JP2010188488A - Double-side grinding device - Google Patents

Double-side grinding device Download PDF

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JP2010188488A
JP2010188488A JP2009037256A JP2009037256A JP2010188488A JP 2010188488 A JP2010188488 A JP 2010188488A JP 2009037256 A JP2009037256 A JP 2009037256A JP 2009037256 A JP2009037256 A JP 2009037256A JP 2010188488 A JP2010188488 A JP 2010188488A
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polishing
rotation
rotating body
rotating
around
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Joichi Takada
穣一 高田
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PORATEKKU KK
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PORATEKKU KK
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a double-side grinding device normally stably transmitting the rotational force to a holding carrier while reducing the possibility of breakage (fracture). <P>SOLUTION: Both grinders 19, 39 are freely rotatably provided around the axes of rotation 10A, 20A located on the same line, and a pair of grinder driving means 14, 25 for respectively rotating the grinders around the axes of rotation are provided in an individually drive-controllable manner. A holding carrier 80 is freely detachably connected to a ring-shaped rotating body 50 around the offset axis 50A which is support-guided on a body frame 1 side and displaced with respect to the axes of rotation via a connector 70, and a rotating body driving means 60 for rotating the rotating body is provided. The rotation of the rotating body around the offset axis 50A can be reliably executed through the rigidity without any breakage. Further, the rotational force to the holding carrier is integrally transmitted with the rotating body via the connector in a constant and consistent manner by reducing breakage (fracture) of the holding carrier. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、たとえば液晶用の硝子板、金属板、半導体のシリコン基板、セラミックス基板など各種の被加工物の両面を研磨するのに使用される両面研磨装置に関するものである。   The present invention relates to a double-side polishing apparatus used for polishing both surfaces of various workpieces such as glass plates for liquid crystals, metal plates, semiconductor silicon substrates, ceramic substrates, and the like.

従来、保持キャリアで保持した被加工物の両面を挟む状態で、一対の研磨盤を配置するとともに、これら研磨盤を相対的に接近離間動させる接近離間手段を設けた両面研磨装置であって、保持キャリアを自転(回転)させる形式としては、次のような構成が提供されている。   Conventionally, in a state of sandwiching both surfaces of a workpiece held by a holding carrier, a pair of polishing discs and a double-side polishing apparatus provided with an approaching / separating means for relatively moving these polishing discs, As a form for rotating (rotating) the holding carrier, the following configuration is provided.

すなわち、ワークの両面を研磨する一対の回転定盤と、一対の回転定盤間の回転中心部周囲に配置され、それぞれがワークを偏心して保持する複数の歯車型のキャリアと、一対の回転定盤間の回転中心部に配置され、周囲に配置された複数のキャリアに噛み合って複数のキャリアを同期して自転させるセンターギヤと、複数のキャリアの周囲に各キャリアに対応して分散配置され、それぞれが内側のキャリアに噛み合ってそのキャリアをセンターギヤと共同して定位置に保持して自転させる複数の自転手段とを具備している。そして各自転手段は、キャリアに1位置又は2位置以上で噛み合うと共に、歯すじが回転軸に沿った1又は複数の回転歯車でキャリアを自転させる構成となっている(たとえば、特許文献1参照。)。   That is, a pair of rotating surface plates for polishing both surfaces of the workpiece, a plurality of gear-type carriers that are arranged around the rotation center between the pair of rotating surface plates, each holding the workpiece eccentrically, and a pair of rotating surface plates A center gear that is arranged at the center of rotation between the boards, meshes with a plurality of carriers arranged around and rotates the plurality of carriers synchronously, and distributed around the plurality of carriers corresponding to each carrier, Each has a plurality of rotation means that mesh with the inner carrier and rotate the carrier while holding the carrier in a fixed position together with the center gear. Each rotating means meshes with the carrier at one position or two or more positions, and the tooth traces are configured to rotate the carrier with one or a plurality of rotating gears along the rotation axis (see, for example, Patent Document 1). ).

特開2000−237953号公報(第3頁、図1、図2、図4、図7)JP 2000-237953 A (Page 3, FIG. 1, FIG. 2, FIG. 4, FIG. 7) 特開2000−237954号公報Japanese Patent Laid-Open No. 2000-237954 特開2005−205585号公報Japanese Patent Laid-Open No. 2005-205585

しかし、上記した従来構成によると、各キャリアは、センターギヤと自転手段とに内外で直接に噛み合う遊星歯車形式によって回転力を伝達する構成であり、したがって、使用経過に伴って歯部が折損する恐れがある。特にキャリアを、ワークを保護するために強度の低い樹脂材製としたときや、薄いワークに対応させて薄く形成したときなどに、歯部が簡単に折損する(壊れる)ことになり、樹脂材製の薄いキャリアは容易に採用し難い。   However, according to the above-described conventional configuration, each carrier is configured to transmit the rotational force by the planetary gear type that directly meshes with the center gear and the rotation means inside and outside, and therefore the tooth portion breaks with the progress of use. There is a fear. Especially when the carrier is made of a low-strength resin material to protect the workpiece, or when the carrier is thinly formed to correspond to a thin workpiece, the tooth part will easily break (break), and the resin material Thin carriers made of metal are difficult to adopt.

そこで本発明の請求項1記載の発明は、保持キャリアへの回転力の伝達を、折損する(壊れる)ことなどを減少して常に安定して行える両面研磨装置を提供することを目的としたものである。   SUMMARY OF THE INVENTION An object of the present invention is to provide a double-side polishing apparatus capable of constantly and stably reducing the breaking (breaking) of the rotational force transmitted to the holding carrier. It is.

