JP2010219083A - Electrolytic capacitor cathode foil and method of manufacturing the same - Google Patents
Electrolytic capacitor cathode foil and method of manufacturing the same Download PDFInfo
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Abstract
Description
本発明は、電解コンデンサ用陰極箔およびその方法に関するものである。 The present invention relates to a cathode foil for electrolytic capacitors and a method thereof.
近年、電解コンデンサの低インピーダンス化が求められる中、低インピーダンス製品に用いられる電解液は、水を多量に含む構成となっている。
水を多量に含む電解液中では、アルミニウム陰極箔は、水和反応を起こして劣化するだけではなく、溶質として添加されている各種有機酸の錯化反応の活性化により、アルミニウムの溶解反応による劣化が促進される。よって、低インピーダンス製品に使用する電解コンデンサ用陰極箔は、耐水性、錯化反応に対する安定性に優れたものが求められている。
In recent years, while the electrolytic capacitor is required to have a low impedance, the electrolytic solution used in the low impedance product has a structure containing a large amount of water.
In an electrolyte containing a large amount of water, the aluminum cathode foil not only deteriorates due to a hydration reaction, but also due to the dissolution reaction of aluminum by the activation of the complexing reaction of various organic acids added as a solute. Deterioration is promoted. Therefore, the cathode foil for electrolytic capacitors used for low impedance products is required to have excellent water resistance and stability against complexing reaction.
電極箔の劣化が促進されると、電解コンデンサは、静電容量の減少や漏れ電流特性の劣化、また溶解反応に伴って発生する水素ガスにより、安全弁の開弁に到るという問題が発生する。特に陰極箔は陽極箔のように、厚い酸化皮膜に覆われていないので、電解液中での溶解反応が起こりやすい。 When the deterioration of the electrode foil is promoted, the electrolytic capacitor has a problem that the safety valve is opened due to a decrease in electrostatic capacity, deterioration of leakage current characteristics, and hydrogen gas generated by a dissolution reaction. . In particular, since the cathode foil is not covered with a thick oxide film unlike the anode foil, a dissolution reaction in the electrolytic solution easily occurs.
従来から、陰極箔にリン酸水溶液で、浸漬処理または化成処理を行うと、このような電極箔の劣化防止効果があることはよく知られている。(たとえば非特許文献1、特許文献1参照) Conventionally, it is well known that when an immersion treatment or a chemical conversion treatment is performed on a cathode foil with an aqueous phosphoric acid solution, the electrode foil has such an effect of preventing deterioration. (For example, see Non-Patent Document 1 and Patent Document 1)
しかしながら、現在の低インピーダンス製品に用いられる電解液は、従来の電解液よりさらに水を多く含む電解液で、従来から知られているリン酸による浸漬処理では、十分な効果を得ることはできず、溶解反応を更に抑制することのできる処理が求められている。 However, the electrolyte used in current low-impedance products is an electrolyte that contains more water than the conventional electrolyte, and the conventional immersion treatment with phosphoric acid cannot achieve a sufficient effect. There is a need for a treatment that can further suppress the dissolution reaction.
また、リン酸水溶液による化成処理により耐水性を上げる方法やリン酸水溶液のリン酸濃度を上げて浸漬する方法では、耐水性は改善されるが、静電容量の減少が非常に大きい。よって、静電容量を低下させずに溶解反応を抑制することのできる処理、およびその処理による陰極箔が求められていた。 In addition, the method of increasing water resistance by chemical conversion treatment with a phosphoric acid aqueous solution or the method of immersing by increasing the phosphoric acid concentration of the phosphoric acid aqueous solution improves the water resistance, but greatly reduces the capacitance. Therefore, there has been a demand for a process capable of suppressing the dissolution reaction without reducing the capacitance, and a cathode foil by the process.
上記課題を解決するため、本発明は、電解コンデンサ用陰極箔において、粗面化されたエッチング箔の表面にモリブデンとリンを含む皮膜(モリブデン酸またはモリブデン酸塩、リン酸またはリン酸塩の形で含む皮膜)が形成されてなることを特徴とする電解コンデンサ用陰極箔である。 In order to solve the above-mentioned problems, the present invention provides a cathode foil for an electrolytic capacitor, which is a film containing molybdenum and phosphorus (molybdic acid or molybdate, phosphoric acid or phosphate in the form of a roughened etching foil. A cathode foil for an electrolytic capacitor, characterized in that a coating film is formed.
