JP2010212096A - Conductive film and method of manufacturing the same, and organic electroluminescent element - Google Patents
Conductive film and method of manufacturing the same, and organic electroluminescent element Download PDFInfo
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- JP2010212096A JP2010212096A JP2009057237A JP2009057237A JP2010212096A JP 2010212096 A JP2010212096 A JP 2010212096A JP 2009057237 A JP2009057237 A JP 2009057237A JP 2009057237 A JP2009057237 A JP 2009057237A JP 2010212096 A JP2010212096 A JP 2010212096A
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Abstract
Description
本発明は、導電膜とその製造方法及び該導電膜を有する有機エレクトロルミネッセンス素子に関し、液晶表示素子、有機発光素子、無機電界発光素子、太陽電池、電磁波シールド、電子ペーパー、タッチパネル等の各種分野において好適に用いることができる、導電膜とその製造方法及び該導電膜を有する有機エレクトロルミネッセンス素子に関する。 The present invention relates to a conductive film, a method for producing the same, and an organic electroluminescent element having the conductive film, and in various fields such as a liquid crystal display element, an organic light emitting element, an inorganic electroluminescent element, a solar cell, an electromagnetic wave shield, electronic paper, and a touch panel. The present invention relates to a conductive film, a method for producing the same, and an organic electroluminescence device having the conductive film, which can be suitably used.
近年、薄型TV需要の高まりに伴い、液晶・プラズマ・有機エレクトロルミネッセンス・フィールドエミッション等、各種方式のディスプレイ技術が開発されている。これら表示方式の異なる何れのディスプレイにおいても、導電膜は必須の構成技術となっている。また、テレビ以外でも、タッチパネルや携帯電話、電子ペーパー、各種太陽電池、各種エレクトロルミネッセンス調光素子においても、導電膜は欠くことのできない技術要素となっている。 In recent years, various types of display technologies such as liquid crystal, plasma, organic electroluminescence, and field emission have been developed in response to the increasing demand for thin TVs. In any of these displays having different display methods, the conductive film is an essential constituent technology. In addition to televisions, conductive films are an indispensable technical element in touch panels, mobile phones, electronic paper, various solar cells, and various electroluminescent light control elements.
従来導電膜は、ガラスや透明なプラスチックフィルム等の透明基材上に、インジウム−スズの複合酸化物(ITO)膜を真空蒸着法やスパッタリング法で製膜したITO透明電極が主に使用されてきた。しかし、ITOに用いられているインジウムはレアメタルであり、且つ価格の高騰により、脱インジウムが望まれている。また、ディスプレイの大画面化、生産性向上に伴い、フレキシブル基板を用いたロールtoロールの生産技術が所望されている。 Conventionally, an ITO transparent electrode in which an indium-tin composite oxide (ITO) film is formed on a transparent base material such as glass or a transparent plastic film by a vacuum deposition method or a sputtering method has been mainly used. It was. However, indium used in ITO is a rare metal and removal of indium is desired due to the rising price. Also, roll-to-roll production technology using a flexible substrate has been desired along with an increase in display screen and productivity.
近年、有機物からなる導電体を用いる導電膜が開示されており、テトラフルバレンジカルボキシレートのカチオンラジカルとポリビニルアルコールからなる導電膜が提案されている(例えば非特許文献1参照)。しかし、この導電膜では導電体は混合原子価化合物ではなく、また高導電性領域ではテトラフルバレンジカルボキシレートのカチオンラジカルが星型の結晶を形成するためフィルムの透過率が低いという課題を有していた。 In recent years, a conductive film using a conductor made of an organic substance has been disclosed, and a conductive film made of a cation radical of tetrafulvalene dicarboxylate and polyvinyl alcohol has been proposed (for example, see Non-Patent Document 1). However, in this conductive film, the conductor is not a mixed valence compound, and in the highly conductive region, the tetrafulvalenedicarboxylate cation radical forms a star-shaped crystal, which has a problem of low film transmittance. It was.
金属ナノワイヤーを用いた導電体も開示されており、銀ナノワイヤー上に導電性高分子材料を積層させた透明電極が提案されている(例えば特許文献1参照)。しかしこれらは銀ナノワイヤー層上に透過率の低いPEDOT/PSS、ポリアニリン及びポリピロール等の導電性ポリマーを積層する構成になっており、高透過率と導電性を両立するという課題を有していた。 A conductor using metal nanowires is also disclosed, and a transparent electrode in which a conductive polymer material is laminated on silver nanowires has been proposed (for example, see Patent Document 1). However, these have a structure in which conductive polymers such as PEDOT / PSS, polyaniline, and polypyrrole having low transmittance are laminated on the silver nanowire layer, and have a problem of achieving both high transmittance and conductivity. .
また、PET上に銀ナノワイヤーを塗布後、ポリウレタンのメチルエチルケトン溶液をスピンコートした導電体が提案されている(例えば特許文献2参照)。電極は局所的に高温になり、素子寿命を劣化させる要因の一つであるため、経時での導電性、透過率の高い安定性向上という課題を有していた。 In addition, a conductor in which silver nanowires are coated on PET and then spin-coated with a polyurethane methylethylketone solution has been proposed (see, for example, Patent Document 2). Since the electrode locally becomes a high temperature and is one of the factors that degrade the device life, it has a problem of improving the stability with high conductivity and transmittance over time.
テトラチアフルバレン・テトラシアノキノジメタン錯体を用いた修飾電極を含む有機エレクトロルミネッセンス素子が提案されている(例えば特許文献3参照)。しかし、電極作製時にテトラチアフルバレン・テトラシアノキノジメタン錯体溶液を水面上に滴下し、形成した膜をPETフィルムのマスクでAg電極上へ転写しており、有機エレクトロルミネッセンス素子の寿命低下を引き起こす水の残存が懸念される。有機エレクトロルミネッセンス素子中に水が存在するとダークスポットの原因となるため、高温、高湿度環境下における環境試験後の安定性向上という課題を有していた。 An organic electroluminescence device including a modified electrode using a tetrathiafulvalene / tetracyanoquinodimethane complex has been proposed (see, for example, Patent Document 3). However, a tetrathiafulvalene / tetracyanoquinodimethane complex solution is dropped onto the water surface during electrode preparation, and the formed film is transferred onto the Ag electrode with a PET film mask, which causes a reduction in the lifetime of the organic electroluminescence device. There is concern about water remaining. When water is present in the organic electroluminescence device, it causes dark spots, which has a problem of improving stability after an environmental test in a high temperature and high humidity environment.
本発明の目的は、経時での導電性評価において高い導電性と透明性を有する導電膜と、高温、高湿度環境下における環境試験後でも安定性の優れた有機エレクトロルミネッセンス素子(以後有機EL素子ともいう)を提供することにある。 An object of the present invention is to provide a conductive film having high conductivity and transparency in the evaluation of conductivity over time, and an organic electroluminescence element (hereinafter referred to as an organic EL element) having excellent stability even after an environmental test under a high temperature and high humidity environment. (Also called).
本発明の上記目的は、以下の構成により達成することができる。 The above object of the present invention can be achieved by the following configuration.
1.導電性ナノワイヤーとバインダーを含有する導電膜であって、該導電性ナノワイヤーが下記一般式(I)で表される化合物と該一般式(I)で表される化合物の酸化体の塩からなる混合原子価化合物であることを特徴とする導電膜。 1. A conductive film containing a conductive nanowire and a binder, wherein the conductive nanowire is composed of a compound represented by the following general formula (I) and a salt of an oxidant of the compound represented by the general formula (I) A conductive film characterized by being a mixed valence compound.
〔式中、X1〜X4はそれぞれカルコゲン原子を表し、同一であっても異なっていても良い。R1〜R4はそれぞれ独立に水素原子又は置換基を表すが、R1とR2、又はR3とR4は互いに結合して環状構造を形成しても良い。〕
2.前記一般式(I)で表される化合物のX1、X2、X3及びX4が硫黄原子であることを特徴とする前記1記載の導電膜。
[Wherein, X 1 to X 4 each represent a chalcogen atom and may be the same or different. R 1 to R 4 each independently represents a hydrogen atom or a substituent, but R 1 and R 2 , or R 3 and R 4 may be bonded to each other to form a cyclic structure. ]
2. 2. The conductive film according to 1 above, wherein X 1 , X 2 , X 3 and X 4 of the compound represented by the general formula (I) are sulfur atoms.
3.前記一般式(I)で表される化合物の酸化体の塩のカウンターアニオンが下記一般式(II)表されるアニオンであることを特徴とする前記1又は2記載の導電膜。 3. 3. The conductive film as described in 1 or 2 above, wherein the counter anion of the oxidized salt of the compound represented by the general formula (I) is an anion represented by the following general formula (II).
一般式(II) R5COO−
〔式中、R5は置換基を示す。〕
4.前記1〜3のいずれか1項記載の導電膜から構成される電極を用いることを特徴とする有機エレクトロルミネッセンス素子。
Formula (II) R 5 COO −
[Wherein R 5 represents a substituent. ]
4). The organic electroluminescent element characterized by using the electrode comprised from the electrically conductive film of any one of said 1-3.
5.前記1〜3のいずれか1項記載の導電膜が、一般式(I)で表される化合物を含有する溶液と、一般式(I)で表される化合物の酸化体の塩を含有する溶液と、バインダーを含有する溶液とを混合後、支持体上へ塗布、乾燥する工程で製造されたことを特徴とする導電膜の製造方法。 5. The conductive film according to any one of the above 1 to 3, a solution containing a compound represented by the general formula (I) and a salt containing an oxidant of the compound represented by the general formula (I) And a solution containing a binder, followed by coating and drying on a support, and a method for producing a conductive film.
本発明の課題を克服すべく鋭意検討を行った結果、経時での導電性評価において高い導電性と透明性を有する導電膜と、高温、高湿度環境下における環境試験後でも安定性の優れた有機EL素子を提供することができた。 As a result of diligent studies to overcome the problems of the present invention, a conductive film having high conductivity and transparency in the evaluation of conductivity over time, and excellent stability even after an environmental test under a high temperature and high humidity environment An organic EL device could be provided.
本発明を更に詳しく説明する。 The present invention will be described in more detail.
本発明は、バインダー、一般式(I)と該一般式(I)で表される化合物の酸化体の塩からなる混合原子価化合物で構成されるナノワイヤーを含有することを特徴とする。 The present invention is characterized by containing a nanowire composed of a mixed valence compound composed of a binder and a salt of an oxidant of the compound represented by the general formula (I) and the general formula (I).
本発明においては、特に、ナノワイヤーをバインダー中に含有させることで、経時での導電性評価において高い安定性を有し、更に高温、高湿度環境下における環境試験後でも安定性の優れた有機エレクトロルミネッセンスが得られる。 In the present invention, in particular, by including nanowires in the binder, it has high stability in the evaluation of conductivity over time, and further has excellent stability even after environmental tests under high temperature and high humidity environments. Electroluminescence is obtained.
〔導電性ナノワイヤー〕
本発明に係る導電性ナノワイヤーとは、導電性を有し、かつその長さが直径(太さ)に比べて十分に長い形状を持つものである。本発明に係る導電性ナノワイヤーは、透明導電層内において導電性ナノワイヤーが互いに接触し合うことにより3次元的な導電ネットワークを形成し補助電極として機能すると考えられる。従って、導電性ナノワイヤーが長い方が導電ネットワーク形成に有利であるため好ましい。一方で、導電性ナノワイヤーが長くなると導電性ナノワイヤーが絡み合って凝集体を生じ、光学特性を劣化させる場合がある。導電ネットワーク形成や凝集体生成には、導電性ナノワイヤーの剛性や直径等も影響するため、使用する導電性ナノワイヤーに応じて最適な平均アスペクト比(アスペクト=長さ/直径)のものを使用することが好ましい。大凡の目安として、平均アスペクト比は、10〜10,000であるものが好ましく、より好ましくはで15〜1,000である。
[Conductive nanowires]
The conductive nanowire according to the present invention is conductive and has a length that is sufficiently longer than its diameter (thickness). The conductive nanowire according to the present invention is considered to function as an auxiliary electrode by forming a three-dimensional conductive network when the conductive nanowires contact each other in the transparent conductive layer. Accordingly, a longer conductive nanowire is preferable because it is advantageous for forming a conductive network. On the other hand, when the conductive nanowires become long, the conductive nanowires are entangled to form aggregates, which may deteriorate the optical characteristics. Conductive network formation and aggregate formation are also affected by the rigidity and diameter of the conductive nanowires, so use the optimal average aspect ratio (aspect = length / diameter) according to the conductive nanowire used. It is preferable to do. As a rough guide, the average aspect ratio is preferably 10 to 10,000, more preferably 15 to 1,000.
本発明において上記導電性ナノワイヤーの長さや直径、アスペクト比の平均値は、十分な数の導電性ナノワイヤーについて電子顕微鏡写真を撮影し、個々の導電性ワイヤー像の計測値の算術平均から求めることができる。導電性ワイヤーの長さは、本来直線状に伸ばした状態で測定すべきであるが、現実には屈曲している場合が多いため、電子顕微鏡写真から画像解析装置を用いてナノワイヤーの投影径及び投影面積を算出し、円柱体を仮定して算出する(長さ=投影面積/投影径)こともできる。また、長さや直径の相対標準偏差は、測定値の標準偏差を平均値で除した値に100を乗じた値で表す。計測対象の導電性ナノワイヤーのサンプル数は、少なくとも100個以上が好ましく、300個以上がより好ましい。 In the present invention, the average values of the length, diameter and aspect ratio of the conductive nanowires are obtained from the arithmetic average of the measured values of the individual conductive wire images by taking electron micrographs of a sufficient number of conductive nanowires. be able to. The length of the conductive wire should be measured in a linearly stretched state, but in reality, it is often bent, so the projected diameter of the nanowire using an image analyzer from an electron micrograph The projected area can also be calculated and calculated assuming a cylindrical body (length = projected area / projected diameter). The relative standard deviation of length and diameter is expressed by a value obtained by multiplying 100 by the value obtained by dividing the standard deviation of the measured value by the average value. The number of conductive nanowire samples to be measured is preferably at least 100 or more, more preferably 300 or more.
相対標準偏差[%]=測定値の標準偏差/平均値×100
本発明のナノワイヤーの形状としては中空チューブ状、ワイヤー状、ファイバー状、ロッド状等がある。本発明の導電性ナノワイヤーは、有機物成分のみで構成されているが、該有機導電性ナノワイヤーと無機ナノワイヤー、導電性金属酸化物ナノワイヤー、金属ナノワイヤー、炭素繊維、カーボンナノチューブ等と併用して用いても良い。また、本発明の導電性ナノワイヤーを金属や金属酸化物等でコーティングして用いても良い。コスト(原材料費、製造費)と性能(導電性、透明性、可撓性)の観点から、有機導電性ナノワイヤーである一般式(I)と該一般式(I)で表わされる化合物の酸化体の塩からなる混合原子価化合物で構成される導電性ナノワイヤーが最も好ましい。
Relative standard deviation [%] = standard deviation of measured value / average value × 100
Examples of the shape of the nanowire of the present invention include a hollow tube shape, a wire shape, a fiber shape, and a rod shape. The conductive nanowire of the present invention is composed only of organic components, but is used in combination with the organic conductive nanowire and inorganic nanowire, conductive metal oxide nanowire, metal nanowire, carbon fiber, carbon nanotube, etc. May be used. Further, the conductive nanowire of the present invention may be coated with a metal, a metal oxide or the like. From the viewpoint of cost (raw material cost, manufacturing cost) and performance (conductivity, transparency, flexibility), oxidation of the compound represented by the general formula (I) and the general formula (I), which are organic conductive nanowires Conductive nanowires composed of mixed valence compounds consisting of body salts are most preferred.
本発明の導電性ナノワイヤーは一般式(I)で表される化合物、一般式(I)で表される化合物の酸化体及び一般式(II)で表されるカルボン酸のアニオン、或いはスルホン酸のアニオン、ハロゲンアニオンから構成されたものが好ましい。本発明の導電性ナノワイヤーは一般式(I)で表される化合物、一般式(I)で表される化合物の酸化体の塩からなる導電性ナノワイヤーは、図4の紫外可視近赤外吸収スペクトルにおいて2000cm−1付近に幅広い吸収が見られることから混合原子化状態であることが示唆された。混合原子価化合物とは物質を構成する同種原子が異なる酸化数(電子状態)を持つ化学物質である。 The conductive nanowire of the present invention includes a compound represented by the general formula (I), an oxidant of the compound represented by the general formula (I), an anion of a carboxylic acid represented by the general formula (II), or a sulfonic acid Of these, an anion and a halogen anion are preferred. The conductive nanowire of the present invention is composed of a compound represented by the general formula (I) and an oxidized salt of the compound represented by the general formula (I). In the absorption spectrum, wide absorption was observed in the vicinity of 2000 cm −1 , suggesting a mixed atomized state. A mixed-valence compound is a chemical substance in which the same kind of atoms constituting the substance have different oxidation numbers (electronic states).