前述した目的を達成するために、本発明の請求項1記載の両面研磨装置は、保持キャリアで保持した被加工物の両面を挟む状態で、一対の研磨盤を配置するとともに、これら研磨盤を相対的に接近離間動させる接近離間手段を設けた両面研磨装置であって、両研磨盤を、同一状線上に位置される回転軸心の周りに回転自在に設けるとともに、両研磨盤を回転軸心の周りに各別に回転させる一対の研磨盤駆動手段を、各別に駆動制御自在として設け、前記保持キャリアを、本体フレーム側に支持案内されて前記回転軸心に対して変位させた偏心軸心の周りに回転可能なリング状の回転体に、連結具を介して着脱自在に連結するとともに、この回転体を回転させる回転体駆動手段を設けたことを特徴としたものである。   In order to achieve the above-mentioned object, a double-side polishing apparatus according to claim 1 of the present invention is arranged with a pair of polishing disks in a state where both surfaces of a workpiece held by a holding carrier are sandwiched, A double-side polishing apparatus provided with an approaching / separating means for relatively moving toward and away from each other, wherein both polishing discs are provided so as to be rotatable around a rotation axis located on the same line, and both polishing discs are provided as rotary shafts. A pair of polishing disk driving means for rotating each around the core is provided so as to be individually controllable, and the holding carrier is supported and guided on the main body frame side and displaced with respect to the rotation axis. A rotating body driving means for rotating the rotating body and a ring-shaped rotating body rotatable around the rotating body is provided.

したがって請求項1の発明によると、接近離間手段により両研磨盤を相対的に離間させた状態で、保持キャリアに被加工物をセットさせ、この状態で接近離間手段により両研磨盤を相対的に接近させることにより、被加工物の両面に対して各研磨盤を当接し得る。このような当接の前後において、両研磨盤駆動手段を稼働して両研磨盤を回転軸心の周りに回転させるとともに、回転体駆動手段を稼働して回転体を偏心軸心の周りに偏心回転させる。したがって、この状態で接近離間手段により荷重を掛けることにより、研磨盤の回転軸心の周りでの駆動回転と、被加工物の偏心軸心の周りでの駆動回転によって、被加工物の両面に対する研磨加工を行える。その際に、回転速度(駆動)を各別に制御(調整)することによって、上部研磨盤と被加工物との研磨速度と、下部研磨盤と被加工物との研磨速度とを等速状にし得る。そして回転体の偏心軸心の周りでの回転(自転)は、破損など生じることなく剛体化して行え、また保持キャリアへの回転力の伝達は、連結具を介して回転体と一体状として行える。   Therefore, according to the first aspect of the present invention, the workpiece is set on the holding carrier in a state where the two polishing discs are relatively separated by the approaching / separating means, and in this state, the two polishing discs are relatively moved by the approaching / separating means. By bringing them closer, each polishing disk can be brought into contact with both surfaces of the workpiece. Before and after such contact, both polishing disc drive means are operated to rotate both polishing discs around the rotation axis, and the rotary body drive means is operated to eccentric the rotation body about the eccentric axis. Rotate. Therefore, by applying a load by the approaching / separating means in this state, the drive rotation around the rotation axis of the polishing disc and the drive rotation around the eccentric axis of the workpiece can be applied to both surfaces of the workpiece. Polishing can be performed. At that time, by controlling (adjusting) the rotation speed (drive) separately, the polishing speed of the upper polishing machine and the workpiece and the polishing speed of the lower polishing machine and the workpiece are made constant. obtain. The rotation (rotation) around the eccentric shaft center of the rotating body can be made rigid without causing breakage, and the rotational force can be transmitted to the holding carrier integrally with the rotating body via a connector. .

上記した本発明の請求項1によると、接近離間手段により両研磨盤を相対的に離間させたのち、保持キャリアに被加工物をセットした状態で、接近離間手段により両研磨盤を相対的に接近させることにより、被加工物の両面に対して各研磨盤を当接でき、このような当接の前後において、両研磨盤駆動手段を稼働して両研磨盤を回転軸心の周りに回転できるとともに、回転体駆動手段を稼働して回転体を偏心軸心の周りに偏心回転できる。したがって、この状態で接近離間手段により荷重を掛けることにより、研磨盤の回転軸心の周りでの駆動回転と、被加工物の偏心軸心の周りでの駆動回転によって、被加工物の両面に対する研磨加工を行うことができる。その際に、回転速度(駆動)を各別に制御(調整)することによって、上部研磨盤と被加工物との研磨速度と、下部研磨盤と被加工物との研磨速度とを等速状にでき、これにより研磨盤の当接は、両面全域で均一状にかつ研磨速度を一定状として行うことができ、以て研磨残りの生じない均一な研磨加工を行うことができる。   According to the first aspect of the present invention described above, after the two polishing disks are relatively separated by the approaching / separating means, the two polishing disks are relatively moved by the approaching / separating means in a state where the workpiece is set on the holding carrier. By bringing them closer, each polishing disk can be brought into contact with both surfaces of the workpiece, and before and after such contact, both polishing disks are operated to rotate both polishing disks around the rotation axis. In addition, the rotating body driving means can be operated to rotate the rotating body eccentrically around the eccentric axis. Therefore, by applying a load by the approaching / separating means in this state, the drive rotation around the rotation axis of the polishing disc and the drive rotation around the eccentric axis of the workpiece can be applied to both surfaces of the workpiece. Polishing can be performed. At that time, by controlling (adjusting) the rotation speed (drive) separately, the polishing speed between the upper polishing machine and the workpiece and the polishing speed between the lower polishing machine and the workpiece are made constant. Thus, the contact of the polishing disk can be performed uniformly over the entire surface and at a constant polishing rate, so that a uniform polishing process with no polishing residue can be performed.

そして回転体の偏心軸心の周りでの回転(自転)は、破損など生じることなく剛体化して確実に行うことができ、また保持キャリアへの回転力の伝達は、連結具を介して回転体と一体状として行うことができて、保持キャリアが折損する(壊れる)ことなどを減少して常に安定して行うことができる。これにより保持キャリアとしては、被加工物を保護するために強度の低い樹脂材製としたものや、薄い被加工物に対応させて薄く形成したとしても、歯部が簡単に折損する(壊れる)ことがなくなり、以て樹脂材製の薄い保持キャリアを容易に採用できる。   The rotation (rotation) around the eccentric shaft center of the rotating body can be reliably performed by making it rigid without causing breakage, and the transmission of the rotational force to the holding carrier is performed via the coupling tool. Can be carried out as a single piece, and the holding carrier can be broken (broken) and the like can be reduced and always carried out stably. As a result, even if the holding carrier is made of a low-strength resin material to protect the workpiece, or if it is thinly formed corresponding to a thin workpiece, the tooth portion is easily broken (broken). Therefore, a thin holding carrier made of a resin material can be easily adopted.