また、電解コンデンサ用陰極箔の製造方法において、粗面化されたエッチング箔をモリブデン酸塩とリン酸を含む水溶液に浸漬する処理を行い、エッチング箔の表面にモリブデンとリンを含む皮膜を形成することを特徴とする電解コンデンサ用陰極箔の製造方法である。 Further, in the method for producing a cathode foil for an electrolytic capacitor, a roughened etching foil is immersed in an aqueous solution containing molybdate and phosphoric acid to form a film containing molybdenum and phosphorus on the surface of the etching foil. This is a method for producing a cathode foil for an electrolytic capacitor.
さらに、前記モリブデン酸塩として、モリブデン酸ナトリウムを用いたことを特徴とする電解コンデンサ用陰極箔の製造方法である。 Furthermore, it is a manufacturing method of the cathode foil for electrolytic capacitors characterized by using sodium molybdate as the molybdate.
そして、電解コンデンサ用陰極箔の製造方法において、浸漬処理温度が25〜70℃であることを特徴とする電解コンデンサ用陰極箔の製造方法である。 And in the manufacturing method of the cathode foil for electrolytic capacitors, the immersion treatment temperature is 25-70 degreeC, It is a manufacturing method of the cathode foil for electrolytic capacitors characterized by the above-mentioned.
また、前記浸漬処理液中のモリブデン酸ナトリウム濃度が0.05〜0.25wt%であることを特徴とする電解コンデンサ用陰極箔の製造方法である。 Moreover, it is a manufacturing method of the cathode foil for electrolytic capacitors characterized by the sodium molybdate density | concentration in the said immersion treatment liquid being 0.05-0.25 wt%.
本発明では、粗面化処理されたエッチング箔を、モリブデン酸塩とリン酸を含む水溶液で浸漬処理し、モリブデンとリンを含む酸化皮膜を形成することにより、陰極箔の電解液中での溶解を抑制し、静電容量の低下を抑えながら、耐水性に優れた、信頼性の高い電解コンデンサ用陰極箔を得ることができる。この理由は必ずしも明確ではないが、耐食性を持つモリブデンと耐水性に効果のあるリンを含む酸化皮膜が、両者の相乗効果により、電解液中での陰極箔の皮膜溶解を抑制していると考えられる。 In the present invention, the roughened etching foil is immersed in an aqueous solution containing molybdate and phosphoric acid to form an oxide film containing molybdenum and phosphorous, thereby dissolving the cathode foil in the electrolytic solution. It is possible to obtain a highly reliable cathode foil for electrolytic capacitors that is excellent in water resistance while suppressing the decrease in capacitance. The reason for this is not necessarily clear, but it is thought that the oxide film containing molybdenum with corrosion resistance and phosphorus that is effective in water resistance suppresses dissolution of the cathode foil film in the electrolyte due to the synergistic effect of both. It is done.
以下、実施例に基づいて本発明を具体的に説明する。 Hereinafter, the present invention will be specifically described based on examples.
[実施例1〜5]浸漬処理温度の比較
公知の方法により、アルミニウム原箔に、エッチング(粗面化)処理を行い、エッチング箔試料を作製した。エッチング処理後、45℃、0.5wt%のリン酸溶液に浸漬し、残留塩素イオンを除去した。次いで表1に示すように、モリブデン酸ナトリウム0.15wt%とリン酸0.10wt%を含む水溶液を温度20、25、50、70、80℃に設定して、当該水溶液に浸漬処理処理後、400℃で熱処理を行い、モリブデンとリンを含む皮膜が形成された陰極箔試料を作製した。
[Examples 1 to 5] Comparison of immersion treatment temperature By a known method, etching (roughening) treatment was performed on the aluminum original foil to prepare an etching foil sample. After the etching treatment, it was immersed in a phosphoric acid solution at 45 ° C. and 0.5 wt% to remove residual chlorine ions. Next, as shown in Table 1, an aqueous solution containing 0.15 wt% sodium molybdate and 0.10 wt% phosphoric acid was set at a temperature of 20, 25, 50, 70, 80 ° C., and after immersion treatment in the aqueous solution, Heat treatment was performed at 400 ° C. to prepare a cathode foil sample on which a film containing molybdenum and phosphorus was formed.
