JP2010192621A - Electromagnetic wave shielding material and plasma display panel to which the electromagnetic wave shielding material is applied - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electromagnetic wave shielding material which is not damaged by etchant or plating liquid. <P>SOLUTION: The electromagnetic wave shielding material 1 includes a composite base material 13 integrating a PET base layer 16 and a hard coat layer 7 with near-infrared absorption features. On one surface of the composite base material 13, an anti-reflection layer 7a is provided. On the other surface of the composite base material 13, an ink receiving layer 4 which prevents the conductive paste ink from bleeding is provided. The conductive paste ink is screen printed on the ink receiving layer 4 and then fired thus forming an electromagnetic wave shield mesh layer 3. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

  The present invention generally relates to an electromagnetic wave shielding material having an electromagnetic wave shielding function and a near infrared ray absorbing function, and more particularly to an electromagnetic wave shielding material having no trace of damage caused by an etching solution or a plating solution. The present invention also relates to a plasma display panel provided with such an electromagnetic wave shielding material.

  FIG. 6 is a conceptual diagram of a plasma display panel using a conventional functional film. An electromagnetic wave shield (EMI) film 1 a and an antireflection (AR) film 1 b are disposed on the front side of the display unit 9 of the plasma display panel 8. Also, the TV is usually operated with a remote control that works in the near infrared, and in order to prevent the remote control from malfunctioning, a near infrared absorption (NIRA) film for blocking the near infrared emitted from the plasma display panel. 1c is also arranged in the plasma display panel.

  Referring to FIG. 7, an electromagnetic wave shielding film 1a includes a base material layer 6 and a hard coat layer 11 (which protects the screen from scratches, dust, sebum dirt, etc.) provided on one surface of the base material layer 6. The electromagnetic wave shielding mesh layer 3 for blocking electromagnetic waves provided on the other surface of the base material layer 6 is included.

  However, in the conventional method, as described above, films having various functions are gathered together and bonded to glass to produce an optical filter, so that the number of parts is large and the operation is complicated. In addition, since the optical filter is formed of a glass substrate, it is easy to break, the roll-to-roll flow operation cannot be performed, and the work efficiency is lowered. In addition, the method of gathering films having various functions and bonding them directly to the display also has a large number of parts, and the work is complicated (for example, see Patent Document 1).

Patent Publication 2007-57889

  The present invention has been made to solve the above problems, and has an electromagnetic wave shielding material integrated with a near-infrared absorbing function, an electromagnetic wave shielding function, an antireflection function, and a reduced number of parts. The purpose is to provide.

  Another object of the present invention is to provide an integrated electromagnetic shielding material capable of realizing roll-to-roll and capable of being rolled up.

  Another object of the present invention is to provide an electromagnetic wave shielding material that has no trace of damage caused by an etching solution or a plating solution.

  Another object of the present invention is to provide a plasma display panel on which such an electromagnetic wave shielding material is mounted.

  An electromagnetic wave shielding material according to the present invention is a functional composite film having a near-infrared absorption function and an electromagnetic wave shielding function, which is disposed on a plasma display panel, and is formed on one or both surfaces of the base material layer and the base material layer. A hard coat layer provided with a near-infrared absorbing function, and an ink receiving layer for preventing bleeding of the conductive paste ink provided on the other or any one surface of the base material layer; An electromagnetic wave shielding mesh layer formed by firing conductive paste ink screen-printed on the ink receiving layer. The conductive paste ink is preferably a conductive silver paste ink.

  According to the present invention, since the hard coat layer has a near infrared ray absorbing function, the near infrared ray emitted from the plasma display panel is blocked. In addition, since the electromagnetic shielding mesh layer is formed by baking the conductive paste ink screen-printed on the ink receiving layer, no etching solution or plating solution is used, so that no damage is caused by these solutions. .

  A more preferable electromagnetic wave shielding material of the present invention is a functional composite film having a near-infrared absorption function and an electromagnetic wave shielding function, which is disposed on a plasma display panel, and is provided on both sides of the base material layer and the base material layer. A hard coat layer imparted with a near-infrared absorbing function to at least one; an ink receiving layer provided on one surface of the base material layer for preventing bleeding of the conductive paste ink; and the ink The present invention relates to an electromagnetic wave shielding material comprising an electromagnetic wave shielding mesh layer formed by firing conductive paste ink screen-printed on a receiving layer.