本発明の実施の形態1を示し、両面研磨装置の縦断側面図である。BRIEF DESCRIPTION OF THE DRAWINGS It is Embodiment 1 of this invention, and is a vertical side view of a double-side polish apparatus. 同両面研磨装置の一部切り欠き正面図である。It is a partially cutaway front view of the double-side polishing apparatus. 同両面研磨装置の平面図である。It is a top view of the double-side polishing apparatus. 同両面研磨装置の横断平面図である。It is a cross-sectional plan view of the double-side polishing apparatus. 同両面研磨装置の要部の縦断側面図である。It is a vertical side view of the principal part of the double-side polishing apparatus. 同両面研磨装置の回転体支持部の縦断側面図である。It is a vertical side view of the rotary body support part of the double-side polishing apparatus. 本発明の実施の形態2を示し、両面研磨装置の横断平面図である。FIG. 5 is a cross-sectional plan view of a double-side polishing apparatus according to a second embodiment of the present invention.

[実施の形態1]
以下に、本発明の実施の形態1を、図1〜図6に基づいて説明する。
図1〜図3において、1は本体フレームで、箱枠状の上部フレーム2と、箱枠状の下部フレーム3と、これら上部フレーム2と下部フレーム3との後部間(一側部間)を連結する箱枠状の中間部フレーム4とから構成され、前記下部フレーム3は、その上板3aの中央部に開口5が形成されている。そして上部フレーム2の前部側に昇降体6が設けられ、この昇降体6は、上部フレーム2の前面に設けられた摺動案内体7に後面に設けた上下方向のレール体8が支持案内されることで、上部フレーム2に対して昇降自在に構成されている。前記本体フレーム1には、縦方向の上部回転軸10と下部回転軸20とが設けられ、これら回転軸10,20は、同一状(同一またはほぼ同一)線上に位置される回転軸心10A,20Aの周りに回転自在に構成されている。
[Embodiment 1]
Below, Embodiment 1 of this invention is demonstrated based on FIGS.
1 to 3, reference numeral 1 denotes a main body frame, which is a box frame-shaped upper frame 2, a box frame-shaped lower frame 3, and a rear portion (between one side portion) of the upper frame 2 and the lower frame 3. The lower frame 3 has an opening 5 formed at the center of the upper plate 3a. An elevating body 6 is provided on the front side of the upper frame 2, and the elevating body 6 is supported by a sliding guide body 7 provided on the front surface of the upper frame 2 and a vertical rail body 8 provided on the rear surface. Thus, the upper frame 2 is configured to be movable up and down. The main body frame 1 is provided with a vertical upper rotary shaft 10 and a lower rotary shaft 20, and these rotary shafts 10, 20 are rotary axes 10 A, 10 A, It is configured to be rotatable around 20A.

すなわち上部回転軸10は、上部筒体11に軸受12を介して回転自在に支持されており、そして上部筒体11は前記昇降体6の下部に連結されている。前記上部回転軸10の下端には、連結部材13を介して上部研磨盤(研磨盤の一例)19が連動連結されており、そして上部回転軸10の上端には、上部研磨盤駆動手段(研磨盤駆動手段の一例)14が連結されている。すなわち上部研磨盤駆動手段14は、前記昇降体6に配設された回転駆動装置(モータ)15と、この回転駆動装置15に一体状の変速装置16と、この変速装置16からの出力軸17と前記上部回転軸10の上端とを連動連結する連結部材18などから構成されている。   That is, the upper rotary shaft 10 is rotatably supported by the upper cylinder 11 via the bearing 12, and the upper cylinder 11 is connected to the lower part of the elevating body 6. An upper polishing disc (an example of a polishing disc) 19 is linked to the lower end of the upper rotary shaft 10 via a connecting member 13, and an upper polishing disc drive means (polishing) is connected to the upper end of the upper rotary shaft 10. An example of the panel driving means 14 is connected. That is, the upper polishing disk drive means 14 includes a rotation drive device (motor) 15 disposed in the elevating body 6, a transmission device 16 integrated with the rotation drive device 15, and an output shaft 17 from the transmission device 16. And a connecting member 18 that interlocks and connects the upper end of the upper rotary shaft 10.

したがって、回転駆動装置15の駆動により出力軸17や前記上部回転軸10などを介して、上部研磨盤19を回転軸心10Aの周りに回転し得る。その際に上部研磨盤駆動手段14は上部研磨盤19を、平面視において時計回転方向を回転方向19Kとして駆動回転すべく設定されており、また上部研磨盤19の回転速度は、変速装置16によって調整(制御)するように構成されている。以上の15〜18などにより、上部研磨盤駆動手段14の一例が構成される。   Therefore, the upper polishing disc 19 can be rotated around the rotation axis 10 </ b> A through the output shaft 17, the upper rotation shaft 10, and the like by driving the rotation driving device 15. At this time, the upper polishing disk drive means 14 is set so as to drive and rotate the upper polishing disk 19 with the clockwise direction as the rotation direction 19K in plan view. The rotational speed of the upper polishing disk 19 is set by the transmission 16. It is configured to adjust (control). The above 15 to 18 and the like constitute one example of the upper polishing disc driving means 14.

図1〜図6において、前記下部回転軸20は筒体状であって、その中心部分には液供給管21が内嵌されて一体回転自在に構成されている。そして下部回転軸20は下部筒体22に軸受23を介して回転自在に支持されるとともに、この下部筒体22は、前記開口5を挿通されて下部フレーム3の上板3aに固定されている。前記下部回転軸20の上端には、連結部材24を介して下部研磨盤(研磨盤の一例)39が連結されており、そして下部回転軸20の下端には、下部研磨盤駆動手段(研磨盤駆動手段の一例)25が連動連結されている。すなわち下部研磨盤駆動手段25は、前記下部フレーム3内に配設された回転駆動装置(モータ)26と、この回転駆動装置26に無端連動機構27を介して連動連結された変速装置28と、この変速装置28からの出力軸29に設けられた駆動輪体30と、前記下部回転軸20の下端に外嵌固定された受動輪体31と、両輪体30,31間に掛けられた無端回動体(タイミングベルトやチェーンなど)32などから構成されている。   1 to 6, the lower rotary shaft 20 has a cylindrical shape, and a liquid supply pipe 21 is fitted in the central portion thereof so as to be integrally rotatable. The lower rotary shaft 20 is rotatably supported by the lower cylindrical body 22 via a bearing 23. The lower cylindrical body 22 is inserted through the opening 5 and fixed to the upper plate 3a of the lower frame 3. . A lower polishing disc (an example of a polishing disc) 39 is connected to the upper end of the lower rotary shaft 20 via a connecting member 24, and a lower polishing disc driving means (a polishing disc) is connected to the lower end of the lower rotary shaft 20. An example of driving means) 25 is interlocked. That is, the lower polishing disk drive means 25 includes a rotation drive device (motor) 26 disposed in the lower frame 3, a transmission device 28 linked to the rotation drive device 26 via an endless linkage mechanism 27, and A drive wheel 30 provided on an output shaft 29 from the transmission 28, a passive wheel 31 fitted and fixed to the lower end of the lower rotary shaft 20, and an endless rotation hung between the two wheels 30,31. It consists of a moving body (timing belt, chain, etc.) 32 and the like.

