Including
The color filter for a display device according to claim 1 or 2, wherein the layers of the colored ionizing radiation curable resin having different hues are formed by a roll-to-roll process by repeating the previous steps. Manufacturing method. The color filter is
A colored ionizing radiation curable resin layer is directly coated on a plastic film substrate to form, and the colored ionizing radiation curable resin layer is exposed through a photomask and developed to form a colored pattern. Including steps,
3. The color filter for a display device according to claim 1, wherein the layers are formed by a roll-to-roll process by repeating the steps described above for layers of colored ionizing radiation curable resins having different hues. Manufacturing method. The color filter is
6. A colored ionizing radiation curable resin layer is formed on a plastic film substrate by arbitrarily combining the production methods according to claim 3 depending on the type of the colored ionizing radiation curable resin. A method for producing a color filter for a display device according to claim 1.   The colored ionizing radiation curable resin is a radiation-sensitive composition containing (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photopolymerization initiator. The method for manufacturing a color filter for a display device according to any one of claims 3 to 6, wherein   The method for producing a color filter for a display device according to claim 1, further comprising a step of providing a gas barrier layer made of an inorganic thin film. In the step of providing the gas barrier layer,
The gas barrier layer is continuously formed on a long roll of the plastic film by roll-to-roll using a roll film forming apparatus including at least a roll unwinding device, a film forming device, and a roll winding device. The method for producing a color filter for a display device according to claim 8.   The method for producing a color filter for a display device according to claim 8 or 9, wherein the gas barrier layer is formed by a sputtering method.   11. The oxide according to claim 8, wherein the gas barrier layer is made of an oxide, nitride, or oxynitride containing one or more elements selected from Si, Ta, and Al. A method for producing a color filter for a display device according to claim 1.   The color filter for a display device according to any one of claims 1 to 11, further comprising a step of irradiating and curing the photocurable resin prior to heating the plastic film. Manufacturing method.   The manufacturing method for a color filter for a display device according to any one of claims 1 to 11, further comprising a step of heating and curing the thermosetting resin prior to heating the plastic film. Method.