  Further, when an antireflection layer is provided on the hard coat layer on the side opposite to the ink receiving layer, it further has an antireflection function.

  The base material layer is not particularly limited as long as it is a flexible base material, but a plastic film can be suitably used. In particular, it is preferably formed of a polyethylene terephthalate (PET) film. This is so that it can be wound into a roll.

  The thickness of the hard coat layer having the near infrared absorption function is preferably 2 to 25 μm.

  The plasma display panel of the present invention is provided with an electromagnetic wave shielding material having the above-described characteristics.

  According to the present invention, an integrated electromagnetic shielding material having an electromagnetic shielding function and a near-infrared absorbing function can be obtained. Since they are integrated, the number of parts is reduced accordingly, and the work is simplified. Since it can be rolled up, a roll-to-roll operation can be realized. Moreover, since an etching solution or a plating solution is not used when forming the electromagnetic wave shielding mesh layer, it is not damaged by these solutions. A plasma display panel equipped with such an electromagnetic wave shielding material can protect the viewer from electromagnetic waves and can prevent malfunction of the remote control.

It is a conceptual diagram of the plasma display panel which affixed the electromagnetic wave shielding material which concerns on this invention. It is the top view (A) and sectional drawing (B) of the electromagnetic wave shielding material which concern on an Example. It is electromagnetic wave shielding material sectional drawing which concerns on a more preferable Example. 6 is a cross-sectional view illustrating a manufacturing process of an electromagnetic wave shielding material according to Comparative Example 1. FIG. 6 is a cross-sectional view illustrating a manufacturing process of an electromagnetic wave shielding material according to Comparative Example 2. FIG. It is the figure which showed a mode that the conventional electromagnetic wave shielding material was mounted | worn with a plasma display panel. It is sectional drawing of the conventional optical filter.

  FIG. 1 is a conceptual diagram of a plasma display panel to which an electromagnetic wave shielding material 1 according to the present invention is attached. The display unit 9 of the plasma display panel 8 is provided with an integrated electromagnetic shielding material 1 having a near infrared absorption function, an electromagnetic shielding function, and an antireflection function. Since they are integrated, the number of parts is reduced and the assembling work is simplified.

  In the present invention, for the purpose of obtaining such an integrated electromagnetic shielding material having a near-infrared absorbing function and an electromagnetic shielding function and having an antireflection function, a near-containing infrared absorbing dye is contained. This was realized by applying an AR (antireflection) / NIRA-HC (hard coat layer with near-infrared absorbing function) integrated film substrate with an infrared absorbing function-equipped hard coat layer and a base material layer. Examples of the present invention will be described below together with comparative examples.

  2A is a plan view of the electromagnetic wave shielding material according to the embodiment, and FIG. 2B is a cross-sectional view taken along line BB in FIG. 2A.

  Referring to these figures, the electromagnetic wave shielding material 1 is composed of a composite base material 13 (NIRA-HC film base) in which a PET base material layer 16 (100 μm) and a hard coat layer 7 with a near infrared absorption function (15 μm) are integrated. Material).

  The hard coat layer 7 with a near-infrared absorbing function is formed by curing a hard coat coating liquid with a near-infrared absorbing function including an inorganic near-infrared absorbent, an ultraviolet curable resin, and the like.

  As the inorganic near infrared absorber, tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), composite tungsten oxide, or the like can be used. Among them, a composite tungsten oxide is preferable because it has a high near-infrared absorptivity and a high visible light transmittance, and cesium-containing tungsten oxide is most preferable.

  The ultraviolet curable resin includes a monomer, an oligomer, a polymer or a mixture thereof having an ultraviolet curable functional group. Specifically, monofunctional acrylate, monofunctional methacrylate, polyfunctional acrylate, polyfunctional methacrylate, or the like can be used.

  The thickness of the hard coat layer 7 with a near infrared ray absorbing function is preferably 2 to 25 μm. The actual film thickness (d) in the examples is 15 μm.

  An antireflection layer 7a (actual film thickness (d) 0.2 μm) is provided on one surface of the composite base material 13 (side closer to the viewer's eyes 2).