本発明の一般式(I)において、X1〜X4はそれぞれカルコゲンを示し、同一でも異なっていても良い。カルコゲン原子とは周期律表おいて第16族に属する元素総称であり、酸素、イオウ、セレン、テルル、ポロニウムがこれに分類される。本発明におけるカルコゲンは、硫黄、セレン、テルルが好ましく、更に好ましくは硫黄である。 In the general formula (I) of the present invention, X 1 to X 4 each represent a chalcogen and may be the same or different. A chalcogen atom is an element generic name belonging to Group 16 in the periodic table, and oxygen, sulfur, selenium, tellurium and polonium are classified into this. The chalcogen in the present invention is preferably sulfur, selenium or tellurium, more preferably sulfur.
本発明の一般式(I)において、R1〜R4はそれぞれ独立に水素原子又は置換基を示し、R1とR2、又はR3とR4は互いに結合して環状構造を形成しても良い。 In the general formula (I) of the present invention, R 1 to R 4 each independently represent a hydrogen atom or a substituent, and R 1 and R 2 , or R 3 and R 4 are bonded to each other to form a cyclic structure. Also good.
前記本発明の一般式(I)のR1〜R4で表される置換基の例としては、ハロゲン原子、シアノ基、アルキル基、シクロアルキル基、アルコキシ基、アルキルチオ基、アリールチオ基、シクロアルコキシ基、アリール基、アリールオキシ基、ヘテロシクロアルキル基、ヘテロアリール基、アシル基、アルキルカルボンアミド基、アリールカルボンアミド基、アルキルスルホンアミド基、アリールスルホンアミド基、ウレイド基、アラルキル基、ニトロ基、アルコキシカルボニル基、アリールオキシカルボニル基、アラルキルオキシカルボニル基、アルキルカルバモイル基、アリールカルバモイル基、アルキルスルファモイル基、アリールスルファモイル基、アシルオキシ基、アルケニル基、アルキニル基、アルキルスルホニル基、アリールスルホニル基、アルキルオキシスルホニル基、アリールオキシスルホニル基、アルキルスルホニルオキシ基、アリールスルホニルオキシ基等が挙げられる。上記ハロゲン原子には、フッ素原子、塩素原子、臭素原子及びヨウ素原子が含まれる。上記アルキル基は分岐を有していてもよく、炭素原子数は、1〜20であることが好ましく、1〜12であることがより好ましく、1〜8であることが更に好ましい。アルキル基の例には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、t−ブチル基、ヘキシル基、オクチル基及び2−エチルヘキシル基が含まれる。 Examples of said substituent represented by R 1 to R 4 of the general formula (I) of the present invention, a halogen atom, a cyano group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkylthio group, an arylthio group, cycloalkoxy Group, aryl group, aryloxy group, heterocycloalkyl group, heteroaryl group, acyl group, alkylcarbonamide group, arylcarbonamide group, alkylsulfonamide group, arylsulfonamide group, ureido group, aralkyl group, nitro group, Alkoxycarbonyl group, aryloxycarbonyl group, aralkyloxycarbonyl group, alkylcarbamoyl group, arylcarbamoyl group, alkylsulfamoyl group, arylsulfamoyl group, acyloxy group, alkenyl group, alkynyl group, alkylsulfonyl group, aryl Ruhoniru group, alkyloxy sulfonyl group, aryloxy sulfonyl group, alkylsulfonyloxy group, and an aryl sulfonyloxy group. The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. The alkyl group may have a branch, and the number of carbon atoms is preferably 1 to 20, more preferably 1 to 12, and still more preferably 1 to 8. Examples of the alkyl group include methyl group, ethyl group, propyl group, isopropyl group, butyl group, t-butyl group, hexyl group, octyl group and 2-ethylhexyl group.
上記シクロアルキル基の炭素原子数は、3〜20であることが好ましく、3〜12であることがより好ましく、3〜8であることが更に好ましい。シクロアルキル基の例には、シクロプロピル基、シクロブチル基、シクロペンチル基及びシクロヘキシル基が含まれる。上記アルコキシ基は、分岐を有していてもよく、炭素原子数は1〜20であることが好ましく、1〜12であることがより好ましく、1〜6であることが更に好ましく、1〜4であることが最も好ましい。アルコキシ基の例としては、メトキシ基、エトキシ基、2−メトキシエトキシ基、2−メトキシ−2−エトキシエトキシ基、ブチルオキシ基、ヘキシルオキシ基及びオクチルオキシ基が含まれる。上記アルキルチオ基の炭素数は、分岐を有していてもよく、炭素原子数は1〜20であることが好ましく、1〜12であることがより好ましく、1〜6であることが更に好ましく、1〜4であることが最も好ましい。アルキルチオ基の例としては、メチルチオ基、エチルチオ基等が含まれる。上記アリールチオ基の炭素数は、6〜20であることが好ましく、6〜12であることが更に好ましい。アリールチオ基の例にはフェニルチオ基及びナフチルチオ基等が含まれる。上記シクロアルコキシ基の炭素原子数は、3〜12であることが好ましく、より好ましくは3〜8である。シクロアルコキシ基の例には、シクロプロポキシ基、シクロブチロキシ基、シクロペンチロキシ基及びシクロヘキシロキシ基が含まれる。上記アリール基の炭素原子数は6〜20であることが好ましく、6〜12であることが更に好ましい。アリール基の例にはフェニル基及びナフチル基が含まれる。上記アリールオキシ基の炭素原子数は6〜20であることが好ましく、6〜12であることが更に好ましい。アリールオキシ基の例にはフェノキシ基及びナフトキシ基が含まれる。上記へテロシクロアルキル基の炭素原子数は、2〜10であることが好ましく、3〜5であることが更に好ましい。へテロシクロアルキル基の例にはピペリジノ基、ジオキサニル基及び2−モルホリニル基が含まれる。上記へテロアリール基の炭素原子数は、3〜20であることが好ましく、3〜10であることが更に好ましい。へテロアリール基の例にはチエニル基、ピリジル基が含まれる。上記アシル基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アシル基の例にはホルミル基、アセチル基及びベンゾイル基が含まれる。上記アルキルカルボンアミド基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アルキルカルボンアミド基の例にはアセトアミド基等が含まれる。上記アリールカルボンアミド基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アリールカルボンアミド基の例にはベンズアミド基等が含まれる。上記アルキルスルホンアミド基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。スルホンアミド基の例にはメタンスルホンアミド基等が含まれる上記アリールスルホンアミド基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アリールスルホンアミド基の例には、ベンゼンスルホンアミド基及びp−トルエンスルホンアミドが基含まれる。上記アラルキル基の炭素原子数は7〜20であることが好ましく、7〜12であることが更に好ましい。アラルキル基の例にはベンジル基、フェネチル基及びナフチルメチル基が含まれる。上記アルコキシカルボニル基の炭素原子数は1〜20であることが好ましく、2〜12であることが更に好ましい。アルコキシカルボニル基の例にはメトキシカルボニル基が含まれる。上記アリールオキシカルボニル基の炭素原子数は7〜20であることが好ましく、7〜12であることが更に好ましい。アリールオキシカルボニル基の例にはフェノキシカルボニル基が含まれる。上記アラルキルオキシカルボニル基の炭素原子数は8〜20であることが好ましく、8〜12であることが更に好ましい。アラルキルオキシカルボニル基の例にはベンジルオキシカルボニル基が含まれる。上記アシルオキシ基の炭素原子数は1〜20であることが好ましく、2〜12であることが更に好ましい。アシルオキシ基の例にはアセトキシ基及びベンゾイルオキシ基が含まれる。上記アルケニル基の炭素原子数は2〜20であることが好ましく、2〜12であることが更に好ましい。アルケニル基の例に、ビニル基、アリル基及びイソプロペニル基が含まれる。上記アルキニル基の炭素原子数は2〜20であることが好ましく、2〜12であることが更に好ましい。アルキニル基の例にはエチニル基が含まれる。上記アルキルスルホニル基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アルキルスルホニル基の例に、メチルスルホニル基、エチルスルホニル基が含まれる。上記アリールスルホニル基の炭素原子数は6〜20であることが好ましく、6〜12であることが更に好ましい。アリールスルホニル基の例に、フェニルスルホニル基、ナフチルスルホニル基が含まれる。上記アルキルオキシスルホニル基の炭素原子数は1〜20あることが好ましく、1〜12であることが更に好ましい。アルキルオキシスルホニル基の例に、メトキシスルホニル基、エトキシスルホニル基が含まれる。上記アリールオキシスルホニル基の炭素原子数は6〜20であることが好ましく、6〜12であることが更に好ましい。アリールオキシスルホニル基の例に、フェノキシスルホニル基、ナフトキシスルホニル基が含まれる。上記アルキルスルホニルオキシ基の炭素原子数は1〜20であることが好ましく、1〜12であることが更に好ましい。アルキルスルホニルオキシ基の例に、メチルスルホニルオキシ基、エチルスルホニルオキシ基が含まれる。 The number of carbon atoms of the cycloalkyl group is preferably 3-20, more preferably 3-12, and still more preferably 3-8. Examples of the cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group. The alkoxy group may have a branch, and the number of carbon atoms is preferably 1 to 20, more preferably 1 to 12, still more preferably 1 to 6, and further preferably 1 to 4. Most preferably. Examples of the alkoxy group include methoxy group, ethoxy group, 2-methoxyethoxy group, 2-methoxy-2-ethoxyethoxy group, butyloxy group, hexyloxy group and octyloxy group. The number of carbon atoms of the alkylthio group may be branched, and the number of carbon atoms is preferably 1 to 20, more preferably 1 to 12, still more preferably 1 to 6, Most preferably, it is 1-4. Examples of the alkylthio group include a methylthio group and an ethylthio group. The arylthio group preferably has 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. Examples of the arylthio group include a phenylthio group and a naphthylthio group. The number of carbon atoms of the cycloalkoxy group is preferably 3-12, more preferably 3-8. Examples of the cycloalkoxy group include a cyclopropoxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group. The aryl group preferably has 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. Examples of the aryl group include a phenyl group and a naphthyl group. The aryloxy group preferably has 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. Examples of the aryloxy group include a phenoxy group and a naphthoxy group. The heterocycloalkyl group preferably has 2 to 10 carbon atoms, and more preferably 3 to 5 carbon atoms. Examples of the heterocycloalkyl group include a piperidino group, a dioxanyl group, and a 2-morpholinyl group. The number of carbon atoms in the heteroaryl group is preferably 3-20, and more preferably 3-10. Examples of the heteroaryl group include a thienyl group and a pyridyl group. The acyl group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the acyl group include a formyl group, an acetyl group, and a benzoyl group. The alkylcarbonamide group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the alkylcarbonamide group include an acetamide group. The arylcarbonamide group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the arylcarbonamide group include a benzamide group and the like. The alkylsulfonamide group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the sulfonamido group include a methanesulfonamido group and the like, and the arylsulfonamido group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the arylsulfonamide group include a benzenesulfonamide group and p-toluenesulfonamide group. The number of carbon atoms in the aralkyl group is preferably 7-20, and more preferably 7-12. Examples of the aralkyl group include a benzyl group, a phenethyl group, and a naphthylmethyl group. The alkoxycarbonyl group preferably has 1 to 20 carbon atoms, more preferably 2 to 12 carbon atoms. Examples of the alkoxycarbonyl group include a methoxycarbonyl group. The aryloxycarbonyl group preferably has 7 to 20 carbon atoms, and more preferably 7 to 12 carbon atoms. Examples of the aryloxycarbonyl group include a phenoxycarbonyl group. The aralkyloxycarbonyl group preferably has 8 to 20 carbon atoms, and more preferably 8 to 12 carbon atoms. Examples of the aralkyloxycarbonyl group include a benzyloxycarbonyl group. The acyloxy group preferably has 1 to 20 carbon atoms, and more preferably 2 to 12 carbon atoms. Examples of the acyloxy group include an acetoxy group and a benzoyloxy group. The alkenyl group has preferably 2 to 20 carbon atoms, and more preferably 2 to 12 carbon atoms. Examples of the alkenyl group include vinyl group, allyl group and isopropenyl group. The alkynyl group preferably has 2 to 20 carbon atoms, and more preferably 2 to 12 carbon atoms. Examples of the alkynyl group include an ethynyl group. The alkylsulfonyl group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the alkylsulfonyl group include a methylsulfonyl group and an ethylsulfonyl group. The arylsulfonyl group preferably has 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. Examples of the arylsulfonyl group include a phenylsulfonyl group and a naphthylsulfonyl group. The alkyloxysulfonyl group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the alkyloxysulfonyl group include a methoxysulfonyl group and an ethoxysulfonyl group. The aryloxysulfonyl group preferably has 6 to 20 carbon atoms, and more preferably 6 to 12 carbon atoms. Examples of the aryloxysulfonyl group include a phenoxysulfonyl group and a naphthoxysulfonyl group. The alkylsulfonyloxy group preferably has 1 to 20 carbon atoms, and more preferably 1 to 12 carbon atoms. Examples of the alkylsulfonyloxy group include a methylsulfonyloxy group and an ethylsulfonyloxy group.
上記アリールスルホニルオキシ基の炭素原子数は6〜20であることが好ましく、6〜12であることが更に好ましい。アリールスルホニルオキシ基の例に、フェニルスルホニルオキシ基、ナフチルスルホニルオキシ基が含まれる。置換基は同一でも異なっていても良く、これら置換基が更に置換されても良い。 The number of carbon atoms of the arylsulfonyloxy group is preferably 6-20, and more preferably 6-12. Examples of the arylsulfonyloxy group include a phenylsulfonyloxy group and a naphthylsulfonyloxy group. The substituents may be the same or different, and these substituents may be further substituted.
本発明の一般式(I)で表されるR1とR2、又はR3とR4は互いに結合して環状構造を形成しても良いが、その場合は、不飽和炭化水素環、芳香族環、脂肪族複素環、芳香族複素環等が縮環した構造が好ましい。R1とR2、及びR3とR4が互いに結合して形成した縮環は同一の環構造でも、異なっていても良く、不飽和炭化水素環、芳香族環を形成することが好ましい。これらの環は、更に上述の置換基により置換されても良い。 R 1 and R 2 , or R 3 and R 4 represented by the general formula (I) of the present invention may be bonded to each other to form a cyclic structure. In that case, an unsaturated hydrocarbon ring, aromatic A structure in which an aromatic ring, an aliphatic heterocyclic ring, an aromatic heterocyclic ring or the like is condensed is preferable. The condensed rings formed by combining R 1 and R 2 , and R 3 and R 4 may be the same or different, and preferably form an unsaturated hydrocarbon ring or an aromatic ring. These rings may be further substituted with the above-described substituents.
本発明の一般式(I)において、R1、R2、R3及びR4は、それぞれ、水素、ハロゲン原子、アルキル基、アリール基が好ましく、より好ましくは、R1、R2、R3及びR4が総て水素の場合である。 In the general formula (I) of the present invention, R 1 , R 2 , R 3 and R 4 are each preferably a hydrogen atom, a halogen atom, an alkyl group, or an aryl group, and more preferably R 1 , R 2 , R 3. And R 4 is all hydrogen.
以下に、本発明の一般式(I)で表される化合物の代表的具体例を示すが、本発明はこれらに限定されない。 Although the typical example of a compound represented with general formula (I) of this invention below is shown, this invention is not limited to these.
上記本発明一般式(I)で表される化合物は、JournaloftheChemicalSociety,ChemicalCommunications,1980,38−39や特開2002−265466号等の既報の方法により合成することができる。 The compound represented by the general formula (I) of the present invention can be synthesized by a known method such as Journalofthe Chemical Society, Chemical Communications, 1980, 38-39 or JP-A No. 2002-265466.
本発明一般式(I)で表される化合物の酸化体の塩は、一般式(I)で表される化合物の酸化体(カチオンラジカル)と一般式(II)で表されるカルボン酸のアニオン、或いはスルホン酸のアニオン、ハロゲンアニオンから構成される。 The salt of the oxidized form of the compound represented by the general formula (I) of the present invention includes an oxidized form (cation radical) of the compound represented by the general formula (I) and an anion of the carboxylic acid represented by the general formula (II). Alternatively, it is composed of a sulfonic acid anion and a halogen anion.