[実施例6〜11、3]モリブデン酸ナトリウム水溶液濃度の比較
上記実施例と同様にして、エッチング箔試料を作製し、エッチング処理後、残留塩素イオンを除去した。次いで表1に示すように、モリブデン酸ナトリウム濃度を0.03、0.05、0.10、0.15、0.20、0.25、0.30wt%と、リン酸0.10wt%を含む水溶液を50℃に設定して、当該水溶液に浸漬処理後、400℃で熱処理を行い、モリブデンとリンを含む酸化皮膜が形成された陰極箔試料を作製した。
[Examples 6-11, 3] Comparison of sodium molybdate aqueous solution concentrations Etch foil samples were prepared in the same manner as in the above examples, and residual chlorine ions were removed after the etching treatment. Next, as shown in Table 1, the sodium molybdate concentration was 0.03, 0.05, 0.10, 0.15, 0.20, 0.25, 0.30 wt%, and phosphoric acid 0.10 wt%. The aqueous solution containing was set to 50 ° C., immersed in the aqueous solution, and then heat treated at 400 ° C. to prepare a cathode foil sample on which an oxide film containing molybdenum and phosphorus was formed.
(比較例1、2)モリブデン酸ナトリウム単独(リン酸なし)水溶液との比較
上記実施例と同様にして、エッチング箔試料を作製し、エッチング処理後、残留塩素イオンを除去した。次いで表1に示すように、モリブデン酸ナトリウム濃度を0.15wt%とし、リン酸を含まない水溶液を50、70℃に設定して、当該水溶液に浸漬処理後、400℃で熱処理を行い、モリブデンのみ含む皮膜が形成された陰極箔試料を作製した。
(Comparative Examples 1 and 2) Comparison with an aqueous solution of sodium molybdate alone (no phosphoric acid) In the same manner as in the above example, an etching foil sample was prepared, and after the etching treatment, residual chlorine ions were removed. Next, as shown in Table 1, a sodium molybdate concentration was set to 0.15 wt%, an aqueous solution not containing phosphoric acid was set to 50 and 70 ° C., immersed in the aqueous solution, and then heat treated at 400 ° C. A cathode foil sample on which a film containing only the carbon was formed.
(従来例)リン酸単独(モリブデン酸ナトリウムなし)水溶液との比較
上記実施例と同様にして、エッチング箔試料を作製し、エッチング処理後、残留塩素イオンを除去した。次いで表1に示すように、リン酸濃度を0.10wt%とし、モリブデン酸ナトリウムを含まない水溶液を50℃に設定して、当該水溶液に浸漬処理後、400℃で熱処理を行い、リン酸のみ含む酸化皮膜が形成された陰極箔試料を作製した。
(Conventional example) Comparison with phosphoric acid alone (no sodium molybdate) aqueous solution In the same manner as in the above example, an etching foil sample was prepared, and after the etching treatment, residual chlorine ions were removed. Next, as shown in Table 1, the phosphoric acid concentration was set to 0.10 wt%, an aqueous solution not containing sodium molybdate was set to 50 ° C., and after immersion treatment in the aqueous solution, heat treatment was performed at 400 ° C., and phosphoric acid only A cathode foil sample on which an oxide film was formed was prepared.
上記実施例1〜11、比較例1、2、従来例による陰極箔試料を、皮膜耐圧と静電容量を測定した後、エチレングリコール40wt%、水50wt%、アジピン酸アンモニウム10wt%の電解液中に105℃の状態で、8時間浸漬を行い、浸漬後の皮膜耐圧の変化率を調べた。その結果を表1に示す。 The cathode foil samples according to Examples 1 to 11 and Comparative Examples 1 and 2 and the conventional example were measured for film withstand voltage and capacitance, and then in an electrolytic solution of ethylene glycol 40 wt%, water 50 wt%, and ammonium adipate 10 wt%. The film was immersed for 8 hours at 105 ° C., and the rate of change in the film pressure resistance after the immersion was examined. The results are shown in Table 1.