したがって、回転駆動装置26の駆動により出力軸29や前記下部回転軸20などを介して、下部研磨盤39を回転軸心20Aの周りに回転し得る。その際に下部研磨盤駆動手段25は下部研磨盤39を、平面視において反時計回転方向を回転方向39Kとして駆動回転すべく設定されており、また下部研磨盤39の回転速度は、変速装置28によって調整(制御)するように構成されている。以上の26〜32などにより、下部研磨盤駆動手段25の一例が構成される。   Accordingly, the lower polishing disk 39 can be rotated around the rotation axis 20A via the output shaft 29, the lower rotation shaft 20 and the like by driving the rotation driving device 26. At that time, the lower polishing disk drive means 25 is set so as to drive and rotate the lower polishing disk 39 with the counterclockwise rotation direction as the rotation direction 39K in a plan view. It is comprised so that it may adjust (control) by. The above-described 26 to 32 and the like constitute an example of the lower polishing disc driving means 25.

上記した構成によって、両研磨盤19,39を、同一状線上に位置される回転軸心10A,20Aの周りに回転自在に設け得るとともに、両研磨盤19,39を回転軸心10A,20Aの周りに各別に回転させる一対の研磨盤駆動手段14,25を、各別に駆動制御自在として構成し得る。なお下部研磨盤39の外側面で適所には、上板3aの上面に摺接自在な清掃体33が設けられている。   With the above-described configuration, both polishing discs 19 and 39 can be rotatably provided around the rotation axes 10A and 20A positioned on the same line, and both polishing discs 19 and 39 can be provided on the rotation axes 10A and 20A. The pair of polishing disk drive means 14 and 25 that are rotated around each other can be configured to be freely drive-controllable. A cleaning body 33 that is slidable in contact with the upper surface of the upper plate 3a is provided at an appropriate position on the outer surface of the lower polishing board 39.

前記液供給管21は、その上端が下部研磨盤39の上面に開放され、そして下端には、液供給装置(図示せず。)がロータリージョイント35を介して接続されている。また下部研磨盤39の下面側は、下部フレーム3の上板3a上に設けられたスライド受け台9に受け止められている。そしてスライド受け台9には、下部研磨盤39の下面とスライド受け台9の上面との間に油を供給する油供給路36が形成されるとともに、油供給路36に接続する油供給装置37が下部フレーム3に設けられている。   The liquid supply pipe 21 has an upper end opened to the upper surface of the lower polishing disc 39, and a liquid supply device (not shown) connected to the lower end via a rotary joint 35. Further, the lower surface side of the lower polishing board 39 is received by a slide receiving base 9 provided on the upper plate 3 a of the lower frame 3. In the slide cradle 9, an oil supply path 36 for supplying oil is formed between the lower surface of the lower polishing board 39 and the upper surface of the slide cradle 9, and an oil supply device 37 connected to the oil supply path 36. Is provided on the lower frame 3.

両研磨盤19,39を相対的に接近離間動させる接近離間手段40が設けられる。この接近離間手段40は左右一対のシリンダー装置41からなり、そのシリンダー本体42が
上部フレーム2に連結されるとともに、下向きのピストンロッド43が連結部材44を介して前記昇降体6に連結されることにより、その一例が構成される。したがって、両シリンダー装置41を同期して伸縮動させ、摺動案内体7を介してガイドレール8を支持案内して昇降体6を昇降動させることで、下部研磨盤39に対して上部研磨盤19を接近離間動し得る。
An approaching / separating means 40 for relatively moving the both polishing discs 19 and 39 closer to and away from each other is provided. The approaching / separating means 40 includes a pair of left and right cylinder devices 41, the cylinder body 42 is connected to the upper frame 2, and the downward piston rod 43 is connected to the elevating body 6 via a connecting member 44. An example of this is configured. Therefore, both the cylinder devices 41 are synchronously expanded and contracted, the guide rail 8 is supported and guided via the sliding guide body 7 and the lifting body 6 is moved up and down, so that the upper polishing disk is moved relative to the lower polishing disk 39. 19 can be moved close to and away from.

前記下部研磨盤39に外嵌されてリング状の回転体50が設けられ、この回転体50は、本体フレーム1側に支持案内されて前記回転軸心10A,20Aに対して変位させた偏心軸心50Aの周りに回転可能に構成されている。すなわち回転体50は筒リング状であって、その外面側には外向き鍔部50aが一体形成されるとともに、内面側には内向き鍔部50bが一体形成されている。そして回転体50の外側で周方向の複数箇所には、回転支持部51が設けられている。これら回転支持部51は、下部フレーム3の上板3a上に設けられた支持体52と、この支持体52側に横軸53を介して遊転自在に設けられて前記外向き鍔部50aを下方から支持自在な受けローラ54と、前記支持体52側に縦軸55を介して遊転自在に設けられて前記外向き鍔部50aに外方から当接自在な案内ローラ56と、この案内ローラ56の当接位置を調整自在な調整部57などにより一例が構成される。   A ring-shaped rotating body 50 is provided so as to be fitted on the lower polishing disc 39, and the rotating body 50 is supported and guided on the main body frame 1 side and displaced with respect to the rotating shafts 10A and 20A. It is configured to be rotatable around the core 50A. That is, the rotating body 50 has a cylindrical ring shape, and an outward flange portion 50a is integrally formed on the outer surface side, and an inward flange portion 50b is integrally formed on the inner surface side. In addition, rotation support portions 51 are provided at a plurality of locations in the circumferential direction outside the rotating body 50. These rotation support portions 51 are provided on a support body 52 provided on the upper plate 3a of the lower frame 3, and are provided on the side of the support body 52 so as to be freely rotatable via a horizontal shaft 53. A receiving roller 54 which can be supported from below, a guide roller 56 which is provided on the side of the support 52 so as to be freely rotatable via a longitudinal axis 55 and which can be in contact with the outward flange 50a from the outside, and this guide An example is configured by an adjustment unit 57 that can adjust the contact position of the roller 56.