  The antireflection layer 7a is formed by coating and curing a high refractive index layer / low refractive index layer or a low refractive index layer on the coated surface of the hard coat layer 7 with near infrared absorption function. .

  The high refractive index layer is formed by curing a high refractive index layer coating liquid containing an inorganic material, an ultraviolet curable resin, or the like.

  As the inorganic material, zinc oxide, titanium oxide, cerium oxide, tin oxide, aluminum oxide, zirconium oxide, or the like can be used.

  The refractive index of the high refractive index layer needs to be higher than that of the low refractive index layer formed immediately above the high refractive index layer, and the refractive index is preferably in the range of 1.55 to 1.90. Is within.

  The optical film thickness (nd) of the high refractive index layer is preferably 100 nm to 250 nm. The film thickness and refractive index of the examples are optical film thickness (nd): 150 nm and refractive index (n): 1.60.

  The low refractive index layer is formed by curing a coating solution for forming a low refractive index layer containing silica fine particles, a binder component and the like.

  As the silica fine particles, silica sol, porous silica fine particles, hollow silica fine particles and the like can be used. As the binder component, a simple substance or a mixture of a fluorine-containing organic compound, a simple substance or a mixture of a fluorine-free organic compound, a polymer, or the like can be used.

  The refractive index of the low refractive index layer is preferably in the range of 1.20 to 1.45. The optical film thickness (nd) of the low refractive index layer is preferably 100 nm to 175 nm. The film thickness and refractive index of the examples are optical film thickness (nd): 140 nm and refractive index (n): 1.35.

  As the coating method of the hard coat layer 7 with near infrared absorption function and the antireflection layer 7a, it was applied on a base film by a roll coating method, a spin coating method, a coil bar method, a dip coating method, a die coating method, etc. and dried. Thereafter, there is a method of irradiating with ultraviolet rays. A method capable of continuous coating such as a roll coating method is preferred from the viewpoint of productivity and production cost.

  An ink receiving layer 4 (1 μm) for preventing bleeding (line thickening) of the conductive paste ink on the other surface of the composite substrate 13 (the side far from the viewer's eyes 2 and the side to be attached to the plasma display panel PDP). ) Is provided. On the ink receiving layer 4, there is provided an electromagnetic wave shielding mesh layer 3 formed by screen-printing conductive paste ink and firing it.

  The ink receiving layer 4 is a transparent porous layer and is formed of an aggregate of fine particles mainly composed of silica, titania, alumina or the like.

  The conductive paste ink is composed of conductive powder and a binder, and for example, a silver paste is used.

  The electromagnetic shielding material according to the embodiment is configured as described above, and becomes an integrated electromagnetic shielding material having a near-infrared absorption function, an electromagnetic shielding function, and an antireflection function. Since the electromagnetic wave shielding mesh layer 3 is formed by screen printing, an etching solution or a plating solution is not used as in the comparative example described later, and therefore, no damage is caused by these solutions.

  As a more preferred embodiment, referring to FIG. 3, from antireflection layer 7a / NIRA-HC layer 7 (15 μm) / PET base material layer 16 / HC layer 11 (15 μm) / ink receiving layer 4 / electromagnetic wave shielding mesh 3. The electromagnetic shielding material which becomes.

  In addition, AR / NIRA-HC (10 μm) / PET / NIRA-HC (10 μm) / ink receiving layer / electromagnetic shielding mesh, NIRA-HC (15 μm) / PET / HC (15 μm) / ink receiving layer / electromagnetic shielding mesh, Alternatively, a laminated film such as NIRA-HC (10 μm) / PET / NIRA-HC (10 μm) / ink receiving layer / electromagnetic wave shield mesh also has a considerable effect.

  (Comparative Example 1)

  FIG. 4 is a cross-sectional view illustrating the manufacturing process of the electromagnetic shielding material according to Comparative Example 1. Referring to FIG. 4A, a near-infrared absorbing layer 33 containing a dye that absorbs near-infrared rays is formed on one surface of a base material layer (PET) 31 by coating, and an antireflection layer 32 is formed thereon. A film base material having a film formed thereon

  The near-infrared absorbing layer 33 is formed by curing a near-infrared absorbing layer-forming coating liquid containing an organic near-infrared absorber, a binder component, and the like.

