JP2010181861A5 - - Google Patents
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- Publication number
- JP2010181861A5 JP2010181861A5 JP2009229734A JP2009229734A JP2010181861A5 JP 2010181861 A5 JP2010181861 A5 JP 2010181861A5 JP 2009229734 A JP2009229734 A JP 2009229734A JP 2009229734 A JP2009229734 A JP 2009229734A JP 2010181861 A5 JP2010181861 A5 JP 2010181861A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- projection optical
- shutter
- exposure apparatus
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 23
- 239000000758 substrate Substances 0.000 claims 5
- 238000005259 measurement Methods 0.000 claims 4
- 230000000903 blocking effect Effects 0.000 claims 3
- 238000002834 transmittance Methods 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229920006395 saturated elastomer Polymers 0.000 claims 2
- 238000009529 body temperature measurement Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009229734A JP2010181861A (ja) | 2009-01-06 | 2009-10-01 | 露光装置、及びそれを用いたデバイスの製造方法 |
| KR1020090131424A KR20100081927A (ko) | 2009-01-06 | 2009-12-28 | 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법 |
| US12/652,985 US8363207B2 (en) | 2009-01-06 | 2010-01-06 | Exposure apparatus, and method of manufacturing device using same |
| KR1020130029056A KR20130032893A (ko) | 2009-01-06 | 2013-03-19 | 노광 장치 및 노광 장치를 사용하여 디바이스를 제조하는 방법 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009001015 | 2009-01-06 | ||
| JP2009229734A JP2010181861A (ja) | 2009-01-06 | 2009-10-01 | 露光装置、及びそれを用いたデバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010181861A JP2010181861A (ja) | 2010-08-19 |
| JP2010181861A5 true JP2010181861A5 (cg-RX-API-DMAC7.html) | 2012-11-15 |
Family
ID=42311918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009229734A Pending JP2010181861A (ja) | 2009-01-06 | 2009-10-01 | 露光装置、及びそれを用いたデバイスの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8363207B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2010181861A (cg-RX-API-DMAC7.html) |
| KR (2) | KR20100081927A (cg-RX-API-DMAC7.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9235134B2 (en) * | 2010-08-16 | 2016-01-12 | Micron Technology, Inc. | Lens heating compensation in photolithography |
| JP2012234110A (ja) * | 2011-05-09 | 2012-11-29 | Canon Inc | 露光装置、およびそれを用いたデバイスの製造方法 |
| CN102411264B (zh) * | 2011-11-22 | 2014-07-16 | 上海华力微电子有限公司 | 光刻机投影物镜温度均衡装置及均衡方法 |
| CN204406005U (zh) * | 2015-02-28 | 2015-06-17 | 成都京东方光电科技有限公司 | 光取向设备 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63266821A (ja) * | 1987-04-24 | 1988-11-02 | Nippon Telegr & Teleph Corp <Ntt> | 紫外線露光装置 |
| JP2682067B2 (ja) * | 1988-10-17 | 1997-11-26 | 株式会社ニコン | 露光装置及び露光方法 |
| JPH03222405A (ja) | 1990-01-29 | 1991-10-01 | Hitachi Ltd | 露光装置およびそれに用いられる空露光方法 |
| US6078380A (en) * | 1991-10-08 | 2000-06-20 | Nikon Corporation | Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure |
| US5677757A (en) * | 1994-03-29 | 1997-10-14 | Nikon Corporation | Projection exposure apparatus |
| US5995263A (en) * | 1993-11-12 | 1999-11-30 | Nikon Corporation | Projection exposure apparatus |
| JP3552221B2 (ja) * | 1995-09-11 | 2004-08-11 | 株式会社ニコン | 投影露光装置 |
| JPH09199384A (ja) * | 1996-01-23 | 1997-07-31 | Nec Kyushu Ltd | 露光装置及び露光方法 |
| JP2001351850A (ja) | 2000-06-08 | 2001-12-21 | Canon Inc | 半導体製造装置および半導体デバイス製造方法 |
| JP3341767B2 (ja) * | 2001-10-10 | 2002-11-05 | 株式会社ニコン | 投影露光装置及び方法、並びに回路素子形成方法 |
-
2009
- 2009-10-01 JP JP2009229734A patent/JP2010181861A/ja active Pending
- 2009-12-28 KR KR1020090131424A patent/KR20100081927A/ko not_active Abandoned
-
2010
- 2010-01-06 US US12/652,985 patent/US8363207B2/en not_active Expired - Fee Related
-
2013
- 2013-03-19 KR KR1020130029056A patent/KR20130032893A/ko not_active Ceased