本発明一般式(II)で表されるカルボン酸のアニオン、或いはスルホン酸のアニオンはカルボン酸アニオン、スルホン酸アニオン部位を分子中に含有すれば特に制限はなく、単量体、2量体及びポリマーでもよい。また、カルボン酸アニオン、或いはスルホン酸アニオン及びハロゲンアニオン等の複数のアニオンを含有してもよく、またこれらのアニオン種を同時に含有していても良い。 The anion of the carboxylic acid represented by the general formula (II) of the present invention or the anion of the sulfonic acid is not particularly limited as long as it contains a carboxylic acid anion and a sulfonic acid anion moiety in the molecule. It may be a polymer. In addition, a carboxylate anion or a plurality of anions such as a sulfonate anion and a halogen anion may be contained, or these anion species may be contained simultaneously.
本発明一般式(II)で表されるカルボン酸アニオンの例としては、蟻酸、酢酸、プロピオン酸、酪酸、吉草酸、ヘキサン酸、ヘプタン酸、オクタン酸、ノナン酸、デカン酸、ドデンカン酸、テトラドデカン酸、ヘキサデカン酸、ヘプタデカン酸、ヘプタデカン酸、オクタデカン酸、イソ酪酸、イソ吉草酸、トリフルオロ酢酸、ペンタフルオロプロピオン酸、ヘプタフルオロ酪酸、ヘニコサフルオロドデカン酸、オレイン酸、リノール酸、リノレイン酸、アラキドン酸、ドコサヘキサエン酸、エイコサペンタエン酸、シュウ酸、マロン酸、コハク酸、アジピン酸、安息香酸、フタル酸、サリチル酸、没食子酸、メリト酸、ケイ皮酸、乳酸、リンゴ酸、クエン酸、フマル酸、マレイン酸、アコニット酸、アミノ酸、ニトロカルボン酸、ポリアクリル酸、ポリアクリル酸の共重合体、ポリメタクリル酸、ポリメタクリル酸の共重合体等のアニオンが挙げられる。スルホン酸アニオンの例としては、メタンスルホン酸、エタンスルホン酸、プロパンスルホン酸、ウンデカンスルホン酸、10−カンファースルホン酸、トリフルオロメタンスルホン酸、ペンタフルオロエタンスルホン酸、ヘプタフルオロプロパンスルホン酸、ノナフルオロブタンスルホン酸、1,1,2,2,3,3−ヘキサフルオロプロパン−1,3−ジスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸、ドデシルベンゼンスルホン酸、1,5−ナフタレンジスルホン酸、ポリスチレンスルホン酸、ポリスチレンスルホン酸の共重合体等のアニオンが挙げられる。ハロゲンアニオンとしては、第17族に属するフッ素、塩素、臭素、ヨウ素、アスタチンのアニオンを表すが、塩素、臭素、ヨウ素のアニオンが好ましく。より好ましくは塩素のアニオンである。本発明一般式(I)で表される化合物の酸化体のカウンターアニオンとしては、トリフルオロ酢酸、ヘプタフルオロ酪酸、ヘニコサフルオロドデカン酸、メタンスルホン酸、プロパンスルホン酸、ウンデカンスルホン酸、ベンゼンスルホン酸及び塩素のアニオンが好ましく、より好ましくは、ヘプタフルオロ酪酸のアニオンである。 Examples of the carboxylate anion represented by the general formula (II) of the present invention include formic acid, acetic acid, propionic acid, butyric acid, valeric acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, dodencanic acid, tetra Dodecanoic acid, hexadecanoic acid, heptadecanoic acid, heptadecanoic acid, octadecanoic acid, isobutyric acid, isovaleric acid, trifluoroacetic acid, pentafluoropropionic acid, heptafluorobutyric acid, henicosafluorododecanoic acid, oleic acid, linoleic acid, linolenic acid, Arachidonic acid, docosahexaenoic acid, eicosapentaenoic acid, oxalic acid, malonic acid, succinic acid, adipic acid, benzoic acid, phthalic acid, salicylic acid, gallic acid, melicic acid, cinnamic acid, lactic acid, malic acid, citric acid, fumaric acid , Maleic acid, aconitic acid, amino acid, nitrocarboxylic acid, polyacrylic acid Acid, copolymers of polyacrylic acid, polymethacrylic acid, anions of a copolymer of polymethacrylic acid. Examples of sulfonic acid anions include methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, undecanesulfonic acid, 10-camphorsulfonic acid, trifluoromethanesulfonic acid, pentafluoroethanesulfonic acid, heptafluoropropanesulfonic acid, nonafluorobutane. Sulfonic acid, 1,1,2,2,3,3-hexafluoropropane-1,3-disulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, 1,5-naphthalenedisulfonic acid, polystyrene Examples include anions such as sulfonic acid and polystyrene sulfonic acid copolymers. The halogen anion represents an anion of fluorine, chlorine, bromine, iodine, or astatine belonging to Group 17, and anion of chlorine, bromine, or iodine is preferable. More preferably, it is a chlorine anion. The counter anion of the oxidant of the compound represented by the general formula (I) of the present invention includes trifluoroacetic acid, heptafluorobutyric acid, henicosafluorododecanoic acid, methanesulfonic acid, propanesulfonic acid, undecanesulfonic acid, and benzenesulfonic acid. And an anion of chlorine, more preferably an anion of heptafluorobutyric acid.
本発明の導電性ナノワイヤーは、金属ナノワイヤー、カーボンナノチューブを併用することができる。 In the conductive nanowire of the present invention, a metal nanowire and a carbon nanotube can be used in combination.
金属ナノワイヤーとしては、1つの金属ナノワイヤーで長い導電パスを形成するために、平均長さが3μm以上であることが好ましく、さらには3〜500μmが好ましく、特に、3〜300μmであることが好ましい。併せて、長さの相対標準偏差は40%以下であることが好ましい。また、平均直径は、透明性の観点からは小さいことが好ましく、一方で、導電性の観点からは大きい方が好ましい。本発明においては、金属ナノワイヤーの平均直径として10〜300nmが好ましく、30〜200nmであることがより好ましい。併せて、直径の相対標準偏差は20%以下であることが好ましい。 As a metal nanowire, in order to form a long conductive path with one metal nanowire, the average length is preferably 3 μm or more, more preferably 3 to 500 μm, and particularly preferably 3 to 300 μm. preferable. In addition, the relative standard deviation of the length is preferably 40% or less. Moreover, it is preferable that an average diameter is small from a transparency viewpoint, On the other hand, the larger one is preferable from an electroconductive viewpoint. In this invention, 10-300 nm is preferable as an average diameter of metal nanowire, and it is more preferable that it is 30-200 nm. In addition, the relative standard deviation of the diameter is preferably 20% or less.
金属ナノワイヤーの金属組成としては特に制限はなく、貴金属元素や卑金属元素の1種または複数の金属から構成することができるが、貴金属(例えば、金、白金、銀、パラジウム、ロジウム、イリジウム、ルテニウム、オスミウム等)及び鉄、コバルト、銅、錫からなる群に属する少なくとも1種の金属を含むことが好ましい。金属ナノワイヤーが2種類以上の金属元素を含む場合には、例えば、金属ナノワイヤーの表面と内部で金属組成が異なっていてもよいし、金属ナノワイヤー全体が同一の金属組成を有していてもよい。 There is no restriction | limiting in particular as a metal composition of metal nanowire, Although it can comprise from the 1 type or several metal of a noble metal element and a base metal element, it is a noble metal (For example, gold | metal | money, platinum, silver, palladium, rhodium, iridium, ruthenium) And at least one metal belonging to the group consisting of iron, cobalt, copper, and tin. When the metal nanowire includes two or more kinds of metal elements, for example, the metal composition may be different between the inside and the surface of the metal nanowire, and the entire metal nanowire has the same metal composition. Also good.
カーボンナノチューブは、厚さ数原子層のグラファイト状炭素原子面(グラフェンシート)が筒形に巻かれた形状からなる炭素系繊維材料であり、その周壁の構成数から単層ナノチューブ(SWNT)と多層ナノチューブ(MWNT)とに大別され、また、グラフェンシートの構造の違いからカイラル(らせん)型、ジグザグ型、アームチェア型に分けられ、各種のものが知られている。カーボンナノチューブの形状としては、1つのカーボンナノチューブで長い導電パスを形成するために、アスペクト比(=長さ/直径)が大きい、すなわち細くて長い単層カーボンナノチューブであることが好ましい。例えば、アスペクト比が102以上、好ましくは103以上のカーボンナノチューブが挙げられる。カーボンナノチューブの平均長さは、3μm以上であることが好ましく、さらには3〜500μmが好ましく、特に、3〜300μmであることが好ましい。併せて、長さの相対標準偏差は40%以下であることが好ましい。また、平均直径は100nmより小さいことが好ましく、1〜50nmが好ましく、1〜30nmであることがより好ましい。併せて、直径の相対標準偏差は20%以下であることが好ましい。 A carbon nanotube is a carbon-based fiber material having a shape in which a graphite-like carbon atomic plane (graphene sheet) having a thickness of several atomic layers is wound into a cylindrical shape, and single-walled nanotubes (SWNT) and multilayers are formed from the number of peripheral walls. It is roughly divided into nanotubes (MWNT), and it is divided into a chiral type, a zigzag type, and an armchair type depending on the structure of the graphene sheet, and various types are known. The shape of the carbon nanotube is preferably a single-walled carbon nanotube having a large aspect ratio (= length / diameter), that is, a thin and long carbon nanotube, in order to form a long conductive path with one carbon nanotube. For example, carbon nanotubes having an aspect ratio of 102 or more, preferably 103 or more can be mentioned. The average length of the carbon nanotubes is preferably 3 μm or more, more preferably 3 to 500 μm, and particularly preferably 3 to 300 μm. In addition, the relative standard deviation of the length is preferably 40% or less. Moreover, it is preferable that an average diameter is smaller than 100 nm, 1-50 nm is preferable and it is more preferable that it is 1-30 nm. In addition, the relative standard deviation of the diameter is preferably 20% or less.
〔バインダー〕
本発明に係るバインダーとしては透明ならば何を用いてもかまわない。水溶性高分子、有機溶剤溶解性高分子、ポリマーラテックス、水性アイオノマーや熱硬化性樹脂、光硬化樹脂、エネルギー線硬化樹脂等の組成物等の中から任意に選択すればよい。また、重合性モノマーやオリゴマーあるいはそれらの混合物を塗布した後、光や熱や電子線などで重合して透明バインダー層を形成しても良い。これらのうち、透明バインダー層として高分子バインダーを用いる場合、高分子バインダーとなるものの例としては、PolymerHandbookVI/453−VI/461に列挙されているものを好適に用いることができる。
〔binder〕
Any transparent binder may be used as long as it is transparent. What is necessary is just to select arbitrarily from compositions, such as water-soluble polymer, organic-solvent soluble polymer, polymer latex, aqueous | water-based ionomer, thermosetting resin, photocuring resin, energy-beam curable resin. Moreover, after apply | coating a polymerizable monomer, an oligomer, or those mixtures, you may superpose | polymerize with light, a heat | fever, an electron beam, etc., and may form a transparent binder layer. Among these, when a polymer binder is used as the transparent binder layer, those listed in Polymer Handbook VI / 453-VI / 461 can be preferably used as examples of the polymer binder.
本発明のバインダーとしては、天然ポリマー、合成樹脂やポリマーおよびコポリマー、その他フィルムを形成する媒体であれば特に限定はないが、親水性でも疎水性でもよい。 The binder of the present invention is not particularly limited as long as it is a natural polymer, synthetic resin, polymer and copolymer, or other medium for forming a film, but may be hydrophilic or hydrophobic.
親水性バインダーとしては、例えば:ゼラチン、カゼイン、デンプン、アラビアゴム、ポリ(ビニルアルコール)、ポリ(ビニルピロリドン)、カルボキシメチルエーテルセルロース、ヒドロキシエチルセルロース、メチルヒドロキシエチルエーテルセルロース等のセルロース類、キトサン、デキストラン、グアーガム、ポリ(アクリルアミド)、ポリ(アクリルアミド−アクリル酸)、ポリ(アクリル酸)、ポリ(メタクリル酸)、ポリ(アリルアミン)、ポリ(ブタジエン−無水マレイン酸)、ポリ(n−ブチルアクリレート−2−メタクリロイルトリメチルアンモニウムブロミド)、ポリ(3−クロロ−2−ヒドロキシプロピル−2−メタクリロキシトリメチルアンモニウムブロミド)、ポリ(2−ジメチルアミノエチルメタクリレート)、ポリ(エチレングリコール)、ポリ(エチレングリコール)−ビスフェノールA−ジグリシジルエーテル付加体、ポリ(エチレングリコール)ビス2−アミノエチル、ポリ(エチレングリコール)ジメチルエーテル、ポリ(エチレングリコール)モノカルボキシメチルエーテルモノメチルエーテル、ポリ(エチレングリコール)モノメチルエーテル、ポリ(エチレンオキシド)、ポリ(エチレンオキシド−b−プロピレンオキシド)、ポリエチレンイミン、ポリ(2−エチル−2−オキサゾリン)、ポリ(1−グリセロールメタクリレート)、ポリ(2−ヒドロキシエチルアクリレート)、ポリ(2−エチルメタクリレート)、ポリ(2−ヒドロキシエチルメタクリレート−メタクリル酸)、ポリ(マレイン酸)、ポリ(メタクリルアミド)、ポリ(2−メタクリロキシエチルトリメチルアンモニウムブロミド)、ポリ(N−イソ−プロピルアクリルアミド)、ポリ(スチレンスルホン酸)、ポリ(N−ビニルアセトアミド)、ポリ(N−メチル−N−ビニルアセトアミド)、ポリ(ビニルアミン)、ポリ(2−ビニル−1−メチルピリジニウムブロミド)、ポリ(リン酸)、ポリ(2−ビニルピリジン)、ポリ(4−ビニルピリジン)、ポリ(2−ビニルピリジン−N−オキシド)、ポリ(ビニルスルホン酸)等が挙げられる。上記バインダーにおいて、カルボン酸、スルホン酸、リン酸等を有するポリマーは、リチウム、ナトリウム、カリウム等の塩を有していてもよく、窒素原子を有するポリマーは塩酸塩等の構造を有していても良い。また、熱硬化性樹脂であるメラミン樹脂、尿素樹脂、グリオキザール系樹脂等も挙げることができる。上記バインダーは1種でも複数種でも使用することができる。 Examples of hydrophilic binders include: gelatin, casein, starch, gum arabic, poly (vinyl alcohol), poly (vinyl pyrrolidone), carboxymethyl ether cellulose, hydroxyethyl cellulose, cellulose such as methyl hydroxyethyl ether cellulose, chitosan, dextran , Guar gum, poly (acrylamide), poly (acrylamide-acrylic acid), poly (acrylic acid), poly (methacrylic acid), poly (allylamine), poly (butadiene-maleic anhydride), poly (n-butyl acrylate-2) -Methacryloyltrimethylammonium bromide), poly (3-chloro-2-hydroxypropyl-2-methacryloxytrimethylammonium bromide), poly (2-dimethylaminoethyl methacrylate) ), Poly (ethylene glycol), poly (ethylene glycol) -bisphenol A-diglycidyl ether adduct, poly (ethylene glycol) bis 2-aminoethyl, poly (ethylene glycol) dimethyl ether, poly (ethylene glycol) monocarboxymethyl ether Monomethyl ether, poly (ethylene glycol) monomethyl ether, poly (ethylene oxide), poly (ethylene oxide-b-propylene oxide), polyethyleneimine, poly (2-ethyl-2-oxazoline), poly (1-glycerol methacrylate), poly ( 2-hydroxyethyl acrylate), poly (2-ethyl methacrylate), poly (2-hydroxyethyl methacrylate-methacrylic acid), poly (maleic acid), poly (methacrylamido) ), Poly (2-methacryloxyethyltrimethylammonium bromide), poly (N-iso-propylacrylamide), poly (styrenesulfonic acid), poly (N-vinylacetamide), poly (N-methyl-N-vinylacetamide) , Poly (vinylamine), poly (2-vinyl-1-methylpyridinium bromide), poly (phosphoric acid), poly (2-vinylpyridine), poly (4-vinylpyridine), poly (2-vinylpyridine-N- Oxide), poly (vinyl sulfonic acid) and the like. In the above binder, the polymer having carboxylic acid, sulfonic acid, phosphoric acid or the like may have a salt such as lithium, sodium or potassium, and the polymer having a nitrogen atom has a structure such as hydrochloride. Also good. Moreover, the melamine resin, urea resin, glyoxal resin, etc. which are thermosetting resins can also be mentioned. One or more of the binders can be used.