表1より明らかなように、モリブデン酸ナトリウムとリン酸を含む水溶液に浸漬した実施例1〜11は、リン酸のみ含む水溶液に浸漬した従来例と比較して、静電容量、皮膜耐圧の変化率が向上しており、その中でも、浸漬処理温度25〜70℃、モリブデン酸ナトリウム濃度0.05〜0.25wt%とした実施例2〜4、7〜10が特に優れている。
また、リン酸を含まずにモリブデン酸ナトリウムのみ含む水溶液に浸漬した比較例1、2は、実施例1〜11と比較して、静電容量、皮膜耐圧の変化率が低下しているため、リン酸およびモリブデン酸ナトリウムを併用することが不可欠であることが分かる。
As is clear from Table 1, Examples 1 to 11 immersed in an aqueous solution containing sodium molybdate and phosphoric acid had a change in capacitance and film withstand voltage as compared with the conventional example immersed in an aqueous solution containing only phosphoric acid. In particular, Examples 2 to 4 and 7 to 10 having an immersion treatment temperature of 25 to 70 ° C. and a sodium molybdate concentration of 0.05 to 0.25 wt% are particularly excellent.
Moreover, since Comparative Examples 1 and 2 immersed in an aqueous solution containing only sodium molybdate without containing phosphoric acid had a lower rate of change in capacitance and film pressure resistance than Examples 1-11, It can be seen that the combined use of phosphoric acid and sodium molybdate is essential.
なお、上記実施例では、モリブデンを含む化合物として、モリブデン酸ナトリウムを用いたが、この他にも、カリウム、リチウム等のアルカリ金属塩、アンモニウム塩としても用いることができる。
また、浸漬処理後の熱処理温度は、350〜550℃であればよい。
In the above examples, sodium molybdate was used as the compound containing molybdenum, but other than these, alkali metal salts such as potassium and lithium, and ammonium salts can also be used.
Moreover, the heat processing temperature after an immersion process should just be 350-550 degreeC.
Claims (5)
粗面化されたエッチング箔の表面にモリブデンとリンを含む皮膜が形成されてなることを特徴とする電解コンデンサ用陰極箔。 In the cathode foil for electrolytic capacitors,
A cathode foil for an electrolytic capacitor, characterized in that a film containing molybdenum and phosphorus is formed on the surface of a roughened etching foil.
粗面化されたエッチング箔を、モリブデン酸塩とリン酸を含む水溶液に浸漬する処理を行い、エッチング箔の表面にモリブデンとリンを含む皮膜を形成することを特徴とする電解コンデンサ用陰極箔の製造方法。 In the method for producing a cathode foil for an electrolytic capacitor,
A cathode foil for an electrolytic capacitor, characterized in that a roughened etching foil is immersed in an aqueous solution containing molybdate and phosphoric acid to form a film containing molybdenum and phosphorus on the surface of the etching foil. Production method.
浸漬処理温度が、25〜70℃であることを特徴とする請求項3に記載の電解コンデンサ用陰極箔の製造方法。 In the manufacturing method of the cathode foil for electrolytic capacitors,
The method for producing a cathode foil for an electrolytic capacitor according to claim 3, wherein the immersion treatment temperature is 25 to 70 ° C.
The method for producing a cathode foil for an electrolytic capacitor according to claim 3 or 4, wherein a concentration of sodium molybdate in the immersion treatment liquid is 0.05 to 0.25 wt%.
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CN113764191A (en) * | 2021-09-14 | 2021-12-07 | 南通海星电子股份有限公司 | An inhibitor for Al (OH)3Method for manufacturing low-voltage electrode foil formed by crystallization |
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CN113764191A (en) * | 2021-09-14 | 2021-12-07 | 南通海星电子股份有限公司 | An inhibitor for Al (OH)3Method for manufacturing low-voltage electrode foil formed by crystallization |
CN113764191B (en) * | 2021-09-14 | 2022-08-30 | 南通海星电子股份有限公司 | An inhibitor for Al (OH) 3 Method for manufacturing low-voltage electrode foil formed by crystallization |
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