前記回転体50を偏心軸心50Aの周りに回転させる回転体駆動手段60が設けられている。すなわち、回転体50に外嵌されて外向き鍔部50a上に載置されたのち、この外向き鍔部50a側に連結される環状の受動歯車61が設けられている。そして、下部フレーム3の上板3a上に回転駆動装置(モータ)62が設けられ、この回転駆動装置62に一体状の変速装置63からの上向きの出力軸64に、前記受動歯車61に常時噛合する駆動歯車65が設けられている。   Rotating body driving means 60 for rotating the rotating body 50 around the eccentric axis 50A is provided. That is, an annular passive gear 61 that is externally fitted to the rotating body 50 and placed on the outward flange 50a is connected to the outward flange 50a. A rotation drive device (motor) 62 is provided on the upper plate 3 a of the lower frame 3, and is always meshed with the passive gear 61 by an upward output shaft 64 from a transmission 63 integrated with the rotation drive device 62. A driving gear 65 is provided.

したがって、回転駆動装置62により駆動歯車65を駆動回転することで、受動歯車61を介して回転体50を偏心軸心50Aの周りに回転(自転)し得、そして回転は、受けローラ54や案内ローラ56からなる回転支持部51群の支持案内によって、常に安定して行える。その際に回転体50の回転方向50Kは、下部研磨盤39の回転方向39Kと同方向で、平面視において反時計回転方向に設定されており、また回転体50の回転速度は、変速装置63によって調整(制御)するように構成されている。以上の61〜65などにより、回転体駆動手段60の一例が構成される。   Therefore, by driving and rotating the drive gear 65 by the rotation drive device 62, the rotating body 50 can be rotated (rotated) around the eccentric axis 50A via the passive gear 61, and the rotation can be performed by the receiving roller 54 or the guide. It can always be stably performed by the support guide of the rotation support portion 51 group composed of the rollers 56. At this time, the rotating direction 50K of the rotating body 50 is set to be the same as the rotating direction 39K of the lower polishing board 39, and is set to the counterclockwise rotating direction in a plan view. It is comprised so that it may adjust (control) by. An example of the rotating body driving means 60 is configured by the above 61-65 and the like.

このように、本体フレーム1側に支持案内されて前記回転軸心10A,20Aに対して変位させた偏心軸心50Aの周りに回転可能な回転体50に、被加工物(被研磨物)85を貫装自在な保持キャリア80が連結具70を介して着脱自在に連結されている。すなわち、回転体50の内向き鍔部50bで周方向の複数箇所には、連結用孔50cが形成されている。前記連結具70は、各連結用孔50cに対応してそれぞれ設けられるもので、連結用孔50cに上方から差し込まれる位置決めピン71と、この位置決めピン71の下位螺子部に螺合して内向き鍔部50bに固定させるナット体72と、前記位置決めピン71の上位ピン部に外嵌して内向き鍔部50b上に位置されるスペーサ73と、前記位置決めピン71の上位ピン部に外嵌してスペーサ73に対向される押さえ体74と、この押さえ体74に上方から差し込まれて位置決めピン71の上位螺子孔部に螺合自在な押さえボルト体75とにより構成されている。   In this way, the workpiece (polishing object) 85 is provided on the rotary body 50 that is supported and guided on the main body frame 1 side and can be rotated around the eccentric axis 50A displaced with respect to the rotary axes 10A and 20A. A holding carrier 80 that can be freely inserted and removed is detachably connected via a connector 70. That is, the connecting holes 50c are formed at a plurality of locations in the circumferential direction of the inward flange portion 50b of the rotating body 50. The coupling tool 70 is provided corresponding to each coupling hole 50c. The coupling tool 70 is screwed into a positioning pin 71 inserted into the coupling hole 50c from above and a lower screw portion of the positioning pin 71 to be inward. A nut body 72 fixed to the flange portion 50b, a spacer 73 that is externally fitted to the upper pin portion of the positioning pin 71 and is positioned on the inward flange portion 50b, and an upper pin portion of the positioning pin 71. The pressing body 74 is opposed to the spacer 73, and the pressing bolt body 75 is inserted into the pressing body 74 from above and can be screwed into the upper screw hole portion of the positioning pin 71.

前記保持キャリア80は円盤状であって、その中央部分(設定箇所)には矩形状の嵌合孔81が形成され、この嵌合孔81に矩形板状の被加工物85を貫装自在としている。そして保持キャリア80は、周縁部分で周方向の複数箇所に前記連結具70に対応した連結用孔82が形成される状態で、樹脂材により一体成形されている。したがって保持キャリア80は、押さえボルト体75の離脱により押さえ体74を外した状態で、位置決めピン71群の上位ピン部に連結用孔82群を介して外嵌させたのち、上位ピン部に押さえ体74を外嵌させて押さえボルト体75を締め付け螺合することによって、連結具70群を介して回転体50で保持し得る。これにより、保持キャリア80で保持した被加工物85の両面を挟む状態で、一対の研磨盤19,39を配置し得る。以上の71〜75などにより、連結具70の一例が構成される。なお上板3aの周縁部には、回転支持部51群の側方や上方を覆うカバー体58が設けられている。   The holding carrier 80 has a disc shape, and a rectangular fitting hole 81 is formed in the center portion (setting position), and a rectangular plate-like workpiece 85 can be freely inserted into the fitting hole 81. Yes. The holding carrier 80 is integrally formed of a resin material in a state where connection holes 82 corresponding to the connection tool 70 are formed at a plurality of locations in the circumferential direction at the peripheral portion. Accordingly, the holding carrier 80 is externally fitted to the upper pin portion of the positioning pin 71 group via the connecting hole 82 group in a state in which the presser body 74 is removed by detachment of the presser bolt body 75, and then pressed to the upper pin portion. The body 74 can be externally fitted and the holding bolt body 75 can be tightened and screwed to hold the rotating body 50 via the connector 70 group. Accordingly, the pair of polishing discs 19 and 39 can be disposed in a state where both surfaces of the workpiece 85 held by the holding carrier 80 are sandwiched. An example of the connector 70 is configured by the above 71 to 75 and the like. A cover body 58 is provided at the peripheral edge of the upper plate 3a so as to cover the side and upper side of the rotation support section 51 group.