疎水性バインダーとしては、例えば、アクリル酸エステル、メタクリル酸エステル等の単独重合体及び共重合体(例えば、ポリメチルメタクリレート)、ポリエチレン、ポリプロピレン、ポリスチレン、塩化ビニル系共重合体、塩化ビニル−酢酸ビニル共重合体、ポリビニルビニルエーテル、ポリ酢酸ビニル、ポリスチレンのようなビニル系ポリマー及びビニル化合物の共重合体、ポリエステル、ポリウレタン、ポリアミドのような縮合系ポリマー、ブタジエン−スチレン共重合体のようなゴム系熱可塑性ポリマー等が挙げられる。また、熱や光で酸を発生させる酸発生剤とエポキシ化合物の組成物、光照射によりラジカルを発生させる光ラジカル発生剤とアクリレート、メタクリレート化合物の組成物等の硬化性樹脂も挙げることができる。 Examples of the hydrophobic binder include homopolymers and copolymers (for example, polymethyl methacrylate) such as acrylic acid ester and methacrylic acid ester, polyethylene, polypropylene, polystyrene, vinyl chloride copolymer, vinyl chloride-vinyl acetate. Copolymers, vinyl polymers such as polyvinyl vinyl ether, polyvinyl acetate, polystyrene, copolymers of vinyl compounds, condensation polymers such as polyester, polyurethane, polyamide, rubber heat such as butadiene-styrene copolymers Examples thereof include a plastic polymer. Moreover, curable resin, such as the composition of an acid generator and an epoxy compound which generate | occur | produce an acid with a heat | fever or light, the composition of an optical radical generator and an acrylate and a methacrylate compound which generate | occur | produce a radical by light irradiation, can also be mentioned.
「ポリマーラテックス」とは水不溶な疎水性ポリマーが微細な粒子として水溶性の分散媒中に分散されたものである。分散状態としてはポリマーが分散媒中に乳化されているもの、乳化重合されたもの、ミセル分散されたもの、あるいはポリマー分子中に部分的に親水的な構造を持ち分子鎖自身が分子状分散されたものなどいずれでもよい。ポリマーラテックスについては「合成樹脂エマルジョン(奥田平、稲垣寛編集、高分子刊行会発行(1978))」、「合成ラテックスの応用(杉村孝明、片岡靖男、鈴木聡一、笠原啓司編集、高分子刊行会発行(1993))」、「合成ラテックスの化学(室井宗一著、高分子刊行会発行(1970))」などに記載されている。分散粒子の平均粒子サイズは1〜50000nm、より好ましくは5〜1000nm程度の範囲が好ましい。分散粒子の粒子サイズ分布に関しては特に制限は無く、広い粒子サイズ分布を持つものでも単分散の粒子サイズ分布を持つものでもよい。ポリマーラテックスとしては、通常の均一構造のポリマーラテックス以外の、いわゆるコア/シェル型のラテックスでもよい。この場合コアとシェルはガラス転移温度を変えると好ましい場合がある。 “Polymer latex” is a water-insoluble hydrophobic polymer dispersed as fine particles in a water-soluble dispersion medium. As the dispersion state, the polymer is emulsified in the dispersion medium, the emulsion polymerized, the micelle-dispersed, or the polymer molecule has a partially hydrophilic structure and the molecular chain itself is molecularly dispersed. Any of them may be used. For polymer latex, see "Synthetic Resin Emulsion (Hiraku Okuda, Hiroshi Inagaki, published by Polymer Press (1978))", "Applications of Synthetic Latex (Takaaki Sugimura, Tatsuo Kataoka, Junichi Suzuki, Keiji Kasahara, edited by Koshihara Kogyo) Publication (1993)), “Synthetic Latex Chemistry (Muroichi Soichi, published by Kobunshi Shuppankai (1970))” and the like. The average particle size of the dispersed particles is preferably from 1 to 50000 nm, more preferably from about 5 to 1000 nm. The particle size distribution of the dispersed particles is not particularly limited, and may have a wide particle size distribution or a monodispersed particle size distribution. The polymer latex may be a so-called core / shell type latex other than a normal polymer latex having a uniform structure. In this case, it may be preferable to change the glass transition temperature between the core and the shell.
ポリマーラテックスに用いられるポリマー種としてはアクリル樹脂、酢酸ビニル樹脂、ポリエステル樹脂、ポリウレタン樹脂、ゴム系樹脂、塩化ビニル樹脂、塩化ビニリデン樹脂、ポリオレフィン樹脂、またはこれらの共重合体などが挙げられる。ポリマーとしては直鎖のポリマーでも枝分かれしたポリマーでも、また架橋されたポリマーでもよい。またポリマーとしては単一のモノマーが重合したいわゆるホモポリマーでもよいし、2種以上のモノマーが重合したコポリマーでもよい。コポリマーの場合はランダムコポリマーでもブロックコポリマーでもよい。好ましいポリマーは直鎖のランダムコポリマーである。ポリマーの分子量は数平均分子量で5,000〜1,000,000、好ましくは10,000〜100,000程度が好ましい。分子量が小さすぎるものは力学強度が不十分であり、大きすぎるものは成膜性が悪く、好ましくない。ポリマーラテックスの具体例としては、メチルメタクリレート/エチルアクリレート/メタクリル酸コポリマーのラテックス、メチルメタクリレート/ブタジエン/イタコン酸コポリマーのラテックス、エチルアクリレート/メタクリル酸のコポリマーのラテックス、メチルメタクリレート/2−エチルヘキシルアクリレート/スチレン/アクリル酸コポリマーのラテックス、スチレン/ブタジエン/アクリル酸コポリマーのラテックス、スチレン/ブタジエン/ジビニルベンゼン/メタクリル酸コポリマーのラテックス、メチルメタクリレート/塩化ビニル/アクリル酸コポリマーのラテックス、塩化ビニリデン/エチルアクリレート/アクリロニトリル/メタクリル酸コポリマーのラテックスなどが挙げられる。 Examples of the polymer species used for the polymer latex include acrylic resins, vinyl acetate resins, polyester resins, polyurethane resins, rubber resins, vinyl chloride resins, vinylidene chloride resins, polyolefin resins, and copolymers thereof. The polymer may be a linear polymer, a branched polymer, or a crosslinked polymer. The polymer may be a so-called homopolymer in which a single monomer is polymerized or a copolymer in which two or more monomers are polymerized. In the case of a copolymer, it may be a random copolymer or a block copolymer. A preferred polymer is a linear random copolymer. The molecular weight of the polymer is 5,000 to 1,000,000, preferably 10,000 to 100,000 in terms of number average molecular weight. When the molecular weight is too small, the mechanical strength is insufficient, and when the molecular weight is too large, the film formability is poor, which is not preferable. Specific examples of the polymer latex include: methyl methacrylate / ethyl acrylate / methacrylic acid copolymer latex, methyl methacrylate / butadiene / itaconic acid copolymer latex, ethyl acrylate / methacrylic acid copolymer latex, methyl methacrylate / 2-ethylhexyl acrylate / styrene. / Latex of acrylic acid copolymer, latex of styrene / butadiene / acrylic acid copolymer, latex of styrene / butadiene / divinylbenzene / methacrylic acid copolymer, latex of methyl methacrylate / vinyl chloride / acrylic acid copolymer, vinylidene chloride / ethyl acrylate / acrylonitrile / Examples thereof include latex of methacrylic acid copolymer.
本発明に用いられるバインダーとしてはゼラチン、ポリ(ビニルアルコール)、セルロースアセテートプロピオネート、ポリ(ビニルピロリドン)、ポリ(ビニルブチラール)、ポリメチルメタクリレート、ポリスチレン、が好ましく、より好ましくは、ポリ(ビニルピロリドン)、ポリメチルメタクリレート、ポリスチレンである。 The binder used in the present invention is preferably gelatin, poly (vinyl alcohol), cellulose acetate propionate, poly (vinyl pyrrolidone), poly (vinyl butyral), polymethyl methacrylate, or polystyrene, and more preferably poly (vinyl). Pyrrolidone), polymethyl methacrylate, and polystyrene.
〔導電膜〕
本発明の導電膜は、本発明の導電性ナノワイヤーとバインダーからなる自立膜でもよく、また支持体に該導電膜を積層しても良い。
[Conductive film]
The conductive film of the present invention may be a self-supporting film composed of the conductive nanowires of the present invention and a binder, or may be laminated on a support.
本発明の導電膜の構造模式図の例を図1に示す。図1は、本発明の代表的な導電膜の構造模式図であって、透明基材51上に導電膜31を有し、該導電膜は導電性ナノワイヤー11とバインダー21を含み構成される。本発明において、その他の構成には特に制限はない。 An example of a structural schematic diagram of the conductive film of the present invention is shown in FIG. FIG. 1 is a structural schematic diagram of a representative conductive film of the present invention, which has a conductive film 31 on a transparent substrate 51, and the conductive film includes a conductive nanowire 11 and a binder 21. . In the present invention, other configurations are not particularly limited.
尚、透明基材には前述のように表面処理を施し、目的に応じて各種の機能性層を設けることができる。 The transparent substrate can be subjected to a surface treatment as described above, and various functional layers can be provided depending on the purpose.
本発明の導電膜においては、全光線透過率が60%以上であることが好ましく、70%以上であることがより好ましく、80%以上であることが特に好ましい。全光透過率は、分光光度計等を用いた公知の方法に従って測定することができる。また、本発明の導電膜の電気抵抗値としては、表面抵抗率として1000Ω/□以下であることが好ましく、100Ω/□以下であることがより好ましい。さらには、電流駆動型オプトエレクトロニクスデバイスに適用するためには、50Ω/□以下であることが好ましく、10Ω/□以下であることが特に好ましい。103Ω/□以下であると各種オプトエレクトロニクスデバイスにおいて、導電膜として機能することができて好ましい。前記表面抵抗率は、例えば、JISK7194:1994(導電性プラスチックの4探針法による抵抗率試験方法)などに準拠して測定することができ、また市販の表面抵抗率計を用いて簡便に測定することができる。 In the conductive film of the present invention, the total light transmittance is preferably 60% or more, more preferably 70% or more, and particularly preferably 80% or more. The total light transmittance can be measured according to a known method using a spectrophotometer or the like. In addition, the electrical resistance value of the conductive film of the present invention is preferably 1000Ω / □ or less, more preferably 100Ω / □ or less as the surface resistivity. Furthermore, in order to apply to a current drive type optoelectronic device, it is preferably 50Ω / □ or less, particularly preferably 10Ω / □ or less. It is preferable that it is 10 3 Ω / □ or less because it can function as a conductive film in various optoelectronic devices. The surface resistivity can be measured in accordance with, for example, JIS K7194: 1994 (resistivity test method using conductive plastic 4-probe method), and can be easily measured using a commercially available surface resistivity meter. can do.
本発明の導電膜の厚みには特に制限はなく、目的に応じて適宜選択することができるが、一般的に10μm以下であることが好ましく、厚みが薄くなるほど透明性や柔軟性が向上するためより好ましい。使用する導電性ナノワイヤーの形状ややバインダー含有量によって異なるが、大凡の目安として、導電性ナノワイヤーの平均直径以上500nm以下が好ましい。加圧方法などにより、本発明に係る導電膜の厚さを薄くすると、厚さ方向の導電性ナノワイヤーのネットワーク形成を密にすることができるため好ましい。 There is no restriction | limiting in particular in the thickness of the electrically conductive film of this invention, Although it can select suitably according to the objective, Generally it is preferable that it is 10 micrometers or less, and transparency and a softness | flexibility improve, so that thickness becomes thin. More preferred. Although it differs depending on the shape of the conductive nanowire used and the binder content, as a rough guide, the average diameter of the conductive nanowire is preferably 500 nm or less. It is preferable to reduce the thickness of the conductive film according to the present invention by a pressurizing method or the like because the network formation of conductive nanowires in the thickness direction can be made dense.
〔支持体〕
本発明の支持体として、本発明の導電ナノワイヤーとバインダーからなる導電膜が積層できれば特に制限はないが、ガラス、樹脂フィルムが好ましく、光学用途に用いる場合、無色で透明である透明基材であることが好ましい。
[Support]
As the support of the present invention, there is no particular limitation as long as the conductive nanowire of the present invention and a conductive film composed of a binder can be laminated, but glass and resin films are preferable, and when used for optical purposes, it is a colorless and transparent transparent substrate. Preferably there is.
本発明において、「透明」とは、JISK7361−1(ISO13468−1に対応)の「プラスチック−透明材料の全光線透過率の試験方法」に準拠した方法で測定した可視光波長領域における全光線透過率が60%以上であることをいう。 In the present invention, “transparent” means total light transmission in the visible light wavelength region measured by a method in accordance with “Testing method of total light transmittance of plastic-transparent material” of JIS K7361-1 (corresponding to ISO13468-1). The rate is 60% or more.
本発明の導電膜に用いられる透明基材としては、高い光透過性を有していればそれ以外に特に制限はない。例えば、基材としての硬度に優れ、またその表面への導電層の形成のし易さ等の点で、ガラス基板、樹脂基板、樹脂フィルムなどの基材が好適に挙げられる。 The transparent substrate used for the conductive film of the present invention is not particularly limited as long as it has high light transmittance. For example, base materials such as a glass substrate, a resin substrate, and a resin film are preferable in terms of excellent hardness as a base material and ease of forming a conductive layer on the surface.
本発明の透明基材として用いることができる透明樹脂フィルムには特に制限はなく、その材料、形状、構造、厚み等については公知のものの中から適宜選択することができる。例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート、変性ポリエステル等のポリエステル系樹脂フィルム、ポリエチレン(PE)樹脂フィルム、ポリプロピレン(PP)樹脂フィルム、ポリスチレン樹脂フィルム、環状オレフィン系樹脂等のポリオレフィン類樹脂フィルム、ポリ塩化ビニル、ポリ塩化ビニリデン等のビニル系樹脂フィルム、ポリエーテルエーテルケトン(PEEK)樹脂フィルム、ポリサルホン(PSF)樹脂フィルム、ポリエーテルサルホン(PES)樹脂フィルム、ポリカーボネート(PC)樹脂フィルム、ポリアミド樹脂フィルム、ポリイミド樹脂フィルム、アクリル樹脂フィルム、トリアセチルセルロース(TAC)樹脂フィルム等を挙げることができるが、可視域の波長(380〜780nm)における透過率が80%以上である樹脂フィルムであれば、本発明に係る透明基材の透明樹脂フィルムに好ましく適用することができる。中でも透明性、耐熱性、取り扱いやすさ、強度及びコストの点から、二軸延伸ポリエチレンテレフタレートフィルム、二軸延伸ポリエチレンナフタレートフィルム、ポリエーテルサルホンフィルム、ポリカーボネートフィルムであることが好ましく、二軸延伸ポリエチレンテレフタレートフィルム、二軸延伸ポリエチレンナフタレートフィルムであることがより好ましい。 There is no restriction | limiting in particular in the transparent resin film which can be used as a transparent base material of this invention, About the material, a shape, a structure, thickness, etc., it can select suitably from well-known things. For example, polyester resin films such as polyethylene terephthalate (PET), polyethylene naphthalate, modified polyester, polyethylene (PE) resin films, polypropylene (PP) resin films, polystyrene resin films, polyolefin resin films such as cyclic olefin resins, Vinyl resin films such as polyvinyl chloride and polyvinylidene chloride, polyether ether ketone (PEEK) resin film, polysulfone (PSF) resin film, polyether sulfone (PES) resin film, polycarbonate (PC) resin film, polyamide resin A film, a polyimide resin film, an acrylic resin film, a triacetyl cellulose (TAC) resin film, and the like can be given. If the resin film transmittance of 80% or more in nm), can be preferably applied to a transparent resin film of a transparent substrate according to the present invention. Among these, from the viewpoint of transparency, heat resistance, ease of handling, strength and cost, it is preferably a biaxially stretched polyethylene terephthalate film, a biaxially stretched polyethylene naphthalate film, a polyethersulfone film, or a polycarbonate film, and biaxially stretched. More preferred are polyethylene terephthalate films and biaxially stretched polyethylene naphthalate films.