  As the organic near infrared absorber, a cyanine compound, a phthalocyanine compound, a diimonium compound, or the like can be used.

  Examples of the binder component include polystyrene compounds, styrene copolymers, poly (meth) acrylate alkyls, polyethers, polyesters, polyurethanes, polycarbonate resins, and epoxy resins.

  The thickness of the near infrared absorbing layer is preferably 2 to 20 μm. The film thickness in the case of the comparative example is the actual film thickness (d): 10 μm.

  Examples of the coating method of the near infrared absorption layer 33 include a method of applying and drying on the base film by a roll coating method, a spin coating method, a coil bar method, a dip coating method, a die coating method and the like. A method capable of continuous coating such as a roll coating method is preferred from the viewpoint of productivity and production cost.

  A copper foil 34 is formed on the base material layer (PET) 31. Referring to FIG. 4B, the copper foil 34 is etched in a lattice shape with acid or alkali to form an electromagnetic wave shielding mesh layer 35.

  According to this method, the antireflection layer 32 itself, the near infrared absorption layer 33 itself, or the interface between the near infrared absorption layer 33 and the antireflection layer 32, the base material layer (PET) 31 and the near infrared absorption layer are formed by acid or alkali. There arises a problem that 33 interfaces are damaged.

  (Comparative Example 2)

  FIG. 5 is a cross-sectional view showing the manufacturing process of the electromagnetic wave shielding material according to Comparative Example 2. Referring to FIG. 5A, a near-infrared absorbing layer 33 containing a dye that absorbs near-infrared rays is formed on one surface of a base material layer (PET) 31 by coating, and an antireflection layer 32 is formed thereon. A film base material on which is formed is prepared. On the base material layer (PET) 31, the catalyst ink 36 is printed in a mesh shape by a gravure printing method. Referring to FIG. 5B, the electromagnetic wave shielding mesh layer 37 is formed by depositing a metal only on the mesh printing portion by electroless plating.

According to this method, the subject that the near-infrared absorption layer 33 itself or the interface of the base material layer (PET) 31 and the near-infrared absorption layer 33 was damaged at the time of electroless plating occurred.
It should be understood that the embodiments disclosed herein are illustrative and non-restrictive in every respect. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

  The plasma display panel equipped with the electromagnetic wave shielding material according to the present invention can protect the viewer from electromagnetic waves and can prevent malfunction of the remote control.

DESCRIPTION OF SYMBOLS 1 Electromagnetic shielding material 1a Electromagnetic shielding film 1b Antireflection film 1c Near-infrared absorption film 2 Eye 3 Electromagnetic shielding mesh layer 4 Ink receiving layer 6 Base material layer 7 Hard coat layer with near-infrared absorption function 7a Antireflection layer 8 Plasma display panel 9 Display unit 11 Hard coat layer 13 Composite base material 16 PET base material layer 31 PET base material layer 32 Antireflection layer 33 Near infrared absorption layer 34 Copper foil 35 Electromagnetic wave shield mesh layer 36 Catalyst ink 37 Electromagnetic wave shield mesh layer

Claims (4)

A functional composite film having a near-infrared absorption function and an electromagnetic wave shielding function to be disposed on a plasma display panel,
A base material layer;
A hard coat layer provided with a near-infrared absorbing function provided on one surface of the base material layer;
An ink receiving layer provided on the other surface of the base material layer for preventing bleeding of the conductive paste ink;
An electromagnetic shielding material comprising: an electromagnetic shielding mesh layer formed by firing conductive paste ink screen-printed on the ink receiving layer. A functional composite film having a near-infrared absorption function and an electromagnetic wave shielding function to be disposed on a plasma display panel,
A base material layer;
A hard coat layer provided on both surfaces of the base material layer and imparted a near-infrared absorbing function to at least one;
An ink receiving layer for preventing bleeding of the conductive paste ink provided on any one surface of the base material layer;
An electromagnetic shielding material comprising: an electromagnetic shielding mesh layer formed by firing conductive paste ink screen-printed on the ink receiving layer.   The electromagnetic wave shielding material according to claim 1 or 2, wherein the outermost layer on the side of the base material layer not having the electromagnetic wave shielding mesh layer has an antireflection function.   The plasma display panel formed by mounting | wearing with the electromagnetic wave shielding material of any one of Claim 1 to 3.

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