以下に、上記した実施の形態1における作用を説明する。
図1の実線や図2に示すように、接近離間動手段40におけるシリンダー装置41の収縮動で昇降体6を上昇させ、下部研磨盤39に対して上部研磨盤19を上昇離間させた状態で、保持キャリア80の嵌合孔81に対して矩形の被加工物85を嵌め込みによりセットし得る。このとき被加工物85は下部研磨盤39に、その下面を介して当接される。なお嵌め込み前に、前工程で研磨した製品(被加工物85)は取り出される。
Hereinafter, the operation of the first embodiment will be described.
As shown in the solid line of FIG. 1 and FIG. 2, the lifting body 6 is raised by the contraction movement of the cylinder device 41 in the approaching / separating movement means 40, and the upper polishing disk 19 is lifted and separated from the lower polishing disk 39. The rectangular workpiece 85 can be set by fitting into the fitting hole 81 of the holding carrier 80. At this time, the workpiece 85 is brought into contact with the lower polishing disc 39 via its lower surface. Before fitting, the product (workpiece 85) polished in the previous process is taken out.

この状態でシリンダー装置41を伸展動させ、昇降体6を介して上部研磨盤19を下降させることにより、図1の仮想線に示すように、被加工物85の上面に対して上部研磨盤19を軽く当接し得る。このような当接の前後において、両研磨盤駆動手段14,25の回転駆動装置15,26を稼働して両研磨盤19,39を回転軸心10A,20Aの周りに回転させるとともに、回転体駆動手段60の回転駆動装置62を稼働して回転体50を偏心軸心50Aの周りに偏心回転させて、所期の研磨を行う。   In this state, the cylinder device 41 is extended and moved to lower the upper polishing plate 19 via the elevating body 6, so that the upper polishing plate 19 is moved relative to the upper surface of the workpiece 85 as shown by the phantom line in FIG. Can be abutted lightly. Before and after such contact, the rotary drive devices 15 and 26 of both polishing disc drive means 14 and 25 are operated to rotate both polishing discs 19 and 39 around the rotation axes 10A and 20A, and to rotate the rotating body. The rotation driving device 62 of the driving means 60 is operated to rotate the rotating body 50 eccentrically around the eccentric axis 50A, thereby performing desired polishing.

すなわち、上部研磨盤駆動手段14における回転駆動装置15の回転を、変速装置16や出力軸17を介して上部回転軸10に伝達し得、そして上部回転軸10の回転により、上部研磨盤19を回転軸心10Aの周りに駆動回転し得る。また下部研磨盤駆動手段25における回転駆動装置26の回転を、無端連動機構27を介して変速装置28に伝達し得、さらに出力軸29の回転を、無端回動体32などを介して下部回転軸20に伝達し得、そして下部回転軸20の回転により、下部研磨盤39を回転軸心20Aの周りに駆動回転し得る。また回転体駆動手段60における回転駆動装置62の回転を、変速装置63を介して駆動歯車65に伝達し得、さらに受動歯車61を介して回転体50に伝達し得、そして回転体50の回転により、保持キャリア80(被加工物85)を偏心軸心50Aの周りに駆動回転し得る。   That is, the rotation of the rotation driving device 15 in the upper polishing disk driving means 14 can be transmitted to the upper rotation shaft 10 via the transmission 16 and the output shaft 17, and the rotation of the upper rotation shaft 10 causes the upper polishing disk 19 to move. It can be driven to rotate around the rotation axis 10A. Further, the rotation of the rotation driving device 26 in the lower polishing disk driving means 25 can be transmitted to the transmission 28 via the endless interlocking mechanism 27, and the rotation of the output shaft 29 can be transmitted to the lower rotation shaft via the endless rotating body 32 or the like. 20, and the rotation of the lower rotary shaft 20 can drive and rotate the lower polishing disc 39 around the rotary axis 20 </ b> A. Further, the rotation of the rotary drive device 62 in the rotary body drive means 60 can be transmitted to the drive gear 65 via the transmission device 63, and further transmitted to the rotary body 50 via the passive gear 61, and the rotation of the rotary body 50 can be transmitted. Thus, the holding carrier 80 (workpiece 85) can be driven and rotated around the eccentric axis 50A.

したがって、この状態でシリンダー装置41の伸展により荷重を掛けることにより、研磨盤19,39の回転軸心10A,20Aの周りでの駆動回転と、被加工物85の偏心軸心50Aの周りでの駆動回転によって、被加工物85の両面に対する研磨加工を行える。その際に、上部研磨盤19の回転方向19Kと下部研磨盤39の回転方向39Kが反対方向(逆方向)であることから、被加工物85の両面研磨における摩擦力を相殺し得る。   Therefore, in this state, by applying a load by the extension of the cylinder device 41, the driving rotation of the polishing discs 19 and 39 around the rotation axes 10A and 20A and the rotation of the workpiece 85 around the eccentric axis 50A are performed. By the driving rotation, polishing on both surfaces of the workpiece 85 can be performed. At this time, since the rotation direction 19K of the upper polishing disk 19 and the rotation direction 39K of the lower polishing disk 39 are opposite (reverse directions), the frictional force in the double-side polishing of the workpiece 85 can be offset.