本発明に用いられる透明基材には、塗布液の濡れ性や接着性を確保するために、表面処理を施すことや易接着層を設けることができる。表面処理や易接着層については従来公知の技術を使用できる。例えば、表面処理としては、コロナ放電処理、火炎処理、紫外線処理、高周波処理、グロー放電処理、活性プラズマ処理、レーザー処理等の表面活性化処理を挙げることができる。また、易接着層としては、ポリエステル、ポリアミド、ポリウレタン、ビニル系共重合体、ブタジエン系共重合体、アクリル系共重合体、ビニリデン系共重合体、エポキシ系共重合体等を挙げることができる。透明樹脂フィルムが二軸延伸ポリエチレンテレフタレートフィルムである場合は、フィルムに隣接する易接着層の屈折率を1.57〜1.63とすることで、フィルム基材と易接着層との界面反射を低減して透過率を向上させることができるのでより好ましい。屈折率を調整する方法としては、酸化スズゾルや酸化セリウムゾル等の比較的屈折率の高い酸化物ゾルとバインダー樹脂との比率を適宜調整して塗設することで実施できる。易接着層は単層でもよいが、接着性を向上させるためには2層以上の構成にしてもよい。また、透明基材にはバリアコート層が予め形成されていてもよいし、透明導電層を転写する反対側にはハードコート層が予め形成されていてもよい。 The transparent substrate used in the present invention can be subjected to a surface treatment or an easy-adhesion layer in order to ensure the wettability and adhesion of the coating solution. A conventionally well-known technique can be used about a surface treatment or an easily bonding layer. For example, the surface treatment includes surface activation treatment such as corona discharge treatment, flame treatment, ultraviolet treatment, high frequency treatment, glow discharge treatment, active plasma treatment, and laser treatment. Examples of the easy adhesion layer include polyester, polyamide, polyurethane, vinyl copolymer, butadiene copolymer, acrylic copolymer, vinylidene copolymer, and epoxy copolymer. When the transparent resin film is a biaxially stretched polyethylene terephthalate film, by making the refractive index of the easy adhesion layer adjacent to the film 1.57-1.63, the interface reflection between the film substrate and the easy adhesion layer can be achieved. Since it can reduce and can improve the transmittance | permeability, it is more preferable. The method for adjusting the refractive index can be carried out by appropriately adjusting the ratio of the oxide sol having a relatively high refractive index such as tin oxide sol or cerium oxide sol and the binder resin. The easy adhesion layer may be a single layer, but may be composed of two or more layers in order to improve adhesion. Moreover, the barrier coat layer may be formed in advance on the transparent substrate, or the hard coat layer may be formed in advance on the opposite side to which the transparent conductive layer is transferred.
〔製造方法〕
本発明の導電膜の製造方法において、一般式(I)で表される化合物を含有する溶液(A)、一般式(I)で表される化合物の酸化体の塩を含有する溶液(B)及びバインダーを含有する溶液(C)を混合後、支持体上へ塗布し、その後乾燥を行ない製造される。一般式(I)で表される化合物を含有する溶液(A)の溶媒は一般式(I)で表される化合物が溶解すれば特に制限はないが、アセトニトリルが好ましい。溶液(A)の濃度は、一般式(I)で表される化合物が析出しない濃度が良く、1〜20mMが好ましく、特に好ましくは3〜10mMである。一般式(I)で表される化合物の酸化体の塩は、一般式(I)で表される化合物と酸化剤を溶解した溶液中で製造される。酸化剤には特に制限はないが、フェリシアン化カリウム(K3Fe(CN)6)、ヨードベンゼンジアセテートが好ましく、特に好ましくはヨードベンゼンジアセテートである。一般式(I)で表される化合物の酸化体の塩を製造するときの用いる溶媒には、特に制限はないが、アセトニトリルが好ましい。一般式(I)で表される化合物の酸化体の塩を含有する溶液(B)の溶媒は一般式(I)で表される化合物の酸化体の塩が溶解すれば特に制限はないが、アセトニトリルが好ましい。溶液(B)の濃度は、一般式(I)で表される酸化体の塩が析出しない濃度が良く、1〜50mMが好ましく、特に好ましくは5〜30mMである。バインダーを含有する溶液(C)の溶媒は、使用するバインダーが溶解すれば特に制限はなく、例えばポリメチルメタクリレート、ポリビニルピロリドン及びポリスチレンの場合は、それぞれ塩化メチレン、アセトニトリル及びベンゼンが好ましい。塗布溶液の調製は、一般式(I)で表される化合物を含有する溶液(A)、一般式(I)で表される化合物の酸化体の塩を含有する溶液(B)及びバインダーを含有する溶液(C)を混合後、室温で攪拌することにより得られる。攪拌時間は、1〜180分が好ましく、より好ましくは3〜120分で、更に好ましくは5〜60分である。
〔Production method〕
In the method for producing a conductive film of the present invention, a solution (A) containing a compound represented by the general formula (I), a solution (B) containing a salt of an oxidant of the compound represented by the general formula (I) And after mixing the solution (C) containing a binder, it apply | coats on a support body, it dries after that and is manufactured. The solvent of the solution (A) containing the compound represented by the general formula (I) is not particularly limited as long as the compound represented by the general formula (I) is dissolved, but acetonitrile is preferable. The concentration of the solution (A) is preferably a concentration at which the compound represented by the general formula (I) does not precipitate, preferably 1 to 20 mM, particularly preferably 3 to 10 mM. The salt of the oxidized form of the compound represented by the general formula (I) is produced in a solution in which the compound represented by the general formula (I) and the oxidizing agent are dissolved. The oxidizing agent is not particularly limited, but potassium ferricyanide (K 3 Fe (CN) 6 ) and iodobenzene diacetate are preferable, and iodobenzene diacetate is particularly preferable. Although there is no restriction | limiting in particular in the solvent used when manufacturing the salt of the oxidant of the compound represented by general formula (I), Acetonitrile is preferable. The solvent of the solution (B) containing the oxidized salt of the compound represented by the general formula (I) is not particularly limited as long as the oxidized salt of the compound represented by the general formula (I) is dissolved. Acetonitrile is preferred. The concentration of the solution (B) is preferably a concentration at which the salt of the oxidant represented by the general formula (I) does not precipitate, preferably 1 to 50 mM, particularly preferably 5 to 30 mM. The solvent of the solution (C) containing the binder is not particularly limited as long as the binder to be used is dissolved. For example, in the case of polymethyl methacrylate, polyvinyl pyrrolidone and polystyrene, methylene chloride, acetonitrile and benzene are preferable, respectively. The preparation of the coating solution includes a solution (A) containing the compound represented by the general formula (I), a solution (B) containing a salt of an oxidant of the compound represented by the general formula (I), and a binder. The solution (C) to be obtained is mixed and then stirred at room temperature. The stirring time is preferably 1 to 180 minutes, more preferably 3 to 120 minutes, and further preferably 5 to 60 minutes.
本発明の導電膜の製造方法において、透明基材上に導電性ナノワイヤーとバインダーを含む導電膜を形成する方法に特に制限はないが、生産性の改善、平滑性や均一性などの導電膜の品質の向上、環境負荷軽減の観点から、導電膜の形成には塗布法や印刷法などの液相成膜法を用いることが好ましい。塗布法としては、ロールコート法、バーコート法、ディップコーティング法、スピンコーティング法、キャスティング法、ダイコート法、ブレードコート法、バーコート法、グラビアコート法、カーテンコート法、スプレーコート法、ドクターコート法などを用いることができる。印刷法としては、凸版(活版)印刷法、孔版(スクリーン)印刷法、平版(オフセット)印刷法、凹版(グラビア)印刷法、スプレー印刷法、インクジェット印刷法などを用いることができる。なお、必要に応じて、密着性・塗工性を向上させるための予備処理として、離型性基材表面にコロナ放電処理、プラズマ放電処理などの物理的表面処理を施すことができる。 Although there is no restriction | limiting in particular in the method of forming the electrically conductive nanowire and the electrically conductive film containing a binder on a transparent base material in the manufacturing method of the electrically conductive film of this invention, The electrically conductive film of productivity improvement, smoothness, uniformity, etc. From the viewpoint of improving the quality and reducing the environmental burden, it is preferable to use a liquid phase film forming method such as a coating method or a printing method for forming the conductive film. Application methods include roll coating, bar coating, dip coating, spin coating, casting, die coating, blade coating, bar coating, gravure coating, curtain coating, spray coating, and doctor coating. Etc. can be used. As the printing method, a letterpress (letter) printing method, a stencil (screen) printing method, a lithographic (offset) printing method, an intaglio (gravure) printing method, a spray printing method, an ink jet printing method, and the like can be used. In addition, as necessary, physical surface treatment such as corona discharge treatment or plasma discharge treatment can be applied to the surface of the releasable substrate as a preliminary treatment for improving the adhesion and coating properties.
本発明の導電膜の製造方法において、平滑な離型性基材の離型面上に、導電性ナノワイヤーとバインダーを含む導電膜を形成した後、該導電膜を接着性透明基材上に転写することにより導電膜を形成する方法を用いても良い。この方法を用いることにより、導電膜の表面を簡便にかつ安定に高平滑化することができる。 In the manufacturing method of the electrically conductive film of this invention, after forming the electrically conductive film containing electroconductive nanowire and a binder on the mold release surface of a smooth moldable base material, this electrically conductive film is formed on an adhesive transparent base material. A method of forming a conductive film by transferring may be used. By using this method, the surface of the conductive film can be easily and stably highly smoothed.
本発明の導電膜の製造方法で用いられる離型性基板としては、樹脂基板や樹脂フィルムなどが好適に挙げられる。該樹脂には特に制限はなく、公知のものの中から適宜選択することができ、例えば、ポリエチレンテレフタレート樹脂、塩化ビニル系樹脂、アクリル系樹脂、ポリカーボネート樹脂、ポリイミド樹脂、ポリエチレン樹脂、ポリプロピレン樹脂などの合成樹脂の単層あるいは複数層からなる基板やフィルムが好適に用いられる。更にガラス基板や金属基板を用いることもできる。また、離型性基板の表面(離型面)には、必要に応じてシリコーン樹脂やフッ素樹脂、ワックスなどの離型剤を塗布して表面処理を施してもよい。 Suitable examples of the releasable substrate used in the method for producing a conductive film of the present invention include a resin substrate and a resin film. There is no restriction | limiting in particular in this resin, It can select suitably from well-known things, For example, synthesis | combination, such as a polyethylene terephthalate resin, a vinyl chloride resin, an acrylic resin, a polycarbonate resin, a polyimide resin, a polyethylene resin, a polypropylene resin A substrate or film composed of a single layer or multiple layers of resin is preferably used. Furthermore, a glass substrate or a metal substrate can also be used. Further, the surface (release surface) of the releasable substrate may be subjected to a surface treatment by applying a release agent such as silicone resin, fluororesin, or wax as necessary.
離型性基板表面は、導電膜を転写した後の表面の平滑性に影響を与えるため、高平滑であることが望ましく、具体的にはRy≦50nmであることが好ましく、Ry≦40nmであることがより好ましく、Ry≦30nmであることが更に好ましい。また、Ra≦5nmであることが好ましく、Ra≦3nmであることがより好ましく、Ra≦1nmであることが更に好ましい。表面の平滑性を表すRyとRaは、Ry=最大高さ(表面の山頂部と谷底部との高低差)とRa=算術平均粗さを意味し、JIS B601(1994)に規定される表面粗さに準ずる値であり、RyやRaの測定には、市販の原子間力顕微鏡(Atomic Force Microscopy:AFM)を用いることができる。 Since the surface of the releasable substrate affects the smoothness of the surface after the conductive film is transferred, it is desirable that the surface of the releasable substrate be highly smooth. Specifically, Ry ≦ 50 nm is preferable, and Ry ≦ 40 nm. It is more preferable that Ry ≦ 30 nm. Further, Ra ≦ 5 nm is preferable, Ra ≦ 3 nm is more preferable, and Ra ≦ 1 nm is still more preferable. Ry and Ra representing the smoothness of the surface mean Ry = maximum height (difference between the top and bottom of the surface) and Ra = arithmetic mean roughness, and are defined in JIS B601 (1994). It is a value according to the roughness, and a commercially available atomic force microscope (AFM) can be used for the measurement of Ry and Ra.
透明基材上に、導電性ナノワイヤーとバインダーを含む平滑性に優れた導電膜を形成する具体的な方法として、例えば次のようなプロセスを挙げることができる。 As a specific method for forming a conductive film excellent in smoothness including conductive nanowires and a binder on a transparent substrate, for example, the following process can be exemplified.
離型性基板の離型面上に、導電性ナノワイヤーとバインダーの分散液を塗布(または印刷)・乾燥して導電性ナノワイヤーからなる導電ネットワーク構造を形成する次いで、該導電膜または別の透明基材上に接着層を塗設して両者を貼合する。接着層を硬化させた後、離型性基板を剥離することによって導電膜を透明基材に転写する。また、離型性基板の離型面上に、導電性ナノワイヤーの分散液を塗布(または印刷)・乾燥して導電性ナノワイヤーからなる導電ネットワーク構造を形成する。次いで、該導電性ナノワイヤーのネットワーク構造上に導電性材料の分散液を塗布(または印刷)し、基板表面上の導電性ナノワイヤーのネットワーク構造の隙間に導電性材料を含浸させ、導電性ナノワイヤーと導電性材料を含む導電膜層を形成する。次いで、該導電膜層または別の透明基材上に接着層を塗設して両者を貼合する。接着層を硬化させた後、離型性基板を剥離することによって導電膜層を透明基材に転写する。 On the release surface of the release substrate, a conductive nanowire and binder dispersion liquid is applied (or printed) and dried to form a conductive network structure composed of conductive nanowires. An adhesive layer is coated on a transparent base material, and both are bonded together. After the adhesive layer is cured, the conductive film is transferred to the transparent substrate by peeling the release substrate. Further, a conductive nanowire dispersion liquid is applied (or printed) and dried on the release surface of the release substrate to form a conductive network structure made of conductive nanowires. Next, a dispersion liquid of a conductive material is applied (or printed) on the network structure of the conductive nanowires, and the conductive material is impregnated in the gaps of the network structure of the conductive nanowires on the substrate surface. A conductive film layer including a wire and a conductive material is formed. Next, an adhesive layer is applied on the conductive film layer or another transparent substrate, and both are bonded together. After the adhesive layer is cured, the conductive film layer is transferred to the transparent substrate by peeling the release substrate.
上記のプロセスにおいて、導電性ナノワイヤーを塗布・乾燥した後、カレンダー処理や熱処理を施し導電性ナノワイヤー間の密着性を高めることや、プラズマ処理を施し導電性ナノワイヤー間の接触抵抗を低減することは、導電性ナノワイヤーのネットワーク構造の導電性を向上させる方法として有効である。また、上記プロセスにおいて、離型性基板の離型面は、予めコロナ放電(プラズマ)などにより親水化処理していてもよい。 In the above process, after applying and drying conductive nanowires, calendar treatment and heat treatment are applied to increase the adhesion between conductive nanowires, or plasma treatment is applied to reduce contact resistance between conductive nanowires. This is effective as a method for improving the conductivity of the network structure of conductive nanowires. In the above process, the release surface of the release substrate may be previously hydrophilized by corona discharge (plasma) or the like.
上記プロセスにおいて、接着層は離型性基板側に設けても良いし、透明基材側に設けても良い。接着層に用いられる接着剤としては、可視領域で透明で転写能を有する材料であれば特に限定されない。透明であれば、硬化型樹脂でも良いし、熱可塑性樹脂でも良い。 In the above process, the adhesive layer may be provided on the releasable substrate side or on the transparent base material side. The adhesive used for the adhesive layer is not particularly limited as long as it is a material that is transparent in the visible region and has transfer ability. As long as it is transparent, a curable resin or a thermoplastic resin may be used.
硬化型樹脂として、熱硬化型樹脂、紫外線硬化型樹脂、電子線硬化型樹脂などが挙げられるが、これらの硬化型樹脂のうちでは、樹脂硬化のための設備が簡易で作業性に優れることから、紫外線硬化型樹脂を用いることが好ましい。紫外線硬化型樹脂とは紫外線照射により架橋反応等を経て硬化する樹脂で、エチレン性不飽和二重結合を有するモノマーを含む成分が好ましく用いられる。例えば、アクリルウレタン系樹脂、ポリエステルアクリレート系樹脂、エポキシアクリレート系樹脂、ポリオールアクリレート系樹脂等が挙げられる。本発明では、バインダーとしてアクリル系、アクリルウレタン系の紫外線硬化型樹脂を主成分とすることが好ましい。 Examples of curable resins include thermosetting resins, ultraviolet curable resins, and electron beam curable resins. Among these curable resins, the equipment for resin curing is simple and excellent in workability. It is preferable to use an ultraviolet curable resin. The ultraviolet curable resin is a resin that is cured through a crosslinking reaction or the like by ultraviolet irradiation, and a component containing a monomer having an ethylenically unsaturated double bond is preferably used. For example, acrylic urethane type resin, polyester acrylate type resin, epoxy acrylate type resin, polyol acrylate type resin and the like can be mentioned. In the present invention, it is preferable that an acrylic or acrylic urethane-based ultraviolet curable resin is a main component as a binder.
アクリルウレタン系樹脂は、一般にポリエステルポリオールにイソシアネートモノマー、またはプレポリマーを反応させて得られた生成物にさらに2−ヒドロキシエチルアクリレート、2−ヒドロキシエチルメタクリレート(以下アクリレートにはメタクリレートを包含するものとしてアクリレートのみを表示する)、2−ヒドロキシプロピルアクリレート等の水酸基を有するアクリレート系のモノマーを反応させることによって容易に得ることができる。例えば、特開昭59−151110号に記載のものを用いることができる。例えば、ユニディック17−806(大日本インキ(株)製)100部とコロネートL(日本ポリウレタン(株)製)1部との混合物等が好ましく用いられる。 Acrylic urethane-based resins generally include 2-hydroxyethyl acrylate and 2-hydroxyethyl methacrylate (hereinafter referred to as acrylates including methacrylates) to products obtained by reacting polyester polyols with isocyanate monomers or prepolymers. Can be easily obtained by reacting an acrylate monomer having a hydroxyl group such as 2-hydroxypropyl acrylate. For example, those described in JP-A-59-151110 can be used. For example, a mixture of 100 parts Unidic 17-806 (Dainippon Ink Co., Ltd.) and 1 part Coronate L (Nihon Polyurethane Co., Ltd.) is preferably used.
紫外線硬化型ポリエステルアクリレート系樹脂としては、一般にポリエステルポリオールに2−ヒドロキシエチルアクリレート、2−ヒドロキシアクリレート系のモノマーを反応させると容易に形成されるものを挙げることができ、特開昭59−151112号に記載のものを用いることができる。 Examples of UV curable polyester acrylate resins include those which are easily formed when 2-hydroxyethyl acrylate and 2-hydroxy acrylate monomers are generally reacted with polyester polyols. JP-A-59-151112 Can be used.
紫外線硬化型エポキシアクリレート系樹脂の具体例としては、エポキシアクリレートをオリゴマーとし、これに反応性希釈剤、光反応開始剤を添加し、反応させて生成するものを挙げることができ、特開平1−105738号に記載のものを用いることができる。 Specific examples of the ultraviolet curable epoxy acrylate resin include an epoxy acrylate as an oligomer, a reactive diluent and a photoreaction initiator added to the oligomer, and a reaction. Those described in US Pat. No. 105738 can be used.
紫外線硬化型ポリオールアクリレート系樹脂の具体例としては、トリメチロールプロパントリアクリレート、ジトリメチロールプロパンテトラアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールヘキサアクリレート、アルキル変性ジペンタエリスリトールペンタアクリレート等を挙げることができる。 Specific examples of UV curable polyol acrylate resins include trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, alkyl-modified dipentaerythritol pentaacrylate, etc. Can be mentioned.
樹脂モノマーとしては、例えば、不飽和二重結合が一つのモノマーとして、メチルアクリレート、エチルアクリレート、ブチルアクリレート、ベンジルアクリレート、シクロヘキシルアクリレート、酢酸ビニル、スチレン等の一般的なモノマーを挙げることができる。また不飽和二重結合を二つ以上持つモノマーとして、エチレングリコールジアクリレート、プロピレングリコールジアクリレート、ジビニルベンゼン、1,4−シクロヘキサンジアクリレート、1,4−シクロヘキシルジメチルアジアクリレート、前出のトリメチロールプロパントリアクリレート、ペンタエリスリトールテトラアクリルエステル等を挙げることができる。 Examples of the resin monomer may include general monomers such as methyl acrylate, ethyl acrylate, butyl acrylate, benzyl acrylate, cyclohexyl acrylate, vinyl acetate, and styrene as monomers having one unsaturated double bond. In addition, monomers having two or more unsaturated double bonds include ethylene glycol diacrylate, propylene glycol diacrylate, divinylbenzene, 1,4-cyclohexane diacrylate, 1,4-cyclohexyldimethyl adiacrylate, and the above trimethylolpropane. Examples thereof include triacrylate and pentaerythritol tetraacryl ester.
これらの中で、バインダーの主成分として、1,4−シクロヘキサンジアクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリメチロールプロパン(メタ)アクリレート、トリメチロールエタン(メタ)アクリレート、ジペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、1,2,3−シクロヘキサンテトラメタクリレート、ポリウレタンポリアクリレート、ポリエステルポリアクリレートから選択されるアクリル系の活性線硬化樹脂が好ましい。 Among these, 1,4-cyclohexanediacrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, trimethylolpropane (meth) acrylate, trimethylolethane (meth) acrylate as the main component of the binder , An acrylic selected from dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,2,3-cyclohexanetetramethacrylate, polyurethane polyacrylate, polyester polyacrylate A system active ray curable resin is preferred.
これら紫外線硬化型樹脂の光反応開始剤としては、具体的には、ベンゾイン及びその誘導体、アセトフェノン、ベンゾフェノン、ヒドロキシベンゾフェノン、ミヒラーズケトン、α−アミロキシムエステル、チオキサントン等及びこれらの誘導体を挙げることができる。光増感剤と共に使用してもよい。上記光反応開始剤も光増感剤として使用できる。また、エポキシアクリレート系の光反応開始剤の使用の際、n−ブチルアミン、トリエチルアミン、トリ−n−ブチルホスフィン等の増感剤を用いることができる。紫外線硬化型樹脂組成物に用いられる光反応開始剤また光増感剤は該組成物100質量部に対して0.1〜15質量部であり、好ましくは1〜10質量部である。 Specific examples of the photoinitiator of these ultraviolet curable resins include benzoin and its derivatives, acetophenone, benzophenone, hydroxybenzophenone, Michler's ketone, α-amyloxime ester, thioxanthone, and derivatives thereof. You may use with a photosensitizer. The photoinitiator can also be used as a photosensitizer. In addition, when using an epoxy acrylate photoinitiator, a sensitizer such as n-butylamine, triethylamine, or tri-n-butylphosphine can be used. The photoreaction initiator or photosensitizer used in the ultraviolet curable resin composition is 0.1 to 15 parts by weight, preferably 1 to 10 parts by weight, based on 100 parts by weight of the composition.
透明導電膜を形成した離型性基板と透明基材とを接着(貼合)し、紫外線等を照射して接着剤を硬化した後に離型性基板を剥離することにより、透明導電膜を透明基材側に転写することができる。ここで、接着方法は特に限定されることなく、シートプレス、ロールプレス等により行うことができるが、ロールプレス機を用いて行うことが好ましい。ロールプレスは、ロールとロールの間に接着すべきフィルムを挟んで圧着し、ロールを回転させる方法である。ロールプレスは均一に圧力がかけられ、シートプレスよりも生産性が良く好適に用いることができる。 The transparent conductive film is made transparent by bonding (bonding) the release substrate on which the transparent conductive film is formed and the transparent base material, curing the adhesive by irradiating ultraviolet rays and the like, and then peeling the release substrate. It can be transferred to the substrate side. Here, the bonding method is not particularly limited and can be performed by a sheet press, a roll press or the like, but is preferably performed using a roll press machine. The roll press is a method in which a film to be bonded is sandwiched between the rolls, and the rolls are rotated. The roll press is uniformly applied with pressure, and has a higher productivity than the sheet press and can be used preferably.
本発明の導電膜は導電性材料を含むことができる。導電性材料に適用される導電性高分子としては、例えば、ポリピロール、ポリアニリン、ポリチオフェン、ポリチエニレンビニレン、ポリアズレン、ポリイソチアナフテン、ポリカルバゾール、ポリアセチレン、ポリフェニレン、ポリフェニレンビニレン、ポリアセン、ポリフェニルアセチレン、ポリジアセチレン及びポリナフタレンの各誘導体からなる群より選ばれる化合物等を挙ることができる。 The conductive film of the present invention can contain a conductive material. Examples of the conductive polymer applied to the conductive material include polypyrrole, polyaniline, polythiophene, polythienylene vinylene, polyazulene, polyisothianaphthene, polycarbazole, polyacetylene, polyphenylene, polyphenylene vinylene, polyacene, polyphenylacetylene, Examples include compounds selected from the group consisting of polydiacetylene and polynaphthalene derivatives.
導電性材料は、1種類の導電性高分子を単独に含有してもよいし、2種類以上の導電性高分子を組み合わせて含有してもよいが、導電性及び透明性の観点から、下記一般式(1)または一般式(2)で示される繰り返し単位を有するポリアニリンまたはその誘導体や、下記一般式(3)で示される繰り返し単位を有するポリピロール誘導体、または下記一般式(4)で示される繰り返し単位を有するポリチオフェン誘導体からなる群より選ばれる少なくとも1種の化合物を含むことがより好ましい。 The conductive material may contain one kind of conductive polymer alone or may contain two or more kinds of conductive polymers in combination, but from the viewpoint of conductivity and transparency, Polyaniline having a repeating unit represented by the general formula (1) or general formula (2) or a derivative thereof, a polypyrrole derivative having a repeating unit represented by the following general formula (3), or represented by the following general formula (4) More preferably, it contains at least one compound selected from the group consisting of polythiophene derivatives having repeating units.
なお、一般式(1)において、MはH+、アルカリ金属イオン、又はアンモニウムイオンを表す。一般式(2)において、Aは置換されても良い炭素数1〜4のアルキレン基を示し、Qは酸素原子、硫黄原子を表す。また、一般式(5)及び一般式(6)において、Rは主として線状有機置換基であり、アルキル基、アルコキシ基、アリル基又はこれらの基の組み合わせが好ましいが、可溶性導電性高分子としての性質を失わなければよく、さらにこれらにスルホネート基、エステル基、アミド基などが結合しても、組み合わされてもよい。なお、nは整数である。 In the general formula (1), M represents H + , an alkali metal ion, or an ammonium ion. In the general formula (2), A represents an optionally substituted alkylene group having 1 to 4 carbon atoms, and Q represents an oxygen atom or a sulfur atom. In general formula (5) and general formula (6), R is mainly a linear organic substituent, preferably an alkyl group, an alkoxy group, an allyl group, or a combination of these groups. It is sufficient that the above properties are not lost, and a sulfonate group, an ester group, an amide group or the like may be bonded to or combined with these. Note that n is an integer.
導電性高分子には、導電性をより高めるためにドーピング処理を施すことができる。導電性高分子に対するドーパントとしては、例えば、炭素数が6〜30の炭化水素基を有するスルホン酸(以下、長鎖スルホン酸ともいう。)あるいはその重合体(例えば、ポリスチレンスルホン酸)、ハロゲン原子、ルイス酸、プロトン酸、遷移金属ハロゲン化物、遷移金属化合物、アルカリ金属、アルカリ土類金属、MClO4(M=Li+、Na+)、R4N+(R=CH3、C4H9、C6H5)、またはR4P+(R=CH3、C4H9、C6H5)からなる群から選ばれる少なくとも1種が挙げられる。なかでも、上記長鎖スルホン酸が好ましい。 The conductive polymer can be subjected to a doping treatment in order to further increase the conductivity. As a dopant for the conductive polymer, for example, a sulfonic acid having a hydrocarbon group having 6 to 30 carbon atoms (hereinafter also referred to as a long-chain sulfonic acid) or a polymer thereof (for example, polystyrene sulfonic acid), a halogen atom , Lewis acid, proton acid, transition metal halide, transition metal compound, alkali metal, alkaline earth metal, MClO 4 (M = Li + , Na + ), R 4 N + (R═CH 3 , C 4 H 9 , C 6 H 5 ), or R 4 P + (R═CH 3 , C 4 H 9 , C 6 H 5 ). Of these, the long-chain sulfonic acid is preferable.
また、導電性高分子に対するドーパントは、水素化フラーレン、水酸化フラーレン、スルホン酸化フラーレンなどのフラーレン類に導入されていてもよい。透明導電膜において、上記ドーパントは、導電性高分子100質量部に対して、0.001質量部以上含まれていることが好ましい。さらには、0.5質量部以上含まれていることがより好ましい。 The dopant for the conductive polymer may be introduced into fullerenes such as hydrogenated fullerene, hydroxylated fullerene, and sulfonated fullerene. In the transparent conductive film, the dopant is preferably contained in an amount of 0.001 part by mass or more with respect to 100 parts by mass of the conductive polymer. Furthermore, it is more preferable that 0.5 mass part or more is contained.
尚、本発明の導電性材料は、長鎖スルホン酸、長鎖スルホン酸の重合体(例えば、ポリスチレンスルホン酸)、ハロゲン、ルイス酸、プロトン酸、遷移金属ハロゲン化物、遷移金属化合物、アルカリ金属、アルカリ土類金属、MClO4、R4N+、およびR4P+からなる群から選ばれる少なくとも1種のドーパントと、フラーレン類との双方を含んでいてもよい。 The conductive material of the present invention includes a long-chain sulfonic acid, a polymer of long-chain sulfonic acid (for example, polystyrene sulfonic acid), halogen, Lewis acid, proton acid, transition metal halide, transition metal compound, alkali metal, Both at least one dopant selected from the group consisting of alkaline earth metals, MClO 4 , R 4 N + , and R 4 P + and fullerenes may be included.
導電性高分子として、特表2001−511581号公報や特開2004−99640号公報、特開2007−165199号公報などに開示される金属によって改質された導電性高分子を用いることもできる。 As the conductive polymer, a conductive polymer modified with a metal disclosed in JP-T-2001-511581, JP-A-2004-99640, JP-A-2007-165199, or the like can also be used.
導電性高分子を含む導電性材料には、水溶性有機化合物を含有してもよい。水溶性有機化合物の中で、導電性高分子材料に添加することによって導電性を向上させる効果を有する化合物が知られており、2nd.ドーパント(或いは増感剤)と称される場合がある。 The conductive material containing a conductive polymer may contain a water-soluble organic compound. Among water-soluble organic compounds, compounds having an effect of improving conductivity by adding to a conductive polymer material are known, and 2nd. Sometimes called a dopant (or sensitizer).
導電性材料で用いることができる2nd.ドーパントには特に制限はなく、公知のものの中から適宜選択することができ、例えば、ジメチルスルホキシド(DMSO)やジエチレングリコール、その他酸素含有化合物が好適に挙げられる。 2nd. Which can be used for conductive materials. There is no restriction | limiting in particular in a dopant, It can select suitably from well-known things, For example, a dimethyl sulfoxide (DMSO), diethylene glycol, and another oxygen containing compound are mentioned suitably.
導電性高分子を含む導電性材料においては、導電性高分子100質量部に対する上記2nd.ドーパントの含有量は、0.001質量部以上が好ましく、0.01〜50質量部がより好ましく、0.01〜10質量部が特に好ましい。 In the conductive material containing a conductive polymer, the 2nd. 0.001 mass part or more is preferable, as for content of a dopant, 0.01-50 mass parts is more preferable, and 0.01-10 mass parts is especially preferable.
導電性高分子を含む導電性材料は、成膜性や膜強度を確保するために、導電性高分子の他に透明な樹脂成分や添加剤を含んでいてもよい。透明な樹脂成分としては、導電性高分子と相溶又は混合分散可能であれば特に制限されず、熱硬化性樹脂であってもよいし、熱可塑性樹脂であってもよい。例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステル系樹脂、ポリイミド、ポリアミドイミド等のポリイミド系樹脂、ポリアミド6、ポリアミド6,6、ポリアミド12、ポリアミド11等のポリアミド樹脂、ポリフッ化ビニリデン、ポリフッ化ビニル、ポリテトラフルオロエチレン、エチレンテトラフルオロエチレンコポリマー、ポリクロロトリフルオロエチレン等のフッ素樹脂、ポリビニルアルコール、ポリビニルエーテル、ポリビニルブチラール、ポリ酢酸ビニル、ポリ塩化ビニル等のビニル樹脂、エポキシ樹脂、キシレン樹脂、アラミド樹脂、ポリウレタン系樹脂、ポリウレア系樹脂、メラミン樹脂、フェノール系樹脂、ポリエーテル、アクリル系樹脂及びこれらの共重合体等が挙げられる。 The conductive material containing a conductive polymer may contain a transparent resin component or additive in addition to the conductive polymer in order to ensure film formability and film strength. The transparent resin component is not particularly limited as long as it is compatible or mixed and dispersed with the conductive polymer, and may be a thermosetting resin or a thermoplastic resin. For example, polyester resins such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate, polyimide resins such as polyimide and polyamideimide, polyamide resins such as polyamide 6, polyamide 6,6, polyamide 12 and polyamide 11, polyvinylidene fluoride, Fluorine resin such as polyvinyl fluoride, polytetrafluoroethylene, ethylene tetrafluoroethylene copolymer, polychlorotrifluoroethylene, etc., vinyl resin such as polyvinyl alcohol, polyvinyl ether, polyvinyl butyral, polyvinyl acetate, polyvinyl chloride, epoxy resin, xylene Resin, aramid resin, polyurethane resin, polyurea resin, melamine resin, phenol resin, polyether, acrylic resin and their co-polymer Body, and the like.