また、変速装置16,28,63により出力軸17,29,64の回転速度(駆動)を各別に制御(調整)することによって、反対方向(逆方向)である上部研磨盤19の回転方向19Kと保持キャリア80の回転方向50Kによる上部研磨盤19と被加工物85との研磨速度と、同方向である下部研磨盤39の回転方向39Kと保持キャリア80の回転方向50Kによる下部研磨盤39と被加工物85との研磨速度とを等速状とし得、これにより研磨盤19,39の当接は、両面全域で均一状にかつ研磨速度を一定状として行え、以て研磨残りの生じない均一な研磨加工を行える。さらに、被加工物85の両面を同時に研磨するので、板状物の研磨の場合、歪んだ板状物を平面に研磨加工できる。   Further, the rotational speed (drive) of the output shafts 17, 29, 64 is controlled (adjusted) by the transmissions 16, 28, 63 separately, whereby the rotation direction 19K of the upper polishing disc 19 which is the opposite direction (reverse direction). And the polishing speed of the upper polishing disc 19 and the workpiece 85 in the rotation direction 50K of the holding carrier 80, the rotation direction 39K of the lower polishing disc 39 in the same direction, and the lower polishing disc 39 in the rotation direction 50K of the holding carrier 80 The polishing rate with the workpiece 85 can be made constant, so that the abutment of the polishing discs 19 and 39 can be made uniform across the entire surface and at a constant polishing rate, so that no polishing residue occurs. Uniform polishing can be performed. Furthermore, since both surfaces of the workpiece 85 are polished simultaneously, in the case of polishing a plate-like object, the distorted plate-like object can be polished into a flat surface.

そして回転体50の偏心軸心50Aの周りでの回転(自転)は、回転駆動装置62により駆動歯車65を駆動回転することで、破損など生じることなく剛体化した受動歯車61を介して確実に行うことができ、さらに回転は、受けローラ54や案内ローラ56からなる回転支持部51群の支持案内によって、常に安定して行うことができる。また保持キャリア80への回転力の伝達は、連結具70を介して回転体50と一体状として行うことができて、保持キャリア80が折損する(壊れる)ことなどを減少して常に安定して行うことができる。これにより保持キャリア80としては、被加工物85を保護するために強度の低い樹脂材製としたものや、薄い被加工物85に対応させて薄く形成したとしても、歯部が簡単に折損する(壊れる)ことがなくなり、以て樹脂材製の薄い保持キャリア80を容易に採用できる。   Then, the rotation (rotation) around the eccentric shaft 50A of the rotating body 50 is reliably performed through the passive gear 61 which is rigidized without causing breakage or the like by driving and rotating the driving gear 65 by the rotation driving device 62. Further, the rotation can be always stably performed by the support guide of the rotation support portion 51 group including the receiving roller 54 and the guide roller 56. Further, the transmission of the rotational force to the holding carrier 80 can be performed integrally with the rotating body 50 via the coupler 70, and the holding carrier 80 is prevented from being broken (broken), and is always stable. It can be carried out. As a result, even if the holding carrier 80 is made of a low-strength resin material to protect the workpiece 85 or is thinly formed corresponding to the thin workpiece 85, the tooth portion is easily broken. Therefore, the thin holding carrier 80 made of a resin material can be easily employed.

なお上述した研磨盤19,39による研磨は、液供給装置からロータリージョイント35や液供給管21を介して下部研磨盤39の上面(同様にして上部研磨盤19の下面)に研磨材(水や油の研磨液など)を供給しながら(かけながら)行われる。また、下部研磨盤39の回転は、油供給装置37から油供給路36を介して下部研磨盤39の下面とスライド受け台9の上面との間に供給される油によって、静圧スラスト軸受形式により安定して支持できる。
[実施の形態2]
次に、本発明の実施の形態2を、図7に基づいて説明する。
The polishing by the polishing machines 19 and 39 described above is performed on the upper surface of the lower polishing board 39 (the lower surface of the upper polishing board 19 in the same manner) from the liquid supply device via the rotary joint 35 and the liquid supply pipe 21. This is performed while supplying (polishing) oil polishing liquid. The rotation of the lower polishing plate 39 is caused by the oil supplied between the lower surface of the lower polishing plate 39 and the upper surface of the slide cradle 9 from the oil supply device 37 via the oil supply path 36. Can be supported more stably.
[Embodiment 2]
Next, a second embodiment of the present invention will be described with reference to FIG.

すなわち、円板状の保持キャリア80には、周方向の2箇所(複数箇所)に矩形状の嵌合孔81が形成され、それぞれに小さな被加工物85群を貫装している。これによると、被加工物85群の両面を、均一に研磨する要素をより確実として、同時に研磨し得る。なお、同時に研磨される被加工物85の数や大小の形状は任意に設定されるものである。   That is, the disc-shaped holding carrier 80 is formed with rectangular fitting holes 81 at two places (a plurality of places) in the circumferential direction, and a small group of workpieces 85 are inserted through each. According to this, both surfaces of the group of workpieces 85 can be polished at the same time with more reliable elements for uniformly polishing. The number of workpieces 85 to be polished simultaneously and the size of the workpiece 85 are arbitrarily set.

上記した実施の形態1では、回転体50の回転支持部51として、受けローラ54と案内ローラ56とからなるローラ形式が示されているが、これはベアリング形式などであってもよい。   In the first embodiment described above, a roller type including the receiving roller 54 and the guide roller 56 is shown as the rotation support portion 51 of the rotating body 50, but this may be a bearing type.

上記した実施の形態1では、連結具70として押さえ体74を介しての押し付けクランプ形式が示されているが、これはねじ体のみによる締め付け形式などであってもよい。
上記した実施の形態1では、回転体50を回転させる回転体駆動手段60として歯車伝動形式が示されているが、これはチェーン伝動形式やベルト伝動形式などであってもよい。
In the first embodiment described above, a pressing clamp type through the pressing body 74 is shown as the connecting tool 70, but this may be a tightening type using only a screw body.
In the first embodiment described above, the gear transmission type is shown as the rotary body driving means 60 for rotating the rotary body 50, but this may be a chain transmission type or a belt transmission type.

上記した実施の形態1,2では、矩形板状の被加工物85の研磨を行っているが、これは丸形板状など種々な形状の被加工物を取り扱えるものであり、それに応じて嵌合孔81の形状が決定される。   In the first and second embodiments described above, the rectangular plate-shaped workpiece 85 is polished, but this can handle workpieces of various shapes such as a round plate shape, and fits accordingly. The shape of the joint hole 81 is determined.

上記した実施の形態1,2において、両面研磨装置を複数台設置して、共通(1台)のロボットにより、被加工物85の供給や取出しなど、各種の作業を行う形式であってもよい。   In the first and second embodiments described above, a plurality of double-side polishing apparatuses may be installed, and various operations such as supply and extraction of the workpiece 85 may be performed by a common (one) robot. .

1 本体フレーム
6 昇降体
9 スライド受け台
10 上部回転軸
10A 回転軸心
14 上部研磨盤駆動手段(研磨盤駆動手段)
15 回転駆動装置
16 変速装置
19 上部研磨盤(研磨盤)
19K 回転方向
20 下部回転軸
20A 回転軸心
25 下部研磨盤駆動手段(研磨盤駆動手段)
26 回転駆動装置
28 変速装置
39 下部研磨盤(研磨盤)
39K 回転方向
40 接近離間手段
50 回転体
50a 外向き鍔部
50b 内向き鍔部
50c 連結用孔
50A 偏心軸心
50K 回転方向
51 回転支持部
60 回転体駆動手段
62 回転駆動装置
63 変速装置
70 連結具
71 位置決めピン
74 押さえ体
75 押さえボルト体
80 保持キャリア
81 嵌合孔
82 連結用孔
85 被加工物(被研磨物)
DESCRIPTION OF SYMBOLS 1 Main body frame 6 Lifting body 9 Slide receiving stand 10 Upper rotating shaft 10A Rotating shaft center 14 Upper polishing disk drive means (polishing disk drive means)
15 Rotation drive device 16 Transmission device 19 Upper polishing disk (polishing disk)
19K Rotating direction 20 Lower rotating shaft 20A Rotating axis 25 Lower polishing disk driving means (polishing disk driving means)
26 Rotating drive device 28 Transmission device 39 Lower polishing machine (polishing machine)
39K Rotation direction 40 Approaching / separating means 50 Rotating body 50a Outward flange portion 50b Inward flange portion 50c Connection hole 50A Eccentric shaft center 50K Rotation direction 51 Rotation support portion 60 Rotation body drive means 62 Rotation drive device 63 Transmission device 70 Connection tool 71 Positioning Pin 74 Holding Body 75 Holding Bolt Body 80 Holding Carrier 81 Fitting Hole 82 Connection Hole 85 Workpiece (Workpiece)

Claims (1)

保持キャリアで保持した被加工物の両面を挟む状態で、一対の研磨盤を配置するとともに、これら研磨盤を相対的に接近離間動させる接近離間手段を設けた両面研磨装置であって、両研磨盤を、同一状線上に位置される回転軸心の周りに回転自在に設けるとともに、両研磨盤を回転軸心の周りに各別に回転させる一対の研磨盤駆動手段を、各別に駆動制御自在として設け、前記保持キャリアを、本体フレーム側に支持案内されて前記回転軸心に対して変位させた偏心軸心の周りに回転可能なリング状の回転体に、連結具を介して着脱自在に連結するとともに、この回転体を回転させる回転体駆動手段を設けたことを特徴とする両面研磨装置。   A double-side polishing apparatus in which a pair of polishing discs are arranged with both sides of a workpiece held by a holding carrier being sandwiched, and an approaching / separating means for moving these polishing discs relatively close to each other is provided. A disc is rotatably provided around a rotation axis centered on the same line, and a pair of polishing disc driving means for rotating both polishing discs individually around the rotation axis can be driven and controlled separately. The holding carrier is detachably connected via a connector to a ring-shaped rotating body that is supported and guided on the main body frame side and can be rotated around an eccentric shaft center that is displaced with respect to the rotation shaft center. In addition, a double-side polishing apparatus provided with a rotating body driving means for rotating the rotating body.
JP2009037256A 2009-02-20 2009-02-20 Double-side grinding device Pending JP2010188488A (en)

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CN103600285A (en) * 2013-07-26 2014-02-26 浙江工业大学 Upper disc eccentric compression type cylindrical machining device of cylindrical parts
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CN110509174A (en) * 2019-09-06 2019-11-29 东阳阿语机械科技有限公司 A kind of sheet metal surface burnishing device
CN110549238A (en) * 2019-09-23 2019-12-10 大同新成新材料股份有限公司 grinding device for producing high-precision chip silicon and operation method
KR20220020909A (en) * 2019-06-14 2022-02-21 실트로닉 아게 Semiconductor wafer polishing apparatus and method
CN114536153A (en) * 2022-02-28 2022-05-27 三明福特科光电有限公司 Two-sided grinding device of optical lens piece

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Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103522166A (en) * 2013-07-26 2014-01-22 浙江工业大学 Method for processing outer circle of cylindrical part based on upper plate eccentric pressurizing
CN103522168A (en) * 2013-07-26 2014-01-22 浙江工业大学 Cylindrical part outer circle machining device based on holder eccentric rotary swing type double-plane grinding
CN103600285A (en) * 2013-07-26 2014-02-26 浙江工业大学 Upper disc eccentric compression type cylindrical machining device of cylindrical parts
CN103433842A (en) * 2013-09-23 2013-12-11 南通龙源电站阀门有限公司 Eccentric grinding tool of valve body
CN104191349A (en) * 2014-08-21 2014-12-10 益阳橡胶塑料机械集团有限公司 Grinding method of dynamic ring and static ring in rotor sealing device of internal mixer and auxiliary grinding device
CN104191349B (en) * 2014-08-21 2016-06-29 益阳橡胶塑料机械集团有限公司 The Ginding process of dynamic and static ring and lapping aid in closed-smelting machine rotor sealing device
CN109397100A (en) * 2018-11-30 2019-03-01 苏州赛森电子科技有限公司 A kind of integrated circuit board grinding device and application method
CN109397100B (en) * 2018-11-30 2024-05-28 苏州赛森电子科技有限公司 Integrated circuit board grinding device and use method
KR20220020909A (en) * 2019-06-14 2022-02-21 실트로닉 아게 Semiconductor wafer polishing apparatus and method
JP2022537523A (en) * 2019-06-14 2022-08-26 ジルトロニック アクチエンゲゼルシャフト Equipment and method for polishing semiconductor wafers
JP7225437B2 (en) 2019-06-14 2023-02-20 ジルトロニック アクチエンゲゼルシャフト Equipment and method for polishing semiconductor wafers
KR102608078B1 (en) 2019-06-14 2023-11-29 실트로닉 아게 Semiconductor wafer polishing apparatus and method
CN110509174A (en) * 2019-09-06 2019-11-29 东阳阿语机械科技有限公司 A kind of sheet metal surface burnishing device
CN110549238A (en) * 2019-09-23 2019-12-10 大同新成新材料股份有限公司 grinding device for producing high-precision chip silicon and operation method
CN114536153A (en) * 2022-02-28 2022-05-27 三明福特科光电有限公司 Two-sided grinding device of optical lens piece

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