導電性材料には、導電性を改善するためにポリアニオンを用いても良い。本発明で用いられるポリアニオンは、高分子カルボン酸、高分子スルホン酸及びこれらの塩の各誘導体からなる群より選ばれる化合物等を挙ることができ、好ましくは高分子スルホン酸及びその塩である。ポリアニオンは単独に含有してもよいし、2種類以上を組み合わせて含有してもよい。また、ポリアニオンは、カルボン酸、スルホン酸を有する構造単位と酸残基を有していないモノマー、例えばアクリレート、メタクリレート及びスチレン等と共重合体を形成してもよい。 A polyanion may be used for the conductive material in order to improve conductivity. Examples of the polyanion used in the present invention include compounds selected from the group consisting of polymer carboxylic acids, polymer sulfonic acids, and derivatives of these salts, preferably polymer sulfonic acids and salts thereof. . The polyanions may be contained alone or in combination of two or more. The polyanion may form a copolymer with a structural unit having carboxylic acid or sulfonic acid and a monomer having no acid residue, such as acrylate, methacrylate, styrene, or the like.
高分子カルボン酸、高分子スルホン酸及びこれらの塩の具体例としては、例えばポリアクリル酸、ポリメタクリル酸またはポリマレイン酸、高分子スルホン酸、ポリスチレンスルホン酸及びポリビニルスルホン酸及びこれらの塩であり、好ましくは、ポリスチレンスルホン酸及びその塩である。 Specific examples of the polymer carboxylic acid, polymer sulfonic acid and salts thereof include, for example, polyacrylic acid, polymethacrylic acid or polymaleic acid, polymer sulfonic acid, polystyrene sulfonic acid and polyvinyl sulfonic acid and salts thereof. Polystyrene sulfonic acid and its salt are preferable.
〔パターニング方法〕
本発明の導電膜はパターニングすることができる。パターニングの方法やプロセスには特に制限はなく、公知の手法を適宜適用することができる。例えば、離型面上にパターニングされた導電膜を形成した後、透明基材上に転写することによってパターニングされた導電膜を形成する方法を用いることができ、具体的には、以下のような方法を好ましく用いることができる。
[Patterning method]
The conductive film of the present invention can be patterned. There is no particular limitation on the patterning method or process, and a known method can be applied as appropriate. For example, a method of forming a patterned conductive film by forming a patterned conductive film on a release surface and then transferring it onto a transparent substrate can be used. The method can be preferably used.
i)離型性基板上に印刷法を用いて本発明の導電膜をパターン様に直接形成する方法
ii)離型性基板上に本発明の導電膜を一様に形成した後、一般的なフォトリソプロセスを用いてパターニングする方法
iii)例えば紫外線硬化型樹脂を含む導電性材料を使用して本発明の導電膜を一様に形成した後、フォトリソプロセス様にパターニングする方法
iv)離型性基板上に予めフォトレジストで形成したネガパターン上に本発明の導電膜を一様に形成し、リフトオフ法を用いてパターニングする方法
上記のいずれの方法においても、離型性基板上でパターニングした導電膜層を透明基材上に転写することにより、パターニングされた本発明の導電膜を形成することができる。
i) A method of directly forming the conductive film of the present invention in a pattern-like manner on a releasable substrate using a printing method.
ii) A method of uniformly forming the conductive film of the present invention on a releasable substrate and then patterning using a general photolithography process
iii) A method of patterning like a photolithography process after uniformly forming the conductive film of the present invention using, for example, a conductive material containing an ultraviolet curable resin
iv) A method of uniformly forming the conductive film of the present invention on a negative pattern previously formed of a photoresist on a releasable substrate and patterning it using the lift-off method In any of the above methods, the releasable substrate By transferring the conductive film layer patterned above onto the transparent substrate, the patterned conductive film of the present invention can be formed.
〔好ましい用途〕
本発明の導電膜は高い導電性と透明性を併せ持ち、液晶表示素子、有機発光素子、無機電界発光素子、電子ペーパー、有機太陽電池、無機太陽電池等の各種オプトエレクトロニクスデバイスや、電磁波シールド、タッチパネル等の分野において好適に用いることができる。その中でも、透明電極表面の平滑性が厳しく求められる有機エレクトロルミネッセンス素子の導電膜として特に好ましく用いることができる。
[Preferred use]
The conductive film of the present invention has both high conductivity and transparency, and various optoelectronic devices such as liquid crystal display elements, organic light emitting elements, inorganic electroluminescent elements, electronic paper, organic solar cells, inorganic solar cells, electromagnetic wave shields, touch panels. It can be suitably used in such fields. Among these, it can use especially preferably as an electrically conductive film of the organic electroluminescent element by which the smoothness of the surface of a transparent electrode is calculated | required severely.
以下、実施例を挙げて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。なお、実施例において「%」の表示を用いるが、特に断りがない限り「質量%」を表す。 EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In addition, although the display of "%" is used in an Example, unless otherwise indicated, "mass%" is represented.
合成例1
(一般式(I)で表される化合物の酸化体の塩合成)
100mlのナスフラスコにおいて、テトラチアフルバレン(以後TTFと省略する)(286mg,1.40mmol、東京化成社より購入)とヘプタフルオロ酪酸(363μL,2.80mmol、和光純薬社より購入)をiodebenzene−diacetate(225mg,0.70mmol、東京化成社より購入)存在下、15mlのアセトニトリル(和光純薬社より購入)溶液中に溶解させた。室温中で30分間の撹拌により溶液が褐色に変化した後、200mlのジエチルエーテル(和光純薬社より購入)を加え、対アニオンとしてヘプタブチル酪酸アニオンを有するTTFラジカルカチオン塩の沈殿を形成させた。該沈殿をろ過後、アセトニトリルにより洗浄することにより褐色沈殿として434mg(収率74%)を得た。化合物の物性データは元素分析、紫外可視吸収スペクトル測定と質量測定に行なった。
Synthesis example 1
(Salt synthesis of oxidized form of compound represented by general formula (I))
In a 100 ml eggplant flask, tetrathiafulvalene (hereinafter abbreviated as TTF) (286 mg, 1.40 mmol, purchased from Tokyo Kasei) and heptafluorobutyric acid (363 μL, 2.80 mmol, purchased from Wako Pure Chemical Industries, Ltd.) In the presence of diacetate (225 mg, 0.70 mmol, purchased from Tokyo Kasei Co., Ltd.), it was dissolved in 15 ml of acetonitrile (purchased from Wako Pure Chemical Industries, Ltd.) solution. After the solution turned brown by stirring for 30 minutes at room temperature, 200 ml of diethyl ether (purchased from Wako Pure Chemical Industries, Ltd.) was added to form a precipitate of TTF radical cation salt having heptabutyl butyrate anion as a counter anion. The precipitate was filtered and then washed with acetonitrile to obtain 434 mg (yield 74%) as a brown precipitate. The physical property data of the compound was subjected to elemental analysis, UV-visible absorption spectrum measurement and mass measurement.
元素分析値:C10H4F7O2S4
計算値(%):C,28.78;H,0.97;F,31.86;O,7.67;S,30.73
実験値(%):C,29.07;H,1.18;F,31.66.
UV/vis/NIR(CH3CN)
λmax(ε)=265(1200),339(4900),436(14600),578(4000).
HRMS(EI+)
計算値:C6H4S4(TTF+)として203.9196
測定値:203.9192.
(FAB)
計算値:C4F7O2(C3F7COO−),212.9792
測定値:212.9786.
比較例1
(比較導電膜1(PEDOT/PSS膜)の作製)
Aldrich社より購入したPEDOT/PSS水溶液をガラス基板上に滴下し、室温で16時間放置することで、乾燥膜厚2μmの比較導電膜1を作製した。
Elemental analysis: C 10 H 4 F 7 O 2 S 4
Calculated Value (%): C, 28.78; H, 0.97; F, 31.86; O, 7.67; S, 30.73
Experimental value (%): C, 29.07; H, 1.18; F, 31.66.
UV / vis / NIR (CH 3 CN)
λmax (ε) = 265 (1200), 339 (4900), 436 (14600), 578 (4000).
HRMS (EI + )
Calculated value: 203.9196 as C 6 H 4 S 4 (TTF + )
Measurement value: 203.9192.
(FAB)
Calculated value: C 4 F 7 O 2 (C 3 F 7 COO − ), 212.9792
Measurement value: 212.9786.
Comparative Example 1
(Production of comparative conductive film 1 (PEDOT / PSS film))
A PEDOT / PSS aqueous solution purchased from Aldrich was dropped on a glass substrate and allowed to stand at room temperature for 16 hours to prepare a comparative conductive film 1 having a dry film thickness of 2 μm.
(比較導電膜2(TTF膜)の作製)
TTF(10mg、0.049mmol)と合成例1により得られたTTFの酸化体の塩 28.8mg、0.069mmol)を10mlのアセトニトリルに溶解した溶液をガラス基板上に滴下し、室温で16時間放置することで、乾燥膜厚4μmの比較導電膜2を作製した。比較導電膜2の透明度及び導電性を比較導電膜1の方法で測定した結果、透過率69%、導電性1.6×10−2S/cmであった。
(Preparation of comparative conductive film 2 (TTF film))
A solution prepared by dissolving TTF (10 mg, 0.049 mmol) and an oxidized salt of TTF obtained in Synthesis Example 1 (28.8 mg, 0.069 mmol) in 10 ml of acetonitrile was dropped onto a glass substrate, and the solution was stirred at room temperature for 16 hours. By allowing to stand, a comparative conductive film 2 having a dry film thickness of 4 μm was produced. As a result of measuring the transparency and conductivity of the comparative conductive film 2 by the method of the comparative conductive film 1, the transmittance was 69% and the conductivity was 1.6 × 10 −2 S / cm.
実施例1
(導電膜1−1〜1−6の作製)
スキーム1に導電性ナノワイヤーを含む導電膜の作製法の概略を示す。
Example 1
(Preparation of conductive films 1-1 to 1-6)
Scheme 1 shows an outline of a method for manufacturing a conductive film including conductive nanowires.
100mlのナスフラスコを用い、5.3mMの中性TTFのアセトニトリル溶液と上記で得られたTTFラジカルカチオン塩を14.7mM含むアセトニトリル溶液を表1の分量に従い、ポリメタクリル酸メチル(PMMA,Mw=700,000〜750,000、ナカライテスク社より購入)をモノマー濃度が20mMの高分子溶液を10mlに加えた。その後、アセトニトリルを添加して全量で20mlに調製し、室温で1時間撹拌した。その溶液をガラス基板上に滴下し、室温で16時間放置することで乾燥膜厚2μmの本発明の導電膜1−1〜1−6を作製した。 Using a 100 ml eggplant flask, a solution of 5.3 mM neutral TTF in acetonitrile and an acetonitrile solution containing 14.7 mM of the TTF radical cation salt obtained above according to the quantities in Table 1, polymethyl methacrylate (PMMA, Mw = 700,000-750,000, purchased from Nacalai Tesque) was added to 10 ml of a polymer solution having a monomer concentration of 20 mM. Thereafter, acetonitrile was added to prepare a total volume of 20 ml, and the mixture was stirred at room temperature for 1 hour. The solution was dropped on a glass substrate and allowed to stand at room temperature for 16 hours to prepare the conductive films 1-1 to 1-6 of the present invention having a dry film thickness of 2 μm.
評価
得られた導電膜1及び比較導電膜1、2について、以下の評価を行った。
Evaluation The following evaluation was performed about the obtained electrically conductive film 1 and the comparative electrically conductive films 1 and 2. FIG.
<導電率測定>
四端子法により導電膜上の異なる5点における導電率を算出し、平均値を算出した。表2に導電膜中のTTF種の濃度に対するそれぞれの平均の導電率を示す。括弧内は値の標準偏差を示す。得られた結果を表2に示す。
<Conductivity measurement>
The conductivity at five different points on the conductive film was calculated by the four-terminal method, and the average value was calculated. Table 2 shows the average conductivity of each of the TTF species in the conductive film with respect to the concentration. The standard deviation of the value is shown in parentheses. The obtained results are shown in Table 2.
<透過率の算出>
400nmから800nm間で紫外可視吸収スペクトル測定を行い、透過率を計測した。この波長間での平均透過率を1μm当たりに換算したものを透過率とした。得られた結果を表2に示す。
<Calculation of transmittance>
The ultraviolet-visible absorption spectrum was measured between 400 nm and 800 nm, and the transmittance was measured. The transmittance obtained by converting the average transmittance between wavelengths per 1 μm was defined as the transmittance. The obtained results are shown in Table 2.
本発明の導電膜も導電性を有することが明らかとなり、TTFとTTFの酸化体の塩からなる導電性ナノワイヤーのみの導電膜と同程度の値となった。このことは、汎用高分子に本発明の導電性ナノワイヤーを少量添加することで、材料に導電性を付与させることが可能であることが明らかとなった。 The conductive film of the present invention was also found to have conductivity, and the value was comparable to that of a conductive film composed only of conductive nanowires composed of a TTF and an oxide salt of TTF. This proved that it is possible to impart conductivity to the material by adding a small amount of the conductive nanowire of the present invention to a general-purpose polymer.
本発明の導電膜はいずれも透明度は90%以上であった。一方、PEDOTは10%未満であり、本発明の導電膜は高い透明度を有することが明らかとなった。 All of the conductive films of the present invention had a transparency of 90% or more. On the other hand, PEDOT is less than 10%, and it was revealed that the conductive film of the present invention has high transparency.
実施例2
導電膜2−1〜2−6の作製
ポリメタクリル酸メチルをポリビニルピロリドン(PVP,Mw=10,000、Aldrich社より購入)に換えた以外は実施例1と同様に本発明の導電膜2−1〜2−6を作製した。
Example 2
Preparation of conductive films 2-1 to 2-6 The conductive film 2- of the present invention was the same as in Example 1 except that polymethyl methacrylate was replaced with polyvinylpyrrolidone (PVP, Mw = 10,000, purchased from Aldrich). 1-2-6 were produced.
実施例3
導電膜3−1〜3−6の作製
ポリメタクリル酸メチルをポリスチレン(Mw=100,000〜140,000、ナカライテスク社より購入)に換えた以外は実施例1と同様に本発明の導電膜3−1〜3−6を作製した。
Example 3
Preparation of conductive films 3-1 to 3-6 The conductive film of the present invention was the same as in Example 1 except that polymethyl methacrylate was replaced with polystyrene (Mw = 100,000 to 140,000, purchased from Nacalai Tesque). 3-1 to 3-6 were produced.
得られた導電膜2−1〜2−6及び導電膜3−1〜3−6を実施例1と同様に導電率と透過率を測定し、得られた結果を表3に示す。 The obtained conductive films 2-1 to 2-6 and the conductive films 3-1 to 3-6 were measured for conductivity and transmittance in the same manner as in Example 1, and the obtained results are shown in Table 3.
表3からも明らかなように、本発明の導電膜は導電率、透過率の優れた導電膜であることがわかる。 As is apparent from Table 3, the conductive film of the present invention is a conductive film having excellent conductivity and transmittance.
<導電膜の導電性の時間変化>
導電膜を空気中、室温で放置し、時間経過による導電率の変化を調べ、図2に結果を示す。
<Change in conductivity of conductive film over time>
The conductive film is allowed to stand at room temperature in the air, and the change in conductivity over time is examined. The result is shown in FIG.
フィルム上の異なる5点において導電率を四端子法により計測し、平均点をプロットした。図2において、丸は35mol%、四角は15mol%TTF含有のサンプルのデータポイントを表す。誤差は標準偏差を表す。 The conductivity was measured by the four probe method at five different points on the film, and the average points were plotted. In FIG. 2, circles represent data points of samples containing 35 mol% and squares containing 15 mol% TTF. Error represents standard deviation.
図2において、
a.実施例3の導電膜(PSバインダー)の導電率の時間変化、
b.実施例1の導電膜(PMMAバインダー)の導電率の時間変化、
c.実施例2の導電膜(PVPバインダー)の導電率の時間変化、
d.比較例2の導電膜(導電性ナノワイヤーのみ)の導電率の時間変化を示す図である。
In FIG.
a. Change with time of conductivity of the conductive film (PS binder) of Example 3,
b. Change over time of conductivity of the conductive film (PMMA binder) of Example 1,
c. Change over time of conductivity of the conductive film (PVP binder) of Example 2,
d. It is a figure which shows the time change of the electrical conductivity of the electrically conductive film (only electroconductive nanowire) of the comparative example 2.
TTFとTTFの酸化体の塩からなる導電性ナノワイヤーのみの導電膜では24時間で大きく導電率が損なわれたが、本発明の導電膜は大幅に劣化が抑えられた。特に、PMMAバインダーで35mol%TTF含有導電膜は一週間以上ほとんど導電率の低下が観られず、経時での安定性が飛躍的に向上することが明らかとなった。また、目視評価において、本発明の各導電膜の色味、透過率には全く変化が見られなかった。 In the conductive film composed only of conductive nanowires made of TTF and an oxide salt of TTF, the conductivity was greatly impaired in 24 hours. However, the conductive film of the present invention was greatly prevented from deteriorating. In particular, it was revealed that the 35 mol% TTF-containing conductive film with PMMA binder showed almost no decrease in conductivity for more than one week, and the stability over time was dramatically improved. Moreover, in visual evaluation, the change was not seen at all in the color tone and transmittance | permeability of each electrically conductive film of this invention.
<走査型電子顕微鏡による膜の表面観察>
導電膜の表面観察を走査型電子顕微鏡(JEOL JSM−5600)を用いて行なった。電圧1.5kVにより測定を行ない、図3に結果を示す。
<Surface observation of the film with a scanning electron microscope>
The surface of the conductive film was observed using a scanning electron microscope (JEOL JSM-5600). Measurement was performed at a voltage of 1.5 kV, and the results are shown in FIG.
図3において、
a.導電膜3−6(TTF35mol%含有PS導電膜)の走査型顕微鏡写真、
b.導電膜1−3(TTF35mol%含有PMMA導電膜)の走査型顕微鏡写真、
c.導電膜2−3(TTF35mol%含有PVP導電膜)の走査型顕微鏡写真、
d.比較導電膜2(TTFのみからなる導電膜)の走査型顕微鏡写真である。
In FIG.
a. Scanning photomicrograph of conductive film 3-6 (PS conductive film containing 35 mol% TTF),
b. Scanning photomicrograph of conductive film 1-3 (PMMA conductive film containing 35 mol% TTF),
c. Scanning photomicrograph of conductive film 2-3 (PTF conductive film containing 35 mol% TTF),
d. It is a scanning microscope picture of the comparison electrically conductive film 2 (conductive film which consists only of TTF).
本発明の導電膜は35mol%という高濃度の導電性ナノワイヤー含有率であるにもかかわらず、どの高分子バインダーにおいてもナノファイバーが均質に分散しているという結果を得た。導電膜の均質性化により、光の分散を抑えられ導電膜に高い透明性が付与されることが明らかとなった。 Although the conductive film of the present invention had a high concentration of conductive nanowires of 35 mol%, the result was that nanofibers were uniformly dispersed in any polymer binder. It has been clarified that the homogeneity of the conductive film suppresses dispersion of light and imparts high transparency to the conductive film.
<紫外可視近赤外吸収スペクトルによる膜の観察>
紫外可視近赤外吸収スペクトルにより35mol%導電性ナノワイヤー含有導電膜を観察し、図4にその結果を示す。
<Observation of film by UV-Vis near-infrared absorption spectrum>
A 35 mol% conductive nanowire-containing conductive film was observed by ultraviolet-visible-near infrared absorption spectrum, and the results are shown in FIG.
図4において、
a.導電膜3−6(導電性ナノワイヤー35mol%含有PS導電膜)の紫外可視近赤外吸収スペクトルを示す
b.導電膜1−3(導電性ナノワイヤー35mol%含有PMMA導電膜)の紫外可視近赤外吸収スペクトルを示す
c.導電膜2−3(導電性ナノワイヤー35mol%含有PVP導電膜)の紫外可視近赤外吸収スペクトルを示す図である。
In FIG.
a. An ultraviolet-visible near-infrared absorption spectrum of conductive film 3-6 (PS conductive film containing 35 mol% of conductive nanowires) b. An ultraviolet-visible near-infrared absorption spectrum of the conductive film 1-3 (PMMA conductive film containing 35 mol% of conductive nanowires) is shown. C. It is a figure which shows the ultraviolet visible near-infrared absorption spectrum of the electrically conductive film 2-3 (Conductive nanowire 35 mol% containing PVP electrically conductive film).
一般的に混合原子価を形成すると2000nm付近に幅の広い吸収が現れることが知られているおり、本発明導電膜においても全てその吸収が観られた。このことから、ポリマー中でもTTFは混合原子価状態を形成し、電子移動の媒体となることが明らかとなった。 In general, it is known that when a mixed valence is formed, a broad absorption appears in the vicinity of 2000 nm, and the absorption was also observed in the conductive film of the present invention. From this, it was clarified that TTF forms a mixed valence state among polymers and becomes a medium for electron transfer.
<粉末X線回析による膜の観察>
本発明の導電膜1〜3をガラス基板上よりはがした後、破砕することで粉末状の試料を作製した。得られたサンプル10mgを用い、粉末X線回析スペクトル(SHIMADZUX−ray diffractometer−6000)を測定した。CuKα線により、0.02度/Sで2度から90度まで測定を行った。図5にその結果を示す。
<Observation of film by powder X-ray diffraction>
After the conductive films 1 to 3 of the present invention were peeled off from the glass substrate, a powdery sample was prepared by crushing. A powder X-ray diffraction spectrum (SHIMADZUX-ray diffractometer-6000) was measured using 10 mg of the obtained sample. Measurement was performed from 2 degrees to 90 degrees at 0.02 degrees / S with CuKα rays. FIG. 5 shows the result.
図5において、
a.導電膜3の粉末X線回析スペクトル、
b.導電膜1の粉末X線回析スペクトル、
c.導電膜2の粉末X線回析スペクトルを示す。
In FIG.
a. Powder X-ray diffraction spectrum of conductive film 3,
b. Powder X-ray diffraction spectrum of conductive film 1,
c. The powder X-ray diffraction spectrum of the electrically conductive film 2 is shown.
いずれの導電膜についても、導電性ナノワイヤー構造に由来する回析角2θが6,14,20度の部位に鋭いピークが観測された。このことは、ポリマー中でもTTFとTTFの酸化体の塩同士のスタッキング構造が維持されていることを示す。上記の紫外可視近赤外吸収スペクトルの結果と併せ、本発明手法を用いることにより、混合原子価導電性ナノワイヤーをポリマー中でも導電性を損なわずに成長させることができることが明らかとなった。 In any conductive film, a sharp peak was observed at a site where the diffraction angle 2θ derived from the conductive nanowire structure was 6, 14, and 20 degrees. This indicates that the stacking structure between TTF and oxidized salt of TTF is maintained even in the polymer. It became clear that mixed valence conductive nanowires can be grown in a polymer without impairing conductivity by using the method of the present invention together with the results of the above-mentioned ultraviolet-visible-near infrared absorption spectrum.
実施例4
[有機エレクトロルミネッセンス素子(有機EL素子)の作製]
実施例1〜3で作製した本発明の導電膜1−3、2−3、3−3及び1−6、2−6、3−6を第1電極(アノード電極)に用いて、以下の手順でそれぞれ有機EL素子OEL−101〜106を作製した。
Example 4
[Production of organic electroluminescence element (organic EL element)]
Using the conductive films 1-3, 2-3, 3-3 and 1-6, 2-6, 3-6 of the present invention prepared in Examples 1 to 3 as the first electrode (anode electrode), the following Organic EL elements OEL-101 to 106 were produced by the procedure.
〈正孔輸送層の形成〉
上記本発明の各導電膜の上に、ポリ(3,4−エチレンジオキシチオフェン)−ポリスチレンスルホネート(PEDOT/PSS、Bayer社製、Baytron P Al 4083)を純水で70%に希釈した溶液を3000rpm、30秒でスピンコート法により成膜した後、200℃にて1時間乾燥し、膜厚30nmの正孔輸送層を設けた。
<Formation of hole transport layer>
A solution obtained by diluting poly (3,4-ethylenedioxythiophene) -polystyrene sulfonate (PEDOT / PSS, Bayer, Baytron P Al 4083) to 70% with pure water on each conductive film of the present invention. A film was formed by spin coating at 3000 rpm for 30 seconds, and then dried at 200 ° C. for 1 hour to provide a hole transport layer having a thickness of 30 nm.
〈発光層の形成〉
正孔輸送層が形成された各フィルム上に、ホスト材料として20mgのH−1を用い、発光ドーパントとして2mgのD−1をトルエン2mlに溶解した溶液を、1500rpm、30秒の条件下、スピンコート法により成膜し、120℃で1時間加熱乾燥し、膜厚40nmの発光層を設けた。
<Formation of light emitting layer>
On each film on which the hole transport layer was formed, a solution of 20 mg of H-1 as a host material and 2 mg of D-1 as a luminescent dopant in 2 ml of toluene was spinned at 1500 rpm for 30 seconds. A film was formed by a coating method, and heat-dried at 120 ° C. for 1 hour to provide a light-emitting layer having a thickness of 40 nm.
〈電子輸送層、及び第2電極〔カソード電極〕の形成〉
発光層まで形成した各試料を真空蒸着装置に取付け、真空槽を4×10−4Paまで減圧した。次いで、電子輸送層として、E−1(ビス(2−メチル−8−キノラート)−p−フェニルフェノラートアルミニウム錯体;BAlq)を30nm、陰極バッファー層としてフッ化リチウム1nm及び陰極としてアルミニウム110nmを蒸着して第2電極(アノード電極)を形成し、有機EL素子OEL−101〜106を作製した。
<Formation of electron transport layer and second electrode [cathode electrode]>
Each sample was formed to the light emitting layer attached to the vacuum vapor deposition apparatus, pressure in the vacuum tank was reduced to 4 × 10 -4 Pa. Next, as an electron transport layer, E-1 (bis (2-methyl-8-quinolate) -p-phenylphenolate aluminum complex; BAlq) was deposited to 30 nm, lithium fluoride 1 nm as a cathode buffer layer, and aluminum 110 nm as a cathode. Thus, the second electrode (anode electrode) was formed, and organic EL elements OEL-101 to 106 were produced.
〈封止膜の形成〉
形成した第2電極上に、ポリエチレンテレフタレートを基材とし、Al2O3を厚さ300nmで蒸着した可撓性封止部材を封止膜として使用した。第1電極および第2電極の外部取り出し端子が形成出来る様に端部を除き第2電極の周囲に接着剤を塗り、可撓性封止部材を貼合した後、熱処理で接着剤を硬化させた。
<Formation of sealing film>
The formed on the second electrode, a polyethylene terephthalate as a substrate, using a flexible sealing member which is deposited to a thickness 300nm to for Al 2 O 3 sealing film. Apply the adhesive around the second electrode except for the end so that the external lead terminals of the first electrode and the second electrode can be formed, paste the flexible sealing member, and then cure the adhesive by heat treatment It was.
(比較導電膜TC−107作製)
Synthetic Metals,1995,68,281を参考に比較導電膜を以下のように作製した。ポリビニルアルコール(Aldrich社製、MW=115,000)0.5gに蒸留水を加え10mlとし、90℃に加熱溶解した。溶液をアルゴンパージし、The Journal of Organic Chemistry,1974,2456の方法を用いて合成したテトラフルバレンジカルボン酸 T−1 25mg(6.8×10−5mol、Fw 368.6)、フェリシアン化カリウム7.3mg(2.2×10−5mol、Fw 329.2)を温度を50℃に維持したまま添加し、10分間攪拌した。この溶液をガラス基板上へキャスティングし、膜厚10μmの比較導電膜TC−107を作製した。
(Preparation of comparative conductive film TC-107)
A comparative conductive film was prepared as follows with reference to Synthetic Metals, 1995, 68, 281. Distilled water was added to 0.5 g of polyvinyl alcohol (manufactured by Aldrich, MW = 15,000) to make 10 ml, and the mixture was dissolved by heating at 90 ° C. The solution was purged with argon, tetrafulvalenedicarboxylic acid T-1 25 mg (6.8 × 10 −5 mol, Fw 368.6), potassium ferricyanide 7 synthesized using the method of The Journal of Organic Chemistry, 1974, 2456 .3mg (2.2 × 10 -5 mol, Fw 329.2) was added while maintaining the temperature at 50 ° C., and stirred for 10 minutes. This solution was cast on a glass substrate to prepare a comparative conductive film TC-107 having a thickness of 10 μm.
(比較導電膜TC−108、TC−109の作製)
テトラフルバレンジカルボン酸、フェリシアン化カリウムの添加温度を80℃、90℃に換えた以外はTC−107と同様な方法により、膜厚10μmの比較導電膜TC−108、TC−109を作製した。
(Preparation of comparative conductive films TC-108 and TC-109)
Comparative conductive films TC-108 and TC-109 having a thickness of 10 μm were prepared by the same method as TC-107 except that the addition temperatures of tetrafulvalenedicarboxylic acid and potassium ferricyanide were changed to 80 ° C. and 90 ° C.
(比較有機EL素子OEL−107〜109の作製)
作製したTC−107〜109を用いて、前記本発明の有機EL素子OEL−101〜106と同様の方法により比較有機EL素子OEL−107〜109を作製した。
(Production of comparative organic EL elements OEL-107 to 109)
Using the produced TC-107 to 109, comparative organic EL elements OEL-107 to 109 were produced by the same method as the organic EL elements OEL-101 to 106 of the present invention.
[有機EL素子発光試験]
本発明の有機EL素子OEL−101〜106、比較有機EL素子OEL−107〜109に対しKEITHLEY製ソースメジャーユニット2400型を用いて、直流電圧を有機EL素子に印加し、23±3℃、55±3%RHの環境下で発光させた。また、本発明有機EL素子OEL−101〜106、比較有機EL素子OEL−107〜109を80℃60%RHの環境下で30分置いたのち、再び前記23±3℃、55±3%RHの環境下で1時間以上調湿した後、同様に素子を発光させた。
[Organic EL device emission test]
A direct measure voltage was applied to the organic EL element using a source measure unit 2400 type manufactured by KEITHLEY for the organic EL elements OEL-101 to 106 and comparative organic EL elements OEL-107 to 109 of the present invention, and 23 ± 3 ° C., 55 Light was emitted in an environment of ± 3% RH. Further, after placing the organic EL elements OEL-101 to 106 of the present invention and the comparative organic EL elements OEL-107 to 109 in an environment of 80 ° C. and 60% RH for 30 minutes, the above 23 ± 3 ° C. and 55 ± 3% RH are again obtained. After adjusting the humidity for 1 hour or more in the above environment, the device was similarly made to emit light.
発光均一性の評価基準
◎:EL素子の発光が認められる
○:EL素子の弱い発光が認められる
△:EL素子の不均一な弱い発光が認められる
×:EL素子の発光認められない
上記評価結果を表4に示す。
Evaluation criteria for emission uniformity ◎: Light emission of EL element is recognized ○: Light emission of EL element is recognized Δ: Non-uniform light emission of EL element is recognized ×: Light emission of EL element is not recognized Is shown in Table 4.
表4から、比較有機EL素子OEL−107〜OEL−109は80℃60%RH30分の加熱(強制劣化)後、発光が著しく劣化するのに対し、本発明有機EL素子OEL−101〜OEL−106の発光は強制劣化後でも安定していることが明らかとなった。 From Table 4, the comparative organic EL elements OEL-107 to OEL-109 are significantly deteriorated in light emission after heating (forced deterioration) at 80 ° C. and 60% RH for 30 minutes, whereas the organic EL elements OEL-101 to OEL- It became clear that the light emission of 106 was stable even after forced deterioration.
11 導電性繊維
21 導電性材料
31 透明導電層
51 透明基材
DESCRIPTION OF SYMBOLS 11 Conductive fiber 21 Conductive material 31 Transparent conductive layer 51 Transparent base material
Claims (5)
一般式(II) R5COO−
〔式中、R5は置換基を示す。〕 The conductive film according to claim 1 or 2, wherein the counter anion of the salt of the oxidant of the compound represented by the general formula (I) is an anion represented by the following general formula (II).
Formula (II) R 5 COO −
[Wherein R 5 represents a substituent. ]
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WO2011136022A1 (en) * | 2010-04-26 | 2011-11-03 | コニカミノルタホールディングス株式会社 | Method for manufacturing transparent electrode, transparent electrode and organic electronic element |
KR20180099782A (en) * | 2016-03-11 | 2018-09-05 | 쇼와 덴코 가부시키가이샤 | Metal nano wire ink, transparent conductive substrate, and transparent antistatic substrate |
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